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DE602004027894D1 - Steuerung der raum-zeit-uniformität eines gepulsten gaslaserstrahls - Google Patents

Steuerung der raum-zeit-uniformität eines gepulsten gaslaserstrahls

Info

Publication number
DE602004027894D1
DE602004027894D1 DE602004027894T DE602004027894T DE602004027894D1 DE 602004027894 D1 DE602004027894 D1 DE 602004027894D1 DE 602004027894 T DE602004027894 T DE 602004027894T DE 602004027894 T DE602004027894 T DE 602004027894T DE 602004027894 D1 DE602004027894 D1 DE 602004027894D1
Authority
DE
Germany
Prior art keywords
uniformity
space
laser beam
gas laser
control
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE602004027894T
Other languages
English (en)
Inventor
Maxime Makarov
Marc Stehle
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Excico Group NV
Original Assignee
Excico Group NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=33041714&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=DE602004027894(D1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Excico Group NV filed Critical Excico Group NV
Publication of DE602004027894D1 publication Critical patent/DE602004027894D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • H01S3/09705—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser with particular means for stabilising the discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • H01S3/0971—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser transversely excited
    • H01S3/09713—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser transversely excited with auxiliary ionisation, e.g. double discharge excitation
    • H01S3/09716—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser transversely excited with auxiliary ionisation, e.g. double discharge excitation by ionising radiation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/102—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the active medium, e.g. by controlling the processes or apparatus for excitation
    • H01S3/104—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the active medium, e.g. by controlling the processes or apparatus for excitation in gas lasers

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Lasers (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
DE602004027894T 2003-04-08 2004-03-09 Steuerung der raum-zeit-uniformität eines gepulsten gaslaserstrahls Expired - Lifetime DE602004027894D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR0304355A FR2853772B1 (fr) 2003-04-08 2003-04-08 Controle de l'uniformite spatio-temporelle du faisceau d'un laser a gaz pulse
PCT/FR2004/000557 WO2004095658A2 (fr) 2003-04-08 2004-03-09 Controle de l’uniformite spatio-temporelle du faisceau d’un laser a gaz pulse

Publications (1)

Publication Number Publication Date
DE602004027894D1 true DE602004027894D1 (de) 2010-08-12

Family

ID=33041714

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602004027894T Expired - Lifetime DE602004027894D1 (de) 2003-04-08 2004-03-09 Steuerung der raum-zeit-uniformität eines gepulsten gaslaserstrahls

Country Status (9)

Country Link
US (1) US20070133645A1 (de)
EP (1) EP1609222B1 (de)
JP (1) JP4481298B2 (de)
KR (1) KR100915878B1 (de)
AT (1) ATE472835T1 (de)
CA (1) CA2521491A1 (de)
DE (1) DE602004027894D1 (de)
FR (1) FR2853772B1 (de)
WO (1) WO2004095658A2 (de)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20230084777A (ko) * 2021-12-06 2023-06-13 주식회사 엘지에너지솔루션 전극의 레이저 노칭에 사용되는 전극 제조 장치

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02248094A (ja) * 1989-03-22 1990-10-03 Toshiba Corp Ｘ線予備電離パルスレーザー装置
US5077749A (en) * 1989-07-10 1991-12-31 Kabushiki Kaisha Toshiba Laser apparatus
NL9100019A (nl) * 1991-01-09 1992-08-03 Philips Nv Roentgenonderzoekapparaat.
US5778046A (en) * 1996-01-19 1998-07-07 The Regents Of The University Of California Automatic X-ray Beam Equalizer
JP2002170767A (ja) * 2000-12-04 2002-06-14 Nikon Corp ビーム評価方法、荷電粒子線投影露光装置及びデバイス製造方法

Also Published As

Publication number Publication date
KR20060002957A (ko) 2006-01-09
KR100915878B1 (ko) 2009-09-07
WO2004095658A2 (fr) 2004-11-04
JP2006523020A (ja) 2006-10-05
EP1609222A2 (de) 2005-12-28
CA2521491A1 (fr) 2004-11-04
ATE472835T1 (de) 2010-07-15
US20070133645A1 (en) 2007-06-14
EP1609222B1 (de) 2010-06-30
WO2004095658A3 (fr) 2005-05-06
JP4481298B2 (ja) 2010-06-16
FR2853772A1 (fr) 2004-10-15
FR2853772B1 (fr) 2005-07-01

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