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DE60143372D1 - Vorsensibilisierte Platte zum Herstellen einer lithographischen Druckplatte - Google Patents

Vorsensibilisierte Platte zum Herstellen einer lithographischen Druckplatte

Info

Publication number
DE60143372D1
DE60143372D1 DE60143372T DE60143372T DE60143372D1 DE 60143372 D1 DE60143372 D1 DE 60143372D1 DE 60143372 T DE60143372 T DE 60143372T DE 60143372 T DE60143372 T DE 60143372T DE 60143372 D1 DE60143372 D1 DE 60143372D1
Authority
DE
Germany
Prior art keywords
plate
photosensitive layer
lithographic printing
negative
printing plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60143372T
Other languages
English (en)
Inventor
Tomoyoshi Mitsumoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
Original Assignee
Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Application granted granted Critical
Publication of DE60143372D1 publication Critical patent/DE60143372D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
    • G03F7/0955—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer one of the photosensitive systems comprising a non-macromolecular photopolymerisable compound having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Materials For Photolithography (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
DE60143372T 2000-03-06 2001-03-06 Vorsensibilisierte Platte zum Herstellen einer lithographischen Druckplatte Expired - Lifetime DE60143372D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000059797A JP4152559B2 (ja) 2000-03-06 2000-03-06 ネガ型感光性平版印刷版

Publications (1)

Publication Number Publication Date
DE60143372D1 true DE60143372D1 (de) 2010-12-16

Family

ID=18580204

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60143372T Expired - Lifetime DE60143372D1 (de) 2000-03-06 2001-03-06 Vorsensibilisierte Platte zum Herstellen einer lithographischen Druckplatte

Country Status (5)

Country Link
US (1) US6593054B2 (de)
EP (1) EP1132775B1 (de)
JP (1) JP4152559B2 (de)
AT (1) ATE487163T1 (de)
DE (1) DE60143372D1 (de)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6887642B2 (en) * 2002-04-05 2005-05-03 Kodak Polychrome Graphies Llc Multi-layer negative working imageable element
US8859048B2 (en) * 2006-01-03 2014-10-14 International Business Machines Corporation Selective placement of carbon nanotubes through functionalization
JP5387601B2 (ja) * 2010-03-24 2014-01-15 信越化学工業株式会社 アセタール化合物、高分子化合物、レジスト材料及びパターン形成方法
JP5533797B2 (ja) * 2010-07-08 2014-06-25 信越化学工業株式会社 パターン形成方法
CN104448098B (zh) * 2014-12-30 2016-04-27 山东华夏神舟新材料有限公司 含氟共聚物组合物及其制造方法
CN105753736A (zh) * 2016-04-02 2016-07-13 田菱精细化工（大连）有限公司 一种重氮单体4-重氮二苯胺硫酸氢盐的合成方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ZA6903590B (de) 1968-05-22
JPS59208552A (ja) * 1983-05-12 1984-11-26 Fuji Yakuhin Kogyo Kk 感光性平版印刷版
JPS6278544A (ja) 1985-10-01 1987-04-10 Fuji Photo Film Co Ltd 感光性組成物
DE3644160A1 (de) 1986-12-23 1988-07-14 Hoechst Ag Lichtempfindliches aufzeichnungsmaterial mit einer lichtempfindlichen zwischenschicht
JPH01137891A (ja) 1987-11-25 1989-05-30 Hitachi Ltd ビデオテープレコーダ
JPH0237786A (ja) 1988-07-28 1990-02-07 Fujitsu Ltd 超伝導トランジスタ
JP2627565B2 (ja) 1990-02-19 1997-07-09 富士写真フイルム株式会社 感光性平版印刷版

Also Published As

Publication number Publication date
US20020064726A1 (en) 2002-05-30
JP4152559B2 (ja) 2008-09-17
JP2001249443A (ja) 2001-09-14
EP1132775A1 (de) 2001-09-12
EP1132775B1 (de) 2010-11-03
ATE487163T1 (de) 2010-11-15
US6593054B2 (en) 2003-07-15

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