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DE60004137D1 - Herstellungsverfahren für einen oberflächen-gekoppelten InGaAs Photodetektor - Google Patents

Herstellungsverfahren für einen oberflächen-gekoppelten InGaAs Photodetektor

Info

Publication number
DE60004137D1
DE60004137D1 DE60004137T DE60004137T DE60004137D1 DE 60004137 D1 DE60004137 D1 DE 60004137D1 DE 60004137 T DE60004137 T DE 60004137T DE 60004137 T DE60004137 T DE 60004137T DE 60004137 D1 DE60004137 D1 DE 60004137D1
Authority
DE
Germany
Prior art keywords
manufacturing process
ingaas photodetector
coupled
coupled ingaas
photodetector
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60004137T
Other languages
English (en)
Other versions
DE60004137T2 (de
Inventor
Y Loo
E Schmitz
J Brown
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
DirecTV Group Inc
Original Assignee
Hughes Electronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hughes Electronics Corp filed Critical Hughes Electronics Corp
Application granted granted Critical
Publication of DE60004137D1 publication Critical patent/DE60004137D1/de
Publication of DE60004137T2 publication Critical patent/DE60004137T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F30/00Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors
    • H10F30/20Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors
    • H10F30/21Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors the devices being sensitive to infrared, visible or ultraviolet radiation
    • H10F30/22Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors the devices being sensitive to infrared, visible or ultraviolet radiation the devices having only one potential barrier, e.g. photodiodes
    • H10F30/221Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors the devices being sensitive to infrared, visible or ultraviolet radiation the devices having only one potential barrier, e.g. photodiodes the potential barrier being a PN homojunction
    • H10F30/2215Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors the devices being sensitive to infrared, visible or ultraviolet radiation the devices having only one potential barrier, e.g. photodiodes the potential barrier being a PN homojunction the devices comprising active layers made of only Group III-V materials
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/28Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
    • H01L21/283Deposition of conductive or insulating materials for electrodes conducting electric current
    • H01L21/285Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation
    • H01L21/28506Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation of conductive layers
    • H01L21/28575Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation of conductive layers on semiconductor bodies comprising AIIIBV compounds
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/80Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials
    • H10D62/85Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials being Group III-V materials, e.g. GaAs
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D64/00Electrodes of devices having potential barriers
    • H10D64/60Electrodes characterised by their materials
    • H10D64/62Electrodes ohmically coupled to a semiconductor
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F71/00Manufacture or treatment of devices covered by this subclass
    • H10F71/127The active layers comprising only Group III-V materials, e.g. GaAs or InP
    • H10F71/1272The active layers comprising only Group III-V materials, e.g. GaAs or InP comprising at least three elements, e.g. GaAlAs or InGaAsP
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00Constructional details of devices covered by this subclass
    • H10F77/70Surface textures, e.g. pyramid structures
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00Constructional details of devices covered by this subclass
    • H10F77/70Surface textures, e.g. pyramid structures
    • H10F77/703Surface textures, e.g. pyramid structures of the semiconductor bodies, e.g. textured active layers
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
    • Y02E10/544Solar cells from Group III-V materials

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Light Receiving Elements (AREA)
  • Radiation Pyrometers (AREA)
  • Solid State Image Pick-Up Elements (AREA)
  • Photometry And Measurement Of Optical Pulse Characteristics (AREA)
DE60004137T 1999-05-13 2000-05-11 Herstellungsverfahren für einen oberflächen-gekoppelten InGaAs Photodetektor Expired - Lifetime DE60004137T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/311,673 US6228673B1 (en) 1999-05-13 1999-05-13 Method of fabricating a surface coupled InGaAs photodetector
US311673 1999-05-13

Publications (2)

Publication Number Publication Date
DE60004137D1 true DE60004137D1 (de) 2003-09-04
DE60004137T2 DE60004137T2 (de) 2004-04-22

Family

ID=23207952

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60004137T Expired - Lifetime DE60004137T2 (de) 1999-05-13 2000-05-11 Herstellungsverfahren für einen oberflächen-gekoppelten InGaAs Photodetektor

Country Status (4)

Country Link
US (1) US6228673B1 (de)
EP (1) EP1063709B1 (de)
JP (1) JP3662811B2 (de)
DE (1) DE60004137T2 (de)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2289983B (en) 1994-06-01 1996-10-16 Simage Oy Imaging devices,systems and methods
US9029793B2 (en) 1998-11-05 2015-05-12 Siemens Aktiengesellschaft Imaging device
DE19956904C2 (de) * 1999-11-26 2003-08-07 United Monolithic Semiconduct Integrierter Amplitudenbegrenzer bzw. Limiter und Verfahren zur Herstellung eines integrierten Limiters
JP5011607B2 (ja) * 2001-04-16 2012-08-29 住友電気工業株式会社 受光素子
US6780750B2 (en) * 2002-01-08 2004-08-24 Samsung Electronics Co. Ltd. Photodiode for ultra high speed optical communication and fabrication method therefor
GB0224689D0 (en) 2002-10-23 2002-12-04 Simage Oy Formation of contacts on semiconductor substrates
JP2006504258A (ja) 2002-10-25 2006-02-02 ゴールドパワー リミテッド 回路基板およびその製造方法
DE102004037868A1 (de) * 2004-04-30 2005-11-24 Osram Opto Semiconductors Gmbh Strahlungsemittierendes und/oder -empfangendes Halbleiterbauelement und Verfahren zur strukturierten Aufbringung eines Kontakts auf einen Halbleiterkörper
US8072041B2 (en) * 2009-04-08 2011-12-06 Finisar Corporation Passivated optical detectors with full protection layer
US9087926B2 (en) * 2009-12-23 2015-07-21 Avago Technologies General Ip (Singapore) Pte. Ltd. Low capacitance semiconductor device
RU2485628C1 (ru) * 2012-01-19 2013-06-20 Федеральное государственное бюджетное учреждение науки Физико-технический институт им. А.Ф. Иоффе Российской академии наук Способ изготовления чипов наногетероструктуры и травитель
RU2530458C1 (ru) * 2013-04-23 2014-10-10 Российская Федерация, от имени которой выступает государственный заказчик - Министерство промышленности и торговли Российской Федерации СПОСОБ ИЗГОТОВЛЕНИЯ МНОГОЭЛЕМЕНТНОГО ФОТОПРИЕМНИКА НА ОСНОВЕ ЭПИТАКСИАЛЬНЫХ СТРУКТУР InGaAs/InP
US10388807B2 (en) 2014-04-30 2019-08-20 Hewlett Packard Enterprise Development Lp Mirrors including reflective and second layers disposed on photodetectors
CN105762226B (zh) * 2014-12-19 2018-04-17 中国电子科技集团公司第十八研究所 一种多结太阳电池渐变缓冲层的腐蚀方法
CN112582262B (zh) * 2020-11-27 2022-10-04 中国电子科技集团公司第十三研究所 一种多层材料的非选择性湿法腐蚀方法及其应用

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4414561A (en) * 1979-09-27 1983-11-08 Bell Telephone Laboratories, Incorporated Beryllium-gold ohmic contact to a semiconductor device
FR2488049A1 (fr) * 1980-07-31 1982-02-05 Bouley Jean Source lumineuse a jonction semiconductrice, notamment source-laser, utilisant des diodes schottky, et procede de fabrication
US4996163A (en) * 1988-02-29 1991-02-26 Sumitomo Electric Industries, Ltd. Method for producing an opto-electronic integrated circuit
US5250471A (en) * 1988-12-26 1993-10-05 The Furukawa Electric Co. Method for manufacturing compound semiconductor devices including a step where the semiconductor is etched without exposure to light
NL8902292A (nl) * 1989-09-14 1991-04-02 Philips Nv Werkwijze voor het vervaardigen van een een mesa bevattende halfgeleiderinrichting.
US5365087A (en) * 1992-07-15 1994-11-15 Sumitomo Electric Industries, Ltd. Photodetector and opto-electronic integrated circuit with guard ring
US5448099A (en) * 1993-03-04 1995-09-05 Sumitomo Electric Industries, Ltd. Pin-type light receiving device, manufacture of the pin-type light receiving device and optoelectronic integrated circuit
JP3115148B2 (ja) * 1993-03-31 2000-12-04 株式会社東芝 半導体装置の製造方法
JP3191835B2 (ja) * 1993-05-17 2001-07-23 住友電気工業株式会社 光電子集積回路
JPH07211692A (ja) * 1994-01-12 1995-08-11 Sumitomo Electric Ind Ltd InP系化合物半導体の加工方法
JP2762939B2 (ja) * 1994-03-22 1998-06-11 日本電気株式会社 超格子アバランシェフォトダイオード
US5518934A (en) * 1994-07-21 1996-05-21 Trustees Of Princeton University Method of fabricating multiwavelength infrared focal plane array detector
DE69637318T2 (de) * 1995-02-02 2008-09-04 Sumitomo Electric Industries, Ltd. PIN lichtempfindliche Vorrichtung und ihr Herstellungsverfahren
US5646069A (en) * 1995-06-07 1997-07-08 Hughes Aircraft Company Fabrication process for Alx In1-x As/Gay In1-y As power HFET ohmic contacts
US5689122A (en) * 1995-08-14 1997-11-18 Lucent Technologies Inc. InP/InGaAs monolithic integrated demultiplexer, photodetector, and heterojunction bipolar transistor
US5684308A (en) * 1996-02-15 1997-11-04 Sandia Corporation CMOS-compatible InP/InGaAs digital photoreceiver
US6005266A (en) * 1997-03-13 1999-12-21 The Trustees Of Princeton University Very low leakage JFET for monolithically integrated arrays
US5966622A (en) * 1997-10-08 1999-10-12 Lucent Technologies Inc. Process for bonding crystalline substrates with different crystal lattices

Also Published As

Publication number Publication date
EP1063709B1 (de) 2003-07-30
JP2000353819A (ja) 2000-12-19
EP1063709A2 (de) 2000-12-27
JP3662811B2 (ja) 2005-06-22
EP1063709A3 (de) 2001-09-26
DE60004137T2 (de) 2004-04-22
US6228673B1 (en) 2001-05-08

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8328 Change in the person/name/address of the agent

Representative=s name: WITTE, WELLER & PARTNER, 70178 STUTTGART