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DE59010008D1 - Photoempfindliches Gemisch - Google Patents

Photoempfindliches Gemisch

Info

Publication number
DE59010008D1
DE59010008D1 DE59010008T DE59010008T DE59010008D1 DE 59010008 D1 DE59010008 D1 DE 59010008D1 DE 59010008 T DE59010008 T DE 59010008T DE 59010008 T DE59010008 T DE 59010008T DE 59010008 D1 DE59010008 D1 DE 59010008D1
Authority
DE
Germany
Prior art keywords
photosensitive mixture
photosensitive
mixture
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE59010008T
Other languages
English (en)
Inventor
Max Dr Hunziker
Manfred Dr Hofmann
Adrian Dr Schulthess
Paul Dr Bernhard
Bernd Dr Klingert
Rolf Dr Wiesendanger
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Huntsman Advanced Materials Switzerland GmbH
Original Assignee
Ciba Geigy AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Geigy AG filed Critical Ciba Geigy AG
Application granted granted Critical
Publication of DE59010008D1 publication Critical patent/DE59010008D1/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Polymerisation Methods In General (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
DE59010008T 1989-10-27 1990-10-19 Photoempfindliches Gemisch Expired - Fee Related DE59010008D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CH390289 1989-10-27
CH96690 1990-03-23

Publications (1)

Publication Number Publication Date
DE59010008D1 true DE59010008D1 (de) 1996-02-08

Family

ID=25686242

Family Applications (1)

Application Number Title Priority Date Filing Date
DE59010008T Expired - Fee Related DE59010008D1 (de) 1989-10-27 1990-10-19 Photoempfindliches Gemisch

Country Status (5)

Country Link
EP (1) EP0425441B1 (de)
JP (1) JP3243565B2 (de)
KR (1) KR0163588B1 (de)
CA (1) CA2028541C (de)
DE (1) DE59010008D1 (de)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE59209143D1 (de) * 1991-03-27 1998-02-26 Ciba Geigy Ag Photoempfindliches Gemisch auf Basis von Acrylaten
EP0525578A1 (de) * 1991-08-02 1993-02-03 E.I. Du Pont De Nemours And Company Photopolymerzusammensetzung zur Herstellung von dreidimensionalen Objekten
TW311923B (de) 1992-01-27 1997-08-01 Ciba Sc Holding Ag
TW418346B (en) * 1993-03-05 2001-01-11 Ciba Sc Holding Ag Photopolymerisable compositions containing tetraacrylates
EP0643329B2 (de) * 1993-08-26 2002-02-06 Vantico AG Flüssige strahlungshärtbare Zusammensetzung, insbesondere für die Stereolithographie
GB9504995D0 (en) * 1995-03-11 1995-04-26 Zeneca Ltd Compositions
GB9504996D0 (en) * 1995-03-11 1995-04-26 Zeneca Ltd Compositions
GB9522656D0 (en) * 1995-11-04 1996-01-03 Zeneca Ltd Mould
JP3786480B2 (ja) * 1996-10-14 2006-06-14 Ｊｓｒ株式会社 光硬化性樹脂組成物
JP3626302B2 (ja) * 1996-12-10 2005-03-09 Ｊｓｒ株式会社 光硬化性樹脂組成物
JP3765896B2 (ja) 1996-12-13 2006-04-12 Ｊｓｒ株式会社 光学的立体造形用光硬化性樹脂組成物
JP4839525B2 (ja) 2000-09-29 2011-12-21 大日本印刷株式会社 感光性樹脂組成物および液晶ディスプレイ用カラーフィルタ
DE10328302A1 (de) * 2003-06-23 2005-01-27 Dreve Otoplastik Gmbh Niedrigviskose, strahlungshärtbare Formulierung, insbesondere für die Stereolithographie, zum Einsatz in der Medizintechnik, insbesondere zur Herstellung von Ohrstücken
DE102004050868A1 (de) * 2004-10-18 2006-04-20 Dreve Otoplastik Gmbh Niedrigviskose, strahlungshärtbare Formulierung zur Herstellung von Ohrpassstücken
KR100810998B1 (ko) * 2005-03-30 2008-03-11 주식회사 코오롱 프리즘 필름 및 그 제조방법
WO2006135054A1 (ja) 2005-06-16 2006-12-21 Dsm Ip Assets B.V. 光学的立体造形用放射線硬化性液状樹脂組成物及びそれを硬化させて得られる光造形物
JP2008201913A (ja) 2007-02-20 2008-09-04 Fujifilm Corp 光重合性組成物
MY193850A (en) 2017-02-10 2022-10-28 Basf Se Acrylate-based monomers for use as reactive diluents in printing formulations
TWI759422B (zh) 2017-02-10 2022-04-01 德商巴斯夫歐洲公司 於印刷調配物中作為反應性稀釋劑之基於丙烯酸酯的單體及用於印刷的方法
JP6742654B2 (ja) * 2018-06-25 2020-08-19 Ｋｊケミカルズ株式会社 三次元造形用光硬化性樹脂組成物及びそれを用いた三次元造形方法、三次元造形物
KR20220095230A (ko) 2019-11-07 2022-07-06 바스프 에스이 3d 프린팅에 사용하기 위한 수-세척성 조성물

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4575330A (en) * 1984-08-08 1986-03-11 Uvp, Inc. Apparatus for production of three-dimensional objects by stereolithography
US4789620A (en) * 1986-03-03 1988-12-06 Mitsubishi Rayon Co. Ltd. Liquid photosensitive resin composition containing carboxylated epoxy acrylates or methacrylates

Also Published As

Publication number Publication date
KR0163588B1 (ko) 1998-12-15
CA2028541A1 (en) 1991-04-28
EP0425441A2 (de) 1991-05-02
EP0425441A3 (de) 1991-06-26
JPH03160013A (ja) 1991-07-10
JP3243565B2 (ja) 2002-01-07
CA2028541C (en) 2000-05-16
EP0425441B1 (de) 1995-12-27
KR910008491A (ko) 1991-05-31

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: CIBA SPECIALTY CHEMICALS HOLDING INC., BASEL, CH

8327 Change in the person/name/address of the patent owner

Owner name: VANTICO AG, BASEL, CH

8339 Ceased/non-payment of the annual fee