DE3484526D1 - Verfahren zur herstellung einer halbleiteranordnung. - Google Patents
Verfahren zur herstellung einer halbleiteranordnung.Info
- Publication number
- DE3484526D1 DE3484526D1 DE8484304587T DE3484526T DE3484526D1 DE 3484526 D1 DE3484526 D1 DE 3484526D1 DE 8484304587 T DE8484304587 T DE 8484304587T DE 3484526 T DE3484526 T DE 3484526T DE 3484526 D1 DE3484526 D1 DE 3484526D1
- Authority
- DE
- Germany
- Prior art keywords
- producing
- semiconductor arrangement
- semiconductor
- arrangement
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000004519 manufacturing process Methods 0.000 title 1
- 239000004065 semiconductor Substances 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/26—Bombardment with radiation
- H01L21/263—Bombardment with radiation with high-energy radiation
- H01L21/268—Bombardment with radiation with high-energy radiation using electromagnetic radiation, e.g. laser radiation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/048—Coating on selected surface areas, e.g. using masks using irradiation by energy or particles
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0224—Electrodes
- H01L31/022408—Electrodes for devices characterised by at least one potential jump barrier or surface barrier
- H01L31/022425—Electrodes for devices characterised by at least one potential jump barrier or surface barrier for solar cells
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
- H01L31/036—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes
- H01L31/0392—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes including thin films deposited on metallic or insulating substrates ; characterised by specific substrate materials or substrate features or by the presence of intermediate layers, e.g. barrier layers, on the substrate
- H01L31/03921—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes including thin films deposited on metallic or insulating substrates ; characterised by specific substrate materials or substrate features or by the presence of intermediate layers, e.g. barrier layers, on the substrate including only elements of Group IV of the Periodic Table
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/042—PV modules or arrays of single PV cells
- H01L31/0445—PV modules or arrays of single PV cells including thin film solar cells, e.g. single thin film a-Si, CIS or CdTe solar cells
- H01L31/046—PV modules composed of a plurality of thin film solar cells deposited on the same substrate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/042—PV modules or arrays of single PV cells
- H01L31/0445—PV modules or arrays of single PV cells including thin film solar cells, e.g. single thin film a-Si, CIS or CdTe solar cells
- H01L31/046—PV modules composed of a plurality of thin film solar cells deposited on the same substrate
- H01L31/0463—PV modules composed of a plurality of thin film solar cells deposited on the same substrate characterised by special patterning methods to connect the PV cells in a module, e.g. laser cutting of the conductive or active layers
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S438/00—Semiconductor device manufacturing: process
- Y10S438/94—Laser ablative material removal
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Electromagnetism (AREA)
- Life Sciences & Earth Sciences (AREA)
- Sustainable Development (AREA)
- Chemical & Material Sciences (AREA)
- Sustainable Energy (AREA)
- High Energy & Nuclear Physics (AREA)
- Toxicology (AREA)
- Manufacturing & Machinery (AREA)
- Health & Medical Sciences (AREA)
- Organic Chemistry (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Optics & Photonics (AREA)
- Mechanical Engineering (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Photovoltaic Devices (AREA)
- Drying Of Semiconductors (AREA)
- Formation Of Insulating Films (AREA)
- Light Receiving Elements (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58121426A JPS6014441A (ja) | 1983-07-04 | 1983-07-04 | 半導体装置作製方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
DE3484526D1 true DE3484526D1 (de) | 1991-06-06 |
Family
ID=14810849
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE8484304587T Expired - Lifetime DE3484526D1 (de) | 1983-07-04 | 1984-07-04 | Verfahren zur herstellung einer halbleiteranordnung. |
Country Status (4)
Country | Link |
---|---|
US (1) | US4906491A (de) |
EP (1) | EP0130847B1 (de) |
JP (1) | JPS6014441A (de) |
DE (1) | DE3484526D1 (de) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6196774A (ja) * | 1984-10-17 | 1986-05-15 | Fuji Electric Co Ltd | 薄膜光電変換素子製造装置 |
US4697041A (en) * | 1985-02-15 | 1987-09-29 | Teijin Limited | Integrated solar cells |
FR2582446B1 (fr) * | 1985-05-24 | 1987-07-17 | Thomson Csf | Dispositif semi-conducteur photosensible et procede de fabrication d'un tel procede |
JPH0820638B2 (ja) * | 1986-08-08 | 1996-03-04 | 株式会社半導体エネルギ−研究所 | 液晶装置およびその作製方法 |
US4943710A (en) * | 1987-06-25 | 1990-07-24 | Semiconductor Energy Laboratory Co., Ltd. | Image sensor and manufacturing method for the same |
US5187601A (en) * | 1988-03-07 | 1993-02-16 | Semiconductor Energy Laboratory Co., Ltd. | Method for making a high contrast liquid crystal display including laser scribing opaque and transparent conductive strips simultaneously |
US4962057A (en) * | 1988-10-13 | 1990-10-09 | Xerox Corporation | Method of in situ photo induced evaporation enhancement of compound thin films during or after epitaxial growth |
JPH03203343A (ja) * | 1989-12-29 | 1991-09-05 | Tokyo Electron Ltd | 検査方法 |
JPH06124913A (ja) * | 1992-06-26 | 1994-05-06 | Semiconductor Energy Lab Co Ltd | レーザー処理方法 |
US5384953A (en) * | 1993-07-21 | 1995-01-31 | International Business Machines Corporation | Structure and a method for repairing electrical lines |
US7122489B2 (en) * | 2004-05-12 | 2006-10-17 | Matsushita Electric Industrial Co., Ltd. | Manufacturing method of composite sheet material using ultrafast laser pulses |
US8557683B2 (en) * | 2011-06-15 | 2013-10-15 | Applied Materials, Inc. | Multi-step and asymmetrically shaped laser beam scribing |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1244346B (de) * | 1964-10-19 | 1967-07-13 | Menzel Gerhard Glasbearbeitung | Verfahren zum Schneiden von Glas |
FR2202856B1 (de) * | 1972-10-12 | 1977-03-11 | Glaverbel | |
DE2439848C2 (de) * | 1973-08-20 | 1985-05-15 | Canon K.K., Tokio/Tokyo | Verfahren zum Aufzeichnen mittels eines Laserstrahls |
JPS5331106A (en) * | 1976-09-03 | 1978-03-24 | Hitachi Ltd | Information recording member |
US4181563A (en) * | 1977-03-31 | 1980-01-01 | Citizen Watch Company Limited | Process for forming electrode pattern on electro-optical display device |
US4292092A (en) * | 1980-06-02 | 1981-09-29 | Rca Corporation | Laser processing technique for fabricating series-connected and tandem junction series-connected solar cells into a solar battery |
US4315096A (en) * | 1980-07-25 | 1982-02-09 | Eastman Kodak Company | Integrated array of photovoltaic cells having minimized shorting losses |
FR2503457B1 (fr) * | 1981-03-31 | 1987-01-23 | Rca Corp | Systeme de cellules solaires connectees en serie sur un substrat unique |
US4473737A (en) * | 1981-09-28 | 1984-09-25 | General Electric Company | Reverse laser drilling |
US4428110A (en) * | 1981-09-29 | 1984-01-31 | Rca Corporation | Method of making an array of series connected solar cells on a single substrate |
US4472456A (en) * | 1982-11-18 | 1984-09-18 | Texas Instruments Incorporated | Absorption optimized laser annealing |
JPS59193782A (ja) * | 1983-04-18 | 1984-11-02 | Semiconductor Energy Lab Co Ltd | レ−ザ加工機 |
-
1983
- 1983-07-04 JP JP58121426A patent/JPS6014441A/ja active Granted
-
1984
- 1984-07-04 EP EP84304587A patent/EP0130847B1/de not_active Expired - Lifetime
- 1984-07-04 DE DE8484304587T patent/DE3484526D1/de not_active Expired - Lifetime
-
1988
- 1988-04-25 US US07/186,745 patent/US4906491A/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JPH0572112B2 (de) | 1993-10-08 |
EP0130847A3 (en) | 1986-04-23 |
JPS6014441A (ja) | 1985-01-25 |
EP0130847A2 (de) | 1985-01-09 |
US4906491A (en) | 1990-03-06 |
EP0130847B1 (de) | 1991-05-02 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
DE3485924D1 (de) | Verfahren zur herstellung einer halbleiterlaservorrichtung. | |
DE3483444D1 (de) | Verfahren zur herstellung eines halbleiterbauelementes. | |
DE3686315D1 (de) | Verfahren zur herstellung einer halbleiterstruktur. | |
DE3485880D1 (de) | Verfahren zur herstellung von halbleiteranordnungen. | |
DE3873146D1 (de) | Verfahren zur herstellung einer koernigen reinigungsmittelzusammensetzung. | |
DE3873145D1 (de) | Verfahren zur herstellung einer koernigen reinigungsmittelzusammensetzung. | |
DE3381880D1 (de) | Verfahren zur herstellung einer halbleiteranordnung mit einem diffusionsschritt. | |
DE3280182D1 (de) | Verfahren zur herstellung einer monokristallinen schicht. | |
DE3686125D1 (de) | Verfahren zur herstellung einer integrierten schaltung. | |
DE3486147D1 (de) | Verfahren zur herstellung von l-isoleucin. | |
DE3583183D1 (de) | Verfahren zur herstellung eines halbleitersubstrates. | |
DE3483413D1 (de) | Verfahren zur herstellung eines zusammengesetzten bauteiles. | |
AT372281B (de) | Verfahren zur herstellung einer nutriens-verbindung | |
DE3587255D1 (de) | Verfahren zur herstellung einer halbleiteranordnung mit einer wanne, z.b. einer komplementaeren halbleiteranordnung. | |
DE68907507D1 (de) | Verfahren zur herstellung einer halbleitervorrichtung. | |
DE3485087D1 (de) | Verfahren zur herstellung gekruemmter oberflaechen. | |
DE3381126D1 (de) | Verfahren zur herstellung einer monokristallinen halbleiterschicht. | |
DE3582143D1 (de) | Verfahren zur herstellung einer halbleitervorrichtung. | |
DE3481416D1 (de) | Verfahren zur herstellung von thiazolyl-2-sulfenamiden. | |
DE3485089D1 (de) | Verfahren zur herstellung von halbleitervorrichtungen. | |
DE3779802D1 (de) | Verfahren zur herstellung einer halbleiteranordnung. | |
DE3483809D1 (de) | Verfahren zur herstellung einer dielektrisch isolierten integrierten schaltung. | |
DE3484526D1 (de) | Verfahren zur herstellung einer halbleiteranordnung. | |
DE3482214D1 (de) | Verfahren zur herstellung einer silberhalogenidemulsion. | |
DE3484733D1 (de) | Verfahren zur herstellung einer dielektrisch isolierten integrierten schaltungsanordnung. |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |