DE29707686U1 - Magnethalterung für Folienmasken - Google Patents
Magnethalterung für FolienmaskenInfo
- Publication number
- DE29707686U1 DE29707686U1 DE29707686U DE29707686U DE29707686U1 DE 29707686 U1 DE29707686 U1 DE 29707686U1 DE 29707686 U DE29707686 U DE 29707686U DE 29707686 U DE29707686 U DE 29707686U DE 29707686 U1 DE29707686 U1 DE 29707686U1
- Authority
- DE
- Germany
- Prior art keywords
- carrier plate
- substrate
- substrate carrier
- mask
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000011888 foil Substances 0.000 title description 16
- 230000005291 magnetic effect Effects 0.000 title description 9
- 239000000758 substrate Substances 0.000 claims description 89
- 239000003302 ferromagnetic material Substances 0.000 claims description 3
- 239000010408 film Substances 0.000 description 18
- 239000011248 coating agent Substances 0.000 description 8
- 238000000576 coating method Methods 0.000 description 8
- 239000004033 plastic Substances 0.000 description 4
- 239000004642 Polyimide Substances 0.000 description 3
- 230000005294 ferromagnetic effect Effects 0.000 description 3
- 229920001721 polyimide Polymers 0.000 description 3
- 239000004696 Poly ether ether ketone Substances 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- JUPQTSLXMOCDHR-UHFFFAOYSA-N benzene-1,4-diol;bis(4-fluorophenyl)methanone Chemical compound OC1=CC=C(O)C=C1.C1=CC(F)=CC=C1C(=O)C1=CC=C(F)C=C1 JUPQTSLXMOCDHR-UHFFFAOYSA-N 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 229920002530 polyetherether ketone Polymers 0.000 description 2
- 229910000938 samarium–cobalt magnet Inorganic materials 0.000 description 2
- 230000008646 thermal stress Effects 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 229910000531 Co alloy Inorganic materials 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- -1 aluminum-nickel-cobalt Chemical compound 0.000 description 1
- KPLQYGBQNPPQGA-UHFFFAOYSA-N cobalt samarium Chemical compound [Co].[Sm] KPLQYGBQNPPQGA-UHFFFAOYSA-N 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 239000000696 magnetic material Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000000284 resting effect Effects 0.000 description 1
- 238000007493 shaping process Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Chemical Vapour Deposition (AREA)
Description
30
bolzen gewährleistet.
5
Claims (10)
30
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE29707686U DE29707686U1 (de) | 1997-04-28 | 1997-04-28 | Magnethalterung für Folienmasken |
JP10747898A JPH10317139A (ja) | 1997-04-28 | 1998-04-17 | 金属箔マスク用磁力保持装置 |
TW087105880A TW376332B (en) | 1997-04-28 | 1998-04-17 | Magnet supporter for the foil mask |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE29707686U DE29707686U1 (de) | 1997-04-28 | 1997-04-28 | Magnethalterung für Folienmasken |
Publications (1)
Publication Number | Publication Date |
---|---|
DE29707686U1 true DE29707686U1 (de) | 1997-06-26 |
Family
ID=8039673
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE29707686U Expired - Lifetime DE29707686U1 (de) | 1997-04-28 | 1997-04-28 | Magnethalterung für Folienmasken |
Country Status (3)
Country | Link |
---|---|
JP (1) | JPH10317139A (de) |
DE (1) | DE29707686U1 (de) |
TW (1) | TW376332B (de) |
Cited By (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2000037707A1 (de) * | 1998-12-21 | 2000-06-29 | Uhp Corporation | Ortsselektive oberflächenbehandlung mit magnetischer maskenhalterung |
EP1209522A2 (de) | 2000-11-28 | 2002-05-29 | Lg Electronics Inc. | Maske zur herstellung von Bildschirmen |
DE10232821A1 (de) * | 2002-07-12 | 2004-01-29 | Domorazek, Gottfried, Dr.-Ing.habil. | Verfahren zum Herstellen von Sensoren zum elektrischen Messsen der Füllstandshöhe sowie Einrichtung zum Herstellen solcher Sensoren |
DE102004034418A1 (de) * | 2004-07-15 | 2006-02-16 | Schott Ag | Verfahren zur Herstellung struktuierter optischer Filterschichten auf Substraten |
WO2006020006A1 (en) * | 2004-07-16 | 2006-02-23 | Applied Materials, Inc. | Shadow frame with mask panels |
EP2159303A2 (de) * | 2002-02-14 | 2010-03-03 | 3M Innovative Properties Company | Lochmasken zur Herstellung von Schaltungen |
DE102008037387A1 (de) * | 2008-09-24 | 2010-03-25 | Aixtron Ag | Verfahren sowie Vorrichtung zum Abscheiden lateral strukturierter Schichten mittels einer magnetisch auf einem Substrathalter gehaltenen Schattenmaske |
US8361230B2 (en) | 2005-04-20 | 2013-01-29 | Applied Materials Gmbh & Co. Kg | Magnetic mask holder |
WO2016109975A1 (en) * | 2015-01-09 | 2016-07-14 | Applied Materials,Inc. | Method for coating thin metal substrates using pulsed or combustion coating processes |
US10916464B1 (en) | 2019-07-26 | 2021-02-09 | Applied Materials, Inc. | Method of pre aligning carrier, wafer and carrier-wafer combination for throughput efficiency |
US11196360B2 (en) | 2019-07-26 | 2021-12-07 | Applied Materials, Inc. | System and method for electrostatically chucking a substrate to a carrier |
US11756816B2 (en) | 2019-07-26 | 2023-09-12 | Applied Materials, Inc. | Carrier FOUP and a method of placing a carrier |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW490714B (en) * | 1999-12-27 | 2002-06-11 | Semiconductor Energy Lab | Film formation apparatus and method for forming a film |
JP3651432B2 (ja) * | 2001-09-25 | 2005-05-25 | セイコーエプソン株式会社 | マスク及びその製造方法並びにエレクトロルミネッセンス装置の製造方法 |
KR100463532B1 (ko) * | 2002-10-22 | 2004-12-29 | 엘지전자 주식회사 | 대면적 풀-컬러 디스플레이 패널의 제작방법 |
JP4795842B2 (ja) * | 2006-04-26 | 2011-10-19 | 日本冶金工業株式会社 | 蒸着用治具 |
JP5157700B2 (ja) * | 2007-07-25 | 2013-03-06 | セイコーエプソン株式会社 | 時計用文字板、時計用文字板の製造方法、および、時計 |
JP5941971B2 (ja) * | 2014-12-10 | 2016-06-29 | 東京エレクトロン株式会社 | リング状シールド部材及びリング状シールド部材を備えた基板載置台 |
CN110100043B (zh) | 2017-10-24 | 2021-09-03 | 株式会社爱发科 | 基板处理装置及支撑销 |
-
1997
- 1997-04-28 DE DE29707686U patent/DE29707686U1/de not_active Expired - Lifetime
-
1998
- 1998-04-17 JP JP10747898A patent/JPH10317139A/ja not_active Withdrawn
- 1998-04-17 TW TW087105880A patent/TW376332B/zh not_active IP Right Cessation
Cited By (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2000037707A1 (de) * | 1998-12-21 | 2000-06-29 | Uhp Corporation | Ortsselektive oberflächenbehandlung mit magnetischer maskenhalterung |
EP1209522A2 (de) | 2000-11-28 | 2002-05-29 | Lg Electronics Inc. | Maske zur herstellung von Bildschirmen |
EP2159303A2 (de) * | 2002-02-14 | 2010-03-03 | 3M Innovative Properties Company | Lochmasken zur Herstellung von Schaltungen |
EP2159303A3 (de) * | 2002-02-14 | 2010-09-29 | 3M Innovative Properties Company | Lochmasken zur Herstellung von Schaltungen |
DE10232821A1 (de) * | 2002-07-12 | 2004-01-29 | Domorazek, Gottfried, Dr.-Ing.habil. | Verfahren zum Herstellen von Sensoren zum elektrischen Messsen der Füllstandshöhe sowie Einrichtung zum Herstellen solcher Sensoren |
DE10232821B4 (de) * | 2002-07-12 | 2006-06-14 | Domorazek, Gottfried, Dr.-Ing.habil. | Verfahren zum Herstellen von Sensoren zum elektrischen Messen der Füllstandshöhe sowie Einrichtung zum Herstellen solcher Sensoren |
DE102004034418A1 (de) * | 2004-07-15 | 2006-02-16 | Schott Ag | Verfahren zur Herstellung struktuierter optischer Filterschichten auf Substraten |
DE102004034418B4 (de) * | 2004-07-15 | 2009-06-25 | Schott Ag | Verfahren zur Herstellung struktuierter optischer Filterschichten auf Substraten |
WO2006020006A1 (en) * | 2004-07-16 | 2006-02-23 | Applied Materials, Inc. | Shadow frame with mask panels |
US8361230B2 (en) | 2005-04-20 | 2013-01-29 | Applied Materials Gmbh & Co. Kg | Magnetic mask holder |
DE102008037387A1 (de) * | 2008-09-24 | 2010-03-25 | Aixtron Ag | Verfahren sowie Vorrichtung zum Abscheiden lateral strukturierter Schichten mittels einer magnetisch auf einem Substrathalter gehaltenen Schattenmaske |
US20110174217A1 (en) * | 2008-09-24 | 2011-07-21 | Markus Gersdorff | Shadow mask held magnetically on a substrate support |
US9045818B2 (en) * | 2008-09-24 | 2015-06-02 | Aixtron Se | Shadow mask held magnetically on a substrate support |
WO2016109975A1 (en) * | 2015-01-09 | 2016-07-14 | Applied Materials,Inc. | Method for coating thin metal substrates using pulsed or combustion coating processes |
US10916464B1 (en) | 2019-07-26 | 2021-02-09 | Applied Materials, Inc. | Method of pre aligning carrier, wafer and carrier-wafer combination for throughput efficiency |
US11183411B2 (en) | 2019-07-26 | 2021-11-23 | Applied Materials, Inc. | Method of pre aligning carrier, wafer and carrier-wafer combination for throughput efficiency |
US11196360B2 (en) | 2019-07-26 | 2021-12-07 | Applied Materials, Inc. | System and method for electrostatically chucking a substrate to a carrier |
US11756816B2 (en) | 2019-07-26 | 2023-09-12 | Applied Materials, Inc. | Carrier FOUP and a method of placing a carrier |
Also Published As
Publication number | Publication date |
---|---|
TW376332B (en) | 1999-12-11 |
JPH10317139A (ja) | 1998-12-02 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
R207 | Utility model specification |
Effective date: 19970807 |
|
R150 | Utility model maintained after payment of first maintenance fee after three years |
Effective date: 20000623 |
|
R081 | Change of applicant/patentee |
Owner name: UNAXIS DEUTSCHLAND VERTRIEBS GMBH, DE Free format text: FORMER OWNER: BALZERS PROZESS SYSTEME VERTRIEBS- UND SERVICE GMBH, 81476 MUENCHEN, DE Effective date: 20001219 |
|
R151 | Utility model maintained after payment of second maintenance fee after six years |
Effective date: 20030522 |
|
R081 | Change of applicant/patentee |
Owner name: UNAXIS DEUTSCHLAND VERTRIEBS GMBH, DE Free format text: FORMER OWNER: UNAXIS DEUTSCHLAND VERTRIEBS GMBH, 81476 MUENCHEN, DE Effective date: 20040506 |
|
R152 | Utility model maintained after payment of third maintenance fee after eight years |
Effective date: 20050506 |
|
R071 | Expiry of right |