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DE2007627C3 - - Google Patents

Info

Publication number
DE2007627C3
DE2007627C3 DE2007627A DE2007627A DE2007627C3 DE 2007627 C3 DE2007627 C3 DE 2007627C3 DE 2007627 A DE2007627 A DE 2007627A DE 2007627 A DE2007627 A DE 2007627A DE 2007627 C3 DE2007627 C3 DE 2007627C3
Authority
DE
Germany
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE2007627A
Other versions
DE2007627B2 (de
DE2007627A1 (de
Inventor
Tegze Dipl.-Ing. Haraszti
Rainer Dipl.-Phys. Grosholz
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Licentia Patent Verwaltungs GmbH
Original Assignee
Licentia Patent Verwaltungs GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Licentia Patent Verwaltungs GmbH filed Critical Licentia Patent Verwaltungs GmbH
Priority to DE19702007627 priority Critical patent/DE2007627B2/de
Priority to JP45118458A priority patent/JPS504555B1/ja
Priority to US00116494A priority patent/US3788904A/en
Priority to GB20053/71A priority patent/GB1291682A/en
Publication of DE2007627A1 publication Critical patent/DE2007627A1/de
Publication of DE2007627B2 publication Critical patent/DE2007627B2/de
Application granted granted Critical
Publication of DE2007627C3 publication Critical patent/DE2007627C3/de
Granted legal-status Critical Current

Links

Classifications

    • H01L27/0727
DE19702007627 1970-02-19 1970-02-19 Verfahren zum herstellen einer integrierten halbleiterschaltung Granted DE2007627B2 (de)

Priority Applications (4)

Application Number Priority Date Filing Date Title
DE19702007627 DE2007627B2 (de) 1970-02-19 1970-02-19 Verfahren zum herstellen einer integrierten halbleiterschaltung
JP45118458A JPS504555B1 (de) 1970-02-19 1970-12-24
US00116494A US3788904A (en) 1970-02-19 1971-02-18 Method of producing an integrated solid state circuit
GB20053/71A GB1291682A (en) 1970-02-19 1971-04-19 Method of producing an integrated solid-state circuit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19702007627 DE2007627B2 (de) 1970-02-19 1970-02-19 Verfahren zum herstellen einer integrierten halbleiterschaltung

Publications (3)

Publication Number Publication Date
DE2007627A1 DE2007627A1 (de) 1971-09-02
DE2007627B2 DE2007627B2 (de) 1973-03-22
DE2007627C3 true DE2007627C3 (de) 1973-10-11

Family

ID=5762721

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19702007627 Granted DE2007627B2 (de) 1970-02-19 1970-02-19 Verfahren zum herstellen einer integrierten halbleiterschaltung

Country Status (4)

Country Link
US (1) US3788904A (de)
JP (1) JPS504555B1 (de)
DE (1) DE2007627B2 (de)
GB (1) GB1291682A (de)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1357515A (en) * 1972-03-10 1974-06-26 Matsushita Electronics Corp Method for manufacturing an mos integrated circuit
JPS5410228B2 (de) * 1973-08-20 1979-05-02
US4449224A (en) * 1980-12-29 1984-05-15 Eliyahou Harari Dynamic merged load logic (MLL) and merged load memory (MLM)
JPS5994453A (ja) * 1982-10-25 1984-05-31 ゼネラル・エレクトリック・カンパニイ オン抵抗を低減した高圧半導体デバイス
DE3408285A1 (de) * 1984-03-07 1985-09-19 Telefunken electronic GmbH, 7100 Heilbronn Schutzanordnung fuer einen feldeffekttransistor
US4694313A (en) * 1985-02-19 1987-09-15 Harris Corporation Conductivity modulated semiconductor structure
JPH0760854B2 (ja) * 1985-08-30 1995-06-28 株式会社日立製作所 一方向導通形スイツチング回路
US4989058A (en) * 1985-11-27 1991-01-29 North American Philips Corp. Fast switching lateral insulated gate transistors
US5010034A (en) * 1989-03-07 1991-04-23 National Semiconductor Corporation CMOS and bipolar fabrication process using selective epitaxial growth scalable to below 0.5 micron
WO1994005042A1 (en) * 1992-08-14 1994-03-03 International Business Machines Corporation Mos device having protection against electrostatic discharge

Also Published As

Publication number Publication date
US3788904A (en) 1974-01-29
GB1291682A (en) 1972-10-04
JPS504555B1 (de) 1975-02-20
DE2007627B2 (de) 1973-03-22
DE2007627A1 (de) 1971-09-02

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Legal Events

Date Code Title Description
C3 Grant after two publication steps (3rd publication)
E771 Valid patent as to the heymanns-index 1977, willingness to grant licences
EHJ Ceased/non-payment of the annual fee