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DE19983134T1 - Induktionsspulenanordnung - Google Patents

Induktionsspulenanordnung

Info

Publication number
DE19983134T1
DE19983134T1 DE19983134T DE19983134T DE19983134T1 DE 19983134 T1 DE19983134 T1 DE 19983134T1 DE 19983134 T DE19983134 T DE 19983134T DE 19983134 T DE19983134 T DE 19983134T DE 19983134 T1 DE19983134 T1 DE 19983134T1
Authority
DE
Germany
Prior art keywords
induction coil
coil arrangement
arrangement
induction
coil
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
DE19983134T
Other languages
English (en)
Other versions
DE19983134B4 (de
Inventor
Paul George Bennett
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Aviza Europe Ltd
Original Assignee
Aviza Europe Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Aviza Europe Ltd filed Critical Aviza Europe Ltd
Publication of DE19983134T1 publication Critical patent/DE19983134T1/de
Application granted granted Critical
Publication of DE19983134B4 publication Critical patent/DE19983134B4/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Plasma Technology (AREA)
  • Cleaning In General (AREA)
DE19983134T 1998-12-17 1999-12-16 Induktionsspulenanordnung Expired - Lifetime DE19983134B4 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
GB9827778.3 1998-12-17
GB9827778A GB2344930B (en) 1998-12-17 1998-12-17 Inductive coil assembly
PCT/GB1999/004280 WO2000036632A2 (en) 1998-12-17 1999-12-16 Inductive coil assembly

Publications (2)

Publication Number Publication Date
DE19983134T1 true DE19983134T1 (de) 2002-07-25
DE19983134B4 DE19983134B4 (de) 2007-08-16

Family

ID=10844397

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19983134T Expired - Lifetime DE19983134B4 (de) 1998-12-17 1999-12-16 Induktionsspulenanordnung

Country Status (4)

Country Link
US (1) US6495963B1 (de)
DE (1) DE19983134B4 (de)
GB (2) GB2387023B (de)
WO (1) WO2000036632A2 (de)

Families Citing this family (36)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6237526B1 (en) * 1999-03-26 2001-05-29 Tokyo Electron Limited Process apparatus and method for improving plasma distribution and performance in an inductively coupled plasma
US6474258B2 (en) 1999-03-26 2002-11-05 Tokyo Electron Limited Apparatus and method for improving plasma distribution and performance in an inductively coupled plasma
US6507155B1 (en) 2000-04-06 2003-01-14 Applied Materials Inc. Inductively coupled plasma source with controllable power deposition
JP2002008996A (ja) 2000-06-23 2002-01-11 Mitsubishi Heavy Ind Ltd 給電アンテナ及び給電方法
US6494998B1 (en) 2000-08-30 2002-12-17 Tokyo Electron Limited Process apparatus and method for improving plasma distribution and performance in an inductively coupled plasma using an internal inductive element
WO2002084698A1 (en) * 2001-04-13 2002-10-24 Applied Materials, Inc. Inductively coupled plasma source with controllable power distribution
US7298091B2 (en) * 2002-02-01 2007-11-20 The Regents Of The University Of California Matching network for RF plasma source
KR100486724B1 (ko) * 2002-10-15 2005-05-03 삼성전자주식회사 사행 코일 안테나를 구비한 유도결합 플라즈마 발생장치
US7511246B2 (en) * 2002-12-12 2009-03-31 Perkinelmer Las Inc. Induction device for generating a plasma
EP1480250A1 (de) * 2003-05-22 2004-11-24 HELYSSEN S.à.r.l. Plasmareaktor für Plasmen hoher Dichte, und RF-Antenne für diesen Reaktor
US7273533B2 (en) * 2003-11-19 2007-09-25 Tokyo Electron Limited Plasma processing system with locally-efficient inductive plasma coupling
US7094313B2 (en) * 2004-04-21 2006-08-22 Applied Materials, Inc. Universal mid-frequency matching network
KR100716720B1 (ko) * 2004-10-13 2007-05-09 에이피티씨 주식회사 비원형의 플라즈마 소스코일
US20060105114A1 (en) * 2004-11-16 2006-05-18 White John M Multi-layer high quality gate dielectric for low-temperature poly-silicon TFTs
US20070080141A1 (en) * 2005-10-07 2007-04-12 Applied Materials, Inc. Low-voltage inductively coupled source for plasma processing
US20080118663A1 (en) * 2006-10-12 2008-05-22 Applied Materials, Inc. Contamination reducing liner for inductively coupled chamber
US20080156264A1 (en) * 2006-12-27 2008-07-03 Novellus Systems, Inc. Plasma Generator Apparatus
TWI440405B (zh) * 2007-10-22 2014-06-01 New Power Plasma Co Ltd 電容式耦合電漿反應器
US9591738B2 (en) * 2008-04-03 2017-03-07 Novellus Systems, Inc. Plasma generator systems and methods of forming plasma
US8916022B1 (en) 2008-09-12 2014-12-23 Novellus Systems, Inc. Plasma generator systems and methods of forming plasma
CN203409418U (zh) * 2010-05-05 2014-01-29 珀金埃尔默健康科学股份有限公司 感应装置和使用感应装置的低流动等离子体
JP5851682B2 (ja) * 2010-09-28 2016-02-03 東京エレクトロン株式会社 プラズマ処理装置
US8333166B2 (en) * 2011-05-04 2012-12-18 Nordson Corporation Plasma treatment systems and methods for uniformly distributing radiofrequency power between multiple electrodes
US10388493B2 (en) * 2011-09-16 2019-08-20 Lam Research Corporation Component of a substrate support assembly producing localized magnetic fields
US9928987B2 (en) * 2012-07-20 2018-03-27 Applied Materials, Inc. Inductively coupled plasma source with symmetrical RF feed
CA2900492C (en) * 2013-02-11 2022-03-01 The Regents Of The University Of California Fractional turn coil winding
GB201309583D0 (en) 2013-05-29 2013-07-10 Spts Technologies Ltd Apparatus for processing a semiconductor workpiece
JP6178759B2 (ja) * 2014-07-08 2017-08-09 日本電産サンキョー株式会社 カードリーダ
US10672596B2 (en) * 2016-03-28 2020-06-02 Tokyo Electron Limited Ionized physical vapor deposition (IPVD) apparatus and method for an inductively coupled plasma sweeping source
US10541114B2 (en) * 2016-11-03 2020-01-21 En2Core Technology, Inc. Inductive coil structure and inductively coupled plasma generation system
US10903046B2 (en) * 2016-11-03 2021-01-26 En2Core Technology, Inc. Inductive coil structure and inductively coupled plasma generation system
US10896806B2 (en) * 2016-11-03 2021-01-19 En2Core Technology, Inc. Inductive coil structure and inductively coupled plasma generation system
RU2643167C1 (ru) * 2017-02-22 2018-01-31 Российская Федерация, от имени которой выступает Государственная корпорация по атомной энергии "Росатом" (Госкорпорация "Росатом") Прецизионный многопроволочный лайнер
GB201813451D0 (en) * 2018-08-17 2018-10-03 Spts Technologies Ltd Plasma apparatus
US11532455B2 (en) * 2018-12-31 2022-12-20 En2Core Technology, Inc. Plasma generating apparatus and method for operating same
JP7489894B2 (ja) * 2020-10-20 2024-05-24 東京エレクトロン株式会社 プラズマ生成装置、プラズマ処理装置及びプラズマ処理方法

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5231334A (en) * 1992-04-15 1993-07-27 Texas Instruments Incorporated Plasma source and method of manufacturing
US5401350A (en) * 1993-03-08 1995-03-28 Lsi Logic Corporation Coil configurations for improved uniformity in inductively coupled plasma systems
GB9321489D0 (en) * 1993-10-19 1993-12-08 Central Research Lab Ltd Plasma processing
DE4403125A1 (de) * 1994-02-02 1995-08-03 Fraunhofer Ges Forschung Vorrichtung zur Plasmaerzeugung
JPH0850998A (ja) * 1994-08-04 1996-02-20 Kokusai Electric Co Ltd プラズマ処理装置
JP3105403B2 (ja) * 1994-09-14 2000-10-30 松下電器産業株式会社 プラズマ処理装置
US5919382A (en) * 1994-10-31 1999-07-06 Applied Materials, Inc. Automatic frequency tuning of an RF power source of an inductively coupled plasma reactor
US5589737A (en) * 1994-12-06 1996-12-31 Lam Research Corporation Plasma processor for large workpieces
JP3104117B2 (ja) * 1995-01-13 2000-10-30 松下電器産業株式会社 プラズマ処理装置およびその方法
WO1997016946A2 (en) * 1995-10-31 1997-05-09 Arakhne Technology Inc Uniform plasma generation, filter, and neutralization apparatus and method
US5846883A (en) * 1996-07-10 1998-12-08 Cvc, Inc. Method for multi-zone high-density inductively-coupled plasma generation
JP2929275B2 (ja) * 1996-10-16 1999-08-03 株式会社アドテック 透磁コアを有する誘導結合型−平面状プラズマの発生装置
JP3955351B2 (ja) * 1996-12-27 2007-08-08 キヤノンアネルバ株式会社 プラズマ処理装置

Also Published As

Publication number Publication date
GB0315895D0 (en) 2003-08-13
WO2000036632A3 (en) 2002-10-17
GB2344930A (en) 2000-06-21
GB2387023A (en) 2003-10-01
GB9827778D0 (en) 1999-02-10
GB2344930B (en) 2003-10-01
GB2387023B (en) 2003-12-03
US6495963B1 (en) 2002-12-17
WO2000036632A2 (en) 2000-06-22
DE19983134B4 (de) 2007-08-16

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Legal Events

Date Code Title Description
8110 Request for examination paragraph 44
8364 No opposition during term of opposition
R071 Expiry of right