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DE19708149A1 - Electrodeless discharge tube containing mercury and noble gas mixture - Google Patents

Electrodeless discharge tube containing mercury and noble gas mixture

Info

Publication number
DE19708149A1
DE19708149A1 DE1997108149 DE19708149A DE19708149A1 DE 19708149 A1 DE19708149 A1 DE 19708149A1 DE 1997108149 DE1997108149 DE 1997108149 DE 19708149 A DE19708149 A DE 19708149A DE 19708149 A1 DE19708149 A1 DE 19708149A1
Authority
DE
Germany
Prior art keywords
gas mixture
containing mercury
mercury
quartz glass
tight
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
DE1997108149
Other languages
German (de)
Inventor
Andreas Dr Meyer
Steffen Dipl Ing Johne
Heido Dipl Ing Herrmann
Dietrich Dr Birus
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
UMEX GES fur UMWELTBERATUNG U
Original Assignee
UMEX GES fur UMWELTBERATUNG U
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by UMEX GES fur UMWELTBERATUNG U filed Critical UMEX GES fur UMWELTBERATUNG U
Priority to DE1997108149 priority Critical patent/DE19708149A1/en
Publication of DE19708149A1 publication Critical patent/DE19708149A1/en
Withdrawn legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00Treatment of water, waste water, or sewage
    • C02F1/30Treatment of water, waste water, or sewage by irradiation
    • C02F1/32Treatment of water, waste water, or sewage by irradiation with ultraviolet light
    • C02F1/325Irradiation devices or lamp constructions
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D53/00Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/007Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by irradiation
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J19/12Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electromagnetic waves
    • B01J19/122Incoherent waves
    • B01J19/123Ultraviolet light
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J19/12Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electromagnetic waves
    • B01J19/122Incoherent waves
    • B01J19/123Ultraviolet light
    • B01J19/124Ultraviolet light generated by microwave irradiation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J61/00Gas-discharge or vapour-discharge lamps
    • H01J61/02Details
    • H01J61/30Vessels; Containers
    • H01J61/32Special longitudinal shape, e.g. for advertising purposes
    • H01J61/325U-shaped lamps
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J65/00Lamps without any electrode inside the vessel; Lamps with at least one main electrode outside the vessel
    • H01J65/04Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels
    • H01J65/042Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels by an external electromagnetic field
    • H01J65/048Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels by an external electromagnetic field the field being produced by using an excitation coil
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D2259/00Type of treatment
    • B01D2259/80Employing electric, magnetic, electromagnetic or wave energy, or particle radiation
    • B01D2259/804UV light
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2201/00Apparatus for treatment of water, waste water or sewage
    • C02F2201/32Details relating to UV-irradiation devices
    • C02F2201/322Lamp arrangement
    • C02F2201/3223Single elongated lamp located on the central axis of a turbular reactor

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Electromagnetism (AREA)
  • General Health & Medical Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Plasma & Fusion (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Water Supply & Treatment (AREA)
  • Hydrology & Water Resources (AREA)
  • Analytical Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Discharge Lamps And Accessories Thereof (AREA)

Abstract

The mercury tube subjects liquids and gases to ultraviolet (UV) irradiation has a sealed discharge chamber in quartz, filled with a mixture containing mercury and noble gases. High frequency electromagnetic energy causing plasma discharge is coupled into the tube, avoiding use of internal electrodes. In the improved apparatus, the quartz body is a lengthy, double-walled glass vessel (1) in U-shaped ring configuration. In the space surrounded by the double-walled vessel, there is a support (2) made of UV-resistant material, carrying a component of a high frequency (HF) oscillation circuit.

Description

Die Erfindung betrifft eine Vorrichtung zur UV-Bestrahlung von Flüssig­ keiten und Gasen mit einem gasdicht nach außen abgeschlossen und mit einem Quecksilber-Edelgas-Gemisch gefüllten Entladungsraum, der von einem Quarzglaskörper gebildet wird und in den elektrodenlos HF-Energie für die Plasmaentladung eingekoppelt wird.The invention relates to a device for UV irradiation of liquid and gas with a gas-tight seal to the outside and with a discharge space filled with mercury-noble gas, which by a quartz glass body is formed and in the electrodeless RF energy for the plasma discharge.

Die Vorrichtung dient zur UV-Bestrahlung strömender und nichtströmen­ der Flüssigkeiten und Gase. Sie kann ohne technische Umrüstungen gegen vorhandene UV-Strahler in Wasser- und Abwasserbehandlungsanlagen ausgetauscht werden.The device is used for UV radiation flowing and non-flowing of liquids and gases. It can be used without any technical modifications existing UV lamps in water and wastewater treatment plants be replaced.

In der Umweltschutztechnik werden häufig Flüssigkeiten und Gase durch UV-Bestrahlung behandelt.Liquids and gases are often used in environmental protection technology Treated with UV radiation.

Es ist im Stand der Technik bekannt, zum Reinigen und Entkeimen von Flüssigkeiten und Gasen UV-Strahler einzusetzen. Bei den bekannten Vorrichtungen werden im allgemeinen hierfür stabförmige UV-Strahler eingesetzt, bei denen die elektrische Energie über an den Stirnflächen angebrachte Elektroden im Inneren des Ladungsraumes eingespeist wird.It is known in the prior art for cleaning and sterilizing Use liquids and gases with UV lamps. With the known Devices are generally rod-shaped UV lamps for this used where the electrical energy is on the end faces attached electrodes is fed inside the cargo space.

Dabei ist nachteilig, daß die für die Einspeisung maximal mögliche Leistung durch die Elektroden und Geometrie des Entladungsraumes begrenzt wird. Die Lebensdauer eines derartigen Strahlers wird durch die verwendeten Elektroden auf maximal zehntausend Stunden begrenzt. Ferner ist nachteilig, daß chemische Reaktionen der in den Entladungsräu­ men vorhandenen Gase mit dem Elektrodenmaterial durch entsprechende Werkstoffwahl ausgeschlossen werden müssen. Dadurch können nur bestimmte Gase und Gasgemische für die Entladung zur Strahlungserzeu­ gung verwendet werden. Die Erzeugung von Spektren mit beliebiger Zusammensetzung und Wellenlängenverteilung wird dann stark einge­ schränkt.It is disadvantageous that the maximum possible for the feed Power through the electrodes and geometry of the discharge space  is limited. The lifespan of such a radiator is determined by used electrodes limited to a maximum of ten thousand hours. A further disadvantage is that chemical reactions in the discharge space existing gases with the electrode material by appropriate Choice of materials must be excluded. This can only certain gases and gas mixtures for the discharge to generate radiation be used. The generation of spectra with any The composition and wavelength distribution is then strongly incorporated limits.

Im Stand der Technik ist es auch bekannt, für die Strahlungserzeugung elektrodenlose Strahler zu verwenden. Bei diesen Strahlern wird ein hochfrequentes elektromagnetisches Feld eingekoppelt. Die Einkopplung erfolgt bei den bekannten Anordnungen auf induktiven Wege mit Hilfe einer Ferrittspule oder durch Mikrowellen.It is also known in the prior art for the generation of radiation to use electrodeless spotlights. With these spotlights is a high-frequency electromagnetic field coupled. The coupling takes place in the known arrangements by inductive means a ferrite coil or by microwaves.

Bei den bekannten elektrodenlosen Strahlern ist nachteilig, daß vorhandene Wasser- und Abwasseraufbereitungssysteme, die mit stabförmigen Strah­ lern ausgerüstet sind, nicht mit elektrodenlos angeregten Strahlern nachge­ rüstet werden können.In the known electrodeless radiators it is disadvantageous that existing ones Water and wastewater treatment systems using rod-shaped jets learners are not equipped with electrodelessly excited emitters can be equipped.

Der Erfindung liegt die Aufgabe zugrunde, eine Vorrichtung der eingangs genannten Art anzugeben, die es gestattet, vorhandene Systeme der Wasser- und Abwasserbehandlung ohne konstruktive Änderungen durch UV-Strah­ ler mit elektrodenloser Anregung austauschen zu können. The invention has for its object a device of the beginning specified type, which allows existing systems of water and wastewater treatment without structural changes due to UV rays to be able to exchange with electrodeless excitation.  

Erfindungsgemäß wird die Aufgabe dadurch gelöst, daß der Quarzglaskör­ per aus einem langgestreckten Doppelmantelgefäß besteht, das in Form eines U-förmigen Ringes ausgebildet ist, wobei sich in dem von dem Doppelmantelgefäß umschlossenen Raum ein Trägerelement aus strah­ lungsbeständigem Material befindet, auf dem ein Teilelement eines HF-Schwingkreises angeordnet ist.According to the invention the object is achieved in that the quartz glass body per consists of an elongated double jacket vessel that is in shape a U-shaped ring is formed, in which of the Double-walled vessel enclosed space a beam element from beam resilient material is on which a sub-element of a HF resonant circuit is arranged.

Vorteilhafte Ausgestaltungen der erfindungsgemäßen Anordnung sind in den Unteransprüchen angegeben.Advantageous embodiments of the arrangement according to the invention are shown in specified in the subclaims.

Ein wesentlicher Bestandteil der Vorrichtung ist der langgestreckte Quarz­ glaskörper, der den Raum für die Plasmaentladung umschließt. Die Einkopplung der HF-Energie erfolgt vorzugsweise induktiv über eine oder mehrere HF-Spulen. Es ist jedoch auch möglich, die HF-Energie durch eine kapazitive Anordnung einzukoppeln.An essential component of the device is the elongated quartz vitreous body that encloses the space for the plasma discharge. The The RF energy is preferably coupled inductively via or several RF coils. However, it is also possible to use an RF energy coupling capacitive arrangement.

Die Erfindung wird im folgenden anhand eines Ausführungsbeispieles näher erläutert. In der zugehörigen Zeichnung zeigen:The invention is described below using an exemplary embodiment explained in more detail. In the accompanying drawing:

Fig. 1 einen Schnitt durch die erfindungsgemäße Vorrichtung und Fig. 1 shows a section through the device according to the invention and

Fig. 2 die Einzelheiten der Gestaltung der erfindungsgemäßen Vorrichtung im unteren sowie im oberen Bereich in einer abgebroche­ nen Darstellung. Fig. 2 shows the details of the design of the device according to the invention in the lower and in the upper area in a broken-off representation.

Das aus Quarzglas gefertigte Doppelmantelgefäß 1 schließt den ringförmi­ gen Entladungsraum nach außen gasdicht ab. Im Inneren des Entladungs­ raumes befindet sich ein Quecksilber-Edelgas-Gemisch. Der im Inneren dieses ringförmigen Raumes bestehende Hohlraum nimmt den Spulenträger 2 auf. Der Spulenträger 2 ist aus einem geeigneten strahlungsbeständigen Material, wie PTFE oder Keramik hergestellt. Auf dem Spulenträger 2 ist eine Spule 3 aufgebracht. Die Spule 3 kann aufgedampft oder aufgewickelt sein. Die Spule 3 ist elektrisch in einen hier nicht dargestellten HF-Schwingkreis einbezogen. Über die Anschlüsse 4 werden die elektri­ schen Kontakte hergestellt. Die Anordnung kann mit Hilfe der Verschrau­ bung 5 gas- bzw. flüssigkeitsdicht in einen Reaktor eingeschraubt werden. Hierzu ist im oberen Bereich der Vorrichtung das äußere ringförmige Teil des Doppelmantelgefäßes 1 weiter nach oben geführt und mit der Verschraubung 5 gasdicht verschlossen. The double-walled vessel 1 made of quartz glass closes the annular discharge space from the outside in a gas-tight manner. A mercury-noble gas mixture is located inside the discharge space. The cavity existing in the interior of this annular space accommodates the coil carrier 2 . The coil carrier 2 is made of a suitable radiation-resistant material, such as PTFE or ceramic. A coil 3 is applied to the coil carrier 2 . The coil 3 can be evaporated or wound up. The coil 3 is electrically included in an RF resonant circuit, not shown here. The electrical contacts are made via the connections 4 . The arrangement can be screwed into a reactor in a gas-tight or liquid-tight manner using the screw connection 5 . For this purpose, in the upper area of the device, the outer annular part of the double jacket vessel 1 is guided upward and sealed gas-tight with the screw 5 .

BezugszeichenlisteReference list

11

Doppelmantelgefäß
Double jacket vessel

22nd

Spulenträger
Coil carrier

33rd

Spule
Kitchen sink

44th

elektrische Anschlüsse
electrical connections

55

Verschraubung
Screw connection

Claims (3)

1. Vorrichtung zur UV-Bestrahlung von Flüssigkeiten und Gasen mit einem gasdicht nach außen abgeschlossen und mit einem Quecksilber-Edelgas-Gemisch gefüllten Entladungsraum, der von einem Quarzglaskörper gebil­ det wird und in den elektrodenlos HF-Energie für die Plasmaentladung eingekoppelt wird, dadurch gekennzeichnet, daß der Quarzglaskörper aus einem langgestreckten Doppelmantelgefäß (1) besteht, das in Form eines U-förmigen Ringes ausgebildet ist, wobei sich in dem von dem Doppel­ mantelgefäß (1) umschlossenen Raum ein Trägerelement (2) aus strah­ lungsbeständigem Material befindet, auf dem ein Teilelement eines HF-Schwingkreises angeordnet ist.1. Device for UV radiation of liquids and gases sealed with a gas-tight to the outside and filled with a mercury-inert gas mixture discharge chamber, which is formed by a quartz glass body and is coupled into the electrodeless RF energy for the plasma discharge, characterized That the quartz glass body consists of an elongated double jacket vessel ( 1 ) which is designed in the form of a U-shaped ring, wherein in the space enclosed by the double jacket vessel ( 1 ) there is a carrier element ( 2 ) made of radiation-resistant material on which a sub-element of an RF resonant circuit is arranged. 2. Vorrichtung nach Anspruch 1, dadurch gekennzeichnet, daß das Trägerelement als Spulenkörper ausgebildet ist, an dem eine Spule angebracht ist, die in einem HF-Schwingkreis geschaltet ist.2. Device according to claim 1, characterized in that the Carrier element is designed as a coil former on which a coil attached, which is connected in an RF resonant circuit. 3. Vorrichtung nach Anspruch 1 oder 2, dadurch gekennzeichnet, daß der Quarzglaskörper (1) an einem Ende mit einer Verschraubung (5) versehen ist, mit der die Vorrichtung gas- oder flüssigkeitsdicht in einen Reaktor eingeschraubt werden kann.3. Device according to claim 1 or 2, characterized in that the quartz glass body ( 1 ) is provided at one end with a screw ( 5 ) with which the device can be screwed into a reactor in a gas-tight or liquid-tight manner.
DE1997108149 1997-02-28 1997-02-28 Electrodeless discharge tube containing mercury and noble gas mixture Withdrawn DE19708149A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
DE1997108149 DE19708149A1 (en) 1997-02-28 1997-02-28 Electrodeless discharge tube containing mercury and noble gas mixture

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE1997108149 DE19708149A1 (en) 1997-02-28 1997-02-28 Electrodeless discharge tube containing mercury and noble gas mixture

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DE19708149A1 true DE19708149A1 (en) 1998-09-03

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Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10130348A1 (en) * 2001-06-22 2003-03-20 Umex Gmbh Dresden Method for sterilizing liquids and gases by UV radiation has a sealed double walled elongated U-shaped tube containing a high frequency microwave aerial
WO2003036683A2 (en) * 2001-10-24 2003-05-01 Matsushita Electric Works, Ltd. Electrodeless low pressure lamp with multiple ferrite cores and induction coils
EP1394118A1 (en) * 2002-08-27 2004-03-03 UMEX Dresden GmbH Method and apparatus for the uv radiation of liquids
CN105817127A (en) * 2016-05-24 2016-08-03 叶君芝 Small organic waste gas purification device
WO2018158313A1 (en) * 2017-03-01 2018-09-07 Eta Plus Electronic Gmbh Device for irradiating a flowing medium with uv radiation

Citations (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE544312C (en) * 1930-04-01 1932-02-19 Helmuth Laux Process for the ultraviolet irradiation of liquids by means of a discharge tube immersed directly in the liquid
EP0254111A1 (en) * 1986-07-22 1988-01-27 BBC Brown Boveri AG Ultraviolett radiation device
DE3903549A1 (en) * 1989-02-07 1990-08-09 Int Biotech Lab UV light for the degradation of pollutants, in particular of halogenated hydrocarbons
DE9017684U1 (en) * 1990-08-08 1991-11-14 Ibl Umwelt- Und Biotechnik Gmbh, 6900 Heidelberg Device for carrying out photochemical reactions
EP0509110A1 (en) * 1991-04-15 1992-10-21 Heraeus Noblelight GmbH Irradation device
EP0516223A2 (en) * 1991-05-30 1992-12-02 Koninklijke Philips Electronics N.V. Electrodeless low-pressure sodium vapour discharge lamp
DE4203345A1 (en) * 1992-02-06 1993-08-12 Asea Brown Boveri High performance emitter, esp. for UV light - comprises discharge chamber filled with gas, and metallic outer electrodes coated with UV-transparent layer
DE4238324A1 (en) * 1992-11-13 1994-05-19 Abb Research Ltd Removal of dangerous contaminants from oxygen-contg. gases - gas stream is treated with ozone as well as with UV-light
DE4243210A1 (en) * 1992-12-19 1994-06-30 Heraeus Noblelight Gmbh High power radiator
DE4222130C2 (en) * 1992-07-06 1995-12-14 Heraeus Noblelight Gmbh High-power radiation
DE19507189A1 (en) * 1995-03-02 1996-09-12 Stengelin Gmbh & Co Kg Processing medium, esp. water, gas mixt. or air, in UV excimer-emitter

Patent Citations (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE544312C (en) * 1930-04-01 1932-02-19 Helmuth Laux Process for the ultraviolet irradiation of liquids by means of a discharge tube immersed directly in the liquid
EP0254111A1 (en) * 1986-07-22 1988-01-27 BBC Brown Boveri AG Ultraviolett radiation device
DE3903549A1 (en) * 1989-02-07 1990-08-09 Int Biotech Lab UV light for the degradation of pollutants, in particular of halogenated hydrocarbons
DE9017684U1 (en) * 1990-08-08 1991-11-14 Ibl Umwelt- Und Biotechnik Gmbh, 6900 Heidelberg Device for carrying out photochemical reactions
EP0509110A1 (en) * 1991-04-15 1992-10-21 Heraeus Noblelight GmbH Irradation device
EP0516223A2 (en) * 1991-05-30 1992-12-02 Koninklijke Philips Electronics N.V. Electrodeless low-pressure sodium vapour discharge lamp
DE4203345A1 (en) * 1992-02-06 1993-08-12 Asea Brown Boveri High performance emitter, esp. for UV light - comprises discharge chamber filled with gas, and metallic outer electrodes coated with UV-transparent layer
DE4222130C2 (en) * 1992-07-06 1995-12-14 Heraeus Noblelight Gmbh High-power radiation
DE4238324A1 (en) * 1992-11-13 1994-05-19 Abb Research Ltd Removal of dangerous contaminants from oxygen-contg. gases - gas stream is treated with ozone as well as with UV-light
DE4243210A1 (en) * 1992-12-19 1994-06-30 Heraeus Noblelight Gmbh High power radiator
DE19507189A1 (en) * 1995-03-02 1996-09-12 Stengelin Gmbh & Co Kg Processing medium, esp. water, gas mixt. or air, in UV excimer-emitter

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
OPPENLÄNDER,Thomas, BAUM,Georg, EGLE,Wolfgang: Abwasserreinigung durch Vakuum-UV-Oxidation in Excimer-Durchflußphotoreaktoren. In: gwf Wasser - Abwasser 136, 1995, Nr. 6, S.311-316 *
OPPENLÄNDER,Thomas, BAUM,Georg, HALL,Jürgen: Verfahrenstechnische Grundlagen, Automatisierungs-konzepte und Entwicklungen der UV-Oxidation. In: gwf Wasser - Abwasser 137, 1996, Nr. 12, S.657-664 *

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10130348A1 (en) * 2001-06-22 2003-03-20 Umex Gmbh Dresden Method for sterilizing liquids and gases by UV radiation has a sealed double walled elongated U-shaped tube containing a high frequency microwave aerial
DE10130348B4 (en) * 2001-06-22 2005-05-04 Umex Gmbh Dresden Arrangement for UV irradiation of liquids and gases
WO2003036683A2 (en) * 2001-10-24 2003-05-01 Matsushita Electric Works, Ltd. Electrodeless low pressure lamp with multiple ferrite cores and induction coils
WO2003036683A3 (en) * 2001-10-24 2003-12-04 Matsushita Electric Works Ltd Electrodeless low pressure lamp with multiple ferrite cores and induction coils
CN1305104C (en) * 2001-10-24 2007-03-14 松下电工株式会社 Electrodeless low pressure lamp with multiple ferrite cores and induction coils
EP1394118A1 (en) * 2002-08-27 2004-03-03 UMEX Dresden GmbH Method and apparatus for the uv radiation of liquids
CN105817127A (en) * 2016-05-24 2016-08-03 叶君芝 Small organic waste gas purification device
CN105817127B (en) * 2016-05-24 2018-05-04 台州鼎拓工业设计有限公司 Small-sized organic waste-gas purification equipment
WO2018158313A1 (en) * 2017-03-01 2018-09-07 Eta Plus Electronic Gmbh Device for irradiating a flowing medium with uv radiation

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