DE102011051263A1 - Device for generating aerosols and depositing a light-emitting layer - Google Patents
Device for generating aerosols and depositing a light-emitting layer Download PDFInfo
- Publication number
- DE102011051263A1 DE102011051263A1 DE102011051263A DE102011051263A DE102011051263A1 DE 102011051263 A1 DE102011051263 A1 DE 102011051263A1 DE 102011051263 A DE102011051263 A DE 102011051263A DE 102011051263 A DE102011051263 A DE 102011051263A DE 102011051263 A1 DE102011051263 A1 DE 102011051263A1
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- Prior art keywords
- carrier gas
- line
- aerosol
- gas stream
- powder
- Prior art date
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Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/246—Replenishment of source material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B7/00—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas
- B05B7/14—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas designed for spraying particulate materials
- B05B7/1404—Arrangements for supplying particulate material
- B05B7/144—Arrangements for supplying particulate material the means for supplying particulate material comprising moving mechanical means
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/12—Organic material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/228—Gas flow assisted PVD deposition
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
- C23C16/4486—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by producing an aerosol and subsequent evaporation of the droplets or particles
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C24/00—Coating starting from inorganic powder
- C23C24/02—Coating starting from inorganic powder by application of pressure only
- C23C24/04—Impact or kinetic deposition of particles
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Dispersion Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
Die Erfindung betrifft eine Vorrichtung mit einem Vorratsbehälter (4) zur Aufnahme eines Pulvers (5) und mit einer Förderschnecke (8), um eine dosierte Menge des Pulvers (5) aus dem Vorratsbehälter (4) zu einer Einspeisestelle (13) zu fördern, an welcher Einspeisestelle (13) das Pulver (5) in einen n im Trägergasstrom (25) durch eine Aerosolleitung (15) abtransportiert zu werden. Zur technischen Verbesserung eines Aerosol-Erzeugers wird vorgeschlagen, dass die Förderschnecke (8) einen vom Träger (10) aufweist.The invention relates to a device with a storage container (4) for receiving a powder (5) and with a screw conveyor (8) to convey a metered amount of powder (5) from the storage container (4) to a feed point (13), at which feed point (13) the powder (5) is to be transported away through an aerosol line (15) in a carrier gas stream (25). For the technical improvement of an aerosol generator, it is proposed that the screw conveyor (8) have a carrier (10).
Description
Die Erfindung betrifft eine Vorrichtung mit einem Vorratsbehälter zur Aufnahme eines Pulvers und mit einer Förderschnecke, um eine dosierte Menge des Pulvers aus dem Vorratsbehälter zu einer Einspeisestelle zu fördern, an welcher Einspeisestelle das Pulver in einen Trägergasstrom gelangt, um als Schwebeteilchen im Trägergasstrom durch eine Aerosolleitung abtransportiert zu werden.The invention relates to a device with a reservoir for receiving a powder and with a screw conveyor to promote a metered amount of the powder from the reservoir to a feed point at which feed point, the powder enters a carrier gas stream to be suspended particles in the carrier gas stream by an aerosol to be transported away.
Eine Vorrichtung dieser Art wird von der
Die
Die
Der Erfindung liegt die Aufgabe zugrunde, den eingangs genannten Aerosol-Erzeuger technisch zu verbessern.The invention has for its object to improve the aerosol generator mentioned above technically.
Gelöst wird die Aufgabe durch die in den Ansprüchen angegebene Erfindung.The object is achieved by the invention specified in the claims.
Zunächst und im Wesentlichen ist vorgesehen, dass die Förderschnecke einen vom Trägergasstrom durchströmten axialen Strömungskanal aufweist. Hierdurch wird die Funktionalität des Aerosol-Erzeugers in einer Verdampfungseinrichtung verbessert. Die von der Schnecke geförderten Pulverteilchen werden am Ende der Schnecke über eine geeignete Formgebung des Endes der Lagerhöhlung der Schnecke radial einwärts transportiert und unmittelbar in den aus dem Ende der Förderschnecke austretenden Trägergasstrom eingespeist. Der Strömungskanal verläuft in der Drehachse der Schnecke. Die Pulverteilchen werden als Schwebeteilchen in eine Aerosolleitung vom Trägergas zu einem Verdampfer transportiert, in welchem die Schwebeteilchen durch Zufuhr von Wärme zu einem Dampf verdampfen. Der mit dem Dampf des verdampften organischen Ausgangsstoffes angereicherte Trägergasstrom wird durch eine Dampfleitung einem CVD-Reaktor zugeführt. Dieser besitzt einen Gasverteiler in Form eines shower head mit an seiner Unterseite angeordneter Gasaustrittsfläche, die eine Vielzahl von siebartig angeordneten Gasaustrittsöffnungen aufweist. Durch diesen Gasverteiler und die Gasaustrittsöffnungen gelangt der mit dem Dampf angereicherte Trägergasstrom in eine unterhalb des Gasverteilers angeordnete Prozesskammer, deren Boden von einem Suszeptor ausgebildet wird, der ein zu beschichtendes Substrat, beispielsweise aus Glas trägt, welches durch Kühlmittel des Suszeptors auf eine Temperatur gekühlt wird, bei der der Dampf auf der Oberfläche des Substrates kondensiert. Die Einspeisung des Aerosols, welches unmittelbar am Ende der Förderschnecke gebildet wird, in die Aerosolleitung kann in einen quer zur Schnecke fließenden zweiten Trägergasstrom erfolgen. Es ist aber auch vorgesehen, dass die Aerosolleitung mit dem Strömungskanal fluchtet. Auch bei einer fluchtenden Anordnung kann an der Einspeisestelle ein zweites Trägergas in die Aerosolleitung strömen. Während das erste Trägergas aus dem Zentrum einer rotationssymmetrischen Einspeiseanordnung ausströmt, kann das zweite Trägergas von einer radial äußeren Düsenanordnung eingespeist werden. Die Trägergaseinspeiseleitung für das erste Trägergas kann ein Ventil aufweisen, das alternierend geöffnet und geschlossen wird, so dass Trägergaspulse durch den Strömungskanal der Förderschnecke strömen. Auch das zweite Trägergas kann gepulst zugeleitet werden. Bei dem Ventil handelt es sich bevorzugt um ein Umschaltventil, welches den Trägergasfluss entweder in den Strömungskanal oder in eine Vent-Leitung leitet. Der Trägergasstrom wird bevorzugt dosiert. Dies erfolgt mit einem Massenflussregler. Der Vorratsbehälter kann ein Rührwerk aufweisen, wie es beispielsweise in der
Ausführungsbeispiele der Erfindung werden nachfolgend anhand beigefügter Zeichnungen erläutert. Es zeigen: Embodiments of the invention are explained below with reference to accompanying drawings. Show it:
Die
Der Gasverteiler
Zur Erzeugung des Dampfes wird zunächst in einem Aerosol-Erzeuger
Der Trägergasstrom
Die Trägergaseinspeiseleitung
Innerhalb des Vorratsbehälters
Durch Drehen der Förderschnecke
Der aus der Mündung
Bei dem in den
Bei dem in den
Bei dem in den
Das in der
Alle offenbarten Merkmale sind (für sich) erfindungswesentlich. In die Offenbarung der Anmeldung wird hiermit auch der Offenbarungsinhalt der zugehörigen/beigefügten Prioritätsunterlagen (Abschrift der Voranmeldung) vollinhaltlich mit einbezogen, auch zu dem Zweck, Merkmale dieser Unterlagen in Ansprüche vorliegender Anmeldung mit aufzunehmen. Die Unteransprüche charakterisieren in ihrer fakultativ nebengeordneten Fassung eigenständige erfinderische Weiterbildung des Standes der Technik, insbesondere um auf Basis dieser Ansprüche Teilanmeldungen vorzunehmen.All disclosed features are essential to the invention. The disclosure of the associated / attached priority documents (copy of the prior application) is hereby also incorporated in full in the disclosure of the application, also for the purpose of including features of these documents in claims of the present application. The subclaims characterize in their optional sibling version independent inventive development of the prior art, in particular to make on the basis of these claims divisional applications.
BezugszeichenlisteLIST OF REFERENCE NUMBERS
- 11
- Aerosol-ErzeugerAerosol Generator
- 22
- VerdampferEvaporator
- 33
- CVD-ReaktorCVD reactor
- 44
- Vorratsbehälterreservoir
- 55
- pulverförmiger organischer Ausgangsstoffpowdery organic starting material
- 66
- Rührwerkagitator
- 77
- Motorengine
- 88th
- FörderschneckeAuger
- 99
- Lagerrohrbearing tube
- 9'9 '
- EndeThe End
- 1010
- Strömungskanalflow channel
- 1111
- Antriebseinrichtungdriving means
- 1212
- TrägergaseinspeiseleitungTrägergaseinspeiseleitung
- 1313
- Einspeisestelleinfeed
- 1414
- Mündungmuzzle
- 1515
- Aerosolleitungaerosol line
- 1616
- VerdampfungskörperEvaporating body
- 1717
- Dampfleitungsteam line
- 1818
- Gasverteilergas distributor
- 1919
- Prozesskammerprocess chamber
- 2020
- Substratsubstratum
- 2121
- Suszeptorsusceptor
- 2222
- Vakuumpumpevacuum pump
- 2323
- Förderkanaldelivery channel
- 2424
- wendelgangförmige Stegehelical webs
- 2525
- TrägergasstromCarrier gas stream
- 2626
- VentilValve
- 2727
- MassenflussreglerMass Flow Controller
- 2828
- Vent-LeitungVent line
- 2929
- zweites Trägergassecond carrier gas
- 3030
- TrägergaszuleitungCarrier gas supply line
- 3131
- Düsenkopfnozzle head
- 3232
- Öffnungopening
- 3333
- StutzenSupport
ZITATE ENTHALTEN IN DER BESCHREIBUNG QUOTES INCLUDE IN THE DESCRIPTION
Diese Liste der vom Anmelder aufgeführten Dokumente wurde automatisiert erzeugt und ist ausschließlich zur besseren Information des Lesers aufgenommen. Die Liste ist nicht Bestandteil der deutschen Patent- bzw. Gebrauchsmusteranmeldung. Das DPMA übernimmt keinerlei Haftung für etwaige Fehler oder Auslassungen.This list of the documents listed by the applicant has been generated automatically and is included solely for the better information of the reader. The list is not part of the German patent or utility model application. The DPMA assumes no liability for any errors or omissions.
Zitierte PatentliteraturCited patent literature
- US 6037241 [0002] US 6037241 [0002]
- US 7501152 B2 [0003, 0007] US 7501152 B2 [0003, 0007]
- US 2009/0039175 A1 [0004] US 2009/0039175 A1 [0004]
Claims (10)
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102011051263.2A DE102011051263B4 (en) | 2011-06-22 | 2011-06-22 | Device for aerosol generation and deposition of a light-emitting layer |
PCT/EP2012/060413 WO2012175315A1 (en) | 2011-06-22 | 2012-06-01 | Device for generating aerosol and depositing a light-emitting layer |
TW101121522A TW201305377A (en) | 2011-06-22 | 2012-06-15 | Device for generating aerosol and depositing a light-emitting layer |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102011051263.2A DE102011051263B4 (en) | 2011-06-22 | 2011-06-22 | Device for aerosol generation and deposition of a light-emitting layer |
Publications (2)
Publication Number | Publication Date |
---|---|
DE102011051263A1 true DE102011051263A1 (en) | 2012-12-27 |
DE102011051263B4 DE102011051263B4 (en) | 2022-08-11 |
Family
ID=46395583
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE102011051263.2A Active DE102011051263B4 (en) | 2011-06-22 | 2011-06-22 | Device for aerosol generation and deposition of a light-emitting layer |
Country Status (3)
Country | Link |
---|---|
DE (1) | DE102011051263B4 (en) |
TW (1) | TW201305377A (en) |
WO (1) | WO2012175315A1 (en) |
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102013106863A1 (en) | 2013-07-01 | 2015-01-08 | Aixtron Se | Device for determining the mass flow of a vapor transported in a carrier gas |
DE102014101792A1 (en) | 2014-02-13 | 2015-08-13 | Aixtron Se | Device for determining the mass flow of a gas or gas mixture with nested tubular filament arrangements |
CN108690955A (en) * | 2017-04-10 | 2018-10-23 | 三星显示有限公司 | Manufacture shows the device and method of equipment |
WO2018224454A1 (en) * | 2017-06-08 | 2018-12-13 | Aixtron Se | Method for the deposition of oleds |
DE202018107303U1 (en) | 2018-12-20 | 2019-01-14 | gemeinnützige KIMW Forschungs-GmbH | Dosing device for dosing a powdery substance and CVD system with such a dosing device |
DE102017119565A1 (en) | 2017-08-25 | 2019-02-28 | Aixtron Se | Apparatus and method for conveying a powder, in particular as a component of a coating device |
DE102018133068A1 (en) | 2018-12-20 | 2020-06-25 | gemeinnützige KIMW Forschungs-GmbH | Dosing device for dosing a powdery substance and CVD system with such a dosing device |
CN113457479A (en) * | 2021-07-22 | 2021-10-01 | 上海交通大学 | Dust aerosol generating system with continuous and stable quantitative concentration |
WO2021223844A1 (en) * | 2020-05-05 | 2021-11-11 | gemeinnützige KIMW Forschungs-GmbH | Apparatus for the vapour deposition of a substance on a substrate |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
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EP3938069A4 (en) * | 2019-03-13 | 2022-12-14 | MetOxTechnologies, Inc. | Solid precursor feed system for thin film depositions |
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-
2011
- 2011-06-22 DE DE102011051263.2A patent/DE102011051263B4/en active Active
-
2012
- 2012-06-01 WO PCT/EP2012/060413 patent/WO2012175315A1/en active Application Filing
- 2012-06-15 TW TW101121522A patent/TW201305377A/en unknown
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EP0585848A1 (en) * | 1992-09-02 | 1994-03-09 | Hoechst Aktiengesellschaft | Method and apparatus for thin film formation by CVD |
DE19638100C1 (en) * | 1996-09-18 | 1998-03-05 | Fraunhofer Ges Forschung | Apparatus to produce vaporous reaction product from solid particles |
US6037241A (en) | 1998-02-19 | 2000-03-14 | First Solar, Llc | Apparatus and method for depositing a semiconductor material |
US7501152B2 (en) | 2004-09-21 | 2009-03-10 | Eastman Kodak Company | Delivering particulate material to a vaporization zone |
US20060177578A1 (en) * | 2005-02-04 | 2006-08-10 | Eastman Kodak Company | Feeding particulate material to a heated surface |
US20060177576A1 (en) * | 2005-02-04 | 2006-08-10 | Eastman Kodak Company | Controllably feeding organic material in making OLEDs |
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US20090081365A1 (en) * | 2007-09-20 | 2009-03-26 | Cok Ronald S | Deposition apparatus for temperature sensitive materials |
Cited By (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2015000727A1 (en) | 2013-07-01 | 2015-01-08 | Aixtron Se | Apparatus for determining the mass flow of a vapour transported in a carrier gas |
DE102013106863A1 (en) | 2013-07-01 | 2015-01-08 | Aixtron Se | Device for determining the mass flow of a vapor transported in a carrier gas |
DE102014101792A1 (en) | 2014-02-13 | 2015-08-13 | Aixtron Se | Device for determining the mass flow of a gas or gas mixture with nested tubular filament arrangements |
US11534790B2 (en) | 2017-04-10 | 2022-12-27 | Samsung Display Co., Ltd. | Apparatus and method of manufacturing display apparatus |
CN108690955A (en) * | 2017-04-10 | 2018-10-23 | 三星显示有限公司 | Manufacture shows the device and method of equipment |
EP3396731A1 (en) * | 2017-04-10 | 2018-10-31 | Samsung Display Co., Ltd. | Apparatus and method of manufacturing display apparatus |
WO2018224454A1 (en) * | 2017-06-08 | 2018-12-13 | Aixtron Se | Method for the deposition of oleds |
DE102017119565A1 (en) | 2017-08-25 | 2019-02-28 | Aixtron Se | Apparatus and method for conveying a powder, in particular as a component of a coating device |
DE202018107303U1 (en) | 2018-12-20 | 2019-01-14 | gemeinnützige KIMW Forschungs-GmbH | Dosing device for dosing a powdery substance and CVD system with such a dosing device |
EP3699320A1 (en) | 2018-12-20 | 2020-08-26 | Gemeinnützige KIMW Forschungs-GmbH | Dosing device for dosing a powdery substance |
DE102018133068B4 (en) * | 2018-12-20 | 2020-10-22 | gemeinnützige KIMW Forschungs-GmbH | Dosing device for dosing a powdery substance |
DE102018133068A1 (en) | 2018-12-20 | 2020-06-25 | gemeinnützige KIMW Forschungs-GmbH | Dosing device for dosing a powdery substance and CVD system with such a dosing device |
WO2021223844A1 (en) * | 2020-05-05 | 2021-11-11 | gemeinnützige KIMW Forschungs-GmbH | Apparatus for the vapour deposition of a substance on a substrate |
CN113457479A (en) * | 2021-07-22 | 2021-10-01 | 上海交通大学 | Dust aerosol generating system with continuous and stable quantitative concentration |
CN113457479B (en) * | 2021-07-22 | 2022-09-23 | 上海交通大学 | Dust aerosol generating system with constant and stable quantitative concentration |
Also Published As
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WO2012175315A1 (en) | 2012-12-27 |
DE102011051263B4 (en) | 2022-08-11 |
TW201305377A (en) | 2013-02-01 |
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