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DE102009037011B8 - Molekulares Lithographieverfahren - Google Patents

Molekulares Lithographieverfahren Download PDF

Info

Publication number
DE102009037011B8
DE102009037011B8 DE200910037011 DE102009037011A DE102009037011B8 DE 102009037011 B8 DE102009037011 B8 DE 102009037011B8 DE 200910037011 DE200910037011 DE 200910037011 DE 102009037011 A DE102009037011 A DE 102009037011A DE 102009037011 B8 DE102009037011 B8 DE 102009037011B8
Authority
DE
Germany
Prior art keywords
lithography method
molecular
molecular lithography
lithography
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE200910037011
Other languages
English (en)
Other versions
DE102009037011B3 (de
Inventor
Dr. Mertsch Olaf
Antje Mertsch
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Helmholtz Zentrum Berlin fuer Materialien und Energie GmbH
Original Assignee
Helmholtz Zentrum Berlin fuer Materialien und Energie GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Helmholtz Zentrum Berlin fuer Materialien und Energie GmbH filed Critical Helmholtz Zentrum Berlin fuer Materialien und Energie GmbH
Priority to DE200910037011 priority Critical patent/DE102009037011B8/de
Application granted granted Critical
Publication of DE102009037011B3 publication Critical patent/DE102009037011B3/de
Publication of DE102009037011B8 publication Critical patent/DE102009037011B8/de
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82B—NANOSTRUCTURES FORMED BY MANIPULATION OF INDIVIDUAL ATOMS, MOLECULES, OR LIMITED COLLECTIONS OF ATOMS OR MOLECULES AS DISCRETE UNITS; MANUFACTURE OR TREATMENT THEREOF
    • B82B3/00—Manufacture or treatment of nanostructures by manipulation of individual atoms or molecules, or limited collections of atoms or molecules as discrete units
    • B82B3/0009—Forming specific nanostructures
    • B82B3/0014—Array or network of similar nanostructural elements
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
    • B01L3/00—Containers or dishes for laboratory use, e.g. laboratory glassware; Droppers
    • B01L3/50—Containers for the purpose of retaining a material to be analysed, e.g. test tubes
    • B01L3/502—Containers for the purpose of retaining a material to be analysed, e.g. test tubes with fluid transport, e.g. in multi-compartment structures
    • B01L3/5027—Containers for the purpose of retaining a material to be analysed, e.g. test tubes with fluid transport, e.g. in multi-compartment structures by integrated microfluidic structures, i.e. dimensions of channels and chambers are such that surface tension forces are important, e.g. lab-on-a-chip
    • B01L3/502707—Containers for the purpose of retaining a material to be analysed, e.g. test tubes with fluid transport, e.g. in multi-compartment structures by integrated microfluidic structures, i.e. dimensions of channels and chambers are such that surface tension forces are important, e.g. lab-on-a-chip characterised by the manufacture of the container or its components
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
    • B01L2200/00—Solutions for specific problems relating to chemical or physical laboratory apparatus
    • B01L2200/06—Fluid handling related problems
    • B01L2200/0647—Handling flowable solids, e.g. microscopic beads, cells, particles
    • B01L2200/0663—Stretching or orienting elongated molecules or particles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
    • B01L2400/00—Moving or stopping fluids
    • B01L2400/04—Moving fluids with specific forces or mechanical means
    • B01L2400/0403—Moving fluids with specific forces or mechanical means specific forces
    • B01L2400/0415—Moving fluids with specific forces or mechanical means specific forces electrical forces, e.g. electrokinetic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
    • B01L2400/00—Moving or stopping fluids
    • B01L2400/04—Moving fluids with specific forces or mechanical means
    • B01L2400/0403—Moving fluids with specific forces or mechanical means specific forces
    • B01L2400/0472—Diffusion

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Nanotechnology (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Clinical Laboratory Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Hematology (AREA)
  • Analytical Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Dispersion Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE200910037011 2009-08-08 2009-08-08 Molekulares Lithographieverfahren Expired - Fee Related DE102009037011B8 (de)

Priority Applications (1)

Application Number Priority Date Filing Date Title
DE200910037011 DE102009037011B8 (de) 2009-08-08 2009-08-08 Molekulares Lithographieverfahren

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE200910037011 DE102009037011B8 (de) 2009-08-08 2009-08-08 Molekulares Lithographieverfahren

Publications (2)

Publication Number Publication Date
DE102009037011B3 DE102009037011B3 (de) 2011-05-12
DE102009037011B8 true DE102009037011B8 (de) 2011-11-10

Family

ID=43853263

Family Applications (1)

Application Number Title Priority Date Filing Date
DE200910037011 Expired - Fee Related DE102009037011B8 (de) 2009-08-08 2009-08-08 Molekulares Lithographieverfahren

Country Status (1)

Country Link
DE (1) DE102009037011B8 (de)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ITTO20120331A1 (it) * 2012-04-17 2013-10-18 Fond Istituto Italiano Di Tecnologia Dispositivo per l'ottenimento di colture cellulari in tre dimensioni, procedimento per la sua realizzazione e impiego di tale dispositivo
CN106475572A (zh) * 2016-09-30 2017-03-08 天津宝兴威科技有限公司 一种新型纳米银线的合成方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20050158763A1 (en) * 2003-12-19 2005-07-21 Albena Ivanisevic Aligned long DNA molecules on templates and methods for preparing
US20070134939A1 (en) * 2005-10-17 2007-06-14 Brueck Steven R Fabrication of enclosed nanochannels using silica nanoparticles
DE102007027414B3 (de) * 2007-06-11 2009-01-22 Berliner Elektronenspeicherring-Gesellschaft für Synchrotronstrahlung mbH Mikro- und Nanofluidsystem zur dynamischen Strukturanalyse von linearen Makromolekülen und Anwendungen davon
US20090136948A1 (en) * 2007-10-31 2009-05-28 Jongyoon Han Nanoconfinement- based devices and methods of use thereof

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20050158763A1 (en) * 2003-12-19 2005-07-21 Albena Ivanisevic Aligned long DNA molecules on templates and methods for preparing
US20070134939A1 (en) * 2005-10-17 2007-06-14 Brueck Steven R Fabrication of enclosed nanochannels using silica nanoparticles
DE102007027414B3 (de) * 2007-06-11 2009-01-22 Berliner Elektronenspeicherring-Gesellschaft für Synchrotronstrahlung mbH Mikro- und Nanofluidsystem zur dynamischen Strukturanalyse von linearen Makromolekülen und Anwendungen davon
US20090136948A1 (en) * 2007-10-31 2009-05-28 Jongyoon Han Nanoconfinement- based devices and methods of use thereof

Non-Patent Citations (6)

* Cited by examiner, † Cited by third party
Title
ABGRALL,Patrick, CONEDERA,Veronique, CAMON,Henri, GUE,Anne-Marie, NGUYEN,Nam-Trung: SU-8 as a structual material for labs-on-chips and microelectromechanical systems. In: Electrophoresis, 2007, Vol.28, S.4539-4551 *
ALACA.B.Erdem: Integration of one-dimensional nanostructures with microsystems: an overview. In: International Materials Reviews, 2009, Vol.54, No.5, S.245-282 *
KEREN,Kinneret, BRAUN,Erez: Sequence-Specific Molecular Lithography Towards DNA-Templated Electronics. In: Chem. Eng. Technol. 2004, Vol.27, No.4, S.447-452 *
NORTON,Michael, RAHMAN,Mashiur, DAY,B.Scott, HUFFMANN,Chad, CAO,Huan, Neff,David, BUTTS,Heather, GIN,Aaron: Recent Advances in molecular lithography. In: Proc. of SPIE, 2008, Vol.6769, S-67690M-1 bis 67690M-9 *
PERRY,Jeffrey L., KANDLIKAR,Satish G.: Review of fabrication of nanochannels for single phase liquid flow. In: Microfluidics and Nanofluidics, 2006, Vol.2, No.3, S.185-193 *
YANG,B., PANG,S.W.: Multiple level nanochannels fabricated using reversal UV nanoimprint. In: J. Vac. Sci. Technol. B., 2006, Vol.24, Iss.6, S.2984-2987 *

Also Published As

Publication number Publication date
DE102009037011B3 (de) 2011-05-12

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Legal Events

Date Code Title Description
R083 Amendment of/additions to inventor(s)
R020 Patent grant now final

Effective date: 20111126

R119 Application deemed withdrawn, or ip right lapsed, due to non-payment of renewal fee