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DE102004015442A1 - Method of closing perforated membranes - Google Patents

Method of closing perforated membranes Download PDF

Info

Publication number
DE102004015442A1
DE102004015442A1 DE102004015442A DE102004015442A DE102004015442A1 DE 102004015442 A1 DE102004015442 A1 DE 102004015442A1 DE 102004015442 A DE102004015442 A DE 102004015442A DE 102004015442 A DE102004015442 A DE 102004015442A DE 102004015442 A1 DE102004015442 A1 DE 102004015442A1
Authority
DE
Germany
Prior art keywords
fine
layer
pored layer
dollar
pored
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
DE102004015442A
Other languages
German (de)
Inventor
Thorsten Pannek
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Robert Bosch GmbH
Original Assignee
Robert Bosch GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Robert Bosch GmbH filed Critical Robert Bosch GmbH
Priority to DE102004015442A priority Critical patent/DE102004015442A1/en
Priority to GB0427160A priority patent/GB2415828B/en
Priority to FR0550765A priority patent/FR2868412A1/en
Priority to JP2005099338A priority patent/JP2005279928A/en
Publication of DE102004015442A1 publication Critical patent/DE102004015442A1/en
Withdrawn legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00436—Shaping materials, i.e. techniques for structuring the substrate or the layers on the substrate
    • B81C1/00523—Etching material
    • B81C1/00547—Etching processes not provided for in groups B81C1/00531 - B81C1/00539
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B3/00—Devices comprising flexible or deformable elements, e.g. comprising elastic tongues or membranes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
    • G01J5/02—Constructional details
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
    • G01J5/02—Constructional details
    • G01J5/0225—Shape of the cavity itself or of elements contained in or suspended over the cavity
    • G01J5/024—Special manufacturing steps or sacrificial layers or layer structures
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
    • G01J5/10—Radiation pyrometry, e.g. infrared or optical thermometry using electric radiation detectors
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
    • G01J5/10—Radiation pyrometry, e.g. infrared or optical thermometry using electric radiation detectors
    • G01J5/20—Radiation pyrometry, e.g. infrared or optical thermometry using electric radiation detectors using resistors, thermistors or semiconductors sensitive to radiation, e.g. photoconductive devices
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C2201/00—Manufacture or treatment of microstructural devices or systems
    • B81C2201/01—Manufacture or treatment of microstructural devices or systems in or on a substrate
    • B81C2201/0101—Shaping material; Structuring the bulk substrate or layers on the substrate; Film patterning
    • B81C2201/0111—Bulk micromachining
    • B81C2201/0115—Porous silicon

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Micromachines (AREA)
  • Separation Using Semi-Permeable Membranes (AREA)
  • Pressure Sensors (AREA)
  • Photometry And Measurement Of Optical Pulse Characteristics (AREA)

Abstract

Die Erfindung betrifft ein Verfahren zum Erzeugen einer Membranstruktur mit verschlossenen Perforationsöffnungen, welche einen Hohlraum überspannt, bei dem DOLLAR A - auf einem Substrat wenigstens eine feinporige Schicht erzeugt wird, DOLLAR A - durch einen die feinporige Schicht durchdringenden Ätzvorgang ein von wenigstens der feinporigen Schicht überspannter Hohlraum unter der feinporigen Schicht erzeugt wird, DOLLAR A - auf der feinporigen Schicht eine Verschlussschicht erzeugt wird, welche die feinporige Schicht wenigstens teilweise überdeckt.The invention relates to a method for producing a membrane structure with closed perforation openings, which spans a cavity in which DOLLAR A - at least one fine-pored layer is produced on a substrate, DOLLAR A - by an etching process penetrating the fine-pored layer one of at least the fine-pored layer spanned Cavity is produced under the fine-pored layer, DOLLAR A - on the fine-pored layer, a closure layer is produced, which at least partially covers the fine-pored layer.

DE102004015442A 2004-03-30 2004-03-30 Method of closing perforated membranes Withdrawn DE102004015442A1 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
DE102004015442A DE102004015442A1 (en) 2004-03-30 2004-03-30 Method of closing perforated membranes
GB0427160A GB2415828B (en) 2004-03-30 2004-12-10 Method for closing perforated membranes
FR0550765A FR2868412A1 (en) 2004-03-30 2005-03-24 METHOD FOR CLOSING PERFORATED MEMBRANES
JP2005099338A JP2005279928A (en) 2004-03-30 2005-03-30 Method for closing bored diaphragm

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE102004015442A DE102004015442A1 (en) 2004-03-30 2004-03-30 Method of closing perforated membranes

Publications (1)

Publication Number Publication Date
DE102004015442A1 true DE102004015442A1 (en) 2005-10-20

Family

ID=34072186

Family Applications (1)

Application Number Title Priority Date Filing Date
DE102004015442A Withdrawn DE102004015442A1 (en) 2004-03-30 2004-03-30 Method of closing perforated membranes

Country Status (4)

Country Link
JP (1) JP2005279928A (en)
DE (1) DE102004015442A1 (en)
FR (1) FR2868412A1 (en)
GB (1) GB2415828B (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102017210459A1 (en) * 2017-06-22 2018-12-27 Robert Bosch Gmbh Micromechanical device with a first cavity and a second cavity

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0750789B2 (en) * 1986-07-18 1995-05-31 日産自動車株式会社 Method for manufacturing semiconductor pressure converter
DE19961578A1 (en) * 1999-12-21 2001-06-28 Bosch Gmbh Robert Sensor comprises a micromechanical structure based on silicon integrated in the sensor chamber of a base wafer and a cover made of a transparent deposition layer and a sealing layer
DE10053326A1 (en) * 2000-10-27 2002-05-08 Bosch Gmbh Robert Micro-mechanical component for sensing dew point contains membrane and porous material thermal insulating zone membrane support
FI112644B (en) * 2000-11-10 2003-12-31 Vaisala Oyj Surface micromechanical absolute pressure sensor and method of manufacture thereof
DE10064494A1 (en) * 2000-12-22 2002-07-04 Bosch Gmbh Robert Method for producing a semiconductor component and a semiconductor component produced by the method, the semiconductor component in particular having a movable mass
DE10065026A1 (en) * 2000-12-23 2002-07-04 Bosch Gmbh Robert Micromechanical component and corresponding manufacturing method
DE10117486A1 (en) * 2001-04-07 2002-10-17 Bosch Gmbh Robert Method for producing a semiconductor component and a semiconductor component produced using the method
GR1004106B (en) * 2002-01-24 2003-01-13 Εκεφε "Δημοκριτος" Ινστιτουτο Μικροηλεκτρονικης Low power silicon thermal sensors and microfluidic devices based on the use of porous silicon sealed air cavity technology or microchannel technology

Also Published As

Publication number Publication date
GB2415828B (en) 2006-06-28
GB2415828A (en) 2006-01-04
JP2005279928A (en) 2005-10-13
GB0427160D0 (en) 2005-01-12
FR2868412A1 (en) 2005-10-07

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Legal Events

Date Code Title Description
8110 Request for examination paragraph 44
R002 Refusal decision in examination/registration proceedings
R119 Application deemed withdrawn, or ip right lapsed, due to non-payment of renewal fee

Effective date: 20121002