CN86103910A - Surface passivation treatment method for copper and copper alloy - Google Patents
Surface passivation treatment method for copper and copper alloy Download PDFInfo
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- CN86103910A CN86103910A CN86103910.6A CN86103910A CN86103910A CN 86103910 A CN86103910 A CN 86103910A CN 86103910 A CN86103910 A CN 86103910A CN 86103910 A CN86103910 A CN 86103910A
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- 238000000034 method Methods 0.000 title claims abstract description 25
- 238000002161 passivation Methods 0.000 title claims abstract description 24
- 239000010949 copper Substances 0.000 title claims abstract description 15
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 title claims abstract description 14
- 229910052802 copper Inorganic materials 0.000 title claims abstract description 13
- 229910000881 Cu alloy Inorganic materials 0.000 title claims abstract description 9
- 238000011282 treatment Methods 0.000 title claims description 26
- 238000005498 polishing Methods 0.000 claims abstract description 28
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 claims abstract description 21
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 claims abstract description 21
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 claims abstract description 15
- 238000004140 cleaning Methods 0.000 claims abstract description 6
- 235000006408 oxalic acid Nutrition 0.000 claims abstract description 5
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical compound C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 claims description 38
- 239000004372 Polyvinyl alcohol Substances 0.000 claims description 29
- 229920002451 polyvinyl alcohol Polymers 0.000 claims description 29
- 239000012964 benzotriazole Substances 0.000 claims description 26
- 239000000203 mixture Substances 0.000 claims description 21
- 239000000126 substance Substances 0.000 claims description 14
- 239000012530 fluid Substances 0.000 claims description 13
- 239000003513 alkali Substances 0.000 claims description 5
- 238000011284 combination treatment Methods 0.000 claims description 4
- 238000005554 pickling Methods 0.000 claims description 4
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims 6
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 abstract description 8
- 229910000147 aluminium phosphate Inorganic materials 0.000 abstract description 4
- 239000002253 acid Substances 0.000 abstract description 2
- 238000010306 acid treatment Methods 0.000 abstract 1
- 238000006388 chemical passivation reaction Methods 0.000 abstract 1
- 230000001681 protective effect Effects 0.000 abstract 1
- 229910001369 Brass Inorganic materials 0.000 description 11
- 239000010951 brass Substances 0.000 description 11
- 238000005516 engineering process Methods 0.000 description 8
- 230000007797 corrosion Effects 0.000 description 6
- 238000005260 corrosion Methods 0.000 description 6
- 239000002932 luster Substances 0.000 description 6
- 238000007789 sealing Methods 0.000 description 6
- 239000007788 liquid Substances 0.000 description 5
- 239000000243 solution Substances 0.000 description 5
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 description 4
- 230000006378 damage Effects 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- FFRBMBIXVSCUFS-UHFFFAOYSA-N 2,4-dinitro-1-naphthol Chemical compound C1=CC=C2C(O)=C([N+]([O-])=O)C=C([N+]([O-])=O)C2=C1 FFRBMBIXVSCUFS-UHFFFAOYSA-N 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- VMQMZMRVKUZKQL-UHFFFAOYSA-N Cu+ Chemical compound [Cu+] VMQMZMRVKUZKQL-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 2
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 235000011114 ammonium hydroxide Nutrition 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000013522 chelant Substances 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- TVZPLCNGKSPOJA-UHFFFAOYSA-N copper zinc Chemical compound [Cu].[Zn] TVZPLCNGKSPOJA-UHFFFAOYSA-N 0.000 description 2
- BERDEBHAJNAUOM-UHFFFAOYSA-N copper(I) oxide Inorganic materials [Cu]O[Cu] BERDEBHAJNAUOM-UHFFFAOYSA-N 0.000 description 2
- LBJNMUFDOHXDFG-UHFFFAOYSA-N copper;hydrate Chemical compound O.[Cu].[Cu] LBJNMUFDOHXDFG-UHFFFAOYSA-N 0.000 description 2
- 229960004643 cupric oxide Drugs 0.000 description 2
- QDOXWKRWXJOMAK-UHFFFAOYSA-N dichromium trioxide Chemical compound O=[Cr]O[Cr]=O QDOXWKRWXJOMAK-UHFFFAOYSA-N 0.000 description 2
- 238000003912 environmental pollution Methods 0.000 description 2
- 229910017604 nitric acid Inorganic materials 0.000 description 2
- 239000012266 salt solution Substances 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 238000004381 surface treatment Methods 0.000 description 2
- 230000000007 visual effect Effects 0.000 description 2
- 239000002699 waste material Substances 0.000 description 2
- TUSDEZXZIZRFGC-UHFFFAOYSA-N 1-O-galloyl-3,6-(R)-HHDP-beta-D-glucose Natural products OC1C(O2)COC(=O)C3=CC(O)=C(O)C(O)=C3C3=C(O)C(O)=C(O)C=C3C(=O)OC1C(O)C2OC(=O)C1=CC(O)=C(O)C(O)=C1 TUSDEZXZIZRFGC-UHFFFAOYSA-N 0.000 description 1
- 208000008964 Chemical and Drug Induced Liver Injury Diseases 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- 201000004624 Dermatitis Diseases 0.000 description 1
- 239000001263 FEMA 3042 Substances 0.000 description 1
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 1
- LRBQNJMCXXYXIU-PPKXGCFTSA-N Penta-digallate-beta-D-glucose Natural products OC1=C(O)C(O)=CC(C(=O)OC=2C(=C(O)C=C(C=2)C(=O)OC[C@@H]2[C@H]([C@H](OC(=O)C=3C=C(OC(=O)C=4C=C(O)C(O)=C(O)C=4)C(O)=C(O)C=3)[C@@H](OC(=O)C=3C=C(OC(=O)C=4C=C(O)C(O)=C(O)C=4)C(O)=C(O)C=3)[C@H](OC(=O)C=3C=C(OC(=O)C=4C=C(O)C(O)=C(O)C=4)C(O)=C(O)C=3)O2)OC(=O)C=2C=C(OC(=O)C=3C=C(O)C(O)=C(O)C=3)C(O)=C(O)C=2)O)=C1 LRBQNJMCXXYXIU-PPKXGCFTSA-N 0.000 description 1
- 208000025865 Ulcer Diseases 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 229910001297 Zn alloy Inorganic materials 0.000 description 1
- 239000003929 acidic solution Substances 0.000 description 1
- 208000007502 anemia Diseases 0.000 description 1
- 230000002421 anti-septic effect Effects 0.000 description 1
- 230000000711 cancerogenic effect Effects 0.000 description 1
- 231100000357 carcinogen Toxicity 0.000 description 1
- 239000003183 carcinogenic agent Substances 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- WGLPBDUCMAPZCE-UHFFFAOYSA-N chromium trioxide Inorganic materials O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 1
- 229940117975 chromium trioxide Drugs 0.000 description 1
- GAMDZJFZMJECOS-UHFFFAOYSA-N chromium(6+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Cr+6] GAMDZJFZMJECOS-UHFFFAOYSA-N 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 201000010099 disease Diseases 0.000 description 1
- 208000037265 diseases, disorders, signs and symptoms Diseases 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 210000003928 nasal cavity Anatomy 0.000 description 1
- IPGOVDXOBDFUBM-UHFFFAOYSA-N oxalic acid;sodium Chemical compound [Na].OC(=O)C(O)=O IPGOVDXOBDFUBM-UHFFFAOYSA-N 0.000 description 1
- 239000007800 oxidant agent Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 238000007517 polishing process Methods 0.000 description 1
- 210000002345 respiratory system Anatomy 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- LRBQNJMCXXYXIU-NRMVVENXSA-N tannic acid Chemical compound OC1=C(O)C(O)=CC(C(=O)OC=2C(=C(O)C=C(C=2)C(=O)OC[C@@H]2[C@H]([C@H](OC(=O)C=3C=C(OC(=O)C=4C=C(O)C(O)=C(O)C=4)C(O)=C(O)C=3)[C@@H](OC(=O)C=3C=C(OC(=O)C=4C=C(O)C(O)=C(O)C=4)C(O)=C(O)C=3)[C@@H](OC(=O)C=3C=C(OC(=O)C=4C=C(O)C(O)=C(O)C=4)C(O)=C(O)C=3)O2)OC(=O)C=2C=C(OC(=O)C=3C=C(O)C(O)=C(O)C=3)C(O)=C(O)C=2)O)=C1 LRBQNJMCXXYXIU-NRMVVENXSA-N 0.000 description 1
- 229940033123 tannic acid Drugs 0.000 description 1
- 235000015523 tannic acid Nutrition 0.000 description 1
- 229920002258 tannic acid Polymers 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 231100000167 toxic agent Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- 239000003440 toxic substance Substances 0.000 description 1
- 231100000397 ulcer Toxicity 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
Landscapes
- Preventing Corrosion Or Incrustation Of Metals (AREA)
Abstract
A chemical passivation method for the surface of copper and copper alloy is mainly characterized in that: 1) the dilute chromic acid treatment is carried out after bright acid cleaning (polishing); 2) the concentration of the oxalic acid polishing solution is doubled, and a phosphoric acid polishing solution with high polishing efficiency is also provided; 3) compared with all the existing passivation processes, the passivation film forming process has the advantages that the environment is not polluted, the operation personnel are not harmful to the health, and an ideal protective film can be obtained.
Description
The invention belongs to metal material surface chemical treatment field, be applicable to the surface chemistry Passivation Treatment of copper, copper zinc and multicomponent copper zinc alloy.
Copper and brass very easily get rusty in atmosphere, and for a long time, people generally adopt chromic acid passivation technology to carry out the surperficial corrosion stability that surface treatment improves copper and brass.Though the product appearance after this art breading presents golden yellow, and have good corrosion resistance, chromic salt or chromium trioxide consumption are very big in this technology, and its chromic total add-on is up to about 250 grams per liters.According to medical information, sexavalent chrome belongs to a kind of strong carcinogen, also can cause respiratory tract ulcer, the perforation of nasal cavity septation, multiple diseases such as toxic hepatitis, dermatitis and anaemia, very big to human health damage, the permissible discharge amount of this toxic substance of national regulation is＜0.5mg/l for this reason, but the concentration that contains Toxic matter in the chromium acid waste liquid is higher than more than 500,000 times of national regulation index, also is difficult to make it to obtain reclaiming even if expend huge cost.Just mean the pollution problem that can't fundamentally solve and can't reclaim these objectionable impuritiess, thereby also just can't avoid HUMAN HEALTH this fact that works the mischief to environment.For addressing this problem, once the someone adopted tannic acid to add rare chromic acid and handled brass surfaces, but the workpiece color and luster after handling is relatively poor, a little less than the weather-resistance, product can not standing storage and use, and lack of material, with high costs, therefore fail extensively to be adopted by people.The somebody adopts silicate to handle copper and brass surfaces in addition, though the membranous layer corrosion resistance after this art breading is good, but because at high temperature when handling workpiece, so require workpiece can not contact with each other each other, in order to avoid influence the superficial film quality owing to workpiece surface is bonding, therefore can not produce in enormous quantities, especially can not be used for the production in enormous quantities of clock and watch spare and bearing part etc.Comparatively the ideal treatment process is to adopt benzotriazole (BTA) Passivation Treatment copper and copper alloy surface at present, surface after treatment generates the film of one deck tens dusts to the hundreds of dust, very thin being easy to of this rete abrades, be easy to again that slow oxidation is the Cu(II in air) BTA, cause appearance luster to deepen gradually, aesthetic appearance is affected, and anti-salt solution or ammoniacal liquor corrosive power are also lower, though in containing the weakly acidic solution of NaCl, can make film reach 5000
, but the Corrosion Protection of this thick film is poor, and color and luster is also good not as what handle through chromic acid.More than be to introduce the problem that the passivation film formation process exists.Except that film formation process, polished finish also is a critical process in the passivation process, it directly affects the visual appearance and the antiseptic property of product after the film forming, people generally adopt nitric acid, sulfuric acid and hydrochloric acid or solution such as phosphoric acid, acetic acid and nitric acid to make polishing fluid at present, and these polishing fluids can discharge a large amount of NO in polishing process
2Come serious environment pollution with chlorine.Someone uses hydrogen peroxide as oxidant instead, as Ericson, and Harry
(1)Propose to adopt oxalic acid-sodium oxalate-superoxol Deng the people, Chengdu Univ. of Science ﹠ Technology and Chongqing 791 factories improved this liquid afterwards, were successfully used to the surface treatment of brass and other copper alloys
(2-4)But adopt above-mentioned polishing fluid, polishing velocity is slower, especially if want to remove surface imperfection, need prolong polishing time greatly.In addition, the ordinary skill of this area is all got used to making last " sealing treatment " with dilute chromic acid solution again after the Passivation Treatment, thereby can improve the corrosive nature of anti-strong aqua.But sealing treatment is placed on the homogeneity variation that last procedure can make film, color and luster is inhomogeneous, influence the visual appearance of product, moreover, because in the end a procedure carries out sealing treatment, therefore must at high temperature carry out, can produce not only contaminate environment but also be harmful to health of operators of some rare chromic acid steam.
For fundamentally addressing the above problem, the present invention improves existing passivation technology, for copper and copper alloy provides a kind of both free from environmental pollution, does not harm the healthy passivation technology that can obtain desirable film again of operator.
Principal character of the present invention is: 1) rare chromic acid processing is changed into after polishing by last procedure and carrying out, its composition and processing condition are as follows:
Whether above-mentioned " sealing treatment " can adopt according to the final performance requriements decision of product.Have the parts of good anti-ammoniacal liquor corrosive power for some requirement, after handling with rare chromic acid, film layer structure is: copper (or brass)/Red copper oxide, chromium sesquioxide/Cu(I) chelate compound of BTA/PVA and cupric oxide.2) oxalic acid polishing fluid concentration is added be twice, the composition and the polishing technological conditions of polishing fluid are as follows:
Meanwhile, the present invention also provides a kind of polishing efficiency very high phosphoric acid polishing fluid, and its composition and processing condition are as follows:
If seek out better surface smoothness, can slightly throw with phosphoric acid liquid earlier, and then carefully throw, thereby can obtain very ideal surface smoothness rapidly with the oxalic acid liquid that strengthens concentration.Can select different solution for use according to the requirement difference of workpiece surface finish in a word, also can adopt above-mentioned two kinds of different solutions simultaneously.When 3) film forming is handled, adopt benzotriazole and polyvinyl alcohol combination treatment, handle with polyvinyl alcohol again after also can handling with benzotriazole earlier.Its composition and processing condition are as follows:
BTA handles
PVA handles
The BTA+PVA combination treatment
Adopt the film layer structure that obtains after the above-mentioned processing to be: copper or the brass/Red copper oxide/Cu(I) chelate compound of BTA/PVA and cupric oxide.
Operation of the present invention consists of: alkali cleaning, pickling, bright dipped finish (polishing), rare chromic acid are handled, BTA handles, PVA handles (or BTA+PVA handles), oven dry.
Provide 3 embodiment of the present invention below:
Embodiment 1: brass pipe fitting Passivation Treatment
Alkali cleaning
Pickling
Bright dipped finish
Rare chromic acid is handled:
CrO
3(chemical pure) 1 grams per liter room temperature 1 minute
BTA handles:
The BTA(chemical pure) 60 ℃ of 5 grams per liters are 10 minutes
PVA handles:
The PVA(chemical pure) 65 ℃ of 5 grams per liters are 10 minutes
Embodiment 2: brass bearing spare Passivation Treatment
Alkali cleaning
Bright dipped finish
BTA handles:
The BTA(chemical pure) 60 ℃ of 5 grams per liters are 10 minutes
PVA handles:
The PVA(chemical pure) 65 ℃ of 5 grams per liters are 10 minutes
Embodiment 3: red copper and brass electric elements Passivation Treatment
BTA+PVA handles:
The BTA+PVA(chemical pure) 65 ℃ of each 5 grams per liters are 5 minutes
Handle the superficial film of generation and the passivation of high density chromic acid and relatively see Table 1 with the present invention for the brass spare that contains 30% zinc with the performance that simple benzotriazole (BTA) is handled the rete that generates:
In sum, the present invention has overcome existing deficiency in the prior art really, and the technology that it can replace existing high concentration chromic acid passivation technology and process with BTA has merely fundamentally solved because the severe contamination that effluent discharge causes environment. The present invention has not only guaranteed the product brightness to the improvement of polishing fluid, also can greatly accelerate polishing velocity, to the change of sealing on the processing sequence, can remedy owing at high temperature seal the inhomogeneous of color and luster that processing occurs and rete. Sealing of the present invention is processed only to be needed to carry out under 15～25 ℃ usually, and maximum temperature is 50 ℃, and this not only provides convenience for the staff, thereby the more important thing is that can not produce rare chromic acid steam owing to temperature is low does not just harm the healthy of operating personnel yet. The present invention seals and processes employed dilute chromic acid solution and can use continuously in addition, need not to discharge waste liquid, has therefore also just avoided the pollution to environment. In addition, film forming of the present invention is processed owing to added polyvinyl alcohol, thereby increased thicknesses of layers, it is golden yellow that the rete light is, color and luster is stable, high temperature resistance vapour corrosion and salt solution salt air corrosion ability are higher than the workpiece that the passivation of high concentration chromic acid and single BTA process, and the corrosive power of anti-the concentrated ammonia liquor is higher than significantly that single BTA processes, and can compare with high concentration chromic acid Passivation Treatment simultaneously. The present invention be a kind of both free from environmental pollution, not harm operating personnel healthy, can obtain again the passivation technology of desirable diaphragm.
Claims (8)
1, a kind of copper and copper alloy surface chemistry deactivating process for the treatment of, it is made up of following operation: alkali cleaning, pickling, bright dipped finish (polishing), passivation film forming are handled, rare chromic acid is handled, oven dry, and the present invention is characterised in that:
1) rare chromic acid is handled carried out after being placed on bright dipped finish (polishing), treatment temp is room temperature～50 ℃, and the time is 30 seconds～3 minutes;
2) according to the requirement of workpiece surface finish, can adopt 1 pair of workpiece of polishing fluid slightly to throw, carefully to throw with polishing fluid 2 again, polishing fluid composition 1,2 and processing condition are as follows:
Solution 1 composition scope
H
3PO
4(dense, industry)＜450CC/ liter
HAC (dense, industry)＜200CC/ liter
H
2O
2(30% industry)＜350CC/ liter
The temperature room temperature
30～5 minutes time
Solution 2 composition scopes
NaOH (industry)＜30 grams per liter
H
2O
2(30% industry)＜300CC/ liter
Oxalic acid (industry)＜50 grams per liter
BTA (chemistry is blunt)＜1 grams per liter
Temperature room temperature～60 ℃
1～6 minute time
3) it is to adopt benzotriazole and polyvinyl alcohol combination treatment that passivation film forming is handled, and handles with polyvinyl alcohol after also can handling with benzotriazole earlier again.
2, a kind of copper and copper alloy surface chemistry deactivating process for the treatment of, it is made up of following operation: alkali cleaning, pickling, bright dipped finish (polishing), passivation film forming are handled, rare chromic acid is handled, oven dry, and the present invention is characterised in that:
1) rare chromic acid is handled carried out after being placed on bright dipped finish (polishing), treatment temp is room temperature～50 ℃, and the time is 30 seconds～3 minutes;
2) according to the requirement of workpiece surface finish, can adopt polishing fluid 1 described in the claim 1 or polishing fluid 2 respectively, processing condition are identical with claim 1;
3) it is to adopt benzotriazole and polyvinyl alcohol combination treatment that passivation film forming is handled, and handles with polyvinyl alcohol after also can handling with benzotriazole earlier again.
3, according to claim 1,2 described deactivating process for the treatment of, it is characterized in that the optimum temps that rare chromic acid is handled is 15～25 ℃, Best Times is 1 minute.
4,, it is characterized in that polishing fluid 1,2 best compositions and processing condition are respectively according to claim 1,2 described deactivating process for the treatment of:
Solution 1 composition optimum value
H
3PO
4(dense, industry) 400CC/ liter
Dense, the industry of HAC() 100CC/ liter
H
2O
2(30% industry) 300CC/ liter
The temperature room temperature
1～2 minute time
Solution 2 composition optimum values
NaOH(industry) 15 grams per liters
H
2O
2(30% industry) 150CC/ liter
Oxalic acid (industry) 35 grams per liters
The BTA(chemical pure) 0.1～0.2 grams per liter
40～45 ℃ of temperature
1～2 minute time
5,, it is characterized in that composition and processing condition that (BTA+PVA) handles are according to claim 1,2 described deactivating process for the treatment of:
The composition scope
The BTA+PVA(chemical pure) each 1～15 grams per liter
50 ℃～70 ℃ of temperature
3～20 minutes time
6, according to the described deactivating process for the treatment of of claim 5, it is characterized in that the best composition that (BTA+PVA) handles, concentration and processing condition are:
The composition optimum value
The BTA+PVA(chemical pure) each 5 grams per liter
65 ℃ of temperature
10 minutes time
7, according to claim 1,2 described deactivating process for the treatment of, it is characterized in that handling with BTA earlier, composition and the processing condition of handling with PVA are as follows again:
BTA handles the composition scope
The BTA(chemical pure) 3～15 grams per liters
Temperature room temperature～70 ℃
3～20 minutes time
PVA handles the composition scope
The PVA(chemical pure) 1～15 grams per liter
Temperature room temperature～75 ℃
3～20 minutes time
8, according to the described deactivating process for the treatment of of claim 7, it is characterized in that handling with BTA earlier, with the best composition of PVA processing, composition when processing condition is as follows again:
BTA handles the composition optimum value
The BTA(chemical pure) 5 grams per liters
60～65 ℃ of temperature
5～15 minutes time
PVA handles the composition optimum value
The PVA(chemical pure) 5 grams per liters
60～65 ℃ of temperature
5 minutes time
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 86103910 CN1020479C (en) | 1986-06-02 | 1986-06-02 | Passivating process for surface of copper and its alloy |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 86103910 CN1020479C (en) | 1986-06-02 | 1986-06-02 | Passivating process for surface of copper and its alloy |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN86103910A true CN86103910A (en) | 1987-12-16 |
| CN1020479C CN1020479C (en) | 1993-05-05 |
Family
ID=4802240
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 86103910 Expired - Fee Related CN1020479C (en) | 1986-06-02 | 1986-06-02 | Passivating process for surface of copper and its alloy |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN1020479C (en) |
Cited By (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2004070088A1 (en) * | 2002-06-04 | 2004-08-19 | Merck-Kanto Advanced Chemical Ltd. | Electrolytic solution formulation for electropolishing process |
| CN100419125C (en) * | 2004-11-19 | 2008-09-17 | 中国科学院金属研究所 | Pickling solution for copper alloy materials |
| CN101445923B (en) * | 2008-12-30 | 2012-07-04 | 森鹤乐器股份有限公司 | Passivation method for brass antitarnish |
| CN102703890A (en) * | 2012-05-30 | 2012-10-03 | 中宇建材集团有限公司 | Method for performing color washing on copper product |
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1986
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