CN2434311Y - Magnetic controlled spurting foam nickel winding film coater - Google Patents
Magnetic controlled spurting foam nickel winding film coater Download PDFInfo
- Publication number
- CN2434311Y CN2434311Y CN00246953.7U CN00246953U CN2434311Y CN 2434311 Y CN2434311 Y CN 2434311Y CN 00246953 U CN00246953 U CN 00246953U CN 2434311 Y CN2434311 Y CN 2434311Y
- Authority
- CN
- China
- Prior art keywords
- target
- vacuum chamber
- roll
- rollers
- unwinding
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 title claims abstract description 18
- 229910052759 nickel Inorganic materials 0.000 title claims abstract description 9
- 238000004804 winding Methods 0.000 title claims abstract description 9
- 239000006260 foam Substances 0.000 title claims description 7
- 239000011248 coating agent Substances 0.000 claims abstract description 8
- 238000000576 coating method Methods 0.000 claims abstract description 8
- 238000001755 magnetron sputter deposition Methods 0.000 claims abstract description 4
- 239000004033 plastic Substances 0.000 claims description 5
- 229920003023 plastic Polymers 0.000 claims description 5
- 239000000463 material Substances 0.000 claims description 2
- 239000007888 film coating Substances 0.000 claims 1
- 238000009501 film coating Methods 0.000 claims 1
- 230000005389 magnetism Effects 0.000 claims 1
- 238000007747 plating Methods 0.000 claims 1
- 239000000758 substrate Substances 0.000 abstract description 11
- 239000002184 metal Substances 0.000 abstract description 7
- 229910052751 metal Inorganic materials 0.000 abstract description 7
- 230000005540 biological transmission Effects 0.000 abstract description 3
- 239000007769 metal material Substances 0.000 abstract 1
- 238000000034 method Methods 0.000 description 7
- XKRFYHLGVUSROY-UHFFFAOYSA-N argon Substances [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 3
- 239000010408 film Substances 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- 229910052786 argon Inorganic materials 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- -1 argon ions Chemical class 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000005240 physical vapour deposition Methods 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
- Y02E60/10—Energy storage using batteries
Landscapes
- Physical Vapour Deposition (AREA)
Abstract
本实用新型公开了一种磁控溅射泡沫镍卷绕镀膜机,它包括一个形状为圆形或方形的单室型真空室;一个设在真空室内的驱动车;一对设在真空室内的放、收卷辊;数对设在真空室内的磁控靶;放卷辊与收卷辊上卷绕有被镀基材,放卷辊与收卷辊间的被镀基材之间设有传动链条或带及多个导辊;在真空室内,被镀基材由放卷辊匀速通过每对靶的中间位置,连续传送到收卷辊上,这些靶溅射的金属材料沉积在基材上,形成附着牢固,厚度均匀的镍或其他金属薄膜。
The utility model discloses a coil coating machine for magnetron sputtering foamed nickel, which comprises a circular or square single-chamber vacuum chamber; a driving car arranged in the vacuum chamber; a pair of Unwinding and winding rollers; several pairs of magnetron targets set in the vacuum chamber; unwinding rollers and winding rollers are wound with coated substrates, and between the unwinding rollers and winding rollers there is a plated substrate Transmission chain or belt and multiple guide rollers; in the vacuum chamber, the substrate to be plated passes through the middle position of each pair of targets at a uniform speed by the unwinding roller, and is continuously conveyed to the winding roller, and the metal materials sputtered by these targets are deposited on the substrate On the surface, a nickel or other metal film with firm adhesion and uniform thickness is formed.
Description
本实用新型涉及在柔性基材上连续沉积镍或其他金属薄膜的设备，具体地说是一种磁控溅射泡沫镍卷绕镀膜机。The utility model relates to a device for continuously depositing nickel or other metal thin films on a flexible base material, in particular to a magnetron sputtering foam nickel winding coating machine.
目前，国内进行的这一工艺步骤是用化学的方法，称之湿法，它使用设备较多，而且有些设备的使用不利于环境保护，劳动条件也不好。At present, this process step in China uses a chemical method, called wet method, which uses a lot of equipment, and the use of some equipment is not conducive to environmental protection, and the working conditions are not good.
本实用新型的目的是提供一种采用物理汽相沉积的真空溅射方法来进行在柔性基材上镀金属膜的设备，它镀制的金属膜致密性好，厚度均匀，结合牢固，采用此设备不产生三废，劳动条件好。The purpose of this utility model is to provide a kind of equipment that adopts the vacuum sputtering method of physical vapor deposition to coat metal film on flexible substrates. The metal film plated by it has good compactness, uniform thickness and firm combination. The equipment does not produce three wastes, and the working conditions are good.
实现本实用新型目的的具体技术方案是：磁控溅射泡沫镍卷绕镀膜机包括：一个形状为圆形或方形的单室型真空室；一个设在真空室内的驱动车；一对设在真空室内的放、收卷辊；数对设在真空室内的磁控靶；放卷辊与收卷辊上卷绕有被镀基材泡沫塑料，放卷辊与收卷辊间的泡沫塑料之间设有传动链条或带及多个导辊；磁控靶成对出现，水平或垂直设置，其上靶或内靶安装在驱动车上，下靶或外靶安装在真空室的室体上，磁控靶两侧设有充气管路；磁控靶采用电磁靶或永磁靶。The concrete technical scheme that realizes the purpose of this utility model is: magnetron sputtering nickel foam winding coating machine comprises: a single-chamber type vacuum chamber that is round or square in shape; a drive car that is located in the vacuum chamber; Unwinding and rewinding rollers in the vacuum chamber; several pairs of magnetron targets set in the vacuum chamber; the unwinding roller and the rewinding roller are wound with the coated substrate foam, and the foam between the unwinding roller and the rewinding roller There are transmission chains or belts and multiple guide rollers between them; the magnetron targets appear in pairs and are arranged horizontally or vertically. The upper target or inner target is installed on the driving car, and the lower target or outer target is installed on the body of the vacuum chamber. , There are gas-filled pipelines on both sides of the magnetron target; the magnetron target adopts an electromagnetic target or a permanent magnet target.
与现有技术相比，本实用新型有以下优点：Compared with the prior art, the utility model has the following advantages:
1、在柔性基材上镀制的金属薄膜致密性好，厚度均匀，结合牢固，且不产生污染，劳动条件好。1. The metal thin film plated on the flexible substrate has good compactness, uniform thickness, firm combination, no pollution, and good working conditions.
2、结构简单，磁控靶分别安装在驱动车和真空室体上，靶材的更换和被镀基材的装卸方便。2. The structure is simple, the magnetron target is respectively installed on the driving car and the vacuum chamber body, the replacement of the target and the loading and unloading of the substrate to be plated are convenient.
3、适用于大面积镀膜的工业化生产，靶的安装方式，使被镀基材的外表面和孔内表面的镀膜一次完成。3. It is suitable for industrialized production of large-area coating. The installation method of the target makes the coating of the outer surface of the substrate to be plated and the inner surface of the hole completed at one time.
图1为本实用新型圆形真空室且水平设置磁控靶的结构示意图Fig. 1 is the structural representation of the circular vacuum chamber of the utility model and the magnetron target is arranged horizontally
图2为本实用新型方形真空室且垂直设置磁控靶的结构示意图Fig. 2 is a schematic structural view of a square vacuum chamber of the present invention and a magnetron target is arranged vertically
图中：1-传动链条或带2-真空室3-放卷辊4-收卷辊5-驱动车6-泡沫塑料7-导辊8-充气管路9-磁控靶In the figure: 1-transmission chain or belt 2-vacuum chamber 3-unwinding roller 4-rewinding roller 5-driving car 6-foam plastic 7-guide roller 8-inflatable pipeline 9-magnetic control target
下面结合附图对本实用新型进行详细描述：The utility model is described in detail below in conjunction with accompanying drawing:
参阅附图，本实用新型中的真空室2可为方形室体，也可为圆形室体，磁控靶9可水平设置，也可垂直设置，靶的溅射和被镀基材的放卷、收卷等是在同一个真空室内进行。磁控靶9分别安装在驱动车5和真空室2室体上，充气管路8设在磁控靶9的两侧且靠近被镀基材，各导辊7用传动链条或带进行同步传动。具体工作过程：在真空室2中，被镀基材一泡沫塑料6从放卷辊3经过多个导辊7和每对磁控靶9的中间位置连续均匀地传送到收卷辊4上，在通过磁控靶9时，磁控靶9的靶材金属镍被充气管路8充入的氩气电离后产生的氩离子溅射出来，沉积在泡沫塑料6上而得到镍金属薄膜，完成溅射镀膜过程。Referring to the accompanying drawings, the vacuum chamber 2 in the utility model can be a square chamber body or a circular chamber body, and the magnetron target 9 can be arranged horizontally or vertically, and the sputtering of the target and the release of the substrate to be plated Rolling, winding, etc. are carried out in the same vacuum chamber. The magnetron target 9 is respectively installed on the driving car 5 and the vacuum chamber 2 chamber body, the gas charging pipeline 8 is arranged on both sides of the magnetron target 9 and close to the substrate to be plated, and each guide roller 7 is synchronously driven by a transmission chain or a belt . Concrete work process: in vacuum chamber 2, to be plated substrate-foamed plastics 6 is conveyed continuously and evenly on the take-up roller 4 from unwinding roller 3 through a plurality of guide rollers 7 and the middle position of every pair of magnetron target 9, When passing through the magnetron target 9, the target metal nickel of the magnetron target 9 is sputtered out by the argon ions generated after the argon gas ionized by the gas-filling pipeline 8, and is deposited on the foamed plastic 6 to obtain a nickel metal film, and the process is completed. Sputter coating process.
Claims (4)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN00246953.7U CN2434311Y (en) | 2000-08-08 | 2000-08-08 | Magnetic controlled spurting foam nickel winding film coater |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN00246953.7U CN2434311Y (en) | 2000-08-08 | 2000-08-08 | Magnetic controlled spurting foam nickel winding film coater |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN2434311Y true CN2434311Y (en) | 2001-06-13 |
Family
ID=33606069
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN00246953.7U Expired - Fee Related CN2434311Y (en) | 2000-08-08 | 2000-08-08 | Magnetic controlled spurting foam nickel winding film coater |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN2434311Y (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102066607A (en) * | 2008-06-20 | 2011-05-18 | Sakti3有限公司 | High volume manufacture of electrochecmicals cells using physical vapor deposition |
| CN102212791A (en) * | 2011-06-02 | 2011-10-12 | 爱蓝天高新技术材料(大连)有限公司 | Equipment and method for performing magnetron-controlled sputter coating on polyester type polyurethane foam matrix |
| CN102465266A (en) * | 2010-11-15 | 2012-05-23 | 财团法人工业技术研究院 | Continuous sputtering equipment and manufacturing method of solar selective absorption film |
| CN104711521A (en) * | 2015-03-26 | 2015-06-17 | 青州市宝丰镀膜科技有限公司 | Induction heating coating machine with square vacuum chamber |
-
2000
- 2000-08-08 CN CN00246953.7U patent/CN2434311Y/en not_active Expired - Fee Related
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102066607A (en) * | 2008-06-20 | 2011-05-18 | Sakti3有限公司 | High volume manufacture of electrochecmicals cells using physical vapor deposition |
| CN105755446A (en) * | 2008-06-20 | 2016-07-13 | Sakti3有限公司 | Method For High Volume Manufacture Of Electrochemical Cells Using Physical Vapor Deposition |
| CN102465266A (en) * | 2010-11-15 | 2012-05-23 | 财团法人工业技术研究院 | Continuous sputtering equipment and manufacturing method of solar selective absorption film |
| CN102212791A (en) * | 2011-06-02 | 2011-10-12 | 爱蓝天高新技术材料(大连)有限公司 | Equipment and method for performing magnetron-controlled sputter coating on polyester type polyurethane foam matrix |
| CN104711521A (en) * | 2015-03-26 | 2015-06-17 | 青州市宝丰镀膜科技有限公司 | Induction heating coating machine with square vacuum chamber |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| IN266855B (en) | ||
| CN109554680B (en) | Winding type vacuum coating machine | |
| CN107245701A (en) | A kind of many target material magnetic sputtering winding film coating machines and film plating process | |
| EP1628323A3 (en) | Anode for sputter coating | |
| CN111235544B (en) | Film coating machine | |
| CN2434311Y (en) | Magnetic controlled spurting foam nickel winding film coater | |
| CN218089774U (en) | Double-sided vacuum magnetron sputtering winding coating machine | |
| CN101492809A (en) | Vacuum magnetron sputtering coil film coating apparatus | |
| CN105671508A (en) | Roll-to-roll magnetron sputtering vacuum coating device | |
| CN110004427A (en) | Flexible continuity magnetron sputtering deposition plating work chamber partition method | |
| CN108823547B (en) | Vacuum plating film material overspeed device tensioner | |
| CN216891172U (en) | Roll-to-roll equipment for electron beam evaporation double-sided coating | |
| CN108611612B (en) | Vacuum sputtering equipment and sputtering method | |
| CN201158699Y (en) | Web Coater | |
| CN210314474U (en) | T-shaped winding vacuum coating equipment with diaphragm valve | |
| CN220619079U (en) | Winding type vacuum coating equipment convenient to assemble and disassemble | |
| CN210886216U (en) | Multi-chamber multi-functional reel-to-reel film coating machine capable of coating multi-layer film in reciprocating mode | |
| CN201358299Y (en) | Vacuum magnetron-sputtering type winding film-coating device | |
| CN216891198U (en) | Novel volume to volume vacuum coating equipment of vacuum container structure | |
| CN2706479Y (en) | Bisurface sputtering vacuum winding continuous film plating equipment | |
| CN219099302U (en) | Roll-to-roll coating equipment | |
| CN201857424U (en) | Novel vacuum coating machine | |
| CN204417578U (en) | A kind of glass fenestrated membrane | |
| CN116334574A (en) | Magnetron sputtering evaporation double-sided film plating device and method | |
| TW201722828A (en) | Method and device for winding long substrate, and long substrate surface processing device provided with winding device |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C19 | Lapse of patent right due to non-payment of the annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |