CN212396285U - Tail gas cleaning device for vapor deposition furnace - Google Patents
Tail gas cleaning device for vapor deposition furnace Download PDFInfo
- Publication number
- CN212396285U CN212396285U CN202020971488.3U CN202020971488U CN212396285U CN 212396285 U CN212396285 U CN 212396285U CN 202020971488 U CN202020971488 U CN 202020971488U CN 212396285 U CN212396285 U CN 212396285U
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- China
- Prior art keywords
- tail gas
- base
- water
- vapor deposition
- cleaning device
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- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000007740 vapor deposition Methods 0.000 title claims abstract description 27
- 238000004140 cleaning Methods 0.000 title claims abstract description 22
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 33
- 238000001914 filtration Methods 0.000 claims abstract description 15
- 239000010865 sewage Substances 0.000 claims description 22
- 239000007921 spray Substances 0.000 claims description 14
- 230000000149 penetrating effect Effects 0.000 claims description 3
- 230000008021 deposition Effects 0.000 abstract 1
- 238000000746 purification Methods 0.000 description 9
- 239000003381 stabilizer Substances 0.000 description 7
- 239000007788 liquid Substances 0.000 description 5
- 239000012530 fluid Substances 0.000 description 4
- 241000883990 Flabellum Species 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 2
- 238000009434 installation Methods 0.000 description 2
- 238000001311 chemical methods and process Methods 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052755 nonmetal Inorganic materials 0.000 description 1
- 238000005240 physical vapour deposition Methods 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000012808 vapor phase Substances 0.000 description 1
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- Filtering Of Dispersed Particles In Gases (AREA)
Abstract
The utility model discloses a tail gas cleaning device for vapor deposition furnace, the on-line screen storage device comprises a base, the top of base is installed a jar body, the air inlet has been seted up at the top of jar body, the observation window is installed to one side of jar body, water-soluble treatment chamber is installed at the inner wall top of jar body, the tail gas pipe is installed to one side of water-soluble treatment chamber, the diaphragm is installed to the bottom of water-soluble treatment chamber, and the tail gas pipe runs through the diaphragm, the water tank is installed to the bottom of diaphragm, a plurality of shower are installed to the bottom of water tank, and a plurality of shower run through in the bottom of water tank, the base is all installed to the inner wall both sides of jar body, the inner wall of jar body is close to the lower extreme of base and is installed filter one, the internally mounted; the utility model discloses can carry out effectual filtration to the tail gas of relative deposition stove, simultaneously the effectual pollution that reduces tail gas to the environment.
Description
Technical Field
The utility model belongs to tail gas cleaning field specifically is a tail gas cleaning device for vapor deposition stove.
Background
The vapor deposition furnace generates tail gas in the using process, so that a device for treating the tail gas of the vapor deposition furnace is required to be manufactured, and the vapor deposition technology is to form a functional or decorative metal, nonmetal or compound coating on the surface of a workpiece by utilizing physical and chemical processes generated in vapor phase. The vapor deposition technology can be divided into chemical vapor deposition, physical vapor deposition and plasma vapor deposition according to a film forming mechanism, and tail gas is treated by a tail gas cleaning device, so that the pollution to the environment caused by direct emission to the atmosphere is avoided.
The tail gas cleaning device of the existing vapor deposition furnace has certain disadvantages when in use, and the tail gas cleaning device of the existing vapor deposition furnace can not fully treat the tail gas when in use and directly discharges the tail gas to cause pollution to the environment; the tail gas cleaning device of the existing vapor deposition furnace can not effectively filter sewage generated by filtering tail gas when in use, and directly causes pollution to the surrounding environment from the sewage to the outside.
SUMMERY OF THE UTILITY MODEL
The utility model aims to provide a tail gas cleaning device for a vapor deposition furnace, which effectively solves the problems that the tail gas cleaning device of the existing vapor deposition furnace can not fully treat the tail gas when in use and directly discharges the tail gas to pollute the environment; the tail gas cleaning device of the existing vapor deposition furnace can not effectively filter sewage generated by filtering tail gas when in use, and directly causes pollution to the surrounding environment from the sewage to the outside.
The purpose of the utility model can be realized by the following technical scheme:
a tail gas cleaning device for a vapor deposition furnace comprises a base, a tank body is arranged at the top of the base, the top of the tank body is provided with an air inlet, one side of the tank body is provided with an observation window, the top of the inner wall of the tank body is provided with a water-soluble processing chamber, a tail gas pipe is arranged on one side of the water-soluble treatment chamber, a transverse plate is arranged at the bottom of the water-soluble treatment chamber, one end of the tail gas pipe penetrates through the bottom of the transverse plate, a water tank is arranged at the bottom of the transverse plate, a plurality of spray pipes are arranged at the bottom of the water tank, and a plurality of spray pipes penetrate through the bottom of the water tank, bases are arranged on both sides of the inner wall of the tank body, the lower end of the inner wall of the tank body close to the base is provided with a first filter plate, the bottom of the tank body is provided with a sewage valve, the front end of the sewage valve is provided with a sewage pipe, a filtering chamber is arranged in the base, and the sewage pipe is connected in the filtering chamber in a penetrating way;
a second filter plate is installed on the inner wall of the base, a fixed block is installed on one side of the second filter plate, and filter holes are formed in the side wall of the second filter plate.
As a further aspect of the present invention, the joint groove is provided at the top of the base, and the bottom of the tank body is clamped into the inside of the base.
As a further proposal of the utility model, the tail gas treatment liquid is stored in the water-soluble treatment chamber, and the water-soluble treatment chamber is arranged in a rectangular shape.
As a further scheme of the utility model, the stabilizer blade is all installed in the bottom four corners of base, four groups the rubber pad is all installed to the bottom of stabilizer blade, and four groups's stabilizer blade are at the bottom parallel arrangement of base.
As a further aspect of the present invention, the filter plate two-way is fixedly mounted on the inner wall of the filtering chamber through the fixing block.
As a further scheme of the utility model, it is two sets of driving motor is all installed to one side of base, and driving motor's front end installs the flabellum, and the internally mounted of water tank has the water pump, and the water pump is connected with the shower.
As a further aspect of the present invention, the shower head is installed at the front end of the shower pipe, and the shower head is a circular arrangement.
The utility model has the advantages that:
the utility model discloses a water-soluble treatment chamber of internally mounted at the jar body deposits tail gas treatment fluid in water-soluble treatment chamber, makes tail gas enter into water-soluble treatment chamber and carry out preliminary purification, and the tail gas of later preliminary purification discharges to the bottom of diaphragm through the tail gas pipe of water-soluble treatment chamber one side, starts the water pump of water tank internally mounted afterwards, makes the water pump drive the tail gas treatment fluid in the water tank and flows out from the shower head of shower front end to the better purification of the tail gas that vapor deposition stove produced;
through the internally mounted filter chamber at the base, at filter chamber installation filter two, effectual tail gas and sewage filter.
Drawings
In order to facilitate understanding for those skilled in the art, the present invention will be further described with reference to the accompanying drawings.
Fig. 1 is a schematic view of the overall structure of the present invention.
Fig. 2 is a cross-sectional view of the overall structure of the present invention.
Fig. 3 is a side view of the second filter plate according to the present invention.
In the figure: 1. a base; 2. a tank body; 3. an air inlet; 4. an observation window; 5. a water-soluble treatment chamber; 6. a tail gas pipe; 7. a transverse plate; 8. a water tank; 9. a shower pipe; 10. a base; 11. a first filter plate; 12. a sewage valve; 13. a filtering chamber; 14. a second filter plate; 15. a fixed block; 16. and (4) filtering holes.
Detailed Description
The technical solution of the present invention will be described clearly and completely with reference to the following embodiments, and it should be understood that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by a person of ordinary skill in the art without creative efforts belong to the protection scope of the present invention.
As shown in figures 1-3, a tail gas cleaning device for a vapor deposition furnace comprises a base 1, a tank body 2 is installed at the top of the base 1, an air inlet 3 is arranged at the top of the tank body 2, an observation window 4 is installed at one side of the tank body 2, a water-soluble treatment chamber 5 is installed at the top of the inner wall of the tank body 2, a tail gas pipe 6 is installed at one side of the water-soluble treatment chamber 5, a transverse plate 7 is installed at the bottom of the water-soluble treatment chamber 5, one end of the tail gas pipe 6 penetrates through the bottom of the transverse plate 7, a water tank 8 is installed at the bottom of the transverse plate 7, a plurality of spray pipes 9 are installed at the bottom of the water tank 8, bases 10 are installed at two sides of the inner wall of the tank body 2, a first filter plate 11 is installed at the lower end, close to the bases 10, a sewage valve 12 is installed at the, a filtering chamber 13 is arranged inside the base 1, and a sewage pipe is connected inside the filtering chamber 13 in a penetrating way;
a second filter plate 14 is arranged on the inner wall of the base 1, a fixed block 15 is arranged on one side of the second filter plate 14, and filter holes 16 are formed in the side wall of the second filter plate 14.
The top of base 1 has seted up the joint recess, and the bottom card of jar body 2 is gone into in the middle of the inboard of base 1.
The tail gas treatment liquid is stored in the water-soluble treatment chamber 5, and the water-soluble treatment chamber 5 is arranged in a rectangular shape.
The stabilizer blade is all installed in the bottom four corners of base 1, and the rubber pad is all installed to the bottom of four groups of stabilizer blades, and four groups of stabilizer blades are at base 1's bottom parallel arrangement, through setting up four groups of stabilizer blades to make base 1 have better stability.
The second filter plate 14 is fixedly arranged on the inner wall of the filter chamber 13 through a fixing block 15.
Driving motor is all installed to one side of two sets of bases 10, and driving motor's front end installs the flabellum, and the internally mounted of water tank 8 has the water pump, and the water pump is connected with shower 9, through installing driving motor and flabellum in one side of base 10 to effectual stirring tail gas.
The front ends of the groups of spray pipes 9 are provided with spray heads which are arranged in a circular shape, and the spray pipes 9 and the spray heads are arranged to enable tail gas treatment liquid stored in the water tank 8 to be sprayed out to filter tail gas.
A tail gas cleaning device for a vapor deposition furnace, when in use, firstly a tank body 2 is fixed at the top of a base 1, then tail gas enters into the inside of a water-soluble treatment chamber 5 through an air inlet 3, tail gas treatment liquid is stored in the water-soluble treatment chamber 5, so that the tail gas enters into the water-soluble treatment chamber 5 for preliminary purification, then the preliminarily purified tail gas is discharged to the bottom of a transverse plate 7 through a tail gas pipe 6 at one side of the water-soluble treatment chamber 5, then a water pump arranged inside the water tank 8 is started, the water pump drives the tail gas treatment liquid in the water tank 8 to flow out from a spray head at the front end of a spray pipe 9, then a driving motor arranged at one side of a base 10 is started, the driving motor drives fan blades to rotate, flowing air flow is generated inside the tank body 2, so that the preliminarily purified tail gas flows in the tank body 2 under the rotation of the fan blades, and then the preliminarily purified tail gas is sprayed by the, better carry out secondary purification to tail gas, through observation window 4 in jar body 2 one side to see through observation window 4 and observe the condition of jar body 2 when handling tail gas, the tail gas that has carried out secondary purification afterwards and filter the sewage that produces from filter 11 and filter, open the sewage valve 12 of jar body 2 one side after filtering, discharge tail gas and sewage through sewage valve 12 in filter chamber 13, through filter two 14 of installation in filter chamber 13, filter tail gas and sewage through filtration pore 16, discharge through the drain in one side of base 1 after filtering afterwards.
The utility model discloses an at the internally mounted water-soluble treatment chamber 5 of jar body 2, put tail gas treatment fluid in water-soluble treatment chamber 5, make tail gas enter into water-soluble treatment chamber 5 and carry out preliminary purification, the tail gas of later preliminary purification discharges to the bottom of diaphragm 7 through tail gas pipe 6 of water-soluble treatment chamber 5 one side, start the water pump of 8 internally mounted of water tank afterwards, make the water pump drive the tail gas treatment fluid in the water tank 8 and flow out from the shower head of 9 front ends of shower, thereby to the better purification of the tail gas that the vapor deposition stove produced; by installing the filter chamber 13 inside the base 1 and installing the second filter plate 14 inside the filter chamber 13, the tail gas and the sewage can be effectively filtered.
The preferred embodiments of the present invention disclosed above are intended only to help illustrate the present invention. The preferred embodiments are not intended to be exhaustive or to limit the invention to the precise embodiments disclosed. Obviously, many modifications and variations are possible in light of the above teaching. The embodiments were chosen and described in order to best explain the principles of the invention and its practical applications, to thereby enable others skilled in the art to best understand the invention for and utilize the invention. The present invention is limited only by the claims and their full scope and equivalents.
Claims (7)
1. A tail gas cleaning device for a vapor deposition furnace comprises a base (1), and is characterized in that: the tank is characterized in that a tank body (2) is installed at the top of a base (1), an air inlet (3) is formed in the top of the tank body (2), an observation window (4) is installed on one side of the tank body (2), a water-soluble treatment chamber (5) is installed at the top of the inner wall of the tank body (2), a tail gas pipe (6) is installed on one side of the water-soluble treatment chamber (5), a transverse plate (7) is installed at the bottom of the water-soluble treatment chamber (5), one end of the tail gas pipe (6) penetrates through the bottom of the transverse plate (7), a water tank (8) is installed at the bottom of the transverse plate (7), a plurality of spray pipes (9) are installed at the bottom of the water tank (8), a base (10) is installed on two sides of the inner wall of the tank body (2), and a first filter plate (11) is installed on the inner wall of the tank body (, a sewage valve (12) is installed at the bottom of the tank body (2), a sewage pipe is installed at the front end of the sewage valve (12), a filtering chamber (13) is installed inside the base (1), and the sewage pipe is connected inside the filtering chamber (13) in a penetrating mode;
the filter plate II (14) is installed on the inner wall of the base (1), the fixing block (15) is installed on one side of the filter plate II (14), and the side wall of the filter plate II (14) is provided with filter holes (16).
2. The tail gas cleaning device for the vapor deposition furnace according to claim 1, wherein a clamping groove is formed in the top of the base (1), and the bottom of the tank body (2) is clamped into the inner side of the base (1).
3. The exhaust gas cleaning device for the vapor deposition furnace according to claim 1, wherein the water-soluble treatment chamber (5) contains an exhaust gas treatment solution therein, and the water-soluble treatment chamber (5) is rectangular.
4. The tail gas cleaning device for the vapor deposition furnace according to claim 1, wherein four corners of the bottom of the base (1) are provided with support legs, four groups of the support legs are provided with rubber pads, and the four groups of the support legs are arranged in parallel at the bottom of the base (1).
5. The exhaust gas cleaning apparatus for a vapor deposition furnace according to claim 1, wherein the second filter plate (14) is fixedly mounted on the inner wall of the filter chamber (13) by a fixing block (15).
6. The tail gas cleaning device for the vapor deposition furnace according to claim 1, wherein a driving motor is installed on one side of each of the two groups of bases (10), fan blades are installed at the front end of each driving motor, a water pump is installed inside the water tank (8), and the water pump is connected with the spray pipe (9).
7. The tail gas cleaning device for the vapor deposition furnace according to claim 1, wherein the front ends of the groups of the spray pipes (9) are provided with spray headers, and the spray headers are arranged in a circular shape.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202020971488.3U CN212396285U (en) | 2020-06-01 | 2020-06-01 | Tail gas cleaning device for vapor deposition furnace |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202020971488.3U CN212396285U (en) | 2020-06-01 | 2020-06-01 | Tail gas cleaning device for vapor deposition furnace |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN212396285U true CN212396285U (en) | 2021-01-26 |
Family
ID=74408252
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202020971488.3U Expired - Fee Related CN212396285U (en) | 2020-06-01 | 2020-06-01 | Tail gas cleaning device for vapor deposition furnace |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN212396285U (en) |
-
2020
- 2020-06-01 CN CN202020971488.3U patent/CN212396285U/en not_active Expired - Fee Related
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20210126 |
|
| CF01 | Termination of patent right due to non-payment of annual fee |