CN216248759U - Double-column double-sided exposure machine - Google Patents
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Abstract
本实用新型的双列双面曝光机,包括设置于机架上的第一传送装置、第一曝光装置、第二传送装置、第二曝光装置和第三传送装置。第一传送装置用于进料,第二传送装置对接第一曝光装置和第二曝光装置,第三传送装置用于出料。第一传送装置、第二传送装置和第三传送装置均包括并列设置的两传送机构。第一曝光装置包括两第一曝光平台和两第一曝光模组,两第一曝光模组共用一个第一光源组件。第二曝光装置包括两第二曝光平台和两第二曝光模组,两第二曝光模组共用一个第二光源组件。本实用新型的双列双面曝光机,可以双列四工位进行曝光,不仅效率高,而且部分部件共用,节约了成本。本实用新型的双列双面曝光机,结构合理效率高。
The double-column double-sided exposure machine of the utility model comprises a first conveying device, a first exposing device, a second conveying device, a second exposing device and a third conveying device arranged on the frame. The first conveying device is used for feeding, the second conveying device is connected to the first exposing device and the second exposing device, and the third conveying device is used for discharging. The first conveying device, the second conveying device and the third conveying device all include two conveying mechanisms arranged in parallel. The first exposure device includes two first exposure platforms and two first exposure modules, and the two first exposure modules share a first light source assembly. The second exposure device includes two second exposure platforms and two second exposure modules, and the two second exposure modules share a second light source assembly. The double-column and double-sided exposure machine of the utility model can perform exposure in two columns and four stations, which not only has high efficiency, but also shares some parts and saves the cost. The double-column double-sided exposure machine of the utility model has reasonable structure and high efficiency.
Description
技术领域technical field
本实用新型涉及曝光机技术领域,尤其涉及一种双列双面曝光机。The utility model relates to the technical field of exposure machines, in particular to a double-column double-sided exposure machine.
背景技术Background technique
全自动的双面曝光机,通常是将各作业流程设计于同一平面及同一轴线进行,而基本的作业流程有入料、第一面曝光、翻板、第二面曝光和出料等流程。但全自动的双面曝光机中间工序较多,很多情况下各工序等待的时间较长,影响了生产效率。The fully automatic double-sided exposure machine is usually designed to carry out each operation process on the same plane and the same axis, and the basic operation process includes feeding, first-side exposure, flipping, second-side exposure and material discharge. However, there are many intermediate processes in the fully automatic double-sided exposure machine, and in many cases, the waiting time for each process is long, which affects the production efficiency.
因此,有必要提供一种结构合理效率高的双列双面曝光机。Therefore, it is necessary to provide a double-column double-side exposure machine with reasonable structure and high efficiency.
实用新型内容Utility model content
本实用新型的目的在于提供一种结构合理效率高的双列双面曝光机。The purpose of the utility model is to provide a double-column double-sided exposure machine with reasonable structure and high efficiency.
为实现上述目的,本实用新型提供了一种双列双面曝光机,包括设置于机架上的第一传送装置、第一曝光装置、第二传送装置、第二曝光装置和第三传送装置,第一传送装置位于第一曝光装置的前端,第二传送装置位于第一曝光装置和第二曝光装置之间,第三传送装置位于第二曝光装置的后端,第一传送装置、第二传送装置和第三传送装置均包括并列设置的两传送机构;第一曝光装置用于曝光工件的一面,第一曝光装置包括两第一曝光平台,两第一曝光平台上均设置有第一曝光模组,两第一曝光模组上还设置有能在两第一曝光模组之间移动的第一光源组件;第二传送装置上设置有翻板装置,翻板装置包括与两第一曝光平台对接的翻转机构,翻转机构用于翻转工件;第二曝光装置用于曝光工件的另一面,第二曝光装置包括与翻转机构对接的两第二曝光平台,两第二曝光平台上均设置有第二曝光模组,两第二曝光模组上还设置有能在两第二曝光模组之间移动的第二光源组件。In order to achieve the above purpose, the utility model provides a double-column double-sided exposure machine, comprising a first conveying device, a first exposure device, a second conveying device, a second exposure device and a third conveying device arranged on a frame , the first conveying device is located at the front end of the first exposure device, the second conveying device is located between the first exposure device and the second exposure device, the third conveying device is located at the rear end of the second exposure device, the first conveying device, the second The conveying device and the third conveying device both include two conveying mechanisms arranged in parallel; the first exposure device is used for exposing one side of the workpiece, the first exposure device includes two first exposure platforms, and the first exposure platforms are both provided with first exposure platforms. module, the two first exposure modules are also provided with a first light source assembly that can move between the two first exposure modules; the second conveying device is provided with a flip device, the flip device includes and the two first exposure modules. The inversion mechanism of the platform docking, the inversion mechanism is used to invert the workpiece; the second exposure device is used for exposing the other side of the workpiece, the second exposure device includes two second exposure platforms docked with the inversion mechanism, and both second exposure platforms are provided with The second exposure module is further provided with a second light source assembly capable of moving between the two second exposure modules.
较佳地,传送机构上设置有多组滚轮组件,滚轮组件包括滚轴和套设于滚轴上的多个滚轮,滚轮与滚轴之间有间隙,滚轮上放置有工件时,滚轮的转速小于滚轴的转速。Preferably, a plurality of groups of roller assemblies are arranged on the transmission mechanism. The roller assemblies include rollers and a plurality of rollers sleeved on the rollers. There is a gap between the rollers and the rollers. less than the rotational speed of the rollers.
较佳地,第一传送装置和第三传送装置上均设置有能在两传送机构之间活动的取料机械手,取料机械手用于搬运切换两传送机构上的工件。Preferably, both the first conveying device and the third conveying device are provided with a reclaiming manipulator that can move between the two conveying mechanisms, and the reclaiming manipulator is used to transport and switch the workpieces on the two conveying mechanisms.
较佳地,第一曝光装置和第二曝光装置的前端均设置有位于传送机构上的整料机构,借由整料机构以预定位工件,以使工件能更好的进行对位曝光。Preferably, the front ends of the first exposure device and the second exposure device are provided with a monolithic mechanism located on the conveying mechanism, and the workpiece can be pre-positioned by the monolithic mechanism, so that the workpiece can be better aligned and exposed.
较佳地,每第一曝光平台上还设置有第一取料机构,第一取料机构呈滑动的设置于机架上并能在第一传送装置和第一曝光平台之间滑动,以能将第一传送装置上的工件搬运至所述第一曝光平台上。Preferably, each first exposure platform is also provided with a first reclaiming mechanism, and the first reclaiming mechanism is slidably arranged on the frame and can slide between the first conveying device and the first exposure platform, so as to be able to slide. The workpieces on the first conveyor are transported to the first exposure platform.
较佳地,第一取料机构包括相对设置的两个取料组件,两取料组件之间设置有连杆组件,借由调节连杆组件以调节两取料组件之间的距离以使第一取料机构能拾取各种尺寸的工件。Preferably, the first reclaiming mechanism includes two oppositely arranged reclaiming assemblies, a connecting rod assembly is arranged between the two reclaiming assemblies, and the distance between the two reclaiming assemblies can be adjusted by adjusting the connecting rod assembly to make the first reclaiming assembly. A pick-up mechanism can pick up workpieces of various sizes.
较佳地,第一曝光平台呈升降的设置于机架上,第一曝光模组可移动的设置于机架上,第一曝光模组上设置有曝光玻璃,借由操作第一曝光模组以使第一曝光模组滑出机架外以便在曝光玻璃上贴菲林面。Preferably, the first exposure platform is arranged on the frame in a lifting manner, the first exposure module is movably arranged on the frame, and the exposure glass is arranged on the first exposure module, and the first exposure module is operated by operating the first exposure module. In order to make the first exposure module slide out of the frame so as to stick the film surface on the exposure glass.
较佳地,第一曝光装置上还设置有CCD检测机构,第一曝光装置与翻板装置之间设置有NG暂存装置,NG暂存装置设置于第二传送装置上,CCD检测机构用于检测所述工件,NG暂存装置用于暂存检测不合格的工件。Preferably, a CCD detection mechanism is also provided on the first exposure device, a NG temporary storage device is arranged between the first exposure device and the turning device, the NG temporary storage device is arranged on the second conveying device, and the CCD detection mechanism is used for The workpiece is detected, and the NG temporary storage device is used to temporarily store the workpieces that fail to pass the inspection.
较佳地,NG暂存装置包括升降框架和位于升降框架两侧的置物机构,每置物机构均连接有设置于升降框架上的升降机构,第二传送装置上设置有与置物机构配合的避位部,借由升降机构以使置物机构沿升降框架在避位部上递升或递降,置物机构上层设有多个用于放料的放料位。Preferably, the NG temporary storage device includes a lifting frame and an object storage mechanism located on both sides of the lifting frame. Each object storage mechanism is connected with a lifting mechanism arranged on the lifting frame. The upper layer of the storage mechanism is provided with a plurality of discharging positions for discharging materials.
较佳地,翻转机构包括翻转框架以及设置于翻转框架上的第一传送组件和第二传送组件,工件于第一传送组件和第二传送组件之间传送,第一传送组件和第二传送组件之间设置有可活动的挡料组件,第一传送组件或第二传送组件对接第二传送装置上的传送机构,翻转框架连接有动力组件,动力组件动作以使翻转框架带动第一传送组件和第二传送组件翻转并互换位置,从而使得工件翻面。Preferably, the turning mechanism includes a turning frame and a first conveying assembly and a second conveying assembly arranged on the turning frame, the workpiece is conveyed between the first conveying assembly and the second conveying assembly, and the first conveying assembly and the second conveying assembly A movable material stop assembly is arranged between, the first conveying assembly or the second conveying assembly is connected to the conveying mechanism on the second conveying device, and the overturning frame is connected with a power assembly, and the power assembly acts to make the overturning frame drive the first conveying assembly and the The second transfer assembly flips and reverses positions, thereby flipping the workpiece.
与现有技术相比,本实用新型的双列双面曝光机,包括设置于机架上的第一传送装置、第一曝光装置、第二传送装置、第二曝光装置和第三传送装置。第一传送装置用于进料,第二传送装置对接第一曝光装置和第二曝光装置,第三传送装置用于出料。第一传送装置、第二传送装置和第三传送装置均包括并列设置的两传送机构。第一曝光装置包括两第一曝光平台和两第一曝光模组,两第一曝光模组共用一个第一光源组件。第二曝光装置包括两第二曝光平台和两第二曝光模组,两第二曝光模组共用一个第二光源组件。本实用新型的双列双面曝光机,可以双列四工位进行曝光,不仅效率高,而且部分部件共用节约了成本。本实用新型的双列双面曝光机,结构合理效率高。Compared with the prior art, the double-column double-side exposure machine of the present invention includes a first conveying device, a first exposing device, a second conveying device, a second exposing device and a third conveying device arranged on the frame. The first conveying device is used for feeding, the second conveying device is connected to the first exposing device and the second exposing device, and the third conveying device is used for discharging. The first conveying device, the second conveying device and the third conveying device all include two conveying mechanisms arranged in parallel. The first exposure device includes two first exposure platforms and two first exposure modules, and the two first exposure modules share a first light source assembly. The second exposure device includes two second exposure platforms and two second exposure modules, and the two second exposure modules share a second light source assembly. The double-column double-sided exposure machine of the utility model can perform exposure in two columns and four stations, which not only has high efficiency, but also saves costs by sharing some parts. The double-column double-sided exposure machine of the utility model has reasonable structure and high efficiency.
附图说明Description of drawings
为了更清楚地说明本实用新型实施例技术方案,下面将对实施例描述中所需要使用的附图作简单地介绍,显而易见地,下面描述中的附图是本实用新型的一些实施例,对于本领域普通技术人员来讲,在不付出创造性劳动的前提下,还可以根据这些附图获得其他的附图。In order to illustrate the technical solutions of the embodiments of the present invention more clearly, the following briefly introduces the accompanying drawings used in the description of the embodiments. Obviously, the drawings in the following description are some embodiments of the present invention. For those of ordinary skill in the art, other drawings can also be obtained from these drawings without any creative effort.
图1是本实用新型一实施例提供的双列双面曝光机的结构图。FIG. 1 is a structural diagram of a double-column double-sided exposure machine provided by an embodiment of the present invention.
图2是图1中第一传送装置的结构图。FIG. 2 is a structural diagram of the first conveying device in FIG. 1 .
图3是图1中第一曝光装置的结构图。FIG. 3 is a structural diagram of the first exposure apparatus in FIG. 1 .
图4是图3中A处的放大图。FIG. 4 is an enlarged view of A in FIG. 3 .
图5是图3中第一取料机构的结构图。FIG. 5 is a structural diagram of the first reclaiming mechanism in FIG. 3 .
图6是图1中NG暂存装置的结构图。FIG. 6 is a structural diagram of the NG temporary storage device in FIG. 1 .
图7是图1中第二传送装置中与NG暂存装置配合的避位部的结构图。FIG. 7 is a structural diagram of a position avoidance part in the second conveying device in FIG. 1 that cooperates with the NG temporary storage device.
图8是图1中翻转机构的结构图。FIG. 8 is a structural diagram of the inversion mechanism in FIG. 1 .
附图标记说明:Description of reference numbers:
100、双列双面曝光机;101、机架;100. Double-column double-sided exposure machine; 101. Rack;
10、第一传送装置;102、传送机构;11、滚轮组件;111、滚轴;112、滚轮;113、避位部;12、取料机械手;13、挡料机构;14、整料机构;10. The first conveying device; 102, the conveying mechanism; 11, the roller assembly; 111, the roller; 112, the roller; 113, the avoidance part;
20、第一曝光装置;21、第一取料机构;211、取料组件;2111、取料吸盘;212、连杆组件;22、第一曝光平台;23、第一曝光模组;231、把手;24、第一光源组件;25、第二取料机构;20, the first exposure device; 21, the first reclaiming mechanism; 211, the reclaiming assembly; 2111, the reclaiming suction cup; 212, the connecting rod assembly; 22, the first exposure platform; 23, the first exposure module; 231, handle; 24, the first light source assembly; 25, the second reclaiming mechanism;
30、第二传送装置;30. The second conveying device;
40、NG暂存装置;41、升降框架;42、置物机构;421、放料件;422、放料位;43、升降机构;40, NG temporary storage device; 41, lift frame; 42, storage mechanism; 421, discharge part; 422, discharge position; 43, lift mechanism;
50、翻板装置;501、翻转机构;51、翻转框架;52、第一传送组件;53、第二传送组件;54、动力组件;55、挡料组件;50, turning device; 501, turning mechanism; 51, turning frame; 52, first conveying assembly; 53, second conveying assembly; 54, power assembly; 55, stopper assembly;
60、第二曝光装置;60. A second exposure device;
70、第三传送装置。70. A third transmission device.
具体实施方式Detailed ways
为了详细说明本实用新型的技术内容、构造特征,以下结合实施方式并配合附图作进一步说明。In order to describe the technical content and structural features of the present utility model in detail, further description is given below with reference to the embodiments and the accompanying drawings.
请参阅图1至,本实用新型提供了一种双列双面曝光机100,包括在机架101上依次排布的第一传送装置10、第一曝光装置20、第二传送装置30、第二曝光装置60和第三传送装置70。其中,第一传送装置10位于第一曝光装置20的前端,第二传送装置30位于第一曝光装置20和第二曝光装置60之间,第三传送装置70位于第二曝光装置60的后端。第一传送装置10、第二传送装置30和第三传送装置70均包括并列设置的两传送机构102。第一曝光装置20用于曝光工件的一面,第一曝光装置20包括两第一曝光平台22,两第一曝光平台22上均设置有第一曝光模组23,两第一曝光模组23上还设置有能在两第一曝光模组23之间移动的第一光源组件24。第二传送装置30上设置有NG暂存装置40和翻板装置50。NG暂存装置40用于暂存检测NG的工件。翻板装置50包括与两第一曝光平台22对接的翻转机构501,翻转机构501用于翻转工件。第二曝光装置60用于曝光工件的另一面,第二曝光装置60的结构与第一曝光装置20的结构相同。第二曝光装置60包括与翻转机构501对接的两第二曝光平台,两第二曝光平台上均设置有第二曝光模组,两第二曝光模组上还设置有能在两第二曝光模组之间移动的第二光源组件。本实用新型的双列双面曝光机100,双列传送和曝光,效率高,而且第一曝光装置20和第二曝光装置60共用光源组件,有效的节约了成本。Referring to FIGS. 1 to 1 , the present invention provides a double-column double-
请参阅图2,在一些可选的实施例中,第一传送装置10、第二传送装置30和第三传送装置70均包括并列设置的两传送机构102。传送机构102上设置有多组滚轮组件11,滚轮组件11包括滚轴111和套设于滚轴111上的多个滚轮112,工件在滚轮112上传送。滚轮112与滚轴111之间有间隙,及滚轴111在带动滚轮112传送时,滚轴111和滚轮112之间还存在滑动现象,从而使得在滚轮112上放置有工件时,滚轮112的转速小于滚轴111的转速。可以理解的,当滚轮112上放置工件时,在工件重力的作用下,滚轮112会有一个向下的力,使得滚轮112和滚轴111之间产生相对滑动,进而使得滚轮112的转速小于滚轴111的转速,以免滚轮112在带动工件转动时,较高的转速使得滚轮112与工件之间有较大的相对滑动,而使滚轮112摩擦到工件。在本实施例中,工件双面印油以待双面曝光,若工件与传送滚轮112之间的摩擦较大,则会刮伤工件,影响曝光效果。本实用新型的传送机构102中,滚轮112与滚轴111之间有一定的间隙,可以避免刮伤工件,传送效果好。Referring to FIG. 2 , in some optional embodiments, the first conveying
请参阅图2,在一些可选的实施例中,第一传送装置10和第三传送装置70上均设置有能在两传送机构102之间活动的取料机械手12,取料机械手12用于搬运切换两传送机构102上的工件。第一传送装置10和第三传送装置70的结构类似,第一传送装置10用于进料,第三传送装置70用于出料。具体地,在第一传送装置10和第三传送装置70上还设置有挡料机构13和整料机构14。挡料机构13用于挡料,在第一传送装置10上,挡料机构13将工件暂停在传送机构102上以暂缓工件进入第一曝光装置20。即在上工件未完成第一面曝光时,通过挡料机构13暂停工件传送。当第一曝光装置20上的检测装置检测到两曝光平台上的任意一个第一曝光平台22上的工件已完成曝光,则挡料机构13可以放行工件;或当该第一曝光平台22对应的传送机构102上没有工件时,可以通过取料机械手12拾取另一传送机构102上的工件放置于相应的传送机构102上,以使工件传送到空置的第一曝光平台22上,结构设计合理。在第三传送装置70上,挡料机构13将工件暂停在传送机构102上以暂缓第二曝光装置60上的工件流出到下工序。第三传送装置70上的取料机械手12亦用于搬运切换两传送机构102上的工件,以使工件能够更好更高效的被运输传送。第一传送装置10、第二传送装置30和第三传送装置70上均设置有使工件居中传送的居中机构。其中,第一曝光装置20和第二曝光装置60的前端均设置有位于传送机构102上的整料机构14,借由整料机构14以预定位工件,以使工件能更好的进行对位曝光。设置有整料机构14,使得工件能够更好的进行定位,亦使得第一曝光装置20和第二曝光装置60上的第一取料机构21和第二取料机构25能更好的进行取料。在第一曝光装置20和第二曝光装置60的后端还设置有供第二第二取料机构25放料的缓冲区。Referring to FIG. 2 , in some optional embodiments, both the first conveying
请参阅图3至图5,在一些可选的实施例中,每第一曝光平台22上还设置有第一取料机构21,第一取料机构21呈滑动的设置于机架101上并能在第一传送装置10和第一曝光平台22之间滑动,以能将第一传送装置10上的工件搬运至第一曝光平台22上。在第一曝光平台22的另一端还设置有第二取料机构25,第二取料机构25的结构与第一取料机构21的结构大致相同,第二取料机构25用于将第一曝光平台22上曝光完成的工件拾取放置到第二传送装置30上。具体地,第一取料机构21包括相对设置的两个取料组件211,取料组件211上设置有多个取料吸盘2111。两取料组件211之间设置有连杆组件212,借由调节连杆组件212以调节两取料组件211之间的距离,以使第一取料机构21能拾取各种尺寸的工件。连杆组件212动作以使两第一取料机构21沿两侧的滑轨滑动,从而使得两第一取料机构21能够相互靠近或远离。Referring to FIGS. 3 to 5 , in some optional embodiments, each
请参阅图3和图4,在一些可选的实施例中,第一曝光平台22呈升降的设置于机架101上,第一曝光模组23位于第一曝光平台22的上方。当第一取料机构21拾取工件放置于第一曝光平台22后,第一曝光平台22上升靠近第一曝光模组23以能进行曝光。另一方面,第一曝光模组23可移动的设置于机架101上,第一曝光模组23可以在第一曝光装置20的侧边沿水平方向进行移动。第一曝光模组23上设置有曝光玻璃,还设置有可以拉动的把手231,借由拉动把手231以使第一曝光模组23滑出机架101外以便在曝光玻璃上贴菲林面。在本实施例中,第二曝光装置60的结构与第一曝光装置20的结构相同。Referring to FIG. 3 and FIG. 4 , in some optional embodiments, the
请参阅图3和图6,在一些可选的实施例中,第一曝光装置20的两第一曝光平台22上还设置有CCD检测机构,CCD检测机构包括曝光前的CCD检测组件和曝光后的CCD检测组件。第一曝光装置20与翻板装置50之间设置有NG暂存装置40,NG暂存装置40设置于第二传送装置30上,CCD检测机构用于检测所述工件,NG暂存装置40用于暂存检测不合格的工件。Please refer to FIG. 3 and FIG. 6 , in some optional embodiments, the two
请参阅图6和图7,在一些可选的实施例中,NG暂存装置40包括升降框架41和位于升降框架41两侧的置物机构42,每置物机构42均连接有设置于升降框架41上的升降机构43,在升降机构43的作用下以使置物机构42沿升降框架41在第二传送装置30上递升或递降。升降机构43可以包括电机和丝杆。其中,在第二传送装置30上设置有与置物机构42配合的避位部113,置物机构42上层设有多个用于放料的放料位422。每个放料位422在同一水平线上设置有多根放料件421,每层放料位422的多根放料件421的位置大致相同,以使多根放料件421在水平和竖直方向上均整齐排布。可以理解的,在竖直方向的同一列放料件421位于一避位部113内,并在升降机构43的作用下实现放料位422的逐级递升。放料位422递升时抬升第二传送装置30上的工件并使下一个放料位422上的放料件421位于第二传送装置30的传送面下,以免影响工件的传送。Referring to FIGS. 6 and 7 , in some optional embodiments, the NG
请参阅图8,在一些可选的实施例中,翻转机构501包括翻转框架51以及设置于翻转框架51上的第一传送组件52和第二传送组件53,工件于第一传送组件52和第二传送组件53之间传送。其中,在第一传送组件52和第二传送组件53之间设置有可活动的挡料组件55,挡料组件55活动以挡住第一传送组件52和第二传送组件53之间的间隙,以免翻转时工件滑出第一传送组件52和第二传送组件53外。第一传送组件52或第二传送组件53对接第二传送装置30上的传送机构102,翻转框架51连接有动力组件54,动力组件54可以包括电机和同步带组件等。动力组件54动作以使翻转框架51带动第一传送组件52和第二传送组件53翻转并互换位置,从而使得工件翻面。翻转后的工件通过第一传送组件52或第二传送组件53在第二传送装置30上传送,并通过第二传送装置30传送至第二曝光装置60内。Referring to FIG. 8 , in some optional embodiments, the
如图1至图8所示,本实用新型的双列双面曝光机100,包括设置于机架101上的第一传送装置10、第一曝光装置20、第二传送装置30、第二曝光装置60和第三传送装置70。第一传送装置10用于进料,第二传送装置30对接第一曝光装置20和第二曝光装置60,第三传送装置70用于出料。第一传送装置10、第二传送装置30和第三传送装置70均包括并列设置的两传送机构102。第一曝光装置20包括两第一曝光平台22和两第一曝光模组23,两第一曝光模组23共用一个第一光源组件24。第二曝光装置60包括两第二曝光平台和两第二曝光模组,两第二曝光模组共用一个第二光源组件。本实用新型的双列双面曝光机100,可以双列四工位进行曝光,效率高,而且部分部件共用节约了成本。本实用新型的双列双面曝光机100,可衔接自动上下料,全自动曝光,NG产品自动暂存,效率高,对位精度高,曝光效果好。As shown in FIGS. 1 to 8 , the double-column double-
以上所揭露的仅为本实用新型的较佳实例而已,不能以此来限定本实用新型之权利范围,因此依本实用新型权利要求所作的等同变化,均属于本实用新型所涵盖的范围。The above disclosures are only preferred examples of the present invention, and cannot limit the scope of the rights of the present invention. Therefore, the equivalent changes made according to the claims of the present invention belong to the scope of the present invention.
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