CN216217686U

CN216217686U - Supporting structure and electron acceleration system

Info

Publication number: CN216217686U
Application number: CN202120973815.3U
Authority: CN
Inventors: 吕约澎; 崔爱军; 韩广文; 王常强; 余国龙
Original assignee: China Institute of Atomic of Energy
Current assignee: China Institute of Atomic of Energy
Priority date: 2021-05-08
Filing date: 2021-05-08
Publication date: 2022-04-05
Anticipated expiration: 2031-05-08

Abstract

The embodiment of the application discloses bearing structure and electron acceleration system includes: a first support frame configured to support an electron accelerator; the frame is arranged opposite to the first support frame; the substrate is arranged on the top surface of the frame; the first supporting part is arranged on one side of the frame close to the first supporting frame; a first through hole is formed on the substrate, the second supporting part and the upright post supporting unit are respectively arranged at two sides of the first through hole, and the upright post supporting unit extends downwards from the bottom surface of the substrate; one end of the beam transmission system is connected with the electron accelerator, and the rest of the beam transmission system is supported on the first supporting part and the second supporting part, extends along the horizontal direction, downwards passes through the first through hole, and is supported on the upright post supporting unit and extends downwards along the vertical direction. The supporting structure and the electronic acceleration system have the advantages that the three-dimensional space can be fully utilized, and occupied land is saved.

Description

Supporting structure and electron acceleration system

Technical Field

The present application relates to the field of electron accelerators, and in particular, to a support structure and an electron acceleration system.

Background

An accelerator is a device that increases the velocity (kinetic energy) of charged particles, i.e., a device that manually accelerates charged particles to a higher energy. Electrons, protons, deuterons, alpha particles and other heavy ions of various energies can be generated using this device. By the interaction of these directly accelerated charged particles with matter, it is also possible to generate a variety of charged and uncharged secondary particles, like gamma particles, neutrons and a variety of mesons, superons, antiparticles, etc. The electron accelerator can generate and accelerate electrons to obtain electron beams with different energy sections, and the electron beams can serve as high-energy particle flow in the internal space after entering a specific vacuum space, so that the space environment simulation effect is achieved. However, with the increasing requirements of scientific research on electron energy, scientists can only develop electron accelerators with ever-increasing lengths and heights, and the requirements on sites are extremely high.

Disclosure of Invention

In view of this, embodiments of the present disclosure are directed to providing a supporting structure and an electronic acceleration system, which can fully utilize a three-dimensional space and save a floor space.

In order to achieve the above purpose, the technical solution of the embodiment of the present application is implemented as follows:

a support structure for supporting an electron accelerator and beam delivery system, comprising: a first support frame configured to support the electron accelerator; the second support frame comprises a frame, a base plate, a first support part, a second support part and an upright post support unit; the frame is arranged opposite to the first support frame; the substrate is arranged on the top surface of the frame; the first supporting part is arranged on one side of the frame close to the first supporting frame; a first through hole is formed in the substrate, the second supporting part and the upright post supporting unit are respectively arranged on two sides of the first through hole, and the upright post supporting unit extends downwards from the bottom surface of the substrate; one end of the beam transmission system is connected with the electron accelerator, and the rest of the beam transmission system is supported on the first supporting part and the second supporting part, extends along the horizontal direction, downwards penetrates through the first through hole, and is supported on the upright post supporting unit and extends downwards along the vertical direction.

Further, the stand support unit includes a plurality of backup pads and the frame body that is formed by four stands, the one end of the frame body with the bottom surface of base plate is connected, vertical direction downwardly extending is followed to the other end of the frame body, the backup pad middle part has the second through-hole, the backup pad is erect along vertical direction interval in proper order in the frame body, and is a plurality of the second through-hole with first through-hole forms the passageway.

Further, the stand has arranged a plurality of first screw from last to down along vertical direction, the backup pad with first screw bolted connection.

Furthermore, the upright post supporting unit comprises a third supporting part, and a plurality of second screw holes are arranged on the outer side surface of the upright post, which is far away from the supporting plate, from top to bottom along the vertical direction; the third supporting part is connected with the second screw hole through a bolt.

Further, the upright post supporting unit comprises a fixing plate and a hanging rod, wherein the fixing plate is fixedly arranged at one end, far away from the base plate, of the frame body; the suspension rod is arranged on the support plate closest to the fixing plate.

Further, the frame comprises a plurality of longitudinal first pipes, a plurality of transverse second pipes and a plurality of inclined supporting rods, and the first pipes and the second pipes are welded and fixed; the inclined supporting rod is fixedly supported between the first pipe and the second pipe to form a triangular structure.

Further, the first supporting part comprises an L-shaped plate, a triangular plate, a horizontal plate and a plurality of supporting screws; the L-shaped plate comprises a first sub-plate and a second sub-plate which are integrally connected and mutually perpendicular, the horizontal plate and the first sub-plate are oppositely arranged at intervals, and the second sub-plate is fixedly connected with one side of the frame close to the first supporting frame; the plurality of support screws are supported between the horizontal plate and the first sub-plate.

Furthermore, the second supporting part is a V-shaped frame body, and an included angle between the second supporting part and the substrate is formed.

Further, the first support frame comprises a panel for supporting the electron accelerator, a plurality of support columns and a plurality of adjusting devices, wherein the panel is provided with a plurality of positioning holes, the support columns are supported below the panel, the adjusting devices are arranged at the bottom ends of the support columns, and the adjusting devices are configured to adjust the height of the panel;

furthermore, the adjusting device comprises an upper wedge block, a lower wedge block, a positioning column and a locking stud, a sliding rail is formed at the bottom of the upper wedge block, a sliding groove matched with the sliding rail is formed at the top of the lower wedge block, and the bottom end of the supporting column is fixedly connected with the upper wedge block; a waist-shaped hole is formed at the bottom end of the positioning column, positioning grooves are formed on two sides of the upper wedge-shaped block, the positioning column upwards penetrates into the positioning grooves, and the bottom end of the positioning column is connected with the lower wedge-shaped block through a bolt; the locking stud sequentially penetrates through the upper wedge block and the lower wedge block to realize fixation.

An electron acceleration system comprises a shielding hall, a vacuum chamber electron accelerator, a beam transmission system and the support structure; the electron accelerator and the beam transmission system are supported on the supporting structure, the vacuum chamber is connected with the beam transmission system, and the shielding hall covers the vacuum chamber, the electron accelerator, the beam transmission system and the outside of the supporting structure.

A supporting structure and an electronic acceleration system of the embodiment of the application are provided with a first supporting frame and a second supporting frame. The second support frame comprises a frame, a base plate, a first support part, a second support part and an upright post support unit. The first supporting part is arranged on one side of the frame close to the first supporting frame so as to place the energy degrader; a first through hole is formed in the substrate, and the second supporting portion and the stand column supporting unit are respectively arranged on two sides of the through hole. The stand supporting unit extends downwards from the bottom surface of the base plate, so that the transmission direction of high-energy particles is changed, horizontal transmission is converted into vertical transmission, the three-dimensional space can be fully utilized, the overall height or the length of the supporting structure is effectively reduced, the overall length or the height of a shielding hall is reduced, and finally the overall occupied area is reduced.

Drawings

Fig. 1 is a schematic structural diagram of an electronic acceleration system according to an embodiment of the present application, in which a shielding hall and a vacuum chamber are omitted;

FIG. 2 is a schematic structural view of a second support frame of the present application;

FIG. 3 is a schematic structural diagram of a first support frame of the components of the embodiment of the present application;

FIG. 4 is a schematic view of the component support column and the adjustment device of FIG. 3 from another perspective;

fig. 5 is a sectional view a-a of fig. 4.

Detailed Description

It should be noted that, in the case of conflict, the technical features in the examples and examples of the present application may be combined with each other, and the detailed description in the specific embodiments should be interpreted as an explanation of the present application and should not be construed as an improper limitation of the present application.

In the description of the embodiments of the present application, the "up", "down", "left", "right", "front", "back" orientation or positional relationship is based on the orientation or positional relationship shown in fig. 1, it is to be understood that these orientation terms are merely for convenience of description and simplicity of description, and do not indicate or imply that the device or element being referred to must have a particular orientation, be constructed and operated in a particular orientation, and therefore, should not be considered as limiting the present application.

As shown in fig. 1 to 5, an electron acceleration system includes a shadow hall (not shown), a vacuum chamber (not shown), an electron accelerator 9, a beam transport system 8, and a support structure 100.

The electron accelerator 9 and the beam transport system 8 are respectively supported on the support structure 100; the vacuum chamber is connected with the beam transmission system 8 in a flange connection mode, and the vacuum chamber is provided with a vacuum pump (not shown) to keep the vacuum degree in the vacuum chamber.

The beam transmission system 8 includes a degrader 81, a deflection magnet 82, a beam transformer 83, a guidance magnet 84, a quadrupole magnet 85, a hexapole magnet 86, a titanium pump 87, a scanning magnet (not shown), an electric gate valve 88, and a pipe 89.

In practical application, the electron accelerator 9 and the beam current transmission system 8 are communicated with the vacuum chamber. The electron beam enters the vacuum chamber after a series of actions of the components, forms a special environment with high-energy particle flow in the vacuum chamber, and strikes on a preset target, so as to provide conditions for developing related space science experiments.

It is to be understood that the screening hall is a special enclosure outside the vacuum chamber, the electron accelerator 9, the beam delivery system 8, and the support structure 100 to prevent radiation contamination from high energy particles penetrating. Therefore, the length, width, and height of the support structure 100 affect the shielding hall.

In the prior art, because the electronic transmission is vertical transmission, a support structure has to be built up very high according to needs, so that a shielding hall becomes high, and the building cost, the equipment cost, the occupied area and the like all rise.

The support structure 100 of the embodiment of the present application includes: a first support frame 10 and a second support frame 20.

Wherein the first support frame 10 is configured to support the electron accelerator 9, a base of the electron accelerator 9 is disposed on a panel 13 (mentioned below) of the first support frame 10, and the electron accelerator 9 and the panel 13 are detachably connected, such as bolted or riveted, to facilitate position adjustment. A buffer structure may be provided between the electron accelerator 9 and the first support frame 10 to prevent the vibration of the apparatus from affecting the electron accelerator 9.

The second support bracket 20 includes a frame 21, a base plate 22, a first support part 23, a second support part 24, and a pillar support unit 25. The frame 21 is a metal frame, and is usually welded by metal pipes, and has good load-bearing capacity. The bottom of the frame 21 may be padded (not shown) to mitigate equipment vibrations from affecting the beam delivery system 8.

The frame 21 is disposed opposite to the first support frame 10, and the substrate 22 is disposed on the top surface of the frame 21. The first supporting part 23 is arranged on one side of the frame 21 close to the first supporting frame 10 to place the energy degrader 81, and the energy degrader 81 and the first supporting part 23 are detachably connected, such as bolted connection and clamping connection. A rubber pad may be disposed between the first support 23 and the degrader 81 to dampen the vibration of the device.

The base plate 22 is formed with a first through hole 221, and the second supporting portion 24 and the pillar supporting unit 25 are respectively disposed at both sides of the first through hole 221. Wherein, the deflection magnet 82 is fixedly disposed on the second supporting portion 24, the second supporting portion 24 may be a V-shaped frame body, an included angle between the second supporting portion 24 and the substrate 22 is 30-60 °, and is usually selected to be 45 °, so that the deflection magnet 82 and the substrate 22 form a certain included angle, for example, 45 °. The column support unit 25 extends downward from the bottom surface of the base plate 22, and a guide magnet 84, a quadrupole magnet 85, and a hexapole magnet 86 may be placed on the column support unit 25.

When the electron accelerator is in operation, one end of the beam transport system 8 is connected with the electron accelerator 9, and the rest of the beam transport system 8 is supported by the first support portion 23 and the second support portion 24 and extends along the horizontal direction, then passes through the first through hole 221 downwards, and is supported by the column support unit 25 and extends downwards along the vertical direction. Specifically, one end of the pipe 89 is connected to the electron accelerator 9 and receives energetic particles, such as electrons, and the other end of the pipe 89 extends in the horizontal direction to pass through the energy degrader 81 and the deflection magnet 82 in sequence. The deflection magnet 82 is angled with respect to the base plate 22 such that the electron beam current in the conduit 89 is diverted there, i.e. changes from horizontal to vertical. The other end of the pipe 89 passes through the first through hole 221 downward and passes through the guiding magnet 84, the quadrupole magnet 85 and the hexapole magnet 86 arranged on the column support unit 25 to achieve the functions of transporting high energy particles, binding, correcting nonlinear effects, etc. Through changing the transmission direction of high energy particle, realize that horizontal transmission truns into vertical direction transmission, can make full use of cubical space, effectual reduction bearing structure 100's whole height or length, and then reduce the whole length or the height in shielding room, finally reduce whole occupation of land.

One possible embodiment, as shown in fig. 1 and 2, the pillar supporting unit 25 includes a plurality of supporting plates 253 and a frame body 252 formed of four pillars 251, one end of the frame body 252 is connected to the bottom surface of the base plate 22, and the other end of the frame body 252 extends downward in the vertical direction.

Each support plate 253 is provided with a second through hole 254 in the middle, and the support plates 253 are sequentially erected in the frame body 252 at intervals in the vertical direction, wherein the guide magnet 84, the four-pole magnet 85 and the six-pole magnet 86 are sequentially fixed on the support plates 253 in a bolt connection mode or a welding mode. The plurality of second through holes 254 form the channel 26 with the first through hole 221. The pipe 89 is deflected downwards after passing through the deflection magnet 82 and extends downwards along the channel 26, and the guide magnets 84, the four-pole magnets 85 and the six-pole magnets 86 on the plurality of support plates 253 sequentially act on the electron beam in the pipe 89, so that the functions of guiding, restraining, correcting nonlinear effect and the like are achieved.

In order to fix the guide magnet 84, the four-pole magnet 85, and the six-pole magnet 86, the second through hole 254 and the first through hole 221 may be diamond-shaped holes or rectangular holes.

In one possible embodiment, as shown in fig. 1 and 2, the supporting plate 253 and the upright 251 may be bolted. Wherein, the column 251 is arranged with a plurality of first screw holes 258 from top to bottom along the vertical direction, which facilitates adjusting the fixed height of the supporting plate 253, so as to flexibly design the effect of electron beam current in the pipeline 89.

Typically, the support plate 253 may be bolted to the first threaded hole 258. An L-shaped block 260 can be arranged between the supporting plate 253 and the upright 251, the L-shaped block 260 is supported at the bottom of the supporting plate 253 along the horizontal surface, the two can be connected by bolts or directly welded, and the surface of the L-shaped block 260 along the vertical direction is connected with the first screw hole 258 on the upright 251 by bolts.

In one possible embodiment, as shown in fig. 1 and 2, the pillar supporting unit 25 includes a third supporting portion 255, the third supporting portion 255 is generally fixedly disposed on an outer side surface of the frame body 252, and the third supporting portion 255 is used for fixedly placing the titanium pump 87, so that the supporting structure is more compact, the space is reasonably utilized, and the occupied area is reduced.

The frame body 252 and the third supporting part 255 may be connected by welding or bolting.

As shown in fig. 2, a plurality of second screw holes 259 are arranged from top to bottom along a vertical direction on an outer side surface of the upright 251 facing away from the support plate 253; the third support portion 255 is bolted to the second screw hole 259, which facilitates height adjustment of the titanium pump 87.

In one possible embodiment, as shown in fig. 1 and 2, the pillar support unit 25 includes a fixing plate 256 and a suspension rod 257, the fixing plate 256 is fixedly disposed at an end of the frame body 252 away from the base plate 22; the fixing plate 256 is used for fixing the electric gate valve 88, and the electric gate valve 88 is arranged on the pipeline 89 to realize on-off.

The suspension rod 257 is disposed on a support plate 253 nearest to the fixing plate 256, and the scanning magnet is disposed on the suspension rod 257 to scan and detect the electron beam current in the pipeline 89.

In a possible embodiment, as shown in fig. 1 and fig. 2, the frame 21 includes a plurality of longitudinal first tubes 211, a plurality of transverse second tubes 212, and a plurality of diagonal support rods 213, wherein the first tubes 211 are welded or bolted to the second tubes 212; the diagonal support rod 213 is fixedly supported between the first tube 211 and the second tube 212 to form a triangular structure, thereby enhancing stability and load-bearing capacity. The first pipe 211, the second pipe 212 and the inclined support rod 213 are all metal rectangular pipes, and have good bearing capacity. The surface of the frame 21 may be coated with an anti-rust coating in order to prevent rust.

One possible embodiment, as shown in fig. 1 and 2, the first supporting part 23 includes an L-shaped plate 231, a triangular plate 232, a horizontal plate 233, and a plurality of supporting screws 234; the L-shaped plate 231 includes a first sub-plate 235 and a second sub-plate 236 that are integrally connected and perpendicular to each other, the horizontal plate 233 and the first sub-plate 235 are disposed opposite to each other at an interval, and a plurality of support screws 234 are supported between the horizontal plate 233 and the first sub-plate 235, and a distance between the two can be adjusted by the support screws 234. The support screws 234 are generally distributed at the four corners of the horizontal plate 233, and even if the first sub-plate 235 is inclined, the distances between the four corners of the horizontal plate 233 and the first sub-plate 235 can be adjusted by adjusting the lengths of the support screws 234 at the respective different corners, so that the horizontal plate 233 is kept horizontal to place the energy degrader 81.

The second sub-board 236 is fixedly connected to the side of the frame 21 close to the first supporting frame 10 by welding or bolting.

One possible embodiment is shown in fig. 1 and 3 to 5, the first support frame 10 includes a panel 13 supporting the electron accelerator 9, a plurality of support columns 12, a plurality of adjusting devices 11, and a plurality of vertical plates 14, the panel 13 is provided with a plurality of positioning holes (not shown), the plurality of vertical plates 14 are fixed to the panel 13 through the positioning holes, the electron accelerator 9 is mounted on the vertical plates 14 through bolts, and further supported on the panel 13, and the position of the electron accelerator 9 can be flexibly adjusted by adjusting the position of the vertical plates 14, so as to achieve front-back, left-right adjustment.

A support column 12 is supported below the panel 13 for load bearing, and an adjustment device 11 is provided at the bottom end of the support column 12.

Usually, the substrate 22 is level with the panel 13 to facilitate erection of the beam transport system 8, and if the substrate 22 is not level with the panel 13 or requires a certain height difference, the height of the panel 13 can be adjusted by the adjusting device 11 to facilitate erection of the electron accelerator 9.

The form of the adjustment device 11 is various. As shown in fig. 3 to 5, the adjusting device 11 includes an upper wedge block 111, a lower wedge block 112, a positioning post 113, and a lock stud 114. The bottom end of the support column 12 is fixedly connected with an upper wedge block 111.

A waist-shaped hole 116 is formed at the bottom end of the positioning column 113, positioning grooves 117 are formed at two sides of the upper wedge-shaped block 111, the positioning column 113 penetrates upwards into the positioning grooves 117, and the bottom end of the positioning column 113 is in bolted connection with the lower wedge-shaped block 112 to realize the relative position fixation of the positioning column 113 and the lower wedge-shaped block; the locking stud 114 passes through the upper wedge block 111 and the lower wedge block 112 in sequence to achieve the fixing. The locking stud 114 penetrates through a waist hole 119 of the lower wedge block 112, the transverse width of the waist hole 119 is consistent with that of the locking stud 114, the locking stud 114 can move up and down in the waist hole 119, and one end, far away from the waist hole 119, of the locking stud 114 is fixedly connected with the upper wedge block 111 through threads, so that locking is achieved.

The bottom of the upper wedge block 111 is formed with a slide rail 115, and the top of the lower wedge block 112 is formed with a slide groove 118 engaged with the slide rail 115. When the height needs to be adjusted, the positioning column 113 and the positioning groove 117 are loosened, the locking stud 114 is loosened, the upper wedge block 111 and the lower wedge block 112 slide on the wedge-shaped inclined plane to realize the ascending or descending of the upper wedge block 111, so as to drive the supporting column 12 to ascend or descend, realize the lifting or lowering of the height of the panel 13, and finally adjust the horizontal height of the electronic accelerator 9.

The various embodiments/implementations provided herein may be combined with each other without contradiction.

The above description is only a preferred embodiment of the present application and is not intended to limit the present application, and various modifications and changes may be made by those skilled in the art. Any modification, equivalent replacement, improvement and the like made within the spirit and principle of the present application shall be included in the protection scope of the present application.

Claims

1. A support structure for supporting an electron accelerator (9) and a beam transport system (8), comprising:

a first support frame (10), the first support frame (10) being configured to support the electron accelerator (9);

and a second support frame (20), the second support frame (20) comprising a frame (21), a base plate (22), a first support portion (23), a second support portion (24), and a column support unit (25);

the frame (21) is arranged opposite to the first support frame (10); the base plate (22) is arranged on the top surface of the frame (21); the first supporting part (23) is arranged on one side of the frame (21) close to the first supporting frame (10); a first through hole (221) is formed in the base plate (22), the second supporting portion (24) and the column supporting unit (25) are respectively arranged on two sides of the first through hole (221), and the column supporting unit (25) extends downwards from the bottom surface of the base plate (22);

one end of the beam transmission system (8) is connected with the electron accelerator (9), and the rest of the beam transmission system (8) is supported on the first supporting part (23) and the second supporting part (24), extends along the horizontal direction, downwards passes through the first through hole (221), and is supported on the upright post supporting unit (25) and downwards extends along the vertical direction.

2. A supporting structure as claimed in claim 1, wherein the pillar supporting unit (25) comprises a plurality of supporting plates (253) and a frame body (252) formed of four pillars (251), one end of the frame body (252) is connected to the bottom surface of the base plate (22), the other end of the frame body (252) extends downward in the vertical direction, the supporting plates (253) have second through holes (254) in the middle thereof, the supporting plates (253) are sequentially erected in the frame body (252) at intervals in the vertical direction, and the plurality of second through holes (254) form a channel (26) with the first through holes (221).

3. A supporting structure as claimed in claim 2, characterized in that said uprights (251) are vertically arranged with a plurality of first screw holes (258) from top to bottom, said supporting plate (253) being bolted to said first screw holes (258).

4. A support structure as claimed in claim 2, characterized in that the upright support unit (25) comprises a third support portion (255), a plurality of second screw holes (259) being arranged vertically from top to bottom on an outer side of the upright (251) facing away from the support plate (253);

the third supporting portion (255) is bolted to the second screw hole (259).

5. A support structure as claimed in claim 2, wherein the column support unit (25) comprises a fixing plate (256) and a suspension rod (257), the fixing plate (256) being fixedly arranged at an end of the frame body (252) remote from the base plate (22);

the suspension rod (257) is disposed on one of the support plates (253) closest to the fixing plate (256).

6. A support structure according to any one of claims 2 to 5, wherein the frame (21) comprises a plurality of longitudinal first tubes (211), a plurality of transverse second tubes (212) and a plurality of diagonal support bars (213), the first tubes (211) and the second tubes (212) being welded together; the inclined supporting rod (213) is fixedly supported between the first pipe (211) and the second pipe (212) to form a triangular structure.

7. A support structure as claimed in any one of claims 1 to 5, wherein the first support (23) comprises an L-shaped plate (231), a triangular plate (232), a horizontal plate (233) and a plurality of support screws (234); the L-shaped plate (231) comprises a first sub-plate (235) and a second sub-plate (236) which are integrally connected and perpendicular to each other, the horizontal plate (233) and the first sub-plate (235) are oppositely arranged at intervals, and the second sub-plate (236) is fixedly connected with one side, close to the first support frame (10), of the frame (21); the plurality of support screws (234) are supported between the horizontal plate (233) and the first sub-plate (235).

8. A support structure according to any one of claims 1 to 5, wherein the second support portion (24) is a V-shaped frame, the second support portion (24) being arranged at an angle to the base plate (22).

9. A support structure according to claim 1, wherein the first support frame (10) comprises a panel (13) supporting the electron accelerator (9), a plurality of support columns (12) and a plurality of adjustment means (11), the panel (13) being provided with a plurality of positioning holes, the support columns (12) being supported below the panel (13), the adjustment means (11) being provided at the bottom ends of the support columns (12), the adjustment means (11) being configured to adjust the height of the panel (13).

10. A supporting structure as claimed in claim 9, wherein the adjusting device (11) comprises an upper wedge block (111), a lower wedge block (112), a positioning column (113) and a locking stud (114), a sliding rail (115) is formed at the bottom of the upper wedge block (111), a sliding groove (118) matched with the sliding rail (115) is formed at the top of the lower wedge block (112), and the bottom end of the supporting column (12) is fixedly connected with the upper wedge block (111); a waist-shaped hole (116) is formed at the bottom end of the positioning column (113), positioning grooves (117) are formed on two sides of the upper wedge-shaped block (111), the positioning column (113) upwards penetrates into the positioning grooves (117), and the bottom end of the positioning column (113) is in bolt connection with the lower wedge-shaped block (112); the locking stud (114) sequentially penetrates through the upper wedge block (111) and the lower wedge block (112) to achieve fixation.

11. An electron acceleration system, characterized by comprising a screening hall, a vacuum chamber, an electron accelerator (9), a beam transport system (8) and a support structure according to any of claims 1 to 10; the electron accelerator (9) and the beam transmission system (8) are supported on the supporting structure, the vacuum chamber is connected with the beam transmission system (8), and the shielding hall covers the vacuum chamber, the electron accelerator (9), the beam transmission system (8) and the outside of the supporting structure.