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CN215122976U - DFT cultivation device capable of adjusting oxygen and moisture supply - Google Patents

DFT cultivation device capable of adjusting oxygen and moisture supply Download PDF

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Publication number
CN215122976U
CN215122976U CN202121599835.5U CN202121599835U CN215122976U CN 215122976 U CN215122976 U CN 215122976U CN 202121599835 U CN202121599835 U CN 202121599835U CN 215122976 U CN215122976 U CN 215122976U
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CN
China
Prior art keywords
dft
cultivation device
oxygen
planting
moisture supply
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN202121599835.5U
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Chinese (zh)
Inventor
张斌
高洪波
宫彬彬
吴晓蕾
李敬蕊
吕桂云
王卫洪
王琳
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Heibei Agricultural University
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Heibei Agricultural University
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Priority to CN202121599835.5U priority Critical patent/CN215122976U/en
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Publication of CN215122976U publication Critical patent/CN215122976U/en
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    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P60/00Technologies relating to agriculture, livestock or agroalimentary industries
    • Y02P60/20Reduction of greenhouse gas [GHG] emissions in agriculture, e.g. CO2
    • Y02P60/21Dinitrogen oxide [N2O], e.g. using aquaponics, hydroponics or efficiency measures

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  • Hydroponics (AREA)

Abstract

The utility model discloses a can adjust DFT cultivation device of oxygen and moisture supply, include: a culture tank body; the planting plate is horizontally fixed at the open end of the culture tank body, a plurality of planting holes are formed in the planting plate, and a nutrient solution space is formed between the bottom end face of the planting plate and the bottom of the culture tank body; the reflux pipe is arranged in the nutrient solution space, and the bottom of the reflux pipe is in threaded connection with the internal thread through hole at the bottom of the culture tank body. The DFT cultivation device can adjust the height of the return pipe through rotation to further change the depth of the nutrient solution, and can adjust the requirements of oxygen and moisture according to different growth periods of leaf vegetables.

Description

DFT cultivation device capable of adjusting oxygen and moisture supply
Technical Field
The utility model relates to a cultivation technical field, more specifically the DFT cultivation device that relates to a can adjust oxygen and moisture supply that says so.
Background
Soilless culture is a new crop culture technology developed in recent decades, and crops are cultured in an aqueous solution containing mineral substances or a certain culture medium by using a nutrient solution. Water culture is a novel cultivation mode, and the core of the method is that crop roots are directly immersed in nutrient solution, and the nutrient solution is used for replacing soil to directly provide growth factors such as moisture, nutrients, oxygen and the like for crops.
Leaf vegetables are the main planting crops of water planting at present. The key of the water culture technology is to coordinate the contradiction of oxygen and water supply in the rhizosphere environment to ensure the normal growth of the leaf vegetables. At present, the water culture mainly comprises a deep liquid flow and a shallow liquid flow 2 planting mode, the deep liquid layer under the traditional DFT can ensure sufficient water supply of leaf vegetables, and a stable rhizosphere environment of a root system is provided, but the root system of the traditional DFT (deep liquid flow) is completely soaked in nutrient solution because a planting plate is directly contacted with the nutrient solution, so that the normal growth of the root system of the leaf vegetables is not facilitated, in summer, because the oxygen content in the nutrient solution is reduced, the circulation flow frequency of the nutrient solution is often required to be increased or the oxygen content in the nutrient solution is increased in an oxygen adding mode in water, so that the operation cost is increased, and the effect is not satisfactory; NFT (shallow liquid flow) is mainly used for pipeline cultivation, can be better solve the problem of root system oxygen, but because the liquid layer is more shallow, the influence by external environment change is larger, the running cost is higher, and the requirement of leaf vegetables to moisture in different growth periods can not be well met, for example, the requirement of leaf vegetables to moisture in the initial stage of field planting is larger.
Therefore, how to provide a DFT cultivation device capable of regulating the supply of oxygen and moisture is a problem that needs to be solved by those skilled in the art.
SUMMERY OF THE UTILITY MODEL
In view of the above, the present invention provides a DFT cultivation device that can regulate the supply of oxygen and moisture.
In order to achieve the above purpose, the utility model adopts the following technical scheme:
a DFT cultivation device with adjustable oxygen and moisture supply, comprising:
a culture tank body;
the field planting plate is horizontally fixed at the open end of the culture tank body, a plurality of field planting holes are formed in the field planting plate, and a nutrient solution space is formed between the bottom end face of the field planting plate and the bottom of the culture tank body;
the return pipe is arranged in the nutrient solution space, and the bottom of the return pipe is in threaded connection with the internal thread through hole at the bottom of the culture tank body.
Can know via foretell technical scheme, compare with prior art, the utility model discloses a DFT cultivation device that can adjust oxygen and moisture supply, the height and then change the nutrient solution degree of depth of accessible rotation regulation back flow, can make the adjustment to the demand of oxygen and moisture according to the different growth periods of leaf dish, for example, avoid the seedling to take place owing to the root system short contact can not moisture and "dead seedling" that leads to through improving the nutrient solution degree of depth at the field planting initial stage, make leaf dish root system part soak in the nutrient solution through reducing the nutrient solution degree of depth at the later stage of growing, the part is exposed in the middle of the air, can fully satisfy the different growth periods of leaf dish demand to oxygen and moisture. And the planting plate is fixed, and the space of the nutrient solution below the planting plate is unchanged, so that the planting plate does not sink due to the reduction of the depth of the nutrient solution, the contradiction between oxygen and water supply is favorably balanced, and the occurrence of root rot of leaf vegetables due to oxygen deficiency is avoided or reduced.
Furthermore, a filter screen is arranged at the pipe orifice on the return pipe. The backflow pipe can be prevented from being blocked by impurities in the nutrient solution, and the nutrient solution can be ensured to flow out through the backflow pipe smoothly, so that the adjustment of the depth of the nutrient solution is realized.
Furthermore, a plurality of support columns are fixed at the bottom end of the culture tank body, and the bottom end of the planting plate is fixed to the top ends of the support columns. The two support columns below the planting plate can fully ensure the space between the planting plate and the bottom of the groove, so that the planting plate can not sink due to the reduction of the depth of the nutrient solution, the contradiction between oxygen and water supply is favorably balanced, and the occurrence of root rot of leaf vegetables due to oxygen deficiency is avoided or reduced.
Further, the height H5 of the support column is 100mm, and the width W is 50 mm.
Further, the length L1 of the culture trough body is 1300mm, the height H1 is 250mm, and the thickness delta 1 is 50 mm.
Further, the planting plate is square, the length L2 of the planting plate is 1200mm, and the thickness delta 2 of the planting plate is 50 mm.
Further, the diameter phi 1 of the planting hole is 40 mm.
Further, it is a plurality of the plant setting hole is line, vertically arranged, be close to the plant setting flange reason the plant setting hole with the distance H3 of plant setting flange reason is 150mm, adjacent two distance H4 between the plant setting hole is 300 mm.
Further, the return pipe is a cylindrical pipe having a height H2 of 150mm and a diameter φ 2 of 50 mm.
Furthermore, the material of field planting board is polystyrene foaming material.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings required to be used in the description of the embodiments or the prior art will be briefly described below, it is obvious that the drawings in the following description are only embodiments of the present invention, and for those skilled in the art, other drawings can be obtained according to the provided drawings without creative efforts.
FIG. 1 is a schematic structural diagram of a DFT cultivation device capable of adjusting oxygen and moisture supply according to the present invention.
Fig. 2 is a schematic structural diagram of the planting plate.
Detailed Description
The technical solutions in the embodiments of the present invention will be described clearly and completely with reference to the accompanying drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only some embodiments of the present invention, not all embodiments. Based on the embodiments in the present invention, all other embodiments obtained by a person skilled in the art without creative work belong to the protection scope of the present invention.
Referring to fig. 1-2, the embodiment of the present invention discloses a DFT cultivation device capable of adjusting oxygen and moisture supply, comprising:
a culture tank body 1;
the planting plate 2 is horizontally fixed at the open end of the culture tank body 1, a plurality of planting holes 21 are formed in the planting plate 2, and a nutrient solution space 3 is formed between the bottom end face of the planting plate 2 and the bottom of the culture tank body 1;
the return pipe 4 is arranged in the nutrient solution space 3, and the bottom of the return pipe 4 is in threaded connection with the internal thread through hole at the bottom of the culture tank body 1.
A filter screen 5 is arranged at the pipe orifice of the return pipe 4.
A plurality of support columns 6 are fixed at the bottom end of the culture tank body 1, and the bottom end of the planting plate 2 is fixed with the top ends of the support columns 6.
The height H5 of support post 6 is 100mm and the width W is 50 mm.
The length L1 of the culture tank body 1 is 1300mm, the height H1 is 250mm, and the thickness delta 1 is 50 mm.
The planting plate 2 is square, the length L2 of the planting plate is 1200mm, and the thickness delta 2 of the planting plate is 50 mm.
The diameter φ 1 of the implantation hole 21 is 40 mm.
The plurality of planting holes 21 are arranged in rows and longitudinally, the distance H3 between the planting holes 21 close to the edge of the planting plate 2 and the edge of the planting plate 2 is 150mm, and the distance H4 between every two adjacent planting holes 21 is 300 mm. Can ensure the rationality of the planting density of the leaf vegetables.
The return tube 4 is a cylindrical tube having a height H2 of 150mm and a diameter φ 2 of 50 mm.
The planting plate 2 is made of polystyrene foam.
The utility model discloses a DFT cultivation device, the height of accessible rotation regulation back flow and then change the nutrient solution degree of depth, can make the adjustment to the demand of oxygen and moisture according to the different growth periods of leaf dish, for example, avoid the seedling to take place owing to the too short contact moisture of root system and "dead seedling" that leads to of root system to take place through improving the nutrient solution degree of depth at the field planting initial stage, make leaf dish root system part soak in the nutrient solution through reducing the nutrient solution degree of depth in the later stage of growing, the part exposes in the middle of the air, can fully satisfy the demand of the different growth periods of leaf dish to oxygen and moisture. And the planting plate is fixed, and the space of the nutrient solution below the planting plate is unchanged, so that the planting plate does not sink due to the reduction of the depth of the nutrient solution, the contradiction between oxygen and water supply is favorably balanced, and the occurrence of root rot of leaf vegetables due to oxygen deficiency is avoided or reduced.
The embodiments in the present description are described in a progressive manner, each embodiment focuses on differences from other embodiments, and the same and similar parts among the embodiments are referred to each other. The device disclosed by the embodiment corresponds to the method disclosed by the embodiment, so that the description is simple, and the relevant points can be referred to the method part for description.
The previous description of the disclosed embodiments is provided to enable any person skilled in the art to make or use the present invention. Various modifications to these embodiments will be readily apparent to those skilled in the art, and the generic principles defined herein may be applied to other embodiments without departing from the spirit or scope of the invention. Thus, the present invention is not intended to be limited to the embodiments shown herein but is to be accorded the widest scope consistent with the principles and novel features disclosed herein.

Claims (10)

1. A DFT cultivation device with adjustable oxygen and moisture supply, comprising:
a culture tank body (1);
the planting plate (2) is horizontally fixed at the open end of the culture tank body (1), a plurality of planting holes (21) are formed in the planting plate (2), and a nutrient solution space (3) is formed between the bottom end face of the planting plate (2) and the bottom of the culture tank body (1);
the return pipe (4), the return pipe (4) are arranged in nutrient solution space (3), just return pipe (4) bottom threaded connection is in on the internal thread through-hole on the tank bottom of cultivateing cell body (1).
2. DFT cultivation device with adjustable oxygen and moisture supply according to claim 1, characterized in that the pipe opening on the return pipe (4) is provided with a filter screen (5).
3. The DFT cultivation device capable of adjusting oxygen and moisture supply as claimed in claim 1, wherein a plurality of support columns (6) are fixed at the bottom end of the cultivation tank body (1), and the bottom end of the planting plate (2) is fixed with the top ends of the support columns (6).
4. The DFT cultivation device capable of adjusting oxygen and moisture supply as claimed in claim 3, wherein the height H5 of the support column (6) is 100mm, and the width W is 50 mm.
5. The DFT cultivation device capable of adjusting oxygen and moisture supply as claimed in claim 1, wherein the length L1 of the cultivation tank body (1) is 1300mm, the height H1 is 250mm, and the thickness δ 1 is 50 mm.
6. The DFT cultivation device capable of regulating oxygen and moisture supply as claimed in claim 1, wherein the planting plate (2) is square with a length L2 of 1200mm and a thickness δ 2 of 50 mm.
7. The DFT cultivation device capable of regulating oxygen and moisture supply as claimed in claim 1, wherein the diameter φ 1 of the planting holes (21) is 40 mm.
8. The DFT cultivation device capable of adjusting oxygen and moisture supply as claimed in claim 1, wherein a plurality of the planting holes (21) are arranged in rows and in a longitudinal manner, the distance H3 between the planting hole (21) close to the edge of the planting plate (2) and the edge of the planting plate (2) is 150mm, and the distance H4 between two adjacent planting holes (21) is 300 mm.
9. DFT cultivation device with adjustable oxygen and moisture supply according to claim 1, characterized in that the return pipe (4) is a cylindrical pipe with height H2 of 150mm and diameter φ 2 of 50 mm.
10. The DFT cultivation device capable of adjusting oxygen and moisture supply as claimed in claim 1, wherein the planting plate (2) is made of polystyrene foam.
CN202121599835.5U 2021-07-14 2021-07-14 DFT cultivation device capable of adjusting oxygen and moisture supply Expired - Fee Related CN215122976U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202121599835.5U CN215122976U (en) 2021-07-14 2021-07-14 DFT cultivation device capable of adjusting oxygen and moisture supply

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202121599835.5U CN215122976U (en) 2021-07-14 2021-07-14 DFT cultivation device capable of adjusting oxygen and moisture supply

Publications (1)

Publication Number Publication Date
CN215122976U true CN215122976U (en) 2021-12-14

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ID=79394802

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202121599835.5U Expired - Fee Related CN215122976U (en) 2021-07-14 2021-07-14 DFT cultivation device capable of adjusting oxygen and moisture supply

Country Status (1)

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CN (1) CN215122976U (en)

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CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20211214

CF01 Termination of patent right due to non-payment of annual fee