CN203405752U - 一种基于native NMOS晶体管的高电源抑制LDO稳压器 - Google Patents
一种基于native NMOS晶体管的高电源抑制LDO稳压器 Download PDFInfo
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- CN203405752U CN203405752U CN201320562128.8U CN201320562128U CN203405752U CN 203405752 U CN203405752 U CN 203405752U CN 201320562128 U CN201320562128 U CN 201320562128U CN 203405752 U CN203405752 U CN 203405752U
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Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104181972A (zh) * | 2014-09-05 | 2014-12-03 | 电子科技大学 | 一种具有高电源抑制比特性的低压差线性稳压器 |
CN104793672A (zh) * | 2014-01-16 | 2015-07-22 | 北京大学 | 一种高电源抑制比的低压差线性稳压器 |
CN105630058A (zh) * | 2016-03-23 | 2016-06-01 | 江南大学 | 一种改进型片上线性稳压器 |
TWI569123B (zh) * | 2015-03-26 | 2017-02-01 | 晨星半導體股份有限公司 | 高效率之低壓差線性穩壓器 |
CN108762362A (zh) * | 2017-06-25 | 2018-11-06 | 深圳市前海方成微电子有限公司 | 适用于高电源噪声抑制比、低输出阻抗的稳压器 |
CN110502053A (zh) * | 2019-08-28 | 2019-11-26 | 南京凯鼎电子科技有限公司 | 高电源电压抑制比线性稳压器 |
-
2013
- 2013-09-11 CN CN201320562128.8U patent/CN203405752U/zh not_active Expired - Lifetime
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104793672A (zh) * | 2014-01-16 | 2015-07-22 | 北京大学 | 一种高电源抑制比的低压差线性稳压器 |
CN104793672B (zh) * | 2014-01-16 | 2016-11-23 | 北京大学 | 一种高电源抑制比的低压差线性稳压器 |
CN104181972A (zh) * | 2014-09-05 | 2014-12-03 | 电子科技大学 | 一种具有高电源抑制比特性的低压差线性稳压器 |
CN104181972B (zh) * | 2014-09-05 | 2015-12-30 | 电子科技大学 | 一种具有高电源抑制比特性的低压差线性稳压器 |
TWI569123B (zh) * | 2015-03-26 | 2017-02-01 | 晨星半導體股份有限公司 | 高效率之低壓差線性穩壓器 |
US9785162B2 (en) | 2015-03-26 | 2017-10-10 | Mstar Semiconductor, Inc. | LDO with high power conversion efficiency |
CN105630058A (zh) * | 2016-03-23 | 2016-06-01 | 江南大学 | 一种改进型片上线性稳压器 |
CN108762362A (zh) * | 2017-06-25 | 2018-11-06 | 深圳市前海方成微电子有限公司 | 适用于高电源噪声抑制比、低输出阻抗的稳压器 |
CN108762362B (zh) * | 2017-06-25 | 2020-06-12 | 深圳市前海方成微电子有限公司 | 适用于高电源噪声抑制比、低输出阻抗的稳压器 |
CN110502053A (zh) * | 2019-08-28 | 2019-11-26 | 南京凯鼎电子科技有限公司 | 高电源电压抑制比线性稳压器 |
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Address after: Aofong road Taijiang District Fuzhou city Fujian province 350014 No. 184-186 garden Yijing No. 3 4 floor two unit 66 Patentee after: FUJIAN EOCHIP SEMICONDUCTOR Co.,Ltd. Address before: 350003, No. 89, three software Avenue, Gulou District, Fujian City, Fuzhou Province, No. 31, building A, Fuzhou Software Park Patentee before: FUJIAN YIDINGXIN SEMICONDUCTOR Co.,Ltd. |
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Effective date of registration: 20200820 Address after: Unit 102, No. 1742, Gangzhong Road, Xiamen City, Fujian Province Patentee after: XIAMEN EOCHIP SEMICONDUCTOR TECHNOLOGY Co.,Ltd. Address before: Aofong road Taijiang District Fuzhou city Fujian province 350014 No. 184-186 garden Yijing No. 3 4 floor two unit 66 Patentee before: FUJIAN EOCHIP SEMICONDUCTOR Co.,Ltd. |
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Granted publication date: 20140122 |