CN203179834U - Plasma processing device - Google Patents
Plasma processing device Download PDFInfo
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- CN203179834U CN203179834U CN 201320067605 CN201320067605U CN203179834U CN 203179834 U CN203179834 U CN 203179834U CN 201320067605 CN201320067605 CN 201320067605 CN 201320067605 U CN201320067605 U CN 201320067605U CN 203179834 U CN203179834 U CN 203179834U
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- plasma
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- treatment appts
- plasma treatment
- plasma generation
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Abstract
The utility model relates to a plasma processing device comprising a vacuum chamber and a plasma generation assembly. The plasma generation assembly comprises a plasma generation chamber provided on a wall of the vacuum chamber, an electrode module arranged in the plasma generation chamber, a microwave plasma excitation source electrically connected with the electrode module, and a gas delivering pipe communicating with the plasma generation chamber through the side wall of the plasma generation chamber. A discharge end of the electrode module faces the inside of the vacuum chamber. The electrode module is composed of a plurality of parallel tubular electrodes arranged in a matrix manner. With the plasma processing device, when gas flows in the plasma generation chamber, the gas flow turns under the blocking of the side wall and enters the vacuum chamber. During the process, the flow speed is reduced, and ionization is more sufficient. Also, turbulence is formed, such that plasmas in the gas flow are uniformly mixed. Gas passes the plasma generation assembly, and uniform plasma gas is formed. A processing effect is good when a product is subjected to plasma processing.
Description
Technical field
The utility model relates to the surface processing equipment field, particularly relates to a kind of plasma treatment appts.
Background technology
Plasma is called electricity slurry again, is made up of charged particle such as electronics, ion and neutral grain (atom, molecule, a little material etc.), presents quasi-neutrality on the macroscopic view, and has the mist of collective effect.
At present, plasma processing is widely used in plasma cleaning, etching, plasma plating, plasma coated, plasma ashing and occasions such as surface active, modification.Handle by it, can improve the wettability of material, make operations such as multiple material can apply, plating, strengthen bonding force, bonding force, remove organic pollution, greasy dirt or grease simultaneously.
In the middle of the general plasma processing, when air-flow flowed between electrode, the plasma gas of generation was inhomogeneous, when causing carrying out plasma treatment, also can produce inhomogeneous problem.And gas can only partial ionization between two plate electrodes, and the efficient that produces plasma is lower, and the efficient that also causes carrying out plasma treatment reduces.
The utility model content
Based on this, be necessary to provide the plasma treatment appts that a kind of plasma is evenly distributed, plasma treatment efficient is high.
A kind of plasma treatment appts comprises vacuum cavity and plasma generating assembly, and described plasma generating assembly comprises:
The plasma generation cavity is opened in described vacuum chamber body cavity wall;
The electrode module is arranged in the described plasma generation cavity, and the discharge end of described electrode module is over against described vacuum cavity inside, and the hollow edged electrode that described electrode module is arranged by a plurality of parallel matrixes is formed;
The microwave plasma driving source is electrically connected with described electrode module;
Gas transmission pipeline is communicated in described plasma generation cavity from described plasma generation cavity sidewall.
Among embodiment, described vacuum chamber body cavity wall is provided with at least two plasma generating assemblies therein.
Among embodiment, described vacuum chamber body cavity wall is provided with two plasma generating assemblies, is divided into two relative chamber walls of described vacuum cavity therein.
Among embodiment, described two plasma generating assemblies are interspersed relatively in two relative chamber walls of described vacuum cavity therein.
Therein among embodiment, described two plasma generating assemblies comprise the first plasma generating assembly that is arranged at the vacuum cavity top chamber wall, and the second plasma generating assembly that is arranged at the vacuum cavity bottom chamber wall, the described first plasma generating assembly and the second plasma generating assembly are interspersed.
Among embodiment, the frequency of described microwave plasma driving source is 2.45GHz therein.
Among embodiment, described vacuum cavity middle part also is provided with a plurality of conveying running rollers therein, and described conveying running roller is parallel to each other.
Among embodiment, the two ends of described conveying running roller have at least an end to stretch out described vacuum cavity therein.
Among embodiment, described plasma treatment appts also comprises pumped vacuum systems therein, and described pumped vacuum systems is communicated with described vacuum cavity.
Among embodiment, described plasma treatment appts also comprises speed regulating device therein, and described speed regulating device are connected with described conveying running roller.
Above-mentioned plasma treatment appts, microwave plasma driving source exciting electrode module generates an electromagnetic field, and when gas enters the plasma generation cavity through gas transmission pipeline, is ionized under the hollow edged electrode effect of electrode module, forms plasma.Because gas transmission pipeline is communicated in described plasma generation cavity from described plasma generation cavity sidewall, but not over against plasma generation cavity opening part, so when air-flow flows in the plasma generation cavity, another sidewall that warp is relative with the sidewall that connects gas transmission pipeline stops and turns to earlier, enters vacuum cavity from the outflow of plasma generation cavity again.Flow velocity slows down in the process that air-flow turns in the plasma generation cavity, so increased the time of contact with the electrode module, ionization is more abundant; And air-flow forms turbulent flow in steering procedure, thereby the plasma in the air-flow is mixed.And, under the certain situation of applied voltage, because the hollow edged electrode that the electrode module is arranged by a plurality of parallel matrixes is formed, shortened the distance between each hollow edged electrode, the easier ionization of the gas between each hollow edged electrode, and owing to be that a plurality of hollow edged electrodes distribute, arbitrary group of hollow edged electrode can both make distribution gas generation ionization therebetween, make the many places ionization of plasma generation intracavity gas, avoided hollow edged electrode more after a little while, portion gas because of from hollow edged electrode away from the ionization poor effect.So gas by efficiently and fully ionization, forms uniform plasma gas through described plasma generating assembly, enter with vacuum cavity in product is carried out plasma treatment, treatment effect is good.
Description of drawings
Fig. 1 is the structural representation of the plasma treatment appts of an execution mode;
Fig. 2 is the side structure view of the plasma treatment appts of an execution mode;
Fig. 3 is the Facad structure view of the plasma treatment appts of an execution mode;
Fig. 4 is the internal structure schematic diagram of the plasma treatment appts of an execution mode;
Fig. 5 is the plasma generating assembly internal structure schematic diagram of the plasma treatment appts of an execution mode;
Fig. 6 is the electrode modular structure schematic diagram of the plasma treatment appts of an execution mode.
Embodiment
Below in conjunction with the drawings and specific embodiments the utility model is further elaborated.
As Fig. 1, Fig. 2, Fig. 5, shown in Figure 6, a kind of plasma treatment appts comprises vacuum cavity 100 and plasma generating assembly 200, and described plasma generating assembly 200 comprises:
Microwave plasma driving source 260 is electrically connected with described electrode module 240;
Above-mentioned plasma treatment appts, microwave plasma driving source 260 exciting electrode modules 240 generate an electromagnetic field, when gas enters plasma generation cavity 220 through gas transmission pipeline 280, under hollow edged electrode 242230 effects of electrode module 240, be ionized, form plasma.Because gas transmission pipeline 280 is communicated in described plasma generation cavity 220 from described plasma generation cavity 220 sidewalls, but not over against plasma generation cavity 220 opening parts, so when air-flow flows in plasma generation cavity 220, another sidewall that warp is relative with the sidewall that connects gas transmission pipeline 280 stops and turns to earlier, enters vacuum cavity 100 from 220 outflows of plasma generation cavity again.Flow velocity slows down in the process that air-flow turns in plasma generation cavity 220, so increased the time of contact with electrode module 240, ionization is more abundant; And air-flow forms turbulent flow in steering procedure, thereby the plasma in the air-flow is mixed.And, under the certain situation of applied voltage, because the hollow edged electrode 242 that electrode module 240 is arranged by a plurality of parallel matrixes is formed, shortened the distance between each hollow edged electrode 242, the easier ionization of gas between each hollow edged electrode 242, and owing to be that a plurality of hollow edged electrodes 242 distribute, arbitrary group of hollow edged electrode 242 can both make distribution gas generation ionization therebetween, make gas many places ionization in the plasma generation cavity 220, avoided hollow edged electrode 242 more after a little while, portion gas because of from hollow edged electrode 242 away from the ionization poor effect.So gas by efficiently and fully ionization, forms uniform plasma gas through described plasma generating assembly 200, enter with vacuum cavity 100 in product is carried out plasma treatment, treatment effect is good.
Among embodiment, the frequency of described microwave plasma driving source 260 is 2.45GHz therein.Microwave plasma driving source 260 adaptability of this frequency are good, can make 240 pairs of gas ionizations of described electrode module abundant, high efficiency.
Among embodiment, plasma treatment appts is provided with a plurality of plasma generating assemblies 200 therein, and these plasma treatment appts can be divided into plasma generation cavity 220 same chamber walls or different cavity wall.A plurality of plasma generating assemblies 200 are set, the multiply air-flow is respectively through gas transmission pipeline 280, in 220 ionization of plasma generation cavity, producing plasma enters in the vacuum cavity 100, compare single plasma generating assembly 200, plasma density in the vacuum cavity 100 increases, so improved the ability of plasma treatment appts cleaning products.
Particularly, plasma treatment appts can be provided with two plasma generating assemblies 200, and these two plasma generating assemblies 200 are divided into two relative chamber walls of described vacuum cavity 100.Compare two plasma generating assemblies 200 and be arranged at vacuum cavity 100 same chamber walls, two plasma generating assemblies 200 are oppositely arranged, produce two strands of air-flows, air-flow enters vacuum cavity 100 from two relative chamber walls, form circulation, what therefore the plasma in the vacuum cavity 100 distributed is more even, avoid occurring the not good phenomenon of plasma density lower cleaning effect, so the cleaning performance of product integral body also can be better.
More specifically, plasma treatment appts is provided with two plasma generating assemblies 200, and described two plasma generating assemblies 200 are interspersed relatively in two relative chamber walls of described vacuum cavity 100.Two plasma generating assemblies 200 produce two strands of air-flows, because two plasma generating assemblies 200 are interspersed relatively, thereby the more close plasma generation cavity 220 in the corner of vacuum cavity 100, two easier corners that are full of vacuum cavity 100 of two strands of air-flows that plasma generating assembly 200 produces, the concentration of the corner plasma of vacuum cavity 100 also can be higher, therefore the concentration of vacuum cavity 100 plasma everywhere is very even, avoids the low cleaning effect that influences of concentration because of the corner plasma of vacuum cavity 100.
As shown in Figure 3, Figure 4, in present embodiment, plasma treatment appts is provided with two plasma generating assemblies 200, two plasma generating assemblies 200 comprise the first plasma generating assembly 200 that is arranged at vacuum cavity 100 top chamber wall, and the second plasma generating assembly, 200, the first plasma generating assemblies 200 and the second plasma generating assembly 200 that are arranged at vacuum cavity 100 bottom chamber wall are interspersed.The first plasma generating assembly 200 produces one air-flow, enter vacuum cavity 100, the second plasma generating assemblies 200 and produce another strand and enter vacuum cavity 100 from the vacuum cavity 100 bottom chamber wall position that takes over from the vacuum cavity 100 top chamber wall position of taking back.Two bursts of air motion directions are vertical direction, and the direction of motion of product is horizontal direction, and air-flow vertically impacts on product like this, and cleaning performance is better, and plasma and product contact area are bigger, also can strengthen the effect of cleaning.
Among embodiment, as shown in Figure 3, Figure 4, the central authorities of vacuum cavity 100 are provided with and carry running roller 300, carry two ends one end of running roller 300 to stretch out described vacuum cavity 100 therein.Carry running roller 300 can place a plurality of products, make plasma treatment appts clean a plurality of products simultaneously, product enters vacuum cavity 100 through carrying running roller 300, after cleaning end, product is again via carrying running roller 300 to leave vacuum cavity 100, after a collection of product has cleaned, carry running roller 300 to carry the unwashed product of next group, realize continuously uninterrupted the cleaning.The setting of conveying running roller 300 has improved the operating efficiency of plasma treatment appts greatly.
Among embodiment, carry the two ends of running roller 300 to have at least an end to stretch out described vacuum cavity 100 therein, when carrying running roller 300 to break down, can directly extract replacing, convenient for maintaining out.
Among embodiment, described plasma treatment appts also comprises speed regulating device therein, and described speed regulating device are connected with described conveying running roller 300.According to the size of product and the complexity of cleaning, regulate and carry running roller 300 rotating speeds, the scavenging period of control product.When the less easy cleaning of product, can suitably accelerate to carry running roller 300 rotating speeds, reduce scavenging period, realize distributing rationally of resource, take full advantage of the cleansing power of plasma treatment appts; When product is difficult to clean more greatly, can suitably slow down and carry running roller 300 rotating speeds, increase scavenging period, to guarantee cleaning performance.
Among embodiment, described plasma treatment appts also comprises pumped vacuum systems therein, and described pumped vacuum systems is communicated with described vacuum cavity 100.Described pumped vacuum systems is connected with described vacuum cavity 100.Described pumped vacuum systems can keep the vacuum degree of described vacuum cavity 100, removes other foreign gas, guarantees isoionic purity.In other embodiments, also can only at plasma processing a port that is connected with vacuum cavity 100 be set, be used for linking to each other with other vaccum-pumping equipments, that is to say that described pumped vacuum systems is not that described microwave plasma treatment facility is essential.
The above embodiment has only expressed several execution mode of the present utility model, and it describes comparatively concrete and detailed, but can not therefore be interpreted as the restriction to the utility model claim.Should be pointed out that for the person of ordinary skill of the art under the prerequisite that does not break away from the utility model design, can also make some distortion and improvement, these all belong to protection range of the present utility model.Therefore, the protection range of the utility model patent should be as the criterion with claims.
Claims (10)
1. a plasma treatment appts comprises vacuum cavity and plasma generating assembly, it is characterized in that, described plasma generating assembly comprises:
The plasma generation cavity is opened in described vacuum chamber body cavity wall;
The electrode module is arranged in the described plasma generation cavity, and the discharge end of described electrode module is over against described vacuum cavity inside, and the hollow edged electrode that described electrode module is arranged by a plurality of parallel matrixes is formed;
The microwave plasma driving source is electrically connected with described electrode module;
Gas transmission pipeline is communicated in described plasma generation cavity from described plasma generation cavity sidewall.
2. plasma treatment appts according to claim 1 is characterized in that, described vacuum chamber body cavity wall is provided with at least two plasma generating assemblies.
3. plasma treatment appts according to claim 2 is characterized in that, described vacuum chamber body cavity wall is provided with two plasma generating assemblies, is divided into two relative chamber walls of described vacuum cavity.
4. plasma treatment appts according to claim 3 is characterized in that, described two plasma generating assemblies are interspersed relatively in two relative chamber walls of described vacuum cavity.
5. plasma treatment appts according to claim 4, it is characterized in that, described two plasma generating assemblies comprise the first plasma generating assembly that is arranged at the vacuum cavity top chamber wall, and the second plasma generating assembly that is arranged at the vacuum cavity bottom chamber wall, the described first plasma generating assembly and the second plasma generating assembly are interspersed.
6. plasma treatment appts according to claim 1 is characterized in that, the frequency of described microwave plasma driving source is 2.45GHz.
7. plasma treatment appts according to claim 1 is characterized in that, described vacuum cavity middle part also is provided with a plurality of conveying running rollers, and described conveying running roller is parallel to each other.
8. plasma treatment appts according to claim 1 is characterized in that, the two ends of described conveying running roller have at least an end to stretch out described vacuum cavity.
9. plasma treatment appts according to claim 1 is characterized in that, described plasma treatment appts also comprises pumped vacuum systems, and described pumped vacuum systems is communicated with described vacuum cavity.
10. according to each described plasma treatment appts of claim 7-9, it is characterized in that described plasma treatment appts also comprises speed regulating device, described speed regulating device are connected with described conveying running roller.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201320067605 CN203179834U (en) | 2013-02-05 | 2013-02-05 | Plasma processing device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201320067605 CN203179834U (en) | 2013-02-05 | 2013-02-05 | Plasma processing device |
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| Publication Number | Publication Date |
|---|---|
| CN203179834U true CN203179834U (en) | 2013-09-04 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN 201320067605 Expired - Lifetime CN203179834U (en) | 2013-02-05 | 2013-02-05 | Plasma processing device |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103107059A (en) * | 2013-02-05 | 2013-05-15 | 珠海宝丰堂电子科技有限公司 | Plasma treatment device |
| CN111785603A (en) * | 2020-07-20 | 2020-10-16 | 中国计量大学 | Microwave plasma cleaning machine |
| CN112424389A (en) * | 2018-12-03 | 2021-02-26 | 株式会社爱发科 | Film forming apparatus and film forming method |
-
2013
- 2013-02-05 CN CN 201320067605 patent/CN203179834U/en not_active Expired - Lifetime
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103107059A (en) * | 2013-02-05 | 2013-05-15 | 珠海宝丰堂电子科技有限公司 | Plasma treatment device |
| CN103107059B (en) * | 2013-02-05 | 2015-09-30 | 珠海宝丰堂电子科技有限公司 | Plasma treatment appts |
| CN112424389A (en) * | 2018-12-03 | 2021-02-26 | 株式会社爱发科 | Film forming apparatus and film forming method |
| CN111785603A (en) * | 2020-07-20 | 2020-10-16 | 中国计量大学 | Microwave plasma cleaning machine |
| CN111785603B (en) * | 2020-07-20 | 2023-06-13 | 中国计量大学 | Microwave plasma cleaning machine |
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| Date | Code | Title | Description |
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| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CX01 | Expiry of patent term |
Granted publication date: 20130904 |
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| CX01 | Expiry of patent term |