CN201518309U - Plasma discharge and atomization grafting device - Google Patents
Plasma discharge and atomization grafting device Download PDFInfo
- Publication number
- CN201518309U CN201518309U CN2009202466284U CN200920246628U CN201518309U CN 201518309 U CN201518309 U CN 201518309U CN 2009202466284 U CN2009202466284 U CN 2009202466284U CN 200920246628 U CN200920246628 U CN 200920246628U CN 201518309 U CN201518309 U CN 201518309U
- Authority
- CN
- China
- Prior art keywords
- plasma discharge
- atomizing
- grafting device
- roller bearing
- metal roller
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000000889 atomisation Methods 0.000 title abstract description 7
- 229910052751 metal Inorganic materials 0.000 claims abstract description 17
- 239000002184 metal Substances 0.000 claims abstract description 17
- 239000000463 material Substances 0.000 claims abstract description 15
- 239000010409 thin film Substances 0.000 claims description 8
- 239000010408 film Substances 0.000 claims description 7
- 229910052782 aluminium Inorganic materials 0.000 claims description 6
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 6
- 239000007788 liquid Substances 0.000 claims description 4
- 238000005516 engineering process Methods 0.000 abstract description 5
- 230000004048 modification Effects 0.000 abstract description 4
- 238000012986 modification Methods 0.000 abstract description 4
- 238000004501 airglow Methods 0.000 abstract description 2
- 238000010586 diagram Methods 0.000 description 4
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 3
- 230000032683 aging Effects 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 238000009832 plasma treatment Methods 0.000 description 3
- 230000010148 water-pollination Effects 0.000 description 3
- 230000009286 beneficial effect Effects 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 231100001261 hazardous Toxicity 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- URXNVXOMQQCBHS-UHFFFAOYSA-N naphthalene;sodium Chemical compound [Na].C1=CC=CC2=CC=CC=C21 URXNVXOMQQCBHS-UHFFFAOYSA-N 0.000 description 1
- 231100000614 poison Toxicity 0.000 description 1
- 230000007096 poisonous effect Effects 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
Images
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- Plasma Technology (AREA)
Abstract
本实用新型公开了一种等离子体放电与雾化接枝装置，该装置包括：一组雾化喷头，该组雾化喷头安装在一个与支架连接的屏蔽罩上；和两个高压电极，位于雾化喷头的两侧，该两个高压电极与电源的一端连接，外侧安装一个与大地连接的屏蔽罩，内侧设有一个金属圆滚轴地电极。利用本实用新型，在大气压下产生空气辉光放电的区间之间加入一个雾化装置，集成和等离子体放电和表面雾化接枝技术。另外，表面接枝后时效性好，可以用于对薄膜材料的表面接枝与改性处理。
The utility model discloses a plasma discharge and atomization grafting device, which comprises: a group of atomization nozzles, the group of atomization nozzles is installed on a shielding cover connected with a support; and two high-voltage electrodes, located On both sides of the atomizing nozzle, the two high-voltage electrodes are connected to one end of the power supply, a shield connected to the ground is installed on the outside, and a metal circular shaft ground electrode is installed on the inside. Utilizing the utility model, an atomization device is added between the intervals where air glow discharge is generated under atmospheric pressure, and the plasma discharge and surface atomization grafting technologies are integrated. In addition, the timeliness is good after surface grafting, and can be used for surface grafting and modification of film materials.
Description
Technical field
The utility model relates to plasma applicating technology field, relates in particular to a kind of plasma discharge and atomizing grafting device, is the realization of installing between between two circular arc plasma discharge regions under the normal pressure device to the film surface grafting.
Background technology
Past generally is the surface of adopting naphthalene sodium method corrosion material for the hydrophily that improves material surface, adopts this method can bring serious poisonous and hazardous fluid discharge, brings very big hidden danger to environmental protection.
Utilize atmospheric plasma to handle thin-film material, the hydrophily that improves material surface is in one of plasma application technology that develops rapidly in recent years, but general material generally all keeps not long-time through the ageing of its surface hydrophilic after the plasma treatment, in order to keep hydrophilic ageing of thin-film material surface, after carrying out plasma treatment, also need carry out a kind of new hydrophilic radical of glycerol polymerization at film surface.
The hydrophily that the utility model is based on the maintenance thin-film material is a purpose, again at a kind of hydrophilic radical of its surface grafting, the device of being developed is that a binding plasma discharging surface is handled and the atomizing grafting is a kind of new equipment of continuous combined treatment after the process plasma treatment.
The utility model content
(1) technical problem that will solve
In view of this, main purpose of the present utility model is to provide a kind of plasma discharge and atomizing grafting device, handle the various thin-film materials that pass this passage with the zone that utilizes the integrated glow plasma discharge and the atomization of liquid, especially graft modification is carried out on the surface of material and handled.
(2) technical scheme
For achieving the above object, the utility model provides a kind of plasma discharge and atomizing grafting device, and this device comprises:
One group of atomizer, this group atomizer be installed in one with radome that support is connected on; With
Two high-field electrodes are positioned at the both sides of atomizer, and these two high-field electrodes are connected with an end of power supply, and a radome that is connected with the earth is installed in the outside, and the inboard is provided with a round metal roller bearing ground electrode.
In the such scheme, the liquid of this group atomizer atomizing ejection constitutes a plane, is sprayed on the surface of film.
In the such scheme, this high-field electrode be shaped as the segmental tile plate shape, the output voltage of the high voltage source that is connected is greater than 5KV, frequency range is 1 to 40KHz.
In the such scheme, this high voltage source is to adopt high frequency electric source, or adopts radio-frequency power supply.
In the such scheme, the circular arc medial surface of this high-field electrode and the outer surface of this round metal roller bearing have certain spacing.
In the such scheme, this round metal roller bearing ground electrode be installed in one with support that the earth is connected on, be separately installed with the film axis of guide at this in round metal roller bearing ground electrode both sides, thin-film material can be by the plasma discharge between high-field electrode and the round metal roller bearing ground electrode.
In the such scheme, these two high-field electrodes and this round metal roller bearing ground electrode adopt aluminum to make.
In the such scheme, this radome adopts aluminum to make.
(3) beneficial effect
This plasma discharge that the utility model provides and atomizing grafting device, its advantage is:
1, under atmospheric pressure produces and add an atomising device, integrated and plasma discharge and surface atomizing crosslinking technology between the interval of air glow discharge.
2, ageing good behind the surface grafting, can be used for the surface grafting and the modification of thin-film material are handled.
Description of drawings
Fig. 1 is the side structure schematic diagram according to the utility model embodiment plasma discharge that provides and the grafting device that atomizes;
Fig. 2 is the Facad structure schematic diagram according to the utility model embodiment plasma discharge that provides and the grafting device that atomizes.
Embodiment
For making the purpose of this utility model, technical scheme and advantage clearer,, and, the utility model is further described with reference to accompanying drawing below in conjunction with specific embodiment.
Consult side structure schematic diagram and Facad structure schematic diagram that Fig. 1 and Fig. 2 figure are respectively the utility model embodiment.One group of atomizer 109 be installed in one with radome 104 that support 111 is connected on, this atomizer can atomize and spray various liquid, in the both sides of atomizer two high-field electrodes 103 are installed respectively, this high-field electrode 103 is connected with the high-pressure side of power supply 110, a radome that is connected with the earth 104 is installed in the outside at this high-field electrode 103, these high-field electrode 103 inboards are provided with a round metal roller bearing ground electrode 112, this round metal roller bearing ground electrode 112 is installed on the support that is connected with the earth 113 by bearing 107, this support is installed on the base 101, be separately installed with the film axis of guide 102 in these both sides at round metal roller bearing ground electrode 112, when between high-field electrode 103 and metallic cylinder axle ground electrode 112, adding high frequency or radio-frequency voltage, produce plasma in the zone (slit) between two electrodes 103 and 112.Thin-film material 114 can pass the slit between these two electrodes.
Among Fig. 1 and Fig. 2,105,106,108 and 107 is fixed screws, and wherein 106 is to be connected with dielectric panel, and this dielectric panel is that to be used for fixing electrode 103,113 and 111 are metal fixed connecting plates.
Electrode 112 and 103 is to make with aluminum, and radome 104 can be used aluminum, also can make with other material.
Power supply 110 can be to adopt high frequency electric source, also can be to adopt radio-frequency power supply.
Above-described specific embodiment; the purpose of this utility model, technical scheme and beneficial effect are further described; institute is understood that; the above only is a specific embodiment of the utility model; be not limited to the utility model; all within spirit of the present utility model and principle, any modification of being made, be equal to replacement, improvement etc., all should be included within the protection range of the present utility model.
Claims (8)
1. plasma discharge and atomizing grafting device, it is characterized in that: this device comprises:
One group of atomizer, this group atomizer be installed in one with radome that support is connected on; With
Two high-field electrodes are positioned at the both sides of atomizer, and these two high-field electrodes are connected with an end of power supply, and a radome that is connected with the earth is installed in the outside, and the inboard is provided with a round metal roller bearing ground electrode.
2. plasma discharge according to claim 1 and atomizing grafting device is characterized in that: the liquid of this group atomizer atomizing ejection constitutes a plane, is sprayed on the surface of film.
3. plasma discharge according to claim 1 and atomizing grafting device is characterized in that: this high-field electrode be shaped as the segmental tile plate shape, the output voltage of the high voltage source that is connected is greater than 5KV, frequency range is 1 to 40KHz.
4. plasma discharge according to claim 3 and atomizing grafting device is characterized in that: this high voltage source is to adopt high frequency electric source, or adopts radio-frequency power supply.
5. plasma discharge according to claim 1 and atomizing grafting device, it is characterized in that: the circular arc medial surface of this high-field electrode and the outer surface of this round metal roller bearing have certain spacing.
6. plasma discharge according to claim 1 and atomizing grafting device, it is characterized in that: this round metal roller bearing ground electrode be installed in one with support that the earth is connected on, be separately installed with the film axis of guide at this in round metal roller bearing ground electrode both sides, thin-film material can be by the plasma discharge between high-field electrode and the round metal roller bearing ground electrode.
7. plasma discharge according to claim 1 and atomizing grafting device, it is characterized in that: these two high-field electrodes and this round metal roller bearing ground electrode adopt aluminum to make.
8. plasma discharge according to claim 1 and atomizing grafting device, it is characterized in that: this radome adopts aluminum to make.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2009202466284U CN201518309U (en) | 2009-10-21 | 2009-10-21 | Plasma discharge and atomization grafting device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2009202466284U CN201518309U (en) | 2009-10-21 | 2009-10-21 | Plasma discharge and atomization grafting device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN201518309U true CN201518309U (en) | 2010-06-30 |
Family
ID=42499032
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2009202466284U Expired - Lifetime CN201518309U (en) | 2009-10-21 | 2009-10-21 | Plasma discharge and atomization grafting device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN201518309U (en) |
-
2009
- 2009-10-21 CN CN2009202466284U patent/CN201518309U/en not_active Expired - Lifetime
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C41 | Transfer of patent application or patent right or utility model | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20160701 Address after: 830002, the Xinjiang Uygur Autonomous Region economic and Technological Development Zone, Urumqi, Kashi West Road, No. 499, Longhai property building, room 628 Patentee after: Xinjiang Zhongke Silk Road Technology Co.,Ltd. Address before: 100029 Beijing city Chaoyang District Beitucheng West Road No. 3 Patentee before: Institute of Microelectronics of the Chinese Academy of Sciences |
|
| CX01 | Expiry of patent term |
Granted publication date: 20100630 |
|
| CX01 | Expiry of patent term |