CN206584065U - A kind of optical film - Google Patents
A kind of optical film Download PDFInfo
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- CN206584065U CN206584065U CN201621443990.7U CN201621443990U CN206584065U CN 206584065 U CN206584065 U CN 206584065U CN 201621443990 U CN201621443990 U CN 201621443990U CN 206584065 U CN206584065 U CN 206584065U
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- 239000012788 optical film Substances 0.000 title claims abstract description 74
- 239000002245 particle Substances 0.000 claims abstract description 63
- 239000000758 substrate Substances 0.000 claims abstract description 62
- 210000000498 stratum granulosum Anatomy 0.000 claims abstract description 55
- 230000003287 optical effect Effects 0.000 claims abstract description 17
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 claims description 15
- 239000000395 magnesium oxide Substances 0.000 claims description 9
- 229910003087 TiOx Inorganic materials 0.000 claims description 8
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 8
- PFNQVRZLDWYSCW-UHFFFAOYSA-N (fluoren-9-ylideneamino) n-naphthalen-1-ylcarbamate Chemical compound C12=CC=CC=C2C2=CC=CC=C2C1=NOC(=O)NC1=CC=CC2=CC=CC=C12 PFNQVRZLDWYSCW-UHFFFAOYSA-N 0.000 claims description 7
- 239000005083 Zinc sulfide Substances 0.000 claims description 6
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 6
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 claims description 6
- 229910001635 magnesium fluoride Inorganic materials 0.000 claims description 6
- DRDVZXDWVBGGMH-UHFFFAOYSA-N zinc;sulfide Chemical compound [S-2].[Zn+2] DRDVZXDWVBGGMH-UHFFFAOYSA-N 0.000 claims description 6
- 229910001218 Gallium arsenide Inorganic materials 0.000 claims description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 5
- 239000011521 glass Substances 0.000 claims description 4
- WUKWITHWXAAZEY-UHFFFAOYSA-L calcium difluoride Chemical compound [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 claims description 3
- 229910001634 calcium fluoride Inorganic materials 0.000 claims description 3
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical group [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 claims description 3
- 239000010453 quartz Substances 0.000 claims description 3
- RUDFQVOCFDJEEF-UHFFFAOYSA-N yttrium(III) oxide Inorganic materials [O-2].[O-2].[O-2].[Y+3].[Y+3] RUDFQVOCFDJEEF-UHFFFAOYSA-N 0.000 claims description 3
- HLLICFJUWSZHRJ-UHFFFAOYSA-N tioxidazole Chemical compound CCCOC1=CC=C2N=C(NC(=O)OC)SC2=C1 HLLICFJUWSZHRJ-UHFFFAOYSA-N 0.000 claims 2
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims 1
- 239000005864 Sulphur Substances 0.000 claims 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims 1
- 239000011701 zinc Substances 0.000 claims 1
- 229910052725 zinc Inorganic materials 0.000 claims 1
- 238000001914 filtration Methods 0.000 abstract description 10
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 12
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 12
- 229910052760 oxygen Inorganic materials 0.000 description 12
- 239000001301 oxygen Substances 0.000 description 12
- 229910052710 silicon Inorganic materials 0.000 description 12
- 239000010703 silicon Substances 0.000 description 12
- 230000000694 effects Effects 0.000 description 8
- 150000001875 compounds Chemical class 0.000 description 7
- JBRZTFJDHDCESZ-UHFFFAOYSA-N AsGa Chemical compound [As]#[Ga] JBRZTFJDHDCESZ-UHFFFAOYSA-N 0.000 description 4
- 239000000463 material Substances 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 208000027418 Wounds and injury Diseases 0.000 description 2
- 230000000747 cardiac effect Effects 0.000 description 2
- 239000010408 film Substances 0.000 description 2
- 229920001296 polysiloxane Polymers 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 208000020564 Eye injury Diseases 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 230000006378 damage Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- -1 for example Substances 0.000 description 1
- 239000007792 gaseous phase Substances 0.000 description 1
- 208000014674 injury Diseases 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 239000004575 stone Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
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- Optical Filters (AREA)
Abstract
The utility model discloses a kind of optical film.The optical film includes：Substrate, the dielectric layer and stratum granulosum being alternately disposed in the substrate, wherein, the stratum granulosum includes multiple particles, and the span of the grain spacing isExtremelyThe span of the optical thickness of the dielectric layer isExtremelyAnd the refractive index of the stratum granulosum is more than or less than the refractive index of the dielectric layer.The optical film can carry out strong reflection to the light of a centre wavelength or two centre wavelength, meanwhile, influence is not produced on other wave band light waves, it is possible to achieve narrow-band filtering.
Description
Technical field
The utility model belongs to optics technical field of membrane, more particularly to a kind of optical film.
Background technology
In order to increase optics to light wave or the reflectivity of a certain specific wavelength light wave, people are often in optics
Surface patch optical film or increase plating one layer of optical film, realized by the effect of optical film to light wave or a certain specific wavelength
The strong reflection of light wave, that is, realize the filter function to light wave or a certain specific wavelength light wave.For example, on mobile phone screen
Anti-blue light film is pasted, the high energy blu-ray reflection that LED/light source in mobile phone is launched can be fallen, i.e., filtered high energy blue light by anti-blue light film,
Greatly reduce the blue light of mobile phone screen transmission, so as to reach the purpose for reducing blue light to eye injury.
Existing optical film is typically combined by the alternate dielectric layer of high and low refractive index, and the optical film can be played pair
The strong reflection effect of a certain specific wavelength light wave, but existing optical film often should when reflecting specific wavelength light wave
The light wave of other wavelength near specific wavelength light wave also reflects away a part, i.e. filter of the optical film to the specific wavelength light wave
Ripple broader bandwidth so that the problems such as light color Jing Guo optical film outgoing has deviation, has a strong impact on display effect.
Utility model content
The purpose of the utility model embodiment is to provide a kind of optical film, to tackle the filtering of optical film in the prior art
The technical problems such as broader bandwidth.
A kind of optical film of the utility model preferred embodiment offer, the light for reflecting a certain wave band, it includes：Substrate,
It is alternately disposed at dielectric layer and stratum granulosum in the substrate；The stratum granulosum includes multiple particles, and the grain spacing takes
Value scope isExtremelyThe span of the optical thickness of the dielectric layer isExtremelyAnd the folding of the stratum granulosum
The refractive index that rate is more than or less than the dielectric layer is penetrated, wherein, λ1And λ2The respectively centre wavelength of first band light and the second ripple
Duan Guang centre wavelength；
The optical film includes the structure of dielectric layer and stratum granulosum, and the wherein grain spacing in stratum granulosum belongs to the shape of stratum granulosum
Shape feature, the optical thickness of dielectric layer belongs to the architectural feature of dielectric layer.
In the optical film described in the utility model preferred embodiment, the central wavelength lambda of the first band light1With second
The central wavelength lambda of band of light2It is equal.
In the optical film described in the utility model preferred embodiment, contact the substrate one layer is the stratum granulosum,
Outermost layer away from the substrate is the stratum granulosum or the dielectric layer.
In the optical film described in the utility model preferred embodiment, contact the substrate one layer is the dielectric layer,
Outermost layer away from the substrate is the stratum granulosum or the dielectric layer.
In the optical film described in the utility model preferred embodiment, the diameter of the particle is less than
In the optical film described in the utility model preferred embodiment, the central wavelength lambda of the first band light1With second
The central wavelength lambda of band of light2Span be 100 nanometers to 2000 microns.
In the optical film described in the utility model preferred embodiment, the particle be magnesium oxide particle, yttria particles,
Zns particle, zinc selenide particle, GaAs particle, magnesium fluoride particle, calcium fluoride particles, alumina particle, SiOxParticle,
TiOxParticle and/or NbOxParticle；
The dielectric layer is magnesia dielectric layer, yittrium oxide dielectric layer, zinc sulphide dielectric layer, zinc selenide dielectric layer, arsenic
Gallium dielectric layer, magnesium fluoride dielectric layer, calcirm-fluoride dielectric layer, alumina medium layer, SiOxDielectric layer, TiOxDielectric layer and/or NbOx
Dielectric layer；
Wherein above-mentioned particle and dielectric layer are known product, for using known product to optical film dielectric layer and
The restriction of granulosa.
In the optical film described in the utility model preferred embodiment, the substrate includes metallic substrates, substrate of glass, stone
English substrate, rubber substrate or plastic-substrates.
In the optical film described in the utility model preferred embodiment, the trueness error of the grain spacing is not more than described
The 5% of grain spacing.
In the optical film described in the utility model preferred embodiment, the trueness error of the optical thickness is not more than described
The 5% of optical thickness.
Compared with prior art, the utility model preferred embodiment provides a kind of optical film.The optical film passes through in substrate
On be arranged alternately dielectric layer and stratum granulosum, wherein, stratum granulosum includes multiple particles, and the span of the grain spacing isExtremelyThe span of the optical thickness of the dielectric layer isExtremelyThe refractive index of stratum granulosum is more than or less than
The refractive index of dielectric layer, wherein, λ1And λ2The respectively centre wavelength of first band light and the centre wavelength of second band light.Should
Optical film can carry out strong reflection to the light of first band and second band simultaneously, without producing influence to other wave band light waves,
Narrow-band filtering is carried out to the light of first band and second band simultaneously；Especially when the centre wavelength and second of first band light
When the centre wavelength of band of light is equal, it is possible to achieve to the narrow-band filtering of the light of a specific band.
Brief description of the drawings
, below will be to embodiment or prior art in order to illustrate more clearly of the technical scheme in the utility model embodiment
The accompanying drawing used required in description is briefly described, it should be apparent that, drawings in the following description are only that this practicality is new
Some embodiments of type, for those of ordinary skill in the art, without having to pay creative labor, can be with
Other accompanying drawings are obtained according to these accompanying drawings.
Fig. 1 is the structural representation for the first optical film that the utility model preferred embodiment is provided；
Fig. 2 is the structural representation for second of optical film that the utility model preferred embodiment is provided；
Fig. 3 is the structural representation for the third optical film that the utility model preferred embodiment is provided；
Fig. 4 is the structural representation for the 4th kind of optical film that the utility model preferred embodiment is provided.
Embodiment
In describing below, in order to illustrate rather than in order to limit, it is proposed that such as particular system structure, interface, technology it
The detail of class, the utility model embodiment is understood to cut thoroughly.However, it will be clear to one skilled in the art that not having
The utility model can also be realized by having in the other embodiments of these details.In other situations, omission pair is well-known
System, device, the detailed description of circuit and method, in order to avoid unnecessary details hinders description of the present utility model.
It should be noted that in the accompanying drawing involved by this specification, identical part will use identical label.
Refer to Fig. 1, the structural representation for the first optical film that Fig. 1 provides for the utility model preferred embodiment.This
Optical film in preferred embodiment can be used for the light for reflecting certain wave band, and allow the light of its all band to pass through, i.e., by certain wave band
Light is filtered out, for example, can be attached to light-emitting diode display surface and play the blue light transmissive effect of reduction；It can be used for certain in light wave
The light wave of specific band chooses, and is separated by reflecting, so as to obtain the light wave of certain specific band.Here, will not
Particular use to the optical film in this preferred embodiment is limited.
Optical film in this preferred embodiment includes：Substrate 10, stratum granulosum 11 and dielectric layer 12.Shown in Fig. 1 dotted line frames
Part is stratum granulosum 11, and stratum granulosum 11 includes multiple particles 111, i.e. stratum granulosum 11 by being distributed multiple particles on the substrate 10
111 compositions.
Specifically, stratum granulosum 11 is alternately located in substrate 10 with dielectric layer 12, as shown in Figure 1.In substrate 10 to Jie
On the direction of matter layer 12, the first layer contacted with substrate 10 is stratum granulosum 11, is first layer medium on first layer stratum granulosum 11
Layer 12, and the gap that first layer dielectric layer 12 is filled up between particle 111.It is second layer stratum granulosum 11 on first layer dielectric layer 12,
By that analogy, until forming structure as shown in Figure 1.
Grain spacing L span can beExtremelyThe span of the optical thickness of dielectric layer can beExtremelyAnd the refractive index of stratum granulosum 11 is more than or less than the refractive index of dielectric layer 12, wherein, λ1And λ2Respectively first
The centre wavelength of band of light and the centre wavelength of second band light.In Fig. 1, d is the physical thickness of dielectric layer.
In one embodiment, the trueness error of grain spacing is not more than the 5% of grain spacing；The trueness error of optical thickness
No more than the 5% of optical thickness.
In actual application, grain spacing L value can be more than the optical thickness of dielectric layer, might be less that medium
The optical thickness of layer, can also be equal to the optical thickness of dielectric layer, be not particularly limited herein.The optical film can be simultaneously to the
The light of the centre wavelength of one band of light and the centre wavelength of second band light carries out strong reflection, meanwhile, not to other wave band light waves
Influence is produced, so as to realize the effect of narrow-band filtering.In a preferred embodiment, grain spacing value isDielectric layer
Optical thickness value be
In a preferred embodiment, the central wavelength lambda of first band light1With the central wavelength lambda of second band light2It is equal.
That is, the optical film is used for a length of λ of centering cardiac wave1Light carry out narrow-band filtering.For example, when the centre wavelength of first band light
λ1With the central wavelength lambda of second band light2When taking 440 nanometers, the optical film is by the high energy of only a length of 440 nanometers of centering cardiac wave
Blue light carries out strong reflection, i.e., carry out narrow-band filtering to high energy blue light.It is affixed on when by the optical film on mobile phone screen, when in mobile phone
When the light of LED/light source transmitting incides optical film, optical film filters out in LED/light source 90% high energy blu-ray reflection absolutely
Most of high energy blue light so that only containing 10% or so a small amount of blue light from the transmitted light of optical film outgoing, so as to reduce
Injury of the high energy blue light to eyes.Simultaneously as the optical film employs the structure that stratum granulosum 11 is arranged alternately with dielectric layer 12,
And grain spacing is 110 nanometersSo that the optical film filters the smaller bandwidth of blue light, so as to avoid filtering blue light
While the light of other colors is also filtered, ensure display effect in the case of, it is possible to reduce wound of the high energy blue light to eyes
Evil.
Certainly, in other preferred embodiments, the central wavelength lambda of first band light1With the central wavelength lambda of second band light2
Can also be unequal.When the central wavelength lambda of first band light1With the central wavelength lambda of second band light2When unequal, the optical film
The central wavelength lambda that narrow-band filtering, such as first band light are carried out to the light of two centre wavelength can be realized1Take 440 nanometers,
The central wavelength lambda of two band of light2700 nanometers are taken, so the optical film can just carry out strong anti-to high energy blue light and feux rouges simultaneously
Penetrate, realize to blue light and the narrow-band filtering of feux rouges.
In a preferred embodiment, the central wavelength lambda of first band light1With the central wavelength lambda of second band light2Value
Scope is 100 nanometers to 2000 microns, in actual applications, can be according to the central wavelength lambda of first band light1And second band
The central wavelength lambda of light2Size design particle 111 spacing and dielectric layer 12 thickness, so as to realize to some center
The strong reflection of wavelength or the light of two centre wavelength.Meanwhile, the size of particle 111 can not be excessive, and the diameter of general particle 111 is small
InAnd the size of multiple particles can also be incomplete same.When stratum granulosum 11 is only made up of one layer of particle 111, particle
111 diameter is the thickness of stratum granulosum 11.
In addition, particle 111 be magnesium oxide particle, yttria particles, zns particle, zinc selenide particle, GaAs particle,
Magnesium fluoride particle, calcium fluoride particles, alumina particle, SiOxParticle, TiOxParticle, NbOxOne or more in particle.Need
It is noted that SiOxParticle is the compound formed by two kinds of elements of silicon (Si) and oxygen (O), for example, using chemical gaseous phase
Depositing operation is made during the compound, and silicon and oxygen may generate compound according to non-default component ratio.When preparation is SiO
When, ideally, the component ratio of silicon and oxygen is 1:1, but when silicone content is more, the component ratio of silicon and oxygen may be high
In 1:1.Therefore, SiO can will be write a Chinese character in simplified form into by the compound of silicon and oxygen generationx, x represents the composition ratio of oxygen and silicon, and such as x is
1.2。TiOxParticle and NbOxThe situation and SiO of particlexParticle is similar, will not be repeated here.
Dielectric layer 12 is magnesia dielectric layer, yittrium oxide dielectric layer, zinc sulphide dielectric layer, zinc selenide dielectric layer, GaAs
Dielectric layer, magnesium fluoride dielectric layer, calcirm-fluoride dielectric layer, alumina medium layer, SiOxDielectric layer, TiOxDielectric layer, NbOxMedium
One or more in layer.It should be noted that SiOxDielectric layer is the chemical combination formed by two kinds of elements of silicon (Si) and oxygen (O)
Thing, for example, during the compound is made using chemical vapor deposition method, silicon and oxygen may be according to non-default component ratios
Generate compound.When preparation is SiO, ideally, the component ratio of silicon and oxygen is 1:1, but when silicone content is more,
The component ratio of silicon and oxygen is likely to be greater than 1:1.Therefore, SiO can will be write a Chinese character in simplified form into by the compound of silicon and oxygen generationx, x represents oxygen
With the composition ratio of silicon, such as x is 1.2.TiOxDielectric layer and NbOxThe situation and SiO of dielectric layerxDielectric layer is similar, herein no longer
Repeat.
Certainly, particle 111 and dielectric layer 12 can also use other above-mentioned unlisted materials, not do specific limit herein
System, as long as the refractive index for meeting stratum granulosum 11 is more than or less than the refractive index of dielectric layer 12.For example, when stratum granulosum 11 is used
During magnesia, dielectric layer 12 can use zinc sulphide so that the refractive index of stratum granulosum 11 is less than the refractive index of dielectric layer 12.When
So, stratum granulosum 11 can also use zinc sulphide, and dielectric layer 12 uses magnesia so that the refractive index of stratum granulosum 11 is more than medium
The refractive index of layer 12.
Certainly, different layers stratum granulosum 11 or different layers dielectric layer 12 can also use different materials, for example, in Fig. 1
Stratum granulosum 11 in, some stratum granulosum 11 uses magnesia, and another part stratum granulosum 11 uses yittrium oxide, similarly, medium
In layer 12, a part of dielectric layer 12 uses zinc sulphide, and another part dielectric layer 12 uses zinc selenide, so that stratum granulosum 11
Refractive index is respectively less than the refractive index of dielectric layer 12.The specific material of stratum granulosum 11 and dielectric layer 12 can be selected according to actual needs
It is fixed, it is not particularly limited herein.
In the preferred embodiment, substrate 10 is transparent substrate, for example, substrate of glass or quartz substrate etc., so as to
To allow the light after optical film to pass through substrate 10, or incident light can be caused to be incident to stratum granulosum by substrate 10
11 and dielectric layer 12 in.When using the optical film, incident light can be incident to the direction of dielectric layer 12 from substrate 10, also may be used
With incident from dielectric layer 12 to the direction of substrate 10.It is no matter incident from which direction, it can reach identical technique effect.
Certainly, in other embodiments, substrate 10 can also be for rubber substrate, plastic-substrates and metallic substrates etc., can be with
Different substrates 10 are selected according to the practical application of optical film.For example, when optical film is used to reflect a certain of visible light wave range
During wavelength light wave, substrate 10 can be substrate of glass or quartz substrate；When optical film is used for a certain wavelength of microwave reflection wave band
During light wave, substrate 10 can be ceramic bases, rubber substrate or plastic-substrates；When optical film is without transmitted light wave, substrate 10
Can be metallic substrates.
It should be noted that the structure of the optical film shown in Fig. 1 is only one kind therein, that is, contact the one of substrate 10
Layer is stratum granulosum 11, and the outermost layer away from substrate 10 is dielectric layer 12.The structure of optical film of the present utility model can also be it
His structure, such as Fig. 2 are to the structure shown in Fig. 4.Fig. 2 to Fig. 4 is referred to, Fig. 2, Fig. 3 and Fig. 4 are respectively that this practicality is new
Second, the structural representation of the third and the 4th kind of optical film that type preferred embodiment is provided.
In the structure of second of optical film shown in Fig. 2, one layer of contact substrate 10 is stratum granulosum 11, away from substrate 10
Outermost layer also be stratum granulosum 11.In the structure of the third optical film shown in Fig. 3, one layer of contact substrate 10 is dielectric layer
12, the outermost layer away from substrate 10 is also dielectric layer 12.In the structure of the 4th kind of optical film shown in Fig. 4, substrate 10 is contacted
One layer be dielectric layer 12, away from substrate 10 outermost layer be stratum granulosum 11.
It should be noted that Fig. 1 to Fig. 4 only illustrates the approximate location relation of particle 111, it is impossible to be used in limit this reality
With the specific arrangement mode of multiple particles 111 in new.It is understood that during the actual fabrication stratum granulosum 11,
It can not can guarantee that multiple particles 111 use same distribution mode proper alignment, every layer of stratum granulosum 11 in every layer of stratum granulosum 11
In multiple particles 111 can irregularly arrange, as long as the spacing for meeting particle 111 is of substantially equal.
Optical film in this preferred embodiment, by being arranged alternately dielectric layer and stratum granulosum in substrate, wherein, stratum granulosum
It is made up of multiple particles, the span of grain spacing isExtremelyThe span of the optical thickness of dielectric layer is
ExtremelyThe refractive index of stratum granulosum is more than or less than the refractive index of dielectric layer.The optical film can be simultaneously to a centre wavelength
Or the light of two centre wavelength carries out strong reflection, meanwhile, influence is not produced on other wave band light waves, so as to realize that arrowband is filtered
The effect of ripple.
Embodiment described above is only to illustrate the technical solution of the utility model, rather than its limitations；Although with reference to before
Embodiment is stated the utility model is described in detail, it will be understood by those within the art that：It still can be with
Technical scheme described in foregoing embodiments is modified, or equivalent substitution is carried out to which part technical characteristic；And
These modifications are replaced, and the essence of appropriate technical solution is departed from each embodiment technical scheme of the utility model embodiment
Spirit and scope.
Claims (10)
1. a kind of optical film, the light for reflecting certain wave band, it is characterised in that including：Substrate, it is alternately disposed in the substrate
Dielectric layer and stratum granulosum；The stratum granulosum includes multiple particles, and the span of the grain spacing isExtremelyInstitute
The span for stating the optical thickness of dielectric layer isExtremelyAnd the refractive index of the stratum granulosum be more than or less than given an account of
The refractive index of matter layer, wherein, λ1And λ2The respectively centre wavelength of first band light and the centre wavelength of second band light.
2. optical film according to claim 1, it is characterised in that the central wavelength lambda of the first band light1With the second ripple
Duan Guang central wavelength lambda2It is equal.
3. optical film according to claim 1, it is characterised in that one layer of the contact substrate is the stratum granulosum, far
Outermost layer from the substrate is the stratum granulosum or the dielectric layer.
4. optical film according to claim 1, it is characterised in that one layer of the contact substrate is the dielectric layer, far
Outermost layer from the substrate is the stratum granulosum or the dielectric layer.
5. optical film according to claim 1, it is characterised in that the diameter of the particle is less than
6. optical film according to claim 5, it is characterised in that the central wavelength lambda of the first band light1With the second ripple
Duan Guang central wavelength lambda2Span be 100 nanometers to 2000 microns.
7. optical film according to claim 1, it is characterised in that the particle is magnesium oxide particle, yttria particles, sulphur
Change zinc particle, zinc selenide particle, GaAs particle, magnesium fluoride particle, calcium fluoride particles, alumina particle, SiOx particles, TiOx
Particle and/or NbOx particles；
The dielectric layer is magnesia dielectric layer, yittrium oxide dielectric layer, zinc sulphide dielectric layer, zinc selenide dielectric layer, GaAs Jie
Matter layer, magnesium fluoride dielectric layer, calcirm-fluoride dielectric layer, alumina medium layer, SiOx dielectric layers, TiOx dielectric layers and/or NbOx are situated between
Matter layer.
8. optical film according to claim 1, it is characterised in that the substrate includes metallic substrates, substrate of glass, quartz
Substrate, rubber substrate or plastic-substrates.
9. optical film according to claim 1, it is characterised in that the trueness error of the grain spacing is not more than described
Intergranular away from 5%.
10. optical film according to claim 1, it is characterised in that the trueness error of the optical thickness is not more than described
The 5% of optical thickness.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201621443990.7U CN206584065U (en) | 2016-12-26 | 2016-12-26 | A kind of optical film |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201621443990.7U CN206584065U (en) | 2016-12-26 | 2016-12-26 | A kind of optical film |
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| Publication Number | Publication Date |
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| CN206584065U true CN206584065U (en) | 2017-10-24 |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106772747A (en) * | 2016-12-26 | 2017-05-31 | 深圳市光科全息技术有限公司 | A kind of optical film and preparation method thereof |
-
2016
- 2016-12-26 CN CN201621443990.7U patent/CN206584065U/en active Active
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106772747A (en) * | 2016-12-26 | 2017-05-31 | 深圳市光科全息技术有限公司 | A kind of optical film and preparation method thereof |
| CN106772747B (en) * | 2016-12-26 | 2022-10-18 | 深圳市光科全息技术有限公司 | Optical film and manufacturing method thereof |
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