CN206422067U - A kind of display device structure - Google Patents
A kind of display device structure Download PDFInfo
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- CN206422067U CN206422067U CN201720072075.XU CN201720072075U CN206422067U CN 206422067 U CN206422067 U CN 206422067U CN 201720072075 U CN201720072075 U CN 201720072075U CN 206422067 U CN206422067 U CN 206422067U
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- groove pattern
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Abstract
The utility model discloses a kind of display device structure, including：Substrate；Device layer, is arranged on substrate, wherein, device layer includes viewing area and borderline region, and borderline region is etched with groove pattern；Thin-film encapsulation layer, the viewing area of covering device layer, and cover a part of the groove pattern close to viewing area for borderline region.The utility model covers a part for the groove pattern by the borderline region formation groove pattern in device layer, thin-film encapsulation layer, and its inorganic layer is overlapped with Array substrates inorganic layer, is conducive to improving packaging effect.Simultaneously because being etched with groove pattern on the borderline region, when being cut at the groove pattern, acted on by groove and reduce producing for crack, and due to being stopped by groove after crack is produced, its crack will not extend to viewing area.
Description
Technical field
The utility model is related to display technology field, and in particular to a kind of display device structure.
Background technology
In display technology field, liquid crystal display (Liquid Crystal Display, LCD) and Organic Light Emitting Diode
The flat panel displays such as display (Organic Light Emitting Diode, OLED) progressively replace CRT monitor.
Wherein, OLED have that self-luminous, driving voltage are low, luminous efficiency is high, the response time is short, definition and contrast it is high, nearly 180 °
Visual angle, temperature in use scope are wide, many advantages, such as Flexible Displays are with large area total colouring can be achieved, it is most to be known as by industry
There is the display device of development potentiality.
It has been investigated that, existing display device is more crisp due to the inorganic layer quality in thin-film encapsulation layer, is carrying out edge
Its inorganic layer easily produces crack during cutting, and extends to the internal portion of screen, so that causing the yield of device reduces.
Utility model content
The technical problems to be solved in the utility model is that existing display device its film when carrying out edge cuts is sealed
Inorganic layer easily produces crack and extends to the internal portion of screen in dress layer, so as to provide a kind of display device structure.
The utility model embodiment provides a kind of display device structure, including：Substrate；Device layer, is arranged on the base
On plate, wherein, the device layer includes viewing area and borderline region, and the borderline region is etched with groove pattern；Film is sealed
Layer is filled, the viewing area of the device layer is covered, and covers the groove pattern of the borderline region close to the viewing area
The part in domain.
Alternatively, the groove pattern is etched to the substrate.
Alternatively, the thin-film encapsulation layer includes：Inorganic layer, covers the viewing area of the device layer, and cover described
A part of the groove pattern close to the viewing area；Organic layer, covers the inorganic layer.
Alternatively, the organic layer only covers the inorganic layer on the viewing area of the device layer.
Alternatively, the inorganic layer is silicon nitride inorganic layer, Alumina Inorganic layer, silica inorganic layer, oxidation Ti-inorganic
At least one of layer.
Alternatively, the device layer includes：TFT device layers, are set on the substrate；Organic luminous layer, is arranged on institute
State on the TFT device layers of viewing area.
Alternatively, it is additionally provided with cushion between the substrate and the TFT device layers.
Alternatively, the borderline region is apart from the region on 80-120 μm of border.
Alternatively, the groove pattern is made up of groove array, the shape of the cross section of each groove in the groove array
Including at least one of：Rectangle, square, circle, ellipse, rhombus.
According to the utility model embodiment, by the borderline region formation groove pattern in device layer, thin-film encapsulation layer is covered
A part for the groove pattern is covered, its inorganic layer is overlapped with Array substrates inorganic layer, be conducive to improving packaging effect.While by
In being etched with groove pattern on the borderline region, when being cut at the groove pattern, reduced by the effect of groove
The generation in crack, and due to being stopped by groove after crack is produced, its crack will not extend to viewing area.
Brief description of the drawings
, below will be right in order to illustrate more clearly of the utility model embodiment or technical scheme of the prior art
The accompanying drawing used required in embodiment or description of the prior art is briefly described, it should be apparent that, describe below
In accompanying drawing be some embodiments of the present utility model, for those of ordinary skill in the art, do not paying creativeness
On the premise of work, other accompanying drawings can also be obtained according to these accompanying drawings.
Fig. 1 is the side cross-sectional, view of display device structure in the utility model embodiment；
Fig. 2 is the top view of display device structure in the utility model embodiment；
Fig. 3 is a kind of side cross-sectional, view of optional display device structure in the utility model embodiment.
Embodiment
The technical solution of the utility model is clearly and completely described below in conjunction with accompanying drawing, it is clear that described
Embodiment is a part of embodiment of the utility model, rather than whole embodiments.Based on the embodiment in the utility model, sheet
The every other embodiment that field those of ordinary skill is obtained under the premise of creative work is not made, belongs to this practicality
Novel protected scope.
, it is necessary to explanation in description of the present utility model, term " " center ", " on ", " under ", it is "left", "right", " perpendicular
Directly ", the orientation or position relationship of the instruction such as " level ", " interior ", " outer " are, based on orientation shown in the drawings or position relationship, to be only
Described for the ease of description the utility model and simplifying, rather than to indicate or imply that signified device or element must have specific
Orientation, with specific azimuth configuration and operation, therefore it is not intended that to limitation of the present utility model.In addition, term " the
One ", " second ", " the 3rd " are only used for describing purpose, and it is not intended that indicating or implying relative importance.
, it is necessary to which explanation, unless otherwise clearly defined and limited, term " are pacified in description of the present utility model
Dress ", " connected ", " connection " should be interpreted broadly, for example, it may be being fixedly connected or being detachably connected, or integrally be connected
Connect；Can be mechanical connection or electrical connection；Can be joined directly together, can also be indirectly connected to by intermediary, also
It can be the connection of two element internals, can be wireless connection or wired connection.For the ordinary skill of this area
For personnel, concrete meaning of the above-mentioned term in the utility model can be understood with concrete condition.
As long as in addition, technical characteristic involved in the utility model different embodiments disclosed below is each other
Not constituting conflict can just be combined with each other.
The present embodiment provides a kind of display device structure, and as depicted in figs. 1 and 2, the display device structure includes：Substrate
10th, device layer 20 and thin-film encapsulation layer 30, wherein, device layer 20 is set on the substrate 10, wherein, device layer 20 includes viewing area
Domain 21 and borderline region 22, borderline region 22 are etched with groove pattern 221；The viewing area of the covering device of thin-film encapsulation layer 30 layer 20
Domain 21, and cover a part of the groove pattern 221 close to viewing area 21 for borderline region 22.Groove pattern 221 is by groove battle array
The shape of the cross section of each groove includes at least one of in row composition, groove array：Rectangle, square, circle, ellipse
Shape, rhombus.
In the present embodiment, substrate 10 can be thin film transistor (TFT) (Thin Film Transistor, referred to as TFT) base
Plate, viewing area 21 includes active area (Active Area, referred to as AA).Groove pattern 221 can be etched to substrate 10,
It is through device layer 20；A part for device layer 20 can also be etched to, that is, is not passed through device layer 20.Fig. 1 illustrate only it
Concave groove pattern passes through layer 20.
When being cut to the display device, using borderline region 22 as area to be cut, thin-film encapsulation layer 30 is not contacted.
Thin-film package inorganic layer covers the groove pattern, is overlapped with Array substrates inorganic layer, is conducive to improving packaging effect.While by
In being etched with groove pattern 221 on the borderline region 22, when being cut at the groove pattern 221, by groove
Effect reduces the generation in crack, and due to being stopped by groove after crack is produced, its crack will not be to viewing area 21
Extension.
In the present embodiment, when groove pattern 221 is etched to substrate 10, because thin-film encapsulation layer 30 covers the groove figure
Contacted during a part for case 221 with substrate 10, so that the caking property of thin-film encapsulation layer 30 and substrate 10 is added, enhancing encapsulation effect
Really, accordingly even when repeatedly bending, also will not cause thin-film encapsulation layer 30 to be separated with substrate 10.
As a kind of improvement project of above-described embodiment, as shown in figure 3, thin-film encapsulation layer 30 includes in the present embodiment：Nothing
Machine layer 31, the viewing area 21 of covering device layer 20, and cover a part of the groove pattern 221 close to viewing area 21；It is organic
Layer 32, covers inorganic layer 31.Further, the inorganic layer 31 on the only viewing area 21 of covering device layer 20 of organic layer 32.It is aobvious
So, in the present embodiment, organic layer can also be the whole inorganic layer of covering, and shown in Fig. 2 is only a kind of optional of the present embodiment
Embodiment, does not cause any restriction.
As an alternative embodiment, as shown in figure 3, another layer of inorganic layer can also be covered on organic layer 32 again
33, when the inorganic layer 31 on the organic layer 32 only viewing area 21 of covering device layer 20, another layer of inorganic layer 33 is then covered
All organic layers 32 but than inorganic layer 31 closer to viewing area, so, it is possible to prevente effectively from moisture and oxygen enter in device
Portion.
As the further improvement project of above-described embodiment, as shown in figure 3, device layer 20 includes：TFT device layers 23 and have
Machine luminescent layer 25.
TFT device layers 23 are set on the substrate 10；TFT device layers 23 drive for TFT.
For TFT device layers 23, its forming process includes：Be sequentially depositing on substrate cushion, polysilicon layer (PSi),
Gate insulator (GI), metal electrode layer M1, capacitive insulating layer (CI), metal electrode layer M2, it is necessary to explanation, it is above-mentioned in
PSi layers, M1 layers, M2 layers are required to be patterned after having deposited, and redeposited next layer after patterning；Then, exist
Interlayer insulating film (ILD) is deposited on the M2 layers of above-mentioned TFT device layers, and is patterned；In addition, in its boundary, passing through ILD
Layer forms certain groove pattern, and groove pattern cross section can be rectangle, circle, square, ellipse, diamond hole etc., and
It is not limited to these patterns, pattern etch to cushion；Then, metal electrode layer M3, planarization layer are sequentially depositing on ILD layer
(PLA), anode layer, pixel defining layer, support column are, it is necessary to explanation, above-mentioned metal electrode layer M3, planarization layer (PLA), sun
After pole layer, pixel defining layer, each layer of support column have been deposited, it is required to be patterned, and could sink after patterning
The next layer of product.
After the formation of TFT device layers 23, in evaporation OLED organic luminous layers 25 thereon.
Further, buffering (buffer layer) layer (buffer is additionally provided between substrate 10 and TFT device layers 23
layer)40.Groove pattern 221 is etched to cushion 40.
As a kind of improvement project of above-described embodiment, in the present embodiment, inorganic layer be silicon nitride inorganic layer, aluminum oxide without
At least one of machine layer, silica inorganic layer, titanium oxide inorganic layer.Interlayer insulating film can also be silicon nitride layer, so, film
The inorganic layer of encapsulated layer uses identical material with interlayer insulating film, and caking property is good, and the probability that crack is produced during cutting is small.
In the utility model embodiment, borderline region is apart from the region on 80-120 μm of border, with 100 μm of region of distance
It is optimal.
Obviously, above-described embodiment is only intended to clearly illustrate example, and the not restriction to embodiment.It is right
For those of ordinary skill in the art, can also make on the basis of the above description it is other it is various forms of change or
Change.There is no necessity and possibility to exhaust all the enbodiments.And the obvious change thus extended out or
Among changing still in the protection domain of the application.
Claims (9)
1. a kind of display device structure, it is characterised in that including：
Substrate；
Device layer, is set on the substrate, wherein, the device layer includes viewing area and borderline region, the frontier district
Domain is etched with groove pattern；
Thin-film encapsulation layer, covers the viewing area of the device layer, and it is close to cover the groove pattern of the borderline region
A part for the viewing area.
2. display device structure according to claim 1, it is characterised in that the groove pattern is etched to the substrate.
3. display device structure according to claim 1, it is characterised in that the thin-film encapsulation layer includes：
Inorganic layer, covers the viewing area of the device layer, and covers the groove pattern close to one of the viewing area
Point；
Organic layer, covers the inorganic layer.
4. display device structure according to claim 3, it is characterised in that the organic layer only covers the device layer
Inorganic layer on viewing area.
5. the display device structure according to claim 3 or 4, it is characterised in that the inorganic layer be silicon nitride inorganic layer,
At least one of Alumina Inorganic layer, silica inorganic layer, titanium oxide inorganic layer.
6. the display device structure according to any one of Claims 1-4, it is characterised in that the device layer includes：
TFT device layers, are set on the substrate；
Organic luminous layer, is arranged on the TFT device layers of the viewing area.
7. display device structure according to claim 6, it is characterised in that between the substrate and the TFT device layers
It is additionally provided with cushion.
8. display device structure according to claim 1, it is characterised in that the borderline region is apart from border 80-120
μm region.
9. display device structure according to claim 1, it is characterised in that the groove pattern is made up of groove array,
The shape of the cross section of each groove includes at least one of in the groove array：Rectangle, square, circle, ellipse, water chestnut
Shape.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201720072075.XU CN206422067U (en) | 2017-01-20 | 2017-01-20 | A kind of display device structure |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201720072075.XU CN206422067U (en) | 2017-01-20 | 2017-01-20 | A kind of display device structure |
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| CN206422067U true CN206422067U (en) | 2017-08-18 |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107591498A (en) * | 2017-08-31 | 2018-01-16 | 京东方科技集团股份有限公司 | OLED display panel and preparation method thereof, OLED display |
| CN108598287A (en) * | 2018-06-29 | 2018-09-28 | 上海天马微电子有限公司 | Flexible touch display panel, manufacturing method thereof and flexible touch display device |
-
2017
- 2017-01-20 CN CN201720072075.XU patent/CN206422067U/en active Active
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107591498A (en) * | 2017-08-31 | 2018-01-16 | 京东方科技集团股份有限公司 | OLED display panel and preparation method thereof, OLED display |
| US11696465B2 (en) | 2017-08-31 | 2023-07-04 | Boe Technology Group Co., Ltd. | OLED display motherboard and method for manufacturing the same, method for manufacturing OLED display panel and OLED display device thereof |
| CN108598287A (en) * | 2018-06-29 | 2018-09-28 | 上海天马微电子有限公司 | Flexible touch display panel, manufacturing method thereof and flexible touch display device |
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