CN206304929U - A kind of plasma polymerized coating device - Google Patents
A kind of plasma polymerized coating device Download PDFInfo
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- CN206304929U CN206304929U CN201621296613.5U CN201621296613U CN206304929U CN 206304929 U CN206304929 U CN 206304929U CN 201621296613 U CN201621296613 U CN 201621296613U CN 206304929 U CN206304929 U CN 206304929U
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Abstract
A kind of plasma polymerized coating device, belongs to Plasma Engineering technical field, and any cross section of chamber body inwall of the vacuum installation sidepiece is the circle of same diameter or the regular polygon of the identical length of side, and regular polygon is when number is at least 6；Porous electrode is installed at vacuum chamber interior walls, porous electrode is connected with high frequency electric source, at least two discharge cavities are sealed and installed with outer vacuum chamber wall, discharge cavity is provided with least double layer of metal aperture plate with vacuum chamber interior walls junction, it is vertically-mounted on central shaft in vacuum chamber to have exhaust gas collecting pipe, rotary shelf for placing articles, the rotary shaft of the rotary shelf for placing articles and the central axis of vacuum chamber are provided with vacuum chamber, pending base material is placed on rotary shelf for placing articles.The device of the utility model keeps the stability of spatial clustering reactivity species concentration using vacuum chamber structure substantially symmetrical about its central axis, and the volume with vacuum chamber is big, and single treatment batch is big, the advantages for the treatment of effeciency is high, low cost, batch processing have good uniformity.
Description
Technical field
The utility model belongs to Plasma Engineering technical field, is related to a kind of plasma coating device.
Background technology
Plasma polymerized coating treatment be a kind of important surface treatment method, it be need to base material to be processed be placed on
In vacuum chamber, process gas and gaseous state organic monomer are passed through under vacuum conditions, by electric discharge organic gaseous monomer etc.
Gas ions, make it produce all kinds of spikes, and addition reaction is carried out by between these spikes or between spike and monomer,
Substrate surface forms thin polymer film.During in hydrophobic film etc., some are applied, the plasma polymerized coating of nanoscale has
Excellent characteristic.But because the film layer of nanometer polymer coating is very thin, its uniformity to coating has requirement very high.It is existing
Plasma nano plater use square vacuum chamber, during coating treatment, tool and the base material placed thereon
Position in vacuum chamber be it is fixed, due to same batch processing diverse location of the different substrate materials in vacuum chamber and electrode,
The difference of distance, inevitably results from the difference of coating uniformity between monomer/vector gas outlet, vaccum exhaust outlet etc.
Not.In order to reduce the inhomogeneities of this batch processing, existing plasma nano plater can only be using smaller volume
In batches, this greatly reduced treatment effeciency, increases cost for vacuum chamber and less single treatment.Even and if so, also still
Satisfied batch processing uniformity can not so be reached.With the quick expansion of current nanometer polymer coating application, process requirements and
Batch is sharply increased, solve that the batch that current plasma nano coating processing prior art is present is small, efficiency is low, high cost,
The problem of batch processing lack of homogeneity is very real and urgent.
Utility model content
The technical problems to be solved in the utility model is to provide a kind of plasma nano plater, existing etc. to solve
Gas ions nano coating device using square vacuum chamber volume is small, single treatment batch is small, treatment effeciency is low, high cost, batch
The bad problem of process uniformity.
Technical solutions of the utility model are：A kind of plasma polymerized coating device, including vacuum chamber, it is characterised in that：
Any cross section of chamber body inwall of the vacuum chamber sidepiece for same diameter circle or the identical length of side regular polygon, it is described just many
In shape, number is at least 6 sides；
Porous electrode is installed in the vacuum chamber at the inwall of vacuum chamber, the porous electrode be with vacuum chamber
Wall keeps the porous globoidal structure of spacing, the porous electrode to be connected with high frequency electric source, and the power of high frequency electric source is 15-1000W,
Porous electrode is powered by high frequency electric source, is produced plasma to be used for substrate surface during electric discharge and is cleaned and pre-process；
At least two discharge cavities are sealed and installed with the outer vacuum chamber wall；Porous electrode can be according to work with each discharge cavity
Skill needs common electric discharge or independently discharges.
Porous electrode produces plasma for cleaning, i.e. surface cleaning：The continuous discharge of porous electrode relatively high power is produced
Stronger plasma, for the organic impurities such as aqueous vapor, greasy dirt of cleaning substrate surface before coating, can also activate organic base
Material, dangling bonds are formed on its surface, beneficial to the deposition of coating, the adhesion of enhancing base materials and coating, and porous electrode is in coating mistake
Do not worked in journey；
Discharge cavity produces plasma for being polymerized：In coating procedure in each discharge cavity smaller power electric discharge produce it is weaker etc.
Gas ions, discontinuously discharge into vacuum chamber and trigger monomer to be polymerized and be deposited on substrate surface and form coating by metal grid mesh control.
The discharge cavity is provided with least double layer of metal aperture plate, the metal grid mesh and vacuum with vacuum chamber interior walls junction
Chamber interior walls insulate, and metal grid mesh is connected with the pulse power, and the effect of the pulse power is to apply positive pulse bias on metal grid mesh,
Discontinuously the plasma in release discharge cavity enters vacuum chamber, and wherein plasma is hindered by multiple layer metal aperture plate during pulse-off
In discharge cavity, plasma enters vacuum chamber to trigger the list in vacuum chamber gear through multiple layer metal aperture plate during pulse applies
Body steam generation polymerisation.
Discharge source is provided with the discharge cavity, discharge source connection power supply source, the discharge cavity is connected with vector gas pipeline,
The vector gas pipeline other end is connected to vector gas source, and monomer vapours pipeline is connected in vacuum chamber, and its outlet is located at and puts
Electric chamber front, the monomer vapours pipeline other end is connected to monomer vapours source；
On central shaft in the vacuum chamber it is vertically-mounted there is exhaust gas collecting pipe, exhaust gas collecting pipe one end to stretch out vacuum chamber after
It is connected with vavuum pump, perforate on the tube wall of the exhaust gas collecting pipe；
Rotary shelf for placing articles is provided with the vacuum chamber, the rotary shaft of the rotary shelf for placing articles is same with the central shaft of vacuum chamber
Axle, places pending base material on rotary shelf for placing articles.
The top cover and bottom of the vacuum chamber be the flat board that is matched with the sidepiece chamber body cross section of inboard wall of vacuum chamber or segment,
The domes of regular polygon, elliposoidal etc..
The porous electrode is shaped as cylindrical barrel shape or is at least divided into two sections of cylinder cambered surface shapes, and the porous electrode
Coaxial with vacuum chamber, the inwall spacing with vacuum chamber is 1-6cm, and through hole is covered with the porous electrode, and aperture is 2-30mm, hole
At intervals of 2-30mm.
The discharge cavity is cylindrical shape, and material is aluminium, carbon steel or stainless steel, and a diameter of 5-20cm, depth is 3-15cm, phase
Spacing between neighbour's electric discharge cavity axis is 7-40cm.
The metal grid mesh number of plies is 2-6 layers, and material is stainless steel or nickel, and mesh size is 100-1000 mesh, transmitance
It is 25%-40%.
The pulse power exports positive pulse, and its parameter is：Peak value 20-140V, the μ s-1ms of pulsewidth 2, repetition rate 20Hz-
10kHz。
The discharge source is filament or electrode or induction coil or microwave antenna, and its discharge power is 2-500W.
The distance between the monomer vapours tube outlet and discharge cavity are 1-10cm.
The exhaust collection bore is 25-100mm, and uniform pore openings on its tube wall, aperture is 2-30mm, and hole is at intervals of 2-
100mm。
The rotary shaft of the rotary shelf for placing articles and the central axis of vacuum chamber, the rotary shelf for placing articles can turn with rotary shaft
It is dynamic, 2-8 layer commodity platforms symmetrically are fixedly installed on the rotary shelf for placing articles, pending base material is placed on the articles holding table.
The rotary shaft of the rotary shelf for placing articles and the central axis of vacuum chamber, the rotary shelf for placing articles can turn around rotary shaft
It is dynamic, 2-8 root planetary rotation axles are symmetrical arranged on the rotary shelf for placing articles, the planetary rotation axle is perpendicular to the rotary shelf for placing articles
And can rotation；
2-8 layers of rotation articles holding table is set on the planetary rotation axle, and the rotation articles holding table places pending base material.
The beneficial effects of the utility model are：
1st, the stability of spatial clustering reactivity species concentration is kept using vacuum chamber structure substantially symmetrical about its central axis.
Using the air inlet of vacuum chamber side wall, radially transport, by the way of central axial exhaust：
Vector gas pipeline sets outlet in each discharge cavity, and vector gas are sent into each discharge cavity via its pipeline, then
Vacuum chamber is diffused into by multiple layer metal aperture plate；The outer front of monomer vapours pipeline each discharge cavity in vacuum chamber is set out
Mouthful, monomer vapours are via in its pipeline feeding vacuum chamber；One exhaust collection of setting coaxial with vacuum chamber on vacuum chamber axis
Pipe, exhaust gas collecting pipe longitudinally through vacuum chamber, pipe end connection vavuum pump, uniform pore openings on tube wall, tail gas is by exhaust gas collecting pipe
Perforate enter exhaust gas collecting pipe, then vacuum chamber is discharged by vavuum pump.
It is above-mentioned using the air inlet of vacuum chamber side wall, radially transport, by the way of central axial exhaust in transport process be to converge
Collection, this is conducive to improving the stability of spatial clustering reactivity species concentration, and active specy distribution is more uniform, its process
It is：Monomer vapours subject plasma effect near each discharge cavity produces polymerization activity species；Polymerization activity species
Radially transported to vacuum chamber axis direction under vector gas drive；The quantity of polymerization activity species in transport process
Constantly consumption is reduced, but another aspect polymerization activity species constantly collect in transport process, compensate for quantity
Reduce, its concentration is kept stabilization, the bulk density of active specy keeps constant in vacuum chamber, and batch processing has good uniformity, existing
There are coating apparatus and technology with batch processing substrate coating thickness difference more than 30%, and same batch processing base material of the present utility model is applied
Thickness degree difference is less than 10%.
2nd, the uniformity of each substrate coating can be significantly improved using rotary shelf for placing articles
Rotary shelf for placing articles is installed in vacuum chamber；Planetary rotation is rotated or done in articles holding table vacuum chamber on rotary shelf for placing articles
Motion, particularly planetary rotation be articles holding table around itself planetary rotation axle rotation, while with the rotary shaft of rotary shelf for placing articles
Around the revolution of vacuum chamber coaxial line；Pending base material is placed on articles holding table.Planetary rotation makes base material institute during coating treatment
The locus at place is continually changing, and the residing spatial position change in a complete processing procedure of different substrate materials is identical, from
And eliminate in the prior art because the locus residing for different substrate materials is different and caused by coating result difference so that each base
Material degree for the treatment of is identical, and coating result is essentially the same, and the uniformity between each base material is more preferable.
3rd, vacuum chamber volume can be greatly increased, and treatment effeciency is significantly improved
Because the improvement of vacuum chamber structure and rack causes greatly improving batch processing coating film thickness uniformity, vacuum chamber
Volume can be expanded to 5-6 times of current vacuum chamber, and batch processing quantity and treatment effeciency are accordingly greatly improved.
4th, multilayer aperture plate plasma and monomer have retardation
Multiple layer metal aperture plate has retardation to vector gas from discharge cavity to the diffusion of vacuum chamber, makes gas in discharge cavity
Pressure is higher than vacuum room pressure；Multiple layer metal aperture plate from vacuum chamber to the back-diffusion of discharge cavity there is retardance to make monomer vapours
With, but due in discharge cavity air pressure be higher than vacuum room pressure, monomer vapours is difficult back-diffusion and discharge cavity entered by vacuum chamber,
The continuous discharge plasma excessive decomposition for avoiding monomer vapours from being discharged in chamber is destroyed, and device of the present utility model can be effective
Monomer vapours of protecting be not decomposed destruction, so as to obtain the coating of the very polymer of good quality.
Brief description of the drawings
Fig. 1 is the plasma polymerized coating device front cross-sectional that planetary rotation axle is set on the rotary shelf for placing articles of embodiment 1
Structural representation.
Fig. 2 is the overlooking the structure diagram of Fig. 1.
In figure, 1, vacuum chamber, 2, porous electrode, 3, high frequency electric source, 4, discharge cavity, 5, multiple layer metal aperture plate, 6, pulse electricity
Source, 7, discharge source, 8, power supply source, 9, vector gas pipeline, 10, monomer vapours pipeline, 11, exhaust gas collecting pipe, 12, rotation glove
Frame, 13 planetary rotation axles, 14, rotation articles holding table, 15, base material.
Specific embodiment
Specific embodiment of the utility model is described in detail with reference to technical scheme and accompanying drawing.
Embodiment 1
A kind of plasma polymerized coating device as illustrated in figs. 1 and 2, including vacuum chamber, the chamber body of the sidepiece of vacuum chamber 1
Any cross section of inwall is that the circle of same diameter, the i.e. inwall of the chamber body of vacuum chamber are cylinder.
The top cover and bottom of vacuum chamber 1 are the segment matched with the sidepiece chamber body cross section of inboard wall of vacuum chamber.
Porous electrode 2 is installed at the inwall of vacuum chamber 1, porous electrode 2 is to be protected with vacuum chamber interior walls in vacuum chamber 1
The porous globoidal structure of spacing is held, porous electrode is connected with high frequency electric source 3, eight discharge cavities are sealed and installed with outer vacuum chamber wall
4；
Porous electrode 2 is shaped as cylindrical barrel shape, and the porous electrode is coaxial with vacuum chamber, between the inwall of vacuum chamber
Away from being 1cm, through hole is covered with porous electrode 2, aperture is 30mm, and hole is at intervals of 30mm；The high frequency electric source being connected with porous electrode
Power be 15W.
Discharge cavity 4 be cylindrical shape, material is aluminium, a diameter of 5cm, and depth is 15cm, between the axis of neighbouring discharge chamber 4 between
Away from being 40cm.The distance between the outlet of monomer vapours pipeline 10 and discharge cavity 4 are 1cm.
Discharge cavity is provided with double layer of metal aperture plate 5, metal grid mesh and vacuum chamber inner wall insulation with vacuum chamber interior walls junction,
Metal grid mesh is connected with the pulse power 6, and discharge source 7 is provided with discharge cavity 4, and discharge source connection power supply source 8, discharge cavity is connected with load
Body gas piping 9, the vector gas pipeline other end is connected to vector gas source, and monomer vapours pipeline 10 is connected in vacuum chamber,
And its outlet is located at the front of discharge cavity 4, the monomer vapours pipeline other end is connected to monomer vapours source.
Metal grid mesh material is stainless steel, and mesh size is 100 mesh, and transmitance is 40%.
The pulse power 6 exports positive pulse, and its parameter is：Peak value 20V, pulsewidth 1ms, repetition rate 10kHz.
Discharge source 7 is filament and its discharge power is 2W.
It is vertically-mounted on central shaft in vacuum chamber to have an exhaust gas collecting pipe 11, exhaust gas collecting pipe one end stretch out after vacuum chamber with
Vavuum pump is connected, perforate on the tube wall of the exhaust gas collecting pipe；The internal diameter of exhaust gas collecting pipe 11 is 25mm, is uniformly opened on its tube wall
Hole, aperture is 2mm, and hole is at intervals of 2mm.
Rotary shelf for placing articles 12, the rotary shaft of rotary shelf for placing articles 12 and the central axis of vacuum chamber are provided with vacuum chamber,
Rotary shelf for placing articles can be rotated with rotary shaft, be symmetrical arranged 4 planetary rotation axles 13 on rotary shelf for placing articles, planetary rotation axle perpendicular to
Rotary shelf for placing articles 12 simultaneously can rotation；
4 layers of rotation articles holding table 14 are set on planetary rotation axle, and the rotation articles holding table places pending base material 15.
Embodiment 2
A kind of plasma polymerized coating device, including vacuum chamber 1, any cross section of chamber body inwall of vacuum chamber sidepiece is
Positive six polygon of the identical length of side；
The top cover and bottom of vacuum chamber 1 are the arch of the regular hexagon matched with the sidepiece chamber body cross section of inboard wall of vacuum chamber
Structure.
Porous electrode 2 is installed at the inwall of vacuum chamber 1, porous electrode 2 is to be protected with vacuum chamber interior walls in vacuum chamber 1
The porous globoidal structure of spacing is held, porous electrode is connected with high frequency electric source 3, two discharge cavities are sealed and installed with outer vacuum chamber wall
4；
Porous electrode 2 is shaped as being divided into two sections of cylinder cambered surface shapes, and the porous electrode is coaxial with vacuum chamber, with vacuum
The inwall spacing of room is 3cm, and through hole is covered with porous electrode 2, and aperture is 18mm, and hole is at intervals of 15mm；It is connected with porous electrode
The power of high frequency electric source be 500W.
Discharge cavity 4 is cylindrical shape, and material is carbon steel, a diameter of 20cm, and depth is 8cm, between the axis of neighbouring discharge chamber 4
Spacing is 20cm.The distance between the outlet of monomer vapours pipeline 10 and discharge cavity 4 are 6cm.
Discharge cavity is provided with four layers of metal grid mesh 5, metal grid mesh and vacuum chamber inner wall insulation with vacuum chamber interior walls junction,
Metal grid mesh is connected with the pulse power 6, and discharge source 7 is provided with discharge cavity 4, and discharge source connection power supply source 8, discharge cavity is connected with load
Body gas piping 9, the vector gas pipeline other end is connected to vector gas source, and monomer vapours pipeline 10 is connected in vacuum chamber,
And its outlet is located at the front of discharge cavity 4, the monomer vapours pipeline other end is connected to monomer vapours source.
Metal grid mesh material is nickel, and mesh size is 600 mesh, and transmitance is 32%.
The pulse power 6 exports positive pulse, and its parameter is：Peak value 86V, pulsewidth 0.1ms, repetition rate 700Hz.
Discharge source 7 is electrode and its discharge power is 280W.
It is vertically-mounted on central shaft in vacuum chamber to have an exhaust gas collecting pipe 11, exhaust gas collecting pipe one end stretch out after vacuum chamber with
Vavuum pump is connected, perforate on the tube wall of the exhaust gas collecting pipe；The internal diameter of exhaust gas collecting pipe 11 is 60mm, is uniformly opened on its tube wall
Hole, aperture is 16mm, and hole is at intervals of 55mm.
Rotary shelf for placing articles 12, the rotary shaft of rotary shelf for placing articles 12 and the central axis of vacuum chamber are provided with vacuum chamber,
Rotary shelf for placing articles can be rotated with rotary shaft, be symmetrical arranged 2 planetary rotation axles 13 on rotary shelf for placing articles, planetary rotation axle perpendicular to
Rotary shelf for placing articles 12 simultaneously can rotation；
8 layers of rotation articles holding table 14 are set on planetary rotation axle, and the rotation articles holding table places pending base material 15.
Embodiment 3
A kind of plasma polymerized coating device, including vacuum chamber 1, any cross section of chamber body inwall of vacuum chamber sidepiece is
Positive nine polygon of the identical length of side；
The top cover and bottom of vacuum chamber 1 are the positive nonagon flat board matched with the sidepiece chamber body cross section of inboard wall of vacuum chamber.
Porous electrode 2 is installed at the inwall of vacuum chamber 1, porous electrode 2 is to be protected with vacuum chamber interior walls in vacuum chamber 1
The porous globoidal structure of spacing is held, porous electrode is connected with high frequency electric source 3, two discharge cavities are sealed and installed with outer vacuum chamber wall
4；
Porous electrode 2 is shaped as being divided into four sections of cylinder cambered surface shapes, and the porous electrode is coaxial with vacuum chamber, with vacuum
The inwall spacing of room is 6cm, and through hole is covered with porous electrode 2, and aperture is 30mm, and hole is at intervals of 30mm；It is connected with porous electrode
The power of high frequency electric source be 1000W.
Discharge cavity 4 is cylindrical shape, and material is stainless steel, a diameter of 12cm, and depth is 3cm, between the axis of neighbouring discharge chamber 4
Spacing be 7cm.The distance between the outlet of monomer vapours pipeline 10 and discharge cavity 4 are 10cm.
Discharge cavity is provided with six layers of metal grid mesh 5, metal grid mesh and vacuum chamber inner wall insulation with vacuum chamber interior walls junction,
Metal grid mesh is connected with the pulse power 6, and discharge source 7 is provided with discharge cavity 4, and discharge source connection power supply source 8, discharge cavity is connected with load
Body gas piping 9, the vector gas pipeline other end is connected to vector gas source, and monomer vapours pipeline 10 is connected in vacuum chamber,
And its outlet is located at the front of discharge cavity 4, the monomer vapours pipeline other end is connected to monomer vapours source.
Metal grid mesh material is nickel, and mesh size is 1000 mesh, and transmitance is 25%.
The pulse power 6 exports positive pulse, and its parameter is：Peak value 140V, the μ s of pulsewidth 2, repetition rate 20Hz.
Discharge source 7 is microwave antenna and its discharge power is 500W.
It is vertically-mounted on central shaft in vacuum chamber to have an exhaust gas collecting pipe 11, exhaust gas collecting pipe one end stretch out after vacuum chamber with
Vavuum pump is connected, perforate on the tube wall of the exhaust gas collecting pipe；The internal diameter of exhaust gas collecting pipe 11 is 100mm, is uniformly opened on its tube wall
Hole, aperture is 30mm, and hole is at intervals of 100mm.
Rotary shelf for placing articles 12, the rotary shaft of rotary shelf for placing articles 12 and the central axis of vacuum chamber are provided with vacuum chamber,
Rotary shelf for placing articles can be rotated with rotary shaft, be symmetrical arranged 8 planetary rotation axles 13 on rotary shelf for placing articles, planetary rotation axle perpendicular to
Rotary shelf for placing articles 12 simultaneously can rotation；
2 layers of rotation articles holding table 14 are set on planetary rotation axle, and the rotation articles holding table places pending base material 15.
Embodiment 4
A kind of plasma polymerized coating device, including vacuum chamber 1, any cross section of chamber body inwall of vacuum chamber sidepiece is
Positive 12 polygon of the identical length of side；
The top cover and bottom of vacuum chamber 1 are the dodecagon arch matched with the sidepiece chamber body cross section of inboard wall of vacuum chamber
Structure.
Porous electrode 2 is installed at the inwall of vacuum chamber 1, porous electrode 2 is to be protected with vacuum chamber interior walls in vacuum chamber 1
The porous globoidal structure of spacing is held, porous electrode is connected with high frequency electric source 3, two discharge cavities are sealed and installed with outer vacuum chamber wall
4；
Porous electrode 2 is shaped as being divided into five sections of cylinder cambered surface shapes, and the porous electrode is coaxial with vacuum chamber, with vacuum
The inwall spacing of room is 5cm, and through hole is covered with porous electrode 2, and aperture is 12mm, and hole is at intervals of 18mm；It is connected with porous electrode
The power of high frequency electric source be 260W.
Discharge cavity 4 is cylindrical shape, and material is stainless steel, a diameter of 16cm, and depth is 6cm, between the axis of neighbouring discharge chamber 4
Spacing be 26cm.The distance between the outlet of monomer vapours pipeline 10 and discharge cavity 4 are 4cm.
Discharge cavity is provided with seven layers of metal grid mesh 5, metal grid mesh and vacuum chamber inner wall insulation with vacuum chamber interior walls junction,
Metal grid mesh is connected with the pulse power 6, and discharge source 7 is provided with discharge cavity 4, and discharge source connection power supply source 8, discharge cavity is connected with load
Body gas piping 9, the vector gas pipeline other end is connected to vector gas source, and monomer vapours pipeline 10 is connected in vacuum chamber,
And its outlet is located at the front of discharge cavity 4, the monomer vapours pipeline other end is connected to monomer vapours source.
Metal grid mesh material is nickel, and mesh size is 360 mesh, and transmitance is 28%.
The pulse power 6 exports positive pulse, and its parameter is：Peak value 115V, the μ s of pulsewidth 160, repetition rate 380Hz.
Discharge source 7 is filament and its discharge power is 130W.
It is vertically-mounted on central shaft in vacuum chamber to have an exhaust gas collecting pipe 11, exhaust gas collecting pipe one end stretch out after vacuum chamber with
Vavuum pump is connected, perforate on the tube wall of the exhaust gas collecting pipe；The internal diameter of exhaust gas collecting pipe 11 is 85mm, is uniformly opened on its tube wall
Hole, aperture is 18mm, and hole is at intervals of 38mm.
The rotary shaft of rotary shelf for placing articles and the central axis of vacuum chamber, the rotary shelf for placing articles can be rotated around rotary shaft,
2 layer commodity platforms symmetrically are fixedly installed on the rotary shelf for placing articles, pending base material is placed on the articles holding table.
Embodiment 5
A kind of plasma polymerized coating device, including vacuum chamber 1, any cross section of chamber body inwall of vacuum chamber sidepiece is
The inwall of the chamber body of the circle of same diameter, i.e. vacuum chamber is cylinder.
The top cover and bottom of vacuum chamber 1 are the circular flat board matched with the sidepiece chamber body cross section of inboard wall of vacuum chamber.
Porous electrode 2 is installed at the inwall of vacuum chamber 1, porous electrode 2 is to be protected with vacuum chamber interior walls in vacuum chamber 1
The porous globoidal structure of spacing is held, porous electrode is connected with high frequency electric source 3, two discharge cavities are sealed and installed with outer vacuum chamber wall
4；
Porous electrode 2 is shaped as being divided into eight sections of cylinder cambered surface shapes, and the porous electrode is coaxial with vacuum chamber, with vacuum
The inwall spacing of room is 2cm, and through hole is covered with porous electrode 2, and aperture is 5mm, and hole is at intervals of 12mm；It is connected with porous electrode
The power of high frequency electric source is 120W.
Discharge cavity 4 is cylindrical shape, and material is carbon steel, a diameter of 11cm, and depth is 8cm, between the axis of neighbouring discharge chamber 4
Spacing is 20cm.The distance between the outlet of monomer vapours pipeline 10 and discharge cavity 4 are 7cm.
Discharge cavity is provided with three-layer metal aperture plate 5, metal grid mesh and vacuum chamber inner wall insulation with vacuum chamber interior walls junction,
Metal grid mesh is connected with the pulse power 6, and discharge source 7 is provided with discharge cavity 4, and discharge source connection power supply source 8, discharge cavity is connected with load
Body gas piping 9, the vector gas pipeline other end is connected to vector gas source, and monomer vapours pipeline 10 is connected in vacuum chamber,
And its outlet is located at the front of discharge cavity 4, the monomer vapours pipeline other end is connected to monomer vapours source.
Metal grid mesh material is nickel, and mesh size is 640 mesh, and transmitance is 30%.
The pulse power 6 exports positive pulse, and its parameter is：Peak value 58V, the μ s of pulsewidth 620, repetition rate 55Hz.
Discharge source 7 is induction coil and its discharge power is 480W.
It is vertically-mounted on central shaft in vacuum chamber to have an exhaust gas collecting pipe 11, exhaust gas collecting pipe one end stretch out after vacuum chamber with
Vavuum pump is connected, perforate on the tube wall of the exhaust gas collecting pipe；The internal diameter of exhaust gas collecting pipe 11 is 45mm, is uniformly opened on its tube wall
Hole, aperture is 24mm, and hole is at intervals of 58mm.
The rotary shaft of rotary shelf for placing articles and the central axis of vacuum chamber, the rotary shelf for placing articles can be rotated around rotary shaft,
8 layer commodity platforms symmetrically are fixedly installed on the rotary shelf for placing articles, pending base material is placed on the articles holding table.
Claims (10)
1. a kind of plasma polymerized coating device, including vacuum chamber, it is characterised in that：The chamber body of vacuum chamber (1) sidepiece
Any cross section of inwall is the circle of same diameter or the regular polygon of the identical length of side, and the regular polygon is when number is at least 6；
Porous electrode (2) is installed at the inwall of vacuum chamber (1) in the vacuum chamber (1), the porous electrode (2) be with
Vacuum chamber interior walls keep the porous globoidal structure of spacing, the porous electrode to be connected with high frequency electric source (3), the outer vacuum chamber wall
On be sealed and installed with least two discharge cavities (4)；
The discharge cavity is provided with least double layer of metal aperture plate (5), the metal grid mesh and vacuum with vacuum chamber interior walls junction
Chamber interior walls are insulated, and metal grid mesh is connected with the pulse power (6), and discharge source (7), discharge source connection are provided with the discharge cavity (4)
Power supply source (8), the discharge cavity is connected with vector gas pipeline (9), and the vector gas pipeline other end is connected to vector gas source,
Monomer vapours pipeline (10) is connected in vacuum chamber, and its outlet is located at discharge cavity (4) front, and the monomer vapours pipeline other end connects
It is connected to monomer vapours source；
It is vertically-mounted on central shaft in the vacuum chamber to have exhaust gas collecting pipe (11), after vacuum chamber is stretched out in exhaust gas collecting pipe one end
It is connected with vavuum pump, perforate on the tube wall of the exhaust gas collecting pipe；
Rotary shelf for placing articles (12) is provided with the vacuum chamber, the rotary shaft of the rotary shelf for placing articles is same with the central shaft of vacuum chamber
Axle, places pending base material on rotary shelf for placing articles.
2. a kind of plasma polymerized coating device according to claim 1, it is characterised in that：The vacuum chamber (1)
Top cover and bottom are the flat board or domes matched with the sidepiece chamber body cross section of inboard wall of vacuum chamber.
3. a kind of plasma polymerized coating device according to claim 1, it is characterised in that：The porous electrode (2)
It is shaped as cylindrical barrel shape or is at least divided into two sections of cylinder cambered surface shapes, and the porous electrode is coaxial with vacuum chamber, with vacuum
The inwall spacing of room is 1-6cm, and through hole is covered with the porous electrode (2), and aperture is 2-30mm, and hole is at intervals of 2-30mm；Institute
The power for stating the high frequency electric source (3) being connected with porous electrode is 15-1000W.
4. a kind of plasma polymerized coating device according to claim 1, it is characterised in that：The discharge cavity (4) is
Cylindrical shape, material is aluminium, carbon steel or stainless steel, and a diameter of 5-20cm, depth is 3-15cm, between neighbouring discharge chamber (4) axis
Spacing be 7-40cm；The distance between monomer vapours pipeline (10) outlet and discharge cavity (4) are 1-10cm.
5. a kind of plasma polymerized coating device according to claim 1, it is characterised in that：The metal grid mesh (5)
The number of plies is 2-6 layers, and material is stainless steel or nickel, and mesh size is 100-1000 mesh, and transmitance is 25%-40%.
6. a kind of plasma polymerized coating device according to claim 1, it is characterised in that：The pulse power (6)
Positive pulse is exported, its parameter is：Peak value 20-140V, the μ s-1ms of pulsewidth 2, repetition rate 20Hz-10kHz.
7. a kind of plasma polymerized coating device according to claim 1, it is characterised in that：The discharge source (7) is
Filament or electrode or induction coil or microwave antenna, and its discharge power is 2-500W.
8. a kind of plasma polymerized coating device according to claim 1, it is characterised in that：The exhaust gas collecting pipe
(11) internal diameter is 25-100mm, and uniform pore openings on its tube wall, aperture is 2-30mm, and hole is at intervals of 2-100mm.
9. a kind of plasma polymerized coating device according to claim 1, it is characterised in that：The rotary shelf for placing articles
The central axis of rotary shaft and vacuum chamber, the rotary shelf for placing articles can be rotated around rotary shaft, symmetrical on the rotary shelf for placing articles
2-8 layer commodity platforms are fixedly installed, pending base material is placed on the articles holding table.
10. a kind of plasma polymerized coating device according to claim 1, it is characterised in that：The rotary shelf for placing articles
(12) rotary shaft and the central axis of vacuum chamber, the rotary shelf for placing articles can be rotated with rotary shaft, the rotary shelf for placing articles
On be symmetrical arranged 2-8 root planetary rotations axle (13), the planetary rotation axle is perpendicular to the rotary shelf for placing articles (12) and can rotation；
2-8 layers of rotation articles holding table (14) is set on the planetary rotation axle, and the rotation articles holding table places pending base material
(15)。
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201621296613.5U CN206304929U (en) | 2016-11-30 | 2016-11-30 | A kind of plasma polymerized coating device |
Applications Claiming Priority (1)
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN106622824A (en) * | 2016-11-30 | 2017-05-10 | 无锡荣坚五金工具有限公司 | Plasma polymerized coating device |
| CN112981374A (en) * | 2019-12-18 | 2021-06-18 | 江苏菲沃泰纳米科技股份有限公司 | Film coating equipment and film coating method thereof |
| US11332829B2 (en) | 2016-11-30 | 2022-05-17 | Jiangsu Favored Nanotechnology Co., LTD | Plasma polymerization coating with uniformity control |
| US11339477B2 (en) * | 2016-11-30 | 2022-05-24 | Jiangsu Favored Nanotechnology Co., LTD | Plasma polymerization coating apparatus and process |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106622824A (en) * | 2016-11-30 | 2017-05-10 | 无锡荣坚五金工具有限公司 | Plasma polymerized coating device |
| WO2018098980A1 (en) * | 2016-11-30 | 2018-06-07 | 江苏菲沃泰纳米科技有限公司 | Device for forming plasma polymerized coating |
| US10424465B2 (en) | 2016-11-30 | 2019-09-24 | Jiangsu Favored Nanotechnology Co., LTD | Plasma polymerization coating apparatus |
| US11332829B2 (en) | 2016-11-30 | 2022-05-17 | Jiangsu Favored Nanotechnology Co., LTD | Plasma polymerization coating with uniformity control |
| US11339477B2 (en) * | 2016-11-30 | 2022-05-24 | Jiangsu Favored Nanotechnology Co., LTD | Plasma polymerization coating apparatus and process |
| US12065740B2 (en) | 2016-11-30 | 2024-08-20 | Jiangsu Favored Nanotechnology Co., LTD | Plasma polymerization coating with uniformity control |
| CN112981374A (en) * | 2019-12-18 | 2021-06-18 | 江苏菲沃泰纳米科技股份有限公司 | Film coating equipment and film coating method thereof |
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Address after: No.182, East Ring Road, Yuqi supporting area, Huishan Economic Development Zone, Wuxi City, Jiangsu Province, 214000 Patentee after: Jiangsu feiwotai nanotechnology Co.,Ltd. Address before: 214183 East Ring Road, Yuqi Industrial Park, Wuxi City, Jiangsu Province Patentee before: Jiangsu Favored Nanotechnology Co.,Ltd. |