CN206270652U - Laser direct-writing double-side exposure device - Google Patents
Laser direct-writing double-side exposure device Download PDFInfo
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- CN206270652U CN206270652U CN201620549865.8U CN201620549865U CN206270652U CN 206270652 U CN206270652 U CN 206270652U CN 201620549865 U CN201620549865 U CN 201620549865U CN 206270652 U CN206270652 U CN 206270652U
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- laser
- exposure
- mirrors
- turnover device
- light
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Abstract
The utility model discloses a kind of laser direct-writing double-side exposure device, including exposure stage（1）, laser（2）, light turnover device（3）And Mirrors with second order surface（4）, laser（2）, light turnover device（3）And Mirrors with second order surface（4）It is arranged on exposure stage（1）Two sides, light turnover device（3）Positioned at laser（2）And Mirrors with second order surface（4）Centre position.The light beam that laser sends is beaten to be focused in Mirrors with second order surface and is finally beaten on the pcb board surface of exposure stage by light turnover device, light turnover device can be such that laser facula is moved up and down in exposure stage, due to moving forward and backward for exposure stage and moving up and down for hot spot, laser beam completes the scanning of two dimensional surface, exposure is easy, efficient, cost is substantially reduced, exposure quality is improved.
Description
Technical field
The utility model is related to a kind of exposure device, and in particular to a kind of laser direct-writing double-side exposure device.
Background technology
Write-through exposure technique be develop in recent years faster, it is straight to substitute the image of the board-like exposure technique of traditional mask
Transfer techniques are connect, has increasingly consequence in semiconductor and PCB production fields.Can shorten technique using the technology
Flow, and reduce production cost.The write-through exposure machine of main flow is scanned exposure in single work stage mode mostly in the market
Light, will be first exposed after the completion of the exposure of the A faces of workpiece, then carry out reprint, and then B faces are exposed.In single workpiece table system
In, upper plate, alignment, exposure, the lower plate of the substrate for exposing are carried out successively.According to current structural system, each operation
Flow has reached the time-consuming upper limit, it is difficult to shorten the operating time of certain operating procedure again, i.e., the write-through of single work stage
Exposure machine has been difficult to improve production capacity again due to the serial nature of each operating process.
The content of the invention
For the problem that above-mentioned prior art is present, the utility model provides a kind of laser direct-writing double-side exposure device, exposes
Light is easy, efficient, substantially reduces cost, improves exposure quality.
To achieve these goals, the technical solution adopted in the utility model is：A kind of laser direct-writing double-side exposure device,
Including exposure stage, laser, light turnover device and Mirrors with second order surface, laser, light turnover device and quadratic surface are anti-
Two sides that mirror is arranged on exposure stage are penetrated, light turnover device is located at the centre position of laser and Mirrors with second order surface.
Laser, light turnover device and Mirrors with second order surface positional symmetry that the exposure stage both sides are set.
The center line of the laser overlaps with the center line of light turnover device, center line and the exposure stage center line weight of laser
Close.
Described Mirrors with second order surface is highly not less than the height of exposure stage.
The beneficial effects of the utility model are：The light beam that laser sends is beaten by light turnover device and is reflected in quadratic surface
Mirror is focused on and finally beaten on the pcb board surface of exposure stage, and light turnover device can make laser facula upper and lower in exposure stage
Mobile, due to moving forward and backward for exposure stage and moving up and down for hot spot, laser beam completes the scanning of two dimensional surface, exposure letter
Just, efficiently, cost is substantially reduced, exposure quality is improved.
Brief description of the drawings
Fig. 1 is structural representation of the present utility model；
Fig. 2 is front view of the present utility model；
Fig. 3 is top view of the present utility model；
In figure：1st, exposure stage, 2, laser, 3, light turnover device, 4, Mirrors with second order surface.
Specific embodiment
The utility model is described in further detail below in conjunction with the accompanying drawings.
As shown in Figure 1 to Figure 3, this laser direct-writing double-side exposure device, including exposure stage 1, laser 2, light turner
Part 3 and Mirrors with second order surface 4, are moved before and after the energy of exposure stage 1, and exposure light path is by laser 2, light turnover device 3 and
Mirrors with second order surface 4 is constituted, and laser 2, light turnover device 3 and Mirrors with second order surface 4 are arranged on two of exposure stage 1
Side, light turnover device 3 is located at the centre position of laser 2 and Mirrors with second order surface 4.
Pcb board is fixed in exposure stage 1, and exposure stage 1 will not block pcb board tow sides needs the surface of exposure,
Exposure light path is exposed to positive and negative two surfaces of the pcb board in exposure stage 1 simultaneously, and the light beam that laser 2 sends passes through
Light turnover device 3 dozens is focused on the final pcb board surface beaten in exposure stage 1 in Mirrors with second order surface 4, light turnover device
3 can be such that laser facula is moved up and down in exposure stage 1, coordinate moving forward and backward for exposure stage 1 and moving up and down for hot spot,
Laser beam completes the scanning of two dimensional surface, and pcb board exposure is easy, efficient, substantially reduces cost, improves exposure quality.
In order to further improve exposure quality and efficiency, laser 2, light turnover device 3 and that the both sides of exposure stage 1 are set
The positional symmetry of Mirrors with second order surface 4；The center line of the center line of laser 2 and light turnover device 3 overlaps, the center line of laser 2 and
The center line of exposure stage 1 overlaps；Height of the height of Mirrors with second order surface 4 not less than exposure stage 1.
Claims (4)
1. a kind of laser direct-writing double-side exposure device, it is characterised in that including exposure stage（1）, laser（2）, light turner
Part（3）And Mirrors with second order surface（4）, laser（2）, light turnover device（3）And Mirrors with second order surface（4）It is arranged on exposure
Platform（1）Two sides, light turnover device（3）Positioned at laser（2）And Mirrors with second order surface（4）Centre position.
2. a kind of laser direct-writing double-side exposure device according to claim 1, it is characterised in that the exposure stage（1）
The laser that both sides are set（2）, light turnover device（3）And Mirrors with second order surface（4）Positional symmetry.
3. a kind of laser direct-writing double-side exposure device according to claim 2, it is characterised in that the laser（2）'s
Center line and light turnover device（3）Center line overlap, laser（2）Center line and exposure stage（1）Center line overlaps.
4. a kind of laser direct-writing double-side exposure device according to claim 1, it is characterised in that described quadratic surface is anti-
Penetrate mirror（4）Highly it is not less than exposure stage（1）Height.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201620549865.8U CN206270652U (en) | 2016-06-08 | 2016-06-08 | Laser direct-writing double-side exposure device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201620549865.8U CN206270652U (en) | 2016-06-08 | 2016-06-08 | Laser direct-writing double-side exposure device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN206270652U true CN206270652U (en) | 2017-06-20 |
Family
ID=59035667
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201620549865.8U Active CN206270652U (en) | 2016-06-08 | 2016-06-08 | Laser direct-writing double-side exposure device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN206270652U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109557772A (en) * | 2019-01-18 | 2019-04-02 | 昆山国显光电有限公司 | A kind of exposure device and exposure method |
| CN114114854A (en) * | 2021-11-30 | 2022-03-01 | 中山市三美高新材料技术有限公司 | Shielding device |
-
2016
- 2016-06-08 CN CN201620549865.8U patent/CN206270652U/en active Active
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109557772A (en) * | 2019-01-18 | 2019-04-02 | 昆山国显光电有限公司 | A kind of exposure device and exposure method |
| CN109557772B (en) * | 2019-01-18 | 2021-01-05 | 昆山国显光电有限公司 | Exposure device and exposure method |
| CN114114854A (en) * | 2021-11-30 | 2022-03-01 | 中山市三美高新材料技术有限公司 | Shielding device |
| CN114114854B (en) * | 2021-11-30 | 2024-03-19 | 中山市三美高新材料技术有限公司 | Screening device |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| CP03 | Change of name, title or address |
Address after: 221000 west side of Hengshan Road, Pizhou City, Xuzhou City, Jiangsu Province Patentee after: Jiangsu Yingsu integrated circuit equipment Co., Ltd Address before: 221000 Huashan Road, Pizhou Economic Development Zone, Xuzhou, Jiangsu Patentee before: JIANGSU YINGSU PHOTOELECTRIC TECHNOLOGY Co.,Ltd. |
|
| CP03 | Change of name, title or address |