CN204008073U - A kind of optical system wavefront aberration measurement mechanism - Google Patents
A kind of optical system wavefront aberration measurement mechanism Download PDFInfo
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Abstract
The utility model discloses a kind of optical system wavefront aberration measurement mechanism, device comprises that source, 1/2 wave plate, polarization splitting prism, quarter wave plate, reflection unit and Shack-Hartmann wavefront sensor occur plane of linear polarization ripple, and plane of linear polarization ripple source occurs for generation of plane of linear polarization ripple; 1/2 wave plate is for becoming s plane of polarization ripple after the conversion of plane of linear polarization ripple; Polarization splitting prism is for the s plane of polarization wave reflection through 1/2 wave plate transmission is arrived to quarter wave plate, and transmission is from the p polarized light of quarter wave plate transmission; Quarter wave plate is used for the s plane of polarization ripple from polarization splitting prism to be converted into circular polarization plane wave, and the circular polarization plane wave of origin self-reflection device is converted into p plane of polarization ripple; Reflection unit is for making to return from the circular polarization plane Yan Yuan road of quarter wave plate; Shack-Hartmann wavefront sensor is for measuring the wave aberration of the p polarized light inciding on it.The high precision that the utility model can be realized various complicated optical system wave aberrations detects.
Description
Technical field
The utility model relates to field of optical measuring technologies, is specifically related to a kind of measurement mechanism of the optical system wavefront aberration based on Shack-Hartmann (Shack-Hartmann) Wavefront sensor.
Background technology
Along with the development of optical technology, various imaging optical systems are there are.Modern high optics imaging system taking the projection exposure optical system in semi-conductor industry as representative, has very harsh requirement to system wave aberration and resolution.Wave aberration is the key factor that affects optical system imaging performance and resolution.Optical system design, process, debug and imaging process in the factor such as the mechanically deform that causes of various factors all will affect the wave aberration of optical system.Therefore, in optical system manufacture process, high-precision system wave aberration detection has very important effect.
The conventional measuring method of optical system wavefront aberration has Twyman-Green interference instrument based on interferometric method, Feisuo interferometer, point-diffraction interferometer, shearing interferometer etc.The VeriFire series Feisuo interferometer that the FST10 type Twyman-Green interference instrument that FISBA company produces and Zygo company produce is more authoritative and use more interferometer at present, but these appliance requires reference elements, frequency stability to light source and the coherence of light beam have special requirement, and price comparison costliness.Point-diffraction interferometer is produced and is bordering on desirable spherical wave as with reference to light by micropore diffraction, has very high measuring accuracy, but micropore is not easy processing, and beam energy utilization factor is lower, and in measuring process, the demarcation of systematic error is comparatively complicated.Shearing interferometer carries out the measurement of wave aberration by the interference between original wavefront and dislocation wavefront, has higher precision, but in measuring process, the demarcation of systematic error is comparatively complicated.
Different from interferometric method, Shack-Hartmann wavefront sensor obtains wavefront information by measure wavefront simultaneously at the slope of two orthogonal directionss, be subject to the impact of external environment less, have simple in structure, the efficiency of light energy utilization is high, measuring speed is fast, precision high, in the fields such as adaptive optics, laser beam quality measuring and Medical Instruments, has a wide range of applications.
As article " Wavefront error measurement ofhigh-numerical-aperture optics with a Shack-Hartmann sensor and a the pointsource " (Appl.Opt. of prior art, 2007,46 (9): 1411～1415) provided and adopted Shack-Hartmann wavefront sensor to carry out the measurement and calibration method of high-NA mirror system wave aberration.But, the method is in the time demarcating relay system and Shack-Hartmann's systematic error, need to replace optical system to be measured by the less optical system of wave aberration, this will cause the problem of two aspects: on the one hand, calibration result comprises the systematic error of relay system, the systematic error of Shack-Hartmann wavefront sensor, the wave aberration of the error before micropore diffracted wave and the optical system using, make to treat to comprise in the measurement result of examining system wave aberration the wave aberration of calibration process optical system used, on the other hand, detect in order to realize more high-precision system wave aberration, in calibration process, need to adopt more high-precision optical system, and the wave aberration of actual optical system is subject to the restriction of diffraction limit, therefore, said method is difficult to realize the high precision detection of optical system wavefront aberration.
Utility model content
(1) technical matters that will solve
The purpose of this utility model is to provide a kind of optical system wavefront aberration high precision measuring device based on Shack-Hartmann wavefront sensor, to realize, the high precision of various complicated optical system wave aberrations is detected.
(2) technical scheme
To achieve the above object, the utility model provides a kind of optical system wavefront aberration measurement mechanism based on Shack-Hartmann wavefront sensor, in measurement and calibration process, all adopt high precision sphere reference mirror or high precision plane reference mirror, and optical path adopts the structure of double light path, can obtain better signal to noise ratio (S/N ratio), more be of value to the high precision detection that realizes optical system wavefront aberration.
The optical system wavefront aberration measurement mechanism the utility model proposes, for measuring the wave aberration of finite conjugate optical system, comprise that source, 1/2 wave plate, polarization splitting prism, quarter wave plate, the second collimating mirror, spherical reflector and Shack-Hartmann wavefront sensor occur plane of linear polarization ripple, wherein, there is source for generation of plane of linear polarization ripple in described plane of linear polarization ripple; Described 1/2 wave plate is for becoming s plane of polarization ripple after described plane of linear polarization ripple conversion; Described polarization splitting prism is for the s plane of polarization wave reflection through described 1/2 wave plate transmission is arrived to quarter wave plate, and transmission is from the p polarized light of described quarter wave plate transmission; Described quarter wave plate is used for the s plane of polarization ripple from described polarization splitting prism to be converted into circular polarization plane wave, and the circular polarization plane wave by from described reflection unit is converted into p plane of polarization ripple; Described the second collimating mirror is between described finite conjugate optical system and described quarter wave plate, and the front focus of the focus of this second collimating mirror and described finite conjugate optical system overlaps; The center of curvature of described spherical reflector overlaps with the back focus of described finite conjugate optical system, described spherical reflector and described finite conjugate optical system composition reflection unit, described reflection unit is for making to return from the circular polarization plane wave Yan Yuan road of quarter wave plate; Described Shack-Hartmann wavefront sensor is for measuring the wave aberration of the p polarized light inciding on it.
According to embodiment of the present utility model, by formula W=(W
t-W
s)/2 calculate the wave aberration of described finite conjugate optical system, and wherein W is the wave aberration of described finite conjugate optical system, W
tfor described measurement mechanism incides the wave aberration measured value of the p polarized light of Shack-Hartmann wavefront sensor, W in the time comprising described finite conjugate optical system
sfor described measurement mechanism incides the wave aberration measured value of the p polarized light of Shack-Hartmann wavefront sensor in the time not comprising described finite conjugate optical system.
The utility model also proposes a kind of optical system wavefront aberration measurement mechanism, for measuring the wave aberration of infinity conjugate optical system, comprise that source, 1/2 wave plate, polarization splitting prism, quarter wave plate, the second collimating mirror, plane mirror and Shack-Hartmann wavefront sensor occur plane of linear polarization ripple, wherein, there is source for generation of plane of linear polarization ripple in described plane of linear polarization ripple; Described 1/2 wave plate is for becoming s plane of polarization ripple after described plane of linear polarization ripple conversion; Described polarization splitting prism is for the s plane of polarization wave reflection through described 1/2 wave plate transmission is arrived to quarter wave plate, and transmission is from the p polarized light of described quarter wave plate transmission; Described quarter wave plate is used for the s plane of polarization ripple from described polarization splitting prism to be converted into circular polarization plane wave, and the circular polarization plane wave by from described reflection unit is converted into p plane of polarization ripple; Described the second collimating mirror is between described infinity conjugate optical system and described quarter wave plate, and the front focus of the focus of this second collimating mirror and described infinity conjugate optical system overlaps; Described plane mirror and described infinity conjugate optical system composition reflection unit, described reflection unit is for making to return from the circular polarization plane wave Yan Yuan road of quarter wave plate; Described Shack-Hartmann wavefront sensor is for measuring the wave aberration of the p polarized light inciding on it.
According to embodiment of the present utility model, by formula W=(W
t-W
s)/2 calculate the wave aberration of described infinity conjugate optical system, and wherein W is the wave aberration of described infinity conjugate optical system, W
tfor described measurement mechanism incides the wave aberration measured value of the p polarized light of Shack-Hartmann wavefront sensor, W in the time comprising described infinity conjugate optical system
sfor described measurement mechanism incides the wave aberration measured value of the p polarized light of Shack-Hartmann wavefront sensor in the time not comprising described infinity conjugate optical system.
The utility model also proposes a kind of optical system wavefront aberration measurement mechanism, for measuring the wave aberration of infinity conjugate optical system, comprise that source, 1/2 wave plate, polarization splitting prism, quarter wave plate, spherical reflector and Shack-Hartmann wavefront sensor occur plane of linear polarization ripple, wherein, there is source for generation of plane of linear polarization ripple in described plane of linear polarization ripple; Described 1/2 wave plate is for becoming s plane of polarization ripple after described plane of linear polarization ripple conversion; Described polarization splitting prism is for the s plane of polarization wave reflection through described 1/2 wave plate transmission is arrived to quarter wave plate, and transmission is from the p polarized light of described quarter wave plate transmission; Described quarter wave plate is used for the s plane of polarization ripple from described polarization splitting prism to be converted into circular polarization plane wave, and the circular polarization plane wave by from described reflection unit is converted into p plane of polarization ripple; Described spherical reflector and described infinity conjugate optical system composition reflection unit, described reflection unit is for making to return from the circular polarization plane Yan Yuan road of quarter wave plate; Described Shack-Hartmann wavefront sensor is for measuring the wave aberration of the p polarized light inciding on it.
According to embodiment of the present utility model, by formula W=(W
t-W
s)/2 calculate the wave aberration of described infinity conjugate optical system, and wherein W is the wave aberration of described infinity conjugate optical system, W
tfor described measurement mechanism incides the wave aberration measured value of the p polarized light of Shack-Hartmann wavefront sensor, W in the time comprising described infinity conjugate optical system
sfor described measurement mechanism incides the wave aberration measured value of the p polarized light of Shack-Hartmann wavefront sensor in the time not comprising described infinity conjugate optical system.
The utility model also proposes a kind of optical system wavefront aberration measurement mechanism, for measuring the wave aberration of transmitted plane wave conjugate optical system, comprise that source, 1/2 wave plate, polarization splitting prism, quarter wave plate, plane mirror and Shack-Hartmann wavefront sensor occur plane of linear polarization ripple, wherein, there is source for generation of plane of linear polarization ripple in described plane of linear polarization ripple; Described 1/2 wave plate is for becoming s plane of polarization ripple after described plane of linear polarization ripple conversion; Described polarization splitting prism is for the s plane of polarization wave reflection through described 1/2 wave plate transmission is arrived to quarter wave plate, and transmission is from the p polarized light of described quarter wave plate transmission; Described quarter wave plate is used for the s plane of polarization ripple from described polarization splitting prism to be converted into circular polarization plane wave, and the circular polarization plane wave by from described reflection unit is converted into p plane of polarization ripple; Described plane mirror and described transmitted plane wave conjugate optical system composition reflection unit, described reflection unit is for making to return from the circular polarization plane Yan Yuan road of quarter wave plate; Described Shack-Hartmann wavefront sensor is for measuring the wave aberration of the p polarized light inciding on it.
According to embodiment of the present utility model, by formula W=(W
t-W
s)/2 calculate the wave aberration of described transmitted plane wave conjugate optical system, and wherein W is the wave aberration of described transmitted plane wave conjugate optical system, W
tfor described measurement mechanism incides the wave aberration measured value of the p polarized light of Shack-Hartmann wavefront sensor, W in the time comprising described transmitted plane wave conjugate optical system
sfor described measurement mechanism incides the wave aberration measured value of the p polarized light of Shack-Hartmann wavefront sensor in the time not comprising described transmitted plane wave conjugate optical system.
(3) beneficial effect
The optical system wavefront aberration measurement mechanism based on Shack-Hartmann wavefront sensor that the utility model provides, the high precision that can realize various complicated optical system wave aberrations detects, measurement mechanism optical texture can effectively reduce the impact of parasitic light, effectively improve the utilization factor of energy in the detection of complicated optical system wave aberration, this measurement mechanism can complete the demarcation of measuring system and the measurement of optical system wavefront aberration on the basis that does not need extra reference light source and change light-source structure simultaneously, has effectively improved measuring speed and precision.
Brief description of the drawings
Figure 1A is the structural drawing of the first embodiment of optical system wavefront aberration measurement mechanism of the present utility model;
Figure 1B is the lighting system structure figure while adopting micropore as linear polarization spherical wave point source in the first embodiment;
Fig. 2 A and Fig. 2 B are the schematic diagram while utilizing the optical system wavefront aberration measurement mechanism shown in Figure 1A to measure finite conjugate optical system wavefront aberration, what wherein Fig. 2 A showed is the overall wave aberration for measuring optical system to be measured and measuring system, and what Fig. 2 B showed is the wave aberration for calibration measurements system itself;
Fig. 3 is the schematic diagram while utilizing the optical system wavefront aberration measurement mechanism shown in Figure 1A to measure the overall wave aberration of infinity conjugate optical system to be measured and measuring system;
Fig. 4 is the structural drawing of the second embodiment of optical system wavefront aberration measurement mechanism of the present utility model;
Fig. 5 A and Fig. 5 B are the schematic diagram while utilizing the optical system wavefront aberration measurement mechanism shown in Fig. 4 to measure infinity conjugate optical system wave aberration, what wherein Fig. 5 A showed is the overall wave aberration for measuring optical system to be measured and measuring system, and what Fig. 5 B showed is the wave aberration for calibration measurements system itself;
Fig. 6 is the schematic diagram while utilizing the optical system wavefront aberration measurement mechanism shown in Fig. 4 to measure the overall wave aberration of transmission plane optical system to be measured and measuring system.
Embodiment
For the high precision that realizes optical system wavefront aberration detects, the utility model proposes a kind of measurement mechanism of measuring for optical system wavefront aberration.This measurement mechanism comprises that source, 1/2 wave plate, polarization splitting prism, quarter wave plate, reflection unit and Shack-Hartmann wavefront sensor occur plane of linear polarization ripple.
There is source for generation of plane of linear polarization ripple in plane of linear polarization ripple, it can be made up of linear polarization spherical wave point source and collimating mirror.
1/2 wave plate is for becoming s plane of polarization ripple after described plane of linear polarization ripple conversion.
Polarization splitting prism can reflect or transmission the polarized light of different polarization direction, and in the utility model, quarter wave plate is arrived in the s plane of polarization wave reflection through 1/2 wave plate transmission by it, and transmission is from the p polarized light of quarter wave plate transmission.
The optical axis direction of quarter wave plate and this wave polarization direction angle at 45 °, s plane of polarization, thus the s plane of polarization ripple from described polarization splitting prism is converted into circular polarization plane wave, and the circular polarization plane wave by from described reflection unit is converted into p plane of polarization ripple.
Reflection unit is for returning to the circular polarization plane wave Yan Yuan road of quarter wave plate outgoing, to make the circularly polarized light returning be converted to for the second time described p polarized light transmitted through 1/4, this p polarized light then arrives Shack-Hartmann wavefront sensor transmitted through polarization splitting prism.
Shack-Hartmann wavefront sensor is for measuring the wave aberration of the p polarized light inciding on it.
Reflection unit of the present utility model can be made up of light reflection element, or is combined by light reflection element and optical system to be measured.The wave aberration of the p polarized light that incides Shack-Hartmann wavefront sensor when being comprised optical system to be measured and do not comprised optical system to be measured by measurement, calculates the wave aberration of optical system to be measured.
Simultaneously, for different optical systems to be measured, the divergence that can between reflection unit and quarter wave plate, light beam regulation mechanism be set and regulate light beam to can be received light beam and light beam is correctly returned by reflection unit, for example, arranges collimation lens etc. between reflection unit and quarter wave plate.
For making the purpose of this utility model, technical scheme and advantage clearer, below in conjunction with specific embodiment, and with reference to accompanying drawing, the utility model is described in further detail.
The first embodiment
Figure 1A is the structural drawing of the first embodiment of optical system wavefront aberration measurement mechanism of the present utility model, and this embodiment is the measurement mechanism of measuring for carrying out limited wave aberration far away or infinity conjugate optical system.As shown in Figure 1A, this measurement mechanism comprises linear polarization spherical wave point source 10, the first collimating mirror 20,1/2 wave plate 30, polarization splitting prism 40, quarter wave plate 50, the second collimating mirror 60, reflection unit 80 and Shack-Hartmann wavefront sensor 90.
In this embodiment, the illuminator can adopt micropore as linear polarization spherical wave point source time.Figure 1B has shown its concrete structure, as shown in Figure 1B, linear polarization spherical wave point source comprise for the single mode linear polarization of transmission line polarized light keep optical fiber 101, for fiber end face being imaged onto to image-forming objective lens 102 on microwell plate, microwell plate 103 and micropore 104 for generation of ideal ball ground roll.
Specifically, linear polarization spherical wave point source 10 is for generation of linear polarization spherical wave, the linear polarization spherical wave producing incides the first collimating mirror 20, the first collimating mirror 20 incides 1/2 wave plate 30 after this linear polarization spherical wave is converted into plane of linear polarization ripple, 1/2 wave plate 30 incides polarization splitting prism 40 after becoming s plane of polarization ripple after this plane of linear polarization ripple conversion, described polarization splitting prism 40 can reflect or transmission the polarized light of different polarization direction, at this, after being reflected by polarization splitting prism 40, this s plane of polarization ripple of 1/2 wave plate transmission incides described quarter wave plate 50, the optical axis direction of this quarter wave plate 50 and this wave polarization direction angle at 45 °, s plane of polarization, thus s plane of polarization ripple is converted into circular polarization plane wave, then this circular polarization plane wave incides the second collimating mirror 60, after the second collimating mirror 60, incide reflection unit 80, after being reflected by this reflection unit 80 for the second time through the second collimating mirror 60 and quarter wave plate 50, after this circular polarization plane wave being converted to p polarized light by quarter wave plate 50, turn back to polarization splitting prism 40, then, this p polarized light transmission cross polarization splitting prism 40 laggard enter in Shack-Hartmann wavefront sensor 90.Shack-Hartmann wavefront sensor 90 is for measuring wave aberration.
Fig. 2 A and Fig. 2 B are the schematic diagram while utilizing the optical system wavefront aberration measurement mechanism shown in Figure 1A to measure finite conjugate optical system wavefront aberration, what wherein Fig. 2 A showed is the overall wave aberration for measuring optical system to be measured and measuring system, and what Fig. 2 B showed is the wave aberration for calibration measurements system itself.
As shown in Figure 2 A, in the time measuring overall wave aberration, form reflection unit 80 by optical system S to be measured and high precision sphere catoptron 81.Optical system S to be measured is placed between the second collimating mirror 60 and high precision sphere catoptron 81, and, second focus of collimating mirror 60 and the front focus of optical system S to be measured are overlapped, the center of curvature of high precision sphere catoptron 81 is overlapped with the back focus of optical system S to be measured.
As shown in Figure 2 B, in the time of the wave aberration of calibration measurements system itself, form separately reflection unit 80 by high precision sphere catoptron 81, and the center of curvature of high precision sphere catoptron 81 and the focus of the second collimating mirror 60 are overlapped.
Specifically, utilize the method for the wave aberration of the measurement mechanism measurement finite conjugate optical system of this embodiment to comprise the following steps:
S1, constitute described reflection unit by described optical system S to be measured and high precision sphere catoptron 81, optical system S to be measured is placed between the second collimating mirror 60 and high precision sphere catoptron 81, regulate second focus of collimating mirror 60 and the front focus of optical system S to be measured to overlap, adjust the position of described high precision sphere catoptron 81, its center of curvature is overlapped with the back focus of optical system S to be measured, like this, circularly polarized light reflects Hou Yanyuan road through high precision sphere catoptron 81 and returns, the wave aberration W of the p polarized light of described Shack-Hartmann wavefront sensor is incided in measurement
t, this W
tcomprise and treat the wave aberration of examining system S and the systematic error of measurement mechanism itself.
S2, in the time not placing optical system S to be measured, form separately reflection unit by high precision sphere catoptron 81, adjust the position of high precision sphere catoptron 81, the focus of its center of curvature and the second collimating mirror 60 is overlapped, measure the wave aberration W of the p polarized light that incides described Shack-Hartmann wavefront sensor
s, this W
sfor the systematic error of measurement mechanism.
S3, by formula W=(W
t-W
s)/2 calculate the wave aberration of optical system S to be measured, the wave aberration that wherein W is optical system to be measured.
That is to say the wave aberration W that step S1 is recorded
tdeduct the wave aberration W that step S2 records
s, then divided by 2, obtain the wave aberration W of optical system to be measured.
The measurement mechanism of this first embodiment also can be used for infinity conjugate optical system wave aberration and measures.Fig. 3 is the schematic diagram while utilizing the optical system wavefront aberration measurement mechanism shown in Figure 1A to measure the overall wave aberration of infinity conjugate optical system to be measured and measuring system.
As shown in Figure 3, different from Fig. 2 A, the high precision sphere catoptron 81 that uses high precision plane catoptron 82 to replace in Fig. 2, forms reflection unit 80 by high precision plane catoptron 82 and optical system S to be measured.Now, what optical system S to be measured shone high precision plane catoptron 82 is circular polarization plane wave, and high precision plane catoptron 82 will turn back to measuring system after the circular polarization plane wave reflection of optical system S outgoing to be measured.
Utilize the method for wave aberration of measurement mechanism measurement infinity conjugate optical system and the method for the wave aberration of aforementioned measurement finite conjugate optical system of this second embodiment basic identical, difference is only in step S1, what adjust is the position of high precision plane catoptron 82, and the circular polarization plane wave Yan Yuan road of inciding plane mirror 82 is returned.
The second embodiment
Fig. 4 is the structural drawing of the second embodiment of optical system wavefront aberration measurement mechanism of the present utility model, and this embodiment is the measurement mechanism that the wave aberration for carrying out infinity conjugate optical system or transmitted plane wave optical system is measured.As shown in Figure 4, than the first embodiment shown in Figure 1A, in this measurement mechanism, do not comprise the second collimation lens 60.That is to say, in the measurement mechanism of this second embodiment, directly shine reflection unit 80 by the circular polarization plane wave of quarter wave plate outgoing, and return after reflection unit 80 reflections.
Fig. 5 A and Fig. 5 B are the schematic diagram while utilizing the optical system wavefront aberration measurement mechanism shown in Fig. 4 to measure infinity conjugate optical system wave aberration, what wherein Fig. 5 A showed is the overall wave aberration for measuring optical system to be measured and measuring system, and what Fig. 5 B showed is the wave aberration for calibration measurements system itself.As shown in Figure 5A, in the time measuring overall wave aberration, use high precision sphere catoptron 81 and optical system S to be measured jointly to form reflection unit 80, optical system S to be measured is placed between quarter wave plate 50 and high precision sphere catoptron 81, and, the center of curvature of high precision sphere catoptron 81 is overlapped with the back focus of optical system S to be measured.
Specifically, utilize the method for the wave aberration of the measurement mechanism measurement infinity conjugate optical system of this embodiment to comprise the following steps:
S1, constitute described reflection unit 80 by described optical system S to be measured and high precision sphere catoptron 81, optical system S to be measured is placed between quarter wave plate 50 and high precision sphere catoptron 81, adjust the position of high precision sphere catoptron 81, its center of curvature is overlapped with the back focus of optical system S to be measured, like this, circularly polarized light reflects Hou Yanyuan road through high precision sphere catoptron 81 and returns, and measures the wave aberration W of the p polarized light that incides described Shack-Hartmann wavefront sensor
t, this W
tcomprise and treat the wave aberration of examining system S and the systematic error of measurement mechanism itself.
S2, in the time not placing optical system S to be measured, form separately reflection unit 80 by high precision plane catoptron 82, using high precision plane catoptron 82 as reflection unit 80, adjust the position of high precision plane catoptron 82, make circularly polarized light reflect Hou Yanyuan road through high precision plane catoptron 82 and return, measure the wave aberration W of the p polarized light that incides described Shack-Hartmann wavefront sensor
s, this W
sfor the systematic error of measurement mechanism.
S3, by formula W=(W
t-W
s)/2 calculate the wave aberration of optical system S to be measured, the wave aberration that wherein W is optical system to be measured.
That is to say the wave aberration W that step S1 is recorded
tdeduct the wave aberration W that step S2 records
s, then divided by 2, obtain the wave aberration W of optical system to be measured.
The measurement mechanism of this second embodiment also can be used for transmitted plane wave optical system wavefront aberration and measures.Fig. 6 is the schematic diagram while utilizing the optical system wavefront aberration measurement mechanism shown in Fig. 4 to measure the overall wave aberration of transmission plane optical system to be measured and measuring system.
As shown in Figure 6, different from Fig. 5 A, the high precision sphere catoptron 81 that uses high precision plane catoptron 82 to replace in Fig. 5, forms reflection unit 80 by high precision plane catoptron 82 and optical system S to be measured.Now, what optical system S to be measured shone high precision plane catoptron 82 is circular polarization plane wave, and high precision plane catoptron 82 will turn back to measuring system after the circular polarization plane wave reflection of optical system S outgoing to be measured.
Utilize the method for wave aberration of measurement mechanism measurement transmitted plane wave optical system and the method for the wave aberration of aforementioned this examples measure infinity conjugate optical system of this second embodiment basic identical, difference is only in step S1, what adjust is the position of high precision plane catoptron 82, and the former road of circular polarization plane wave of inciding plane mirror 82 is returned.
Above-described specific embodiment; the purpose of this utility model, technical scheme and beneficial effect are further described; be understood that; the foregoing is only specific embodiment of the utility model; be not limited to the utility model; all within spirit of the present utility model and principle, any amendment of making, be equal to replacement, improvement etc., within all should being included in protection domain of the present utility model.
Claims (8)
1. an optical system wavefront aberration measurement mechanism, for measuring the wave aberration of finite conjugate optical system, it is characterized in that, this measurement mechanism comprises that source, 1/2 wave plate, polarization splitting prism, quarter wave plate, the second collimating mirror, spherical reflector and Shack-Hartmann wavefront sensor occur plane of linear polarization ripple, wherein
There is source for generation of plane of linear polarization ripple in described plane of linear polarization ripple;
Described 1/2 wave plate is for becoming s plane of polarization ripple after described plane of linear polarization ripple conversion;
Described polarization splitting prism is for the s plane of polarization wave reflection through described 1/2 wave plate transmission is arrived to quarter wave plate, and transmission is from the p polarized light of described quarter wave plate transmission;
Described quarter wave plate is used for the s plane of polarization ripple from described polarization splitting prism to be converted into circular polarization plane wave, and the circular polarization plane wave by from described reflection unit is converted into p plane of polarization ripple;
Described the second collimating mirror is between described finite conjugate optical system and described quarter wave plate, and the front focus of the focus of this second collimating mirror and described finite conjugate optical system overlaps;
The center of curvature of described spherical reflector overlaps with the back focus of described finite conjugate optical system, described spherical reflector and described finite conjugate optical system composition reflection unit, described reflection unit is for making to return from the circular polarization plane Yan Yuan road of quarter wave plate;
Described Shack-Hartmann wavefront sensor is for measuring the wave aberration of the p polarized light inciding on it.
2. optical system wavefront aberration measurement mechanism as claimed in claim 1, is characterized in that, by formula W=(W
t-W
s)/2 calculate the wave aberration of described finite conjugate optical system, and wherein W is the wave aberration of described finite conjugate optical system, W
tfor described measurement mechanism incides the wave aberration measured value of the p polarized light of Shack-Hartmann wavefront sensor, W in the time comprising described finite conjugate optical system
sfor described measurement mechanism incides the wave aberration measured value of the p polarized light of Shack-Hartmann wavefront sensor in the time not comprising described finite conjugate optical system.
3. an optical system wavefront aberration measurement mechanism, for measuring the wave aberration of infinity conjugate optical system, it is characterized in that, this measurement mechanism comprises that source, 1/2 wave plate, polarization splitting prism, quarter wave plate, the second collimating mirror, plane mirror and Shack-Hartmann wavefront sensor occur plane of linear polarization ripple, wherein
There is source for generation of plane of linear polarization ripple in described plane of linear polarization ripple;
Described 1/2 wave plate is for becoming s plane of polarization ripple after described plane of linear polarization ripple conversion;
Described polarization splitting prism is for the s plane of polarization wave reflection through described 1/2 wave plate transmission is arrived to quarter wave plate, and transmission is from the p polarized light of described quarter wave plate transmission;
Described quarter wave plate is used for the s plane of polarization ripple from described polarization splitting prism to be converted into circular polarization plane wave, and the circular polarization plane wave by from described reflection unit is converted into p plane of polarization ripple;
Described the second collimating mirror is between described infinity conjugate optical system and described quarter wave plate, and the front focus of the focus of this second collimating mirror and described infinity conjugate optical system overlaps;
Described plane mirror and described infinity conjugate optical system composition reflection unit, described reflection unit is for making to return from the circular polarization plane Yan Yuan road of quarter wave plate;
Described Shack-Hartmann wavefront sensor is for measuring the wave aberration of the p polarized light inciding on it.
4. optical system wavefront aberration measurement mechanism as claimed in claim 3, is characterized in that, by formula W=(W
t-W
s)/2 calculate the wave aberration of described infinity conjugate optical system, and wherein W is the wave aberration of described infinity conjugate optical system, W
tfor described measurement mechanism incides the wave aberration measured value of the p polarized light of Shack-Hartmann wavefront sensor, W in the time comprising described infinity conjugate optical system
sfor described measurement mechanism incides the wave aberration measured value of the p polarized light of Shack-Hartmann wavefront sensor in the time not comprising described infinity conjugate optical system.
5. an optical system wavefront aberration measurement mechanism, for measuring the wave aberration of infinity conjugate optical system, it is characterized in that, this measurement mechanism comprises that source, 1/2 wave plate, polarization splitting prism, quarter wave plate, spherical reflector and Shack-Hartmann wavefront sensor occur plane of linear polarization ripple, wherein
There is source for generation of plane of linear polarization ripple in described plane of linear polarization ripple;
Described 1/2 wave plate is for becoming s plane of polarization ripple after described plane of linear polarization ripple conversion;
Described polarization splitting prism is for the s plane of polarization wave reflection through described 1/2 wave plate transmission is arrived to quarter wave plate, and transmission is from the p polarized light of described quarter wave plate transmission;
Described quarter wave plate is used for the s plane of polarization ripple from described polarization splitting prism to be converted into circular polarization plane wave, and the circular polarization plane wave by from described reflection unit is converted into p plane of polarization ripple;
Described spherical reflector and described infinity conjugate optical system composition reflection unit, described reflection unit is for making to return from the circular polarization plane Yan Yuan road of quarter wave plate;
Described Shack-Hartmann wavefront sensor is for measuring the wave aberration of the p polarized light inciding on it.
6. optical system wavefront aberration measurement mechanism as claimed in claim 5, is characterized in that, by formula W=(W
t-W
s)/2 calculate the wave aberration of described infinity conjugate optical system, and wherein W is the wave aberration of described infinity conjugate optical system, W
tfor described measurement mechanism incides the wave aberration measured value of the p polarized light of Shack-Hartmann wavefront sensor, W in the time comprising described infinity conjugate optical system
sfor described measurement mechanism incides the wave aberration measured value of the p polarized light of Shack-Hartmann wavefront sensor in the time not comprising described infinity conjugate optical system.
7. an optical system wavefront aberration measurement mechanism, for measuring the wave aberration of transmitted plane wave conjugate optical system, it is characterized in that, this measurement mechanism comprises that source, 1/2 wave plate, polarization splitting prism, quarter wave plate, plane mirror and Shack-Hartmann wavefront sensor occur plane of linear polarization ripple, wherein
There is source for generation of plane of linear polarization ripple in described plane of linear polarization ripple;
Described 1/2 wave plate is for becoming s plane of polarization ripple after described plane of linear polarization ripple conversion;
Described polarization splitting prism is for the s plane of polarization wave reflection through described 1/2 wave plate transmission is arrived to quarter wave plate, and transmission is from the p polarized light of described quarter wave plate transmission;
Described quarter wave plate is used for the s plane of polarization ripple from described polarization splitting prism to be converted into circular polarization plane wave, and the circular polarization plane wave by from described reflection unit is converted into p plane of polarization ripple;
Described plane mirror and described transmitted plane wave conjugate optical system composition reflection unit, described reflection unit is for making to return from the circular polarization plane Yan Yuan road of quarter wave plate;
Described Shack-Hartmann wavefront sensor is for measuring the wave aberration of the p polarized light inciding on it.
8. optical system wavefront aberration measurement mechanism as claimed in claim 7, is characterized in that, by formula W=(W
t-W
s)/2 calculate the wave aberration of described transmitted plane wave conjugate optical system, and wherein W is the wave aberration of described transmitted plane wave conjugate optical system, W
tfor described measurement mechanism incides the wave aberration measured value of the p polarized light of Shack-Hartmann wavefront sensor, W in the time comprising described transmitted plane wave conjugate optical system
sfor described measurement mechanism incides the wave aberration measured value of the p polarized light of Shack-Hartmann wavefront sensor in the time not comprising described transmitted plane wave conjugate optical system.
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| CN104749776A (en) * | 2015-04-15 | 2015-07-01 | 中国科学院光电技术研究所 | Solar self-adaptive optical system based on composite shack-Hartmann wavefront sensor |
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Effective date of registration: 20200831 Address after: 100029 Beijing city Chaoyang District Beitucheng West Road No. 3 Patentee after: Institute of Microelectronics of the Chinese Academy of Sciences Address before: 100190, No. 19 West Fourth Ring Road, Beijing, Haidian District Patentee before: Aerospace Information Research Institute,Chinese Academy of Sciences Effective date of registration: 20200831 Address after: 100190, No. 19 West Fourth Ring Road, Beijing, Haidian District Patentee after: Aerospace Information Research Institute,Chinese Academy of Sciences Address before: 9 Dengzhuang South Road, Haidian District, Beijing 100094 Patentee before: Academy of Opto-Electronics, Chinese Academy of Sciences |
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