CN1807323B - Double-layer film structure filming glass without light pollution - Google Patents
Double-layer film structure filming glass without light pollution Download PDFInfo
- Publication number
- CN1807323B CN1807323B CN 200610033494 CN200610033494A CN1807323B CN 1807323 B CN1807323 B CN 1807323B CN 200610033494 CN200610033494 CN 200610033494 CN 200610033494 A CN200610033494 A CN 200610033494A CN 1807323 B CN1807323 B CN 1807323B
- Authority
- CN
- China
- Prior art keywords
- film
- glass
- layer
- optical anti
- reflection
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 239000011521 glass Substances 0.000 title claims abstract description 86
- 230000003287 optical effect Effects 0.000 claims abstract description 27
- 229910044991 metal oxide Inorganic materials 0.000 claims abstract description 13
- 150000004706 metal oxides Chemical class 0.000 claims abstract description 13
- 239000010408 film Substances 0.000 claims description 53
- 239000000758 substrate Substances 0.000 claims description 21
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 14
- 239000004065 semiconductor Substances 0.000 claims description 12
- 229910006404 SnO 2 Inorganic materials 0.000 claims description 4
- 239000010409 thin film Substances 0.000 claims description 3
- 229910052725 zinc Inorganic materials 0.000 claims description 3
- 229910017111 AlOF Inorganic materials 0.000 claims description 2
- 229910004261 CaF 2 Inorganic materials 0.000 claims description 2
- 229910052692 Dysprosium Inorganic materials 0.000 claims description 2
- 229910052771 Terbium Inorganic materials 0.000 claims description 2
- 229910052782 aluminium Inorganic materials 0.000 claims description 2
- 229910052796 boron Inorganic materials 0.000 claims description 2
- 229910052738 indium Inorganic materials 0.000 claims description 2
- 229910052710 silicon Inorganic materials 0.000 claims description 2
- 229910052718 tin Inorganic materials 0.000 claims description 2
- 230000007704 transition Effects 0.000 claims description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 2
- 229910017083 AlN Inorganic materials 0.000 claims 1
- 229910052681 coesite Inorganic materials 0.000 claims 1
- 229910052906 cristobalite Inorganic materials 0.000 claims 1
- 229910052731 fluorine Inorganic materials 0.000 claims 1
- 239000000203 mixture Substances 0.000 claims 1
- 239000000377 silicon dioxide Substances 0.000 claims 1
- 235000012239 silicon dioxide Nutrition 0.000 claims 1
- 229910052682 stishovite Inorganic materials 0.000 claims 1
- 229910052905 tridymite Inorganic materials 0.000 claims 1
- 238000013461 design Methods 0.000 abstract description 4
- 239000005357 flat glass Substances 0.000 abstract description 2
- 230000007797 corrosion Effects 0.000 abstract 1
- 238000005260 corrosion Methods 0.000 abstract 1
- 238000002834 transmittance Methods 0.000 abstract 1
- 238000000151 deposition Methods 0.000 description 42
- 230000008021 deposition Effects 0.000 description 29
- 239000006117 anti-reflective coating Substances 0.000 description 20
- 238000004544 sputter deposition Methods 0.000 description 18
- 239000007789 gas Substances 0.000 description 16
- 239000011248 coating agent Substances 0.000 description 14
- 238000000576 coating method Methods 0.000 description 14
- 238000002310 reflectometry Methods 0.000 description 9
- 230000000694 effects Effects 0.000 description 6
- MEYZYGMYMLNUHJ-UHFFFAOYSA-N tunicamycin Natural products CC(C)CCCCCCCCCC=CC(=O)NC1C(O)C(O)C(CC(O)C2OC(C(O)C2O)N3C=CC(=O)NC3=O)OC1OC4OC(CO)C(O)C(O)C4NC(=O)C MEYZYGMYMLNUHJ-UHFFFAOYSA-N 0.000 description 6
- 238000005253 cladding Methods 0.000 description 5
- 239000000919 ceramic Substances 0.000 description 4
- 239000005344 low-emissivity glass Substances 0.000 description 4
- 230000003667 anti-reflective effect Effects 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 239000003086 colorant Substances 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- 238000001755 magnetron sputter deposition Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 238000012797 qualification Methods 0.000 description 2
- 238000001228 spectrum Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- 206010039203 Road traffic accident Diseases 0.000 description 1
- 238000004378 air conditioning Methods 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 230000008033 biological extinction Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000004566 building material Substances 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 238000007334 copolymerization reaction Methods 0.000 description 1
- 238000005034 decoration Methods 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000004134 energy conservation Methods 0.000 description 1
- 238000005265 energy consumption Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 230000004438 eyesight Effects 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 230000004313 glare Effects 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- 238000004321 preservation Methods 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 230000011514 reflex Effects 0.000 description 1
- 238000004062 sedimentation Methods 0.000 description 1
- 230000036561 sun exposure Effects 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Images
Landscapes
- Surface Treatment Of Glass (AREA)
- Physical Vapour Deposition (AREA)
Abstract
本发明提供一种无光污染的二层膜结构镀膜玻璃。该二层膜结构镀膜玻璃在玻璃基底上镀有一层透明导电膜和一层相应的光学减反射膜，光学减反射膜镀在透明导电膜的上方。透明导电膜是透明金属氧化物薄膜，折射率n在光波长555纳米处为1.7≤n≤2.2；光学减反射膜的折射率n在光波长550纳米处1.2≤n≤1.8。经过光学减反射设计，该二层膜结构镀膜玻璃的可见光反射率可降低到6％左右(低于普通透明平板玻璃)，可见光透过率约90％(高透明)。这种无光污染的节能镀膜玻璃具有膜层结构简单，成本低廉，抗腐蚀，耐久性强等优点，可以单片玻璃的形式在建筑中和车船中使用。
The invention provides a two-layer film structure coated glass without light pollution. The two-layer film structure coated glass is coated with a layer of transparent conductive film and a layer of corresponding optical anti-reflection film on the glass base, and the optical anti-reflection film is plated on the top of the transparent conductive film. The transparent conductive film is a transparent metal oxide film, and the refractive index n is 1.7≤n≤2.2 at the light wavelength of 555 nanometers; the refractive index n of the optical anti-reflection film is 1.2≤n≤1.8 at the light wavelength of 550 nanometers. After optical anti-reflection design, the visible light reflectance of the two-layer film structure coated glass can be reduced to about 6% (lower than ordinary transparent flat glass), and the visible light transmittance is about 90% (highly transparent). This energy-saving coated glass without light pollution has the advantages of simple film structure, low cost, corrosion resistance and strong durability, and can be used in buildings and vehicles in the form of single glass.
Description
Technical field
The invention belongs to technical field of glass materials, relate to a kind of two tunic structure coated glass of not having light pollution specifically.
Background technology
The widely-used of glass curtain wall is a notable feature of modern society's Highrise buildings.It is integrated the body of wall and the door and window of buildings, has the building external structure concurrently and goes along with sb. to guard him function and decoration functions, highlights the modern sense and the artistry of buildings.Glass curtain wall through the development of two more than ten years, nowadays extensively spreads all over China big and medium-sized cities in early eighties introducing in last century China.To the end of the year 2004, only just there are 2000 of curtain buildingses Beijing, 1,400 ten thousand square metres of areas.There are 1300 of curtain buildingses in Shanghai, and the curtain wall total area is above 1,000 ten thousand square metres.China has millions of square metres curtain wall to come into operation every year, and continues to increase with 10% speed.According to statistics, China has become maximum in the world glass curtain wall producing country and has used state.
Yet along with the deterioration of energy scarcity situation and carrying out of building energy conservation work, people recognize the defective of glass curtain wall aspect energy consumption gradually.The curtain wall that uses conventional clear glass to build, its heat transfer coefficient height, to sunlight and not effectively restriction of infrared emanation, whole the cold effect of building Xia Redong is fairly obvious, must adopt air-conditioning to regulate the room temperature throughout the year, and it is very huge to consume energy.New " the public building energy-saving design standard " put into effect of China (GB50189-2005) clearly stipulated: glass curtain wall can not use simple glass, must use energy-saving glass.
Energy-saving curtain wall glass on the market mainly comprises low emissivity glass (Low-E) and sunlight control (or solar heat reflection) glass (Sun-E) at present.Although country has made " qualification " (seeing the relevant regulations during " glass curtain wall optical property " (GB/T18091-2000)), the optical performance parameter of this " qualification " above-mentioned just in fact two class glass own to the reflectivity of cladding glass.Except the energy-saving glass (as water white transparency and light grey Low-E glass) of individual colors has lower visible reflectivity (about 10%), the glass of other most colors is all about 30%.
In addition, though the coated glass that is coated with individual layer tool infrared external reflection functional membrane material in optics and thermal property not as good as Sun-E or Low-E, technology is simple, and is cheap, should also be a good selection on energy-saving application.But this class coated glass also shows higher visible reflectance.The common clear plate glass reflectivity that does not have plated film is about 8%, and the reflectivity of glass rises to 20-30% even higher behind the plated film.When sun exposure is to the coated glass surface,, cause so-called light pollution because the reflex action of glass can produce the intensive reflected glare in closely.
Light pollution may cause serious unexpected traffic accident, and a flickering glass curtain wall mansion just as the mirror that piece is huge, carries out (repeatedly) reflection to daylight and various light.Dazzling reflected light enters in the automobile of running at high speed, and can cause officer's blind suddenly or eyesight illusion, serious harm pedestrian and driver's traffic safety.Build near the glass curtain wall in residential quarter in, daylight, advertising lighting or city floodlighting are reflexed in the resident family, cause detrimentally affect for resident's live and work environment.Every year is all received the complaint of a lot of relevant light pollution from various parts of the country by State Environmental Protection Administration.
For alleviating the problem of light pollution, there is clearer and more definite regulation in China in the use of cladding glass, geographical position to the cladding glass building, direction and height or the like have all been done restriction. put in order the surface glass curtain wall as inaccurate construction of regulation new building, that the arrangement of glass-wall building thing is too unconcentrated, or the place of concentrating in the Residential areas, glass curtain wall or the like is not set towards residential building. but cladding glass is as the notable feature of modern architecture, not only can beautifying urban environment, can also save building materials, alleviate the advantages such as deadweight of buildings, if can fundamentally effectively reduce the reflectivity of glass, overcome the shortcoming of light pollution, make it to have concurrently energy-saving and cost-reducing function simultaneously, cladding glass will inevitably be used widely, and this helps promoting the formation of the environmentally friendly and conservation-minded society of China.
Summary of the invention
The objective of the invention is to utilize the heat-reflective and the optics antireflective know-why of transparent conductive body, provide a kind of low reflection not have two tunic structure coated glass of light pollution.
For realizing above purpose, the present invention has taked following technical scheme: deposition layer of transparent conducting film, the optics antireflective coating that deposition one deck matches on nesa coating again on substrate of glass.
Nesa coating can be the transparent semiconductor metal oxide film, and refractive index n is 1.7≤n≤2.2 in optical wavelength 555 nanometers; The refractive index n of optics antireflective coating is in optical wavelength 550 nanometers 1.2≤n≤1.8.
In the present invention, described transparent semiconductor metal oxide film mainly is to be mixed with at least a above In among Sn, Mo, Sb, Zn, the F
2O
3Film, or be mixed with at least a above SnO among Mo, Sb, Zn, the F
2Film, or SnO
2With In
2O
3By mass ratio is 1: 9 blended ito thin film, or is mixed with at least a above ZnO film among Al, Si, B, Dy, Tb, In, Ga, the F.Specific refractory power is between 1.7～2.2 in visible light wave range for this class transparent semiconductor metal oxide film, and the reflectivity of generation is about about 20%.
In actual applications, transparent semiconductor metal oxide film thickness mainly is by the doping of element decision.When low-doped (atomicity per-cent is less than 0.5%), a little less than the infrared external reflection, film needs bigger thickness; During heavy doping (atomicity per-cent is greater than 2%), the infrared external reflection ability is strong, and film can be very thin.In general, thickness is the needs that 20～300 nanometers can satisfy various situations.
Element doping is little to the influence of the specific refractory power in the visible region, and mainly influence is region of ultra-red, therefore, can not consider the element doping situation in the design of visible light anti-reflection.
As previously mentioned, the transparent semiconductor metal oxide film of specific refractory power between 1.7～2.2, its reflectivity is about 20%.In order farthest to reduce reflection, according to optics antireflective principle, the specific refractory power of optics antireflective coating requires between 1.2～1.8, and corresponding matching thickness is 10～300 nanometers.Corresponding optics antireflective coating is selected from SiO
2, SiO
aN
b, MgO, Y
2O
3, Al
2O
3, AlN, AlOF, InOF, SnOF, MgF
2, CaF
2In a kind of, 1≤a≤2,0≤b≤1 wherein.
Before above-mentioned two tunics deposition, also can on glass substrate, deposit one deck SiO earlier
2Transition layer is to prevent that diffusion of contaminants in the glass matrix is in the transparent semiconductor metal oxide.Because SiO
2The specific refractory power and the glass substrate of transition layer are approaching, and the optical property of above-mentioned two tunic structures can not be affected.
Reflectivity through the coated glass among the present invention after the optimization design can be low to moderate about 6%, and is than the reflectivity before the glass coating 8%, also low.Simultaneously, the transmitance of this coated glass is 80% being promoted to about 90% before the plated film also, and window daylighting usefulness is further improved.
Based on the consideration of technology and cost, the adulterated ZnO film of the preferred Al of transparent semiconductor metal oxide among the present invention, the preferred SiO of optics antireflective coating
2Or Al
2O
3, these two kinds of optics antireflective coatings have physicochemical property preferably, can play a very good protection to the transparent semiconductor metal oxide.
The effect of the nesa coating of coated glass of the present invention is that reverberation is infrared, realizes the heat-insulation and heat-preservation function of glass port, reaches energy saving purposes; The effect of optics antireflective coating is the lighting performance that reduces visible reflectance and strengthen window.The infrared external reflection two tunic structure coated glass of no light pollution have advantages such as film layer structure is simple, with low cost, anticorrosive, and weather resistance is strong.
Nesa coating and optics antireflective coating all have very high chemical stability among the present invention, need not seal, coated glass can use with monolithic form. in order to obtain better effect of heat insulation, also can be applied to it is characterized in that it and second glazing plate are in parallel spaced-apart relation in the vitreum of multiple layer assembling.
Description of drawings
Fig. 1 is two tunic structure coated glass structural representations of the present invention, glass matrix 1 is wherein arranged, nesa coating 2, optics antireflective coating 3.
Fig. 2 is transparent conductive film ZnO: Al (Al atomicity per-cent is 1.2%) and the adulterated In of Sn
2O
3(mass ratio In
2O
3: SnO
2=9: 1, i.e. ITO) the dispersion relation figure of refractive index n and optical extinction coefficient k.Film adopts the magnetron sputtering mode, uses corresponding ceramic target, sputtering sedimentation in Ar gas.Optical constant is recorded by spectroscopic ellipsometers.
Fig. 3 is among the embodiment 1, SiO
2Antireflective coating deposits the reflection spectrum of preceding (dotted line) and deposition back (solid line) and sees through spectrogram.
Fig. 4 is among the embodiment 4, Al
2O
3Antireflective coating deposits the reflection spectrum of preceding (dotted line) and deposition back (solid line) and sees through spectrogram.
Embodiment
Below in conjunction with drawings and Examples content of the present invention is described further, but protection domain of the present invention is not limited only to following examples, everyly belongs to the technical scheme that content of the present invention comprises, all belong to the protection domain of this patent.
The optical constant (see figure 2) of utilizing film can obtain the top condition of antireflective coating, i.e. specific refractory power of antireflective film the best and thickness to calculating that optical multilayer is.
Transparent conductive film in the following examples and antireflection film all adopt conventional magnetron sputtering technique deposition to obtain.This magnetic control sputtering system comprises a sample and presets a chamber and a main sputtering chamber (diameter 45cm).Main sputtering chamber is connected with a molecular diffusion pump, and background vacuum pressure is 2.0 * 10
-6Pa.It can be 2 inches different targets for three diameters are installed that sputtering chamber has three target position.Each target position is inclined upwardly with 30 ° of angles, can burnt mode cosputtering of copolymerization or the independently mode sputter of three targets.The sample microscope carrier can heat up and can be in sputter procedure uniform rotation to guarantee film forming homogeneity.
Embodiment 1:
Glass substrate is successively put into alcohol and acetone soln after ultrasonic pond is cleaned 15 minutes, dry up, put into main vacuum sputtering chamber by the sample chamber of presetting with nitrogen.The mode of deposition of nesa coating is as follows: target ZnO: Al (the hundreds of proportions by subtraction of foreign atom are 1.2%), working gas is a high purity Ar gas, flow 32sccm (cubic centimetre/second), sputtering chamber aero operating pressure 0.6Pa, radio frequency power 40W, 300 ℃ of glass substrate temperature, depositing time 25 minutes.The sedimentary condition of antireflective coating is as follows: target is simple substance Si, and working gas is high purity Ar and O
2Mixed gas, Ar airshed 32sccm, O
2Airshed is 0.6sccm, sputtering chamber aero operating pressure 0.6Pa, radio frequency power 80W, 300 ℃ of glass substrate temperature, depositing time 30 minutes.Film layer structure after deposition finishes is: SiO
2(100nm)/ZnO: Al (80nm)/glass.The optical property index that obtains is as follows: visible reflectance is about 5%, and visible light transmissivity 94% is referring to Fig. 3.
Embodiment 2:
Nesa coating ZnO: Al and antireflective coating SiO
2The mode of deposition of mode of deposition identical with embodiment 1, but glass substrate specially heats up in the deposition process, in the state of nature deposit.Film layer structure still is: SiO
2(100nm)/ZnO: Al (80nm)/glass.This coated glass is put into retort furnace anneal, 500 ℃ of annealing temperatures, time 5-10 minute.The optical property index that obtains is as follows: visible reflectance is about 7%, visible light transmissivity 92%.
Embodiment 3:
The mode of deposition of nesa coating ZnO: Al is identical with embodiment 1, but the depositing time difference is 70 minutes.Antireflective coating SiO
2Mode of deposition and embodiment 1 identical, the sedimentary time still is 30 minutes.Film layer structure after deposition finishes is: SiO
2(100nm)/ZnO: Al (240nm)/glass.The optical property index that obtains is as follows: visible reflectance is about 5%, visible light transmissivity 91%.
Embodiment 4:
The mode of deposition of nesa coating ZnO: Al is identical with embodiment 1, and depositing time is 25 minutes.Antireflective coating Al
2O
3Mode of deposition as follows: target is ceramic Al
2O
3, working gas is high purity Ar, airshed 10sccm, sputtering chamber aero operating pressure O.2Pa, radio frequency power 160W, 300 ℃ of glass substrate temperature, depositing time 160 minutes.Film layer structure after deposition finishes is: Al
2O
3(220nm)/ZnO: Al (80nm)/glass.The optical property index that obtains is as follows: visible reflectance is about 8%, and visible light transmissivity is about 91%, referring to Fig. 4.
Embodiment 5:
Clean glass substrate and put into main vacuum sputtering chamber as embodiment 1.The mode of deposition of nesa coating is as follows: target is the adulterated In of Sn
2O
3(mass ratio In
2O
3: SnO
2=9: 1), i.e. ITO.Working gas is a high purity Ar gas, flow 32sccm, sputtering chamber aero operating pressure 0.6Pa, radio frequency power 30W, 200 ℃ of glass substrate temperature, depositing time 20 minutes.Antireflective coating SiO
2Mode of deposition with embodiment 1,200 ℃ of glass substrate temperature, depositing time 30 minutes.Film layer structure after deposition finishes is: SiO
2(100nm)/ITO (80nm)/glass.The optical property index that obtains is as follows: visible reflectance is about 6%, visible light transmissivity 92%.
Embodiment 6:
The mode of deposition of nesa coating ITO is fully with embodiment 5, depositing time 20 minutes.The mode of deposition of antireflective coating is as follows: target is ceramic MgO, and working gas is high purity Ar, airshed 10sccm, sputtering chamber aero operating pressure 0.2Pa, radio frequency power 160W, 200 ℃ of glass substrate temperature, depositing time 90 minutes.Film layer structure after deposition finishes is: MgO (100nm)/ITO (80nm)/glass.The optical property index that obtains is as follows: visible reflectance is about 9%, visible light transmissivity 89%.
Embodiment 7:
Clean glass substrate and put into main vacuum sputtering chamber as embodiment 1.The mode of deposition of nesa coating is as follows: adopt the double target co-sputtering mode, target is respectively ZnO and ZnF
2, working gas is a high purity Ar gas, flow 32sccm, and sputtering chamber aero operating pressure 0.6Pa, the radio frequency power of ZnO target are 120W, ZnF
2The radio frequency power 30W of target, 200 ℃ of glass substrate temperature, depositing time is about 55 minutes.Antireflective coating SiO
2Mode of deposition with embodiment 1,200 ℃ of glass substrate temperature, depositing time 30 minutes.Film layer structure after deposition finishes is: SiO
2(100nm)/ZnO: F (100nm)/glass.The optical property index that obtains is as follows: visible reflectance is about 8%, visible light transmissivity 88%.
Embodiment 8:
Clean glass substrate and put into main vacuum sputtering chamber as embodiment 1.The mode of deposition of nesa coating is as follows: target is In
2O
3, working gas is high purity Ar and CF
4Mixed gas, the flow of Ar gas is 32sccm, CF
4The flow of gas is 1.2sccm, about sputtering chamber aero operating pressure 0.61Pa, and In
2O
3The radio frequency power of target is 120W, 200 ℃ of glass substrate temperature, and depositing time is about 70 minutes.The mode of deposition of antireflective coating is as follows: target is ceramic Al
2O
3, working gas is high purity Ar, airshed 10sccm, sputtering chamber aero operating pressure 0.2Pa, radio frequency power 160W, 200 ℃ of glass substrate temperature, depositing time 40 minutes.Film layer structure after deposition finishes is: Al
2O
3(50nm)/In
2O
3: F (80nm)/glass.The optical property index that obtains is as follows: visible reflectance is about 9%, visible light transmissivity 87%.
In above embodiment, before described two tunics deposition, also can on glass substrate, deposit one deck SiO earlier
2Transition layer, experiment effect is unaffected.
Claims (5)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 200610033494 CN1807323B (en) | 2006-02-08 | 2006-02-08 | Double-layer film structure filming glass without light pollution |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 200610033494 CN1807323B (en) | 2006-02-08 | 2006-02-08 | Double-layer film structure filming glass without light pollution |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1807323A CN1807323A (en) | 2006-07-26 |
| CN1807323B true CN1807323B (en) | 2010-05-12 |
Family
ID=36839443
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 200610033494 Active CN1807323B (en) | 2006-02-08 | 2006-02-08 | Double-layer film structure filming glass without light pollution |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN1807323B (en) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102140013B (en) * | 2010-02-01 | 2014-01-08 | 天津城建大学 | Method for preparing TiO2 porous film with gradient forbidden band |
| CN102347378B (en) * | 2010-07-31 | 2015-05-20 | 信义光伏产业(安徽)控股有限公司 | Conducting glass and preparation method thereof |
| CN102347379B (en) * | 2010-07-31 | 2015-05-20 | 信义光伏产业(安徽)控股有限公司 | Conductive glass and preparation method and application thereof |
| TWI496931B (en) * | 2011-01-04 | 2015-08-21 | Hon Hai Prec Ind Co Ltd | Vacuum depositing article and method for making the same |
| CN102219393A (en) * | 2011-03-29 | 2011-10-19 | 长春理工大学 | Mesoporous antireflective film and transparent conducting film composite coated glass and coating method thereof |
| CN102424533B (en) * | 2011-09-15 | 2014-03-05 | 江苏秀强玻璃工艺股份有限公司 | Difunctional coated glass capable of reducing visible light reflection and reflecting near infrared ray and preparation method thereof |
| CN103771725A (en) * | 2012-10-22 | 2014-05-07 | 中国科学院上海硅酸盐研究所 | Novel multifunctional energy-saving glass film-coating structure and preparation method thereof |
| CN103879088A (en) * | 2012-12-21 | 2014-06-25 | 中国南玻集团股份有限公司 | High-performance double-silver-layer low-radiation glass and preparation method thereof |
| CN110606669A (en) * | 2019-08-27 | 2019-12-24 | 晟光科技股份有限公司 | Coating process of glass touch panel |
-
2006
- 2006-02-08 CN CN 200610033494 patent/CN1807323B/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| CN1807323A (en) | 2006-07-26 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN1807323B (en) | Double-layer film structure filming glass without light pollution | |
| US20090101209A1 (en) | Method of making an antireflective silica coating, resulting product, and photovoltaic device comprising same | |
| CN1807321A (en) | Highly energy-saving coating glass automatically adjusting light according to environment temperature and multi-layed assembled glass body | |
| CN108328942A (en) | High low anti-double-silver low-emissivity coated glass and preparation method thereof thoroughly | |
| CN104609740B (en) | Can monolithic using sunlight controlling coated glass and preparation method thereof | |
| CN102757184A (en) | Vanadium dioxide-based composite film with adjustable radiance as well as preparation method and application thereof | |
| CN111470784B (en) | High-transmittance wide-color cover plate glass | |
| CN102515563B (en) | Organic vanadium source for preparation of vanadium dioxide intelligent temperature control film and preparation method of film | |
| CN100410198C (en) | Two-layer film structure coated glass without light pollution | |
| CN109457228A (en) | A kind of temperature automatically controlled smart membranes and preparation method thereof | |
| CN102372447A (en) | Low emissivity glass containing silver | |
| CN102126832B (en) | High-weatherability multifunctional thermochromic glass | |
| CN204727775U (en) | Sunlight controlling coated glass can be used by monolithic | |
| CN201864667U (en) | Temperable single silver LOW-E glass | |
| CN101648778A (en) | Low-radiation glass | |
| CN109704597A (en) | A wear-resistant, anti-reflection, transparent heat-insulating glass and preparation method thereof | |
| CN116394610A (en) | A Flexible Transparent Radiation Cooling Window Material | |
| CN212476547U (en) | Medium-transmittance low-reflection gray double-silver low-emissivity coated glass | |
| CN201433170Y (en) | Magnetic-control heat-reflection coated glass | |
| CN103966565A (en) | Preparation method of surface coating for colored thin film solar cell | |
| CN103243885B (en) | Low emissivity window still wall film system of a kind of low cost Color tunable and preparation method thereof | |
| CN103818046B (en) | A kind of low emissivity glass with high permeability and preparation method thereof | |
| CN101708960A (en) | Single-dielectric-layer off-line coated low-emissivity glass | |
| CN222082680U (en) | Low-emissivity coated glass | |
| CN101717202A (en) | Ultraviolet-cutoff coated glass containing silicon film and preparation method thereof |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| ASS | Succession or assignment of patent right |
Owner name: JIANGSU TIEMAO GLASS CO., LTD. Free format text: FORMER OWNER: GUANGZHOU ENERGY SOURCE INST., C.A.S. Effective date: 20130508 |
|
| C41 | Transfer of patent application or patent right or utility model | ||
| COR | Change of bibliographic data |
Free format text: CORRECT: ADDRESS; FROM: 510640 GUANGZHOU, GUANGDONG PROVINCE TO: 226600 NANTONG, JIANGSU PROVINCE |
|
| TR01 | Transfer of patent right |
Effective date of registration: 20130508 Address after: 226600 Haian Changjiang Road, Jiangsu, No. 128, No. Patentee after: Jiangsu Tiemao Glass Co.,Ltd. Address before: Energy road Guangzhou City, Guangdong province 510640 Wushan Park No. 1 Guangzhou Institute of Energy Conversion.CAS Patentee before: Guangzhou Institute of Energy Conversion, Chinese Academy of Sciences |