CN1327046C - Monocrystalline Si3N4 nanometer belt and micro belt preparation method - Google Patents
Monocrystalline Si3N4 nanometer belt and micro belt preparation method Download PDFInfo
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Abstract
Description
技术领域technical field
本发明涉及一种单晶Si3N4纳米带和微米带的制备方法,属材料制备技术领域。The invention relates to a method for preparing single crystal Si 3 N 4 nano-belts and micro-belts, belonging to the technical field of material preparation.
背景技术Background technique
纳米带状材料是一种新型功能材料。最近,以美国佐治亚理工学院的王中林教授等人为代表利用高温固体气相法成功合成了氧化锌、氧化锡、氧化铟、氧化镉和氧化镓等一系列宽带半导体体系的纳米带状结构。这些带状结构纯度高、产量大、结构完美、表面干净,并且内部无缺陷、无位错和层错,是一理想的单晶线形型薄片结构。与碳纳米管以及其他纳米线状结构相比,纳米带是迄今惟一被发现具有结构可控且无缺陷的准一维带状结构,而且具有比碳纳米管更独特和优越的结构和物理性能。碳纳米管硬度高,导电性很强,这些特点使得它成为20世纪90年代的纳米科学研究中的宠儿。但碳纳米管在批量生产时会出现缺陷。材料有缺陷的电子元件在通过电流时,温度可能会异常升高。而合成的半导体氧化物纳米带不存在碳纳米管的稳定性问题。同时这些带状结构材料的纯度可高达95%以上,相比之下,碳纳米管的纯度仅达70%左右。纳米带的这些优点有可能使它更早的被投入工业生产。Nano ribbon material is a new type of functional material. Recently, represented by Professor Wang Zhonglin from the Georgia Institute of Technology in the United States, the nanoribbon structures of a series of broadband semiconductor systems such as zinc oxide, tin oxide, indium oxide, cadmium oxide, and gallium oxide were successfully synthesized by high-temperature solid gas phase method. These banded structures have high purity, high output, perfect structure, clean surface, and no internal defects, dislocations and stacking faults. They are an ideal single crystal linear sheet structure. Compared with carbon nanotubes and other nanowire structures, nanobelts are the only quasi-one-dimensional ribbon structure with controllable structure and no defects found so far, and have more unique and superior structures and physical properties than carbon nanotubes. . Carbon nanotubes are hard and highly conductive, characteristics that made them the darlings of nanoscience research in the 1990s. But carbon nanotubes suffer from defects when mass-produced. Electronic components with defective materials may experience an abnormal increase in temperature when current is passed through them. However, the synthesized semiconductor oxide nanoribbons do not have the stability problem of carbon nanotubes. At the same time, the purity of these ribbon-like structure materials can be as high as 95%, compared with that of carbon nanotubes, which is only about 70%. These advantages of nanoribbon may make it be put into industrial production earlier.
低维Si3N4材料具有很高的强度,重量轻,良好的热冲击和抗氧化能力,因而在很多的工业领域有着很广泛的应用。同时,Si3N4也是一种宽能带的半导体(5.3ev),通过掺杂等手段能够降低其能带从而调控其电学和光学性能,从而制备出能够在高温和高辐射环境下使用的纳米电子器件。到目前为止,据最新文献报道仅有日本的Bando等人利用高温固体气相法合成了单晶Si3N4纳米带和微米带,国内还未见报道。Low-dimensional Si 3 N 4 materials have high strength, light weight, good thermal shock and oxidation resistance, so they are widely used in many industrial fields. At the same time, Si 3 N 4 is also a semiconductor with a wide energy band (5.3ev). Its energy band can be lowered by means of doping to adjust its electrical and optical properties, so that it can be used in high temperature and high radiation environments. nanoelectronic devices. So far, according to the latest literature reports, only Japan's Bando et al. have synthesized single crystal Si 3 N 4 nanoribbons and microribbons by the high-temperature solid gas phase method, and there has been no report in China.
发明内容Contents of the invention
本发明的目的在于提出一种设备和合成工艺简单,产物产率高,纯度高,并且具有很好的可重复性的用有机前驱体热解来制备单晶Si3N4纳米带和微米带的方法。该方法制备的纳米带和微米带的生长机制与已经报道的Si3N4纳米带的气固(Vapor-Solid:VS)生长机制不同,为固液气固(Solid-Liquid-Gas-Solid:LSGS)机制。这种机制非常有利于对低维纳米材料进行掺杂处理,从而调控其电学和光学性能,制备出能够在高温和高辐射环境下使用的纳米电子器件。The object of the present invention is to propose a kind of equipment and synthesis process are simple, product yield is high, purity is high, and has good reproducibility to prepare single-crystal Si 3 N 4 nano-belts and micro-belts by pyrolysis of organic precursors Methods. The growth mechanism of nanoribbons and microribbons prepared by this method is different from the gas-solid (Vapor-Solid: VS) growth mechanism of Si 3 N 4 nanoribbons that have been reported. It is solid-liquid-gas-solid (Solid-Liquid-Gas-Solid: LSGS) mechanism. This mechanism is very beneficial to the doping of low-dimensional nanomaterials, so as to adjust their electrical and optical properties, and to prepare nanoelectronic devices that can be used in high temperature and high radiation environments.
本发明提出的单晶Si3N4纳米带和微米带的制备方法,其特征在于:所述方法采用有机前驱体热解合成单晶Si3N4纳米带和微米带,包括以下步骤:The method for preparing single-crystal Si 3 N 4 nano-belts and micro-belts proposed by the present invention is characterized in that: the method uses an organic precursor to pyrolyze and synthesize single-crystal Si 3 N 4 nano-belts and micro-belts, including the following steps:
(1)低温交联固化:初始原料采用聚硅氮烷,在氮气或氨气中240-290℃保温0.4-4小时进行交联固化,得到半透明的非晶态SiCN固体;(1) Low-temperature cross-linking and curing: the initial raw material is polysilazane, which is kept in nitrogen or ammonia at 240-290°C for 0.4-4 hours for cross-linking and curing to obtain a translucent amorphous SiCN solid;
(2)高能球磨粉碎:将半透明的SiCN固体装入尼龙树脂球磨罐中,在高能球磨机中进行干法球磨粉碎,球磨的同时引入催化剂,使得非晶态SiCN粉末与催化剂混合均匀;(2) High-energy ball milling: put the translucent SiCN solid into a nylon resin ball mill tank, perform dry ball milling in a high-energy ball mill, and introduce a catalyst while ball milling, so that the amorphous SiCN powder and the catalyst are evenly mixed;
(3)高温热解:将高能球磨后的混合物进行高温热解,在1250~1550℃热解温度下保温1~8小时,即可得到不同形貌和化学成分的低维纳米材料。保护气氛为N2气或氨气。(3) High-temperature pyrolysis: The mixture after high-energy ball milling is subjected to high-temperature pyrolysis, and kept at a pyrolysis temperature of 1250-1550°C for 1-8 hours to obtain low-dimensional nanomaterials with different shapes and chemical compositions. The protective atmosphere is N2 gas or ammonia gas.
在上述制备方法中,所述步骤2的催化剂为FeCl2、Al、Cu、Ni、Fe中的任何一种。In the above preparation method, the catalyst in step 2 is any one of FeCl 2 , Al, Cu, Ni, Fe.
在上述制备方法中,所述步骤2的催化剂用量为1-5wt%。In the above preparation method, the amount of catalyst used in the step 2 is 1-5wt%.
本发明具有以下优点:The present invention has the following advantages:
1)设备简单,成本低廉;1) The equipment is simple and the cost is low;
2)合成工艺简单,可控性强,通过控制合成工艺中的一些关键工艺参数即可获得单晶Si3N4纳米带和微米带,并且工艺过程具有很高的可重复性;2) The synthesis process is simple and highly controllable. Single crystal Si 3 N 4 nanoribbons and microribbons can be obtained by controlling some key process parameters in the synthesis process, and the process has high repeatability;
3)合成产物纯度高,所合成的带状结构表面光洁,没有污染;3) The synthetic product has high purity, and the synthesized ribbon structure has a smooth surface and no pollution;
4)本发明的制备单晶纳米带和微米带的方法在工艺上具有很高的弹性,通过在分子水平上调控有机前驱体的化学成分,即可获得不同化学组分的单晶纳米带;4) The method for preparing single crystal nanobelts and microbelts of the present invention has very high flexibility in technology, and single crystal nanobelts of different chemical compositions can be obtained by regulating the chemical composition of the organic precursor at the molecular level;
5)本发明制备单晶纳米带和微米带的方法非常有利于对纳米带进行掺杂处理,这对于调控纳米带的光、电、热、磁等性能是非常有利的,为纳米带的器件化提供了基础。5) The method for preparing single crystal nanobelts and microribbons of the present invention is very beneficial to doping the nanobelts, which is very beneficial for regulating the optical, electrical, thermal, magnetic and other properties of the nanobelts, and is a device for nanobelts provides the basis.
6)已有技术制备纳米材料的方法只能合成单一形状的低维纳米材料,而本发明制备纳米材料的方法通过简单控制几个关键工艺参数即可制备出不同形貌的低维纳米材料如纳米线、纳米带和纳米棒等。6) The method for preparing nanomaterials in the prior art can only synthesize low-dimensional nanomaterials of a single shape, while the method for preparing nanomaterials in the present invention can prepare low-dimensional nanomaterials of different shapes by simply controlling several key process parameters, such as nanowires, nanoribbons, and nanorods.
附图说明Description of drawings
图1原料为Polyureasilazane,催化剂为FeCl2,1350℃热解温度下保温2小时合成的单晶Si3N4纳米带SEM图Figure 1 SEM image of single crystal Si 3 N 4 nanoribbons synthesized from Polyureasilazane, catalyst FeCl 2 , 1350°C pyrolysis temperature for 2 hours
图2原料为Polyureasilazane,催化剂为Al,在1450℃保温4小时合成的单晶Si3N4微米带SEM图Figure 2. The raw material is Polyureasilazane, the catalyst is Al, and the SEM image of the single crystal Si 3 N 4 micron band synthesized at 1450°C for 4 hours
图3原料为Polyureasilazane和Al[OCH(CH3)2]3,催化剂为FeCl2,在1450℃保温2小时合成的具有Al掺杂的单晶Si3N4纳米带SEM图Figure 3 SEM image of Al-doped single crystal Si 3 N 4 nanobelts synthesized from Polyureasilazane and Al[OCH(CH 3 ) 2 ] 3 , catalyst FeCl 2 at 1450°C for 2 hours
图4原料为Polysilazane,催化剂为Fe,在1450℃保温2小时合成的单晶Si3N4纳米带SEM图Figure 4. The raw material is Polysilazane, the catalyst is Fe, and the SEM image of single crystal Si 3 N 4 nanoribbons synthesized at 1450°C for 2 hours
具体实施方式Detailed ways
下面结合实施例对本发明的的技术方案做进一步说明:Below in conjunction with embodiment technical scheme of the present invention is described further:
实施例1Example 1
初始原料采用液态聚硅氮烷(Polyureasilazane),260℃保温0.5小时进行交联固化,保护气氛为0.1MPa的N2气,得到半透明的非晶态SiCN固体。将半透明的SiCN固体装入尼龙树脂球磨罐中在高能球磨机中进行干法球磨粉碎,磨料采用Si3N4球,球磨时间为12小时。球磨的同时引入3wt%的FeCl2粉末作为催化剂,使得非晶态SiCN粉末与催化剂混合均匀。然后取高能球磨后的混合物2g装入氧化铝陶瓷坩锅中在管式炉中进行高温热解,在1350℃热解温度下保温2小时合成了Si3N4单晶纳米线。保护气氛为0.1MPa的流动N2气,气体流速为200ml/min。合成的Si3N4单晶纳米带如图1所示。单根单晶纳米带厚度和宽度粗细均匀,厚度平均为20~40nm,宽度为400~600nm,长度可达几个mm,纳米线之间大小均匀,表面光洁,没有污染。The initial raw material is liquid polyureasilazane (Polyureasilazane), which is kept at 260°C for 0.5 hours for cross-linking and solidification, and the protective atmosphere is 0.1MPa N 2 gas to obtain a translucent amorphous SiCN solid. Put the translucent SiCN solid into a nylon resin ball mill tank and carry out dry ball milling in a high-energy ball mill. The abrasive material is Si 3 N 4 balls, and the ball milling time is 12 hours. While ball milling, 3wt% FeCl2 powder was introduced as a catalyst, so that the amorphous SiCN powder was mixed with the catalyst evenly. Then 2 g of the mixture after high-energy ball milling was put into an alumina ceramic crucible for high-temperature pyrolysis in a tube furnace, and Si 3 N 4 single-crystal nanowires were synthesized at a pyrolysis temperature of 1350° C. for 2 hours. The protective atmosphere is 0.1MPa flowing N2 gas, and the gas flow rate is 200ml/min. The synthesized Si 3 N 4 single crystal nanobelts are shown in Fig. 1 . The thickness and width of a single single crystal nanobelt are uniform, the average thickness is 20-40nm, the width is 400-600nm, and the length can reach several mm. The size of the nanowires is uniform, the surface is smooth, and there is no pollution.
实施例2Example 2
初始原料采用液态聚硅氮烷(Polyureasilazane),260℃保温1小时进行交联固化,保护气氛为0.1MPa的N2气,得到半透明的非晶态SiCN固体。将半透明的SiCN固体装入尼龙树脂球磨罐中在高能球磨机中进行干法球磨粉碎,磨料采用Si3N4球,球磨时间为10小时。球磨的同时引入4.5wt%的Al粉末作为催化剂,使得非晶态SiCN粉末与催化剂混合均匀。然后取高能球磨后的混合物3g装入氧化铝陶瓷坩锅中在管式炉中进行高温热解,在1450℃热解温度下保温4小时合成了Si3N4单晶微米带。保护气氛为0.1MPa的流动N2气,气体流速为200ml/min。合成的Si3N4单晶微米带如图2所示。单晶微米带宽度和厚度均匀,厚度大约为200nm,宽度可达6μm,长度达几个mm,微米带表面光洁,没有污染。The initial raw material is liquid polyureasilazane (Polyureasilazane), which is kept at 260°C for 1 hour for cross-linking and solidification, and the protective atmosphere is 0.1MPa N 2 gas to obtain a translucent amorphous SiCN solid. Put the translucent SiCN solid into a nylon resin ball mill tank and carry out dry ball milling in a high-energy ball mill. The abrasive material is Si 3 N 4 balls, and the ball milling time is 10 hours. While ball milling, 4.5wt% Al powder was introduced as a catalyst, so that the amorphous SiCN powder and the catalyst were evenly mixed. Then, 3 g of the mixture after high-energy ball milling was loaded into an alumina ceramic crucible for high-temperature pyrolysis in a tube furnace, and the Si 3 N 4 single crystal microribbons were synthesized at a pyrolysis temperature of 1450°C for 4 hours. The protective atmosphere is 0.1MPa flowing N2 gas, and the gas flow rate is 200ml/min. The synthesized Si 3 N 4 single crystal microribbons are shown in Fig. 2 . The width and thickness of the single crystal microribbon are uniform, the thickness is about 200nm, the width can reach 6μm, and the length can reach several mm. The surface of the microribbon is smooth and free from pollution.
实施例3Example 3
初始原料采用两种聚硅氮烷(Polyureasilazane和Al[OCH(CH3)2]3),后一种为固态粉末,首先将这两种粉末按重量比(Polyureasilazane∶Al[OCH(CH3)2]3)为4∶1在尼龙树脂球磨罐中混合均匀,然后在270℃保温0.5小时进行交联固化,保护气氛为0.1MPa的N2气,得到非晶态的含Al元素的固体颗粒。将固体颗粒装入尼龙树脂球磨罐中在高能球磨机中进行干法球磨粉碎,磨料采用Si3N4球,球磨时间为13小时。球磨的同时引入3wt%的Ni作为催化剂,使得非晶态粉末与催化剂混合均匀。然后取高能球磨后的混合物2g装入氧化铝陶瓷坩锅中在管式炉中进行高温热解,在1450℃热解温度下保温2小时合成了具有Al掺杂的Si3N4单晶纳米带。保护气氛为0.1MPa的流动N2气,气体流速为200ml/min。合成的Si3N4单晶纳米带如图3所示。单根单晶带状结构厚度和宽度均匀,厚度大约为80nm,微米带表面光洁,没有污染。Two kinds of polysilazanes (Polyureasilazane and Al[OCH(CH 3 ) 2 ] 3 ) were used as the initial raw materials, the latter being a solid powder. 2 ] 3 ) Mix evenly in a nylon resin ball mill tank at a ratio of 4:1, then heat at 270°C for 0.5 hours for cross-linking and solidification, and the protective atmosphere is 0.1MPa N2 gas to obtain amorphous solid particles containing Al . The solid particles were put into a nylon resin ball mill tank and carried out dry ball milling in a high-energy ball mill. Si 3 N 4 balls were used as the abrasive, and the ball milling time was 13 hours. While ball milling, 3wt% Ni was introduced as a catalyst, so that the amorphous powder and the catalyst were evenly mixed. Then take 2 g of the mixture after high-energy ball milling and put it into an alumina ceramic crucible, carry out high-temperature pyrolysis in a tube furnace, and keep it at 1450°C for 2 hours to synthesize Si 3 N 4 single-crystal nanometers with Al doping. bring. The protective atmosphere is 0.1MPa flowing N2 gas, and the gas flow rate is 200ml/min. The synthesized Si 3 N 4 single crystal nanobelts are shown in Fig. 3 . The thickness and width of the single single crystal ribbon structure are uniform, the thickness is about 80nm, and the surface of the micrometer ribbon is smooth and free of pollution.
实施例4Example 4
初始原料采用一种液态聚硅氮烷(Polysilazane),280℃保温0.4小时进行交联固化,保护气氛为0.1MPa的N2气,得到半透明的非晶态SiCN固体。将半透明的SiCN固体装入尼龙树脂球磨罐中在高能球磨机中进行干法球磨粉碎,磨料采用Si3N4球,球磨时间为13小时。球磨的同时引入1wt%的Fe作为催化剂,使得非晶态SiCN粉末与催化剂混合均匀。然后取高能球磨后的混合物2g装入氧化铝陶瓷坩锅中在管式炉中进行高温热解,在1450℃热解温度下保温2小时合成了单晶Si3N4纳米带。保护气氛为0.1MPa的流动N2气,气体流速为200ml/min。合成的单晶Si3N4纳米带如图4所示。单根纳米带厚度和宽度大小均匀,厚度大约为60nm,宽度约为2um,长度达几个mm,带状结构表面光洁,没有污染。A liquid polysilazane (Polysilazane) was used as the initial raw material, and it was kept at 280°C for 0.4 hours for cross-linking and solidification, and the protective atmosphere was N 2 gas of 0.1MPa to obtain a translucent amorphous SiCN solid. Put the translucent SiCN solid into a nylon resin ball mill tank and carry out dry ball milling in a high-energy ball mill. The abrasive material is Si 3 N 4 balls, and the ball milling time is 13 hours. 1wt% Fe was introduced as a catalyst during ball milling, so that the amorphous SiCN powder and the catalyst were evenly mixed. Then, 2 g of the mixture after high-energy ball milling was put into an alumina ceramic crucible for high-temperature pyrolysis in a tube furnace, and the single-crystal Si 3 N 4 nanobelts were synthesized at a pyrolysis temperature of 1450°C for 2 hours. The protective atmosphere is 0.1MPa flowing N2 gas, and the gas flow rate is 200ml/min. The synthesized single crystal Si 3 N 4 nanobelts are shown in Fig. 4 . The thickness and width of a single nanoribbon are uniform, the thickness is about 60nm, the width is about 2um, and the length is several mm. The surface of the ribbon structure is smooth and free of pollution.
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