CN1298537C - 喷孔片及其制程 - Google Patents
喷孔片及其制程 Download PDFInfo
- Publication number
- CN1298537C CN1298537C CNB021403562A CN02140356A CN1298537C CN 1298537 C CN1298537 C CN 1298537C CN B021403562 A CNB021403562 A CN B021403562A CN 02140356 A CN02140356 A CN 02140356A CN 1298537 C CN1298537 C CN 1298537C
- Authority
- CN
- China
- Prior art keywords
- ejection layer
- opening
- layer
- processing procedure
- spray nozzle
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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- Particle Formation And Scattering Control In Inkjet Printers (AREA)
Abstract
Description
Claims (10)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CNB021403562A CN1298537C (zh) | 2002-06-27 | 2002-06-27 | 喷孔片及其制程 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CNB021403562A CN1298537C (zh) | 2002-06-27 | 2002-06-27 | 喷孔片及其制程 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1465481A CN1465481A (zh) | 2004-01-07 |
CN1298537C true CN1298537C (zh) | 2007-02-07 |
Family
ID=34147550
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB021403562A Expired - Fee Related CN1298537C (zh) | 2002-06-27 | 2002-06-27 | 喷孔片及其制程 |
Country Status (1)
Country | Link |
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CN (1) | CN1298537C (zh) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102642404B (zh) * | 2006-12-01 | 2015-10-28 | 富士胶卷迪马蒂克斯股份有限公司 | 在流体喷射器上的非润湿涂层 |
CN105599452A (zh) * | 2016-03-03 | 2016-05-25 | 中国科学院苏州纳米技术与纳米仿生研究所 | 多层材料喷孔结构及打印机 |
CN108501532B (zh) * | 2018-04-09 | 2020-02-14 | 京东方科技集团股份有限公司 | 喷墨打印头、打印机、打印机的喷嘴组件及其制作方法 |
CN113059912B (zh) * | 2021-03-25 | 2022-09-13 | 苏州印科杰特半导体科技有限公司 | 一种防止墨水溢出的多层聚合物喷墨腔室及其制作工艺 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5502470A (en) * | 1991-02-04 | 1996-03-26 | Seiko Epson Corporation | Ink jet recording head and process for producing the same |
US5759421A (en) * | 1993-10-29 | 1998-06-02 | Seiko Epson Corporation | Nozzle plate for ink jet printer and method of manufacturing said nozzle plate |
US6016601A (en) * | 1991-03-28 | 2000-01-25 | Seiko Epson Corporation | Method of preparing the nozzle plate |
CN1078537C (zh) * | 1996-01-23 | 2002-01-30 | 精工爱普生株式会社 | 喷墨打印头及其制造方法 |
-
2002
- 2002-06-27 CN CNB021403562A patent/CN1298537C/zh not_active Expired - Fee Related
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5502470A (en) * | 1991-02-04 | 1996-03-26 | Seiko Epson Corporation | Ink jet recording head and process for producing the same |
US6016601A (en) * | 1991-03-28 | 2000-01-25 | Seiko Epson Corporation | Method of preparing the nozzle plate |
US5759421A (en) * | 1993-10-29 | 1998-06-02 | Seiko Epson Corporation | Nozzle plate for ink jet printer and method of manufacturing said nozzle plate |
US6126269A (en) * | 1993-10-29 | 2000-10-03 | Seiko Epson Corporation | Nozzle plate for ink jet printer and method of manufacturing said nozzle plate |
CN1078537C (zh) * | 1996-01-23 | 2002-01-30 | 精工爱普生株式会社 | 喷墨打印头及其制造方法 |
Also Published As
Publication number | Publication date |
---|---|
CN1465481A (zh) | 2004-01-07 |
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Legal Events
Date | Code | Title | Description |
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C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
C41 | Transfer of patent application or patent right or utility model | ||
C56 | Change in the name or address of the patentee | ||
CP03 | Change of name, title or address |
Address after: Taiwan, Hsinchu, China Hsinchu Science Industrial Park, industrial road, No. 1, No. 36, East fourth floor Patentee after: Cape universal Polytron Technologies Inc. Address before: Taiwan, Hsinchu, China Science Industrial Park, industrial road, No. 24-1, 1 East Patentee before: Cape universal Polytron Technologies Inc. |
|
TR01 | Transfer of patent right |
Effective date of registration: 20081226 Address after: Taiwan, Hsinchu, China Science Industrial Park, industrial road, No. 24-1, 1 East Patentee after: Cape universal Polytron Technologies Inc. Address before: 5, building 9, 81 water conservancy Road, Taiwan, Hsinchu Patentee before: NANODYNAMICS INC. |
|
ASS | Succession or assignment of patent right |
Owner name: YINGPU TECHNOLOGY CO., LTD. Free format text: FORMER OWNER: FEIHE SCIENCE AND TECHNOLOGY CO LTD Effective date: 20081226 |
|
C17 | Cessation of patent right | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20070207 Termination date: 20110627 |