CN1285760C - PLasma enhanced chemical deposition method of low vapor-prossure compound - Google Patents

Abstract

The apparatus of the present invention is generally (a) a flash housing (116) with a monomer atomizer (120) for preparing monomer particles (122), a heated evaporation surface (124) for Evaporate is prepared from monomer particles, and an evaporite outlet (128), coupled to (b) a glow discharge electrode (204), which plate generates a glow discharge plasma from the evaporite, wherein (c) the substrate (104 ) in proximity to the glow discharge plasma for receiving and condensing the glow discharge plasma thereon. The method of the present invention has the following steps: (a) flashing the liquid monomer to form an evaporant at the evaporant outlet; (b) passing the evaporator through a glow discharge electric plate to generate a glow discharge monomer plasma from the evaporator; and (c) low-temperature condensing the glow discharge monomer plasma on the substrate, and crosslinking the glow discharge plasma thereon, wherein free radicals generated in the glow discharge plasma cause the crosslinking, and achieve self- solidified.

Description

Plasma enhanced chemical deposition method and equipment for low vapor pressure compounds

This application is a divisional application of the application filed on September 29, 1998 with the application number 98809599.8 and the title of the invention is "Plasma Enhanced Chemical Deposition Method for Low Vapor Pressure Compounds".

field of invention

The present invention generally relates to a method of making a plasma polymerized film. In particular, the invention relates to the production of plasma polymerized films by plasma enhanced chemical deposition from a source of flashed low vapor pressure compounds. The term "(meth)acrylic" as used herein means "acrylic or methacrylic". As used herein, the term "cryogenic condensation" and its morphology refer to the physical phenomenon of a phase change from a gas phase to a liquid phase when a gas comes into contact with a surface at a temperature below the dew point of the gas.

Background of the invention

The basic method of plasma-enhanced chemical vapor deposition (PECVD) is described in "Thin Film Processes", edited by JL Vossen, W. Kern, Academie Press, 1978, Part IV, Chapter IV-1 Plasma Deposition of Inorganic Compounds, Chapter IV-2 Glow discharge polymerization, incorporated herein by reference. Roughly speaking, glow discharge plasmas are generated on smooth or spiky electrodes. Traditionally, the gas inlet introduces a high vapor pressure monomer gas into the plasma region, where free radicals are formed, causing them to subsequently impinge on the substrate, where some of the free radicals in the monomer chemically bond or crosslink (cure ). High vapor pressure monomer gases include CH ₄ , SiH ₄ , C ₂ H ₆ , C ₂ H _{2 ,} or gases generated from high vapor pressure liquids, such as styrene (10 Torr at 87.4°F (30.8°C)), ring Hexane (100 Torr at 60.4°F (15.8°C), tetramethyldisiloxane (1,3 dichlorotetramethyldisiloxane at 82.9°F (28.3°C) at 10 Torr) and their Combined, they can be evaporated with gentle, controlled heat. Since these high vapor pressure monomer gases are not easy to condense at room temperature or elevated temperature, relying on the chemical bonding of free radicals to the relevant surface instead of low temperature condensation will result in a low deposition rate (only a few tenths of a micron/minute at most). The mitigation of this problem due to the relative substrate being etched by the plasma makes it competitive with cryogenic condensation. Lower vapor pressure species cannot be used for PECVD because heating higher molecular weight monomers to a temperature sufficient to vaporize them will often cause reactions prior to vaporization or make gas metering difficult to control, both of which are not feasible .

The flash method is described in US Patent 4,954,371, incorporated herein by reference. This basic method is also known as polymer multilayer (PML) flashing. In general, a radiation polymerizable and/or linkable material is fed at a temperature below the decomposition temperature and polymerization temperature of the material. The material is atomized into droplets, the droplet size ranges from 1-50 microns. Ultrasonic nebulizers are usually used. The droplets are then flashed in contact under vacuum with a heated surface at a temperature above the boiling point of the material but below that which causes pyrolysis. The vapor is cryogenically condensed on the substrate and then radiation polymerized or crosslinked into very thin polymer layers.

The material may include base monomers or mixtures thereof, crosslinkers and/or initiators. The disadvantage of flash evaporation is that it requires two consecutive steps, low temperature condensation followed by curing or crosslinking, and the two are separated in space and time.

According to the current state of the art in the manufacture of plasma polymerized films, neither PECVD nor flash evaporation nor glow discharge plasma deposition and flash evaporation are used in combination. However, according to J.D.Affinito, M.E.Gross, C.A.Coronado, and P.M.Martin's report in "Vacuum Deposition of Polymer Electrolyte on Flexible Substrate", inorganic compound glow discharge plasma generators have been combined with low-pressure atmosphere (vacuum) flash Steam combination is used for plasma processing of substrates. The article was published in the plenary report of the "Proceedings of the Ninth International Vacuum Screen Coating Conference", edited by R. Baskin on November 1995, Baskin Press 1995, pages 20-36, and shown in Figure 1. In this system, a plasma generator 100 is used to etch a surface 102 of a moving substrate 104 to receive an effluent of monomer gas from a flash 106, which cryogenically condenses on the etched surface 102 and then passes through a second A curing device (not shown), such as electron beam or ultraviolet radiation, to initiate crosslinking and curing. The plasma generator 100 has a housing 108 , a gas inlet 110 . The gas may be oxygen, nitrogen, water, or an inert gas such as argon, or combinations thereof. Inside, electrode 112 , which is smooth or has one or more spikes 114 , generates a glow discharge and causes the gas to form a plasma, which etches surface 102 . The flasher 106 has a housing 116, a monomer inlet 118, and an atomizing nozzle 120, such as an ultrasonic atomizer. The stream flowing through the nozzle 120 is atomized into particles or droplets 122 which impinge on a heated surface 124 on which the particles or droplets 122 flash to a gas which passes through a series of baffles 126 (optional) to outlet 128 and cryogenically condenses on surface 102. Although other airflow distribution means have been used, it has been found that the baffles 126 provide suitable airflow distribution or uniformity while allowing the surface 102 to be easily scaled up. A curing unit (not shown) is located downstream of the flasher 106 .

Therefore, there is a need for an apparatus and method for producing a plasma polymerized layer that is fast and self-curing without the need for a curing device. Such an apparatus and method would be particularly advantageous for the manufacture of PML polymer layers.

Brief description of the invention

The present invention can be viewed from two aspects, its (1) apparatus and method for plasma-enhanced chemical vapor deposition of low vapor pressure monomeric materials on substrates, and its (2) manufacture of self-curing polymer layers, especially self-curing Apparatus and methods for PML polymer layers. Viewed in two aspects, the present invention is a combination of flash evaporation and plasma enhanced chemical vapor deposition (PECVD), which offers some unexpected advantages, it enables the use of low vapor pressure monomer materials in PECVD processes, and provides The deposition rate of self-curing from the flash method is surprisingly faster than that of standard PECVD.

In general, the apparatus of the present invention is (a) a flash shell with a monomer atomizer for preparing monomer particles, a heated evaporation surface for making monomer particles into vapor and an outlet for vaporization, (b) a glow discharge electrode, located downstream of the evaporant outlet, for producing a glow discharge plasma from the evaporant, wherein (c) a substrate, which is adjacent to the glow discharge plasma, for receiving the glow discharge plasma and cryogenic condensation on the substrate. All components should preferably be placed in a low pressure (vacuum) chamber.

The method of the present invention has the following steps: (a) flashing the liquid monomer to form an evaporate at the outlet of the evaporate; (b) passing the evaporate to the glow discharge electrode, and making the evaporate into a glow discharge monomer plasma and (c) low-temperature condensation of the glow discharge monomer plasma on the substrate and cross-linking of the glow discharge plasma thereon, wherein free radicals generated in the glow discharge plasma cause cross-linking and achieve self- solidify.

It is an object of the present invention to provide an apparatus and method for combining flash evaporation and glow discharge plasma deposition.

It is an object of the present invention to provide an apparatus and method for preparing a self-curing polymer layer.

Another object of the present invention is to provide an apparatus and method for preparing a self-curing PML polymer layer.

Another object of the present invention is to provide a device and method for PECVD deposition of low vapor pressure monomers.

An advantage of the present invention is that it is insensitive to the direction of substrate movement, since the deposited monomer layer is self-curing. In the prior art, the deposited monomer layer requires radiation curing equipment, so that the movement of the substrate should have to be from the deposition position to the radiation equipment. Another advantage of the present invention is that multiple layers of materials can be combined, for example, multiple polymer layers - alternating layers of polymer and metal and others - listed in US Patents 5,547,508 and 5,396,644, 5,260,095, incorporated herein by reference. The invention is prepared in a vacuum environment.

The concluding part of the specification specifically and distinctly claims the subject matter of the invention, but both the method of operation and arrangement and its other advantages and objects are best understood by referring to the following detailed description in conjunction with the accompanying drawings, wherein like codes refer to like part.

Description of drawings

Fig. 1 is a cross-sectional view of an inorganic compound glow power generation plasma generator combined with flash evaporation in the prior art.

Fig. 2 is a cross-sectional view of the combined flash evaporation and glow discharge plasma deposition apparatus of the present invention.

Figure 2a is a cross-sectional end view of the apparatus of the present invention.

Fig. 3 is a cross-sectional view of the present invention using the substrate as an electrode.

DESCRIPTION OF THE PREFERRED EMBODIMENT

The apparatus of the present invention is shown in FIG. 2 . The apparatus and methods of the present invention are suitably practiced in a low pressure (vacuum) environment or chamber. The pressure is suitably ranged from 10 ^-1 Torr to 10 ^-6 Torr. The flasher 106 has a housing 116 , a monomer inlet 118 and an atomizing nozzle 120 . The stream passing through the nozzle 120 is atomized into particles or droplets 122 which impinge on a heated surface 124 where the particles or droplets flash to a gas or vapor which flows through a series of baffles 126 to Evaporate exits 128 and cryogenically condenses on surface 102 . A measure to prevent cryogenic condensation on the baffle 126 and other internal component surfaces is to heat the baffle 126 and other internal component surfaces to above the cryogenic condensation temperature of the evaporant or its dew point. Although other airflow distribution means have been used, it has been found that the baffles 126 provide suitable airflow distribution and uniformity while allowing the surface 102 to be enlarged. The evaporant outlet 128 directs the gas to the glow discharge electrode 204, causing the evaporant to generate a glow discharge plasma. In the embodiment shown in FIG. 2, the glow discharge electrode 204 is disposed within a glow discharge housing 200 having an evaporant inlet 202 adjacent to the evaporant outlet 128. In this embodiment, the temperature of the glow discharge housing 200 and the glow discharge electrode 204 is maintained above the dew point of the evaporator. The glow discharge plasma flows out of the glow discharge vessel 200 and cryogenically condenses on the surface 102 of the substrate 104 . The temperature of the substrate 104 is preferably kept below the dew point of the evaporant, preferably at room temperature or cooled below room temperature, in order to increase the rate of low temperature condensation. In this embodiment, the substrate 104 is in motion and may be non-conductive, conductive, or biased with an applied voltage to draw charged particles out of the glow discharge plasma. If the substrate 104 is biased, it can even replace the electrode 204 and become the electrode itself for forming the monomer gas into a glow discharge plasma. Substantially unbiased means that no external voltage is applied, although charge may accumulate due to static electricity or due to interaction with the plasma.

A preferred shape of the glow discharge electrode is shown in Figure 2a. In this embodiment, the glow discharge electrode 204 is separate from the substrate 104 and is shaped so that the stream from the evaporant inlet 202 flows substantially through the electrode opening 206 . Any electrode shape can be used to form the glow discharge, but the preferred shape of the electrode 204 does not shield the plasma formed by the evaporant flowing from the outlet 202, and its symmetrical relationship with respect to the cell outlet slot 202 and the substrate 104 provides Uniformity of evaporant vapor flow to the plasma across the width of the substrate while lateral width uniformity is achieved by movement of the substrate.

The space formed by the electrode 204 and the substrate material 104 is the gap or distance that enables the plasma to impinge on the substrate. The distance that the plasma extends from the electrode will depend on the evaporated species, electrode 204/substrate 104 geometry, voltage and frequency, and pressure in a standard manner detailed in "Discharges in Gases", F.M.Penning, Gordon and Breach Seience Press, 1965, and abstract contained in "Thin Film Methods", edited by J.L.Vossen and W.Kern, Science Press, 1978, Part II, Chapter II-1, "glow discharge sputtering deposition", this paper will two All cited this as a reference.

A plant suitable for batch operation is shown in Figure 3. In this embodiment, glow discharge electrode 204 is sufficiently close to member 300 (substrate) that member 300 is an extension or integral part of electrode 204 . In addition, the part temperature is below the dew point so that the glow discharge plasma cryogenically condenses on the part 300, thereby coating the part 300 with monomer condensate and self-curing into a polymer layer. Close enough may be attached to it, against it in direct contact, or with a gap or distance that enables the plasma to strike the substrate. The distance that the plasma extends from the electrode will depend on the evaporated species, electrode 204/substrate 104 geometry, voltage and frequency, and pressure in a standard manner described in "Discharges in Gases", F.M.Penning, Cordon and Breach Press, 1965, this article is incorporated by reference. The substrate 300 may be stationary or moving during cryogenic condensation. Movement includes rotation and translation and can be used to control the thickness and uniformity of the cryogenically condensed monomer layer thereon. Since cryogenic condensation occurs quickly, within milliseconds and seconds, parts can be discharged after coating and before the coating temperature limit is exceeded.

In operation, whether as a method for plasma enhanced chemical vapor deposition of low vapor pressure monomeric materials on a substrate, or as a method for forming a self-curing polymer layer (particularly PML), the method of the present invention has the following steps: (a) flashing the liquid monomer to form an evaporant at the evaporant outlet; (b) passing the evaporant through the glow discharge electrode to cause the evaporant to form a glow discharge monomer plasma; and (c) passing the glow discharge monomer The plasma cryogenically condenses on the substrate and cross-links the glow discharge plasma. Free radicals generated in the glow discharge plasma lead to crosslinking, which enables self-curing.

The flash evaporation has the following steps: the monomer liquid flows into the inlet; the monomer liquid is atomized through the nozzle; and the monomer particles of the monomer liquid are sprayed to form a large amount. The spray is directed towards the heated evaporation surface on which it evaporates, and exits through the evaporation outlet.

The liquid monomer can be any liquid monomer. However, preferred monomeric materials or liquids have low vapor pressures at room temperature so that they readily cryogenically condense. The vapor pressure of the monomeric material is preferably less than 10 Torr at 83°F (28.3°C), preferably less than 1 Torr at 83°F (28.3°C), and most preferably less than 10 mTorr at 83°F (28.3°C). For monomers of the same chemical group, monomers with low vapor pressure usually have higher molecular weight, and are easier to condense at low temperatures than monomers with high vapor pressure and lower molecular weight. Liquid monomers include, but are not limited to, acrylic monomers such as tripropylene glycol diacrylate, tetraethylene glycol diacrylate, tripropylene glycol monoacrylate, caprolactone acrylate, and combinations thereof; methacrylic monomers; and combinations thereof. (Meth)acrylic monomers are particularly suitable for the manufacture of molecularly doped polymers (MDPs), light-emitting polymers (LEPs) and light-emitting electrochemical cells (LECs).

By employing flash evaporation, the monomer evaporates so quickly that the reactions that normally occur between heating the liquid monomer to the evaporation temperature do not take place. In addition, the evaporant feed rate is strictly controlled by the feed rate of liquid monomer into the inlet 118 of the flasher 106 .

In addition to the vapor produced from the liquid monomer, additional gas may be added to the flasher 106 through the gas inlet 130 upstream of the vapor outlet 128, preferably at the heating surface 124 and the first block closest to the heating surface 124. Baffles 126 are added between. Additional gases can be organic or inorganic, and their purposes include, but are not limited to, ballast, reaction, and combinations thereof. Ballasting refers to providing enough molecules to keep the plasma ignited at low vapor flow rates. Reaction means a chemical reaction that produces compounds other than vapors. Ballast gases include, but are not limited to, elements of group VIII of the periodic table, hydrogen, oxygen, nitrogen, chlorine, bromine, polyatomic gases include, for example, carbon dihydrogen, carbon monoxide, water vapor, and combinations thereof. An exemplary reaction is the addition of oxygen to hexamethyldisiloxane to yield silica.

Example 1

An experiment was carried out to demonstrate the invention shown in Figure 2 and described above. Tetraethylene glycol diacrylate is used as liquid monomer. The temperature of the heated surface was set at about 650°F (343°C). Liquid monomer was introduced into the inlet via a 0.032 inch internal diameter capillary. The inner diameter of the ultrasonic atomizer nozzle is 0.051 inches. The deposition rate of the polymer layer was 0.5 m/min for a 25 micron thick polymer layer and 100 m/min for a 1 micron thick polymer layer. Visual inspection of the cured polymer layer did not reveal any pinholes or cracks.

conclusion

While the preferred embodiment of the invention has been shown and described, many changes and modifications will occur to those skilled in the art without departing from the broader scope of the invention. The appended claims are therefore intended to cover all such changes and modifications as are within the true spirit and scope of this invention.

Claims (16)

1. being used in vacuum chamber makes the low-steam pressure monomer material carry out the equipment of plasma enhanced chemical vapor deposition on substrate, comprising:

(a) flasher housing, this housing have the monomer spraying gun for preparing monomer particle, prepare the heating evaporation surface and the vapour outlet of evaporant from this monomer particle; With

(b) glow-discharge electrode, this electrode exports the downstream at evaporant, prepares glow discharge plasma from evaporant; And

(c) substrate, accept and with this glow discharge plasma cryogenic condensation on this substrate.

2. the equipment of claim 1, wherein substrate is near glow-discharge electrode, and applies bias voltage by impressed voltage.

3. the equipment of claim 1, wherein this glow-discharge electrode places in the glow discharge housing, and this housing has the evaporant inlet of evaporant outlet, and the temperature of this glow discharge housing and this glow-discharge electrode remains on more than the dew point of this evaporant.

4. the equipment of claim 1, wherein this flash distillation housing has the baffle plate that places the opposition between heating surface and the evaporant outlet to put.

5. the equipment of claim 1 comprises that also this evaporant exports the gas inlet of upstream.

6. a method that is used for carrying out on substrate in vacuum environment the plasma enhanced chemical vapor deposition of low-steam pressure monomer material comprises the following steps:

(a) preparation evaporant, it is by accepting when a large amount of low-steam pressure monomer materials spray into the particle of the low-steam pressure monomer material of gained in the flash distillation housing, this spraying of evaporation and discharge evaporant and make through the evaporant outlet on water surface of evaporation; With

(b) prepare monomer plasma from described evaporant, it is that this evaporant is passed through near glow-discharge electrode and generation glow discharge, thereby prepares this plasma body by evaporant; And

(c) make this monomer plasma cryogenic condensation on substrate.

7. the method for claim 6, wherein substrate is near glow-discharge electrode, and applies bias voltage by impressed voltage, accepts the monomer plasma of condensation on it.

8. the method for claim 6, wherein this glow-discharge electrode places the glow discharge enclosure interior, the evaporant inlet of this housing is near the evaporant outlet, the temperature of this glow discharge housing and this glow-discharge electrode remains on the dew point of this evaporant, substrate is positioned at the downstream of monomer plasma, basically do not apply bias voltage with impressed voltage, it accepts the monomer plasma of condensation on it.

9. the method for claim 6, wherein said monomer are selected from Acrylic Acid Monomer, methacrylic acid monomer and combination thereof.

10. the method for claim 9, wherein said Acrylic Acid Monomer is selected from tripropylene glycol diacrylate, Viscoat 335HP, tripropylene glycol mono acrylic ester, caprolactone acrylate and combination thereof.

11. the method for claim 6, wherein said substrate is through refrigerative.

12. the method for claim 6 also is included in evaporant outlet upstream and adds additional gas.

13. the method for claim 12, wherein said additional gas are a kind of ballasting gas.

14. the method for claim 12, wherein said gas are a kind of reactant gasess.

15. the method for claim 14, wherein said reactant gases is an oxygen, and described evaporant comprises hexamethyldisiloxane.

16. the method for claim 6, wherein glow-discharge electrode is arranged in housing, and substrate is positioned at the downstream of monomer plasma.

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