CN113964157A - OLED panel capable of avoiding color mixing in evaporation and preparation method thereof - Google Patents
OLED panel capable of avoiding color mixing in evaporation and preparation method thereof Download PDFInfo
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- CN113964157A CN113964157A CN202111096333.5A CN202111096333A CN113964157A CN 113964157 A CN113964157 A CN 113964157A CN 202111096333 A CN202111096333 A CN 202111096333A CN 113964157 A CN113964157 A CN 113964157A
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- 238000001704 evaporation Methods 0.000 title claims abstract description 53
- 230000008020 evaporation Effects 0.000 title claims abstract description 52
- 238000002360 preparation method Methods 0.000 title claims abstract description 11
- 239000010410 layer Substances 0.000 claims abstract description 122
- 239000000758 substrate Substances 0.000 claims abstract description 111
- 239000000463 material Substances 0.000 claims abstract description 73
- 239000011368 organic material Substances 0.000 claims abstract description 20
- 239000002346 layers by function Substances 0.000 claims abstract description 10
- 239000002184 metal Substances 0.000 claims description 38
- 238000000034 method Methods 0.000 claims description 26
- 230000000903 blocking effect Effects 0.000 claims description 24
- 230000004888 barrier function Effects 0.000 claims description 10
- 238000005229 chemical vapour deposition Methods 0.000 claims description 6
- 238000000151 deposition Methods 0.000 claims description 4
- 239000003086 colorant Substances 0.000 claims description 3
- 229920002120 photoresistant polymer Polymers 0.000 claims description 3
- 238000010438 heat treatment Methods 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 6
- 230000000694 effects Effects 0.000 description 6
- 238000002347 injection Methods 0.000 description 6
- 239000007924 injection Substances 0.000 description 6
- 238000007740 vapor deposition Methods 0.000 description 4
- 239000012044 organic layer Substances 0.000 description 3
- 229920001621 AMOLED Polymers 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 125000006850 spacer group Chemical group 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 230000005525 hole transport Effects 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 238000005019 vapor deposition process Methods 0.000 description 1
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
- H10K59/122—Pixel-defining structures or layers, e.g. banks
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
- H10K71/166—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using selective deposition, e.g. using a mask
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Abstract
The invention provides an OLED panel for avoiding color mixing in evaporation and a preparation method thereof, and the OLED panel comprises: the pixel definition layer comprises a plurality of pixel areas, and the pixel areas comprise a plurality of different sub-pixel areas; an organic functional layer; a support layer including a plurality of support blocks disposed on the substrate outside the sub-pixel regions; and the substrate material layer is arranged around each sub-pixel color area and used for isolating the two adjacent sub-pixel areas. According to the OLED panel, the substrate material layer is arranged on the pixel defining layer, so that different sub-pixel regions on the pixel defining layer are separated, the gaseous organic materials can be effectively prevented from being deviated to different sub-pixel regions, the color mixing of the organic materials in the different sub-pixel regions is avoided, and the yield and the display quality of the OLED panel are improved. The substrate material layer is arranged on the substrate, and no gap exists between the substrate material layer and the substrate material layer, so that the offset color mixing of the heterochromatic organic materials is effectively avoided.
Description
Technical Field
The invention relates to the technical field of OLED panels, in particular to an OLED panel capable of avoiding color mixing in evaporation and a preparation method thereof.
Background
In the AMOLED panel evaporation process, a precision Metal Mask (FMM) is used for defining the coating range of an R/G/B organic layer, and a Shadow effect (Shadow effect) is generated due to poor matching relation between an evaporation angle of an evaporation machine and an FMM taper angle in the evaporation process.
In the existing method, color mixing is prevented through an alignment space in the evaporation process, the opening on the precise metal mask and different color regions of a pixel definition layer on the LTPS substrate are kept to be aligned precisely, but in the edge region of the LTPS substrate, the coated Shadow effect is serious, and when the coated organic material is offset, the organic material Shadow part is easily offset to the different-color PDL, so that color mixing is caused.
In the prior art, part of technicians reform a precise metal mask, a retaining wall is arranged around an evaporation opening on the precise metal mask, the retaining wall is in contact with an LTPS substrate in the evaporation process, so that organic materials are ensured to be in a cavity formed by the precise metal mask, the retaining wall and the LTPS substrate, the organic materials are prevented from being subjected to offset color mixing, but the organic materials are subjected to the evaporation process, and if a certain gap exists between the retaining wall and the LTPS substrate, a certain color mixing risk still exists.
Disclosure of Invention
The invention provides an OLED substrate and a preparation method thereof, which aim to solve the problems in the prior art and provide a substrate material layer arranged on a substrate of the OLED substrate, so as to prevent the deviation of organic materials in different pixel areas in the evaporation process and avoid color mixing.
In order to achieve the purpose, the invention adopts the following technical scheme:
the first aspect of the present invention provides an OLED panel for avoiding color mixing in evaporation, including:
the pixel definition layer comprises a plurality of pixel areas, and the pixel areas comprise a plurality of different sub-pixel areas;
an organic functional layer;
a support layer including a plurality of support blocks disposed on the substrate outside the sub-pixel regions; and
and the substrate material layer is arranged around each sub-pixel color area and used for isolating the two adjacent sub-pixel areas.
Further, each sub-pixel region corresponds to a different color within a color system.
Further, the organic functional layer sequentially comprises a hole injection layer, a hole input layer, an organic light emitting layer, an electron transport layer and an electron injection layer from bottom to top.
Further, the sub-pixel region is rectangular, and the substrate material layer includes:
a first blocking block disposed along one side of the rectangle formed by the sub-pixel regions;
the second blocking block is arranged along the opposite side of the rectangle formed by the sub-pixel areas, which is parallel to the first blocking block;
the third blocking block is arranged along one side of the rectangle formed by the sub-pixel areas, which is vertical to the first blocking block; and
and the fourth blocking block is arranged along the opposite side of the rectangle formed by the sub-pixel areas, which is parallel to the third blocking block.
Further, the material of the substrate material layer is a photoreactive material.
Further, the material of the substrate material layer is a positive photoresist.
Further, the layer of substrate material is flush with the top surface of the support layer.
The second aspect of the present invention provides a method for preparing the above OLED panel, including the following steps:
s00, preparing a substrate material layer on the substrate;
s01, forming color in the sub-pixel region on the pixel definition layer by vapor deposition with a precise metal mask;
wherein the support layer and the substrate material layer support a precision metal mask;
the substrate material layer isolates colors in different sub-pixel regions.
Further, the method for preparing the substrate material layer in S00 includes: depositing a film on a substrate by adopting a chemical vapor deposition method; and then exposing the formed film, and finally developing to finish the preparation.
Further, the evaporation in s01 includes:
providing a precise metal mask, wherein the precise metal mask is provided with an evaporation opening corresponding to the sub-pixel region;
arranging a precise metal mask below the substrate, wherein the evaporation opening corresponds to the sub-pixel region, and the precise metal mask is in contact with the substrate material layer and the supporting layer;
the organic material is heated to be sublimated or melted and evaporated, and is deposited on the sub-pixel area through the evaporation opening.
Further, the size of the evaporation opening is equal to or larger than that of the sub-pixel area.
By adopting the technical scheme, compared with the prior art, the invention has the following technical effects:
according to the OLED panel capable of avoiding color mixing in evaporation and the preparation method thereof, the substrate material layer is arranged on the pixel definition layer of the substrate, so that different sub-pixel regions in the pixel region on the pixel definition layer are separated, and in the evaporation process, gaseous organic materials can be effectively prevented from being shifted to different sub-pixel regions due to shadow effect, so that the color mixing of the organic materials in different sub-pixel regions is avoided, and the yield and the display quality of the OLED panel are improved; the substrate material layer is arranged to be flush with the top surface of the supporting layer, and the supporting layer can be assisted to support the precise metal mask. Compared with the method for arranging the retaining wall on the precise metal mask to avoid the color mixing of different sub-pixel regions, the OLED panel has the advantages that the substrate material layer is arranged on the substrate, no gap exists between the substrate material layer and the substrate material layer, and the offset color mixing of different-color organic materials is effectively avoided.
Drawings
FIG. 1 is a schematic diagram illustrating the offset color mixing of organic materials in different sub-pixel regions during evaporation of a substrate in the prior art;
fig. 2 is a schematic structural diagram of an OLED panel for avoiding color mixing during evaporation according to an embodiment of the present invention;
FIG. 3 is a schematic diagram illustrating a principle of a substrate in an OLED panel for avoiding color mixing during evaporation according to an embodiment of the present invention;
FIG. 4 is a schematic diagram of a substrate material layer and a sub-pixel region of an OLED panel for avoiding color mixing during evaporation according to an embodiment of the present invention;
FIG. 5 is a schematic diagram of a substrate material layer and a sub-pixel region of an OLED panel for avoiding color mixing during evaporation according to an embodiment of the present invention;
FIG. 6 is a schematic diagram of a substrate material layer and a supporting layer in an OLED panel for avoiding color mixing during evaporation according to an embodiment of the present invention;
wherein the reference numerals are: 10-substrate, 11-R color zone, 111-offset color mixing zone, 12-G color zone, 13-B color zone, 20-organic functional layer, 21-hole injection layer, 22-hole transport layer, 23-luminescent layer, 24-electron transport layer, 25-electron injection layer, 30-cathode, 40-precision metal mask, 41-evaporation opening, 50-substrate material layer and 60-support layer.
Detailed Description
The present invention will be described in detail and specifically with reference to the following examples to facilitate better understanding of the present invention, but the following examples do not limit the scope of the present invention.
As shown in fig. 1, in the conventional AMOLED panel evaporation process, a precision metal mask 40 is used to define the range of organic layer coating films in different color regions of a pixel definition layer on a substrate 10, and generally, an evaporation opening 41 on the precision metal mask 40 is precisely aligned with different sub-pixel regions of the pixel definition layer on the substrate 10, so as to implement precise evaporation. However, when the precise metal mask 40 and the substrate 10 have a poor positioning angle between different sub-pixel regions, the positions of the evaporation openings 41 and the different color regions are shifted, and at this time, the shift color mixing of the organic layer occurs between the different sub-pixel regions on the pixel definition layer, for example, the organic substance in the R color region 11 is shifted to the G color region 12 to form a shift color mixing region 111, which causes color mixing of the pixel definition layer, which affects the display quality of the OLED panel and results in product loss.
As shown in fig. 2 and 3, the present invention provides an OLED panel for avoiding color mixing in evaporation, which includes a substrate 10 and an organic functional layer 20; a pixel defining layer is formed on the substrate 10, and the pixel defining layer includes a plurality of pixel regions, and each pixel region includes a plurality of different sub-pixel regions. The substrate 10 may be a different substrate, such as an LTPS substrate, or other OLED panel substrate in the prior art, according to the requirement.
Specifically, each sub-pixel region corresponds to a different color in a color system, and the color system can be selected according to different OLED panel requirements, for example, the color system can be selected from an RGB color system, a CMYK color system, a YIQ color system, a YCbCr color system, and the like. In a preferred embodiment of the present invention, the color system is selected from the RGB color system, and the sub-pixel regions in each pixel region are the R color region 11, the G color region 12, and the B color region 13.
The organic functional layer 20 sequentially includes a hole injection layer 21, a hole transport layer 22, an organic light emitting layer 23, an electron transport layer 24, and an electron injection layer 25 from bottom to top, i.e., in a direction away from the substrate 10. The anode of the OLED panel is arranged in the substrate 10 and the cathode 30 is arranged above the organic functional layer for supplying power to the organic functional layer 20.
Also included on the substrate 10 is a support layer 60 and a layer of backing material 50. The support layer 60 includes a plurality of support blocks disposed on the substrate 10 except for the sub-pixel regions; the substrate material layer 50 is disposed around each sub-pixel region to isolate two adjacent sub-pixel regions.
Wherein the support layer 60 comprises support blocks that are flush with the top surface of the layer of substrate material 50, as shown in fig. 6. The support layer 60 is used to support the precision metal mask 40, and also plays a role in controlling the inter-substrate thickness and the substrate thickness uniformity, and is in contact with the precision metal mask 40 during the evaporation process of the substrate 10. The substrate material layer 50 is flush with the top surface of the support layer 60, and in the vapor deposition process, the substrate material layer 50 and the support layer 60 both contact the precision metal mask 40 and together play a role in supporting the precision metal mask 40, so that the precision metal mask 40 can be prevented from deforming, and the uniformity of the thickness of the substrate 10 can be ensured.
The support layer 60 may be selected from photo spacers, which are disposed on the substrate 10 by photolithography, and the shape and height thereof may be selected according to the needs of the manufacturer; other forms of spacers may be selected for the support layer 60 and are within the scope of the present invention.
As shown in fig. 4, taking the RGB color system as an example, each sub-pixel region is rectangular, and the substrate material layer 50 includes a first barrier, a second barrier, a third barrier and a fourth barrier which are disposed at intervals around four sides of the rectangle formed by the sub-pixel regions. Wherein, the first block is arranged along one side of the rectangle formed by the sub-pixel areas; the second blocking block is arranged along the opposite side of the rectangle formed by the sub-pixel areas and parallel to the first blocking block; the third blocking block is arranged along one side of the rectangle formed by the sub-pixel areas and vertical to the first blocking block; and the fourth blocking block is arranged along the opposite side of the rectangle formed by the sub-pixel areas, which is parallel to the third blocking block. The four-blocker barrier separates adjacent two different sub-pixel regions, for example, an R color region 11 and a G color region 12 in an RGB color system.
Obviously, the four corners of the periphery of the adjacent sub-pixel regions are not separated, which may still cause color mixing between different sub-pixel regions during the evaporation process. In practice, this risk can be circumvented by precisely aligning the evaporation openings 41 in the precision metal mask 40 with the sub-pixel areas that need to be evaporated. When the alignment is shifted, generally, only a small shift of the vapor deposition opening 41 with respect to the sub-pixel region occurs, and a color mixture risk occurs at the edge of the sub-pixel region. If the four corners of the sub-pixel region are shifted, the vapor deposition openings 41 are shifted in two directions relatively to the sub-pixel region, and the large shift can be avoided by precise alignment. The small amplitude deviation can avoid the color mixing risk at the edge of the sub-pixel region through the blocking of the first blocking block, the second blocking block, the third blocking block and the fourth blocking block. Therefore, the discontinuous substrate material layer 50 is arranged on the periphery of four sides of the rectangle formed by the sub-pixel region, so that the color mixing of the edges of the sub-pixel region can be avoided, and the material of part of the substrate material layer 50 can be saved, thereby being more economical.
As shown in fig. 5, the sub-pixel region is rectangular, the substrate material layer 50 is continuously disposed on the periphery of the rectangle formed by the sub-pixel region, and the first barrier, the second barrier, the third barrier and the fourth barrier are continuously disposed to form a rectangular enclosure. The substrate material layer 50 configured as a rectangular enclosure can isolate each adjacent sub-pixel region in all directions, and can completely avoid color mixing risk that may occur at the edges and corners of the sub-pixel regions.
The material of the substrate material layer 50 is a photoreactive material and is prepared on the pixel defining layer of the substrate 10 by a Chemical Vapor Deposition (CVD) method. In a preferred embodiment of the present invention, the material of the substrate material layer 50 is a positive photoresist.
The invention also provides a preparation method of the OLED panel for avoiding color mixing in evaporation, which comprises the following steps:
s00, preparing a substrate material layer 50 on the substrate 10;
s01, forming color in the sub-pixel region on the pixel definition layer by vapor deposition using a precision metal mask 40;
wherein, the supporting layer 60 and the substrate material layer 50 are in contact with the precision metal mask 40 and support the precision metal mask 40 during the evaporation process; the substrate material layer 50 isolates different colors of organic materials in different sub-pixel regions during evaporation.
The arrangement of the other components in the substrate 10, the organic functional layer 20 and the cathode 30 is the same as the preparation method in the prior art and will not be described here.
Wherein, the step of preparing the substrate material layer 50 on the substrate 10 in S00 specifically includes: firstly, a layer of photoreactive material is deposited and prepared on a substrate 10 by adopting a CVD (chemical vapor deposition) method, then the layer of photoreactive material is exposed through a photomask plate, the part of the substrate material to be formed is not irradiated by light, the rest part of the substrate material is irradiated by the light to generate photoreaction, finally, the photoreactive material irradiated by the light is dissolved by a developer, and the part which is not irradiated by the light is left to form a substrate material layer 50, so that the preparation is completed. Wherein the shape of the photomask plate matches the shape of the desired layer of substrate material 50.
As shown in fig. 3, S01 specifically includes:
providing a precise metal mask 40, wherein the precise metal mask 40 is provided with an evaporation opening 41 corresponding to the sub-pixel region;
arranging a precise metal mask 40 below the substrate 10, wherein the evaporation openings 41 correspond to the sub-pixel regions, and the precise metal mask 40 is in contact with the substrate material layer 50 and the supporting layer 60;
the organic material is heated to be sublimated or melt-evaporated and deposited on the corresponding sub-pixel region through the evaporation opening 41.
The size of the evaporation opening 41 is equal to or larger than that of the sub-pixel region, so that the gaseous organic material can be completely deposited on the sub-pixel region through the evaporation opening 41.
The invention has the beneficial effects that: by providing the substrate material layer 50 on the pixel defining layer of the substrate 10, different sub-pixel regions on the pixel defining layer are separated from each other, and color mixing caused by shadow effect or misalignment between the deposition opening 41 and the sub-pixel region on the precise metal mask 40 during the deposition process is avoided. In contrast to the method of forming the dam on the precision metal mask 40 to separate different sub-pixel regions on the pixel definition layer, the substrate material layer 50 is directly disposed on the substrate 10, and during the evaporation process, there is no gap between the substrate material layer 50 and the pixel definition layer, so that adjacent sub-pixel regions can be completely separated, thereby avoiding color mixing between different sub-pixel regions (e.g., the R color region 11 and the G color region 12). And the top ends of the substrate material layer 50 and the supporting layer 60 on the substrate 10 are flush, so that the precise metal mask 40 can be supported in the evaporation process in a matching way, and the thickness and the uniformity of the substrate are controlled.
The embodiments of the present invention have been described in detail, but the embodiments are merely examples, and the present invention is not limited to the embodiments described above. Any equivalent modifications and substitutions to those skilled in the art are also within the scope of the present invention. Accordingly, equivalent changes and modifications made without departing from the spirit and scope of the present invention should be covered by the present invention.
Claims (10)
1. An OLED panel for avoiding color mixing in evaporation, comprising:
a substrate including a pixel definition layer, the pixel definition layer including a plurality of pixel regions including a plurality of different sub-pixel regions therein;
an organic functional layer;
a support layer including a plurality of support blocks disposed on the substrate outside the sub-pixel regions; and
and the substrate material layer is arranged around each sub-pixel color area and used for isolating the two adjacent sub-pixel areas.
2. The OLED panel of claim 1, wherein each of said sub-pixel regions respectively corresponds to a different color within a color system.
3. The OLED panel of claim 1, wherein the sub-pixel area has a rectangular shape, and the substrate material layer comprises:
the first barrier block is arranged along one side of the rectangle formed by the sub-pixel areas;
the second blocking block is arranged along the opposite side of the rectangle formed by the sub-pixel areas, which is parallel to the first blocking block;
the third blocking block is arranged along one side of the rectangle formed by the sub-pixel areas, which is vertical to the first blocking block; and
and the fourth blocking block is arranged along the opposite side of the rectangle formed by the sub-pixel areas, which is parallel to the third blocking block.
4. The OLED panel of claim 1, wherein the material of the substrate material layer is a photoreactive material.
5. The OLED panel of claim 5, wherein the material of the layer of substrate material is a positive photoresist.
6. The OLED panel of claim 1, wherein the layer of substrate material is flush with a top surface of the support layer.
7. A method for preparing the OLED panel as claimed in any one of claims 1 to 6, comprising the steps of:
s00, preparing the substrate material layer on the substrate;
s01, forming color in the sub-pixel region on the pixel definition layer by evaporation through a precise metal mask;
wherein the support layer and the substrate material layer support the precision metal mask;
the layer of substrate material isolates the colors within different of the sub-pixel regions.
8. The method of claim 7, wherein the step of preparing the substrate material layer in S00 includes: depositing a film on the substrate by adopting a chemical vapor deposition method; and then exposing the formed film, and finally developing to finish the preparation.
9. The method according to claim 7, wherein the evaporation in S01 includes:
providing a precise metal mask, wherein the precise metal mask is provided with an evaporation opening corresponding to the sub-pixel region;
arranging the precise metal mask below the substrate, wherein the evaporation opening corresponds to the sub-pixel region, and the precise metal mask is in contact with the substrate material layer and the supporting layer;
heating organic materials to sublimate or melt and evaporate the organic materials, and depositing the organic materials on the sub-pixel areas through the evaporation openings.
10. The method according to claim 9, wherein the size of the evaporation opening is equal to or larger than that of the sub-pixel region.
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| CN202111096333.5A CN113964157A (en) | 2021-09-17 | 2021-09-17 | OLED panel capable of avoiding color mixing in evaporation and preparation method thereof |
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| CN202111096333.5A CN113964157A (en) | 2021-09-17 | 2021-09-17 | OLED panel capable of avoiding color mixing in evaporation and preparation method thereof |
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Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105633301A (en) * | 2014-11-17 | 2016-06-01 | 上海和辉光电有限公司 | Method for reducing OLED color mixture defect and OLED display panel |
| US20160254326A1 (en) * | 2014-09-30 | 2016-09-01 | Boe Technology Group Co., Ltd. | Oled display substrate, oled display device, and mask |
| US20180337221A1 (en) * | 2016-12-16 | 2018-11-22 | Boe Technology Group Co., Ltd. | Organic light emitting diode display substrate, organic light emitting diode display apparatus, and method of fabricating organic light emitting diode display substrate |
| WO2019051931A1 (en) * | 2017-09-12 | 2019-03-21 | 深圳市华星光电半导体显示技术有限公司 | Mask plate, and manufacturing method and evaporation method therefor |
| CN110453173A (en) * | 2019-07-29 | 2019-11-15 | 京东方科技集团股份有限公司 | The production method of mask plate and preparation method thereof, oled display substrate |
| CN110783381A (en) * | 2019-08-30 | 2020-02-11 | 昆山国显光电有限公司 | Display panel, manufacturing method thereof and display device |
| CN111799315A (en) * | 2020-07-23 | 2020-10-20 | 京东方科技集团股份有限公司 | OLED display panel and display device with same |
| CN112002743A (en) * | 2020-08-12 | 2020-11-27 | 武汉华星光电半导体显示技术有限公司 | OLED display panel and display device |
-
2021
- 2021-09-17 CN CN202111096333.5A patent/CN113964157A/en active Pending
Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20160254326A1 (en) * | 2014-09-30 | 2016-09-01 | Boe Technology Group Co., Ltd. | Oled display substrate, oled display device, and mask |
| CN105633301A (en) * | 2014-11-17 | 2016-06-01 | 上海和辉光电有限公司 | Method for reducing OLED color mixture defect and OLED display panel |
| US20180337221A1 (en) * | 2016-12-16 | 2018-11-22 | Boe Technology Group Co., Ltd. | Organic light emitting diode display substrate, organic light emitting diode display apparatus, and method of fabricating organic light emitting diode display substrate |
| WO2019051931A1 (en) * | 2017-09-12 | 2019-03-21 | 深圳市华星光电半导体显示技术有限公司 | Mask plate, and manufacturing method and evaporation method therefor |
| CN110453173A (en) * | 2019-07-29 | 2019-11-15 | 京东方科技集团股份有限公司 | The production method of mask plate and preparation method thereof, oled display substrate |
| CN110783381A (en) * | 2019-08-30 | 2020-02-11 | 昆山国显光电有限公司 | Display panel, manufacturing method thereof and display device |
| CN111799315A (en) * | 2020-07-23 | 2020-10-20 | 京东方科技集团股份有限公司 | OLED display panel and display device with same |
| CN112002743A (en) * | 2020-08-12 | 2020-11-27 | 武汉华星光电半导体显示技术有限公司 | OLED display panel and display device |
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