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CN113718218A - Noble metal jewelry processing method and noble metal jewelry - Google Patents

Noble metal jewelry processing method and noble metal jewelry Download PDF

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Publication number
CN113718218A
CN113718218A CN202110980237.0A CN202110980237A CN113718218A CN 113718218 A CN113718218 A CN 113718218A CN 202110980237 A CN202110980237 A CN 202110980237A CN 113718218 A CN113718218 A CN 113718218A
Authority
CN
China
Prior art keywords
metal jewelry
precious metal
titanium oxide
titanium
oxide film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202110980237.0A
Other languages
Chinese (zh)
Inventor
杨珂
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Guangdong Shunde Zhoudafu Jewelry Manufacturing Co ltd
Original Assignee
Guangdong Shunde Zhoudafu Jewelry Manufacturing Co ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Guangdong Shunde Zhoudafu Jewelry Manufacturing Co ltd filed Critical Guangdong Shunde Zhoudafu Jewelry Manufacturing Co ltd
Priority to CN202110980237.0A priority Critical patent/CN113718218A/en
Publication of CN113718218A publication Critical patent/CN113718218A/en
Pending legal-status Critical Current

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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021Reactive sputtering or evaporation
    • C23C14/0036Reactive sputtering
    • AHUMAN NECESSITIES
    • A44HABERDASHERY; JEWELLERY
    • A44CPERSONAL ADORNMENTS, e.g. JEWELLERY; COINS
    • A44C27/00Making jewellery or other personal adornments
    • A44C27/001Materials for manufacturing jewellery
    • A44C27/002Metallic materials
    • A44C27/003Metallic alloys
    • AHUMAN NECESSITIES
    • A44HABERDASHERY; JEWELLERY
    • A44CPERSONAL ADORNMENTS, e.g. JEWELLERY; COINS
    • A44C27/00Making jewellery or other personal adornments
    • A44C27/001Materials for manufacturing jewellery
    • A44C27/005Coating layers for jewellery
    • A44C27/007Non-metallic coatings
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0015Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterized by the colour of the layer
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08Oxides
    • C23C14/083Oxides of refractory metals or yttrium

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Adornments (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

The application provides a precious metal jewelry processing method and precious metal jewelry. The method comprises the following steps: providing a noble metal jewelry body; the method comprises the steps of exciting plasma by using mixed gas containing oxygen and nitrogen, forming a titanium oxide film on the surface of the precious metal jewelry body by using pure titanium as a target material through a reactive magnetron sputtering process, wherein element titanium in the titanium oxide film has various valence of plus or minus 6. The method can make the jewelry more gorgeous, hard, uniform in thickness, safe and nontoxic.

Description

Noble metal jewelry processing method and noble metal jewelry
Technical Field
The application belongs to the technical field of jewelry, and particularly relates to a precious metal jewelry processing method and a precious metal jewelry.
Background
The precious metal jewelry is usually made of gold, silver, platinum, alloy thereof and other materials, and the surface color of the jewelry is usually single yellow or white and has a single color.
Disclosure of Invention
The application aims to provide a precious metal jewelry processing method and a precious metal jewelry aiming at the defects in the prior art.
In order to solve the technical problem, the following technical scheme is adopted in the application: a precious metal jewelry processing method comprises the following steps:
providing a noble metal jewelry body;
the method is characterized in that plasma is excited by mixed gas containing oxygen and nitrogen, pure titanium is used as a target, and a titanium oxide film is formed on the surface of the noble metal jewelry body by a reactive magnetron sputtering process, wherein the titanium element in the titanium oxide film has various valence of plus or minus 6.
In order to solve the technical problem, the following technical scheme is adopted in the application: a precious metal jewelry item comprising: the titanium oxide jewelry comprises a precious metal jewelry body and a titanium oxide film covering the surface of the precious metal jewelry body, wherein the element titanium in the titanium oxide film has various valence of +/-6.
Compared with the prior art, the beneficial effect of this application is: because the element titanium has various valence, the surface of the jewelry presents various colors similar to seven colors, and the jewelry is more gorgeous in appearance. Furthermore, the titanium oxide film is hard and stable, is not easy to scratch, has uniform thickness and is corrosion resistant. The reaction raw materials are safe and nontoxic.
Drawings
Fig. 1 is a flow chart of a method of processing precious metal jewelry according to an embodiment of the present application.
Fig. 2 is a schematic structural diagram of a precious metal jewelry according to an embodiment of the present application.
Detailed Description
In this application, it will be understood that terms such as "including" or "having," or the like, are intended to indicate the presence of the disclosed features, integers, steps, acts, components, parts, or combinations thereof, but do not preclude the presence or addition of one or more other features, integers, steps, acts, components, parts, or combinations thereof.
It should be noted that the embodiments and features of the embodiments in the present application may be combined with each other without conflict. The present application will be described in detail below with reference to the embodiments with reference to the attached drawings.
The application is further described with reference to examples of embodiments shown in the drawings.
Referring to fig. 1, an embodiment of the present application provides a method for processing precious metal jewelry, which includes the following process steps.
Step 101, providing a precious metal jewelry body.
The material of the precious metal jewelry body is gold or platinum, for example. The shape of the precious metal jewelry body is, for example, earrings, necklaces, rings or bracelets.
103, exciting plasma by using mixed gas containing oxygen and nitrogen, forming a titanium oxide film on the surface of the precious metal jewelry body by using pure titanium as a target through a reactive magnetron sputtering process, wherein element titanium in the titanium oxide film has various valence of plus 6.
Specifically, after glow discharge, mixed gas containing oxygen and nitrogen bombards a pure titanium target, ionized titanium steam is formed on the surface of the titanium target, ionized titanium is accelerated by an electric field to move to the surface of the noble metal jewelry, and then the ionized titanium is oxidized by the oxygen. The nitrogen is used as a protective gas, so that the reaction process is more stable.
The nitrogen is inert gas, and can discharge redundant oxygen in the environment after rushing into the reaction chamber, thereby preventing the quality of the titanium oxide film from being influenced by excessive oxidation reaction. According to the content of oxygen in the diffusion pump, the titanium oxide film can present different color effects. The color effect of the coated product can be changed by changing the oxygen content. Too large oxygen addition can cause too severe pressure change in the reaction chamber and increase process errors; the oxygen addition amount is too small, resulting in insufficient reaction. The gas inlet amount of the nitrogen is not too large, otherwise, the ion amount in the plasma is too large, and the noble metal jewelry body is burnt out. The specific amounts of oxygen and nitrogen may be adjusted depending on the test results.
Specifically, the rf power source may be introduced into the reaction chamber by capacitive coupling. The frequency of the radio frequency power supply is, for example, 27.12 MHz. The noble metal jewelry body is placed on a rotating frame, and the rotating frame is driven by a mechanical motor to rotate.
The inventor tests that titanium in the titanium oxide has a plurality of valences, wherein the valences are + 6.
Because the element titanium has various valence, the surface of the jewelry presents various colors similar to seven colors, and the jewelry is more gorgeous in appearance. Furthermore, the titanium oxide film is hard and stable, is not easy to scratch, has uniform thickness and is corrosion resistant. The reaction raw materials are safe and nontoxic.
Optionally, the titanium oxide thin film has a thickness between 10um and 15 um. The inventor finds that if the titanium oxide film is too thin, the surface of the titanium oxide film has weak scratch resistance and is easy to transmit color (namely, the color of the noble metal jewelry body can be transmitted); if the titanium oxide film is too thick, the content of the noble metal jewelry body is too low, and color is not enough.
Optionally, the air pressure in the reaction chamber of the reactive magnetron sputtering process is not more than 8 × 10-4Pa. The excessive air pressure in the reaction chamber can cause single valence of titanium and single color of the titanium oxide film on one hand; on the other hand, the thickness of the titanium oxide film is not controllable.
Optionally, the temperature in the reaction chamber of the reactive magnetron sputtering process is between 380 ℃ and 440 ℃. The temperature in the reaction chamber is too low, and the element titanium is difficult to oxidize; the bonding force between the titanium oxide film and the noble metal jewelry body is insufficient when the temperature in the world is too high before the reaction.
Optionally, the processing method further comprises: 102, covering a protective layer on part of the surface of the noble metal jewelry body before the reactive magnetron sputtering process is carried out; and 104, removing the protective layer after the reactive magnetron sputtering process.
These two steps are optional. After step 104, the area covered by the protective layer may be subjected to subsequent processes such as wire drawing or polishing.
In other words, the titanium oxide film can be formed on the whole surface of the noble metal jewelry body, and the titanium oxide film can also be formed on part of the surface of the noble metal jewelry. Thus, the shape of the multicolored regions is also customizable.
Optionally, the protective layer is insulating ink or high-temperature gummed paper.
Based on the same inventive concept as the previous embodiment, referring to fig. 2, an embodiment of the present application further provides a precious metal jewelry, comprising: the jewelry comprises a precious metal jewelry body 1 and a titanium oxide film 2 covering the surface of the precious metal jewelry body 1, wherein the element titanium in the titanium oxide film 2 has various valence of plus or minus 6.
Because the element titanium has various valence, the surface of the jewelry presents various colors similar to seven colors, and the jewelry is more gorgeous in appearance. Furthermore, the titanium oxide film is hard and stable, is not easy to scratch and is corrosion resistant. The reaction raw materials are safe and nontoxic.
Optionally, the thickness of the titanium oxide thin film 2 is between 10um and 15 um.
Optionally, the material of the precious metal jewelry body 1 is gold or platinum.
The embodiments in the present application are described in a progressive manner, and the same and similar parts among the embodiments can be referred to each other, and each embodiment focuses on the differences from the other embodiments.
The protective scope of the present application is not limited to the above-described embodiments, and it is apparent that various modifications and variations can be made to the present application by those skilled in the art without departing from the scope and spirit of the present application. It is intended that the present application also include such modifications and variations as come within the scope of the appended claims and their equivalents.

Claims (10)

1. A precious metal jewelry processing method is characterized by comprising the following steps:
providing a noble metal jewelry body;
the method comprises the steps of exciting plasma by using mixed gas containing oxygen and nitrogen, forming a titanium oxide film on the surface of the precious metal jewelry body by using pure titanium as a target material through a reactive magnetron sputtering process, wherein element titanium in the titanium oxide film has various valence of plus or minus 6.
2. The method of claim 1, wherein the titanium oxide thin film has a thickness between 10um and 15 um.
3. The method of claim 1, wherein a gas pressure in a reaction chamber of the reactive magnetron sputtering process is not greater than 8 x 10-4Pa。
4. The method of claim 1, wherein a temperature within a reaction chamber of the reactive magnetron sputtering process is between 380 ℃ and 440 ℃.
5. The method of claim 1, further comprising:
before the reaction magnetron sputtering process is carried out, covering a protective layer on part of the surface of the noble metal jewelry body;
and removing the protective layer after the reactive magnetron sputtering process.
6. The method of claim 5, wherein the protective layer is an insulating ink or a high temperature offset paper.
7. The method of claim 1, wherein the precious metal jewelry body is made of gold or platinum.
8. A precious metal jewelry item, comprising: the titanium oxide jewelry comprises a precious metal jewelry body and a titanium oxide film covering the surface of the precious metal jewelry body, wherein the element titanium in the titanium oxide film has various valence of +/-6.
9. The precious metal jewelry of claim 8, wherein the titanium oxide thin film has a thickness between 10um and 15 um.
10. The precious metal jewelry of claim 8, wherein the precious metal jewelry body is made of gold or platinum.
CN202110980237.0A 2021-08-25 2021-08-25 Noble metal jewelry processing method and noble metal jewelry Pending CN113718218A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202110980237.0A CN113718218A (en) 2021-08-25 2021-08-25 Noble metal jewelry processing method and noble metal jewelry

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202110980237.0A CN113718218A (en) 2021-08-25 2021-08-25 Noble metal jewelry processing method and noble metal jewelry

Publications (1)

Publication Number Publication Date
CN113718218A true CN113718218A (en) 2021-11-30

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Country Status (1)

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Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003231966A (en) * 2002-02-08 2003-08-19 Central Glass Co Ltd Process for forming titanium oxide film
CN102534499A (en) * 2010-12-24 2012-07-04 中国科学院兰州化学物理研究所 Preparation method for titanium monoxide imitation gold nanometer film
CN103708738A (en) * 2013-12-30 2014-04-09 陈湛玲 Method for carrying out color coating on domestic glassware
CN105862000A (en) * 2016-05-11 2016-08-17 江南大学 Method for preparing nano-films for realizing structural colors on fabric surfaces through magnetron sputtering technology
KR20170119263A (en) * 2016-04-18 2017-10-26 울산대학교 산학협력단 Plated film and manufacturing method of the same
KR101868852B1 (en) * 2017-12-11 2018-06-19 주식회사 알도 Method for Fashion jewelry with luxury Multi color design by Vacuum Deposition Technologies
CN109487222A (en) * 2018-11-26 2019-03-19 山东大学 Method for rapidly preparing color titanium oxide film on surface of substrate material
CN110387528A (en) * 2018-04-23 2019-10-29 丁志明 Colorful film and forming method thereof

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003231966A (en) * 2002-02-08 2003-08-19 Central Glass Co Ltd Process for forming titanium oxide film
CN102534499A (en) * 2010-12-24 2012-07-04 中国科学院兰州化学物理研究所 Preparation method for titanium monoxide imitation gold nanometer film
CN103708738A (en) * 2013-12-30 2014-04-09 陈湛玲 Method for carrying out color coating on domestic glassware
KR20170119263A (en) * 2016-04-18 2017-10-26 울산대학교 산학협력단 Plated film and manufacturing method of the same
CN105862000A (en) * 2016-05-11 2016-08-17 江南大学 Method for preparing nano-films for realizing structural colors on fabric surfaces through magnetron sputtering technology
KR101868852B1 (en) * 2017-12-11 2018-06-19 주식회사 알도 Method for Fashion jewelry with luxury Multi color design by Vacuum Deposition Technologies
CN110387528A (en) * 2018-04-23 2019-10-29 丁志明 Colorful film and forming method thereof
CN109487222A (en) * 2018-11-26 2019-03-19 山东大学 Method for rapidly preparing color titanium oxide film on surface of substrate material

Non-Patent Citations (4)

* Cited by examiner, † Cited by third party
Title
刘文科等: "钛膜表面氧气氧化层研究", 《材料导报》, vol. 18, no. 5, 31 December 2004 (2004-12-31), pages 92 - 94 *
张济忠等: "《现代薄膜技术》", 31 January 2009, 北京:冶金工业出版社, pages: 399 *
朱昌等: "氧分压对TiO2薄膜光学性能地影响", 《西安工业大学学报》, vol. 28, no. 6, 31 December 2008 (2008-12-31), pages 511 - 515 *
辛湘杰等: "《钛的腐蚀、防护及工程应用》", 31 January 1988, 安徽科学技术出版社, pages: 204 - 205 *

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