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CN113678238A - Magnetic levitation system and method for measuring the distance between at least one electromagnetic actuator and a ferromagnetic element - Google Patents

Magnetic levitation system and method for measuring the distance between at least one electromagnetic actuator and a ferromagnetic element Download PDF

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Publication number
CN113678238A
CN113678238A CN201980094622.6A CN201980094622A CN113678238A CN 113678238 A CN113678238 A CN 113678238A CN 201980094622 A CN201980094622 A CN 201980094622A CN 113678238 A CN113678238 A CN 113678238A
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China
Prior art keywords
electromagnetic actuator
magnetic levitation
transformers
carrier
levitation system
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CN201980094622.6A
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Chinese (zh)
Inventor
斯文·兰霍夫
雷纳·厄布
亨宁·奥斯特
马丁·艾尼斯
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Applied Materials Inc
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Applied Materials Inc
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Publication of CN113678238A publication Critical patent/CN113678238A/en
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
    • H01L21/67709—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations using magnetic elements
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B60—VEHICLES IN GENERAL
    • B60L—PROPULSION OF ELECTRICALLY-PROPELLED VEHICLES; SUPPLYING ELECTRIC POWER FOR AUXILIARY EQUIPMENT OF ELECTRICALLY-PROPELLED VEHICLES; ELECTRODYNAMIC BRAKE SYSTEMS FOR VEHICLES IN GENERAL; MAGNETIC SUSPENSION OR LEVITATION FOR VEHICLES; MONITORING OPERATING VARIABLES OF ELECTRICALLY-PROPELLED VEHICLES; ELECTRIC SAFETY DEVICES FOR ELECTRICALLY-PROPELLED VEHICLES
    • B60L13/00—Electric propulsion for monorail vehicles, suspension vehicles or rack railways; Magnetic suspension or levitation for vehicles
    • B60L13/04—Magnetic suspension or levitation for vehicles
    • B60L13/06—Means to sense or control vehicle position or attitude with respect to railway
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
    • F16C32/00—Bearings not otherwise provided for
    • F16C32/04—Bearings not otherwise provided for using magnetic or electric supporting means
    • F16C32/0406—Magnetic bearings
    • F16C32/044—Active magnetic bearings
    • F16C32/0444—Details of devices to control the actuation of the electromagnets
    • F16C32/0451—Details of controllers, i.e. the units determining the power to be supplied, e.g. comparing elements, feedback arrangements with P.I.D. control
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
    • F16C32/00—Bearings not otherwise provided for
    • F16C32/04—Bearings not otherwise provided for using magnetic or electric supporting means
    • F16C32/0406—Magnetic bearings
    • F16C32/044—Active magnetic bearings
    • F16C32/0444—Details of devices to control the actuation of the electromagnets
    • F16C32/0457—Details of the power supply to the electromagnets
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
    • H01L21/67712—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations the substrate being handled substantially vertically
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02K—DYNAMO-ELECTRIC MACHINES
    • H02K41/00—Propulsion systems in which a rigid body is moved along a path due to dynamo-electric interaction between the body and a magnetic field travelling along the path
    • H02K41/02—Linear motors; Sectional motors
    • H02K41/025—Asynchronous motors
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02N—ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR
    • H02N15/00—Holding or levitation devices using magnetic attraction or repulsion, not otherwise provided for
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
    • F16C2380/00—Electrical apparatus
    • F16C2380/18—Handling tools for semiconductor devices
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
    • F16C32/00—Bearings not otherwise provided for
    • F16C32/04—Bearings not otherwise provided for using magnetic or electric supporting means
    • F16C32/0406—Magnetic bearings
    • F16C32/044—Active magnetic bearings
    • F16C32/0472—Active magnetic bearings for linear movement

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Power Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Combustion & Propulsion (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical & Material Sciences (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Transportation (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Control Of Vehicles With Linear Motors And Vehicles That Are Magnetically Levitated (AREA)
  • Magnetic Bearings And Hydrostatic Bearings (AREA)

Abstract

A magnetic levitation system (100) for magnetically levitated ferromagnetic elements (150) is described. The magnetic levitation system (100) comprises at least one electromagnetic actuator (178) coupled with one or more transformers (140) arranged in a current supply system (135), the current supply system (135) being adapted to supply current to the at least one electromagnetic actuator (178). In addition, a substrate processing system comprising a magnetic levitation system and a method of measuring a distance between at least one electromagnetic actuator and a ferromagnetic element are described.

Description

Magnetic levitation system and method for measuring the distance between at least one electromagnetic actuator and a ferromagnetic element
Technical Field
Embodiments of the present disclosure relate to magnetic levitation systems for magnetically levitating ferromagnetic elements. In particular, embodiments of the present disclosure relate to magnetic levitation systems for contactless transport of carriers, in particular in substrate processing systems. Further, embodiments of the present disclosure relate to a method of measuring a distance between at least one electromagnetic actuator and a ferromagnetic element, in particular, the ferromagnetic element being connected to a carrier for holding a substrate.
Background
Systems for performing various processes, such as coating a substrate in a processing chamber, are known. Several methods are known for depositing materials on a substrate. For example, the substrate may be coated by using an evaporation process, a Physical Vapor Deposition (PVD) process (such as a sputtering process, a spray process, etc.), or a Chemical Vapor Deposition (CVD) process. The process may be performed in a processing chamber of a deposition apparatus in which the substrate to be coated is located. A deposition material is disposed in the process chamber. A variety of materials (such as small molecules, metals, oxides, nitrides, and carbides) may be used for deposition on the substrate. In addition, other processes may be performed in the processing chamber, such as etching, structuring, annealing, and the like.
For example, in display manufacturing technologies, for example, coating processes may be considered for large area substrates. The coated substrate can be used in several applications and in several technical fields. For example, one application may be an Organic Light Emitting Diode (OLED) panel. Additional applications include insulating panels, microelectronic devices, such as semiconductor devices, substrates with Thin Film Transistors (TFTs), color filters, and the like. OLEDs are solid-state devices composed of thin films of (organic) molecules that generate light by being applied with electrical power. As one example, OLED displays may provide a bright display on an electronic device and use reduced power compared to, for example, Liquid Crystal Displays (LCDs). In the processing chamber, organic molecules are generated (e.g., evaporated, sputtered, or sputtered, etc.) and deposited as a layer on the substrate. The particles may, for example, pass through a mask having a boundary or a particular pattern to deposit material at a particular location on the substrate, e.g., to form an OLED pattern on the substrate.
The processing system typically includes a transport system for guiding the carrier in the processing chamber (e.g., during the coating process). For example, the transport system may be adapted to provide carriers at the processing location and/or for transporting carriers within the processing chamber. The transport system may be configured for magnetic levitation and may include one or more magnetic bearings. In order to measure the distance between the carrier and the magnetic bearing, a separate distance sensor is typically provided. However, the separate distance sensor has the disadvantage of requiring additional installation space and increasing complexity. In particular, the use of known distance sensors involves an ultrafast and high-resolution analysis of the measurement signal. In addition, conventional distance measurement methods involve complex signal processing models to determine position information from the magnetic bearing actuators, particularly from high bandwidth and high resolution current measurements.
Accordingly, there is a continuing need for an improved carrier transport system that at least partially overcomes some of the problems of the prior art, particularly with respect to measuring the distance between the magnetic bearing actuator and the carrier. Additionally, there is a continuing need for an improved method of measuring the distance between a magnetic bearing actuator and a carrier that can overcome at least some of the problems in the prior art.
Disclosure of Invention
In view of the above, a magnetic levitation system and a method of measuring a distance between at least one electromagnetic actuator and a ferromagnetic element according to the independent claims are provided. Further aspects, advantages and features are apparent from the dependent claims, the description and the drawings.
According to one aspect of the present disclosure, a magnetic levitation system for magnetically levitating a ferromagnetic element is provided. The magnetic levitation system comprises at least one electromagnetic actuator. At least one electromagnetic actuator is coupled to one or more transformers. One or more transformers are provided in the current supply system for supplying current to the at least one electromagnetic actuator.
According to another aspect of the present disclosure, a magnetic levitation system for magnetically levitating a ferromagnetic element is provided. The magnetic levitation system comprises at least one electromagnetic actuator, one or more transformers, a current supply system and a signal evaluation unit. At least one electromagnetic actuator is electrically coupled to one or more transformers. One or more transformers are provided in the current supply system. The current supply system is configured for supplying current to the at least one electromagnetic actuator. One or more transformers have a secondary winding. The secondary winding is configured for providing an output signal to a signal evaluation unit. The signal evaluation unit is configured for determining a distance between the at least one electromagnetic actuator and the ferromagnetic element based on the output signal.
According to another aspect of the present disclosure, a substrate processing system is provided. The substrate processing system comprises a magnetic levitation system according to any embodiment of the present disclosure.
According to another aspect of the present disclosure, a method of measuring a distance between at least one electromagnetic actuator and a ferromagnetic element is provided. The method includes measuring an inductance of at least one electromagnetic actuator. The step of measuring inductance includes measuring one or more output signals provided by one or more secondary windings of one or more transformers. One or more transformers are provided in the current supply system for supplying current to the at least one electromagnetic actuator.
According to another aspect of the present disclosure, a method of manufacturing a coated substrate, in particular a coated substrate for manufacturing an electronic device, is provided. The method comprises using a magnetic levitation system according to any embodiment of the present disclosure.
Embodiments are also directed to apparatuses for performing the disclosed methods and including apparatus components for performing the described method aspects. These method aspects may be performed by means of hardware components, a computer programmed by suitable software, any combination of the two or in any other manner. Furthermore, embodiments according to the present disclosure also relate to a method for operating the described device. The method for operating the described apparatus includes method aspects for performing each function of the apparatus.
Drawings
So that the manner in which the above recited features of the present disclosure can be understood in detail, a more particular description of the disclosure, briefly summarized above, may be had by reference to embodiments. The figures relate to embodiments of the present disclosure and are described as follows:
fig. 1 shows a schematic view of a magnetic levitation system according to embodiments described herein;
fig. 2 to 4 show schematic views of a magnetic levitation system according to further embodiments described herein;
fig. 5 shows a schematic view of a substrate processing system according to embodiments described herein;
FIG. 6 shows a flow chart illustrating a method of measuring a distance between at least one electromagnetic actuator and a ferromagnetic element according to embodiments described herein; and
FIG. 7 shows an exemplary test signal S for illustrating embodiments described hereintestAnd an exemplary output signal SoutThe figure (a).
Detailed Description
Reference will now be made in detail to the various embodiments of the disclosure, one or more examples of which are illustrated in the figures. In the following description of the drawings, like reference numerals refer to like parts. Only the differences with respect to the individual embodiments are described. Each example is provided by way of explanation of the disclosure, and is not intended as a limitation of the disclosure. In addition, features illustrated or described as part of one embodiment can be used on or in conjunction with other embodiments to yield yet a further embodiment. It is intended that the present specification include such modifications and variations.
Referring exemplarily to fig. 1, a magnetic levitation system 100 for magnetically levitated ferromagnetic elements 150 according to the present disclosure is described. According to embodiments, which can be combined with other embodiments described herein, the magnetic levitation system 100 comprises at least one electromagnetic actuator 178. Typically, during operation, as indicated in fig. 1, a distance x is provided between the at least one electromagnetic actuator 178 and the ferromagnetic element 150. At least one electromagnetic actuator 178 is coupled to one or more transformers 140. One or more transformers 140 are provided in the current supply system 135, the current supply system 135 being adapted to supply current to at least one electromagnetic actuator 178. Typically, as exemplarily shown in fig. 1, the current supply system 135 includes a power source 131. The power source 131 is configured for providing current to the at least one electromagnetic actuator 178. The arrow I in fig. 1 exemplarily indicates the current flow direction. In addition, fig. 1 shows a coordinate system having a first direction 192, a second direction 194, and a third direction 196. Typically, the first direction 192 is a carrier transport direction, the second direction 194 is a vertical direction, and the third direction 196 may be a direction transverse to the carrier transport direction. Additionally, it will be appreciated that the at least one electromagnetic actuator 178 is electrically coupled with the one or more transformers 140. More specifically, as schematically shown in fig. 1, at least one electromagnetic actuator 178 may be inductively coupled with one or more transformers 140.
Thus, a magnetic levitation system is provided which is improved in measuring the distance between the magnetic bearing actuator and the carrier, in particular between the electromagnetic actuator and the ferromagnetic element (e.g. the ferromagnetic element is connected to or part of the carrier). More specifically, a magnetic levitation system having a self-inductive actuator is provided by providing one or more transformers coupled to at least one electromagnetic actuator. "self-sensing actuator" is understood to mean that no additional separate sensor is required for position or distance measurement. In other words, a magnetic levitation system as described herein has the advantage that information about the distance between the electromagnetic actuator and the ferromagnetic element can be obtained without the need for additional position sensors or distance sensors.
In particular, the magnetic levitation system of the present disclosure is beneficially configured for providing an output signal at one or more transformers coupled to at least one electromagnetic actuator. The output signal may be used to determine the distance between the electromagnetic actuator and a ferromagnetic element, typically connected to the carrier. Thus, an advantage of the magnetic levitation system according to embodiments described herein is that distance measurement is facilitated compared to the prior art. In particular, the magnetic levitation system described herein is advantageously configured to provide an output signal of a transformer that can be more easily processed and evaluated to determine distance and/or position information of a ferromagnetic element relative to an electromagnetic actuator, as compared to conventional methods for distance measurement.
Referring exemplarily to fig. 1, according to embodiments which may be combined with other embodiments described herein, one or more transformers 140 have one or more output signals S for providing the one or more transformers 140outAnd electrical connections 144. Typically, as exemplarily shown in fig. 2, one or more transformers 140 have a primary winding 141 electrically connected to the current supply system 135. In addition, typically, one or more transformers 140 have a secondary winding 142 inductively coupled with the primary winding 141. In particular, as exemplarily shown in fig. 2, the electrical connection 144 is electrically connected with the secondary windings 142 of the one or more transformers 140.
According to embodiments, which can be combined with other embodiments described herein, the at least one electromagnetic actuator 178 is part of the levitation unit 175, as exemplarily described with reference to fig. 4. Typically, as exemplarily shown in fig. 2, the at least one electromagnetic actuator 178 includes a coil 178A and at least one ferromagnetic core 178B. The coil 178A is electrically connected to the current supply system 135.
Upon application of an electrical current to the coil 178A, the at least one electromagnetic actuator 178 generates a magnetic field. The magnetic field generated by the at least one electromagnetic actuator 178 applies a magnetic levitation force to the ferromagnetic element 150 in the second direction 194 such that the carrier 110 to which the ferromagnetic element 150 is attached is levitated.
As exemplarily shown in fig. 2, according to embodiments that may be combined with other embodiments described herein, the current supply system 135 comprises a first line 135A for conducting current from the power source 131 to the at least one electromagnetic actuator 178. In addition, the current supply system 135 comprises a second line 135B for conducting current from the at least one electromagnetic actuator 178 to the power supply 131. One or more transformers 140 are disposed in at least one of the first line 135A and the second line 135B.
Referring exemplarily to fig. 2, according to embodiments that can be combined with other embodiments described herein, the one or more transformers comprise a first transformer 140A and a second transformer 140B. The first transformer 140A has a first primary winding 141A electrically connected to the first line 135A. In addition, the first transformer 140A has a first secondary winding 142A, in particular inductively coupled with the first primary winding 141A. Typically, the first secondary winding 142A is provided for providing a first output signal Sout1And electrical connections 144. The second transformer 140B has a second primary winding 141B electrically connected to the second line 135B. In addition, the second transformer 140B has a second secondary winding 142B, which is in particular inductively coupled to the second primary winding 141B. Typically, the second secondary winding 142B is provided for providing a second output signal Sout2And electrical connections 144.
Referring exemplarily to fig. 3, according to an embodiment, which can be combined with other embodiments described herein, the current supply system 135 further comprises an amplifier 132 and a test signal unit 133. In particular, the test signal unit 133 is configured to transmit the test signal StestAdded to the output of amplifier 132.
According to embodiments, which can be combined with other embodiments described herein, the magnetic levitation system further comprises a signal evaluation unit 145, the signal evaluation unit 145 being configured to acquire or read out the output signal S of the one or more transformers 140out. Typically, as exemplarily shown in fig. 3, the signal evaluation unit 145 is connected to the electrical connection 144. Thus, it will be understood that the signal evaluation unit 145 is typically configured to acquire or read out the first output signal S provided by the first secondary winding 142Aout1And/or to obtain or read out a second output signal provided by second secondary winding 142BSout2。
In particular, it should be understood that the signal evaluation unit 145 is configured for deriving the output signal S from one or more transformers 140outTo determine the distance between the at least one electromagnetic actuator 178 and the ferromagnetic element 150. Typically, the signal evaluation unit 145 comprises an analog-to-digital converter.
According to an example, which can be combined with other embodiments described herein, a magnetic levitation system 100 for magnetically levitated ferromagnetic elements 150 is provided. The magnetic levitation system 100 comprises at least one electromagnetic actuator 178, one or more transformers 140, a current supply system 135 and a signal evaluation unit 145. At least one electromagnetic actuator 178 is electrically coupled to the one or more transformers 140. One or more transformers 140 are provided in the current supply system 135. The current supply system 135 is configured for supplying current to at least one electromagnetic actuator 178. The one or more transformers 140 comprise a transformer configured for providing an output signal S to the signal evaluation unit 145outAnd secondary winding 142. The signal evaluation unit 145 is configured for being based on the output signal SoutTo determine the distance between the at least one electromagnetic actuator 178 and the ferromagnetic element 150.
Fig. 4 shows a magnetic levitation system 100 with a vertically oriented carrier 110. The carrier 110 supports the substrate 120 oriented in a plane defined by a first direction 192 and a second direction 194. The first direction 192 is oriented substantially in the carrier transport direction. The second direction 194 is oriented substantially parallel to the direction of gravity. In particular, the first direction 192 is oriented substantially perpendicular to the second direction 194. However, embodiments described herein are not limited to vertically oriented carriers. Other orientations of the carrier, such as horizontal, may also be provided.
In the present disclosure, the term "substantially parallel" directions may include directions forming a small angle of up to 10 degrees or even up to 15 degrees with each other. The term "substantially perpendicular" directions may include directions that form an angle of less than 90 degrees (e.g., at least 80 degrees or at least 75 degrees) with each other. Similar considerations apply to the concepts of substantially parallel or perpendicular axes, planes, regions, orientations, and the like.
Some embodiments described herein relate to the concept of "vertical orientation". A vertical direction is considered to be a direction parallel or substantially parallel to the direction of extension of the force of gravity. The vertical direction may deviate from exactly vertical (the latter being defined by gravity) by an angle of, for example, up to 15 degrees.
Embodiments described herein may further relate to the concept of "horizontal orientation". The horizontal direction will be understood to be distinguished from the vertical direction. The horizontal direction may be perpendicular or substantially perpendicular to the exact vertical direction defined by gravity.
The magnetic levitation system 100 shown in fig. 4 comprises a carrier 110. The carrier 110 supports the substrate 120. The carrier 110 includes a ferromagnetic element 150, such as a rod of ferromagnetic material. The magnetic levitation system 100 includes a plurality of levitation units 170, the plurality of levitation units 170 including an electromagnetic actuator. In particular, the plurality of levitation units 170 includes a single levitation unit 175, the single levitation unit 175 including at least one electromagnetic actuator 178. The plurality of suspension units 170 extend in a first direction 192. The carrier 110 is movable along a plurality of suspension units 170. The ferromagnetic element 150 and the plurality of suspension units 170 are configured to provide a magnetic levitation force to levitate the carrier 110. The maglev force extends in a second direction 194.
In addition, the magnetic levitation system 100 shown in FIG. 4 includes a magnetic drive structure 180. The magnetic drive structure 180 includes a plurality of magnetic drive units 185. The carrier 110 may include a second ferromagnetic element 160 to interact with the magnetic drive unit 185 of the magnetic drive structure 180. The magnetic drive unit 185 of the magnetic drive structure 180 drives the carrier within the processing system, for example, along a first direction 192. For example, the second ferromagnetic element 160 may include a plurality of permanent magnets arranged in alternating polarity. The generated magnetic field of the second ferromagnetic element 160 may interact with the plurality of magnetic drive units 185 of the magnetic drive structure 180 to move the carrier 110 in the first direction 192 while levitating. Although fig. 4 illustrates an embodiment in which a plurality of levitation units 170 are disposed at the top and magnetic drive structures 180 are disposed at the bottom, it will be appreciated that the levitation units and magnetic drive structures may alternatively be disposed on the same side. For example, both the plurality of suspension units 170 and the magnetic drive structure 180 may be arranged at the bottom or at the top. In other words, the magnetic levitation system 100 may be configured such that the plurality of levitation units 170 and the magnetic drive structure 180 are both disposed above or below the carrier 110 to be transported.
In addition, as exemplarily shown in fig. 4, the magnetic levitation system 100 may include a control unit 130. The control unit 130 may be connected to a plurality of levitation units 170. The control unit 130 may be configured for controlling the magnetic levitation of the carrier 110. The control unit 130 may be configured for controlling the distance between the carrier 110 and the plurality of levitation units 170 during levitation of the carrier 110, e.g. based on the measured distance supplied to the control unit 130 by the signal evaluation unit 145. Thus, it will be understood that the signal evaluation unit 145 may be connected to the control unit 130 or be part of the control unit 130. The magnetic driving structure 180 may drive the carrier 110 under the control of the control unit 130.
Embodiments described herein relate to magnetic levitation and/or transport of a carrier (e.g., a substrate carrier). Thus, the magnetic levitation of the carrier can be contactless. The term "contactless" as used throughout this disclosure may be understood in the following sense: the weight of the carrier is not maintained by mechanical contact or mechanical force, but by magnetic force. In particular, magnetic forces, rather than mechanical forces, may be used to hold the substrate carrier in a suspended or floating state. In some embodiments, there may be no mechanical contact at all between the carrier and the rest of the apparatus during suspension and, for example, movement of the carrier in the vacuum system.
An advantage over mechanical devices for guiding a carrier in a processing system is that the non-contact levitation does not suffer from friction that affects the linearity and/or accuracy of the carrier movement. The non-contact transport of the carrier allows a frictionless movement of the carrier, wherein the position of the carrier, e.g. the position of the carrier relative to the mask in the deposition process, can be controlled and maintained with high accuracy. In addition, levitation allows for rapid acceleration or deceleration of the carrier and/or fine tuning of the carrier velocity.
For example, non-contact suspension or transport of the carrier during the deposition process is beneficial because during transport of the carrier, there are no particles resulting from mechanical contact between the carrier and a section of the apparatus (such as a mechanical rail). Thus, the non-contact magnetic levitation system provides improved purity and uniformity of the layer deposited on the substrate, in particular because particle generation is minimized when non-contact magnetic levitation is used.
The magnetic levitation system can be configured to operate in a vacuum environment. The processing system may include at least one vacuum chamber in which a deposition process is performed on a substrate. The at least one vacuum chamber may comprise one or more vacuum pumps, such as turbo pumps and/or cryogenic pumps, connected to the vacuum chamber to create a vacuum within the vacuum chamber. The magnetic levitation system can be configured to transport substrates into, out of, or through the vacuum chamber.
Magnetic levitation systems can be used to transport vehicles. The carrier may be adapted to carry the substrate, the plurality of substrates and/or the mask. The carrier may be a substrate carrier, e.g. adapted to carry a large area substrate and/or a plurality of large area substrates. Alternatively, the carrier may be a mask carrier, e.g. adapted to carry an edge exclusion mask for preventing the edge of the substrate from being coated in the deposition process.
The carrier according to embodiments described herein is not necessarily limited to a substrate carrier or a mask carrier. The methods described herein are also applicable to other types of carriers, i.e., carriers suitable for carrying objects or devices other than, for example, substrates or masks.
The term "substrate" as used herein encompasses non-flexible substrates (e.g., glass substrates, wafers, slices or glass sheets of transparent crystals such as sapphire, etc.) and flexible substrates such as rolls or foils. According to embodiments, which can be combined with other embodiments described herein, the embodiments described herein can be used for display PVD, i.e. sputter deposition on large area substrates in the display market.
According to an embodiment, the large area substrate or the corresponding carrier may have at least 0.67m2The size of (c). The size may be from about 0.67m2(0.73 m.times.0.92 m, 4.5 th generation) to about 8m2More specifically about 2m2To about 9m2Or even up to 12m2. For example, the large area substrate or carrier may be generation 4.5 (which corresponds to about 0.67 m)2Substrate (0.73m × 0.92m)), generation 5 (which corresponds to about 1.4 m)2Substrate (1.1m × 1.3m)), generation 7.5 (which corresponds to about 4.29 m)2Substrate (1.95m × 2.2m)), generation 8.5 (which corresponds to about 5.7 m)2Substrate (2.2m x 2.5m)) or even generation 10 (which corresponds to about 8.7 m)2Substrate (2.85m × 3.05 m)). Even higher generations, such as 11 th and 12 th generations, and corresponding substrate areas may be similarly achieved.
Referring exemplarily to fig. 5, a substrate processing system 200 according to the present disclosure is described. The substrate processing system 200 comprises a magnetic levitation system 100 according to embodiments described herein. In particular, the substrate processing system may be a vacuum system. Typically, the substrate processing system is configured for depositing one or more layers of, for example, organic materials on the substrate 10.
As exemplarily shown in fig. 5, the substrate processing system 200 typically comprises a vacuum chamber 202 (in particular a vacuum deposition chamber), a carrier 110 as described herein and a magnetic levitation system 100 according to any embodiment described herein. The magnetic levitation system 100 is configured for transporting the carrier 110 in the vacuum chamber 202. In addition, the substrate processing system 200 typically includes one or more material deposition sources 210 in a vacuum deposition chamber. The carrier 110 may be configured to hold the substrate 10 during a deposition process, such as a vacuum deposition process. The substrate processing system 200 can be configured for evaporating materials (e.g., organic materials), particularly for fabricating OLED devices. In another example, the substrate processing system 200 may be configured for chemical vapor deposition CVD or physical vapor deposition PVD, such as sputter deposition. Thus, it will be understood that the embodiments described herein may also be used in the production of semiconductor devices.
In some embodiments, the one or more material deposition sources 210 can be evaporation sources, particularly evaporation sources for depositing one or more organic materials on a substrate to form a layer of an OLED device. Alternatively, the one or more material deposition sources 210 may be CVD or PVD deposition sources.
With exemplary reference to fig. 5, it will be appreciated that the carrier 110 for supporting the substrate 10, for example during a layer deposition process, may be transported along a transport path into and through a vacuum deposition chamber, and in particular through a deposition area. Typically, the transport path is a linear transport path. In addition, it will be understood that the material to be deposited may be emitted from one or more material deposition sources 210 in an emission direction towards a deposition area where the substrate 10 to be coated is located. For example, the one or more material deposition sources 210 may provide a line source having a plurality of openings and/or nozzles arranged in at least one line along the length of the one or more material deposition sources 210. The material to be deposited may be ejected through a plurality of openings and/or nozzles.
As indicated in fig. 5, a further chamber 203, in particular a further vacuum chamber, may be provided adjacent to the vacuum chamber 202, in particular a vacuum deposition chamber. The vacuum chamber 202 may be separated from the adjacent further chamber 203 by a valve having a valve housing 204 and a valve unit 206. After the carrier 110 with the substrate 10 thereon is inserted into the vacuum chamber 202 as indicated by the arrow, the valve unit 206 may be closed. The atmosphere in the vacuum chamber 202 may be individually controlled by generating a technical vacuum, for example with a vacuum pump connected to the vacuum chamber 202.
According to some embodiments, which can be combined with other embodiments described herein, the carrier 110, the substrate 10 and the optional mask 20 are static or dynamic during material deposition. For example, a dynamic deposition process may be provided, for example, for fabricating OLED devices.
In addition, with exemplary reference to fig. 5, it will be understood that substrate processing system 200 typically includes one or more transport paths extending through vacuum chamber 202. The carrier 110 may be configured for transport along one or more transport paths, e.g., past one or more material deposition sources 210. Although one transport path is exemplarily indicated by an arrow in fig. 5, it will be understood that the present disclosure is not limited thereto and two or more transport paths may be provided. For example, at least two transport paths may be arranged substantially parallel to each other for transporting the respective carriers. One or more material deposition sources 210 may be disposed between the two transport paths.
Referring exemplarily to the flowchart shown in fig. 6, a method 300 of measuring a distance X between at least one electromagnetic actuator 178 and a ferromagnetic element 150 according to the present disclosure is described. According to embodiments, which may be combined with other embodiments described herein, the method includes measuring an inductance of the at least one electromagnetic actuator 178 (represented by block 310 in fig. 6). The step of measuring the inductance comprises measuring one or more output signals Sout(represented by block 320 in FIG. 6). The one or more output signals are provided by one or more secondary windings 142 of one or more transformers 140. One or more transformers 140 are located in the current supply system 135 for supplying current to the at least one electromagnetic actuator 178.
According to embodiments, which can be combined with other embodiments described herein, the one or more transformers 140 comprise a first transformer 140A and a second transformer 140B, as exemplarily described with reference to fig. 2. Thus, the step of measuring one or more output signals may comprise measuring a first output signal S provided by the first secondary winding 142A of the first transformer 140Aout1. Additionally, the step of measuring one or more output signals may include measuring a second output signal S provided by a second secondary winding 142B of a second transformer 140Bout2。
According to embodiments, which can be combined with other embodiments described herein, the method further comprises applying the test signal S to the test signal StestTo one or more output signals (represented by block 330 in fig. 6).
It will be appreciated that the features of the magnetic levitation system 100 described with reference to fig. 1 to 6 may also be applied to embodiments of the method of measuring the distance x between the at least one electromagnetic actuator 178 and the ferromagnetic element 150.
FIG. 7 shows a graph illustrating the voltage applied to at least one electromagnetic actuator and the voltage supplied to a transformer as a function of time, where UACTIs a voltage applied to at least one electromagnetic actuator, UTRANSIs the voltage supplied to the transformer and t represents time. U shape1and-U1Representing exemplary values of the voltage supplied to the transformer. E.g. U1May be 30V < U1< 60V, e.g. U148V ± 5V. The solid line in fig. 7 represents the voltage applied to the at least one electromagnetic actuator over time. In addition, FIG. 7 shows an exemplary test signal StestAnd an exemplary voltage U applied to the at least one electromagnetic actuator to provide a force-producing current in the at least one electromagnetic actuatorc. The dotted line represents the slave test signal StestThe first output voltage signal S provided at the first secondary winding 142A is generatedout1. The dotted line represents the slave test signal StestThe second output voltage signal S provided on the second secondary winding 142B is generatedout2. T represents the sampling time, in particular the sampling time of the signal evaluation unit 145.
According to another aspect of the present disclosure, a method of manufacturing a coated substrate is provided. In particular, the coated substrate can be used for the manufacture of electronic devices, in particular optoelectronic devices. A method of manufacturing a coated substrate, in particular an electronic device, comprises using a magnetic levitation system according to any embodiment of the present disclosure. More specifically, a method of manufacturing a coated substrate (particularly an electronic device) may include using a substrate processing system as described herein.
In view of the embodiments of the present disclosure, it will be appreciated that an improved magnetic levitation system, an improved substrate processing system and an improved method of measuring a distance between at least one electromagnetic actuator and a ferromagnetic element are provided compared to the prior art. In particular, embodiments of the present disclosure improve on the possibility of measuring the distance between the electromagnetic actuator and the ferromagnetic element. More specifically, embodiments of the present disclosure provide a system with a self-inductive magnetic bearing, in particular a self-inductive electromagnetic actuator, such that an additional separate sensor for position or distance measurement may be omitted.
With respect to self-induced magnetic bearings, it is noted that it is highly important that the magnetic bearing system can measure the position of a levitated part, such as a shaft of a rotating magnetic bearing system or a carrier of a magnetic levitation system. Typically, a separate position sensor is used to determine the position of the carrier. Providing a separate position sensor results in additional cost and effort. It is noted, however, that a change in the position of the carrier changes the inductance of the electromagnetic actuator of the magnetic bearing. Thus, in theory, the carrier position can be determined by measuring the inductance of the actuator.
Basically, the following relationship exists between the voltage, inductance and current of the actuator: dI/dt ═ U (t)/L, where I is the current of the electromagnetic actuator, U is the voltage to which the electromagnetic actuator is applied, and L is the inductance of the electromagnetic actuator. Thus, the inductance of the actuator can be determined by measuring the voltage and current changes in the electromagnetic actuator. There have been many methods of measuring actuator inductance in the past that either require high bandwidth and high accuracy current measurement and powerful computing platforms, or use modulation/demodulation methods with high frequency test signals, both of which are expensive and have limited performance.
As described herein, embodiments of the present disclosure advantageously include one or more transformers disposed in the current loop of the electromagnetic actuator such that measurement of current changes is greatly simplified. In particular, the measurement of the current variation is simplified, since the transformer is able to provide an output voltage on the secondary side which is proportional to the current variation on the primary side. Thus, in contrast to conventional methods, high speed current measurements and curve fitting are no longer required to determine dI/dt in the embodiments described herein. In addition, it is noted that by adding a transformer to the positive and negative paths of the electromagnetic actuator (as exemplarily described with reference to fig. 2), and by adding the output signal Sout1And Sout2(output voltage) the static offset in the current can be removed to obtain a better signal.
Accordingly, embodiments of the present disclosure have the advantage of facilitating the provision of distance measurements compared to the prior art. In particular, embodiments of the present disclosure are advantageously configured for providing output signals that can be more easily processed and evaluated to determine distance and/or position information of the ferromagnetic element relative to the electromagnetic actuator.
In other words, embodiments as described herein provide a magnetic levitation system having a self-inductive magnetic bearing configured for measuring a distance between an electromagnetic actuator and a carrier. Thus, the magnetic levitation system can operate without a separate position sensor. In particular, according to an embodiment of the present disclosure, the electromagnetic actuator is used for determining the carrier position, i.e. the distance between the electromagnetic actuator and the ferromagnetic element of the carrier. Typically, the magnetic levitation system is a linear magnetic levitation system for carrier transport. The carrier may be a substrate carrier configured for carrying one or more substrates. Alternatively, the carrier may be a mask carrier configured for carrying one or more masks.
As described herein, a transformer is added to the current loop of the electromagnetic actuator. In addition, a test signal of a specific shape may be added to the output voltage of the power amplifier. The output signal of the transformer can be fed into a circuit for signal conditioning. The output signal may be evaluated by a software algorithm to determine the carrier position, i.e. the distance between the carrier and the electromagnetic actuator.
It is therefore an advantage of embodiments of the present disclosure that the need for a separate position sensor for controlling a magnetic levitation system is removed. Accordingly, embodiments of the present disclosure advantageously provide for savings in installation space, wiring work, and cost. Furthermore, there is no need to mount the electronics, in particular the sensors, for example in the vacuum housing of a magnetic levitation system.
In addition, an advantage of embodiments of the present disclosure is that a specific test signal may be added to the output voltage of the amplifier, in particular as described herein, enabling a simpler determination of the carrier position than by a direct measurement of the current. It will therefore be appreciated that embodiments of the present disclosure provide for utilizing a transformer in the current loop of an electromagnetic actuator in combination with specific test signals and signal conditions in order to measure carrier position, in particular in the vertical direction. Advantageously, for the embodiments described herein, the test signal may be simple, such that demodulation is not required.
For conventional methods of position detection using electromagnetic actuators, ultra-fast and high-resolution current measurements are used. In addition, a complex, model-based observer is typically required to determine position information from the magnetic bearing actuators from high bandwidth and high resolution current measurements. In contrast, embodiments as described herein provide a simpler and robust method for determining the position of a carrier.
This written description uses examples to disclose the disclosure, including the best mode, and also to enable any person skilled in the art to practice the described subject matter, including making and using any devices or systems and performing any incorporated methods. Although various specific embodiments have been disclosed in the foregoing, the non-mutually exclusive features of the embodiments described above may be combined with each other. The scope of patent protection is defined by the claims, and other examples are intended to fall within the scope of the claims, provided they have structural elements that do not differ from the literal language of the claims, or provided they include equivalent structures with insubstantial differences from the literal language of the claims.
While the foregoing is directed to embodiments, other and further embodiments may be devised without departing from the basic scope thereof, and the scope thereof is determined by the claims that follow.

Claims (15)

1. A magnetic levitation system (100) for magnetically levitated ferromagnetic elements (150), the magnetic levitation system comprising at least one electromagnetic actuator (178), the at least one electromagnetic actuator (178) being coupled with one or more transformers (140) arranged in a current supply system (135), the current supply system (135) being adapted to supply current to the at least one electromagnetic actuator (178).
2. The magnetic levitation system (100) as claimed in claim 1, the one or more transformers (140) having electrical connections (144) for providing one or more output signals of the one or more transformers (140).
3. The magnetic levitation system (100) as recited in claim 2, the one or more transformers (140) having a primary winding (141) electrically connected to the current supply system (135) and a secondary winding (142) inductively coupled with the primary winding (141), the electrical connection (144) being electrically connected with the secondary winding (142).
4. The magnetic levitation system (100) as recited in any one of claims 1 to 3, the at least one electromagnetic actuator (178) comprising a coil (178A) and at least one ferromagnetic core (178B), the coil (178A) being electrically connected with the current supply system (135).
5. The magnetic levitation system (100) as claimed in any of claims 1 to 4, the current supply system (135) comprising a first line (135A) for conducting current from a power supply (131) to the at least one electromagnetic actuator (178) and a second line (135B) for conducting current from the at least one electromagnetic actuator (178) to the power supply (131), the one or more transformers (140) being provided in at least one of the first line (135A) and the second line (135B).
6. The magnetic levitation system (100) as recited in claim 5, the one or more transformers (140) comprising a first transformer (140A) and a second transformer (140B), the first transformer (140A) having a first primary winding (141A) electrically connected with the first track (135A), and the second transformer (140B) having a second primary winding (141B) electrically connected with the second track (135B).
7. The magnetic levitation system (100) as claimed in any of claims 1 to 6, the current supply system (135) further comprising an amplifier (132) and a test signal unit (133), the test signal unit (133) being configured for adding a test signal to an output of the amplifier (132).
8. The magnetic levitation system (100) as claimed in any of claims 2 to 7, further comprising a signal evaluation unit (145) connected to the electrical connection (144), the signal evaluation unit (145) being configured for determining a distance between the at least one electromagnetic actuator (178) and the ferromagnetic element (150) from the one or more output signals of the one or more transformers (140).
9. The magnetic levitation system (100) as recited in claim 8, the signal evaluation unit (145) comprising an analog-to-digital converter.
10. Magnetic levitation system (100) for magnetically levitated ferromagnetic elements (150), comprising:
-at least one electromagnetic actuator (178);
-one or more transformers (140);
-a current supply system (135); and
a signal evaluation unit (145),
the at least one electromagnetic actuator (178) is electrically coupled with the one or more transformers (140) arranged in the current supply system (135), the current supply system (135) being configured for supplying an electrical current to the at least one electromagnetic actuator (178), the one or more transformers (140) having a secondary winding (142) configured for providing an output signal to the signal evaluation unit (145), the signal evaluation unit (145) being configured for determining a distance between the at least one electromagnetic actuator (178) and the ferromagnetic element (150) based on the output signal.
11. A substrate processing system (200) comprising a magnetic levitation system as claimed in any one of claims 1 to 10.
12. A method of measuring a distance between at least one electromagnetic actuator (178) and a ferromagnetic element (150), the method comprising measuring an inductance of the at least one electromagnetic actuator (178), wherein the step of measuring the inductance comprises measuring one or more output signals provided by one or more secondary windings (142) of one or more transformers (140) arranged in a current supply system (135), the current supply system (135) being for supplying a current to the at least one electromagnetic actuator (178).
13. The method of claim 12, the one or more transformers (140) comprising a first transformer (140A) and a second transformer (140B), and wherein measuring the one or more output signals comprises measuring a first output signal provided by a first secondary winding (142A) of the first transformer (140A) and measuring a second output signal provided by a second secondary winding (142A) of the second transformer (140B).
14. The method of claim 12 or 13, further comprising: adding a test signal to the one or more output signals.
15. Method of manufacturing a coated substrate, in particular for manufacturing an electronic device, comprising the use of a magnetic levitation system according to any of claims 1 to 10.
CN201980094622.6A 2019-03-27 2019-03-27 Magnetic levitation system and method for measuring the distance between at least one electromagnetic actuator and a ferromagnetic element Pending CN113678238A (en)

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