CN113651920B - Composition based on acrylic liquid crystal photosensitive resin and its application in 405nm 3D printing - Google Patents

Abstract

The invention discloses a composition based on acrylic liquid crystal photosensitive resin and its application in 405nm 3D printing. By weight, it includes 10-70 parts of acrylic liquid crystal photosensitive resin, 10-70 parts of polyurethane acrylate resin, 0-25 parts of polyethylene glycol dimethacrylate resin, 0-25 parts of alkoxylated acrylate, 0~25 parts of thinner, 0.1~10 parts of photoinitiator, 0~5 parts of defoamer, 0~5 parts of leveling agent and 0~5 parts of antioxidant. The composition based on acrylic liquid crystal photosensitive resin can be used for 405nm 3D printing, and has the ability to print complex structures; while retaining the characteristics of acrylic liquid crystal photosensitive resin, the printed product has excellent heat resistance and good mechanical properties, and can be widely used in Fine electronic devices, aerospace and other fields.

Description

Composition based on acrylic liquid crystal photosensitive resin and its application in 405nm 3D printing

Technical Field

The present invention relates to photosensitive resin processing and application fields, and in particular to a composition based on acrylic liquid crystal photosensitive resin and application thereof in 405nm 3D printing.

Background Art

In recent years, 3D printing technology is in a stage of rapid development, attracting more and more researchers. Compared with traditional manufacturing methods, 3D printing does not require the use of molds, which can effectively reduce the production cycle and cost of industrial products. With the development of 3D printing technology, it has been more widely used in aerospace technology, medical engineering, construction industry and electronic manufacturing. Among various types of 3D printing technologies, stereolithography (SLA) stands out due to its many advantages such as short curing time, high printing accuracy and energy saving and environmental protection. In addition, the printed products have excellent performance in hardness, chemical resistance and wear resistance.

With the rapid development of 3D printing technology, higher requirements are placed on the quality of photocurable 3D printed products. Photosensitive resins, as raw materials for SLA technology, mainly include epoxy resins, acrylic resins and polyester resins; these materials can print products with complex structures such as jewelry, surgical stents, and hand-made models, but most of these products cannot be used in fields such as aviation, aerospace, and automobiles. These fields have high requirements for the thermal stability and mechanical properties of products, which greatly limits the further development of SLA technology. Therefore, the development of new high-performance photosensitive materials for photocurable 3D printing is of great significance to both academic and industrial fields.

Liquid crystal resins have always attracted the attention of scientists due to their advantages such as the orderliness of their orientation. After years of development, their application in 3D printing has also achieved certain results. Liquid crystal elastomers (LCEs) are soft multifunctional materials that combine the anisotropic order of liquid crystal molecules with the entropic elasticity of lightly cross-linked polymer networks. LCEs have special mechanical properties such as high energy dissipation, soft elasticity, programmable anisotropy and negative Poisson's ratio. At present, researchers have used click chemistry and ink direct writing technology to manufacture LCEs devices. However, there have been no reports on liquid crystal photosensitive resins used for stereolithography (SLA) 3D printing.

Liquid crystal materials have excellent optical, electrical and mechanical properties due to their unique molecular shape and chemical structure. Acrylic liquid crystal resin can be cured by thermal curing under the conditions of initiator initiation or thermal initiation. However, due to the limitations of the initiation system and temperature, thermosetting acrylic liquid crystal resins generally use photopolymerization. When photopolymerization is used, the polymerization temperature can be arbitrarily selected within the liquidus temperature range, and the orientation and polymerization processes can be completely independent, that is, the liquid crystal resin can be fully oriented before polymerization. However, this method is more suitable for the preparation of thin films and is not suitable for thicker parts.

Stereolithography (SLA) technology can cure liquid crystal resin layer by layer through laser to quickly obtain three-dimensional structural parts of any shape. This technology has overcome the limitations of photocuring on the thickness and shape of the parts. If the liquid crystal properties of liquid crystal resin can be retained and applied to 3D printing, the mechanical properties of the product will inevitably be improved to a certain extent. Therefore, a new type of liquid crystal photosensitive resin has been developed, and its application in 3D printing will be very potential.

Therefore, based on this idea, a photosensitive resin composition for 405nm photocuring 3D printing based on acrylic liquid crystal resin was developed, which not only broadened the application of acrylic liquid crystal resin and solved its disadvantage of poor formability; but also obtained a new type of high-performance photosensitive resin composition, which is conducive to the popularization and promotion of 405nm photocuring 3D printing technology.

Summary of the invention

In view of the situation and shortcomings of the prior art, the object of the present invention is to provide a composition based on acrylic liquid crystal photosensitive resin with excellent thermal stability and mechanical properties and its application in 405nm 3D printing.

In order to achieve the above technical objectives, the technical solution adopted by the present invention is:

A composition based on acrylic liquid crystal photosensitive resin, the raw materials of which are as follows by weight:

Preferably, the synthesis path of the acrylic liquid crystal photosensitive resin is shown in FIG1 , and the synthesis steps include:

(1) 10 parts by mole of a compound containing a mesogenic unit and having -OH at the end, 50 to 500 parts by mole of epichlorohydrin (EHC) and 0.1 to 1.0 parts by mole of catalyst 1 are mixed as raw materials, _N2 is introduced for protection, and then reacted at 40 to 100°C for 5 to 24 hours to obtain a solution A;

(2) Slowly drop 20 to 50 parts of NaOH solution (concentration 30% to 60%) into solution A on a molar basis, remove the water generated by the reaction by vacuum pump, continue the reaction for 0.1 to 4 hours, pour the product into a separatory funnel, filter to remove NaCl, and remove excess EHC from the filtrate by rotary evaporator to obtain solution B;

(3) Solution B is mixed with methanol/acetone solution (ratio 1.0:0.1 to 1.0:10), placed in a refrigerator for cooling and crystallization, the obtained crystals are washed with methanol and filtered, and the product is dried in an oven at 60 to 100° C. to obtain a milky white solid, which is liquid crystal epoxy resin C;

(4) On a molar basis, 10 parts of liquid crystal epoxy resin C and 0.1-1.0 parts of polymerization inhibitor are added to a flask, and the reaction temperature is set to 90-150° C. After the epoxy resin C is completely melted, 20-25 parts of acrylic acid are slowly added dropwise, and 0.01-0.1 parts of catalyst 2 are added dropwise. The reaction is carried out for 0.5-5.0 hours, and then cooled to obtain a light yellow viscous resin, namely the acrylic liquid crystal photosensitive resin. The synthesis route is as follows:

Wherein, the compound containing mesogens and having -OH at the end is one or a combination of 4-hydroxyphenyl 4-hydroxybenzoate, 4,4'-biphenol, 3,3',5,5'-tetramethylbiphenol, 4-((4-hydroxyphenoxy)carbonyl)phenyl 4-hydroxybenzoate, 2,3-bis(4-hydroxyphenyl)acrylonitrile and 4,4'-propylenebisphenol, etc.; the catalyst 1 in step (1) is tetramethylammonium chloride, tetrabutylammonium bromide, tetrabutylammonium chloride, tetraethylammonium bromide, tetrabutylammonium hydrogen sulfate, benzyltriethylammonium chloride , trioctylmethylammonium chloride, dodecyltrimethylammonium chloride or tetradecyltrimethylammonium chloride or the like or a combination thereof; the polymerization inhibitor described in step (4) is one or a combination of hydroquinone, benzoquinone, methylhydroquinone, p-hydroxyanisole, 2-tert-butylhydroquinone, 2,5-di-tert-butylhydroquinone; the catalyst 2 described in step (4) is one or a combination of N,N-diethylaniline, N,N-dimethyl-p-toluidine, N,N-dimethylbenzylamine, N,N-dimethylcyclohexylamine, N,N'-lutidine, N,N'-diethylpiperazine or the like or a combination thereof.

Preferably, the polyurethane acrylate resin is selected from at least one of aliphatic polyurethane acrylate oligomers, aromatic polyurethane acrylate oligomers, polyurethane diacrylate, and dimethacrylate urethane resin.

Preferably, the degree of polymerization of the polyethylene glycol dimethacrylate resin is 1-200.

Preferably, the alkoxylated acrylate monomer is selected from at least one of propoxylated glycerol triacrylate and ethoxylated pentaerythritol tetraacrylate.

Preferably, the diluent is selected from at least one of styrene, acrylate diluents, hydroxyacrylate diluents, vinyl ether diluents, and cyclohexane diluents; the acrylate diluent is selected from at least one of methyl methacrylate, 1,6-hexanediol diacrylate, isobornyl acrylate, tetrahydrofuran acrylate, tripropylene glycol diacrylate, hexanediol diacrylate, bisphenol A diacrylate, trimethylolpropane triacrylate, pentaerythritol acrylate, isobornyl acrylate, and cyclotrimethylolpropane formal acrylate; the hydroxyacrylate diluent is selected from at least one of hydroxyethyl methacrylate, hydroxypropyl methacrylate, and hydroxyethyl acrylate; the vinyl ether diluent is selected from at least one of 4-hydroxybutyl vinyl ether and diethylene glycol divinyl ether; the cyclohexane diluent is selected from at least one of 4-vinyl epoxycyclohexane and 4-vinyl epoxycyclohexane.

Preferably, the photoinitiator is diphenyl-(4-phenylthio)phenylsulfonium hexafluoroantimonate, diphenyl-(4-phenylthio)phenylsulfonium hexafluorophosphate, 4-octyloxydiphenyliodonium hexafluoroantimonate, bis(4-tert-butylphenyl)iodonium hexafluorophosphate, diphenyliodonium hexafluorophosphate, 4-isopropyl-4'-methyldiphenyliodonium tetrakis(pentafluorophenyl)borate, triphenylsulfonium tetrafluoroborate, tri-p-tolylsulfonium hexafluorophosphate, 1-hydroxy-cyclohexyl-acetophenone, α, At least one of α-dimethyl-α-hydroxyacetophenone, p-isopropylphenyl-2-hydroxydimethylacetone-1, benzophenone, chlorinated benzophenone, acrylated benzophenone, 4-phenylbenzophenone, 2-chlorothioxanthone, isopropylthioxanthone, 2-hydroxy-2-methyl-1-phenyl-1-propanone, dimethylthioxanthone, diethylthioxanthone, dichlorothioxanthone, and 2-phenylbenzyl-2-dimethylamine-1-(4-morpholinobenzylphenyl)butanone.

Preferably, the defoaming agent is selected from at least one of silicone defoaming agents, mineral oil defoaming agents, polyether defoaming agents, and fatty alcohol defoaming agents.

Preferably, the leveling agent is selected from at least one of acrylic leveling agents, silicone leveling agents, and fluorocarbon leveling agents.

Preferably, the antioxidant is selected from at least one of pentaerythritol tetrakis(3,5-di-tert-butyl-4-hydroxy)phenylpropionate, tris(2,4-di-tert-butyl)phenyl phosphite, N,N′-bis-(3-(3,5-di-tert-butyl-4-hydroxyphenyl)propionyl)hexanediamine and 2,6-di-tert-butyl-4-methylphenol.

Preferably, the application of the acrylic liquid crystal photosensitive resin composition is to use the liquid crystal epoxy photosensitive resin composition for 405nm light curing 3D printing to obtain a molded part. The obtained molded part is subjected to ultraviolet light post-treatment, the ultraviolet light intensity is 100W/ ^cm2 , and the ultraviolet light curing time is 0 to 10 minutes.

By adopting the above technical scheme, the present invention has the following beneficial effects compared with the prior art: the present invention introduces acrylic liquid crystal photosensitive resin into the photosensitive resin composition, which can retain the characteristics of acrylic liquid crystal photosensitive resin, and the printed products have excellent mechanical properties and thermal stability, so that they can be widely used in electronic devices, aerospace and other fields. At the same time, the acrylic liquid crystal photosensitive resin composition for 3D printing provided by the present invention has good printability, has the ability to print complex structures, and has low preparation cost, which effectively reduces the price of 405nm 3D printing resin and lays the foundation for the large-scale application of 405nm 3D printing technology.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a synthetic route of the acrylic liquid crystal photosensitive resin involved in the present invention.

FIG. 2 is a POM diagram of the composition based on acrylic liquid crystal photosensitive resin prepared in Example 1 of the present invention.

FIG3 is a model printed by a 405 nm 3D printer of the composition based on acrylic liquid crystal photosensitive resin prepared in Example 1 of the present invention.

4 is a stress-strain curve of a tensile test of a sample strip printed by a 405 nm 3D printer for a composition based on acrylic liquid crystal photosensitive resin prepared in Example 1 of the present invention and a comparative example.

5 is a stress-strain curve of a strip bending test of a composition based on acrylic liquid crystal photosensitive resin prepared in Example 1 of the present invention and a comparative example printed by a 405 nm 3D printer.

FIG6 is a dynamic mechanical property test curve of the composition based on acrylic liquid crystal photosensitive resin prepared in Example 1 of the present invention and the sample printed by the comparative example on a 405nm 3D printer.

DETAILED DESCRIPTION

The present invention is further described below in conjunction with specific embodiments:

Acrylic liquid crystal photosensitive resin:

4-Hydroxyphenyl 4-hydroxybenzoate-based acrylic liquid crystal photosensitive resin, abbreviated as A-1;

4,4′-biphenyldiphenol-based acrylic liquid crystal photosensitive resin, abbreviated as A-2;

Polyurethane acrylate resin:

Aliphatic polyurethane acrylate 1: purchased from Sartomer, product number CN9010, abbreviated as B-1;

Aliphatic polyurethane acrylate 2: purchased from Sartomer, product number CN991, abbreviated as B-2;

Polyethylene glycol dimethacrylate resin:

Polyethylene glycol dimethacrylate resin 1: purchased from Sartomer, product number SR210, abbreviated as C-1;

Polyethylene glycol dimethacrylate resin 2: purchased from Sartomer, product number SR211, abbreviated as C-2;

Alkoxylated acrylates:

Ethoxylated pentaerythritol tetraacrylate, purchased from Sartomer, product number SR494, abbreviated as D-1;

Propylene glycol triacrylate, purchased from Sartomer, product number SR9020, abbreviated as D-2;

Thinner:

Cyclotrimethylolpropane formal acrylate: purchased from Sartomer, product number SR351, abbreviated as E-1;

Hydroxypropyl methacrylate: purchased from Aladdin Reagent (Shanghai) Co., Ltd., abbreviated as E-2;

Hydroxyethyl methacrylate: purchased from Aladdin Reagent (Shanghai) Co., Ltd., abbreviated as E-3;

Photoinitiator:

2,4,6-(trimethylbenzoyl)diphenylphosphine oxide, purchased from Aladdin Reagent (Shanghai) Co., Ltd., product number photoinitiator TPO, abbreviated as F-1;

Phenylbis(2,4,6-trimethylbenzoyl)phosphine oxide: purchased from Aladdin Reagent (Shanghai) Co., Ltd., product number photoinitiator XBPO, abbreviated as F-2;

1-Hydroxy-cyclohexyl-acetophenone: purchased from Aladdin Reagent (Shanghai) Co., Ltd., product number photoinitiator 184, abbreviated as F-3;

Defoaming agent:

Silicone defoamer: purchased from BYK Chemical Company of Germany, product number BYK-088, abbreviated as G-1;

Polyether defoamer: purchased from Guangdong Zhonglian Fine Chemical Co., Ltd., product number B-299, abbreviated as G-2;

Leveling agent:

Silicone leveling agent: purchased from Anhui Jiazhi Xinnuo Chemical Co., Ltd., product number WE-D5510, abbreviated as H-1;

Polyacrylic acid leveling agent: purchased from Anhui Jiazhi Xinnuo Chemical Co., Ltd., product number WE-D819, abbreviated as H-2;

Antioxidants:

2,6-di-tert-butyl-4-methylphenol: purchased from Aladdin Reagent (Shanghai) Co., Ltd., product number antioxidant BHT, abbreviated as I-1;

Pentaerythritol tetrakis(3,5-di-tert-butyl-4-hydroxy)phenylpropionate: purchased from Guangzhou Kaiyin Chemical Co., Ltd., antioxidant 1010, abbreviated as I-2.

Example 1-8 (i.e., preparation of sample 1# to sample 8#)

The preparation steps are as follows: mix appropriate amounts of acrylic liquid crystal photosensitive resin, polyurethane acrylate resin, polyethylene glycol dimethacrylate resin, alkoxylated acrylate, diluent, defoamer, leveling agent, and antioxidant, and heat to 30-80° C., stir and mix evenly, add a photoinitiator after cooling, and stir until uniform to obtain a yellow viscous liquid, which is the composition sample based on acrylic liquid crystal photosensitive resin described in the present application.

The relationship between the sample number and the type and ratio of each component is shown in Table 1.

Table 1

The prepared acrylic liquid crystal photosensitive resin composition was poured into the Form2 3D printer produced by Formlabs, USA, and formed by computer modeling, composition and printing. The obtained product was subjected to UV curing and thermal curing treatment; the UV light intensity was 100W/ ^cm2 , and the UV curing time was 2min.

For the products prepared in the above examples, the photosensitive resin composition was evaluated by observing the appearance of the finished products after curing. The results are shown in Table 2.

Table 2

See Figure 2, which is a POM diagram of the composition based on acrylic liquid crystal photosensitive resin prepared in Example 1 of the present invention. From the figure, it can be seen that as the temperature rises, the polarized light microscope diagram of acrylic liquid crystal photosensitive resin observed at room temperature can be seen, and obvious stripe texture and texture texture can be observed, which is a typical nematic liquid crystal texture. This further proves that acrylic liquid crystal photosensitive resin can exhibit liquid crystal properties at room temperature.

Referring to FIG3 , it is a model printed by a 405nm 3D printer of the composition based on acrylic liquid crystal photosensitive resin prepared in Example 1 of the present invention.

See Figures 4 and 5, which are stress-strain curves of the composition based on acrylic liquid crystal photosensitive resin prepared in Example 1 of the present invention and the comparative example in the 405nm 3D printer for the tensile test and bending test of the sample. It can be seen that the tensile strength of the composition based on acrylic liquid crystal photosensitive resin prepared in Example 1 is 61.7MPa, the elongation at break is 17.5%, and the bending strength is 91.3MPa, which are all better than the comparative example, showing that it has excellent mechanical properties.

See Figure 6, which is a dynamic mechanical properties test curve of the composition based on acrylic liquid crystal photosensitive resin prepared in Example 1 of the present invention and the comparative example printed out by a 405nm 3D printer. It can be seen that the storage modulus of the composition based on acrylic liquid crystal photosensitive resin prepared in Example 1 is 2230MPa and the glass transition temperature is 89.8°C, which are better than the comparative example, indicating that it has excellent thermal stability.

The above are only a few embodiments of the present application and do not constitute any form of limitation to the present application. Although the present application is disclosed as above with preferred embodiments, it is not intended to limit the present application. Any technician familiar with the profession, without departing from the scope of the technical solution of the present application, using the technical content disclosed above to make slight changes or modifications are equivalent to equivalent implementation cases and fall within the scope of the technical solution.

Claims (9)

1. a composition based on acrylic liquid crystal photosensitive resin, is characterized in that: by weight, its raw material is as follows: Acrylic liquid crystal photosensitive resin 10~70 parts Polyurethane acrylate resin 10~70 parts Polyethylene glycol dimethacrylate resin 0~25 parts Alkoxylated acrylate 0~25 parts Thinner 0~25 parts Photoinitiator 0.1~10 parts Defoamer 0~5 parts Leveling agent 0~5 parts Antioxidant 0~5 parts; The preparation method of described acrylic liquid crystal photosensitive resin is: (1) Mix the compound containing mesogen with -OH at the end, epichlorohydrin and catalyst 1 as raw materials, pass through N ₂ protection, and then react at 40-100°C for 5-24 hours, Obtain solution A; (2) Then slowly drop NaOH solution into solution A, and remove the water generated by the reaction under reduced pressure with a vacuum pump. After continuing the reaction for 0.1 to 4 hours, pour the product into a separatory funnel, filter to remove NaCl, and use a rotary evaporator to obtain the filtrate Remove excess epichlorohydrin to obtain solution B; (3) Mix solution B with methanol/acetone solution, cool down and crystallize, wash the obtained crystals with methanol and suction filter, dry the product to obtain liquid crystal epoxy resin C; (4) Add liquid crystal epoxy resin C and polymerization inhibitor into the flask, and set the reaction temperature at 90~150°C. After the epoxy resin C is completely melted, slowly add acrylic acid and catalyst 2 dropwise, and the reaction is 0.5~5.0 Hour, after cooling, obtain acrylic liquid crystal photosensitive resin; Wherein, the compound containing mesogen and having -OH at the end is 4-hydroxyphenyl 4-hydroxybenzoate, 4,4'-biphenol, 3,3',5, 5'-Tetramethylbiphenol, 4-((4-hydroxyphenoxy)carbonyl)phenyl 4-hydroxybenzoate, 2,3-bis(4-hydroxyphenyl)acrylonitrile and 4 , one or a combination of 4'-propylene bisphenols; the catalyst 1 described in step (1) is tetramethylammonium chloride, tetrabutylammonium bromide, tetrabutylammonium chloride, tetraethylammonium ammonium bromide, tetrabutylammonium bisulfate, benzyltriethylammonium chloride, trioctylmethylammonium chloride, dodecyltrimethylammonium chloride or tetradecyltrimethylammonium chloride One or a combination of ammonium; the polymerization inhibitor described in step (4) is hydroquinone, benzoquinone, methylhydroquinone, p-hydroxyanisole, 2-tert-butylhydroquinone, 2 , one or a combination of 5-di-tert-butylhydroquinone; the catalyst 2 described in step (4) is N,N-diethylaniline, N,N-dimethyl-p-toluidine, N , one or a combination of N-dimethylbenzylamine, N,N-dimethylcyclohexylamine, N,N'-lutidine, N,N'-diethylpiperazine. 2. a kind of composition based on acrylic liquid crystal photosensitive resin according to claim 1, is characterized in that: described urethane acrylate resin is selected from aliphatic urethane acrylate oligomer, aromatic urethane acrylate oligomer , at least one of polyurethane diacrylate and dimethacrylate urethane resin. 3 . The composition based on acrylic liquid crystal photosensitive resin according to claim 1 , wherein the degree of polymerization of the polyethylene glycol dimethacrylate resin is 1-200. 4 . 4. a kind of composition based on acrylic liquid crystal photosensitive resin according to claim 1, is characterized in that: described alkoxylated acrylate monomer is selected from propoxylated glycerol triacrylate, ethoxylated pentaerythritol tetraacrylate at least one of . 5. a kind of composition based on acrylic liquid crystal photosensitive resin according to claim 1, is characterized in that: described diluent is selected from styrene, acrylic ester diluent, acrylate hydroxy ester diluent, vinyl ether At least one of class diluents, cyclohexane diluents; the acrylate diluents are selected from methyl methacrylate, 1,6-hexanediol diacrylate, isobornyl acrylate, tetrahydrofuran acrylic acid Tripropylene glycol diacrylate, hexanediol diacrylate, bisphenol A diacrylate, trimethylolpropane triacrylate, pentaerythritol acrylate, isobornyl acrylate, cyclotrimethylolpropane methylate At least one of aldehyde acrylates; the hydroxyacrylate diluent is selected from at least one of hydroxyethyl methacrylate, hydroxypropyl methacrylate, and hydroxyethyl acrylate; the vinyl ether diluent The agent is selected from at least one of 4-hydroxybutyl vinyl ether and diethylene glycol divinyl ether; the cyclohexane diluent is 4-vinyl epoxy cyclohexane. 6. a kind of composition based on acrylic liquid crystal photosensitive resin according to claim 1, is characterized in that: described photoinitiator is diphenyl-(4-phenylsulfur) phenylsulfonium hexafluoroantimonate, Diphenyl-(4-phenylthio)phenylsulfonium hexafluorophosphate, 4-octyloxydiphenyliodide hexafluoroantimonate, bis(4-tert-butylphenyl)iodonium hexafluorophosphate, di Phenyliodonium hexafluorophosphate, 4-isopropyl-4'-methyldiphenyliodonium tetrakis(pentafluorophenyl)borate, triphenylsulfonium tetrafluoroborate, tri-p-cresyl Sulfonium hexafluorophosphate, 1-hydroxy-cyclohexyl-acetophenone, α,α-dimethyl-α-hydroxyacetophenone, p-cymenyl-2-hydroxydimethylacetone-1, di Benzophenone, chlorinated benzophenone, acrylated benzophenone, 4-phenylbenzophenone, 2-chlorothioxanthone, isopropylthioxanthone, 2-hydroxy-2 -Methyl-1-phenyl-1-propanone, dimethylthioxanthone, diethylthioxanthone, dichlorothioxanthone, 2-phenylbenzyl-2-dimethylamine-1 - at least one of (4-morpholinebenzylphenyl) butanone. 7. a kind of composition based on acrylic liquid crystal photosensitive resin according to claim 1, is characterized in that: described defoamer is selected from organosilicon defoamer, mineral oil defoamer, polyether defoamer At least one of agent, fatty alcohol defoamer; The leveling agent is selected from at least one of acrylic leveling agents, silicone leveling agents, and fluorocarbon leveling agents; The antioxidant is selected from tetrakis(3,5-di-tert-butyl-4-hydroxy)pentaerythritol phenylpropionate, tris(2,4-di-tert-butyl)phenyl phosphite, N,N'-bis -at least one of (3-(3,5-di-tert-butyl-4-hydroxyphenyl)propionyl)hexamethylenediamine and 2,6-di-tert-butyl-4-methylphenol. 8. The preparation method of the composition based on acrylic liquid crystal photosensitive resin as described in one of claims 1 to 7, it is characterized in that acrylic liquid crystal photosensitive resin, polyurethane acrylate resin, polyethylene glycol dimethacrylate Resin, alkoxylated acrylate, diluent, defoamer, leveling agent, and antioxidant are mixed and heated to 30-80°C, stirred and mixed evenly, after cooling, photoinitiator is added, and stirred until uniform, to obtain acrylic liquid crystal photosensitive resin composition. 9. The application of a composition based on acrylic liquid crystal photosensitive resin as claimed in any one of claims 1 to 7, characterized in that: the composition based on acrylic liquid crystal photosensitive resin is used for 405nm photocuring 3D printing to obtain molded parts, The obtained molding is subjected to post-treatment with ultraviolet light, the light intensity of ultraviolet light is 100 W/cm ² , and the curing time of ultraviolet light is 0-10 minutes.

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