CN113452347B - Signal fuzzy control filter for wafer detection device - Google Patents
Signal fuzzy control filter for wafer detection device Download PDFInfo
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- CN113452347B CN113452347B CN202110529855.3A CN202110529855A CN113452347B CN 113452347 B CN113452347 B CN 113452347B CN 202110529855 A CN202110529855 A CN 202110529855A CN 113452347 B CN113452347 B CN 113452347B
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- 238000001514 detection method Methods 0.000 title claims abstract description 54
- 235000012431 wafers Nutrition 0.000 claims abstract description 252
- 238000000034 method Methods 0.000 claims abstract description 36
- 230000008569 process Effects 0.000 claims abstract description 29
- 238000012545 processing Methods 0.000 claims abstract description 20
- 238000004519 manufacturing process Methods 0.000 claims abstract description 10
- 230000001681 protective effect Effects 0.000 claims description 25
- 238000007689 inspection Methods 0.000 claims description 9
- 239000000498 cooling water Substances 0.000 claims description 6
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 5
- 229910052802 copper Inorganic materials 0.000 claims description 5
- 239000010949 copper Substances 0.000 claims description 5
- 230000009471 action Effects 0.000 claims description 4
- 238000003860 storage Methods 0.000 claims description 4
- 230000000694 effects Effects 0.000 abstract description 28
- 238000012216 screening Methods 0.000 abstract description 6
- 238000004140 cleaning Methods 0.000 abstract description 3
- 230000008054 signal transmission Effects 0.000 description 8
- 230000008859 change Effects 0.000 description 6
- 238000001914 filtration Methods 0.000 description 6
- 238000005259 measurement Methods 0.000 description 6
- 239000004020 conductor Substances 0.000 description 4
- 230000007613 environmental effect Effects 0.000 description 4
- 230000001360 synchronised effect Effects 0.000 description 4
- 230000007547 defect Effects 0.000 description 3
- 238000009825 accumulation Methods 0.000 description 2
- 230000033228 biological regulation Effects 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 238000012937 correction Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000012634 fragment Substances 0.000 description 2
- 230000017525 heat dissipation Effects 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
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- 238000009434 installation Methods 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
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- 238000005070 sampling Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
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- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H11/00—Networks using active elements
- H03H11/54—Modifications of networks to reduce influence of variations of temperature
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/28—Testing of electronic circuits, e.g. by signal tracer
- G01R31/2851—Testing of integrated circuits [IC]
- G01R31/2884—Testing of integrated circuits [IC] using dedicated test connectors, test elements or test circuits on the IC under test
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/10—Measuring as part of the manufacturing process
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Abstract
The invention relates to the technical field of filters, in particular to a signal fuzzy control filter for a wafer detection device; the device comprises a wafer machine, a detection module, a filter terminal and a controller; the wafer detection device has the advantages that due to the fact that the wafer is broken in the circulation process and the like, the operation of the machine table is required to be suspended for cleaning, and the application effect of the wafer detection device in production is affected; therefore, the invention analyzes the phase angle of the electric signal waveform of the wafer position information of the wafer detection device in different stations of the wafer machine by the set phase circuit and clock circuit, converts the position error of each wafer in the wafer machine into the relative position difference between the circulating wafers in each station, plays a role in fuzzy screening on the electric signal data transmitted by the wafer detection device, reduces the processing capacity of the controller after the electric signal waveform peak-valley value is processed by the filter terminal by analyzing the waveform phase angle, and improves the application effect of the signal fuzzy control filter for the wafer detection device.
Description
Technical Field
The invention relates to the technical field of filters, in particular to a signal fuzzy control filter for a wafer detection device.
Background
The quality of the wafer is an important technical index of an integrated circuit, and the surface defects, crystal defects and the like of the wafer are required to be detected by corresponding detection instruments, for example, a high-speed camera is used for shooting the pattern on the wafer, the pattern is converted into an electric signal wave taking the time of detection record as a scalar quantity by an image processing system, the pattern of the shot wafer is taken as a physical unit variable, and the purpose of detecting the quality of the wafer is achieved by matching with the screening of a filter; the filter is a frequency selecting device, can make specific frequency components in the signal pass through, and greatly attenuate other frequency components, analyze the waveform to obtain the quality of the wafer of the corresponding pattern, along with the development of the integrated circuit industry, the productivity of the wafer has huge gap, and then in the manufacturing process of the wafer, the improvement of the production efficiency in the process has an important role.
At present, the device for detecting the wafers needs to screen the data signals of each wafer in a machine table, the peak value of the processing speed limits the prospect of further optimizing the detection procedure, and meanwhile, in the process of using a filter to process signals, the interference on the waveform detection precision is caused due to the environmental influence in a workshop of a mounting machine table, so that the application effect of the wafer detection device in production is weakened.
The invention discloses a signal fuzzy control filter for a wafer detection device, and relates to the technical field of semiconductors, wherein the signal fuzzy control filter is connected in series between a detection sensor and a processor of the wafer detection device to obtain an original sensor signal, and is connected with a synchronous rack sampling time synchronous signal in a bypass mode, a processed signal can be generated based on the original sensor signal and the time synchronous signal, the processed signal outputs a first effective level of a single standard width from a first effective signal edge of the original sensor signal, then outputs a second effective level of the single standard width from the level synchronized with the original sensor signal until a second effective signal edge of the original sensor signal, and the processed signal performs normalized filtering with ideal characteristics relative to the original sensor signal; however, in the technical scheme, the problem that in the production process of the wafer in the machine, the electric signal transmission precision of the wafer detection device is interfered due to the difference of the environmental temperature caused by different process parameters among the stations of the machine, so that the operation effect of the filter is weakened is not solved.
In view of the above, the present invention provides a signal fuzzy control filter for a wafer inspection apparatus, which solves the above-mentioned technical problems.
Disclosure of Invention
In order to make up for the defects of the prior art, the invention provides a signal fuzzy control filter for a wafer detection device, which is used for carrying out phase angle analysis on electric signal waveforms of wafer position information of the wafer detection device in different stations of a wafer machine through a phase circuit and a clock circuit arranged in a filter terminal, converting position errors of each wafer in the wafer machine into relative position differences among circulating wafers in each station, playing a role in fuzzy screening on electric signal data transmitted by the wafer detection device, reducing the processing capacity of a controller after the filter terminal processes peak and valley values of the electric signal waveforms through analysis on the waveform phase angles, further enhancing the analysis capacity of the controller on the data of the wafer detection device, and further improving the application effect of the signal fuzzy control filter for the wafer detection device.
The invention relates to a signal fuzzy control filter for a wafer detection device, which comprises a wafer machine, a detection module and a controller, wherein the wafer machine is used for detecting a wafer; the wafer machine is provided with a filter terminal in each station; the detection module converts pattern data detected on the wafer into an electric signal and transmits the electric signal to the filter terminal; the controller judges the data processed by the filter terminal and acquires the quality information of the wafer corresponding to the electric signal; the wafer machine is also provided with a cable for transmitting electric signals, and the length of the cable between each station in the wafer machine and the filter terminal is equal; the distance between the filter terminal and the grounding wire in each station of the wafer machine is equal, and the filter terminal is attached to the grounding wire in the wafer machine; the filter terminal is also provided with a phase difference measuring circuit and a clock circuit, and the filter terminal records phase data of the electric signal through the phase difference measuring circuit; the clock circuit is used for marking the phase angles of waveforms in the filter terminals in different stations of the wafer machine;
In the prior art, the device for detecting the wafer needs to screen the position data signal of each wafer in the machine table, the peak value of the processing speed limits the prospect of further optimizing the detection procedure, meanwhile, in the process of using the filter terminal to process the signal, the interference on the waveform detection precision is caused by the environmental influence in a workshop of the mounting machine table, the acquisition of the position precision of the wafer in the machine table is weakened, the conditions of fragments and the like of the wafer in the circulation process are caused, the operation of the machine table needs to be stopped for cleaning, and the application effect of the wafer detection device in production is influenced;
Therefore, the invention reduces the line loss difference of the electric signal transmission between the filter terminal in the wafer machine and each station by controlling the distance between the cable length and the grounding line of the input end and the output end of the filter terminal, then marks the physical quantity of the wafer in the wafer machine by the action of the phase difference measuring circuit, converts the position difference of the wafer in the wafer machine into the position difference between the wafers, enables the waveform fed back in the filter terminal to be identified and analyzed by the controller only through the phase data, avoids the occurrence of extra processing capacity when the orientation of the wafer in the wafer machine is in the storage position error requirement, simultaneously reflects the offset of the wafer in the circulation direction of the wafer machine by the phase angle marked by the clock circuit in different stations, obtains the offset caused by each station in the wafer machine to the circulation position by the phase angle of the set waveform, and then adjusts the wafer in the maintenance operation machine to maintain the wafer machine, and further ensures the speed of the wafer circulation machine by maintaining the filter in the production operation machine; according to the invention, the phase circuit and the clock circuit arranged in the filter terminal are utilized to analyze the phase angle of the electric signal waveform of the wafer position information of the wafer detection device in different stations of the wafer machine, the position error of each wafer in the wafer machine is converted into the relative position difference between the circulating wafers in each station, the effect of fuzzy screening is achieved on the electric signal data transmitted by the wafer detection device, the processing capacity of the controller after the wave phase angle of the wave is analyzed to reduce the peak-valley value of the electric signal waveform processed by the filter terminal, and the analysis capacity of the controller on the data of the wafer detection device is further enhanced, so that the application effect of the signal fuzzy control filter for the wafer detection device is improved.
Preferably, the wafer machine is further provided with a protective sleeve in each station, and the protective sleeve wraps the surfaces of the cable, the grounding wire and the filter terminal; the protective sleeve is used for isolating the conduction of the processing temperature of the wafer machine; when in operation, the wafer has different technological parameters between different stations in the wafer machine; through the protective sleeve that sets up, get up filter terminal and electric connection's cable and earth connection surface, avoid the temperature difference of wafer technological parameter among the different stations of wafer board, cause the temperature difference of filter terminal and cable and earth connection between the different stations of wafer board, then lead to the difference of its circuit performance, and form error accumulation and skew in the filter terminal among different stations, and then influence the analysis precision of controller to wafer detection device measurement data, the interference of measurement system error has been reduced, thereby the application effect of signal fuzzy control filter has been promoted.
Preferably, the protective sleeve is also provided with a water channel pipe which is used for adjusting the temperature range of the protective sleeve and is connected in parallel in a cooling water system of the wafer machine; during operation, the protective sleeve in each station of the wafer machine is in a passive state for protecting the temperature of the filter terminal and the electric connection element thereof, and the heat of the process parameters in the stations of the wafer machine can still influence the inside of the protective sleeve through heat conduction; through the water channel pipe that sets up in the protective sheath and encircle, make it parallelly connected with the cooling water system in the wafer board, the temperature parameter of active control filter terminal and electric connection component thereof has still played the temperature control effect to the electric connection end between filter terminal and cable and the ground wire, reduces the temperature rise influence at filter terminal and cable and ground wire contact resistance, weakens the interference of conductor temperature to the signal transmission distortion to the application effect of signal fuzzy control filter for the wafer detection device has been promoted.
Preferably, the waterway pipe is also provided with a copper shielding net which is umbrella-shaped and is unfolded at the interface between the filter terminal and the cable, and the shielding net is also provided with a grounding wire connected with a grounding wire; when the filter terminal works, the filter terminal carries out filtering processing on the waveform of the electric signal in the cable; through the shielding net arranged at the interface of the filter terminal, the shielding net is utilized to be unfolded into an umbrella-shaped structure, the cable at the input of the filter terminal is surrounded, the interference of unfiltered signals in the cable at the input end to the filtered signals of the cable at the output end is avoided, the cables at the input end and the output end can be arranged at adjacent positions of the filter terminal, the adaptability of the mounting position of the filter terminal is enhanced, the filtering efficacy is maintained, and the application effect of the signal fuzzy control filter is improved.
Preferably, the waterway pipe is further provided with fins, the fins are positioned at the interface between the filter terminal and the cable, and shielding nets are wound and fixed on wedge grooves among the fins; during operation, the fins arranged on the waterway pipe are wound in the wedge grooves among the fins by using the copper shielding net, so that the cooling effect of the waterway pipe is conducted to the area outside the filter terminal through the shielding net, the heat conduction of the station of the wafer machine in the process is weakened to the area of the filter terminal, the unfolded shielding net also enhances the heat dissipation of the interface of the filter terminal, and the temperature regulation effect is kept, thereby stabilizing the application effect of the signal fuzzy control filter.
Preferably, a phase angle offset circuit is further arranged in the filter terminal, and the phase angle offset circuit changes the increment of the waveform phase angle in the filter terminal according to the deflection of the wafer process in the wafer station; when the device works, the wafer can deflect in the working procedure of the wafer machine, so that phase angle difference with obvious waveform is generated in the filter terminals of different stations; through the phase angle offset circuit, the change of the phase angle of the electric signal generated by the process deflection angle of the wafer in the station of the wafer machine is incrementally corrected, so that the waveform of the filter terminal is suitable for the change of the position and the posture of the wafer between different stations of the wafer machine, the deviation of the measured waveform caused by the movement of the wafer between stations in the process is avoided, and the application effect of the signal fuzzy control filter for the wafer detection device is maintained.
The beneficial effects of the invention are as follows:
1. According to the invention, the phase angle analysis is carried out on the electric signal waveforms of the wafer position information of the wafer detection device in different stations of the wafer machine through the phase circuit and the clock circuit which are arranged in the filter terminal, the position error of each wafer in the wafer machine is converted into the relative position difference between the circulating wafers in each station, the blurring screening effect is carried out on the electric signal data transmitted by the wafer detection device, and the processing capacity of the controller after the electric signal waveform peak-valley value is processed by the filter terminal is reduced through the analysis of the waveform phase angle.
2. According to the invention, the filter terminal and the cable and the grounding wire which are electrically connected with the filter terminal are wrapped by the protective sleeve and the internally-encircling waterway pipe, so that the temperature difference of wafer process parameters in different stations of the wafer machine is avoided, the interference of measurement system errors is reduced, the temperature control function is also realized on the electric connection ends between the filter terminal and the cable and between the filter terminal and the grounding wire, the temperature rise influence of contact resistance between the filter terminal and the cable and between the filter terminal and the grounding wire is reduced, and the interference of conductor temperature on electric signal transmission distortion is weakened.
3. According to the invention, the change of the phase angle of the electric signal generated by the process deflection angle of the wafer in the station of the wafer machine is subjected to incremental correction through the phase angle offset circuit, so that the waveform of the filter terminal is suitable for changing the position and the posture of the wafer among different stations of the wafer machine, and the deviation of the measured waveform caused by the movement of the wafer among stations in the process is avoided.
Drawings
The invention will be further described with reference to the drawings and embodiments.
FIG. 1 is a block diagram of a signal-fuzzy control filter in accordance with the present invention;
FIG. 2 is a perspective view of a signal blur control filter for a wafer inspection apparatus according to the present invention;
FIG. 3 is a perspective view of a signal blur control filter component according to the present invention;
FIG. 4 is a schematic diagram of the filtering of the signal fuzzy control filter of the present invention;
In the figure: 1. a wafer machine; 2. a filter terminal; 3. a cable; 4. a ground wire; 5. a protective sleeve; 51. a waterway pipe; 52. a shielding net; 53. and (5) fins.
Detailed Description
The invention is further described in connection with the following detailed description in order to make the technical means, the creation characteristics, the achievement of the purpose and the effect of the invention easy to understand.
As shown in fig. 1 to 4, the signal fuzzy control filter for a wafer inspection device according to the present invention includes a wafer machine 1, an inspection module and a controller; the wafer machine 1 is provided with a filter terminal 2 in each station; the detection module converts pattern data detected on the wafer into an electric signal and transmits the electric signal to the filter terminal 2; the controller judges the data processed by the filter terminal 2 and acquires the quality information of the wafer corresponding to the electric signal; the wafer machine 1 is also provided with a cable 3 for transmitting electric signals, and the length of the cable 3 between each station in the wafer machine 1 and the filter terminal 2 is equal; the distance between the filter terminal 2 and the grounding wire 4 in each station of the wafer machine 1 is also equal, and the filter terminal 2 is attached to the grounding wire 4 in the wafer machine 1; the filter terminal 2 is also provided with a phase difference measuring circuit and a clock circuit, and the filter terminal 2 records the phase data of the electric signal through the phase difference measuring circuit; the clock circuit is used for marking the phase angles of waveforms in the filter terminal 2 in different stations of the wafer machine 1;
in the prior art, the device for detecting the wafer needs to screen the position data signal of each wafer in the machine table, the peak value of the processing speed limits the prospect of further optimizing the detection procedure, meanwhile, in the process of using the filter terminal 2 to process the signal, the interference on the waveform detection precision is caused by the environmental influence in a workshop of the mounting machine table, the acquisition of the position precision of the wafer in the machine table is weakened, the conditions of fragments and the like of the wafer in the circulation process are caused, the operation of the machine table needs to be stopped for cleaning, and the application effect of the wafer detection device in production is influenced;
Therefore, the invention reduces the line loss difference of the electric signal transmission between the filter terminal 2 in the wafer machine 1 and each station by controlling the distance between the cable 3 length and the grounding wire 4at the input end and the output end of the filter terminal 2 through the filter terminal 2 arranged in each station of the wafer machine 1, marks the physical quantity of the wafer position in the wafer machine 1 under the action of the phase difference measuring circuit, converts the position difference of the wafer in the wafer machine 1 into the position difference between the wafers, ensures that the waveform fed back in the filter terminal 2 only needs to be recognized and analyzed by the controller through the phase data, avoids the occurrence of extra processing quantity when the position of the wafer in the wafer machine 1 is in the storage position error requirement of the wafer machine 1, simultaneously reflects the offset of the wafer in the flow direction of the wafer machine 1 through the phase angle marked by the clock circuit in different stations, obtains the offset of each wafer position in the wafer machine 1 through fitting and analyzing the phase angle of the set waveform, maintains the wafer flow speed of the wafer machine 1, and further maintains the operation precision of the wafer machine 1 in the production machine in the state of the wafer machine; the invention utilizes the phase circuit and the clock circuit which are arranged in the filter terminal 2 to analyze the phase angle of the electric signal waveform of the wafer position information of the wafer detection device in different stations of the wafer machine 1, converts the position error of each wafer in the wafer machine 1 into the relative position difference of the circulating wafers in each station, plays a role in fuzzy screening on the electric signal data transmitted by the wafer detection device, reduces the processing capacity of the controller after the wave phase angle of the waveform is analyzed, and further enhances the analysis capacity of the controller on the data of the wafer detection device, thereby improving the application effect of the signal fuzzy control filter for the wafer detection device.
As an embodiment of the invention, the wafer machine 1 is further provided with a protective sleeve 5 in each station, and the protective sleeve 5 wraps the surfaces of the cable 3, the grounding wire 4 and the filter terminal 2; the protective sleeve 5 is used for isolating the conduction of the processing temperature of the wafer machine 1; when in operation, the wafer has different technological parameters among different stations in the wafer machine 1; through the protective sleeve 5 that sets up, get up filter terminal 2 and electric connection's cable 3 and earth connection 4 surface, avoid the temperature difference of wafer technological parameter in the different stations of wafer board 1, cause the temperature difference between the different stations of filter terminal 2 and cable 3 and earth connection 4 at wafer board 1, then lead to its circuit performance's difference, and form error accumulation and skew in the filter terminal 2 between different stations, and then influence the analysis precision of controller to wafer detection device measured data, the interference of measurement system error has been reduced, thereby the application effect of signal fuzzy control filter has been promoted.
As an embodiment of the present invention, the protective sleeve 5 is further provided with a water channel pipe 51 that is circumferentially attached, the water channel pipe 51 is used for adjusting the temperature range of the protective sleeve 5, and the water channel pipe 51 is connected in parallel in the cooling water system of the wafer machine 1; during operation, the protective sleeve 5 in each station of the wafer machine 1 protects the temperature of the filter terminal 2 and the electric connection element thereof in a passive state, and the heat of the process parameters between stations in the wafer machine 1 can still influence the inside of the protective sleeve 5 through heat conduction; the water channel pipe 51 which surrounds the inside of the protective sleeve 5 is arranged to be connected with a cooling water system in the wafer machine 1 in parallel, the temperature parameters of the filter terminal 2 and the electric connection element thereof are actively controlled, the temperature control function is also achieved on the electric connection end between the filter terminal 2 and the cable 3 as well as between the filter terminal 2 and the grounding wire 4, the temperature rise influence of contact resistance between the filter terminal 2 and the cable 3 as well as between the filter terminal 2 and the grounding wire 4 is reduced, interference of conductor temperature on electric signal transmission distortion is weakened, and therefore the application effect of the signal fuzzy control filter for the wafer detection device is improved.
As an embodiment of the present invention, the waterway pipe 51 is further provided with a shielding net 52 made of copper, the shielding net 52 is umbrella-shaped and is unfolded at the interface between the filter terminal 2 and the cable 3, and the shielding net 52 is further provided with a ground wire connected with the ground wire 4; during operation, the filter terminal 2 carries out filtering processing on the waveform of the electric signal in the cable 3; through the shielding net 52 arranged at the interface of the filter terminal 2, the shielding net is utilized to be unfolded into an umbrella-shaped structure, the cable 3 at the input of the filter terminal 2 is surrounded, and the interference of unfiltered signals in the cable 3 at the input end to filtered signals of the cable 3 at the output end is avoided, so that the cables 3 at the input end and the output end can be arranged at adjacent positions of the filter terminal 2, the adaptability of the installation position of the filter terminal 2 is enhanced, the filtering efficacy is maintained, and the application effect of the signal fuzzy control filter is improved.
As an implementation mode of the invention, the waterway pipe 51 is also provided with fins 53, the fins 53 are positioned at the interface between the filter terminal 2 and the cable 3, and a shielding net 52 is wound and fixed on a wedge groove between the fins 53; during operation, the fins 53 arranged on the waterway pipe 51 are wound in the wedge grooves among the fins 53 by the aid of the copper shielding net 52, so that the cooling effect of the waterway pipe 51 is conducted to the area outside the filter terminal 2 through the shielding net 52, heat of a station of the wafer machine 1 in the process is weakened to be conducted to the area of the filter terminal 2, and the unfolded shielding net 52 also enhances heat dissipation of an interface of the filter terminal 2, and the temperature regulation effect is kept, so that the application effect of the signal fuzzy control filter is stabilized.
As an implementation mode of the invention, the filter terminal 2 is also provided with a phase angle offset circuit, and the phase offset circuit changes the increment of the waveform phase angle in the filter terminal 2 according to the deflection amount of the wafer process in the station of the wafer machine 1; when the wafer processing device works, the wafer can deflect in the working procedure of the wafer machine table 1, so that the phase angle difference with obvious waveform is generated in the filter terminals 2 of different stations; through the phase angle offset circuit, the change of the phase angle of the electric signal generated by the process deflection angle of the wafer in the station of the wafer machine 1 is incrementally corrected, so that the waveform of the filter terminal 2 is suitable for the change of the position and the posture of the wafer between different stations of the wafer machine 1, the deviation of the measured waveform caused by the movement of the wafer between stations in the process is avoided, and the application effect of the signal fuzzy control filter for the wafer detection device is maintained.
The specific working procedure is as follows:
The method comprises the steps that through a filter terminal 2 arranged in each station of a wafer machine 1, the distance between the length of a cable 3 and a grounding wire 4 at the input end and the output end of the filter terminal 2 is controlled, the line loss difference of electric signal transmission between the filter terminal 2 in the wafer machine 1 and each station is reduced, then the physical quantity of the adopted wafer position in the wafer machine 1 is marked under the action of a phase difference measuring circuit, the position difference of the wafer in the wafer machine 1 is converted into the position difference between the wafers, the waveform fed back in the filter terminal 2 is only required to be recognized and analyzed by a controller through phase data, the occurrence of extra processing capacity when the position of the wafer in the wafer machine 1 is within the storage position error requirement of the wafer machine 1 is avoided, meanwhile, the offset of the wafer in the wafer machine 1 in the circulation direction can be reflected through the phase angle marked by a clock circuit in different stations, the offset quantity caused by the wafer position in the wafer machine 1 is obtained through fitting analysis with the phase angle of the set waveform, the wafer position difference is maintained, the wafer machine is controlled in the wafer machine 1, the operation speed is maintained, and the operation speed of the wafer is further maintained in the wafer machine 1 is controlled, and the operation speed is further ensured; the filter terminal 2 and the cable 3 and the grounding wire 4 which are electrically connected with the filter terminal 2 are wrapped by the arranged protective sleeve 5, so that temperature differences of wafer process parameters in different stations of the wafer machine 1 are avoided, temperature differences among the filter terminal 2, the cable 3 and the grounding wire 4 in different stations of the wafer machine 1 are avoided, and interference of errors of a measurement system is reduced; the waterway pipe 51 is arranged in the protective sleeve 5 in a surrounding manner, so that the waterway pipe is connected with a cooling water system in the wafer machine 1 in parallel, the temperature parameters of the filter terminal 2 and the electric connection element thereof are actively controlled, the temperature control effect is also achieved on the electric connection end between the filter terminal 2 and the cable 3 as well as between the filter terminal 2 and the grounding wire 4, the temperature rise influence of contact resistance between the filter terminal 2 and the cable 3 as well as between the filter terminal 2 and the grounding wire 4 is reduced, and interference of conductor temperature on electric signal transmission distortion is weakened; the provided phase angle offset circuit carries out increment correction on the change of the phase angle of the electric signal generated by the process deflection angle of the wafer in the station of the wafer machine 1, so that the waveform of the filter terminal 2 is suitable for changing the position and the posture of the wafer among different stations of the wafer machine 1, and the deviation of the measurement waveform caused by the movement of the wafer among the stations in the process is avoided.
The foregoing has shown and described the basic principles, principal features and advantages of the invention. It will be understood by those skilled in the art that the present invention is not limited to the embodiments described above, and that the above embodiments and descriptions are merely illustrative of the principles of the present invention, and various changes and modifications may be made without departing from the spirit and scope of the invention, which is defined in the appended claims. The scope of the invention is defined by the appended claims and equivalents thereof.
Claims (6)
1. A signal fuzzy control filter for a wafer detection device is characterized in that: the wafer detection device comprises a wafer machine (1), a detection module and a controller; the wafer machine (1) is provided with a filter terminal (2) in each station; the detection module converts pattern data detected on the wafer into an electric signal and transmits the electric signal to the filter terminal (2); the controller judges the data processed by the filter terminal (2) and acquires the quality information of the wafer corresponding to the electric signal; the wafer machine (1) is also provided with a cable (3) for transmitting electric signals, and the lengths of the cables (3) between each station in the wafer machine (1) and the filter terminal (2) are equal; the distance between the filter terminal (2) and the grounding wire (4) in each station of the wafer machine (1) is also equal, and the filter terminal (2) is attached to the grounding wire (4) in the wafer machine (1); the filter terminal (2) is also provided with a phase difference measuring circuit and a clock circuit, and the filter terminal (2) records phase data of the electric signal through the phase difference measuring circuit; the clock circuit is used for marking the phase angles of waveforms in the filter terminal (2) in different stations of the wafer machine (1);
The physical quantity of the wafer position in the wafer machine (1) is marked under the action of the phase difference measuring circuit, the position difference of the wafer in the wafer machine (1) is converted into the position difference among the wafers, the waveform fed back in the filter terminal (2) is only required to be recognized and analyzed by the controller through the phase data, the extra processing capacity is avoided when the orientation of the wafer in the wafer machine (1) is in the storage position error requirement, meanwhile, the offset of the wafer in the circulating direction of the wafer machine (1) can be reflected by the phase angle marked by the clock circuit in different stations, the offset of each station in the wafer machine (1) for circulating the wafer position is obtained through fitting analysis with the phase angle of the set waveform, then the operation precision among each station in the wafer machine (1) is maintained, and the production speed of the wafer in the wafer machine (1) is ensured under the state that the controller maintains the processing speed of the filter signal.
2. The signal blur control filter for a wafer inspection apparatus according to claim 1, wherein: the wafer machine table (1) is further provided with a protective sleeve (5) in each station, and the protective sleeve (5) is wrapped on the surfaces of the cable (3), the grounding wire (4) and the filter terminal (2); the protective sleeve (5) is used for isolating the conduction of the processing temperature of the wafer machine (1).
3. The signal blur control filter for a wafer inspection apparatus according to claim 2, wherein: the wafer protection device is characterized in that a waterway pipe (51) which surrounds and is attached to the protection sleeve (5) is further arranged in the protection sleeve (5), the waterway pipe (51) is used for adjusting the temperature range of the protection sleeve (5), and the waterway pipe (51) is connected in parallel in a cooling water system of the wafer machine table (1).
4. A signal blur control filter for a wafer inspection apparatus according to claim 3, wherein: the waterway pipe (51) is also provided with a copper shielding net (52), the shielding net (52) is umbrella-shaped and is unfolded at the interface between the filter terminal (2) and the cable (3), and the shielding net (52) is also provided with a grounding wire connected with the grounding wire (4).
5. The signal blur control filter for a wafer inspection apparatus according to claim 4, wherein: the waterway pipe (51) is also provided with fins (53), the fins (53) are positioned at the interface between the filter terminal (2) and the cable (3), and shielding nets (52) are wound and fixed on wedge grooves between the fins (53).
6. The signal blur control filter for a wafer inspection apparatus according to claim 4, wherein: and a phase angle offset circuit is further arranged in the filter terminal (2), and the phase angle offset circuit changes the increment of the waveform phase angle in the filter terminal (2) according to the deflection of the wafer process in the station of the wafer machine station (1).
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| CN104931133A (en) * | 2015-07-03 | 2015-09-23 | 广西科技大学 | Acoustic holography front-end test channel phase compensation angle testing system |
| CN112038252A (en) * | 2020-09-10 | 2020-12-04 | 无锡卓海科技有限公司 | Signal fuzzy control filter for wafer detection device |
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| JP2003197509A (en) * | 2001-12-27 | 2003-07-11 | Nikon Corp | Abnormality detection method, exposing method and aligner, and method for manufacturing device |
| JP4260587B2 (en) * | 2003-09-18 | 2009-04-30 | 株式会社日立ハイテクノロジーズ | Pattern defect inspection system |
| CA2510828A1 (en) * | 2005-07-06 | 2007-01-06 | John W. Bogdan | Edge detecting filters |
| CN207528335U (en) * | 2017-12-06 | 2018-06-22 | 武汉大学 | A kind of phase difference detection system based on adaptive-filtering |
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| CN104931133A (en) * | 2015-07-03 | 2015-09-23 | 广西科技大学 | Acoustic holography front-end test channel phase compensation angle testing system |
| CN112038252A (en) * | 2020-09-10 | 2020-12-04 | 无锡卓海科技有限公司 | Signal fuzzy control filter for wafer detection device |
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