CN113045992A

CN113045992A - Neutral polishing solution and preparation method thereof

Info

Publication number: CN113045992A
Application number: CN202110308631.XA
Authority: CN
Inventors: 旷建军
Original assignee: Guangdong Jingjian Technology Co ltd
Current assignee: Guangdong Jingjian Technology Co ltd
Priority date: 2021-03-23
Filing date: 2021-03-23
Publication date: 2021-06-29

Abstract

The invention discloses a neutral polishing solution, which consists of the following components: compared with the prior art, the invention has the beneficial effects that: the neutral polishing solution is a nano polishing agent without any chromium, phosphorus and chlorine additives, has good oil stain removal, cleaning and polishing performances, and can enable metal products to exceed the original luster; the product has the characteristics of stable performance, no toxicity, no environmental pollution, no corrosion to processing equipment and the like.

Description

Neutral polishing solution and preparation method thereof

Technical Field

The invention relates to the field of polishing solution, and particularly relates to neutral polishing solution and a preparation method thereof.

Background

With the improvement of living standard of people, stainless steel products are more and more widely used in the fields of chemical industry, petroleum, household appliances, hardware, food, mechanical manufacturing and the like, and the requirements of the stainless steel products are more and more high, so that the stainless steel products are durable, and the effects of mirror surface, brightness, fineness and pleasure of appearance are achieved, and meanwhile, the products are required to be environment-friendly and do not corrode processing equipment.

The currently used methods for polishing stainless steel mainly include: (1) electrochemical polishing, although the effect of the electrochemical polishing is excellent, the energy consumption is high, for complex parts, a special clamp is required, the requirements for an anode, a cathode and a blind hole are high, for the blind hole, because the surface of an inner hole is a low current density area, a satisfactory polishing effect cannot be obtained on the inner surface of the inner hole, and because the electric lines are not uniformly distributed, the inner and outer polishing effects are different; (2) mechanical polishing; mechanical polishing generally has large pollution and high requirement on the number of workers, firstly needs high-temperature acid washing to remove oxide skin and grey film black slag, secondly uses polishing equipment for polishing, and finally uses an artificial soft cloth wheel polishing machine and green polishing paste for polishing unqualified products such as oxide skin and welding residues; (3) chemical polishing: the chemical polishing has low cost, no requirement on the geometric shape of a stainless steel product, capability of meeting the requirement on mirror surface brightness, simple work and low energy consumption, the chemical polishing mainly utilizes polishing solution for polishing, the commercially available polishing solution mainly comprises sulfuric acid type chemical polishing solution, phosphoric acid type chemical polishing solution and chromic acid type polishing solution, most of the polishing solution is acidic and even contains chromium and phosphorus, and the polishing solution is unsafe and not environment-friendly.

Disclosure of Invention

The present invention aims to overcome the above-mentioned shortcomings and provide a technical solution to solve the above-mentioned problems.

A neutral polishing solution comprises the following components: the water-based cleaning agent comprises, by weight, 0.5-10% of aluminum oxide, 1-6% of glycerol, 1-7% of silicon dioxide, 1-3% of oxalic acid, 1-7.5% of sodium carbonate, 1-3% of ferrous nitrate and 63.5-94.5% of pure water.

As one improvement of the technical proposal, the PH value of the polishing solution is between 6 and 8.

As one improvement of the technical scheme, the neutral polishing solution comprises the following components in percentage by weight: 8% of aluminum oxide, 6% of glycerol, 5% of silicon dioxide, 3% of oxalic acid, 5.5% of sodium carbonate, 3% of ferrous nitrate and 69.5% of pure water.

A neutral polishing solution and a preparation method thereof comprise the following steps:

(1) putting pure water into a reaction kettle;

(2) putting aluminum oxide and glycerol into a reaction pot, and mixing the aluminum oxide, the glycerol and pure water to form a component A;

(3) starting a high-speed shearing dispersion machine to stir the component A;

(4) mixing oxalic acid, sodium carbonate and ferrous nitrate to form a component B;

(5) sequentially adding silicon dioxide and the component B into the component A in the stirring process;

(6) the component A, the silicon dioxide and the component B are completely mixed to form neutral polishing solution, and the high-speed shearing dispersion machine is closed.

Preferably, the agitator is continuously agitated during steps (3) - (6) for a period of at least 30 minutes.

Compared with the prior art, the invention has the beneficial effects that:

1. the neutral polishing liquid is a nano polishing agent without any additive of chromium, phosphorus and chlorine, has good performances of degreasing, cleaning and brightening, and can enable metal products to have more luster than the original luster.

2. The product has the characteristics of stable performance, no toxicity, no environmental pollution and the like.

Additional aspects and advantages of the invention will be set forth in part in the description which follows and, in part, will be obvious from the description, or may be learned by practice of the invention.

Detailed Description

The technical solutions in the embodiments of the present invention will be clearly and completely described below, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.

In the embodiment of the invention, the neutral polishing solution comprises the following components: the water-based cleaning agent comprises aluminum oxide, glycerol, silicon dioxide, oxalic acid, sodium carbonate, ferrous nitrate and pure water, and comprises the following components in percentage by weight:

names of ingredients of substances	Content (wt.)
		Aluminum oxide	0.5-10％
Glycerol	1-6％
		Silicon dioxide	1-7％
Oxalic acid	1-3％
		Sodium carbonate	1-7.5％
Ferrous nitrate	1-3％
		Pure water	63.5-94.5％

The equipment needing to be prepared in the preparation process comprises: a reaction pot, a reaction vessel, a high-speed shearing dispersion machine, a packaging barrel and a pasting machine.

The neutral polishing solution is prepared by the following steps:

(1) putting pure water into a reaction kettle, and standing for 3 minutes;

(3) starting a high-speed shearing dispersion machine to stir the component A;

Preferably, the high shear disperser of step (1) is mounted on the reaction kettle.

Preferably, in the step (2), the aluminum oxide and the glycerol are added into a reaction pot and added with water, the aluminum oxide and the glycerol in the component A are not completely mixed with pure water, and a high-speed shearing dispersion machine is required for stirring, so that the components in the component A can be completely mixed, and the uniform dispersion in the preparation process (including the subsequent steps) is ensured.

Preferably, in step (4), the oxalic acid, the sodium carbonate and the ferrous nitrate are mixed in an external reaction vessel.

Preferably, in the production process, under the condition of meeting the capacity of the reaction kettle, the proportion can be changed proportionally according to the actual situation.

The neutral polishing solution is contained in a 25 kg glue barrel, and a corresponding label is printed by a labeling machine.

The comparison between the neutral polishing solution of the invention and other polishing solutions on the market is as follows: wherein, the first embodiment is a polishing solution of a sodium hypochlorite oxidant, the second embodiment is a polishing solution of a chromium oxide oxidant, the third embodiment is a phosphoric acid type chemical polishing solution, the fourth embodiment is a sulfuric acid type chemical polishing solution, and the fifth embodiment is a neutral polishing solution of the invention, and a polishing object is tested by taking the same stainless steel;

compared with the polishing solution on the market, the neutral polishing solution provided by the invention has more stable performance in working, is not easy to damage a polished object (stainless steel), has small pH value floating change in the reaction process, and does not corrode processing equipment.

The fifth embodiment is a neutral polishing solution of the present invention, which comprises the following components by weight: 8% of aluminum oxide, 6% of glycerol, 5% of silicon dioxide, 3% of oxalic acid, 5.5% of sodium carbonate, 3% of ferrous nitrate and 69.5% of pure water.

It will be evident to those skilled in the art that the invention is not limited to the details of the foregoing illustrative embodiments, and that the present invention may be embodied in other specific forms without departing from the spirit or essential attributes thereof. The present embodiments are therefore to be considered in all respects as illustrative and not restrictive, the scope of the invention being indicated by the appended claims rather than by the foregoing description, and all changes which come within the meaning and range of equivalency of the claims are therefore intended to be embraced therein.

Claims

1. A neutral polishing solution is characterized in that: the neutral polishing solution consists of the following components: the neutral polishing solution comprises, by weight, 0.5-10% of aluminum oxide, 1-6% of glycerol, 1-7% of silicon dioxide, 1-3% of oxalic acid, 1-7.5% of sodium carbonate, 1-3% of ferrous nitrate and 63.5-94.5% of pure water.

2. A neutral polishing liquid according to claim 1, wherein: the pH value of the neutral polishing solution is between 6 and 8.

3. A neutral polishing liquid according to claim 1, wherein: the neutral polishing solution comprises the following components in percentage by weight: 8% of aluminum oxide, 6% of glycerol, 5% of silicon dioxide, 3% of oxalic acid, 5.5% of sodium carbonate, 3% of ferrous nitrate and 69.5% of pure water.

4. A neutral polishing solution and a preparation method thereof, which are applied to the neutral polishing solution as claimed in claim 1, and are characterized in that: the method comprises the following steps:

(1) putting pure water into a reaction kettle;

(3) starting a high-speed shearing dispersion machine to stir the component A;

5. The neutral polishing solution and the preparation method thereof according to claim 4, wherein: and (4) continuously stirring by a high-speed shearing disperser in the processes of the steps (3) to (6).

6. The neutral polishing solution and the preparation method thereof according to claim 4, wherein: the stirring time is at least 30 minutes.