CN112014329A - Imaging system and method for internal structure of semiconductor product - Google Patents
Imaging system and method for internal structure of semiconductor product Download PDFInfo
- Publication number
- CN112014329A CN112014329A CN202011128946.8A CN202011128946A CN112014329A CN 112014329 A CN112014329 A CN 112014329A CN 202011128946 A CN202011128946 A CN 202011128946A CN 112014329 A CN112014329 A CN 112014329A
- Authority
- CN
- China
- Prior art keywords
- internal structure
- image
- terahertz wave
- measured
- imaging system
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 title claims abstract description 61
- 238000003384 imaging method Methods 0.000 title claims abstract description 43
- 238000000034 method Methods 0.000 title claims abstract description 15
- 238000009499 grossing Methods 0.000 claims description 9
- 230000003287 optical effect Effects 0.000 claims description 8
- 238000003708 edge detection Methods 0.000 claims description 4
- 230000002093 peripheral effect Effects 0.000 claims description 4
- 230000000149 penetrating effect Effects 0.000 abstract description 5
- 238000005516 engineering process Methods 0.000 description 9
- 230000007547 defect Effects 0.000 description 7
- 238000001514 detection method Methods 0.000 description 7
- 238000007689 inspection Methods 0.000 description 5
- 230000006378 damage Effects 0.000 description 3
- 238000001914 filtration Methods 0.000 description 3
- 239000005022 packaging material Substances 0.000 description 3
- 208000027418 Wounds and injury Diseases 0.000 description 2
- 238000000701 chemical imaging Methods 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000004891 communication Methods 0.000 description 2
- 230000008878 coupling Effects 0.000 description 2
- 238000010168 coupling process Methods 0.000 description 2
- 238000005859 coupling reaction Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 208000014674 injury Diseases 0.000 description 2
- 230000010287 polarization Effects 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000001427 coherent effect Effects 0.000 description 1
- 230000008094 contradictory effect Effects 0.000 description 1
- 230000032798 delamination Effects 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 230000010355 oscillation Effects 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 238000005070 sampling Methods 0.000 description 1
- 230000003313 weakening effect Effects 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01V—GEOPHYSICS; GRAVITATIONAL MEASUREMENTS; DETECTING MASSES OR OBJECTS; TAGS
- G01V8/00—Prospecting or detecting by optical means
- G01V8/10—Detecting, e.g. by using light barriers
- G01V8/12—Detecting, e.g. by using light barriers using one transmitter and one receiver
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Health & Medical Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Immunology (AREA)
- Pathology (AREA)
- General Life Sciences & Earth Sciences (AREA)
- Geophysics (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
Abstract
Description
技术领域technical field
本发明涉及太赫兹成像技术领域,尤其涉及一种半导体产品内部结构成像系统及方法。The invention relates to the technical field of terahertz imaging, in particular to a system and method for imaging the internal structure of a semiconductor product.
背景技术Background technique
对半导体芯片的缺陷检测是制造半导体芯片过程中的一个重要步骤,决定半导体芯片的良品率。半导体芯片缺陷主要方式有晶圆内部结构不均一、芯片内部电路剥落、芯片封装引线断裂、封装材料受应力失效等。Defect detection of semiconductor chips is an important step in the process of manufacturing semiconductor chips, and determines the yield of semiconductor chips. The main ways of semiconductor chip defects include uneven internal structure of the wafer, chip internal circuit peeling, chip package lead breakage, and stress failure of packaging materials.
目前,工业常用的半导体缺陷检测技术是光学检测、超声检测、X射线检测,但这些技术都存在一定的局限性。光学检测无法观察到半导体产品内部,因为它无法穿透芯片的封装材料和PCB板。由于在测试过程中使用了声耦合剂,因此超声技术既费时又会污损产品,只能做到抽样检测。X射线技术只能检测金属,而不能检测芯片内部非金属地的裂纹,分层或孔洞。此外,X射线的电离特性可能会损坏晶片内部电路结构,并且对现场工作人员造成人身伤害。At present, the commonly used semiconductor defect inspection technologies in the industry are optical inspection, ultrasonic inspection, and X-ray inspection, but these technologies all have certain limitations. Optical inspection cannot see inside the semiconductor product because it cannot penetrate the packaging material of the chip and the PCB board. Due to the use of acoustic couplants during testing, ultrasonic technology is time-consuming and fouls the product, and can only be done by sampling. X-ray technology can only detect metals, not cracks, delaminations or holes in non-metallic ground inside the chip. In addition, the ionizing properties of X-rays can damage the circuit structure inside the wafer and cause personal injury to field workers.
目前也有采用太赫兹检测技术进行半导体缺陷检测,但是由于太赫兹波极限分辨率的限制,太赫兹光谱成像仍然存在成像分辨率相对较低的现象。太赫兹成像系统难以获得较高的空间分辨率也是太赫兹成像缺陷检测技术无法广泛应用于工业领域的重要技术难题。因此,如何实现基于太赫兹检测技术成像的图片更加清晰,精度更高成为了亟需解决的技术问题。At present, terahertz detection technology is also used for semiconductor defect detection, but due to the limitation of the limit resolution of terahertz waves, terahertz spectral imaging still has the phenomenon of relatively low imaging resolution. The difficulty of obtaining high spatial resolution for terahertz imaging systems is also an important technical problem that terahertz imaging defect detection technology cannot be widely used in the industrial field. Therefore, how to realize clearer and more accurate images based on terahertz detection technology has become a technical problem that needs to be solved urgently.
发明内容SUMMARY OF THE INVENTION
本发明的主要目的在于提供一种半导体产品内部结构成像系统及方法,旨在如何实现基于太赫兹检测技术成像的图片更加清晰,精度更高的问题。The main purpose of the present invention is to provide an imaging system and method for the internal structure of a semiconductor product, aiming at how to realize the problem of clearer and higher precision imaging based on terahertz detection technology.
为实现上述目的,本发明提供的一种半导体产品内部结构成像系统,该系统包括:用于发射第一太赫兹波的发射装置;靠近所述发射装置的发射端设置的光调制装置,用于将所述发射装置发射的第一太赫兹波进行空间编码形成具有空间分布的第二太赫兹波,并穿透待测物体得到包含所述待测物体的内部结构图像数据的第三太赫兹波;相对于所述光调制装置设置的接收装置,用于接收所述第三太赫兹波并转化成电信号;及与所述接收装置电连接的远程终端设备,用于接收所述电信号并提取所述图像数据构建所述待测物体的内部结构图像。In order to achieve the above object, the present invention provides an imaging system for the internal structure of a semiconductor product, the system includes: a transmitter for emitting a first terahertz wave; a light modulation device disposed near the transmitter end of the transmitter for Spatially encode the first terahertz wave emitted by the transmitting device to form a second terahertz wave with spatial distribution, and penetrate the object to be measured to obtain a third terahertz wave containing image data of the internal structure of the object to be measured a receiving device arranged relative to the light modulation device, for receiving the third terahertz wave and converting it into an electrical signal; and a remote terminal device electrically connected to the receiving device for receiving the electrical signal and converting it into an electrical signal; Extracting the image data to construct an image of the internal structure of the object to be measured.
优选地,所述光调制装置包括:设于所述发射装置与所述待测物体之间的空间光调制器;设于所述空间光调制器周侧的半导体激光器;及设于所述半导体激光器与所述空间光调制器之间的数字光处理器,所述数字光处理器中存储有与所述待测物体的内部结构轮廓图像一致的掩膜图片;所述半导体激光器发出激光经过所述数字光处理器在所述空间光调制器上成像,并使所述空间光调制器朝向所述发射装置的一侧面上形成与所述掩膜图片对应的光生载流子层。Preferably, the light modulation device comprises: a spatial light modulator arranged between the emission device and the object to be measured; a semiconductor laser arranged on the peripheral side of the spatial light modulator; and a semiconductor laser arranged on the semiconductor A digital light processor between the laser and the spatial light modulator, the digital light processor stores a mask image consistent with the outline image of the internal structure of the object to be measured; the semiconductor laser emits laser light through the The digital light processor forms an image on the spatial light modulator, and a photo-generated carrier layer corresponding to the mask picture is formed on the side of the spatial light modulator facing the emitting device.
优选地,该系统还包括:设于所述发射装置与所述空间光调制器之间、用于将所述发射装置发射的第一太赫兹波从发散光束转化成平行光束的第一透镜。Preferably, the system further comprises: a first lens disposed between the emitting device and the spatial light modulator for converting the first terahertz wave emitted by the emitting device from a diverging beam to a parallel beam.
优选地,所述空间光调制器上设有扫描点阵列,所述扫描点阵列在所述空间光调制器上的范围覆盖经过所述第一透镜后第一太赫兹波的投射范围。Preferably, the spatial light modulator is provided with a scanning point array, and the range of the scanning point array on the spatial light modulator covers the projection range of the first terahertz wave after passing through the first lens.
优选地,所述发射装置包括飞秒激光仪及光电导发射器;所述接收装置为光电导探测器。Preferably, the transmitting device includes a femtosecond laser and a photoconductive transmitter; the receiving device is a photoconductive detector.
优选地,所述光调制装置还包括:设于所述半导体激光器与所述数字光处理器之间的第二透镜,用于将所述半导体激光器发出的激光聚焦于所述数字光处理器上。Preferably, the light modulation device further comprises: a second lens arranged between the semiconductor laser and the digital light processor, for focusing the laser light emitted by the semiconductor laser on the digital light processor .
优选地,该系统还包括:设于所述待测物体与所述接收装置之间的信号放大器,用于过滤所述第三太赫兹波中的噪声。Preferably, the system further includes: a signal amplifier arranged between the object to be measured and the receiving device, for filtering noise in the third terahertz wave.
为实现上述目的,本发明还进一步提供一种如上述的半导体产品内部结构成像系统的成像方法,包括:In order to achieve the above object, the present invention further provides an imaging method of the above-mentioned semiconductor product internal structure imaging system, comprising:
将待测物体放置在光调制装置与接收装置之间,开启发射装置、光调制装置、接收装置及远程终端设备;Place the object to be measured between the optical modulation device and the receiving device, and turn on the transmitting device, the optical modulation device, the receiving device and the remote terminal equipment;
通过发射装置向光调制装置发出第一太赫兹波,将发射装置发射的第一太赫兹波进行空间编码形成具有空间分布的第二太赫兹波,并穿透待测物体得到包含待测物体的内部结构图像数据的第三太赫兹波;The first terahertz wave is sent to the light modulation device through the transmitting device, the first terahertz wave emitted by the transmitting device is spatially encoded to form a second terahertz wave with a spatial distribution, and penetrates the object to be measured to obtain a terahertz wave containing the object to be measured. The third terahertz wave of the internal structure image data;
通过接收装置接收第三太赫兹波并转化成电信号,将电信号发送至远程终端设备;The third terahertz wave is received by the receiving device and converted into an electrical signal, and the electrical signal is sent to the remote terminal equipment;
通过远程终端设备从电信号中提取图像数据并构建待测物体的内部结构图像。The image data is extracted from the electrical signal through the remote terminal equipment and the internal structure image of the object to be measured is constructed.
优选地,所述“通过远程终端设备从电信号中提取图像数据并构建待测物体的内部结构图像”步骤之后,该方法还包括处理步骤:Preferably, after the step of "extracting image data from electrical signals through a remote terminal device and constructing an image of the internal structure of the object to be measured", the method further includes a processing step:
对所述内部结构图像进行平滑去噪处理及灰度拉伸处理得到清晰度提升的第一图像。Smoothing and denoising processing and grayscale stretching processing are performed on the internal structure image to obtain a first image with improved definition.
优选地,所述“对所述内部结构图像进行平滑去噪处理及灰度拉伸处理得到清晰度提升的第一图像”步骤还包括:Preferably, the step of "smoothing and denoising the internal structure image and grayscale stretching to obtain a first image with improved clarity" further comprises:
在对所述内部结构图像进行平滑去噪处理及灰度拉伸处理后进行二值化处理,得到二值化图像;After smoothing and denoising processing and grayscale stretching processing, the internal structure image is subjected to binarization processing to obtain a binarized image;
对所述二值化图像进行边缘检测,获取所待测物体的轮廓区域,去除所述二值化图像中的背景区域得到所述第一图像。Perform edge detection on the binarized image, obtain the contour area of the object to be measured, and remove the background area in the binarized image to obtain the first image.
本发明提出的半导体产品内部结构成像系统及方法,半导体产品内部结构成像系统包括:用于发射第一太赫兹波的发射装置;靠近所述发射装置的发射端设置的光调制装置,用于将所述发射装置发射的第一太赫兹波进行空间编码形成具有空间分布的第二太赫兹波,并穿透待测物体得到包含所述待测物体的内部结构图像数据的第三太赫兹波;相对于所述光调制装置设置的接收装置,用于接收所述第三太赫兹波并转化成电信号;及与所述接收装置电连接的远程终端设备,用于接收所述电信号并提取所述图像数据构建所述待测物体的内部结构图像。本发明具有使成像后的图像轮廓更清晰,成像精度更高的优点。The imaging system and method for the internal structure of a semiconductor product proposed by the present invention, the imaging system for the internal structure of a semiconductor product includes: an emission device for emitting the first terahertz wave; a light modulation device disposed near the emission end of the emission device, used for The first terahertz wave emitted by the transmitting device is spatially encoded to form a second terahertz wave with spatial distribution, and penetrates the object to be measured to obtain a third terahertz wave containing image data of the internal structure of the object to be measured; a receiving device arranged relative to the light modulation device, for receiving the third terahertz wave and converting it into an electrical signal; and a remote terminal device electrically connected to the receiving device for receiving the electrical signal and extracting the electrical signal The image data constructs an image of the internal structure of the object to be measured. The present invention has the advantages of making the contour of the imaged image clearer and the imaging accuracy higher.
附图说明Description of drawings
为了更清楚地说明本发明实施例或现有技术中的技术方案,下面将对实施例或现有技术描述中所需要使用的附图作简单地介绍,显而易见地,下面描述中的附图仅仅是本发明的一些实施例,对于本领域普通技术人员来讲,在不付出创造性劳动的前提下,还可以根据这些附图示出的结构获得其他的附图。In order to explain the embodiments of the present invention or the technical solutions in the prior art more clearly, the following briefly introduces the accompanying drawings that need to be used in the description of the embodiments or the prior art. Obviously, the accompanying drawings in the following description are only These are some embodiments of the present invention, and for those of ordinary skill in the art, other drawings can also be obtained according to the structures shown in these drawings without creative efforts.
图1是本发明实施例中半导体产品内部结构成像系统的结构示意图;1 is a schematic structural diagram of an imaging system for the internal structure of a semiconductor product in an embodiment of the present invention;
图2是本发明实施例中半导体产品内部结构成像系统的成像方法流程图。FIG. 2 is a flowchart of an imaging method of an imaging system for an internal structure of a semiconductor product in an embodiment of the present invention.
附图标记:1、发射装置;11、飞秒激光仪;12、光电导发射器;2、光调制装置;21、空间光调制器;22、半导体激光器;23、数字光处理器;3、待测物体;4、接收装置;5、第一透镜;6、第二透镜;7、信号放大器。Reference signs: 1. Transmitting device; 11. Femtosecond laser; 12. Photoconductive transmitter; 2. Optical modulation device; 21. Spatial light modulator; 22. Semiconductor laser; 23. Digital light processor; 3. Object to be measured; 4. Receiving device; 5. First lens; 6. Second lens; 7. Signal amplifier.
具体实施方式Detailed ways
下面将结合本发明实施例中的附图,对本发明实施例中的技术方案进行清楚、完整地描述,显然,所描述的实施例仅仅是本发明的一部分实施例,而不是全部的实施例。基于本发明中的实施例,本领域普通技术人员在没有作出创造性劳动前提下所获得的所有其他实施例,都属于本发明保护的范围。The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only a part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those of ordinary skill in the art without creative efforts shall fall within the protection scope of the present invention.
需要说明,本发明实施例中所有方向性指示(诸如上、下、左、右、前、后……)仅用于解释在某一特定姿态(如附图所示)下各部件之间的相对位置关系、运动情况等,如果该特定姿态发生改变时,则该方向性指示也相应地随之改变。It should be noted that all directional indications (such as up, down, left, right, front, back, etc.) in the embodiments of the present invention are only used to explain the relationship between various components under a certain posture (as shown in the accompanying drawings). The relative positional relationship, the movement situation, etc., if the specific posture changes, the directional indication also changes accordingly.
还需要说明的是,当元件被称为“固定于”或“设置于”另一个元件上时,它可以直接在另一个元件上或者可能同时存在居中元件。当一个元件被称为是“连接”另一个元件,它可以是直接连接另一个元件或者可能同时存在居中元件。It will also be noted that when an element is referred to as being "fixed to" or "disposed on" another element, it can be directly on the other element or intervening elements may also be present. When an element is referred to as being "connected" to another element, it can be directly connected to the other element or intervening elements may also be present.
另外,在本发明中涉及“第一”“第二”等的描述仅用于描述目的,而不能理解为指示或暗示其相对重要性或者隐含指明所指示的技术特征的数量。由此,限定有“第一”“第二”的特征可以明示或者隐含地包括至少一个该特征。另外,各个实施例之间的技术方案可以相互结合,但是必须是以本领域普通技术人员能够实现为基础,当技术方案的结合出现相互矛盾或无法实现时应当认为这种技术方案的结合不存在,也不在本发明要求的保护范围之内。In addition, the descriptions involving "first", "second", etc. in the present invention are only for descriptive purposes, and should not be understood as indicating or implying their relative importance or implying the number of indicated technical features. Thus, a feature defined as "first" and "second" may expressly or implicitly include at least one of that feature. In addition, the technical solutions between the various embodiments can be combined with each other, but must be based on the realization by those of ordinary skill in the art. When the combination of technical solutions is contradictory or cannot be realized, it should be considered that the combination of such technical solutions does not exist. , is not within the scope of protection required by the present invention.
本发明一方面提供了一种半导体产品内部结构成像系统。One aspect of the present invention provides an imaging system for the internal structure of a semiconductor product.
请参考图1,为本发明提供的一种半导体产品内部结构成像系统的整体结构示意图。该系统包括:用于发射第一太赫兹波的发射装置1;靠近所述发射装置1的发射端设置的光调制装置2,用于将所述发射装置1发射的第一太赫兹波进行空间编码形成具有空间分布的第二太赫兹波,并穿透待测物体3得到包含所述待测物体3的内部结构图像数据的第三太赫兹波;相对于所述光调制装置2设置的接收装置4,用于接收所述第三太赫兹波并转化成电信号;及与所述接收装置4电连接的远程终端设备,用于接收所述电信号并提取所述图像数据构建所述待测物体3的内部结构图像。Please refer to FIG. 1 , which is a schematic diagram of the overall structure of an imaging system for the internal structure of a semiconductor product provided by the present invention. The system includes: a transmitting device 1 for transmitting a first terahertz wave; a light modulation device 2 disposed near the transmitting end of the transmitting device 1 for spatially conducting the first terahertz wave transmitted by the transmitting device 1 Encoding forms a second terahertz wave with a spatial distribution, and penetrates the object to be measured 3 to obtain a third terahertz wave containing the image data of the internal structure of the object to be measured 3; A device 4 for receiving the third terahertz wave and converting it into an electrical signal; and a remote terminal device electrically connected to the receiving device 4 for receiving the electrical signal and extracting the image data to construct the to-be-to-be The internal structure image of the
在本实施例中,半导体产品内部结构成像系统包括发射装置1、光调制装置2、接收装置4及远程终端设备。In this embodiment, the imaging system for the internal structure of a semiconductor product includes a transmitting device 1 , a light modulation device 2 , a receiving device 4 and a remote terminal device.
具体地,发射装置1包括飞秒激光仪11及光电导发射器12,通过飞秒激光仪11激活光导电发射器能够发射第一太赫兹波。Specifically, the transmitting device 1 includes a femtosecond laser 11 and a
光调制装置2靠近发射装置1的发射端设置,用于将发射装置1发射的第一太赫兹波进行空间编码形成具有空间分布的第二太赫兹波,并穿透待测物体3后能够得到包含待测物体3的内部结构图像数据的第三太赫兹波。The light modulation device 2 is arranged close to the transmitting end of the transmitting device 1, and is used to spatially encode the first terahertz wave emitted by the transmitting device 1 to form a second terahertz wave with a spatial distribution, and can be obtained after penetrating the object to be measured 3. The third terahertz wave containing the image data of the internal structure of the
其中,待测物体3可以是半导体芯片,通过太赫兹波穿透半导体芯片的封装材料和PCB板,从而获取半导体芯片内部的电路结构图像,为后续识别半导体产品内部结构是否存在缺陷做准备,同时太赫兹波不会对现场工作人员造成人身伤害。Among them, the object to be tested 3 can be a semiconductor chip, and the packaging material and PCB board of the semiconductor chip are penetrated by terahertz waves, so as to obtain an image of the circuit structure inside the semiconductor chip, so as to prepare for the subsequent identification of whether there are defects in the internal structure of the semiconductor product, and at the same time Terahertz waves will not cause personal injury to field workers.
经过光调制装置2调制后的第一太赫兹波形成具有空间分布的第二太赫兹波,使得太赫兹波在穿透待测物体3之前具有完整的结构特性,即经过光调直装置调制后的第二太赫兹波形成与待测物体3的内部结构轮廓一致的结构光,在穿透待测物体3的过程中与待测物体3的内部结构轮廓更加吻合,使成像后的图像轮廓更清晰,成像精度更高,解决了由于太赫兹波极限分辨率的限制,现有的太赫兹光谱成像存在成像分辨率相对较低的技术难题。The first terahertz wave modulated by the light modulation device 2 forms a second terahertz wave with spatial distribution, so that the terahertz wave has complete structural characteristics before penetrating the object to be measured 3, that is, after being modulated by the light straightening device The second terahertz wave forms a structured light that is consistent with the internal structure outline of the object to be measured 3, and is more consistent with the internal structure outline of the object to be measured 3 in the process of penetrating the object to be measured 3, so that the contour of the image after imaging is more accurate. It is clear and has higher imaging accuracy, which solves the technical problem of relatively low imaging resolution in existing terahertz spectral imaging due to the limitation of the limit resolution of terahertz waves.
接收装置4相对于光调制装置2设置,优选为与光电导发射器12对应的光电导接收器,用于接收第三太赫兹波并转化成电信号。The receiving device 4 is arranged relative to the light modulation device 2, preferably a photoconductive receiver corresponding to the
远程终端设备(图中未示出)与接收装置4电连接,优选为具有数据处理能力的计算机,用于接收电信号并提取图像数据构建待测物体3的内部结构图像。A remote terminal device (not shown in the figure) is electrically connected to the receiving device 4 , preferably a computer with data processing capability, for receiving electrical signals and extracting image data to construct an image of the internal structure of the object to be measured 3 .
本发明进一步较佳实施例中,如图1所示,所述光调制装置2包括:设于所述发射装置1与所述待测物体3之间的空间光调制器21;设于所述空间光调制器21周侧的半导体激光器22;及设于所述半导体激光器22与所述空间光调制器21之间的数字光处理器23,所述数字光处理器中存储有与所述待测物体3的内部结构轮廓图像一致的掩膜图片;所述半导体激光器发出激光经过所述数字光处理器23在所述空间光调制器21上成像,并使所述空间光调制器21朝向所述发射装置1的一侧面上形成与所述掩膜图片对应的光生载流子层。In a further preferred embodiment of the present invention, as shown in FIG. 1 , the light modulation device 2 includes: a spatial
在本实施例中,光调制装置2包括空间光调制器21、半导体激光器22及数字光处理器23。In this embodiment, the light modulation device 2 includes a spatial
具体地,空间光调制器21设于发射装置1与待测物体3之间,空间光调制器21是指在主动控制下,它可以通过液晶分子调制光场的某个参量,例如通过调制光场的振幅,通过折射率调制相位,通过偏振面的旋转调制偏振态,或是实现非相干与相干光的转换,从而将一定的信息写入光波中,达到光波调制的目的。它可以方便地将信息加载到一维或二维的光场中,利用光的宽带宽,多通道并行处理等优点对加载的信息进行快速处理。Specifically, the spatial
半导体激光器22设于空间光调制器21的周侧,例如设置在空间光调制器21的上方或下方。The
数字光处理器23(DLP)设于半导体激光器22与空间光调制器21之间,数字光处理器中存储有与待测物体3的内部结构轮廓图像一致的掩膜图片,且空间光调制器21上设有扫描点阵列,扫描点阵列在空间光调制器21上的范围覆盖经过第一透镜5后第一太赫兹波的投射范围,使得半导体激光器发出激光经过数字光处理器23在空间光调制器21上成像,并使空间光调制器21朝向发射装置1的一侧面上形成与掩膜图片对应的光生载流子层,由于光生载流子层能阻止第一太赫兹波通过光调制器,使得穿过光调制器的第一太赫兹波形成具有空间分布的第二太赫兹波。A digital light processor 23 (DLP) is arranged between the
本发明进一步较佳实施例中,如图1所示,该系统还包括:设于所述发射装置1与所述空间光调制器之间、用于将所述发射装置1发射的第一太赫兹波从发散光束转化成平行光束的第一透镜5。In a further preferred embodiment of the present invention, as shown in FIG. 1 , the system further includes: a first solar module disposed between the transmitting device 1 and the spatial light modulator and used for transmitting the transmitting device 1 The first lens 5 converts the Hertzian wave from a diverging beam to a parallel beam.
在本实施例中,该系统还包括设于发射装置1与空间光调制器之间的第一透镜5,利用第一透镜5能够将发射装置1发射的第一太赫兹波从发散光束转化成平行光束,利于穿透光调制器后形成具有完整空间分布的第二太赫兹波。In this embodiment, the system further includes a first lens 5 disposed between the emission device 1 and the spatial light modulator, and the first lens 5 can convert the first terahertz wave emitted by the emission device 1 from a diverging beam into a The parallel beam is beneficial to form a second terahertz wave with complete spatial distribution after penetrating the light modulator.
本发明进一步较佳实施例中,如图1所示,所述光调制装置2还包括:设于所述半导体激光器22与所述数字光处理器23之间的第二透镜6,用于将所述半导体激光器22发出的激光聚焦于所述数字光处理器23上。In a further preferred embodiment of the present invention, as shown in FIG. 1 , the light modulation device 2 further includes: a second lens 6 disposed between the
在本实施例中,光调制装置2还包括设于半导体激光器22与数字光处理器23之间的第二透镜6,利用第二透镜6能够将半导体激光器22发出的激光聚焦于数字光处理器23上,实现照射数字光处理器23之前的激光光路方向统一。In this embodiment, the light modulation device 2 further includes a second lens 6 arranged between the
本发明进一步较佳实施例中,如图1所示,该系统还包括:设于所述待测物体3与所述接收装置4之间的信号放大器7,用于过滤所述第三太赫兹波中的噪声。In a further preferred embodiment of the present invention, as shown in FIG. 1 , the system further includes: a signal amplifier 7 disposed between the object to be measured 3 and the receiving device 4 for filtering the third terahertz noise in waves.
由于太赫兹对半导体成像过程中容易出现信噪比较低的现象。如果直接采用数据采集卡采集接受装置的电信号,电信号的噪声较大,当电信号的变化量较为微弱时,电信号会被噪声淹没,无法被有效识别,使得该像素点成为盲点。为了解决电信号较弱被噪声淹没的问题,在本实施例中,通过选择信号放大器7来滤除噪声,提高系统的信噪比。信号放大器7的原理是利用外差式振荡技术,把被测量的信号通过频率变换的方式转变成为直流。即利用信号放大器7中的信号相关原理,对两个混有噪声的周期信号进行相乘和积分处理后,将信号从噪声中检测出来,并达到通过互相关运算削弱噪声影响的目的。The phenomenon of low signal-to-noise ratio is prone to occur in the process of terahertz imaging of semiconductors. If the data acquisition card is directly used to collect the electrical signal of the receiving device, the noise of the electrical signal is relatively large. When the variation of the electrical signal is relatively weak, the electrical signal will be overwhelmed by the noise and cannot be effectively identified, making the pixel a blind spot. In order to solve the problem that the weak electrical signal is submerged by noise, in this embodiment, the signal amplifier 7 is selected to filter out the noise to improve the signal-to-noise ratio of the system. The principle of the signal amplifier 7 is to use the heterodyne oscillation technique to convert the measured signal into a direct current by means of frequency conversion. That is, using the signal correlation principle in the signal amplifier 7, after multiplying and integrating two periodic signals mixed with noise, the signal is detected from the noise, and the purpose of weakening the influence of the noise through cross-correlation operation is achieved.
本发明另一方面提供了如上述的半导体产品内部结构成像系统的成像方法,如图2所示,包括:Another aspect of the present invention provides the imaging method of the above-mentioned semiconductor product internal structure imaging system, as shown in FIG. 2 , including:
S1:将待测物体3放置在光调制装置2与接收装置4之间,开启发射装置1、光调制装置2、接收装置4及远程终端设备;S1: Place the object to be measured 3 between the light modulation device 2 and the receiving device 4, and turn on the transmitting device 1, the light modulation device 2, the receiving device 4 and the remote terminal equipment;
S2:通过发射装置1向光调制装置2发出第一太赫兹波,将发射装置1发射的第一太赫兹波进行空间编码形成具有空间分布的第二太赫兹波,并穿透待测物体3得到包含待测物体3的内部结构图像数据的第三太赫兹波;S2: Send the first terahertz wave to the light modulation device 2 through the transmitting device 1, perform spatial encoding on the first terahertz wave emitted by the transmitting device 1 to form a second terahertz wave with a spatial distribution, and penetrate the object to be measured 3 obtaining the third terahertz wave containing the image data of the internal structure of the object to be measured 3;
S3:通过接收装置4接收第三太赫兹波并转化成电信号,将电信号发送至远程终端设备;S3: Receive the third terahertz wave through the receiving device 4 and convert it into an electrical signal, and send the electrical signal to the remote terminal device;
S4:通过远程终端设备从电信号中提取图像数据并构建待测物体3的内部结构图像。S4 : extracting image data from the electrical signal through a remote terminal device and constructing an image of the internal structure of the object to be measured 3 .
进一步地,为了提升后续识别内部结构图像中是否存在产品缺陷的情况,在本实施例中,还通过对内部结构图形进行处理得到清晰度更高的第一图像。Further, in order to improve the subsequent identification of whether there is a product defect in the internal structure image, in this embodiment, a first image with higher definition is also obtained by processing the internal structure image.
具体地,“对所述内部结构图像进行处理得到第一图像”步骤包括:Specifically, the step of "processing the internal structure image to obtain the first image" includes:
对所述内部结构图像进行平滑去噪处理及灰度拉伸处理得到清晰度提升的第一图像。Smoothing and denoising processing and grayscale stretching processing are performed on the internal structure image to obtain a first image with improved definition.
其中,平滑去噪处理采用高斯滤波,能够去除图像中的噪点,提升图像的清晰度。灰度拉伸处理能够提升图像的对比度,进而提升图像的清晰度。Among them, the smoothing denoising process adopts Gaussian filtering, which can remove the noise in the image and improve the clarity of the image. Grayscale stretching can improve the contrast of the image, thereby improving the clarity of the image.
在另一实施例中,“对所述内部结构图像进行处理得到第一图像”步骤还包括:In another embodiment, the step of "processing the internal structure image to obtain the first image" further includes:
在对所述内部结构图像进行平滑去噪处理及灰度拉伸处理后进行二值化处理,得到二值化图像;After smoothing and denoising processing and grayscale stretching processing, the internal structure image is subjected to binarization processing to obtain a binarized image;
对所述二值化图像进行边缘检测,获取所述半导体产品的轮廓区域,去除所述二值化图像中的背景区域得到所述第一图像。Perform edge detection on the binarized image to obtain the contour area of the semiconductor product, and remove the background area in the binarized image to obtain the first image.
在本实施例中,通过边缘检测技术从二值化图像中获取半导体产品的轮廓区域,并去除二值化图像中的背景区域,缩小检测区域,进而提升对内部结构图像的识别准确性和减少系统的数据处理压力。In this embodiment, the contour area of the semiconductor product is obtained from the binarized image through the edge detection technology, and the background area in the binarized image is removed to reduce the detection area, thereby improving the recognition accuracy of the internal structure image and reducing the The data processing pressure of the system.
需要说明的是,对于前述的各实施例,为了简单描述,故将其都表述为一系列的动作组合,但是本领域技术人员应该知悉,本发明并不受所描述的动作顺序的限制,因为依据本发明,某些步骤可能采用其他顺序或者同时进行。其次,本领域技术人员也应该知悉,说明书中所描述的实施例均属于优选实施例,涉及的动作和模块并不一定是本发明所必须的。It should be noted that, for the sake of simple description, the foregoing embodiments are expressed as a series of action combinations, but those skilled in the art should know that the present invention is not limited by the described action sequence, because Certain steps may be performed in other sequences or simultaneously in accordance with the present invention. Secondly, those skilled in the art should also know that the embodiments described in the specification are all preferred embodiments, and the actions and modules involved are not necessarily required by the present invention.
本申请所提供的几个实施例中,应该理解到,所揭露的装置,可通过其他的方式实现。例如,以上所描述的装置实施例仅仅是示意性的,例如上述单元的划分,仅仅为一种逻辑功能划分,实际实现时可以有另外的划分方式,例如多个单元或组件可以结合或者可以集成到另一个系统,或一些特征可以忽略,或不执行。另一点,所显示或讨论的相互之间的耦合或通信连接可以是通过一些接口,装置或单元之间的间接耦合或通信连接,可以是电信或者其它的形式。In the several embodiments provided in this application, it should be understood that the disclosed apparatus may be implemented in other manners. For example, the device embodiments described above are only illustrative. For example, the division of the above-mentioned units is only a logical function division. In actual implementation, there may be other division methods. For example, multiple units or components may be combined or integrated. to another system, or some features can be ignored, or not implemented. On the other hand, the shown or discussed mutual coupling or communication connection may be through some interfaces, indirect coupling or communication connection between devices or units, and may be in telecommunication or other forms.
上述作为分离部件说明的单元可以是或者也可以不是物理上分开的,作为单元显示的部件可以是或者也可以不是物理单元,即可以位于一个地方,或者也可以分布到多个网络单元上。可以根据实际的需要选择其中的部分或者全部单元来实现本实施例方案的目的。The units described above as separate components may or may not be physically separated, and components shown as units may or may not be physical units, that is, may be located in one place, or may be distributed to multiple network units. Some or all of the units may be selected according to actual needs to achieve the purpose of the solution in this embodiment.
以上实施例仅用以说明本发明的技术方案,而非对发明的保护范围进行限制。显然,所描述的实施例仅仅是本发明部分实施例,而不是全部实施例。基于这些实施例,本领域普通技术人员在没有作出创造性劳动前提下所获得的所有其他实施例,都属于本发明所要保护的范围。尽管参照上述实施例对本发明进行了详细的说明,本领域普通技术人员依然可以在不冲突的情况下,不作出创造性劳动对本发明各实施例中的特征根据情况相互组合、增删或作其他调整,从而得到不同的、本质未脱离本发明的构思的其他技术方案,这些技术方案也同样属于本发明所要保护的范围。The above embodiments are only used to illustrate the technical solutions of the present invention, but not to limit the protection scope of the invention. Obviously, the described embodiments are only some, but not all, embodiments of the present invention. Based on these embodiments, all other embodiments obtained by those of ordinary skill in the art without creative efforts shall fall within the scope of protection of the present invention. Although the present invention has been described in detail with reference to the above-mentioned embodiments, those of ordinary skill in the art can still combine, add or delete, or make other adjustments to the features in the various embodiments of the present invention according to the situation without making any creative efforts. As a result, other technical solutions that are different and do not essentially depart from the concept of the present invention are obtained, and these technical solutions also belong to the scope of protection of the present invention.
Claims (10)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202011128946.8A CN112014329B (en) | 2020-10-21 | 2020-10-21 | Imaging system and method for internal structure of semiconductor product |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202011128946.8A CN112014329B (en) | 2020-10-21 | 2020-10-21 | Imaging system and method for internal structure of semiconductor product |
Publications (2)
Publication Number | Publication Date |
---|---|
CN112014329A true CN112014329A (en) | 2020-12-01 |
CN112014329B CN112014329B (en) | 2021-04-20 |
Family
ID=73527411
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN202011128946.8A Active CN112014329B (en) | 2020-10-21 | 2020-10-21 | Imaging system and method for internal structure of semiconductor product |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN112014329B (en) |
Citations (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2013002859A (en) * | 2011-06-14 | 2013-01-07 | Toshiba Corp | Inspection apparatus and inspection method using terahertz wave |
CN104517270A (en) * | 2014-12-25 | 2015-04-15 | 深圳市一体太赫兹科技有限公司 | Terahertz image processing method and system |
CN106353634A (en) * | 2016-10-17 | 2017-01-25 | 深圳市太赫兹科技创新研究院 | Terahertz time-domain reflecting system |
CN106932357A (en) * | 2017-03-09 | 2017-07-07 | 南开大学 | A kind of super diffraction limit of resolution terahertz light spectrum imaging system |
CN108956526A (en) * | 2018-06-22 | 2018-12-07 | 西安天和防务技术股份有限公司 | A kind of passive type Terahertz hazardous material detection device, detection method and its application |
CN109001833A (en) * | 2018-06-22 | 2018-12-14 | 天和防务技术(北京)有限公司 | A kind of Terahertz hazardous material detection method based on deep learning |
US10215695B1 (en) * | 2018-04-25 | 2019-02-26 | Globalfoundries Inc. | Inspection system and method for detecting defects at a materials interface |
CN208569203U (en) * | 2018-07-02 | 2019-03-01 | 天津大学 | Terahertz structured light modulation device for super-resolution imaging |
CN109632840A (en) * | 2018-12-17 | 2019-04-16 | 深圳市华讯方舟太赫兹科技有限公司 | Terahertz micro imaging system and imaging method |
WO2019199019A1 (en) * | 2018-04-11 | 2019-10-17 | 한양대학교 산학협력단 | Terahertz wave-based defect measurement apparatus and method |
CN110376135A (en) * | 2019-08-08 | 2019-10-25 | 中国人民解放军军事科学院国防科技创新研究院 | A kind of Terahertz super-resolution micro imaging system |
-
2020
- 2020-10-21 CN CN202011128946.8A patent/CN112014329B/en active Active
Patent Citations (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2013002859A (en) * | 2011-06-14 | 2013-01-07 | Toshiba Corp | Inspection apparatus and inspection method using terahertz wave |
CN104517270A (en) * | 2014-12-25 | 2015-04-15 | 深圳市一体太赫兹科技有限公司 | Terahertz image processing method and system |
CN106353634A (en) * | 2016-10-17 | 2017-01-25 | 深圳市太赫兹科技创新研究院 | Terahertz time-domain reflecting system |
CN106932357A (en) * | 2017-03-09 | 2017-07-07 | 南开大学 | A kind of super diffraction limit of resolution terahertz light spectrum imaging system |
WO2019199019A1 (en) * | 2018-04-11 | 2019-10-17 | 한양대학교 산학협력단 | Terahertz wave-based defect measurement apparatus and method |
US10215695B1 (en) * | 2018-04-25 | 2019-02-26 | Globalfoundries Inc. | Inspection system and method for detecting defects at a materials interface |
CN108956526A (en) * | 2018-06-22 | 2018-12-07 | 西安天和防务技术股份有限公司 | A kind of passive type Terahertz hazardous material detection device, detection method and its application |
CN109001833A (en) * | 2018-06-22 | 2018-12-14 | 天和防务技术(北京)有限公司 | A kind of Terahertz hazardous material detection method based on deep learning |
CN208569203U (en) * | 2018-07-02 | 2019-03-01 | 天津大学 | Terahertz structured light modulation device for super-resolution imaging |
CN109632840A (en) * | 2018-12-17 | 2019-04-16 | 深圳市华讯方舟太赫兹科技有限公司 | Terahertz micro imaging system and imaging method |
CN110376135A (en) * | 2019-08-08 | 2019-10-25 | 中国人民解放军军事科学院国防科技创新研究院 | A kind of Terahertz super-resolution micro imaging system |
Also Published As
Publication number | Publication date |
---|---|
CN112014329B (en) | 2021-04-20 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US10313012B2 (en) | Distributed array for direction and frequency finding | |
CN102621070B (en) | Two-dimensional terahenz imaging system and imaging method thereof | |
US20240056186A1 (en) | Distributed array for direction and frequency finding | |
US20070167816A1 (en) | System and method for optical data transmission in ultrasound imaging | |
CN106983492A (en) | A kind of photoacoustic imaging system | |
TW201344207A (en) | Test system for electromagnetic interference | |
Burford et al. | Terahertz imaging for nondestructive evaluation of packaged power electronic devices | |
FR2906612A1 (en) | METHOD AND DEVICE FOR TOMOGRAPHY BY ELECTRIC IMPEDANCE. | |
CN205411151U (en) | Ultrafast optoacoustic image device based on array detector | |
CN105043524B (en) | A kind of method for detecting vibration based on the imaging of laser speckle defocus | |
CN112014329A (en) | Imaging system and method for internal structure of semiconductor product | |
KR101264099B1 (en) | Apparatus and method for inspecting void of multi-junction semiconductor | |
CN202614666U (en) | Two-dimensional Terahertz imaging system | |
CN113418932A (en) | Semiconductor wafer nondestructive inspection device and method | |
CN106599668B (en) | A Target Identification System | |
JPH10501894A (en) | Ultrasound / vibration using polarization beating in a microchip laser | |
TWI286023B (en) | Optoelectric sensing system for electric field signal | |
CN105487077B (en) | The location estimation method of audible target under water based on laser multiple spot coherent detection and the device for realizing this method | |
CN114159092B (en) | Inspection device and system, ultrasonic diagnostic device, acoustic coupling device, and storage medium | |
CN116879820A (en) | Magnetic imaging device and method based on diamond NV color center under high pressure | |
CN115113231A (en) | Laser radar imaging system, method, electronic equipment and storage medium | |
CN107643289A (en) | A kind of transparent material micro devices bonding quality detecting system | |
CN113176209B (en) | An Ultrasound Modulation Optical Imaging Method | |
CN211602920U (en) | Terahertz wave excitation transmission system | |
CN109839438A (en) | The bubble detection device of organic LED panel |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PB01 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
GR01 | Patent grant | ||
GR01 | Patent grant |