CN111112172B - Cleaning device for silicon wafer processing - Google Patents
Cleaning device for silicon wafer processing Download PDFInfo
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- CN111112172B CN111112172B CN201911396911.XA CN201911396911A CN111112172B CN 111112172 B CN111112172 B CN 111112172B CN 201911396911 A CN201911396911 A CN 201911396911A CN 111112172 B CN111112172 B CN 111112172B
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- Prior art keywords
- fixedly connected
- wall
- cleaning frame
- cleaning
- frame
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- 238000004140 cleaning Methods 0.000 title claims abstract description 63
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title claims abstract description 41
- 229910052710 silicon Inorganic materials 0.000 title claims abstract description 41
- 239000010703 silicon Substances 0.000 title claims abstract description 41
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 36
- 239000007921 spray Substances 0.000 claims abstract description 6
- 238000003860 storage Methods 0.000 claims description 13
- 238000009434 installation Methods 0.000 claims description 8
- 238000005485 electric heating Methods 0.000 claims description 7
- 239000000428 dust Substances 0.000 claims description 3
- 238000007789 sealing Methods 0.000 claims description 3
- 239000000463 material Substances 0.000 abstract description 4
- 238000007599 discharging Methods 0.000 abstract 1
- 235000012431 wafers Nutrition 0.000 description 27
- 238000005406 washing Methods 0.000 description 6
- 230000000694 effects Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005468 ion implantation Methods 0.000 description 1
- 238000001259 photo etching Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
Images
Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B1/00—Cleaning by methods involving the use of tools
- B08B1/30—Cleaning by methods involving the use of tools by movement of cleaning members over a surface
- B08B1/32—Cleaning by methods involving the use of tools by movement of cleaning members over a surface using rotary cleaning members
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B1/00—Cleaning by methods involving the use of tools
- B08B1/10—Cleaning by methods involving the use of tools characterised by the type of cleaning tool
- B08B1/12—Brushes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B13/00—Accessories or details of general applicability for machines or apparatus for cleaning
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/02—Cleaning by the force of jets or sprays
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F26—DRYING
- F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
- F26B21/00—Arrangements or duct systems, e.g. in combination with pallet boxes, for supplying and controlling air or gases for drying solid materials or objects
- F26B21/001—Drying-air generating units, e.g. movable, independent of drying enclosure
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F26—DRYING
- F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
- F26B21/00—Arrangements or duct systems, e.g. in combination with pallet boxes, for supplying and controlling air or gases for drying solid materials or objects
- F26B21/004—Nozzle assemblies; Air knives; Air distributors; Blow boxes
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
The invention discloses a cleaning device for silicon wafer processing, which comprises a cleaning frame, wherein a forward and reverse rotating motor is fixedly connected to the outer wall of one side of the cleaning frame, a threaded lead screw is fixedly connected to one end, extending into the cleaning frame, of an output shaft of the forward and reverse rotating motor, one end of the threaded lead screw is rotatably connected with the inner wall of one side of the cleaning frame through a bearing, a movable seat is in threaded connection with the outer wall of the threaded lead screw, a supporting pad is fixedly connected to the middle position of the top of the movable seat, a material placing table is fixedly connected to the top of the supporting pad, a plurality of material placing grooves are formed in the top of the material placing table, and a first electric push rod is fixedly connected to one side of the top of the cleaning frame. According to the invention, the water is sprayed on the object placing table by using the water discharging pipe and the spray head to drive the annular brush plate and the bristles to rotate, so that the silicon wafer is cleaned, manual cleaning operation is replaced, the cleaned silicon wafer can be conveniently dried, and the working efficiency of the device is improved.
Description
Technical Field
The invention relates to the technical field of silicon wafer processing, in particular to a cleaning device for silicon wafer processing.
Background
The silicon chip is a raw material for manufacturing transistors and integrated circuits, is an important material for manufacturing the integrated circuits, can be manufactured into various semiconductor devices by means of photoetching, ion implantation and the like, and has remarkable computing capability. The development of semiconductors is continuously driven by the development of scientific technology. The development of automation and computers, etc. has reduced the cost of silicon wafers, a high-tech product, to a very low level.
At present, when an existing silicon wafer is processed, the surface of the silicon wafer needs to be cleaned, and people mostly operate manually when cleaning the silicon wafer, so that the labor intensity of people is increased, and the problem of silicon wafer damage is also caused when cleaning the silicon wafer, therefore, a cleaning device for processing the silicon wafer is needed to be designed to solve the problem.
Disclosure of Invention
The invention aims to solve the defects in the prior art and provides a cleaning device for processing silicon wafers.
In order to achieve the purpose, the invention adopts the following technical scheme:
a cleaning device for processing silicon wafers comprises a cleaning frame, wherein a positive and negative rotating motor is fixedly connected to the outer wall of one side of the cleaning frame, an output shaft of the positive and negative rotating motor extends into one end of a threaded lead screw fixedly connected in the cleaning frame, one end of the threaded lead screw is rotatably connected with the inner wall of one side of the cleaning frame through a bearing, the outer wall of the threaded lead screw is in threaded connection with a movable seat, a supporting pad is fixedly connected to the middle position of the top of the movable seat, a placing table is fixedly connected to the top of the supporting pad, a plurality of placing grooves are formed in the top of the placing table, a first electric push rod is fixedly connected to one side of the top of the cleaning frame, a mounting plate is fixedly connected to the bottom of a piston rod of the first electric push rod, a rotating motor is fixedly connected to the bottom of the mounting plate, a movable disc is fixedly connected to the bottom of the output shaft of the rotating motor, and an annular brush plate is fixedly connected to the bottom of the movable disc, the bottom of the annular brush plate is bonded with brush hair.
Preferably: wash the bottom inner wall fixedly connected with reservoir chamber of frame, and the bottom inner wall fixedly connected with suction pump of reservoir chamber, the top fixedly connected with of suction pump extends the drain pipe that washs the frame, and the one end fixedly connected with shower nozzle in the drain pipe extension washing frame.
Preferably: and a water outlet is formed in the bottom of one side of the water storage chamber and the bottom of one side of the cleaning frame, and a sealing plug is inserted into the inner wall of the water outlet.
Preferably: the bottom of the storage groove is provided with a plurality of water leakage holes.
Preferably: and a guide rod is fixedly connected between the inner walls of the opposite sides of the cleaning frame, and the outer wall of the guide rod is slidably connected with a sliding seat fixedly connected with the outer wall of the bottom of the movable seat.
Preferably: wash top one side inner wall fixedly connected with installing frame of frame, and the top inner wall fixedly connected with fan of installing frame, the top of installing frame and the top of wasing the frame are opened and are had a plurality of air vents, and the inner wall fixedly connected with dust screen of air vent leads, and the bottom of installing frame is opened there is the gas outlet.
Preferably: and the inner wall of the opposite side of the mounting frame is fixedly connected with an electric heating wire.
Preferably: the four corners of the bottom of the cleaning frame are fixedly connected with universal wheels.
Preferably: the utility model discloses a put thing platform, including the bottom inner wall, the bottom inner wall intermediate position fixedly connected with second electric putter, the piston end top fixedly connected with movable rod of second electric putter, the movable rod extends into the one end fixedly connected with push pedal of putting the thing inslot.
The invention has the beneficial effects that:
1. the silicon chip cleaning machine comprises a placing table, a placing groove, a water leakage hole, a first electric push rod, a mounting plate, a rotating motor, a movable disc, an annular brush plate, bristles, a water storage chamber, a water suction pump, a water discharge pipe and a spray head, wherein a silicon chip is placed in the placing groove;
2. the air in the installation frame is heated by the electric heating wire through the forward and reverse rotating motor, the threaded screw rod, the movable seat, the installation frame, the fan and the electric heating wire, the air in the installation frame is blown by the fan, so that hot air is blown in the cleaning frame, the forward and reverse rotating motor is used for driving the threaded screw rod to rotate to drive the cleaned silicon wafer to move, the silicon wafer falls on the bottom of the installation frame, the cleaned silicon wafer is dried conveniently, and the working efficiency of the device is improved;
3. through the platform of putting, cavity, second electric putter, movable rod, movable groove and the push pedal of setting, utilize second electric putter to adjust the position of movable rod in the movable groove, adjust the height of push pedal in putting the thing groove to silicon wafer promotes in will putting the thing groove, makes the device have the effect of the ejection of compact of being convenient for.
Drawings
FIG. 1 is a schematic view showing the overall structure of a cleaning apparatus for silicon wafer processing according to example 1;
FIG. 2 is a schematic sectional view showing the front side of a cleaning apparatus for silicon wafer processing according to example 1;
fig. 3 is a schematic structural view of an object placing table and a movable plate of the cleaning device for processing silicon wafers in embodiment 1;
FIG. 4 is a schematic view of the structure of an object placing groove and a water leakage hole of the cleaning apparatus for processing silicon wafers in embodiment 1;
fig. 5 is a schematic structural view of a movable rod and a push plate of the cleaning device for processing silicon wafers in embodiment 2.
In the figure: the cleaning device comprises a cleaning frame 1, a storage table 2, a threaded screw rod 3, an air guide port 4, a first electric push rod 5, a movable disc 6, a water storage chamber 7, a water suction pump 8, a movable seat 9, a guide rod 10, an electric heating wire 11, a fan 12, a rotating motor 13, an annular brush plate 14, a spray head 15, a forward and reverse rotating motor 16, a drain pipe 17, a water leakage hole 18, a storage groove 19, a cavity 20, a second electric push rod 21, a movable rod 22 and a push plate 23.
Detailed Description
The technical solution of the present patent will be described in further detail with reference to the following embodiments.
Reference will now be made in detail to embodiments of the present patent, examples of which are illustrated in the accompanying drawings, wherein like or similar reference numerals refer to the same or similar elements or elements having the same or similar function throughout. The embodiments described below with reference to the drawings are exemplary only for the purpose of explaining the present patent and are not to be construed as limiting the present patent.
In the description of this patent, it is to be understood that the terms "center," "upper," "lower," "front," "rear," "left," "right," "vertical," "horizontal," "top," "bottom," "inner," "outer," and the like are used in the orientations and positional relationships indicated in the drawings for the convenience of describing the patent and for the simplicity of description, and are not intended to indicate or imply that the referenced devices or elements must have a particular orientation, be constructed and operated in a particular orientation, and are not to be considered limiting of the patent.
In the description of this patent, it is noted that unless otherwise specifically stated or limited, the terms "mounted," "connected," and "disposed" are to be construed broadly and can include, for example, fixedly connected, disposed, detachably connected, disposed, or integrally connected and disposed. The specific meaning of the above terms in this patent may be understood by those of ordinary skill in the art as appropriate.
Example 1
Referring to fig. 1-4, a cleaning device for silicon wafer processing comprises a cleaning frame 1, wherein a forward and reverse rotation motor 16 is connected to the outer wall of one side of the cleaning frame 1 through a bolt, a threaded lead screw 3 is connected to one end, extending into the cleaning frame 1, of an output shaft of the forward and reverse rotation motor 16 through a bolt, one end of the threaded lead screw 3 is rotatably connected to the inner wall of one side of the cleaning frame 1 through a bearing, a movable seat 9 is connected to the outer wall of the threaded lead screw 3 through a thread, a support pad is welded to the middle position of the top of the movable seat 9, the top of the support pad is connected to a placing table 2 through a bolt, a plurality of placing grooves 19 are formed in the top of the placing table 2, a first electric push rod 5 is connected to one side of the top of the cleaning frame 1 through a bolt, a mounting plate is connected to the bottom of a piston rod of the first electric push rod 5 through a bolt, a rotation motor 13 is connected to the bottom of the mounting plate through a bolt, and a movable plate 6 is connected to the bottom of the output shaft of the rotation motor 13 through a bolt, the bottom of the movable disk 6 is connected with an annular brush plate 14 through bolts, and bristles are bonded to the bottom of the annular brush plate 14.
Wherein, there is reservoir chamber 7 bottom inner wall of washing frame 1 through bolted connection, and there is a suction pump 8 bottom inner wall of reservoir chamber 7 through bolted connection, and there is a drain pipe 17 that extends washing frame 1 at the top of suction pump 8 through bolted connection, and there is shower nozzle 15 through bolted connection in the one end that drain pipe 17 extends into washing frame 1.
Wherein, the bottom of one side of the water storage chamber 7 and the bottom of one side of the cleaning frame 1 are provided with water outlets, and the inner walls of the water outlets are inserted with sealing plugs.
Wherein, the bottom of the object placing groove 19 is provided with a plurality of water leakage holes 18.
Wherein, a guide rod 10 is welded between the inner walls of the opposite sides of the cleaning frame 1, and the outer wall of the guide rod 10 is connected with a sliding seat welded with the outer wall of the bottom of the movable seat 9 in a sliding manner.
Wherein, there is the installing frame washing one side inner wall in top of frame 1 through bolted connection, and there is fan 12 the top inner wall of installing frame through bolted connection, and open the top of installing frame and the top of washing frame 1 has a plurality of air guide mouth 4, and the inner wall of air guide mouth 4 has the dust screen through bolted connection, and open the bottom of installing frame has the gas outlet.
Wherein, the inner wall of the opposite side of the mounting frame is connected with an electric heating wire 11 through a bolt.
Wherein, the four corners of the bottom of the cleaning frame 1 are connected with universal wheels through bolts.
The working principle is as follows: when the cleaning device is used, a user connects the first electric push rod 5, the rotating motor 13 and the forward and reverse rotating motor 16 through wires, places a silicon wafer in the object placing groove 19, adjusts the heights of the mounting plate and the rotating motor 13 through the first electric push rod 5, enables the bristles to be in contact with the object placing table 2, pumps water in the water storage chamber 7 through the water suction pump 8, sprays water on the object placing table 2 through the water discharge pipe 17 and the spray head 15, drives the movable disc 6 to rotate through the rotating motor 13, drives the annular bristle plate 14 and the bristles to rotate, and then cleans the silicon wafer, enables water in the object placing groove 19 to flow back into the water storage chamber 7 through the water leakage holes 18, so as to replace manual cleaning operation, and is convenient to use, the user heats air in the mounting frame through the electric heating wire 11, blows air in the mounting frame through the fan 12, and blows hot air in the cleaning frame 1, the positive and negative rotation motor 16 is used for driving the threaded screw rod 3 to rotate and driving the cleaned silicon wafer to move, so that the silicon wafer falls on the bottom of the mounting frame, the cleaned silicon wafer is convenient to dry, and the working efficiency of the device is improved.
Example 2
Referring to fig. 5, in the embodiment, compared with embodiment 1, a cavity 20 is formed in the middle position of the object placing table 2, a movable groove is formed between the tops of two sides of the cavity 20 and the inner walls of two sides of the object placing groove 19, a second electric push rod 21 is connected to the middle position of the inner wall of the bottom of the cavity 20 through a bolt, a movable rod 22 is connected to the top of the piston end of the second electric push rod 21 through a bolt, and a push plate 23 is connected to one end, extending into the object placing groove 19, of the movable rod 22 through a bolt.
The working principle is as follows: the user passes through the wire with second electric putter 21 and connects the power, utilizes second electric putter 21 to adjust the position of movable rod 22 in the movable groove, adjusts push pedal 23 height in putting thing groove 19 to will put the silicon slice promotion in the thing groove 19, make the device have the effect of the ejection of compact of being convenient for.
The above description is only for the preferred embodiment of the present invention, but the scope of the present invention is not limited thereto, and any person skilled in the art should be considered to be within the technical scope of the present invention, and the technical solutions and the inventive concepts thereof according to the present invention should be equivalent or changed within the scope of the present invention.
Claims (6)
1. A cleaning device for silicon wafer processing comprises a cleaning frame (1) and is characterized in that a forward and reverse rotating motor (16) is fixedly connected to the outer wall of one side of the cleaning frame (1), an output shaft of the forward and reverse rotating motor (16) extends into one end of the cleaning frame (1) and is fixedly connected with a threaded lead screw (3), one end of the threaded lead screw (3) is rotatably connected with the inner wall of one side of the cleaning frame (1) through a bearing, the outer wall of the threaded lead screw (3) is in threaded connection with a movable seat (9), a supporting pad is fixedly connected to the middle position of the top of the movable seat (9), an object placing table (2) is fixedly connected to the top of the supporting pad, a plurality of object placing grooves (19) are formed in the top of the object placing table (2), a first electric push rod (5) is fixedly connected to one side of the top of the cleaning frame (1), and a mounting plate is fixedly connected to the bottom of a piston rod of the first electric push rod (5), the bottom of the mounting plate is fixedly connected with a rotating motor (13), the bottom of an output shaft of the rotating motor (13) is fixedly connected with a movable disc (6), the bottom of the movable disc (6) is fixedly connected with an annular brush plate (14), and bristles are bonded to the bottom of the annular brush plate (14);
the inner wall of one side of the top of the cleaning frame (1) is fixedly connected with an installation frame, the inner wall of the top of the installation frame is fixedly connected with a fan (12), the top of the installation frame and the top of the cleaning frame (1) are provided with a plurality of air guide ports (4), the inner walls of the air guide ports (4) are fixedly connected with a dust screen, and the bottom of the installation frame is provided with an air outlet;
the inner wall of one side opposite to the mounting frame is fixedly connected with an electric heating wire (11);
the middle position of putting thing platform (2) is opened there is cavity (20), and opens between the both sides top of cavity (20) and the both sides inner wall of putting thing groove (19) has the movable groove, and the bottom inner wall intermediate position fixedly connected with second electric putter (21) of cavity (20), the piston end top fixedly connected with movable rod (22) of second electric putter (21), and movable rod (22) extend into one end fixedly connected with push pedal (23) of putting in thing groove (19).
2. The cleaning device for silicon wafer processing according to claim 1, wherein a water storage chamber (7) is fixedly connected to the inner bottom wall of the cleaning frame (1), a water suction pump (8) is fixedly connected to the inner bottom wall of the water storage chamber (7), a water discharge pipe (17) extending out of the cleaning frame (1) is fixedly connected to the top of the water suction pump (8), and a spray head (15) is fixedly connected to one end of the water discharge pipe (17) extending into the cleaning frame (1).
3. The cleaning device for silicon wafer processing as claimed in claim 2, wherein a water outlet is formed at the bottom of one side of the water storage chamber (7) and the bottom of one side of the cleaning frame (1), and a sealing plug is inserted into the inner wall of the water outlet.
4. The cleaning apparatus for silicon wafer processing according to claim 3, wherein a plurality of water leakage holes (18) are formed in the bottom of the storage tank (19).
5. The silicon wafer processing cleaning device according to claim 4, wherein a guide rod (10) is fixedly connected between the inner walls of the opposite sides of the cleaning frame (1), and a sliding seat fixedly connected with the outer wall of the bottom of the movable seat (9) is slidably connected to the outer wall of the guide rod (10).
6. The cleaning device for silicon wafer processing according to any one of claims 1 to 5, wherein universal wheels are fixedly connected to four corners of the bottom of the cleaning frame (1).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201911396911.XA CN111112172B (en) | 2019-12-30 | 2019-12-30 | Cleaning device for silicon wafer processing |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201911396911.XA CN111112172B (en) | 2019-12-30 | 2019-12-30 | Cleaning device for silicon wafer processing |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN111112172A CN111112172A (en) | 2020-05-08 |
| CN111112172B true CN111112172B (en) | 2021-12-07 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201911396911.XA Active CN111112172B (en) | 2019-12-30 | 2019-12-30 | Cleaning device for silicon wafer processing |
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| Country | Link |
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| CN (1) | CN111112172B (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111701935B (en) * | 2020-06-28 | 2021-11-09 | 广东达源设备科技有限公司 | Semiconductor photoetching plate cleaning machine |
| CN111790708B (en) * | 2020-07-24 | 2021-08-03 | 怀化学院 | Pigment dish belt cleaning device for art design |
Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN202205721U (en) * | 2011-09-13 | 2012-04-25 | 康可电子（无锡）有限公司 | Automatic brushing device of silicon wafer |
| CN107234079A (en) * | 2017-07-13 | 2017-10-10 | 合肥北顾信息科技有限公司 | A kind of computer keyboard cleaning device |
| CN206652739U (en) * | 2017-03-22 | 2017-11-21 | 江西泽发光电有限公司 | A kind of efficient wiping arrangement of glass lens processing eyeglass |
| CN206925062U (en) * | 2017-05-31 | 2018-01-26 | 刘美荣 | A kind of medicine equipment cleaning and drying device |
| JP2018524165A (en) * | 2015-07-14 | 2018-08-30 | ゲボイデライニグング リッソウスキー ゲーエムベーハー | Cleaning device and method for cleaning surfaces |
| CN207896109U (en) * | 2018-02-10 | 2018-09-21 | 清远韶兴新能源科技有限公司 | A kind of novel expansion crystalline substance machine of LED production equipments |
| CN108672374A (en) * | 2018-08-14 | 2018-10-19 | 安徽锐利玻璃机械有限公司 | A kind of glass washing device |
-
2019
- 2019-12-30 CN CN201911396911.XA patent/CN111112172B/en active Active
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN202205721U (en) * | 2011-09-13 | 2012-04-25 | 康可电子（无锡）有限公司 | Automatic brushing device of silicon wafer |
| JP2018524165A (en) * | 2015-07-14 | 2018-08-30 | ゲボイデライニグング リッソウスキー ゲーエムベーハー | Cleaning device and method for cleaning surfaces |
| CN206652739U (en) * | 2017-03-22 | 2017-11-21 | 江西泽发光电有限公司 | A kind of efficient wiping arrangement of glass lens processing eyeglass |
| CN206925062U (en) * | 2017-05-31 | 2018-01-26 | 刘美荣 | A kind of medicine equipment cleaning and drying device |
| CN107234079A (en) * | 2017-07-13 | 2017-10-10 | 合肥北顾信息科技有限公司 | A kind of computer keyboard cleaning device |
| CN207896109U (en) * | 2018-02-10 | 2018-09-21 | 清远韶兴新能源科技有限公司 | A kind of novel expansion crystalline substance machine of LED production equipments |
| CN108672374A (en) * | 2018-08-14 | 2018-10-19 | 安徽锐利玻璃机械有限公司 | A kind of glass washing device |
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| CN111112172A (en) | 2020-05-08 |
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Effective date of registration: 20211123 Address after: 225400 No. 18 Kechuang Road, Taixing high tech Industrial Development Zone, Suzhou, Jiangsu Applicant after: Zhongke tongqi semiconductor (Jiangsu) Co.,Ltd. Address before: 322300 building 11, Zhonglu community, Xinwo Town, Pan'an County, Jinhua City, Zhejiang Province Applicant before: Yang Zhaoan |
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Denomination of invention: A cleaning device for silicon wafer processing Granted publication date: 20211207 Pledgee: Bank of Nanjing Co.,Ltd. Taizhou Branch Pledgor: Zhongke tongqi semiconductor (Jiangsu) Co.,Ltd. Registration number: Y2024980028793 |