CN110492002A - 一种背接触无掺杂异质结-钙钛矿叠层太阳电池 - Google Patents
一种背接触无掺杂异质结-钙钛矿叠层太阳电池 Download PDFInfo
- Publication number
- CN110492002A CN110492002A CN201910811358.5A CN201910811358A CN110492002A CN 110492002 A CN110492002 A CN 110492002A CN 201910811358 A CN201910811358 A CN 201910811358A CN 110492002 A CN110492002 A CN 110492002A
- Authority
- CN
- China
- Prior art keywords
- solar cell
- layer
- impurity
- perovskite
- back contacts
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 claims abstract description 30
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 27
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 27
- 239000010703 silicon Substances 0.000 claims abstract description 27
- 239000002131 composite material Substances 0.000 claims description 19
- 229910052751 metal Inorganic materials 0.000 claims description 14
- 239000002184 metal Substances 0.000 claims description 14
- 229910052709 silver Inorganic materials 0.000 claims description 12
- 230000005540 biological transmission Effects 0.000 claims description 11
- 230000027756 respiratory electron transport chain Effects 0.000 claims description 11
- 229910052802 copper Inorganic materials 0.000 claims description 9
- 239000000956 alloy Substances 0.000 claims description 8
- 229910045601 alloy Inorganic materials 0.000 claims description 8
- 229910052759 nickel Inorganic materials 0.000 claims description 5
- MZLGASXMSKOWSE-UHFFFAOYSA-N tantalum nitride Chemical group [Ta]#N MZLGASXMSKOWSE-UHFFFAOYSA-N 0.000 claims description 5
- 229910052782 aluminium Inorganic materials 0.000 claims description 4
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 claims description 4
- 229910052749 magnesium Inorganic materials 0.000 claims description 4
- 229910052750 molybdenum Inorganic materials 0.000 claims description 4
- 238000002310 reflectometry Methods 0.000 claims description 4
- 229910052719 titanium Inorganic materials 0.000 claims description 4
- 229910052721 tungsten Inorganic materials 0.000 claims description 4
- 229910021421 monocrystalline silicon Inorganic materials 0.000 claims description 3
- 229910021420 polycrystalline silicon Inorganic materials 0.000 claims description 3
- 230000008901 benefit Effects 0.000 abstract description 4
- 238000006243 chemical reaction Methods 0.000 abstract description 4
- 238000001228 spectrum Methods 0.000 abstract description 4
- 239000010410 layer Substances 0.000 description 143
- MRNHPUHPBOKKQT-UHFFFAOYSA-N indium;tin;hydrate Chemical compound O.[In].[Sn] MRNHPUHPBOKKQT-UHFFFAOYSA-N 0.000 description 17
- 239000000463 material Substances 0.000 description 13
- PQXKHYXIUOZZFA-UHFFFAOYSA-M lithium fluoride Chemical compound [Li+].[F-] PQXKHYXIUOZZFA-UHFFFAOYSA-M 0.000 description 12
- 238000002360 preparation method Methods 0.000 description 8
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 8
- 239000010949 copper Substances 0.000 description 7
- 229910000480 nickel oxide Inorganic materials 0.000 description 6
- 238000004528 spin coating Methods 0.000 description 6
- 230000005611 electricity Effects 0.000 description 5
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 5
- 239000002585 base Substances 0.000 description 4
- 239000013078 crystal Substances 0.000 description 4
- XDXWNHPWWKGTKO-UHFFFAOYSA-N 207739-72-8 Chemical compound C1=CC(OC)=CC=C1N(C=1C=C2C3(C4=CC(=CC=C4C2=CC=1)N(C=1C=CC(OC)=CC=1)C=1C=CC(OC)=CC=1)C1=CC(=CC=C1C1=CC=C(C=C13)N(C=1C=CC(OC)=CC=1)C=1C=CC(OC)=CC=1)N(C=1C=CC(OC)=CC=1)C=1C=CC(OC)=CC=1)C1=CC=C(OC)C=C1 XDXWNHPWWKGTKO-UHFFFAOYSA-N 0.000 description 3
- 125000004172 4-methoxyphenyl group Chemical group [H]C1=C([H])C(OC([H])([H])[H])=C([H])C([H])=C1* 0.000 description 3
- 238000000151 deposition Methods 0.000 description 3
- 230000008021 deposition Effects 0.000 description 3
- 150000002220 fluorenes Chemical class 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 238000001755 magnetron sputter deposition Methods 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- GNRSAWUEBMWBQH-UHFFFAOYSA-N oxonickel Chemical compound [Ni]=O GNRSAWUEBMWBQH-UHFFFAOYSA-N 0.000 description 3
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 3
- 238000009738 saturating Methods 0.000 description 3
- 239000006096 absorbing agent Substances 0.000 description 2
- 229910052783 alkali metal Inorganic materials 0.000 description 2
- 150000001340 alkali metals Chemical group 0.000 description 2
- 238000000137 annealing Methods 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 229910021419 crystalline silicon Inorganic materials 0.000 description 2
- 238000005566 electron beam evaporation Methods 0.000 description 2
- 238000003682 fluorination reaction Methods 0.000 description 2
- 230000005525 hole transport Effects 0.000 description 2
- 238000003475 lamination Methods 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052723 transition metal Inorganic materials 0.000 description 2
- 150000003624 transition metals Chemical class 0.000 description 2
- 101001073212 Arabidopsis thaliana Peroxidase 33 Proteins 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 101001123325 Homo sapiens Peroxisome proliferator-activated receptor gamma coactivator 1-beta Proteins 0.000 description 1
- 102100028961 Peroxisome proliferator-activated receptor gamma coactivator 1-beta Human genes 0.000 description 1
- 229910001515 alkali metal fluoride Inorganic materials 0.000 description 1
- 229910021417 amorphous silicon Inorganic materials 0.000 description 1
- 229910052789 astatine Inorganic materials 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- YZZNJYQZJKSEER-UHFFFAOYSA-N gallium tin Chemical compound [Ga].[Sn] YZZNJYQZJKSEER-UHFFFAOYSA-N 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- RHZWSUVWRRXEJF-UHFFFAOYSA-N indium tin Chemical compound [In].[Sn] RHZWSUVWRRXEJF-UHFFFAOYSA-N 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 239000011265 semifinished product Substances 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 229910000314 transition metal oxide Inorganic materials 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0216—Coatings
- H01L31/02161—Coatings for devices characterised by at least one potential jump barrier or surface barrier
- H01L31/02167—Coatings for devices characterised by at least one potential jump barrier or surface barrier for solar cells
- H01L31/02168—Coatings for devices characterised by at least one potential jump barrier or surface barrier for solar cells the coatings being antireflective or having enhancing optical properties for the solar cells
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0224—Electrodes
- H01L31/022408—Electrodes for devices characterised by at least one potential jump barrier or surface barrier
- H01L31/022425—Electrodes for devices characterised by at least one potential jump barrier or surface barrier for solar cells
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/06—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers
- H01L31/072—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers the potential barriers being only of the PN heterojunction type
- H01L31/0725—Multiple junction or tandem solar cells
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K30/00—Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K30/00—Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation
- H10K30/80—Constructional details
- H10K30/81—Electrodes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K2102/00—Constructional details relating to the organic devices covered by this subclass
- H10K2102/10—Transparent electrodes, e.g. using graphene
- H10K2102/101—Transparent electrodes, e.g. using graphene comprising transparent conductive oxides [TCO]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/549—Organic PV cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Sustainable Development (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Life Sciences & Earth Sciences (AREA)
- Power Engineering (AREA)
- Sustainable Energy (AREA)
- Manufacturing & Machinery (AREA)
- Photovoltaic Devices (AREA)
Abstract
本发明公开了一种背接触无掺杂异质结‑钙钛矿叠层太阳电池,属于太阳能电池技术领域,目的在于克服现有技术中的不足之处,提供一种背接触无掺杂异质结‑钙钛矿叠层太阳电池,其采用顶部宽带隙1.5‑2.5ev钙钛矿太阳电池和底部窄带隙1.12ev硅基背接触无掺杂异质结太阳电池的叠层组合,充分利用了太阳光谱。底部背接触无掺杂异质结电极设置在底部,正面减少了阴影遮挡面积。使其背接触无掺杂异质结‑钙钛矿叠层太阳电池具有高的光电转换效率和高的开路电压,增加了发电量。本发明适用于太阳能电池。
Description
技术领域
本发明属于太阳能电池技术领域,具体涉及一种背接触无掺杂异质结-钙钛矿叠层太阳电池。
背景技术
随着传统化石能源的储量日益减少,人们开始研究新能源来替代传统化石能源,在新能源领域中,太阳能有着利用简单、安全、无污染等特点,成为科学研究单位的研究焦点。传统单结太阳电池采用单一的材料,例如晶硅太阳电池、非晶硅太阳电池、有机钙钛矿太阳电池、薄膜太阳电池。随着平价上网的政策的落实,科学研究单位开始研发了高效的太阳能电池,单结电池的效率已经达到了瓶颈,许多科研单位开始叠层太阳电池的研究。太阳能电池的理论转换效率取决于光电材料的禁带宽度,叠层电池的结构能将不同的禁带宽度的顶部电池和底部电池结合起来。
最近几年,钙钛矿电池引起了人们的强烈的关注,钙钛矿材料不但具备了无机半导体材料优良的导电性能和稳定性能,还具备了制备比较简单、成本比较低,钙钛矿材料的禁带宽度可以调节,能够充分利用可见光短波段范围380nm-500nm的光,在外量子效率(EQE)有明显的上升,弥补了硅基材料(禁带宽度1.12ev)对光谱利用不充分的缺点。
钙钛矿电池可以和晶硅PERC太阳电池、晶硅PERL太阳电池、晶硅PERT太阳电池、以及SHJ太阳电池和铜铟镓锡太阳电池的叠层组合,说明钙钛矿太阳电池具有很广的应用。
发明内容
本发明的目的在于克服现有技术中的不足之处,提供一种背接触无掺杂异质结-钙钛矿叠层太阳电池,其采用顶部宽带隙1.5-2.5ev钙钛矿太阳电池和底部窄带隙1.12ev硅基背接触无掺杂异质结太阳电池的叠层组合,充分利用了太阳光谱。底部背接触无掺杂异质结电极设置在底部,正面减少了阴影遮挡面积。使其背接触无掺杂异质结-钙钛矿叠层太阳电池具有高的光电转换效率和高的开路电压,增加了发电量。
本发明采用的技术方案如下:
一种背接触无掺杂异质结-钙钛矿叠层太阳电池,包括从上到下依次设置的顶部电池和底部电池,顶部电池为钙钛矿太阳电池,钙钛矿太阳电池包括从上到下依次设置的透明导电氧化物层、空穴传输层、钙钛矿光吸收层、电子传输层,底部电池为背接触无掺杂异质结太阳电池,背接触无掺杂异质结太阳电池包括从上到下依次设置的与钙钛矿太阳电池连接的透明导电氧化物复合层、减反射层、n-型硅衬底层,n-型硅衬底层底部设置有p型空穴选择层、n型电子选择层,p型空穴选择层和n型电子选择层底部设置有金属电极层。
进一步的是技术方案是,所述钙钛矿太阳电池的透明导电氧化物层为氧化铟锡层,透明导电氧化物层的厚度为20-30nm,透明导电氧化物层在300-1100nm的太阳光下透过率在86%-92%。
进一步的是技术方案是,所述背接触无掺杂异质结太阳电池的透明导电氧化物复合层为氧化铟锡层,透明导电氧化物复合层的厚度为40-60nm,透明导电氧化物复合层在300-1100nm的太阳光下透过率在85%-90%,透明导电氧化物复合层的电阻率为3.0×10-4Ω·cm-4.0×10-4Ω·cm。
进一步的是技术方案是,所述背接触无掺杂异质结太阳电池的减反射层为氮化钽层,减反射层使底部的背接触无掺杂异质结太阳电池的反射率在13%之内且具有电导性,厚度为10-30nm。
进一步的是技术方案是,金属电极层为Cu或Cu与Mo、W、Ti、Ni、Al、Mg、Ta、Sn、Ag至少之一所形成的合金,或者金属电极层为Ag或Ag的合金,且背接触无掺杂异质结-钙钛矿叠层太阳电池的正负电极都设置在背接触无掺杂异质结-钙钛矿叠层太阳电池的背面。
进一步的是技术方案是,所述n-型硅衬底层为n型单晶硅衬底或n型多晶硅衬底,n-型硅衬底层的厚度为80-100um。
进一步的是技术方案是,所述钙钛矿太阳电池的电子传输层的材料的主要成分为SnO2,厚度为200-300nm。
进一步的是技术方案是,所述顶部钙钛矿太阳电池的带宽1.5-2.5ev钙钛矿光吸收层,钙钛矿光吸收层由钙钛矿I层和钙钛矿II层组成,总厚度为800-1000nm。
进一步的是技术方案是,所述顶部钙钛矿太阳电池的空穴传输层的材料为0.2-1.2mol/L的2,2',7,7'-四[N,N-二(4-甲氧基苯基)氨基]-9,9'-螺二芴(spiro-MeOTAD)的溶液沉积到钙钛矿光吸层之上,旋涂均匀即可。
进一步的是技术方案是,所述背接触无掺杂异质结p型空穴选择层为过渡金属NiO(氧化镍),其厚度为200-300nm。
进一步的是技术方案是,所述背接触无掺杂异质结n型电子选择层为碱金属氟化物LiF(氟化锂),其厚度为200-300nm。
综上所述,由于采用了上述技术方案,本发明的有益效果是:
1、本发明中,采用了顶部宽带隙1.5-2.5ev钙钛矿太阳电池和底部窄带隙1.12ev硅基背接触无掺杂异质结太阳电池的叠层组合,充分利用了太阳光谱底部背接触无掺杂异质结电极设置在底部,正面减少了阴影遮挡面积。使其背接触无掺杂异质结-钙钛矿叠层太阳电池具有高的光电转化效率和高的开路电压,增加了发电量。通过顶部钙钛矿太阳电池的透明导电氧化物层为ITO(氧化铟锡)有高的光透过率,增加了光生载流子的产生,再连接顶部钙钛矿太阳电池的高电导率的透明导电氧化物复合层为ITO(氧化铟锡)的调控电流,使其背接触无掺杂异质结-钙钛矿叠层太阳电池具有稳定的电流输出。
附图说明
图1为本发明的结构示意图;
图中标记:1-透明导电氧化物层、2-空穴传输层、3-钙钛矿光吸收层、4-电子传输层、5-透明导电氧化物复合层、6-减反射层、7-n-型硅衬底层、8-p型空穴选择层、9-n型电子选择层、10-金属电极层。
具体实施方式
为了使本发明的目的、技术方案及优点更加清楚明白,以下结合附图及实施例,对本发明进行进一步详细说明。应当理解,此处所描述的具体实施例仅用以解释本发明,并不用于限定本发明。
一种背接触无掺杂异质结-钙钛矿叠层太阳电池,包括从上到下依次设置的顶部电池和底部电池,顶部电池为钙钛矿太阳电池,钙钛矿太阳电池包括从上到下依次设置的透明导电氧化物层、空穴传输层、钙钛矿光吸收层、电子传输层,底部电池为背接触无掺杂异质结太阳电池,背接触无掺杂异质结太阳电池包括从上到下依次设置的与钙钛矿太阳电池连接的透明导电氧化物复合层、减反射层、n-型硅衬底层,n-型硅衬底层底部设置有p型空穴选择层、n型电子选择层,p型空穴选择层和n型电子选择层底部设置有金属电极层。
进一步的是技术方案是,所述钙钛矿太阳电池的透明导电氧化物层为氧化铟锡层,透明导电氧化物层的厚度为20-30nm,透明导电氧化物层在300-1100nm的太阳光下透过率在86%-92%。
进一步的是技术方案是,所述背接触无掺杂异质结太阳电池的透明导电氧化物复合层为氧化铟锡层,透明导电氧化物复合层的厚度为40-60nm,透明导电氧化物复合层在300-1100nm的太阳光下透过率在85%-90%,透明导电氧化物复合层的电阻率为3.0×10-4Ω·cm-4.0×10-4Ω·cm。
进一步的是技术方案是,所述背接触无掺杂异质结太阳电池的减反射层为氮化钽层,减反射层使底部的背接触无掺杂异质结太阳电池的反射率在13%之内且具有电导性,厚度为10-30nm。
进一步的是技术方案是,金属电极层为Cu或Cu与Mo、W、Ti、Ni、Al、Mg、Ta、Sn、Ag至少之一所形成的合金,或者金属电极层为Ag或Ag的合金,且背接触无掺杂异质结-钙钛矿叠层太阳电池的正负电极都设置在背接触无掺杂异质结-钙钛矿叠层太阳电池的背面。
进一步的是技术方案是,所述n-型硅衬底层为n型单晶硅衬底或n型多晶硅衬底,n-型硅衬底层的厚度为80-100um。
进一步的是技术方案是,所述钙钛矿太阳电池的电子传输层的材料的主要成分为SnO2,厚度为200-300nm。
进一步的是技术方案是,所述顶部钙钛矿太阳电池的带宽1.5-2.5ev钙钛矿光吸收层,钙钛矿光吸收层由钙钛矿I层和钙钛矿II层组成,总厚度为800-1000nm。
进一步的是技术方案是,所述顶部钙钛矿太阳电池的空穴传输层的材料为0.2-1.2mol/L的2,2',7,7'-四[N,N-二(4-甲氧基苯基)氨基]-9,9'-螺二芴(spiro-MeOTAD)的溶液沉积到钙钛矿光吸层之上,旋涂均匀即可。
进一步的是技术方案是,所述背接触无掺杂异质结p型空穴选择层为过渡金属NiO(氧化镍),其厚度为200-300nm。
进一步的是技术方案是,所述背接触无掺杂异质结n型电子选择层为碱金属氟化物LiF(氟化锂),其厚度为200-300nm。
实施例1
如图1所示,
一种背接触无掺杂异质结-钙钛矿叠层太阳电池,包括从上到下依次设置的顶部电池和底部电池,顶部电池为钙钛矿太阳电池,钙钛矿太阳电池包括从上到下依次设置的透明导电氧化物层、空穴传输层、钙钛矿光吸收层、电子传输层,底部电池为背接触无掺杂异质结太阳电池,背接触无掺杂异质结太阳电池包括从上到下依次设置的与钙钛矿太阳电池连接的透明导电氧化物复合层、减反射层、n-型硅衬底层,n-型硅衬底层底部设置有p型空穴选择层、n型电子选择层,p型空穴选择层和n型电子选择层底部设置有金属电极层。
本实施例通过以下步骤制备而成:
(1)提供n型硅衬底-7制备背接触无掺杂异质结电池,对n型晶硅衬底进行清洗,表面进行抛光,使其平整有利于钙钛矿电池的旋涂,所述n型硅衬底-7的厚度为80-100um,所述n型晶硅掺杂的浓度为1016-1021/cm3;
(2)n型硅衬底-7的背接触无掺杂异质结电池进行上表面制备减反层-6、减反层-6为TaN(氮化钽),选用磁控溅射氮化钽靶材制备,纯度规格99.5%,使底部的背接触无掺杂异质结太阳电池反射率在13%之内,具有电导性,厚度10-30nm。
(3)n型硅衬底-7的背接触无掺杂异质结电池进行下表面制备p型空穴选择层-8、p型空穴选择层-8为过渡金属氧化物NiO(氧化镍),选用精确的掩膜版进行其他区域的遮挡,选用磁控溅射的高纯镍靶材制备,纯度规格99.999%,厚度为200-300nm;
(4)n型硅衬底-7的背接触无掺杂异质结电池进行下表面制备n型电子选择层-9、n型电子选择层-9为碱金属氟化物LiF(氟化锂),选用精确的掩膜版进行p型空穴选择层区域的遮挡,使其p型空穴选择层和n型电子选择层间隔1-2um,选用磁控溅射的靶材制备,纯度规格99.99%,厚度为200-300nm;
(5)底部背接触无掺杂异质结电池减反层-6上,制备连接顶部钙钛矿太阳电池的透明导电氧化物复合层-5,连接顶部钙钛矿太阳电池的透明导电氧化物复合层-5为ITO(氧化铟锡),选用电子束蒸发制备ITO(氧化铟锡),基地温度为200℃,对底部背接触无掺杂异质结电池有一个退火作用,制备的ITO(氧化铟锡)厚度40-60nm,在300-1100nm的太阳光透过率在85%-90%,电阻率3.0×10-4Ω·cm-4.0×10-4Ω·cm。
(6)在连接顶部钙钛矿太阳电池的透明导电氧化物复合层-5,进行顶部钙钛矿电池的制备电子传输层-4,选用旋涂的方法,电子传输层的材料的主要成分为SnO2,厚度为200-300nm。
(7)将制备完电子传输层-4的SnO2的半成品电池,放入通入氧气的马弗炉,马弗炉的温度在300℃-500℃进行退火,退火20min。
(8)在顶部钙钛矿太阳电池的电子传输层-4,制备钙钛矿光吸收层-3,选用带宽1.5-2.5ev材料,采用旋涂的方法制备钙钛矿光吸收层-3,钙钛矿光吸收层由钙钛矿I层和钙钛矿II层组成,将含有钙钛矿AMX3的溶液旋涂至在空穴传输层上,在80℃烘干5min,形成I层,吸收带宽1.5ev;将含有钙钛矿AMX2Y1的溶液旋涂至在钙钛矿I层上,在100℃烘干8min,形成II层,吸收带宽2.5ev,总厚度为800-1000nm。
(9)在顶部钙钛矿太阳电池的钙钛矿光吸收层-3上制备空穴传输层-2,空穴传输层-2的材料为0.2-1.2mol/L的2,2',7,7'-四[N,N-二(4-甲氧基苯基)氨基]-9,9'-螺二芴(spiro-MeOTAD)的溶液沉积到钙钛矿光吸层之上,旋涂均匀即可。
(10)在顶部钙钛矿太阳电池的空穴传输层-2,制备透明导电氧化物层-1,制备透明导电氧化物层-1为ITO(氧化铟锡),选用电子束蒸发制备ITO(氧化铟锡),基地温度基地温度为200℃,对钙钛矿太阳电池的空穴传输层-2、钙钛矿光吸收层-3、电子传输层-4,进行退火形成更加致密的薄膜,制备ITO(氧化铟锡)的厚度20-30nm,在300-1100nm的太阳光透过率在86%-92%。
(11)在背接触无掺杂异质结-钙钛矿叠层太阳电池下表面的p型空穴选择层-8和n型电子选择层-9下面进行金属电极的网版精确对位,选用网印刷工艺制备金属栅线电极层-10,电极的宽30-50um,高为20-30um,金属电极层-10包含Cu或Cu与Mo、W、Ti、Ni、Al、Mg、Ta、Sn、Ag至少之一所形成的合金,或者Ag或Ag的合金。
以上所述仅为本发明的较佳实施例而已,并不用以限制本发明,凡在本发明的精神和原则之内所作的任何修改、等同替换和改进等,均应包含在本发明的保护范围之内。
Claims (6)
1.一种背接触无掺杂异质结-钙钛矿叠层太阳电池,其特征在于,包括从上到下依次设置的顶部电池和底部电池,顶部电池为钙钛矿太阳电池,钙钛矿太阳电池包括从上到下依次设置的透明导电氧化物层(1)、空穴传输层(2)、钙钛矿光吸收层(3)、电子传输层(4),底部电池为背接触无掺杂异质结太阳电池,背接触无掺杂异质结太阳电池包括从上到下依次设置的与钙钛矿太阳电池连接的透明导电氧化物复合层(5)、减反射层(6)、n-型硅衬底层(7),n-型硅衬底层(7)底部设置有p型空穴选择层(8)、n型电子选择层(9),p型空穴选择层(8)和n型电子选择层(9)底部设置有金属电极层(10)。
2.按照权利要求1所述的一种背接触无掺杂异质结-钙钛矿叠层太阳电池,其特征在于,所述钙钛矿太阳电池的透明导电氧化物层(1)为氧化铟锡层,透明导电氧化物层(1)的厚度为20-30nm,透明导电氧化物层(1)在300-1100nm的太阳光下透过率在86%-92%。
3.按照权利要求1所述的一种背接触无掺杂异质结-钙钛矿叠层太阳电池,其特征在于,所述背接触无掺杂异质结太阳电池的透明导电氧化物复合层(5)为氧化铟锡层,透明导电氧化物复合层(5)的厚度为40-60nm,透明导电氧化物复合层(5)在300-1100nm的太阳光下透过率在85%-90%,透明导电氧化物复合层(5)的电阻率为3.0×10-4Ω·cm-4.0×10-4Ω·cm。
4.按照权利要求1所述的一种背接触无掺杂异质结-钙钛矿叠层太阳电池,其特征在于,所述背接触无掺杂异质结太阳电池的减反射层(6)为氮化钽层,减反射层(6)使底部的背接触无掺杂异质结太阳电池的反射率在13%之内且具有电导性,减反射层(6)的厚度10-30nm。
5.按照权利要求2或3所述的一种背接触无掺杂异质结-钙钛矿叠层太阳电池,其特征在于,金属电极层(10)为Cu或Cu与Mo、W、Ti、Ni、Al、Mg、Ta、Sn、Ag至少之一所形成的合金,或者金属电极层(10)为Ag或Ag的合金,且背接触无掺杂异质结-钙钛矿叠层太阳电池的正负电极都设置在背接触无掺杂异质结-钙钛矿叠层太阳电池的背面。
6.按照权利要求1所述的一种背接触无掺杂异质结-钙钛矿叠层太阳电池,其特征在于,所述n-型硅衬底层(7)为n型单晶硅衬底或n型多晶硅衬底,n-型硅衬底层(7)的厚度为80-100um。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201910811358.5A CN110492002A (zh) | 2019-08-30 | 2019-08-30 | 一种背接触无掺杂异质结-钙钛矿叠层太阳电池 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201910811358.5A CN110492002A (zh) | 2019-08-30 | 2019-08-30 | 一种背接触无掺杂异质结-钙钛矿叠层太阳电池 |
Publications (1)
Publication Number | Publication Date |
---|---|
CN110492002A true CN110492002A (zh) | 2019-11-22 |
Family
ID=68555285
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201910811358.5A Pending CN110492002A (zh) | 2019-08-30 | 2019-08-30 | 一种背接触无掺杂异质结-钙钛矿叠层太阳电池 |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN110492002A (zh) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN111554763A (zh) * | 2020-04-01 | 2020-08-18 | 南开大学 | 一种高开压高效钙钛矿/晶硅叠层电池 |
CN113506853A (zh) * | 2021-06-25 | 2021-10-15 | 南京邮电大学 | 一种异质结锡基钙钛矿薄膜的制备方法和产品 |
CN118139489A (zh) * | 2024-05-10 | 2024-06-04 | 上海电气集团恒羲光伏科技(南通)有限公司 | 钙钛矿异质结太阳能电池及其制备方法 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106410039A (zh) * | 2016-11-07 | 2017-02-15 | 大连理工大学 | 一种钙钛矿叠层太阳电池及其制备方法 |
CN107564989A (zh) * | 2017-07-20 | 2018-01-09 | 南开大学 | 一种钙钛矿/硅异质结叠层太阳电池中隧穿结的结构设计 |
CN109888034A (zh) * | 2019-04-04 | 2019-06-14 | 国家电投集团西安太阳能电力有限公司 | 一种钙钛矿/背接触晶硅叠层太阳能电池 |
-
2019
- 2019-08-30 CN CN201910811358.5A patent/CN110492002A/zh active Pending
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106410039A (zh) * | 2016-11-07 | 2017-02-15 | 大连理工大学 | 一种钙钛矿叠层太阳电池及其制备方法 |
CN107564989A (zh) * | 2017-07-20 | 2018-01-09 | 南开大学 | 一种钙钛矿/硅异质结叠层太阳电池中隧穿结的结构设计 |
CN109888034A (zh) * | 2019-04-04 | 2019-06-14 | 国家电投集团西安太阳能电力有限公司 | 一种钙钛矿/背接触晶硅叠层太阳能电池 |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN111554763A (zh) * | 2020-04-01 | 2020-08-18 | 南开大学 | 一种高开压高效钙钛矿/晶硅叠层电池 |
CN111554763B (zh) * | 2020-04-01 | 2023-06-09 | 南开大学 | 一种高开压高效钙钛矿/晶硅叠层电池 |
CN113506853A (zh) * | 2021-06-25 | 2021-10-15 | 南京邮电大学 | 一种异质结锡基钙钛矿薄膜的制备方法和产品 |
CN113506853B (zh) * | 2021-06-25 | 2024-04-12 | 南京邮电大学 | 一种异质结锡基钙钛矿薄膜的制备方法和产品 |
CN118139489A (zh) * | 2024-05-10 | 2024-06-04 | 上海电气集团恒羲光伏科技(南通)有限公司 | 钙钛矿异质结太阳能电池及其制备方法 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN112018209B (zh) | 一种钙钛矿-硅异质结叠层太阳能电池及其制作方法 | |
CN110600614B (zh) | 一种钙钛矿/钙钛矿两端叠层太阳能电池的隧穿结结构 | |
CN111554764A (zh) | 一种高效稳定的钙钛矿/硅两端叠层太阳电池 | |
EP3358637A1 (en) | Multi-junction photoelectric conversion device and photoelectric conversion module | |
TW201513380A (zh) | 高效率堆疊太陽電池 | |
CN111081878A (zh) | 一种钙钛矿/硅基异质结叠层太阳能电池及其制备方法 | |
US12058876B2 (en) | Laminated battery and method for fabrication thereof | |
WO2016069758A1 (en) | Tandem photovoltaic device | |
CN110492002A (zh) | 一种背接触无掺杂异质结-钙钛矿叠层太阳电池 | |
US20240244853A1 (en) | Perovskite/silicon heterojunction tandem solar cell and preparation method thereof | |
CN110491998A (zh) | 一种平面无掺杂异质结-钙钛矿叠层电池及其制备方法 | |
CN111403519A (zh) | 一种自封装叠层光电器件及其制备方法 | |
CN208548372U (zh) | 一种双结太阳能电池 | |
Li et al. | Lithography-free and dopant-free back-contact silicon heterojunction solar cells with solution-processed TiO2 as the efficient electron selective layer | |
CN104253222B (zh) | 有机串联叠层太阳电池的中间连接层及构成的高效太阳电池 | |
CN209016100U (zh) | 一种钙钛矿/硅基异质结叠层太阳能电池 | |
CN115172602B (zh) | 一种掺杂金属氧化物复合层结构 | |
CN111384187A (zh) | 复合背电极及其制备方法和叠层太阳能电池 | |
CN112103392A (zh) | 一种复合空穴传输层及包含其的钙钛矿太阳能电池 | |
WO2023115870A1 (zh) | 一种pn异质结硒化锑/钙钛矿太阳能电池及其制备方法 | |
CN217719655U (zh) | 一种钙钛矿/晶体硅叠层电池结构 | |
WO2023082584A1 (zh) | 一种钙钛矿-硅基叠层太阳能电池及其制作方法 | |
CN214176064U (zh) | 一种双面入射叠层太阳能电池 | |
CN210403774U (zh) | 一种背接触无掺杂异质结-钙钛矿叠层太阳电池 | |
CN210403773U (zh) | 一种平面无掺杂异质结-钙钛矿叠层电池 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PB01 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination |