[go: up one dir, main page]
More Web Proxy on the site http://driver.im/

CN110341296A - A kind of manufacturing method of screen - Google Patents

A kind of manufacturing method of screen Download PDF

Info

Publication number
CN110341296A
CN110341296A CN201910799211.9A CN201910799211A CN110341296A CN 110341296 A CN110341296 A CN 110341296A CN 201910799211 A CN201910799211 A CN 201910799211A CN 110341296 A CN110341296 A CN 110341296A
Authority
CN
China
Prior art keywords
layer
photoresists
layer photoresists
isolation film
manufacturing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CN201910799211.9A
Other languages
Chinese (zh)
Other versions
CN110341296B (en
Inventor
汪洋
陈厚
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jiangsu Shengxi Electronic Science & Technology Co Ltd
Original Assignee
Jiangsu Shengxi Electronic Science & Technology Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jiangsu Shengxi Electronic Science & Technology Co Ltd filed Critical Jiangsu Shengxi Electronic Science & Technology Co Ltd
Priority to CN201910799211.9A priority Critical patent/CN110341296B/en
Publication of CN110341296A publication Critical patent/CN110341296A/en
Application granted granted Critical
Publication of CN110341296B publication Critical patent/CN110341296B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00Forme preparation
    • B41C1/14Forme preparation for stencil-printing or silk-screen printing
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41FPRINTING MACHINES OR PRESSES
    • B41F15/00Screen printers
    • B41F15/14Details
    • B41F15/34Screens, Frames; Holders therefor

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)

Abstract

The invention discloses a kind of manufacturing method of screen, and steps are as follows: S1, screen knitting;S2, it throws the net;S3, prefabricated photosensitive film;S4, fitting photographic film;S5, cutting dyestripping;S6, exposure;The present invention provides a kind of good photosensitive plastic coating stability, coating uniform, thickness controllable manufacturing method of screen.

Description

A kind of manufacturing method of screen
Technical field
The present invention relates to a kind of manufacturing method of screen.
Background technique
Silk-screen printing technique is a kind of ancient civilization, is a kind of flourishing long time industry, in the production and living of people It is widely applied.Especially the high development of electronics industry, screen printing process have obtained good application, life have occurred in recent years Thriving scene, while the requirement to halftone precision proposes increasingly higher demands, has pushed the development of plate-making industry and material, But change ten thousand times without leaving the original aim or stand, the basic structure of halftone is eternal, that is, screen frame, bite grenadine and blueprint photosensitive material be one Body, three are indispensable;And currently, the mode being exposed on the grenadine usually brushing photoresists on grenadine, then will Photoresists are heating and curing on grenadine, are then exposed in such a way that egative film exposes to the photoresists on grenadine, water Screen pattern is obtained after washing, and the photoresists of this mode are all direct brushings on grenadine, stability is bad, and photoresists apply Brush is uneven and thickness is unable to control, and so influences the printing performance of printed patterns.
Summary of the invention
In view of the deficiencies of the prior art mentioned above, problems solved by the invention are as follows: it is stable to provide a kind of photosensitive plastic coating Property good, coating uniform, the controllable manufacturing method of screen of thickness.
To solve the above problems, the technical solution adopted by the present invention is as follows:
A kind of manufacturing method of screen, steps are as follows:
S1, screen knitting: a plurality of metal weft and a plurality of metal warp are woven in a manner of staggered up and down, to form a net Yarn;
S2, throw the net: the metal weft and the weft are with tension force stretching and are fixed on a screen frame, form a halftone;
S3, prefabricated photosensitive film: a counterdie is chosen, active alumina powder is uniformly sprinkled on counterdie, is spilling active oxygen Change spray attachment first layer photoresists on the counterdie of aluminium powder;In the middle position of first layer photoresists fitting one isolation film of installation; The edge of the control first layer photoresists is located at the outside of the edge of isolation film;Then in the isolation film With first layer photoresists upper surface spray attachment second layer photoresists;The second layer photoresists are covered on isolation film and with One layer of photoresists edge coincides with the upper and lower, and is then fed into baking oven and heats, and obtains half-dried combined type photosensitive layer;
S4, fitting photographic film: water is sprayed on grenadine in step s 2, then most by above-mentioned half-dried combined type photosensitive layer The second layer photoresists covering of upper end fits on grenadine, is then fed into baking oven and is thermally dried, so that the second layer is photosensitive Glue covers attachment and fits on grenadine;
S5, cutting dyestripping: counterdie is torn from first layer photoresists, then cuts the surrounding of second layer photoresists It cuts, is separated so that first layer photoresists are cut from second layer photoresists, finally isolation film is removed, obtains being attached with second The grenadine of layer photoresists;
S6, exposure: development is exposed to the second layer photoresists on grenadine.
Further, the counterdie in the step S3 chooses PET film.
Further, isolation film is polytetrafluoroethylene film in the step S3.
Further, in the step S3 edge of the edge of isolation film to first layer photoresists vertical range L≥2cm。
Further, temperature is 20 to 30 DEG C in baking oven in the step S3;Drying time is 15 to 20min.
Further, temperature is 30 to 40 DEG C in baking oven in the step S4;Drying time is 15 to 20min.
Further, the material of the metal warp and metal weft is stainless steel, wolfram steel, titanium, aluminium, copper, its in nickel One of.
Beneficial effects of the present invention
The present invention changes tradition and photoresists is directly painted on to mode on grenadine, but photoresists are carried out it is prefabricated, and incite somebody to action Photoresists are directly applied and are invested on counterdie, due to the slickness of counterdie, so that the cementability between photoresists and counterdie is too poor, it is mobile When it is very inconvenient, then the present invention utilize active alumina powder porous characterization of adsorption, active alumina powder is uniform It is sprinkled upon on counterdie, then the spray attachment first layer photoresists on the counterdie for spilling active alumina powder, it is photosensitive to increase first layer The adhesion of glue and counterdie, and first layer photoresists are directly heated into solidification after grenadine after tearing counterdie, first layer is photosensitive Glue surface can due to active alumina powder infiltration and porous pleated structure is presented, so to it is subsequent exposure make troubles, Even if being cut to the surface of first layer photoresists and being also unable to control profile pattern, thus the present invention be additionally arranged isolation film and Second layer photoresists, second layer photoresists are fitted in the upper surface of first layer photoresists, and isolation film is in second layer sense Inside between optical cement and first layer photoresists, since the surrounding of second layer photoresists and first layer photoresists is to be fitted and connected , the connectivity of second layer photoresists and first layer photoresists is so neither influenced, second layer sense can be guaranteed by isolation film The planarization of optical cement and convenient for isolation film below dyestripping handle, what such present invention actually used is second layer photoresists, Second layer photoresists are fitted in after grenadine is heating and curing, are then torn counterdie from first layer photoresists, then only The surrounding of second layer photoresists is cut, is separated so that first layer photoresists are cut from second layer photoresists, finally will Isolation film is removed, and the grenadine for being attached with second layer photoresists is obtained, and such second layer photoresists can carry out prefabricated, thickness Control is easy and can guarantee certain even uniform, avoids the influence to the printing performance of halftone.
Detailed description of the invention
Fig. 1 is the structural representation of counterdie of the present invention, activated alumina, first layer photoresists, isolation film, second layer photoresists Figure.
Fig. 2 is the structural schematic diagram of first layer photoresists of the present invention, isolation film, second layer photoresists.
Fig. 3 is the structural schematic diagram of isolation film of the present invention, second layer photoresists.
The structural schematic diagram of Fig. 4 second layer photoresists of the present invention.
Specific embodiment
The content of present invention is described in further detail with reference to the accompanying drawing.
As shown in Figures 1 to 4, a kind of manufacturing method of screen, steps are as follows:
S1, screen knitting: a plurality of metal weft and a plurality of metal warp are woven in a manner of staggered up and down, to form a net Yarn;The material of the metal warp and metal weft is stainless steel, one of in wolfram steel, titanium, aluminium, copper, nickel, this implementation The metal warp and metal weft of the optional aluminium material of example.
S2, throw the net: the metal weft and the weft are with tension force stretching and are fixed on a screen frame, form a halftone.
S3, prefabricated photosensitive film: a counterdie 1 is chosen, active alumina powder 5 is uniformly sprinkled on counterdie 1, is being spilt Spray attachment first layer photoresists 2 on the counterdie of active alumina powder 5;The fitting installation one in the middle position of first layer photoresists 2 A isolation film 3;The edge of the control first layer photoresists 2 is located at the outside of the edge of isolation film 3;Then exist The 2 upper surface spray attachment second layer photoresists 4 of isolation film 3 and first layer photoresists;The second layer photoresists 4 are covered on It is coincided with the upper and lower on isolation film 3 and with 2 edge of first layer photoresists, is then fed into baking oven and heats, obtain half-dried compound Formula photosensitive layer, temperature is 20 to 30 DEG C, preferable 25 DEG C in baking oven in the step S3;Drying time is 15 to 20min, can It is preferred that 18min;Counterdie 1 chooses PET film;Isolation film 3 is polytetrafluoroethylene film;The edge of isolation film 3 is to first layer sense Vertical range L >=2cm of the edge of optical cement, vertical range L are the length in Fig. 2 at appended drawing reference 41.
S4, fitting photographic film: water is sprayed on grenadine in step s 2, then by above-mentioned half-dried combined type photosensitive layer The top second layer photoresists 4 covering fit on grenadine, be then fed into baking oven and be thermally dried, so that the second layer Photoresists 4 cover attachment and fit on grenadine, and temperature is 30 to 40 DEG C, preferable 35 DEG C in baking oven;Drying time be 15 to 20min, preferable 18min.
S5, cutting dyestripping: as shown in Figures 1 to 4, counterdie 1 is torn from first layer photoresists 2, then by second The surrounding of layer photoresists 4 is cut, i.e., is cut from Fig. 2 41, so that first layer photoresists 2 are from second layer photoresists 4 cutting separation, isolation film 3 is finally removed, obtain the grenadine for being attached with second layer photoresists 4.
S6, exposure: the second layer photoresists on grenadine are exposed, are developed.
The present invention changes tradition and photoresists is directly painted on to mode on grenadine, but photoresists are carried out it is prefabricated, And photoresists are directly applied and are invested on counterdie 1, due to the slickness of counterdie 1, so that the cementability between photoresists and counterdie 1 is too Difference, very inconvenient when mobile, then the present invention utilizes the porous characterization of adsorption of active alumina powder 5, by activated alumina Powder 5 is uniformly sprinkled upon on counterdie 1, then the spray attachment first layer photoresists 2 on the counterdie for spilling active alumina powder 5, is increased The adhesions of first layer photoresists 2 and counterdie 1, and first layer photoresists 2 are directly heated into solidification after grenadine when tearing bottom After film, 2 surface of first layer photoresists can due to active alumina powder 5 infiltration and porous pleated structure is presented, such as Fig. 2 institute Show, so make troubles to subsequent exposure, is put down even if being cut to the surface of first layer photoresists 2 and being also unable to control surface Whole property, the present invention is additionally arranged isolation film 3 and second layer photoresists 4 thus, and second layer photoresists 4 fit over photosensitive in first layer The upper surface of glue 2, and inside of the isolation film 3 between second layer photoresists 4 and first layer photoresists 2, isolation film 3 are chosen poly- Tetrafluoroethene material is made, it is ensured that be not easy between isolation film 3 and first layer photoresists 2 and second layer photoresists 4 it is be bonded, due to The surrounding of second layer photoresists 4 and first layer photoresists 2 is fitted and connected, and so neither influences second layer photoresists 4 and the The connectivity of one layer of photoresists 2 can guarantee the planarization of second layer photoresists 4 by isolation film 3 and convenient for being isolated below The dyestripping of film 3 is handled, and what such present invention actually used is second layer photoresists 4, and second layer photoresists 4 are fitted in grenadine and are added After heat cure, then counterdie 1 is torn from first layer photoresists, as long as then by the surrounding 41 of second layer photoresists 4 It is cut, is separated so that first layer photoresists 2 are cut from second layer photoresists 4, finally isolation film 3 is removed, is obtained It is attached with the grenadine of second layer photoresists 4, such second layer photoresists 4 can carry out prefabricated, and thickness control is easy and can protect Certain even uniform is demonstrate,proved, the influence to the printing performance of halftone is avoided.
The foregoing is merely illustrative of the preferred embodiments of the present invention, is not intended to limit the invention, all in essence of the invention Within mind and principle, any modification, equivalent replacement, improvement and so on be should all be included in the protection scope of the present invention.

Claims (7)

1. a kind of manufacturing method of screen, which is characterized in that steps are as follows:
S1, screen knitting: a plurality of metal weft and a plurality of metal warp are woven in a manner of staggered up and down, to form a net Yarn;
S2, throw the net: the metal weft and the weft are with tension force stretching and are fixed on a screen frame, form a halftone;
S3, prefabricated photosensitive film: a counterdie is chosen, active alumina powder is uniformly sprinkled on counterdie, is spilling active oxygen Change spray attachment first layer photoresists on the counterdie of aluminium powder;In the middle position of first layer photoresists fitting one isolation film of installation; The edge of the control first layer photoresists is located at the outside of the edge of isolation film;Then in the isolation film With first layer photoresists upper surface spray attachment second layer photoresists;The second layer photoresists are covered on isolation film and with One layer of photoresists edge coincides with the upper and lower, and is then fed into baking oven and heats, and obtains half-dried combined type photosensitive layer;
S4, fitting photographic film: water is sprayed on grenadine in step s 2, then most by above-mentioned half-dried combined type photosensitive layer The second layer photoresists covering of upper end fits on grenadine, is then fed into baking oven and is thermally dried, so that the second layer is photosensitive Glue covers attachment and fits on grenadine;
S5, cutting dyestripping: counterdie is torn from first layer photoresists, then cuts the surrounding of second layer photoresists It cuts, is separated so that first layer photoresists are cut from second layer photoresists, finally isolation film is removed, obtains being attached with second The grenadine of layer photoresists;
S6, exposure: development is exposed to the second layer photoresists on grenadine.
2. manufacturing method of screen according to claim 1, which is characterized in that the counterdie in the step S3 chooses PET film.
3. manufacturing method of screen according to claim 1, which is characterized in that isolation film is polytetrafluoroethyl-ne in the step S3 Alkene film.
4. manufacturing method of screen according to claim 1, which is characterized in that the edge of isolation film in the step S3 To vertical range L >=2cm of the edge of first layer photoresists.
5. manufacturing method of screen according to claim 1, which is characterized in that in the step S3 in baking oven temperature be 20 to 30℃;Drying time is 15 to 20min.
6. manufacturing method of screen according to claim 1, which is characterized in that in the step S4 in baking oven temperature be 30 to 40℃;Drying time is 15 to 20min.
7. manufacturing method of screen according to claim 1, which is characterized in that the material of the metal warp and metal weft Matter is stainless steel, one of in wolfram steel, titanium, aluminium, copper, nickel.
CN201910799211.9A 2019-08-28 2019-08-28 Screen printing plate manufacturing method Active CN110341296B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201910799211.9A CN110341296B (en) 2019-08-28 2019-08-28 Screen printing plate manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201910799211.9A CN110341296B (en) 2019-08-28 2019-08-28 Screen printing plate manufacturing method

Publications (2)

Publication Number Publication Date
CN110341296A true CN110341296A (en) 2019-10-18
CN110341296B CN110341296B (en) 2021-03-02

Family

ID=68181276

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201910799211.9A Active CN110341296B (en) 2019-08-28 2019-08-28 Screen printing plate manufacturing method

Country Status (1)

Country Link
CN (1) CN110341296B (en)

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6092464A (en) * 1998-03-19 2000-07-25 M J Grant Company Three-dimensional raised image screen printing
CN204694989U (en) * 2015-01-15 2015-10-07 何忠亮 The drying unit of negative pressure drying silk-screen half tone
JP2017219795A (en) * 2016-06-10 2017-12-14 理想科学工業株式会社 Manufacturing method of screen printing sheet
CN207099425U (en) * 2017-07-11 2018-03-13 苏州城邦达力材料科技有限公司 A kind of photosensitive cover layer and product
CN109435431A (en) * 2018-10-30 2019-03-08 东莞市银泰丰光学科技有限公司 A kind of web plate and its printing process for low interference glass light guide plate
CN208789231U (en) * 2018-07-18 2019-04-26 武汉虹之彩包装印刷有限公司 A kind of ultra-thin detachable silk-screen plate

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6092464A (en) * 1998-03-19 2000-07-25 M J Grant Company Three-dimensional raised image screen printing
CN204694989U (en) * 2015-01-15 2015-10-07 何忠亮 The drying unit of negative pressure drying silk-screen half tone
JP2017219795A (en) * 2016-06-10 2017-12-14 理想科学工業株式会社 Manufacturing method of screen printing sheet
CN207099425U (en) * 2017-07-11 2018-03-13 苏州城邦达力材料科技有限公司 A kind of photosensitive cover layer and product
CN208789231U (en) * 2018-07-18 2019-04-26 武汉虹之彩包装印刷有限公司 A kind of ultra-thin detachable silk-screen plate
CN109435431A (en) * 2018-10-30 2019-03-08 东莞市银泰丰光学科技有限公司 A kind of web plate and its printing process for low interference glass light guide plate

Also Published As

Publication number Publication date
CN110341296B (en) 2021-03-02

Similar Documents

Publication Publication Date Title
CN110341295A (en) A kind of laser engraving formula manufacturing method of screen
CN105346213B (en) Composite halftone with choana and preparation method thereof
CN104883825B (en) A kind of method for making solder mask in the circuit board
CN104057518B (en) A kind of high definition ink-jetting process of plate surface process
CN110341296A (en) A kind of manufacturing method of screen
CN110757931A (en) Glass cover plate with superposed nano-scale texture and micro-scale texture and manufacturing method thereof
CN110341294A (en) A kind of manufacturing method of screen based on metal plate engraving
CN110356096A (en) A kind of novel weaved formula ties manufacturing method of screen without net
CN105952079A (en) Ecological coating coiled material capable of being directly pasted on interior wall and preparation method of ecological coating coiled material
CN103215856B (en) A kind of gold powder paper and formula thereof and manufacturing technique
JP5740001B2 (en) Waterproof ceiling tiles
JP2008520082A5 (en)
CN106808819A (en) A kind of working of plastics silk screen printing process
KR101956054B1 (en) Method for manufacturing decorative metal tile
CN109455011A (en) Silicon rubber print lattice-point printing process
KR101466504B1 (en) 3D pattern have the steel plate and its manufacturing method
CN208118643U (en) Screen structure
KR100345161B1 (en) A mult functional and heat insulating textile sheet
CN1252360A (en) Pyrography on rice paper
JPS57140678A (en) Production of decorative sheet
JP4417982B2 (en) Painting method for tiles
JP2551352Y2 (en) Decorative plate
CN106746737A (en) A kind of building decoration color crystal glass and manufacture method
JP2680902B2 (en) Manufacturing method of fiber cement board
JPS58205567A (en) Pattern forming method

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant
PE01 Entry into force of the registration of the contract for pledge of patent right
PE01 Entry into force of the registration of the contract for pledge of patent right

Denomination of invention: A screen making method

Effective date of registration: 20220620

Granted publication date: 20210302

Pledgee: Bank of Jiangsu Co.,Ltd. Yancheng branch

Pledgor: JIANGSU SHENGXI ELECTRONIC TECHNOLOGY CO.,LTD.

Registration number: Y2022320000296