CN110030316B - Precision corner limiting shock-resistant vibration-isolating buffer platform for small photoelectric equipment - Google Patents
Precision corner limiting shock-resistant vibration-isolating buffer platform for small photoelectric equipment Download PDFInfo
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- CN110030316B CN110030316B CN201910227669.7A CN201910227669A CN110030316B CN 110030316 B CN110030316 B CN 110030316B CN 201910227669 A CN201910227669 A CN 201910227669A CN 110030316 B CN110030316 B CN 110030316B
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Classifications
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16F—SPRINGS; SHOCK-ABSORBERS; MEANS FOR DAMPING VIBRATION
- F16F15/00—Suppression of vibrations in systems; Means or arrangements for avoiding or reducing out-of-balance forces, e.g. due to motion
- F16F15/02—Suppression of vibrations of non-rotating, e.g. reciprocating systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating systems
- F16F15/022—Suppression of vibrations of non-rotating, e.g. reciprocating systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating systems using dampers and springs in combination
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16M—FRAMES, CASINGS OR BEDS OF ENGINES, MACHINES OR APPARATUS, NOT SPECIFIC TO ENGINES, MACHINES OR APPARATUS PROVIDED FOR ELSEWHERE; STANDS; SUPPORTS
- F16M11/00—Stands or trestles as supports for apparatus or articles placed thereon ; Stands for scientific apparatus such as gravitational force meters
- F16M11/02—Heads
- F16M11/04—Means for attachment of apparatus; Means allowing adjustment of the apparatus relatively to the stand
- F16M11/043—Allowing translations
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16M—FRAMES, CASINGS OR BEDS OF ENGINES, MACHINES OR APPARATUS, NOT SPECIFIC TO ENGINES, MACHINES OR APPARATUS PROVIDED FOR ELSEWHERE; STANDS; SUPPORTS
- F16M11/00—Stands or trestles as supports for apparatus or articles placed thereon ; Stands for scientific apparatus such as gravitational force meters
- F16M11/02—Heads
- F16M11/04—Means for attachment of apparatus; Means allowing adjustment of the apparatus relatively to the stand
- F16M11/06—Means for attachment of apparatus; Means allowing adjustment of the apparatus relatively to the stand allowing pivoting
- F16M11/12—Means for attachment of apparatus; Means allowing adjustment of the apparatus relatively to the stand allowing pivoting in more than one direction
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16F—SPRINGS; SHOCK-ABSORBERS; MEANS FOR DAMPING VIBRATION
- F16F2222/00—Special physical effects, e.g. nature of damping effects
- F16F2222/04—Friction
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16F—SPRINGS; SHOCK-ABSORBERS; MEANS FOR DAMPING VIBRATION
- F16F2230/00—Purpose; Design features
- F16F2230/0005—Attachment, e.g. to facilitate mounting onto confer adjustability
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16F—SPRINGS; SHOCK-ABSORBERS; MEANS FOR DAMPING VIBRATION
- F16F2238/00—Type of springs or dampers
- F16F2238/02—Springs
- F16F2238/022—Springs leaf-like, e.g. of thin, planar-like metal
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16M—FRAMES, CASINGS OR BEDS OF ENGINES, MACHINES OR APPARATUS, NOT SPECIFIC TO ENGINES, MACHINES OR APPARATUS PROVIDED FOR ELSEWHERE; STANDS; SUPPORTS
- F16M2200/00—Details of stands or supports
- F16M2200/04—Balancing means
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- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
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Abstract
The invention provides a precision corner limiting shock-resistant vibration isolation buffer platform for small-sized photoelectric equipment, which comprises a photoelectric equipment mounting plate and a bottom mounting plate, wherein the photoelectric equipment mounting plate and the bottom mounting plate are connected through a corner limiter assembly and a vibration isolation buffer assembly arranged in the corner limiter, the vibration isolation buffer comprises a horizontal axial vibration isolation buffer and a vertical vibration isolation buffer, a vertical elastic supporting center O of the vertical vibration isolator coincides with a mass center c, and an elastic supporting plane of the horizontal vibration isolator coincides with a horizontal plane of the mass center as much as possible. The invention can effectively isolate vibration and buffer the strong impact and the violent vibration environment of the photoelectric equipment, ensure that the installation platform and the basic platform of the photoelectric equipment always keep three-dimensional linear translation, and ensure that the equipment is always in the excellent vibration impact environment of reliable operation, thereby improving the working reliability and the service life of the photoelectric equipment.
Description
Technical Field
The invention relates to the field of vibration isolation buffer platforms, in particular to a precision corner limiting impact-resistant vibration isolation buffer platform for small photoelectric equipment.
Background
At present, electronic equipment such as an inertial navigator, a gyroscope, a radar, an optical platform and the like of the avionic measurement and control photoelectric equipment are mainly rigidly mounted on a carrier, and also have a small amount of elastic mounting.
1 Rigid mounting
The rigid mounting mode keeps better stability and reliability of the initial calibration coordinates (X 0,Y0,Z0) and pose parameters (psi X, psi y, psi z) of the photoelectric equipment. But the environmental suitability of such optoelectronic devices themselves is high, in particular their resistance to strong impacts and strong vibrations. Sometimes even if they are subjected to optoelectronic property and structural reinforcement, the requirements for use cannot be met, resulting in a state where no acceptable optoelectronic product is available. In this case, the elastic support platform has to be used to isolate the strong impact and vibration that it receives.
2 Existing elastic mounting platform
The existing elastic mounting platform must have the following functions:
(1) The navigation attitude measurement and control photoelectric equipment is effectively isolated by vibration and impact;
(2) When the photoelectric equipment works, the platform is ensured to only have X, Y, Z triaxial free linear displacement, and micro-rotation angle displacement exceeding the requirement of specified precision is not allowed.
The micro-angle elastic supporting platforms commonly used at present have two types: first, the angular displacement error has a "high-precision impact isolator" of photoelectric equipment compensation, patent application publication number CN 105020329A. And secondly, the six-connecting-rod impact isolator is provided in the 'design of the ship-borne laser inertial navigation system impact isolator' with no optical signal equipment compensation for angular displacement error.
The mechanical principle of the two mechanisms is the same and each support rod takes the form of a spring-damper. The twelve pivot points of both are arranged on the upper and lower mounting base surfaces, respectively.
Because the supporting rod is composed of springs and damping, the upper base and the lower base cannot be kept parallel in the strong impact process, and the corner displacement limiting function is not provided, so that six degrees of freedom can have relative displacement in the impact process, the photoelectric equipment can lose the target, and the upper and lower mounting bases can reach a static state only under the action of the spring and damping force. The time from the start of the impact to the recovery to rest is called the reset time, and the data gives a reset time of 0.5 seconds. This means that the optoelectronic device is not operating properly during this time. Obviously, the relative angular displacement (psi x, psi y, psi z) error of the upper and lower mounting base surfaces after relative rest is the resetting precision of the mechanism, and the resetting precision given by the former in the patent document is 1 minute; the theoretical dynamic accuracy given in the latter paper is 33 angular seconds.
The elastic mounting structure has the following characteristics:
(1) The damping force has a remarkable influence on the resetting time and the resetting precision.
(A) Because the damping force is small, the reset time is long (more than or equal to 0.5 seconds);
(b) When the damping force is large, the error that the upper and lower mounting platforms recover to the relevant balance state during resetting is large, the resetting time is short, but the resetting precision is poor.
(2) The eccentricity of the device affects the elastic properties of the elastic support bar.
When the center of gravity of the device is eccentric on the upper mounting surface, the distribution and adjustment of the spring stiffness and damping force in the six supporting rods are difficult, and the decoupling design of the vibration isolation buffer system is not easy to realize.
(3) Liquid damping is preferred over dry friction damping.
Since the liquid damping force is proportional to the amount of speed change, for this reason, the amount of transient speed change Δv is large and the damping is large when strong impact is made with liquid damping. After impact, the speed is low, the damping force is small, the resetting time is short, and photoelectric compensation is adopted in the impact and resetting process, so that the directivity precision of the scheme is high.
But it must be noted that: the photoelectric compensation apparatus mounted on the lower mounting base must be able to withstand the strong impact environment directly, otherwise the compensation is not effective.
The reason is that the elastic damping characteristics are difficult to be respectively optimally designed according to the vibration isolation and buffering performance requirement and the reset function requirement of the triaxial vibration isolator.
The platform is composed of an angle limiter component and a vibration isolation buffer component. The vibration device can effectively isolate strong vibration impact from the outside and effectively limit the angular displacement in the vibration impact process and after the impact, thereby ensuring the precision positioning precision and the working reliability of the photoelectric equipment.
Disclosure of Invention
The invention aims to solve the problems in the prior art, and provides a precision corner limiting impact-resistant vibration-isolating buffer platform for small-sized photoelectric equipment, which can effectively isolate and buffer strong impact and intense vibration environments of the photoelectric equipment, and ensure that the photoelectric equipment is always in an excellent vibration impact environment for reliable operation, thereby improving the reliability and long service life of the photoelectric equipment.
The vibration isolation device comprises a photoelectric device mounting plate and a bottom mounting plate, wherein a corner limiter assembly and a vibration isolation buffer assembly are arranged between the photoelectric device mounting plate and the bottom mounting plate. The vibration isolation buffer assembly comprises a horizontal axial vibration isolation buffer and a vertical vibration isolation buffer. The vertical elastic supporting center O of the vertical vibration isolator coincides with the mass center C, and the elastic supporting center O 1 of the horizontal axial vibration isolation buffer coincides approximately with the horizontal plane of the mass center. The two impact isolation devices respectively perform vertical impact and horizontal impact on the platform to perform effective impact isolation.
The precise corner limiter assembly is a hollow structure in a shape of a Chinese character jing and is composed of a horizontal plane corner limiter assembly, a middle plate and a vertical corner limiter assembly. When the impact mainly comes from the vertical direction, the vertical corner limiter component is arranged below and connected with the photoelectric device mounting plate; when the impact direction mainly comes from the horizontal direction, the horizontal plane corner limiting assembly is arranged below and connected with the bottom mounting plate.
The vertical vibration isolation buffer comprises an outer shell body consisting of an outer shell and a bottom plate, and the bottom plate is fixedly connected with a bottom mounting plate; the center of the upper part of the shell is inserted with an adjusting bolt, the outer edge of the adjusting bolt is sleeved with a cap and an adjusting nut, the cap and the shell are separated by a check ring, and an inner ring is sleeved between the outer edge of the cap and the check ring; the lower part of the cap extends into the shell along the axial direction of the adjusting bolt, an upper rubber ring is sleeved on the outer edge of the part extending into the shell, the lower end of the cap is of an outer flange structure, and a metal damper is sleeved on the outer side of the outer flange structure; a spiral spring is arranged between the bottom plate and the adjusting nut, and a lower rubber ring fixed on the bottom plate is sleeved on the outer edge of the lower portion of the spiral spring.
The metal damper comprises a reed group surrounding an outer flange structure at the lower end of the cap, the lower end of the reed group is connected with the bottom plate through a cushion sleeve, the upper end of the reed group is tightly pressed with the shell retainer ring through an opening adjusting ring and a conical ring, and the reed group comprises straight reeds and bent reeds which are distributed at intervals.
The horizontal axial vibration isolation buffer is characterized in that an isolating ring with a horizontal buffer ring is arranged in a horizontal seat to separate an upper plane spring from a lower plane spring, a horizontal friction plate is arranged at the upper end of the upper plane spring, a horizontal damping adjusting sleeve is arranged at the center of the horizontal seat, a lower sliding vane and a disc spring are arranged at the lower end of the horizontal damping adjusting sleeve, and the horizontal damping adjusting nut is used for locking and solidifying after damping is adjusted.
The invention relates to a precision corner limiting shock-resistant vibration-isolating buffer platform for small-sized photoelectric equipment, which is characterized in that a corner limiter is firstly arranged between a photoelectric equipment mounting plate and a bottom mounting plate, and triaxial free sliding is realized. The horizontal axial vibration isolation damper fixed to the equipment mounting plate and the vertical vibration isolation damper fixed to the base plate are then connected by a load bearing shaft.
The invention has the beneficial effects that:
1. The corner limiter adopted by the invention can bear a certain moment of inertia while meeting the corner precision of the photoelectric equipment, and the vibration isolation buffer is adopted to bear the impact dynamic load F d and the moment of inertia M d borne by the corner limiter, so that the corner limiter is ensured to be in a low impact dynamic load F d and low impact moment of inertia M d state. Thereby ensuring the stability and the service life of the limiting precision of the corner limiter.
2. The vibration isolation buffer combination is adopted in the invention, so that the strong impact and the violent vibration environment of the photoelectric equipment can be effectively isolated and buffered, the photoelectric equipment is ensured to be always in the excellent vibration impact environment of reliable operation, and the reliability and the long service life of the photoelectric equipment are improved.
3. Reducing the reinforcement requirements on the optoelectronic device itself.
4. Provides technical support for the original static working photoelectric equipment on the basis of land fixation to be transplanted to various carriers (ships, airplanes, rockets and missiles). Optoelectronic devices such as navigator, theodolite, laser and the like in various carriers are usually connected with a rigid connection platform without vibration isolation buffer system protection. The structure and the photoelectric system of the corner limiting vibration isolation buffer platform provided by the invention are fully reinforced due to the fact that the corner limiting vibration isolation buffer platform and the rigid platform bear strong impact and vibration environments, so that the overall weight is increased, and the cost is increased.
5. The horizontal guide rail component and the impact forces F X and F y are arranged at 45 degrees along the coordinate xoy, so that the impact force in the vertical horizontal guide rail can be reduced, and the guide rail combination with smaller impact force and lighter weight can be selected.
Drawings
Fig. 1 is a schematic view of a precision corner limiting strong impact resistant vibration isolation buffer platform.
Fig. 2 is a schematic view of the structure of the vertical axial vibration isolation damper of the present invention.
Fig. 3 is a schematic view of the structure of the horizontal axial vibration isolation damper of the present invention.
FIG. 4a is a schematic view of a precision corner limiter assembly under a vertical guide rail.
Fig. 4b is a schematic view of a vertical rail overhead precision corner limiter assembly.
Fig. 5a is a schematic view of an X-axis impact with the horizontal rail mounting plane disposed at 45 ° to the impact force direction. Fig. 5b is a schematic view of the Y-axis impact when the horizontal rail mounting plane is disposed at 45 ° to the impact force direction.
Detailed Description
The invention is further described below with reference to the accompanying drawings.
The structure of the invention is shown in fig. 1, and comprises an optoelectronic device mounting plate 5 and a bottom mounting plate 1 for mounting optoelectronic devices 6, wherein the optoelectronic device mounting plate 5 and the bottom mounting plate 1 are connected through a corner limiter assembly 3 and a vibration isolation buffer assembly, the vibration isolation buffer assembly comprises a horizontal axial vibration isolation buffer 4 and a vertical vibration isolation buffer 2, a vertical elastic supporting center O of the vertical vibration isolation buffer 2 coincides with a mass center C, and an elastic supporting center O 1 of the horizontal axial vibration isolation buffer 4 coincides with a horizontal plane of the mass center C 1. The two impact isolation devices respectively perform vertical impact and horizontal impact on the platform to perform effective impact isolation.
As shown in fig. 2, the vertical vibration isolation buffer comprises an outer shell body composed of an outer shell 7 and a bottom plate 8, wherein an adjusting bolt 15 is inserted into the center of the upper part of the outer shell 7, a cap 18 and an adjusting nut 19 are sleeved on the outer edge of the adjusting bolt 15, the cap 18 is separated from the outer shell 7 through an upper retainer ring 16, and an inner ring 17 is sleeved between the outer edge of the cap 18 and the upper retainer ring 16; the lower part of the cap 18 axially extends into the shell 7 along the adjusting bolt 15, an upper buffer pad 12 is sleeved on the outer edge of the part extending into the shell 7, the lower end of the cap 18 is of an outer flange structure, and a metal damper is sleeved on the outer side of the outer flange structure; a spiral spring 10 is arranged between the bottom plate 8 and the adjusting nut 13, and the outer edge of the lower part of the spiral spring is sleeved with a lower buffer cushion 9 fixed on the bottom plate 8.
The metal damper comprises a reed group which surrounds the outer flange structure at the lower end of the cap 18, and the reed group comprises straight reeds 5 and bent reeds 17 which are distributed at intervals. The lower end of the reed group is riveted with a straight reed 37 and a bent reed 38 into a whole through a cushion sleeve 35 and a lower ring 36, and is connected with the bottom plate 8 through the cushion sleeve 35, and the upper end is tightly pressed with the shell 7 and the upper check ring 16 through an opening ring 39 and a conical ring 40. As shown in fig. 3, the horizontal axial vibration isolation buffer comprises a shaft sleeve 29 and a shell 23, wherein a horizontal friction plate 28, an upper plane spring 27, a spacer ring 25 embedded into a horizontal cushion pad 26 and a lower plane spring 24 are arranged between the shaft sleeve 29 and the shell 23 from top to bottom, and a vibration displacement space is reserved between the horizontal cushion pad 26 and the shaft sleeve 29. A sliding sheet 22 and a horizontal damping adjusting sleeve 20 are sleeved on the outer edge of a shaft sleeve 29 below the shell 23 in sequence, and a disc spring 21 is arranged between the horizontal damping adjusting sleeve 20 and the sliding sheet 22. The outer column surface of the shell 23 is connected with the photoelectric device mounting plate through threads. The bearing shaft is threaded through the bushing 29 to the vertical vibration isolator.
As shown in fig. 4a and 4b, the precise corner limiter assembly is a hollow structure in a shape of a Chinese character jing, which is formed by a horizontal corner limiter assembly, a middle plate 32 and a vertical corner limiter assembly. The vertical guide rail has two distribution modes, an upper one (fig. 4 b) and a lower one (fig. 4 a), taking the lower one in fig. 4a as an example:
the horizontal plane corner limiter assembly is composed of four two-dimensional sliding seats 33, each two-dimensional sliding seat 33 comprises two vertical sliding grooves and two horizontal sliding grooves, and one-dimensional linear sliding rails 34 are inserted into each sliding groove to form a hollow groined structure. The upper one-dimensional linear slide rail 34 is connected with the optoelectronic device mounting plate 5, and the lower one-dimensional linear slide rail 34 is connected with the middle plate 32.
The vertical corner limiter assembly comprises four vertical sliding rails 31 and four vertical sliding seats 30, wherein the vertical sliding rails 31 are orthogonally connected with a middle plate 32, the vertical sliding seats 30 are orthogonally connected with the bottom mounting plate 1, and the vertical sliding rails 31 are inserted into the vertical sliding seats 30 to be slidingly connected.
The vertical guide rail precise corner limiter has the advantages that the slide rail is connected with the upper mounting plate for mounting the photoelectric equipment and the lower mounting plate connected with the foundation, the structure is compact, the connecting piece adopting the one-dimensional guide rail structure and a large number of screws are omitted, the structural rigidity is good, and the corner limiting function is stable and reliable.
Whether the vertical guide rail is placed above or below depends on: vertical impact acceleration valueHorizontal acceleration value/> Is of a size of (a) and (b).
(1) When (when)In order to reduce the horizontal impact acceleration of the vertical sliding rail, the vertical sliding rail is selected to be arranged on the upper side of the vibration isolator after the vertical buffering of the vibration isolator (figure 4 a).
(2) When (when)In order to reduce the vertical impact acceleration of the horizontal guide rail, the vertical guide rail is selected to be arranged downwards after the vertical buffer of the vibration isolator [ fig. 4b ].
(3) To further reduce the horizontal impact acceleration to which each horizontal guide rail is subjectedThe impact force direction can be 45 degrees with the coordinate axis of the horizontal guide rail, and the force born by each guide rail is/>And the vertical guide rail and the equipment only receive the impact response acceleration after being buffered by the horizontal buffer.
As shown in fig. 5a and 5b, in order to reduce the horizontal impact acceleration applied to the horizontal guide rail, the horizontal guide rail may be installed offset from the heading X-axis by 45 °, and if the X-axis or the Y-axis is impacted by the maximum impact acceleration peak a x0 or a y0, respectively, fx=ma x,Fy＝may is set: a x,ay is the strong impact acceleration in the x-axis direction and the y-axis direction respectively, and m is the average mass of the electronic equipment, the upper mounting plate and the corner limiter. The horizontal rail is forced to Fx ' in the X ' axis and Fy ' in the Y ' axis, and since the horizontal rails X, Y slide are in the X ' 1O'Y'1 and X "2O"Y"2 platforms, respectively, then fx=ma x＝Fx1'+Fy1 ″ is present (fig. 5 a) and fy=ma y＝Fx2'+Fy2 ″ is present when a strong impact is performed in either the X or Y axis. Since the guide rails in both directions are simultaneously subjected to impact load when strong impact is applied in the x-axis direction or the y-axis direction, the force applied to the guide rails in each direction is only the impact load in the directionMultiple times. In this case, the life and reliability of the linear ball guide can be improved.
The present invention has been described in terms of the preferred embodiments thereof, and it should be understood by those skilled in the art that various modifications can be made without departing from the principles of the invention, and such modifications should also be considered as being within the scope of the invention.
Claims (4)
1. The utility model provides a spacing shock resistance vibration isolation buffer platform of small-size photoelectric device accurate corner, includes photoelectric device mounting panel and bottom mounting panel, its characterized in that: the photoelectric device mounting plate and the bottom mounting plate are connected through a precise corner limiter assembly and a vibration isolation buffer, the vibration isolation buffer comprises a horizontal axial vibration isolation buffer and a vertical vibration isolation buffer, and a vertical elastic supporting center O of the vertical vibration isolator coincides with a mass center c; the precise corner limiter assembly is a hollow structure in a shape of a Chinese character jing, and the precise corner limiter assembly is a hollow structure in a shape of a Chinese character jing, which is formed by a horizontal plane corner limiter assembly, a middle plate and a vertical corner limiter assembly; the vertical vibration isolation buffer comprises an outer shell body consisting of an outer shell and a bottom plate, and the outer shell body is fixedly connected with the bottom mounting plate; an adjusting bolt is inserted into the center of the upper part of the shell, and a hexagonal ring is arranged at the top of the adjusting bolt; the middle part of the outer edge of the adjusting bolt is provided with a shaft shoulder, the upper part of the shaft shoulder is sleeved with a cap, and the lower part of the shaft shoulder is screwed with an adjusting nut; a retainer ring is arranged between the upper part of the cap cover and the shell, the outer edge of the cap cover is matched with the retainer ring through an inner ring, and the outer edge of the retainer ring is matched with an inner hole of the shell; the lower part of the cap extends into the shell along the axial direction of the adjusting bolt, an outer flange is arranged at the lower end of the cap, a metal damper assembly is sleeved outside the outer flange, an upper buffer pad is sleeved on the outer edge of the cap at the upper part of the outer flange, and a distance is reserved between the upper buffer pad and the retainer ring in the vertical direction; a spiral spring is arranged between the bottom plate and the adjusting nut; the bottom plate is provided with a lower buffer cushion which is arranged outside the spiral spring and vertically spaced from the lower flange of the cap; the horizontal vibration isolation buffer comprises a shell with an opening at the lower part, a shaft sleeve with a flange at the upper part is arranged in the shell, and the lower part of the shaft sleeve extends out of the shell; a horizontal friction plate, an upper plane spring, a horizontal buffer ring and a lower plane spring are sequentially arranged between the flange of the shaft sleeve and the shell from top to bottom; a gap is reserved between the flange of the shaft sleeve and the inner wall of the shell, and a gap is reserved between the shaft sleeve and the lower end opening of the shell; the outer edge of the horizontal friction plate is contacted with the inner wall of the shell, and a gap is reserved between the inner wall of the horizontal friction plate and the outer edge of the shaft sleeve; the outer edges of the upper and lower plane springs are contacted with the inner wall of the shell, and the inner walls of the upper and lower plane springs are contacted with the outer edges of the shaft sleeve; the outer edge of the horizontal buffer ring is contacted with the inner wall of the shell through the isolating ring, and a gap is reserved between the inner wall of the horizontal buffer ring and the outer edge of the shaft sleeve; the outer edge of the part of the shaft sleeve extending out of the shell is sequentially provided with a sliding sheet and a horizontal adjusting nut internally provided with a belleville spring from top to bottom, and the height of the belleville spring is higher than the upper plane of the horizontal adjusting nut; the outer wall of the shell is fixedly connected with the equipment mounting plate; the horizontal axial vibration isolation buffer and the vertical vibration isolation buffer are connected through a connecting shaft, and the connecting shaft penetrates through a shaft sleeve of the horizontal axial vibration isolation buffer and is inserted into a matched unthreaded hole in an adjusting bolt of the vertical vibration isolation buffer and screwed through threads, so that a horizontal adjusting nut of the horizontal axial vibration isolation buffer is abutted against a hexagonal ring of the vertical vibration isolation buffer.
2. The small-sized photoelectric equipment precise corner limiting impact-resistant vibration-isolating buffer platform according to claim 1, wherein the small-sized photoelectric equipment precise corner limiting impact-resistant vibration-isolating buffer platform is characterized in that: one group of sliding rails of the sliding rail of the precise corner limiter is perpendicular to the impact force acting direction, and the other group of sliding rails slide in the same direction.
3. The small-sized photoelectric equipment precise corner limiting impact-resistant vibration-isolating buffer platform according to claim 1, wherein the small-sized photoelectric equipment precise corner limiting impact-resistant vibration-isolating buffer platform is characterized in that: the two groups of sliding rails of the precise corner limiter are arranged at 45 degrees with the impact force acting direction.
4. The small-sized photoelectric equipment precise corner limiting impact-resistant vibration-isolating buffer platform according to claim 1, wherein the small-sized photoelectric equipment precise corner limiting impact-resistant vibration-isolating buffer platform is characterized in that: when the impact mainly comes from the vertical direction, the vertical corner limiter component is arranged below and connected with the photoelectric device mounting plate; when the impact direction mainly comes from the horizontal direction, the horizontal plane corner limiting assembly is arranged below and connected with the bottom mounting plate.
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910227669.7A CN110030316B (en) | 2019-03-25 | 2019-03-25 | Precision corner limiting shock-resistant vibration-isolating buffer platform for small photoelectric equipment |
| US17/439,316 US11965574B2 (en) | 2019-03-25 | 2020-03-20 | Compact precision angular-displacement-limiting impact-resistant vibration-isolating buffering platform for compact optoelectronic equipment |
| PCT/SG2020/050151 WO2020197491A1 (en) | 2019-03-25 | 2020-03-20 | Compact precision angular-displacement-limiting impact-resistant vibration-isolating buffering platform for compact optoelectronic equipment |
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| CN201910227669.7A CN110030316B (en) | 2019-03-25 | 2019-03-25 | Precision corner limiting shock-resistant vibration-isolating buffer platform for small photoelectric equipment |
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| CN110030316A CN110030316A (en) | 2019-07-19 |
| CN110030316B true CN110030316B (en) | 2024-06-11 |
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| CN110657190B (en) * | 2019-08-15 | 2024-03-19 | 中国电力科学研究院有限公司 | Composite spring component and vertical vibration isolation device comprising same |
| CN111022546B (en) * | 2019-12-31 | 2024-06-14 | 石家庄距龙盘科技有限公司 | Vibration damper without angular displacement |
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