CN118426152B - Variable-magnification double telecentric photoetching lens - Google Patents
Variable-magnification double telecentric photoetching lens Download PDFInfo
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- CN118426152B CN118426152B CN202410897649.1A CN202410897649A CN118426152B CN 118426152 B CN118426152 B CN 118426152B CN 202410897649 A CN202410897649 A CN 202410897649A CN 118426152 B CN118426152 B CN 118426152B
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- 238000001259 photo etching Methods 0.000 title claims abstract description 37
- 230000003287 optical effect Effects 0.000 claims abstract description 38
- 238000001459 lithography Methods 0.000 claims description 43
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- 210000001747 pupil Anatomy 0.000 claims description 4
- 230000000694 effects Effects 0.000 abstract description 8
- 230000004075 alteration Effects 0.000 abstract description 7
- 230000008901 benefit Effects 0.000 abstract description 3
- 230000009467 reduction Effects 0.000 description 12
- 238000003384 imaging method Methods 0.000 description 11
- 239000000758 substrate Substances 0.000 description 10
- 238000000206 photolithography Methods 0.000 description 7
- 238000010586 diagram Methods 0.000 description 6
- 230000009286 beneficial effect Effects 0.000 description 5
- 230000008859 change Effects 0.000 description 4
- 239000003292 glue Substances 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 3
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- 238000005530 etching Methods 0.000 description 1
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B15/00—Optical objectives with means for varying the magnification
- G02B15/14—Optical objectives with means for varying the magnification by axial movement of one or more lenses or groups of lenses relative to the image plane for continuously varying the equivalent focal length of the objective
- G02B15/16—Optical objectives with means for varying the magnification by axial movement of one or more lenses or groups of lenses relative to the image plane for continuously varying the equivalent focal length of the objective with interdependent non-linearly related movements between one lens or lens group, and another lens or lens group
- G02B15/163—Optical objectives with means for varying the magnification by axial movement of one or more lenses or groups of lenses relative to the image plane for continuously varying the equivalent focal length of the objective with interdependent non-linearly related movements between one lens or lens group, and another lens or lens group having a first movable lens or lens group and a second movable lens or lens group, both in front of a fixed lens or lens group
- G02B15/167—Optical objectives with means for varying the magnification by axial movement of one or more lenses or groups of lenses relative to the image plane for continuously varying the equivalent focal length of the objective with interdependent non-linearly related movements between one lens or lens group, and another lens or lens group having a first movable lens or lens group and a second movable lens or lens group, both in front of a fixed lens or lens group having an additional fixed front lens or group of lenses
- G02B15/173—Optical objectives with means for varying the magnification by axial movement of one or more lenses or groups of lenses relative to the image plane for continuously varying the equivalent focal length of the objective with interdependent non-linearly related movements between one lens or lens group, and another lens or lens group having a first movable lens or lens group and a second movable lens or lens group, both in front of a fixed lens or lens group having an additional fixed front lens or group of lenses arranged +-+
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B13/00—Optical objectives specially designed for the purposes specified below
- G02B13/22—Telecentric objectives or lens systems
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
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Abstract
The invention relates to a variable-multiplying power double telecentric photoetching lens, which is sequentially arranged from an object side to an image side: the front lens group with positive focal power and the rear lens group with positive focal power, wherein the front lens group consists of a first lens, a second lens, a third lens, a fourth lens and a fifth lens which are sequentially arranged from the object side to the image side, and the rear lens group comprises a movable lens, and has the advantages that a double telecentric optical system is adopted, and through reasonable collocation of lens surfaces and focal power, the optical beam trend in the lens is controlled, the aberration is reduced, the effects of high resolution (more than 0.35@75 lp/mm), low distortion (less than 0.01%), wide focal depth (more than 480 um) and small telecentricity (less than or equal to 0.07 DEG) are achieved, the use requirement is met, fine adjustment (2.99-3.01) of the magnification is achieved through the back-and-forth movement of the movable lens, and the consistency and accuracy of projection positioning are improved.
Description
Technical Field
The invention relates to a photoetching lens, in particular to a variable-magnification double telecentric photoetching lens.
Background
Photolithography is a key step in the chip manufacturing process, while a photolithography lens is an important component in a photoetching machine, and the imaging performance of the photolithography lens directly influences the line precision of a chip. A Spatial Light Modulator (SLM) is a micro device comprising a plurality of individual units, which can change parameters such as amplitude, phase and polarization state of spatial light, a mask is not required in a photolithography technique based on the SLM, the SLM can form different patterns, and multiple exposures are completed by projection of a photolithography lens onto a substrate. In the photoetching machine, the substrate area can be a larger piece, a plurality of photoetching lenses work simultaneously, and a plurality of generated projections are mutually combined to cover the substrate. And each photoetching lens is provided with an SLM and a light source which are matched with each other, after the photoetching lens is assembled in the photoetching machine, the relative positions of the devices are required to be adjusted, so that the image surfaces of a plurality of photoetching lenses are on the same plane, and confocal is ensured.
In order to ensure the accuracy of projection, the lithography machine needs to have the characteristics of high exposure resolution, high confocal precision and high positioning precision. The object-side principal ray and the image-side principal ray of the double telecentric optical system are almost parallel to the optical axis, and the angles of the object-side principal ray and the image-side principal ray can be represented by telecentricity, and the double telecentric optical system is characterized by constant amplification rate, no parallax and low distortion in a certain object distance and image distance range, and can be widely applied to the photoetching field. Some photoetching lenses also use variable power optical systems, and are characterized in that the lens defocus amount is changed by changing the interval between the lens and the substrate, or the focal length of the lens is changed by moving the position of a specific lens group in the lens back and forth, so that the projection size of the surface of the substrate is changed, and the fine adjustment of the power is completed. With the improvement of chip manufacturing process, the performance requirements of the lithography lens are also improved. The existing photoetching lens has the following conditions:
1) The imaging quality of a lens can be represented by a number of performance parameters of resolution, depth of focus, distortion, etc. When the photoetching machine works, if errors exist in factors such as flatness of a chip substrate, thickness of photoresist of the substrate and the like, imaging of the upper surface and the lower surface of a glue layer in the exposure etching process are inconsistent, in order to avoid the phenomenon, part of lenses can increase focal depth by reducing numerical aperture, but the resolution is reduced. The chinese patent application number 202010568828.2 provides a double telecentric optical system with high resolution (0.9@100 lp/mm) and low distortion (0.02%) but with a small depth of focus (+ -35 um).
2) If errors exist in the matching of mechanical structures assembled in the photoetching machine, under the condition that the positions of the light source, the SLM and the substrate are unchanged, the photoetching lens deviates from the original position, the conjugation relation of the object and image is changed, the image plane is not coincident with the surface of the substrate, and the projection sizes on the substrate are different and cannot be spliced perfectly. Typically, a zoom lens is used to compensate for the error. However, in order to ensure stability, the optical machine structure of the photoetching lens is not changed after the photoetching lens is installed in the photoetching machine. Therefore, the lens with adjustable multiplying power is used, and the multiplying power of the lens is adjusted according to the actual condition of the photoetching machine during assembly and debugging, so that the high confocal precision and the high positioning precision of each photoetching lens are ensured, and the consistency and the accuracy of projection imaging are ensured. The chinese patent application with application number 202310600377.X proposes a double telecentric optical system with adjustable magnification, which fine-adjusts the magnification (2.74985-2.75221) by moving the lens, but has a smaller numerical aperture NA (0.04-0.07), which affects the resolution of the lens.
3) The cost of the lens is related to the number of lenses. In order to achieve high resolution, most lenses increase the number of lenses, but at the same time increase the cost and reduce the transmittance. The cemented lens can reduce the lens number, but the cemented layer has the problems of glue gasification, glue opening, aging and deterioration after long-term exposure, and the like, and influences the appearance of the lens and the imaging quality of the lens. The Chinese patent application with the application number 202110505623.4 provides a photoetching imaging system, which has the effects of high resolution (0.5@100 lp/mm) and large focal depth (+ -350 um) and has more lenses (12 sheets).
Disclosure of Invention
The invention aims to solve the technical problem of providing a variable-magnification double telecentric photoetching lens which is relatively low in cost, high in resolution, low in distortion, wide in focal depth and small in telecentricity.
The technical scheme adopted for solving the technical problems is as follows: a variable magnification double telecentric photoetching lens is provided with the following components in sequence from an object side to an image side: the front lens group consists of a first lens, a second lens, a third lens, a fourth lens and a fifth lens which are sequentially arranged from an object side to an image side, wherein the first lens has positive focal power, the object side is a convex surface, and the image side is a convex surface; the second lens has negative focal power, the object side surface is a convex surface, and the image side surface is a concave surface; the third lens has positive focal power, and the object side surface is a convex surface; the fourth lens has negative focal power, the object side surface is a convex surface, and the image side surface is a concave surface; the fifth lens has positive focal power, and the object side surface is a convex surface; the rear lens group comprises a movable lens, the movable lens has positive focal power, and the image side surface is a convex surface; the whole photoetching lens meets the following conditions: NA is more than or equal to 0.09 and less than or equal to 0.1,2.99 and less than or equal to M is more than or equal to 3.01,0.99 and less than or equal to | imgH/objH/m| and less than or equal to 1, 16 < |f/EXPD | 2 < 25, wherein NA is the object numerical aperture of the lithography lens, M is the magnification, objH is the object height on any field of view, imgH is the corresponding image height, f is the focal length of the lithography lens, EXPD is the exit pupil diameter of the lithography lens, and the following conditions are satisfied: 0.02 < |f 100/f|＜0.04,0.08＜|f200/f|＜0.14,0.25＜|f100/f200 | < 0.35, wherein f is the focal length of the photoetching lens, and f 100、f200 is the focal length of the front lens group and the rear lens group respectively.
Compared with the prior art, the invention has the advantages that the double telecentric optical system is adopted, the light trend in the lens is controlled by reasonably collocating the lens surface and the focal power, the aberration is reduced, the effects of high resolution (more than 0.35@75 lp/mm), low distortion (less than 0.01%), wide focal depth (more than 480 um) and small telecentricity (less than or equal to 0.07 DEG) are realized, and the use requirement is met. By moving the movable lens back and forth, fine adjustment (2.99-3.01) of magnification is realized, and consistency and accuracy of projection positioning are improved. And meanwhile, a small number (9 or 10) of lenses are used, so that the assembly difficulty and the manufacturing cost are reduced.
The rear lens group consists of a sixth lens, a seventh lens, an eighth lens and a ninth lens which are sequentially arranged from the object side to the image side, wherein the sixth lens has negative focal power, and the image side is a concave surface; the image side surface of the seventh lens is a convex surface; at least one of the object side surface and the image side surface of the eighth lens is a convex surface, the ninth lens has positive focal power, the image side surface is a convex surface, the movable lens can be a single-piece ninth lens or can be composed of two lenses, namely the eighth lens and the ninth lens, and the requirements are satisfied: 0.5 < |f 7/f200|＜1.5,0.9＜|f8/f200|＜2.1,f7 and f 8 are the focal lengths of the seventh lens and the eighth lens, respectively.
The rear lens group comprises a sixth lens, a seventh lens, an eighth lens, a ninth lens and a tenth lens which are sequentially arranged from the object side to the image side, wherein the sixth lens has negative focal power, and the image side surface is a concave surface; the image side surface of the seventh lens is a convex surface; at least one of the object side surface and the image side surface of the eighth lens is a convex surface, the ninth lens has positive focal power, the image side surface is a convex surface, the tenth lens has positive focal power, the image side surface is a convex surface, the movable lens can be a single tenth lens or can be composed of two lenses, namely the ninth lens and the tenth lens, and the requirements are that: 0.5 < |f 7/f200|＜1.5,0.9＜|f8/f200|＜2.1,f7 and f 8 are the focal lengths of the seventh lens and the eighth lens, respectively.
Preferably, the lithography lens satisfies the following conditional expression:
1.5 < |f 1/f100|＜2.5,1.2＜|f2/f100|＜2.4,1.0＜|f3/f100 | < 1.4, wherein f 1、f2 and f 3 are focal lengths of the first lens, the second lens and the third lens respectively, and f 100 is a focal length of the front lens group.
Preferably, the lithography lens satisfies the following conditional expression: 15 < VD 2＜55,55＜VD3 < 80, wherein VD 2 and VD 3 are the dispersion coefficients of said second lens and said third lens, respectively.
Preferably, the lithography lens satisfies the following conditional expression: nd 2＜1.8,1.2＜Nd3 < 1.6, wherein Nd 2 and Nd 3 are refractive indices of the second lens and the third lens, respectively.
Drawings
FIG. 1 is a schematic diagram of an optical system according to an example I of the present invention;
FIG. 2 is a graph of a conventional defocus transfer function of an example one of the present embodiments;
FIG. 3 is a graph of a zoom out-of-focus transfer function for example one of the embodiments of the present invention;
FIG. 4 is a graph of a magnification defocus transfer function of an example one of the present embodiments;
FIG. 5 is a distortion chart of an example one of the embodiments of the present invention;
FIG. 6 is a schematic diagram of an optical system according to a second embodiment of the present invention;
FIG. 7 is a graph of a conventional defocus transfer function of example two of the present invention;
FIG. 8 is a graph of a zoom out-of-focus transfer function for example two of the present invention;
FIG. 9 is a graph of a magnification defocus transfer function of example two of the present invention;
FIG. 10 is a distortion chart of example two of the present invention;
FIG. 11 is a schematic diagram of an optical system according to an example III of the present invention;
FIG. 12 is a graph of a conventional defocus transfer function of example three of an embodiment of the present invention;
FIG. 13 is a graph of a zoom out-of-focus transfer function for example three of an embodiment of the present invention;
FIG. 14 is a graph of a magnification defocus transfer function of example three of an embodiment of the present invention;
FIG. 15 is a distortion chart of example III of an embodiment of the present invention;
FIG. 16 is a schematic diagram of an optical system according to example four of the present invention;
FIG. 17 is a graph of a conventional defocus transfer function of example four of an embodiment of the present invention;
FIG. 18 is a graph of a zoom out-of-focus transfer function for example four of an embodiment of the present invention;
FIG. 19 is a graph of a magnification defocus transfer function of example four of the present embodiment;
FIG. 20 is a distortion chart of example four of an embodiment of the present invention;
FIG. 21 is a schematic diagram of an optical system according to an example five of the present invention;
FIG. 22 is a graph of a conventional defocus transfer function of example five of the present embodiment;
FIG. 23 is a graph of a zoom out-of-focus transfer function for example five of an embodiment of the present invention;
FIG. 24 is a graph of a magnification defocus transfer function of example five of the present embodiment;
FIG. 25 is a distortion chart of example five of an embodiment of the present invention;
FIG. 26 is a schematic diagram of an optical system according to example six of the present invention;
FIG. 27 is a graph of a conventional defocus transfer function of example six of the present embodiment;
FIG. 28 is a graph of a zoom out-of-focus transfer function for example six of an embodiment of the present invention;
FIG. 29 is a graph of a magnification defocus transfer function of example six of the present embodiment;
fig. 30 is a distortion chart of example six of the embodiment of the present invention.
Detailed Description
The invention is described in further detail below with reference to the embodiments of the drawings.
In the drawings, the thickness, size, and shape of the lenses have been slightly exaggerated for convenience of explanation. The drawings are merely examples and are not necessarily drawn to scale.
( The formula referred to herein is: r=k 1λ/NA、DoF=k2λ/NA2、0.99≤|imgH/objH/M|≤1、16＜|f/EXPD|2 < 25 )
Examples: a variable magnification double telecentric photoetching lens is provided with the following components in sequence from an object side to an image side: front lens group with positive focal power and rear lens group with positive focal power meet the following conditional expression: NA is more than or equal to 0.09 and less than or equal to 0.1,0.99 and less than or equal to | imgH/objH/M| and less than or equal to 1, and 16 < |f/EXPD | 2 < 25, wherein NA is the object numerical aperture of the lithography lens, objH is the object height on any view field, the unit is millimeter mm, imgH is the corresponding image height, the unit is millimeter mm, M is the magnification, f is the focal length of the lithography lens, the unit is millimeter mm, EXPD is the exit pupil diameter of the lithography lens, and the unit is millimeter mm.
The resolution of the lithography lens is related to the numerical aperture: r=k 1 λ/NA, where R is a theoretical resolution length, the smaller the value is, the stronger the resolution capability, k 1 is a process factor, the value is a constant, the value is usually 0.38-0.5, λ is a wavelength, and NA is a numerical aperture. The depth of focus of a lithography lens is also related to the numerical aperture: dof=k 2λ/NA2, where DoF is the theoretical depth of focus, the greater the value, the greater the depth of focus, k 2 is the correlation coefficient, and the value is constant, and typically the value is 0.4-0.85. As can be seen from the two formulas above, the resolution of the lithography lens is inversely related to the depth of focus. Therefore, in order to achieve the benefits of both high resolution and wide depth of focus, the overall design of the lithographic lens needs to be balanced.
In an exemplary embodiment, the conditional expression of imgH/objH/M represents the relation between the actual magnification and the theoretical magnification, and the proportional relation is reasonably set in a given range, so that the imaging size of the lithography lens can be controlled, and the distortion of the lithography lens can be reduced.
In an exemplary embodiment, the conditional expression |f/EXPD | 2 indicates a relationship between a focal length and an exit pupil diameter of the lithography lens, and the ratio relationship is reasonably set in a given range, so that an imaging position of the lithography lens can be controlled, and a focal depth of the lithography lens can be increased.
In an exemplary embodiment, the focal length f of the lithography lens, the focal length f 100 of the front lens group, and the focal length f 200 of the rear lens group satisfy: the proportion relation is reasonably set in the given range, and the light trend of the object side and the image side can be controlled, so that the telecentricity is reduced.
In an exemplary embodiment, the front lens group is sequentially arranged from the object side to the image side with a first lens L1, a second lens L2, a third lens L3, a fourth lens L4 and a fifth lens L5, wherein the first lens L1, the second lens L2 and the third lens L3 convert the object side light from a divergent angle to be approximately parallel, and the fourth lens L4 and the fifth lens L5 reduce the light beam propagation angle to form a convex shape in the middle of two tips, which is matched with the rear lens group, thereby being beneficial to controlling most aberrations and improving the imaging quality.
In an exemplary embodiment, the first lens element L1 has positive optical power, the object-side surface is convex, the image-side surface is convex, and the first lens element L1 has smaller optical power, so that the object-side light can be smoothly collected at the second lens element L2, which is beneficial to reducing aberration and reducing sensitivity of the lithography lens. The focal length f 1 and the front group focal length f 100 of the first lens L1 satisfy: 1.5 < |f 1/f100 | < 2.5, and the optical power proportion is reasonably arranged, so that the effects of high resolution and wide focal depth are realized.
In an exemplary embodiment, the second lens element L2 has negative optical power, and has a convex object-side surface, so as to change the light ray trend, and has a concave image-side surface, so as to eliminate aberration caused by the object-side surface; the third lens L3 has positive optical power, and an object-side surface is a convex surface. The focal length f 2 of the second lens L2, the focal length f 3 of the third lens, and the focal length f 100 of the front lens group satisfy: 1.2 < |f 2/f100 | < 2.4,
1.0 < |F 3/f100 | < 1.4, and the two groups of focal power ratios are reasonably arranged, thereby being beneficial to realizing the effects of high resolution and wide focal depth. Meanwhile, the dispersion coefficient VD 2 of the second lens L2 and the dispersion coefficient VD 3 of the third lens L3 satisfy: 15 < VD 2＜55,55＜VD3 < 80, and the refractive index Nd 2 of the second lens L2 and the refractive index Nd 3 of the third lens L3 satisfy: the second lens L2 and the third lens L3 form an approximate double-cemented lens with an air layer, and chromatic aberration can be reduced under the condition that glue is avoided, wherein Nd 2＜1.8,1.2＜Nd3 is more than 1.6.
In the exemplary embodiment, the object-side surface of the fourth lens element L4 is convex, so as to change the light beam profile, and the image-side surface is concave, thereby eliminating the aberration caused by the object-side surface.
In an exemplary embodiment, the fifth lens L5 has positive optical power, and the object-side surface is convex, so that light can reach the stop STO smoothly, and the sensitivity of the lithography lens is reduced.
In the exemplary embodiment, the rear lens group is composed of the sixth lens L6, the seventh lens L7, the eighth lens L8, and the ninth lens L9 arranged in this order from the object side to the image side, and the angle of light is controlled using a plurality of lenses, which is advantageous in achieving the effects of low distortion and small telecentricity.
In an exemplary embodiment, the sixth lens L6 has negative optical power, and at least one of the object-side surface and the image-side surface is concave, so that the light beam diverges to the seventh lens L7, which is beneficial for shaping the light beam by the image-side lens.
In an exemplary embodiment, at least one of the object side surface and the image side surface of the seventh lens L7 is convex, and at least one of the object side surface and the image side surface of the eighth lens L8 is convex. The focal length f 7 of the seventh lens L7, the focal length f 8 of the eighth lens L8, and the focal length f 200 of the rear lens group satisfy: 0.5 < |f 7/f200|＜1.5,0.9＜|f8/f200 | < 2.1, and the two groups of focal power ratios are reasonably arranged, so that the light angle is changed gently, the distortion is reduced, and the sensitivity of the photoetching lens is reduced.
In an exemplary embodiment, the ninth lens L9 has positive optical power, and at least one of the object side surface and the image side surface is convex.
In another exemplary embodiment, the rear lens group is composed of a sixth lens L6, a seventh lens L7, an eighth lens L8, a ninth lens L9 and a tenth lens L10, which are sequentially arranged from the object side to the image side, wherein the tenth lens L10 has positive optical power, and at least one of the object side and the image side is convex, so that the image side light rays are parallel, which is advantageous for achieving the effect of small telecentricity.
When the photolithography lens is composed of nine lenses, the movable lens may be a single-piece ninth lens L9, or may be composed of an eighth lens L8 and a ninth lens L9.
When the photolithography lens is composed of ten lenses, the movable lens may be a single tenth lens L10, or may be composed of a ninth lens L9 and a tenth lens L10.
When the movable lens moves along the optical axis, the multiplying power of the photoetching lens is finely adjusted, and the working distance is kept unchanged.
In light of the foregoing, more particular examples and figures are set forth below in detail.
Example one:
as shown in fig. 1, a variable magnification double telecentric lithography lens is provided with: a front lens group with positive focal power and a rear lens group with positive focal power,
The front lens group is composed of a first lens L1, a second lens L2, a third lens L3, a fourth lens L4 and a fifth lens L5 which are sequentially arranged from the object side to the image side,
The first lens element L1 has positive refractive power, wherein an object-side surface is a convex surface, and an image-side surface is a convex surface;
the second lens L2 has negative focal power, the object side surface is a convex surface, and the image side surface is a concave surface;
the third lens element L3 has positive refractive power, wherein an object-side surface thereof is convex, and an image-side surface thereof is convex;
The fourth lens L4 has negative focal power, the object side surface is a convex surface, and the image side surface is a concave surface;
The fifth lens element L5 has positive refractive power, wherein an object-side surface thereof is convex, and an image-side surface thereof is concave;
The rear lens group is composed of a sixth lens L6, a seventh lens L7, an eighth lens L8 and a ninth lens L9 which are sequentially arranged from the object side to the image side,
The sixth lens L6 has negative focal power, the object side surface is a concave surface, and the image side surface is a concave surface;
The seventh lens L7 has positive focal power, the object side surface is a convex surface, and the image side surface is a convex surface;
the eighth lens element L8 with positive refractive power has a concave object-side surface and a convex image-side surface;
The ninth lens element L9 with positive refractive power has a convex object-side surface and a convex image-side surface;
A movable lens is composed of an eighth lens L8 and a ninth lens L9, and the forward and backward movement distance is 0.1mm;
The movable lens can also be a ninth lens, and the front-back movement distance is 0.1mm;
The physical optical parameters of the first example are shown in table 1:
TABLE 1
In this example, defocus transfer function curves in the conventional case (magnification M), magnification reduction (magnification M-), and magnification (magnification m+) are shown in fig. 2,3, and 4, respectively, and distortion is shown in fig. 5.
Fig. 2 shows that the present example-with a focal depth greater than 0.48mm (center field of view 0.00mm curve coincidence, edge field of view 12.10mm curve coincidence) at 75lp/mm, mtf=0.25-has the characteristic of a large focal depth; meanwhile, the transfer function value at the position of the image plane (the origin of the abscissa) is larger than 0.43, and the resolution is higher.
Fig. 3 and 4 show that this example-with magnification reduction and magnification-has less effect on depth of focus and resolution.
Fig. 5 shows that the distortion of this example, which is less than 0.005% at the 0.400um, 0.405um, 0.410um bands, is characterized by small distortion.
Example two:
as shown in fig. 6, the variable magnification double telecentric lithography lens is provided with: a front lens group with positive focal power and a rear lens group with positive focal power,
The front lens group is composed of a first lens L1, a second lens L2, a third lens L3, a fourth lens L4 and a fifth lens L5 which are sequentially arranged from the object side to the image side,
The first lens element L1 has positive refractive power, wherein an object-side surface is a convex surface, and an image-side surface is a convex surface;
the second lens L2 has negative focal power, the object side surface is a convex surface, and the image side surface is a concave surface;
the third lens element L3 has positive refractive power, wherein an object-side surface thereof is convex, and an image-side surface thereof is convex;
The fourth lens L4 has negative focal power, the object side surface is a convex surface, and the image side surface is a concave surface;
The fifth lens element L5 has positive refractive power, wherein an object-side surface thereof is convex, and an image-side surface thereof is concave;
The rear lens group is composed of a sixth lens L6, a seventh lens L7, an eighth lens L8 and a ninth lens L9 which are sequentially arranged from the object side to the image side,
The sixth lens L6 has negative focal power, the object side surface is a concave surface, and the image side surface is a concave surface;
the seventh lens L7 has positive focal power, the object side surface is a concave surface, and the image side surface is a convex surface;
The eighth lens element L8 with positive refractive power has a convex object-side surface and a planar image-side surface;
The ninth lens element L9 with positive refractive power has a convex object-side surface and a convex image-side surface;
A movable lens is composed of an eighth lens L8 and a ninth lens L9, and the forward and backward movement distance is 0.1mm;
The movable lens can also be a ninth lens, and the front-back movement distance is 0.1mm;
the physical optical parameters of the second example are shown in table 2:
TABLE 2
The defocus transfer function curves in the case of the conventional case (magnification M), magnification reduction (magnification M-), magnification (magnification m+) of the second example are shown in fig. 7, 8, and 9, respectively, and the distortion is shown in fig. 10.
Fig. 7 shows that the second example has a focal depth greater than 0.49mm (center field of view 0.00mm curve coincident and edge field of view 12.10mm curve not coincident) at 75lp/mm, mtf=0.25, and is characterized by a large focal depth; meanwhile, the transfer function value at the position of the image plane (the origin of the abscissa) is larger than 0.43, and the resolution is higher.
Fig. 8 and 9 show that the present example two has less influence on the depth of focus and resolution in the case of magnification reduction and magnification.
Fig. 10 shows that the distortion of the second example is less than 0.002% in the 0.400um, 0.405um, 0.410um bands, and the second example has the characteristic of small distortion.
Example three:
as shown in fig. 11, a variable magnification double telecentric lithography lens is provided with, in order from an object side to an image side: a front lens group with positive focal power and a rear lens group with positive focal power;
The front lens group is composed of a first lens L1, a second lens L2, a third lens L3, a fourth lens L4 and a fifth lens L5 which are sequentially arranged from the object side to the image side,
The first lens element L1 has positive refractive power, wherein an object-side surface is a convex surface, and an image-side surface is a convex surface;
the second lens L2 has negative focal power, the object side surface is a convex surface, and the image side surface is a concave surface;
the third lens L3 has positive focal power, the object side surface is a convex surface, and the image side surface is a concave surface;
The fourth lens L4 has negative focal power, the object side surface is a convex surface, and the image side surface is a concave surface;
The fifth lens element L5 has positive refractive power, wherein an object-side surface thereof is convex, and an image-side surface thereof is concave;
the rear lens group is composed of a sixth lens L6, a seventh lens L7, an eighth lens L8, a ninth lens L9 and a tenth lens L10 which are sequentially arranged from the object side to the image side,
The sixth lens element L6 with negative refractive power has a convex object-side surface and a concave image-side surface;
the seventh lens L7 has negative focal power, the object side surface is a concave surface, and the image side surface is a convex surface;
The eighth lens element L8 with negative refractive power has a concave object-side surface and a convex image-side surface;
the ninth lens element L9 with positive refractive power has a concave object-side surface and a convex image-side surface;
the tenth lens L10 has positive focal power, the object-side surface is a convex surface, and the image-side surface is a convex surface;
A movable lens is composed of a ninth lens L9 and a tenth lens L10, and the forward and backward movement distance is 0.1mm;
The movable lens can also be a tenth lens L10, and the front-back movement distance is 0.1mm;
The physical optical parameters of this example three are shown in table 3:
TABLE 3 Table 3
The defocus transfer function curves in the case of the conventional case (magnification M), magnification reduction (magnification M-), and magnification (magnification m+) of the third example are shown in fig. 12, 13, and 14, respectively, and the distortion is shown in fig. 15.
Fig. 12 shows that the third example has a focal depth greater than 0.49mm (center field of view 0.00mm curve coincident, edge field of view 12.10mm curve not coincident) at 75lp/mm, mtf=0.25, and features a large focal depth; meanwhile, the transfer function value at the position of the image plane (the origin of the abscissa) is larger than 0.41, and the resolution is higher.
Fig. 13 and 14 show that the present example three has little influence on the depth of focus and resolution in the case of magnification reduction and magnification.
Fig. 15 shows that the distortion of the third example is less than 0.002% at the 0.400um, 0.405um, 0.410um bands, and the third example has the characteristic of small distortion.
Example four:
as shown in fig. 16, a variable magnification double telecentric lithography lens is provided with, in order from an object side to an image side: a front lens group with positive focal power and a rear lens group with positive focal power;
The front lens group is composed of a first lens L1, a second lens L2, a third lens L3, a fourth lens L4 and a fifth lens L5 which are sequentially arranged from the object side to the image side,
The first lens element L1 has positive refractive power, wherein an object-side surface is a convex surface, and an image-side surface is a convex surface;
the second lens L2 has negative focal power, the object side surface is a convex surface, and the image side surface is a concave surface;
the third lens L3 has positive focal power, the object side surface is a convex surface, and the image side surface is a plane;
The fourth lens L4 has negative focal power, the object side surface is a convex surface, and the image side surface is a concave surface;
the fifth lens element L5 has positive refractive power, wherein an object-side surface is convex, and an image-side surface is planar;
the rear lens group is composed of a sixth lens L6, a seventh lens L7, an eighth lens L8, a ninth lens L9 and a tenth lens L10 which are sequentially arranged from the object side to the image side,
The sixth lens L6 has negative focal power, the object side surface is a concave surface, and the image side surface is a concave surface;
the seventh lens L7 has positive focal power, the object side surface is a concave surface, and the image side surface is a convex surface;
the eighth lens element L8 with positive refractive power has a concave object-side surface and a convex image-side surface;
the ninth lens L9 has positive focal power, the object side surface is a plane, and the image side surface is a convex surface;
the tenth lens L10 has positive focal power, the object-side surface is a convex surface, and the image-side surface is a convex surface;
a movable lens is composed of a ninth lens L9 and a tenth lens L10, and the forward and backward movement distance is 0.5mm;
the physical optical parameters of the fourth example are shown in table 4:
TABLE 4 Table 4
In this example four, defocus transfer function curves in the normal case (magnification M), magnification reduction (magnification M-), and magnification (magnification m+) are shown in fig. 17, 18, and 19, respectively, and distortion is shown in fig. 20.
Fig. 17 shows that the fourth example has a focal depth greater than 0.52mm (center field of view 0.00mm curve coincident, edge field of view 12.10mm curve almost coincident) at 75lp/mm, mtf=0.25, and features a large focal depth; meanwhile, the transfer function value at the position of the image plane (the origin of the abscissa) is larger than 0.36, and the resolution is higher.
Fig. 18 and 19 show that the present example four has little influence on the depth of focus and resolution in the case of magnification reduction and magnification.
Fig. 20 shows that the distortion of the fourth example is less than 0.007% at the 0.400um, 0.405um, 0.410um bands, and has the characteristic of small distortion.
Example five:
as shown in fig. 21, a variable magnification double telecentric lithography lens is provided with, in order from an object side to an image side: a front lens group with positive focal power and a rear lens group with positive focal power;
The front lens group is composed of a first lens L1, a second lens L2, a third lens L3, a fourth lens L4 and a fifth lens L5 which are sequentially arranged from the object side to the image side,
The first lens element L1 has positive refractive power, wherein an object-side surface is a convex surface, and an image-side surface is a convex surface;
the second lens L2 has negative focal power, the object side surface is a convex surface, and the image side surface is a concave surface;
the third lens L3 has positive focal power, the object side surface is a convex surface, and the image side surface is a plane;
The fourth lens L4 has negative focal power, the object side surface is a convex surface, and the image side surface is a concave surface;
the fifth lens element L5 has positive refractive power, wherein an object-side surface is convex, and an image-side surface is planar;
the rear lens group is composed of a sixth lens L6, a seventh lens L7, an eighth lens L8, a ninth lens L9 and a tenth lens L10 which are sequentially arranged from the object side to the image side,
The sixth lens L6 has negative focal power, the object side surface is a concave surface, and the image side surface is a concave surface;
the seventh lens L7 has positive focal power, the object side surface is a concave surface, and the image side surface is a convex surface;
the eighth lens element L8 with positive refractive power has a concave object-side surface and a convex image-side surface;
The ninth lens element L9 with positive refractive power has a convex object-side surface and a convex image-side surface;
The tenth lens L10 has positive focal power, the object side surface is a plane, and the image side surface is a convex surface;
a movable lens is composed of a ninth lens L9 and a tenth lens L10, and the forward and backward movement distance is 0.5mm;
the physical optical parameters of the fifth example are shown in table 5:
TABLE 5
In this example five, defocus transfer function curves in the normal case (magnification M), magnification reduction (magnification M-), and magnification (magnification m+) are shown in fig. 22, 23, and 24, respectively, and distortion is shown in fig. 25.
Fig. 22 shows that the focal depth of this example five is greater than 0.53mm (center field of view 0.00mm curve overlap, edge field of view 12.10mm curve overlap) at 75lp/mm, mtf=0.25, featuring a large focal depth; meanwhile, the transfer function value at the position of the image plane (the origin of the abscissa) is larger than 0.38, and the resolution is higher.
Fig. 23 and 24 show that the present example five has little influence on the depth of focus and resolution in the case of magnification reduction and magnification.
Fig. 25 shows that the distortion of the fifth example is less than 0.004% at the wave bands of 0.400um, 0.405um and 0.410um, and the fifth example has the characteristic of small distortion.
Example six:
As shown in fig. 26, a variable magnification double telecentric lithography lens is provided with, in order from an object side to an image side: a front lens group with positive focal power and a rear lens group with positive focal power;
The front lens group is composed of a first lens L1, a second lens L2, a third lens L3, a fourth lens L4 and a fifth lens L5 which are sequentially arranged from the object side to the image side,
The first lens element L1 has positive refractive power, wherein an object-side surface is a convex surface, and an image-side surface is a convex surface;
the second lens L2 has negative focal power, the object side surface is a convex surface, and the image side surface is a concave surface;
the third lens element L3 has positive refractive power, wherein an object-side surface thereof is convex, and an image-side surface thereof is convex;
The fourth lens L4 has negative focal power, the object side surface is a convex surface, and the image side surface is a concave surface;
The fifth lens element L5 has positive refractive power, wherein an object-side surface thereof is convex, and an image-side surface thereof is concave;
the rear lens group is composed of a sixth lens L6, a seventh lens L7, an eighth lens L8, a ninth lens L9 and a tenth lens L10 which are sequentially arranged from the object side to the image side,
The sixth lens L6 has negative focal power, the object side surface is a concave surface, and the image side surface is a concave surface;
the seventh lens L7 has positive focal power, the object side surface is a concave surface, and the image side surface is a convex surface;
the eighth lens element L8 with positive refractive power has a concave object-side surface and a convex image-side surface;
The ninth lens element L9 with positive refractive power has a convex object-side surface and a convex image-side surface;
the tenth lens L10 has positive focal power, the object-side surface is a convex surface, and the image-side surface is a convex surface;
a movable lens is composed of a ninth lens L9 and a tenth lens L10, and the forward and backward movement distance is 0.5mm;
the physical optical parameters of this example six are shown in table 6:
TABLE 6
The defocus transfer function curves in the conventional case (magnification M), magnification reduction (magnification M-), and magnification (magnification m+) of the present example are shown in fig. 27, 28, and 29, respectively, and the distortion is shown in fig. 30.
Fig. 27 shows that the focal depth of this example six is greater than 0.52mm at 75lp/mm, mtf=0.25 (center field of view 0.00mm curve coincident, edge field of view 12.10mm curve not coincident), featuring a large focal depth; meanwhile, the transfer function value at the position of the image plane (the origin of the abscissa) is larger than 0.38, and the resolution is higher.
Fig. 28 and 29 show that the present example six has little influence on the depth of focus and resolution in the case of magnification reduction and magnification.
Fig. 30 shows that the distortion of this example six is less than 0.007% at the 0.400um, 0.405um, 0.410um bands, featuring small distortion.
According to the above description, the beneficial effects of high resolution, low distortion, wide focal depth, small telecentricity and low cost can be realized by adopting a double telecentric optical system and matching the surface shape and the focal power of the lens. The physical parameters of each example are shown in table 7:
TABLE 7
The first example adopts nine lens pieces with positive, negative, positive and positive from the object side to the image side optical power in sequence, so that the photoetching lens achieves the expected effect;
the second example is based on the first example, mainly changes the surface shapes of the seventh lens L7 and the eighth lens L8, reduces the distortion of the lithography lens, improves the imaging quality, and maintains the adjustable range of the magnification of the lithography lens unchanged;
The third example is based on the first example, a negative lens is mainly added in the rear group, the focal depth of the photoetching lens is increased, and the adjustable range of the multiplying power of the photoetching lens is slightly improved;
The fourth, fifth and sixth examples mainly change the positive and negative surface shapes and focal powers of the seventh lens L7 and the eighth lens L8 on the basis of the third example, and imaging quality is reduced, but the focal depth of the lens is increased, and the adjustable range of the magnification of the lens is improved.
Claims (8)
1. A variable magnification double telecentric photoetching lens is provided with the following components in sequence from an object side to an image side: the front lens group is composed of a first lens, a second lens, a third lens, a fourth lens and a fifth lens which are sequentially arranged from an object side to an image side, wherein the first lens has positive focal power, the object side is a convex surface, and the image side is a convex surface; the second lens has negative focal power, the object side surface is a convex surface, and the image side surface is a concave surface; the third lens has positive focal power, and the object side surface is a convex surface; the fourth lens has negative focal power, the object side surface is a convex surface, and the image side surface is a concave surface; the fifth lens has positive focal power, and the object side surface is a convex surface; the rear lens group comprises a movable lens, the movable lens has positive focal power, and the image side surface is a convex surface; the whole photoetching lens meets the following conditions: NA is more than or equal to 0.09 and less than or equal to 0.1,2.99 and less than or equal to M is more than or equal to 3.01,0.99 and less than or equal to | imgH/objH/m| and less than or equal to 1, 16 < |f/EXPD | 2 < 25, wherein NA is the object numerical aperture of the lithography lens, M is the magnification, objH is the object height on any field of view, imgH is the corresponding image height, f is the focal length of the lithography lens, EXPD is the exit pupil diameter of the lithography lens, and the following conditions are satisfied: 0.02 < |f 100/f|＜0.04,0.08＜|f200/f|＜0.14,0.25＜|f100/f200 | < 0.35, wherein f is the focal length of the photoetching lens, and f 100、f200 is the focal length of the front lens group and the rear lens group respectively.
2. The variable magnification double telecentric lithography lens of claim 1, wherein said rear lens group comprises a sixth lens, a seventh lens, an eighth lens and a ninth lens arranged in order from the object side to the image side, said sixth lens having negative optical power, the image side being concave; the image side surface of the seventh lens is a convex surface; at least one of the object side surface and the image side surface of the eighth lens is a convex surface, the ninth lens has positive focal power, the image side surface is a convex surface, and the movable lens is the ninth lens and meets the following requirements: 0.5 < |f 7/f200|＜1.5,0.9＜|f8/f200|＜2.1,f7 and f 8 are the focal lengths of the seventh lens and the eighth lens, respectively.
3. The variable magnification double telecentric lithography lens of claim 1, wherein said rear lens group comprises a sixth lens, a seventh lens, an eighth lens and a ninth lens arranged in order from the object side to the image side, said sixth lens having negative optical power, the image side being concave; the image side surface of the seventh lens is a convex surface; at least one of the object side surface and the image side surface of the eighth lens is a convex surface, the ninth lens has positive focal power, the image side surface is a convex surface, and the movable lens consists of the eighth lens and the ninth lens and satisfies the following conditions: 0.5 < |f 7/f200|＜1.5,0.9＜|f8/f200|＜2.1,f7 and f 8 are the focal lengths of the seventh lens and the eighth lens, respectively.
4. The variable magnification double telecentric lithography lens of claim 1, wherein said rear lens group comprises a sixth lens, a seventh lens, an eighth lens, a ninth lens and a tenth lens arranged in order from the object side to the image side, said sixth lens having negative optical power, the image side being concave; the image side surface of the seventh lens is a convex surface; at least one of the object side surface and the image side surface of the eighth lens is a convex surface, the ninth lens has positive focal power, the image side surface is a convex surface, the tenth lens has positive focal power, the image side surface is a convex surface, the movable lens is the tenth lens, and the following conditions are satisfied: 0.5 < |f 7/f200|＜1.5,0.9＜|f8/f200|＜2.1,f7 and f 8 are the focal lengths of the seventh lens and the eighth lens, respectively.
5. The variable magnification double telecentric lithography lens of claim 1, wherein said rear lens group comprises a sixth lens, a seventh lens, an eighth lens, a ninth lens and a tenth lens arranged in order from the object side to the image side, said sixth lens having negative optical power, the image side being concave; the image side surface of the seventh lens is a convex surface; at least one of the object side surface and the image side surface of the eighth lens is a convex surface, the ninth lens has positive focal power, the image side surface is a convex surface, the tenth lens has positive focal power, the image side surface is a convex surface, the movable lens consists of the ninth lens and the tenth lens and satisfies the following conditions: 0.5 < |f 7/f200|＜1.5,0.9＜|f8/f200|＜2.1,f7 and f 8 are the focal lengths of the seventh lens and the eighth lens, respectively.
6. The variable magnification double telecentric lithography lens of any one of claims 1-5, wherein the lithography lens satisfies the following conditional expression:
1.5 < |f 1/f100|＜2.5,1.2＜|f2/f100|＜2.4,1.0＜|f3/f100 | < 1.4, wherein f 1、f2 and f 3 are focal lengths of the first lens, the second lens and the third lens respectively, and f 100 is a focal length of the front lens group.
7. The variable magnification double telecentric lithography lens of any one of claims 1-5, wherein the lithography lens satisfies the following conditional expression: 15 < VD 2＜55,55＜VD3 < 80, wherein VD 2 and VD 3 are the dispersion coefficients of said second lens and said third lens, respectively.
8. The variable magnification double telecentric lithography lens of any one of claims 1-5, wherein the lithography lens satisfies the following conditional expression: nd 2＜1.8,1.2＜Nd3 < 1.6, wherein Nd 2 and Nd 3 are refractive indices of the second lens and the third lens, respectively.
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| JPH09113806A (en) * | 1995-10-19 | 1997-05-02 | Ricoh Co Ltd | Zooming optical system |
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| CN204903851U (en) * | 2012-11-19 | 2015-12-23 | 富士胶片株式会社 | Zoom lens and projection type display device for projection |
| CN115494624B (en) * | 2022-11-16 | 2023-04-07 | 江西联创电子有限公司 | Optical lens |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| JPH09113806A (en) * | 1995-10-19 | 1997-05-02 | Ricoh Co Ltd | Zooming optical system |
| CN112269256A (en) * | 2020-10-21 | 2021-01-26 | 麦克奥迪实业集团有限公司 | Microscope objective |
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