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CN115613087A - A kind of high hardness nano-Ni-Co-B alloy substitutes chromium electroplating solution and its application - Google Patents

A kind of high hardness nano-Ni-Co-B alloy substitutes chromium electroplating solution and its application Download PDF

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CN115613087A
CN115613087A CN202211313821.1A CN202211313821A CN115613087A CN 115613087 A CN115613087 A CN 115613087A CN 202211313821 A CN202211313821 A CN 202211313821A CN 115613087 A CN115613087 A CN 115613087A
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chromium
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CN115613087B (en
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杨培霞
董德蕊
张惠铃
李若鹏
毕思海
张锦秋
安茂忠
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Harbin Institute of Technology Shenzhen
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Abstract

一种高硬度纳米Ni‑Co‑B合金代铬电镀液及其应用,它属于电镀领域,具体涉及一种高硬度纳米Ni‑Co‑B合金代铬电镀液及其应用。本发明的目的是要解决现有三价铬电镀不能满足代硬铬的需求,复合镀工艺复杂,且电流分布不均导致镀层厚度不均匀,其大规模应用仍受到较大限制和镍基合金存在内应力大、硬度较低、镀速慢的问题。一种高硬度纳米Ni‑Co‑B合金代铬电镀液由主盐、硼源、阳极活化剂、pH缓冲剂、晶粒细化剂、应力消除剂、润湿剂和蒸馏水制备而成。采用一种高硬度纳米Ni‑Co‑B合金代铬电镀液制备的Ni‑Co‑B合金代铬镀层,硬度可达到1100~1300HV‑50。

Figure 202211313821

A high-hardness nano-Ni-Co-B alloy chromium-substituting electroplating solution and an application thereof belong to the field of electroplating, and in particular relate to a high-hardness nano-Ni-Co-B alloy chromium-substituting electroplating solution and an application thereof. The purpose of the present invention is to solve the problem that the existing trivalent chromium electroplating cannot meet the needs of replacing hard chromium, the composite plating process is complex, and the uneven current distribution leads to uneven thickness of the coating, and its large-scale application is still subject to relatively large restrictions and the existence of nickel-based alloys. The problem of large internal stress, low hardness and slow plating speed. A high-hardness nano Ni-Co-B alloy chromium-substituting electroplating solution is prepared from a main salt, a boron source, an anode activator, a pH buffer, a grain refiner, a stress reliever, a wetting agent and distilled water. The Ni-Co-B alloy substituting chromium coating prepared by using a high-hardness nano-Ni-Co-B alloy substituting chromium electroplating solution has a hardness of 1100-1300HV-50.

Figure 202211313821

Description

一种高硬度纳米Ni-Co-B合金代铬电镀液及其应用A kind of high-hardness nano-Ni-Co-B alloy substitutes chromium electroplating solution and its application

技术领域technical field

本发明属于电镀领域,具体涉及一种高硬度纳米Ni-Co-B合金代铬电镀液及其应用。The invention belongs to the field of electroplating, and in particular relates to a high-hardness nano-Ni-Co-B alloy chromium-substituting electroplating solution and an application thereof.

背景技术Background technique

作为电镀工业中不可或缺的工艺之一,六价铬电镀技术应用十分广泛。作为防护-装饰性镀层使用时,具有色泽光亮美观、抗变色能力强的优点;此外,由于镀铬层具有硬度高、耐磨性能好、耐蚀性号等优点,广泛应用在发动机的气缸和活塞环、压印辊的辊面、枪炮的内腔等。但是,六价铬电镀技术也有一些缺点限制其应用。如阴极析氢严重、电流效率低,需要大电流、高电压沉积,六价铬毒性大、废水处理困难等。找到一种在性能上满足甚至超出铬(Ⅵ)镀层的绿色环保代镀铬镀层和工艺方法非常必要。As one of the indispensable processes in the electroplating industry, hexavalent chromium electroplating technology is widely used. When used as a protective-decorative coating, it has the advantages of bright and beautiful color and strong anti-discoloration ability; in addition, due to the advantages of high hardness, good wear resistance and high corrosion resistance, the chrome plating layer is widely used in cylinders and pistons of engines Ring, the roll surface of the embossing roller, the inner cavity of the gun, etc. However, the hexavalent chromium plating technology also has some disadvantages that limit its application. For example, severe hydrogen evolution at the cathode, low current efficiency, high current and high voltage deposition are required, hexavalent chromium is highly toxic, and wastewater treatment is difficult. It is very necessary to find a green and environmentally friendly generation of chromium plating coatings and process methods that meet or even exceed the performance of chromium (Ⅵ) coatings.

纳米镀层由于晶粒尺寸的大幅度减小和相邻晶粒之间大量晶界的存在,有着独特的物理化学性能,如高耐蚀性、高硬度、高耐磨性等。在电镀工艺中,通常需要加入合适的添加剂来增大阴极极化,使得晶核的成核速度增加,晶粒更细,从而获得纳米镀层。因此,制备纳米镀层的首要问题在于开发合适的无毒添加剂,在其封闭效应或穿透效应的阻化作用下,显著增大阴极极化,在镀液中加入少量的添加剂即可大幅度改善镀层的性能。根据添加剂种类的不同,起到晶粒细化、整平、润湿、消除应力等作用。Due to the large reduction in grain size and the existence of a large number of grain boundaries between adjacent grains, nano-coatings have unique physical and chemical properties, such as high corrosion resistance, high hardness, and high wear resistance. In the electroplating process, it is usually necessary to add suitable additives to increase the cathode polarization, so that the nucleation speed of crystal nuclei increases and the grains are finer, so as to obtain nano-coatings. Therefore, the primary problem of preparing nano-coatings is to develop suitable non-toxic additives, which can significantly increase the cathodic polarization under the blocking effect or penetration effect of the additives. Adding a small amount of additives in the plating solution can greatly improve performance of the coating. According to the different types of additives, it plays the role of grain refinement, leveling, wetting, and stress relief.

目前代铬技术主要包括三价铬电镀工艺、复合电镀工艺以及合金电镀/化学镀工艺等。其中,三价铬电镀以其低毒性、较高的分散能力和覆盖能力在代装饰铬领域得到了越来越多的应用。但该技术并不能满足代硬铬的需求。利用复合电镀技术,在镀液中加入不溶性硬质相微粒可以显著提高镀层的硬度,例如Ni-金刚石、Ni-Co-金刚石复合镀层的硬度可达700HV。但复合镀工艺复杂,且电流分布不均导致镀层厚度不均匀,其大规模应用仍受到较大限制。镍基合金具有外观光亮、有高硬度、高耐磨性、高耐蚀性等优点,成为最有希望替代硬铬的镀层,但目前研究的镍钨合金、镍钴合金、镍硼合金、镍钼合金等还存在内应力大、硬度较低、镀速慢等问题。The current chromium generation technology mainly includes trivalent chromium electroplating process, composite electroplating process and alloy electroplating/electroless plating process, etc. Among them, trivalent chromium plating has been more and more used in the field of decorative chromium for its low toxicity, high dispersion and coverage. However, this technology cannot meet the needs of the generation of hard chrome. Using composite electroplating technology, adding insoluble hard phase particles to the plating solution can significantly increase the hardness of the coating, for example, the hardness of Ni-diamond and Ni-Co-diamond composite coatings can reach 700HV. However, the composite plating process is complicated, and the uneven current distribution leads to uneven thickness of the coating, so its large-scale application is still limited. Nickel-based alloys have the advantages of bright appearance, high hardness, high wear resistance, and high corrosion resistance, and have become the most promising coatings to replace hard chrome. Molybdenum alloys also have problems such as large internal stress, low hardness, and slow plating speed.

发明内容Contents of the invention

本发明的目的是要解决现有三价铬电镀不能满足代硬铬的需求,复合镀工艺复杂,且电流分布不均导致镀层厚度不均匀,其大规模应用仍受到较大限制和镍基合金存在内应力大、硬度较低、镀速慢的问题,而提供一种高硬度纳米Ni-Co-B合金代铬电镀液及其应用。The purpose of the present invention is to solve the problem that the existing trivalent chromium electroplating cannot meet the needs of replacing hard chromium, the composite plating process is complex, and the uneven current distribution leads to uneven thickness of the coating, its large-scale application is still relatively limited and the existence of nickel-based alloys To solve the problems of large internal stress, low hardness and slow plating speed, a high-hardness nano-Ni-Co-B alloy chromium-substituting electroplating solution and its application are provided.

一种高硬度纳米Ni-Co-B合金代铬电镀液由主盐、硼源、阳极活化剂、pH缓冲剂、晶粒细化剂、应力消除剂、润湿剂和蒸馏水备而成;A high-hardness nano-Ni-Co-B alloy chromium-substituting electroplating solution is prepared from main salt, boron source, anode activator, pH buffer, grain refiner, stress reliever, wetting agent and distilled water;

所述的主盐为镍盐和钴盐;Described main salt is nickel salt and cobalt salt;

所述的晶粒细化剂为2-乙氨基-4-甲基噻唑-5-羧酸、聚乙烯亚胺、月桂烯、糠酸烯丙酯、3-(甲硫基)己醇乙酸酯中的一种或其中几种的混合物;The grain refiner is 2-ethylamino-4-methylthiazole-5-carboxylic acid, polyethyleneimine, myrcene, allyl furoate, 3-(methylthio)hexanol acetic acid One or a mixture of several esters;

所述的应力消除剂为1,3-二环己基氯化咪唑、2-甲氧基-4-乙烯基苯酚或孟加拉玫瑰红;The stress reliever is 1,3-dicyclohexyl imidazole chloride, 2-methoxy-4-vinylphenol or rose bengal;

所述的润湿剂为聚乙二醇、OP乳化剂或十二烷基硫酸钠。Described wetting agent is polyethylene glycol, OP emulsifier or sodium lauryl sulfate.

一种高硬度纳米Ni-Co-B合金代铬电镀液用于制备Ni-Co-B合金代铬镀层。A high-hardness nanometer Ni-Co-B alloy substituting chromium electroplating solution is used for preparing Ni-Co-B alloy substituting chromium coating.

本发明的原理:Principle of the present invention:

本发明所述晶粒细化剂通过吸附作用在阴极表面形成一层极薄的吸附层,阻碍了金属离子的放电,因而提高了阴极极化;吸附在阴极表面的晶粒细化剂,会阻碍甚至完全抑制晶体的生长,因此,新的结晶便在其他位置产生;如此反复进行,便可获得晶粒细小而光亮的高质量镀层;The grain refiner of the present invention forms an extremely thin adsorption layer on the surface of the cathode through adsorption, which hinders the discharge of metal ions, thereby improving the polarization of the cathode; the grain refiner adsorbed on the surface of the cathode will Hinder or even completely inhibit the growth of crystals, so new crystals will be produced in other positions; so repeated, you can get fine and bright high-quality coatings;

本发明所述应力消除剂可以使镀层产生一定的压应力,从而抵消镀层中的拉应力,改善镀层的延展性,防止镀层表面微裂纹的产生,提高镀层光亮性;The stress reliever of the present invention can cause the coating to produce a certain compressive stress, thereby offsetting the tensile stress in the coating, improving the ductility of the coating, preventing the generation of micro-cracks on the surface of the coating, and improving the brightness of the coating;

本发明所述润湿剂的加入可以使得电极/溶液界面的表面张力降低,电解液对电极表面的润湿性能变好,使金属离子更更易于在阴极沉积;同时,氢气泡在尺寸较小时就脱离电极表面,防止其在阴极表面滞留而发生屏蔽作用,起到了消除针孔的作用,提高镀层的硬度和光亮性。The addition of the wetting agent of the present invention can reduce the surface tension of the electrode/solution interface, improve the wettability of the electrolyte to the electrode surface, and make metal ions easier to deposit on the cathode; at the same time, when the size of the hydrogen bubbles is small It is separated from the surface of the electrode, preventing it from staying on the surface of the cathode and causing shielding, eliminating pinholes, and improving the hardness and brightness of the coating.

晶粒细化剂、应力消除剂和润湿剂的加入可以使本发明所述镀层达到六价铬镀层的外观、硬度要求,避免了有毒的六价铬的使用。The addition of the grain refiner, the stress reliever and the wetting agent can make the coating of the present invention meet the appearance and hardness requirements of the hexavalent chromium coating, and avoid the use of toxic hexavalent chromium.

本发明的优点:Advantages of the present invention:

一、利用本发明制备的高硬度纳米Ni-Co-B合金代铬电镀液制备的Ni-Co-B合金代铬镀层的平均晶粒尺寸约10nm,为纳米晶镀层,且镀层应力较低,长时间电镀没有微裂纹;One, the average grain size of the Ni-Co-B alloy substituting chromium coating prepared by the high-hardness nano Ni-Co-B alloy substituting chromium plating solution prepared by the present invention is about 10nm, which is a nanocrystalline coating, and the coating stress is lower, There is no micro-crack in electroplating for a long time;

二、本发明镀层在热处理后的硬度可达到1100~1300HV-50,且耐蚀性较好,镀层与基体结合强度较高,镀层没有裂纹;2. The hardness of the coating of the present invention after heat treatment can reach 1100-1300HV-50, and the corrosion resistance is good, the bonding strength between the coating and the substrate is high, and the coating has no cracks;

三、本发明制备的高硬度纳米Ni-Co-B合金代铬电镀液的阴极电流效率达95%,沉积速度为70~80μm/h。3. The cathodic current efficiency of the high-hardness nano-Ni-Co-B alloy chromium-substituting electroplating solution prepared by the present invention reaches 95%, and the deposition rate is 70-80 μm/h.

附图说明Description of drawings

图1为X射线衍射(XRD)图,图中1为实施例1步骤三制备的镀件在热处理前的X射线衍射曲线,2为实施例1步骤四经过200℃热处理后得到的Ni-Co-B合金代铬镀层的X射线衍射曲线,3为实施例2步骤四经过300℃热处理后得到的Ni-Co-B合金代铬镀层的X射线衍射曲线;Fig. 1 is X-ray diffraction (XRD) figure, among the figure 1 is the X-ray diffraction curve of the plated piece prepared in step 3 of embodiment 1 before heat treatment, and 2 is the Ni-Co obtained after 200 ℃ of heat treatment in step 4 of embodiment 1 -The X-ray diffraction curve of the B alloy chromium coating, 3 is the X-ray diffraction curve of the Ni-Co-B alloy chromium coating obtained after the 300°C heat treatment in Step 4 of Example 2;

图2为实施例1步骤四经过200℃热处理后得到的Ni-Co-B合金代铬镀层的SEM图;Fig. 2 is the SEM figure of the Ni-Co-B alloy substituting chromium coating obtained after 200 DEG C of heat treatment in step 4 of embodiment 1;

图3为实施例1步骤四经过200℃热处理后得到的Ni-Co-B合金代铬镀层的光学显微镜图;Fig. 3 is the optical micrograph of the Ni-Co-B alloy chromium-substituting coating obtained after 200 DEG C of heat treatment in step 4 of embodiment 1;

图4为实施例1步骤四经过200℃热处理后得到的Ni-Co-B合金代铬镀层在经过3.5%氯化钠溶液腐蚀后的光学显微镜图。Fig. 4 is an optical microscope image of the chromium-substituting Ni-Co-B alloy coating obtained after heat treatment at 200°C in Step 4 of Example 1 after being corroded by a 3.5% sodium chloride solution.

具体实施方式detailed description

以下实施例进一步说明本发明的内容,但不应理解为对本发明的限制。在不背离本发明实质的情况下,对本发明方法、步骤或条件所作的修改和替换,均属于本发明的范围。The following examples further illustrate the content of the present invention, but should not be construed as limiting the present invention. Without departing from the essence of the present invention, the modifications and substitutions made to the methods, steps or conditions of the present invention all belong to the scope of the present invention.

具体实施方式一:本实施方式一种高硬度纳米Ni-Co-B合金代铬电镀液由主盐、硼源、阳极活化剂、pH缓冲剂、晶粒细化剂、应力消除剂、润湿剂和蒸馏水备而成;Specific embodiment one: In this embodiment, a high-hardness nano-Ni-Co-B alloy chromium-substituting electroplating solution consists of main salt, boron source, anode activator, pH buffer, grain refiner, stress reliever, wetting Prepared with reagent and distilled water;

所述的主盐为镍盐和钴盐;Described main salt is nickel salt and cobalt salt;

所述的晶粒细化剂为2-乙氨基-4-甲基噻唑-5-羧酸、聚乙烯亚胺、月桂烯、糠酸烯丙酯、3-(甲硫基)己醇乙酸酯中的一种或其中几种的混合物;The grain refiner is 2-ethylamino-4-methylthiazole-5-carboxylic acid, polyethyleneimine, myrcene, allyl furoate, 3-(methylthio)hexanol acetic acid One or a mixture of several esters;

所述的应力消除剂为1,3-二环己基氯化咪唑、2-甲氧基-4-乙烯基苯酚或孟加拉玫瑰红;The stress reliever is 1,3-dicyclohexyl imidazole chloride, 2-methoxy-4-vinylphenol or rose bengal;

所述的润湿剂为聚乙二醇、OP乳化剂或十二烷基硫酸钠。Described wetting agent is polyethylene glycol, OP emulsifier or sodium lauryl sulfate.

具体实施方式二:本实施方式与具体实施方式一不同点是:所述镍盐为硫酸镍;所述的钴盐为硫酸钴。其它步骤与具体实施方式一相同。Embodiment 2: This embodiment differs from Embodiment 1 in that: the nickel salt is nickel sulfate; the cobalt salt is cobalt sulfate. Other steps are the same as in the first embodiment.

具体实施方式三:本实施方式与具体实施方式一或二之一不同点是:所述的硼源为二甲胺基甲硼烷;所述的阳极活化剂为氯化镍;所述的pH缓冲剂为硼酸。其它步骤与具体实施方式一或二相同。Specific embodiment three: the differences between this embodiment and specific embodiment one or two are: the boron source is dimethylaminoborane; the anode activator is nickel chloride; the pH The buffer is boric acid. Other steps are the same as those in Embodiment 1 or 2.

具体实施方式四:本实施方式与具体实施方式一至三之一不同点是:所述的一种高硬度纳米Ni-Co-B合金代铬电镀液中镍盐的浓度为100~150g/L,钴盐的浓度为10~15g/L,硼源的浓度为1~5g/L,阳极活化剂的浓度为20~50g/L,pH缓冲剂的浓度为30~50g/L,晶粒细化剂的浓度为0.1~5g/L,应力消除剂的浓度为0.5~1.5g/L,润湿剂的浓度为0.05~1g/L。其它步骤与具体实施方式一至三相同。Embodiment 4: The difference between this embodiment and Embodiments 1 to 3 is that the concentration of nickel salt in the high-hardness nano-Ni-Co-B alloy chromium-substituting electroplating solution is 100-150 g/L, The concentration of cobalt salt is 10-15g/L, the concentration of boron source is 1-5g/L, the concentration of anode activator is 20-50g/L, the concentration of pH buffer is 30-50g/L, and the grain is refined The concentration of the agent is 0.1-5g/L, the concentration of the stress relief agent is 0.5-1.5g/L, and the concentration of the wetting agent is 0.05-1g/L. Other steps are the same as those in Embodiments 1 to 3.

具体实施方式五:本实施方式与具体实施方式一至四之一不同点是:一种高硬度纳米Ni-Co-B合金代铬电镀液用于制备Ni-Co-B合金代铬镀层。其它步骤与具体实施方式一至四相同。Embodiment 5: This embodiment differs from Embodiments 1 to 4 in that: a high-hardness nano-Ni-Co-B alloy chromium-substituting electroplating solution is used to prepare Ni-Co-B alloy chromium-substituting plating. Other steps are the same as those in Embodiments 1 to 4.

具体实施方式六:本实施方式与具体实施方式一至五之一不同点是:一种高硬度纳米Ni-Co-B合金代铬电镀液用于制备Ni-Co-B合金代铬镀层是按以下步骤完成的:Specific embodiment six: the difference between this embodiment and one of the specific embodiments one to five is: a high-hardness nano-Ni-Co-B alloy chromium-substituting electroplating solution is used to prepare a Ni-Co-B alloy chromium-substituting coating as follows Steps completed:

一、制备代铬电镀液:1. Preparation of chromium-substituting electroplating solution:

将主盐、硼源、阳极活化剂、pH缓冲剂、晶粒细化剂、应力消除剂和润湿剂溶解到蒸馏水中,得到代铬电镀液;Dissolving the main salt, boron source, anode activator, pH buffer, grain refiner, stress reliever and wetting agent into distilled water to obtain a chromium-substituting electroplating solution;

二、对基体进行预处理,得到预处理后的基体;2. Pretreating the substrate to obtain a pretreated substrate;

步骤二中将基体浸入到80~90℃的除油液中浸泡,取出后使用蒸馏水冲洗;再使用盐酸酸洗,蒸馏水冲洗,得到预处理后的基体;In step 2, immerse the substrate in a degreasing solution at 80-90°C, take it out and rinse it with distilled water; pickle it with hydrochloric acid and rinse it with distilled water to obtain the pretreated substrate;

三、将代铬电镀液的pH值调节至3.5~4.0,将预处理后的基体浸入到代铬电镀液中,再在温度为40℃~50℃和电流密度2~7A/dm2的条件下电镀,得到镀件;3. Adjust the pH value of the chromium-substituting electroplating solution to 3.5-4.0, immerse the pretreated substrate into the chromium-substituting electroplating solution, and then under the conditions of a temperature of 40°C-50°C and a current density of 2-7A /dm2 Electroplating is carried out to obtain the plated parts;

四、高温热处理:4. High temperature heat treatment:

将镀件置于管式炉中,在氩气气氛保护下,将镀件升温至200~300℃,再在200~300℃下保温,最后自然冷却至室温,得到在基材表面得到Ni-Co-B合金代铬镀层。其它步骤与具体实施方式一至五相同。Put the plated parts in a tube furnace, under the protection of argon atmosphere, raise the temperature of the plated parts to 200-300°C, keep the temperature at 200-300°C, and finally cool down to room temperature naturally to obtain Ni- on the surface of the substrate. Co-B alloy instead of chromium plating. Other steps are the same as those in Embodiments 1 to 5.

具体实施方式七:本实施方式与具体实施方式一至六之一不同点是:步骤二中所述的除油液由氢氧化钠、碳酸钠、磷酸钠、硅酸钠和蒸馏水混合而成,其中氢氧化钠的浓度为60~80g/L,碳酸钠的浓度为20~60g/L,磷酸钠的浓度为15~30g/L,硅酸钠的浓度为5~10g/L;步骤二中所述的盐酸的质量分数为10%~20%;步骤二中所述的基体为冷轧钢。其它步骤与具体实施方式一至六相同。Specific embodiment seven: the difference between this embodiment and one of specific embodiments one to six is that the degreasing liquid described in step 2 is formed by mixing sodium hydroxide, sodium carbonate, sodium phosphate, sodium silicate and distilled water, wherein The concentration of sodium hydroxide is 60~80g/L, and the concentration of sodium carbonate is 20~60g/L, and the concentration of sodium phosphate is 15~30g/L, and the concentration of sodium silicate is 5~10g/L; The mass fraction of the hydrochloric acid is 10%-20%; the matrix in the second step is cold-rolled steel. Other steps are the same as those in Embodiments 1 to 6.

具体实施方式八:本实施方式与具体实施方式一至七之一不同点是:步骤二中将基体浸入到除油液中浸泡5min~10min,取出后使用蒸馏水冲洗3次~5次,再使用盐酸酸洗3次~5次,蒸馏水冲洗3次~5次,得到预处理后的基体。其它步骤与具体实施方式一至七相同。Embodiment 8: The difference between this embodiment and Embodiments 1 to 7 is: in step 2, immerse the substrate in the degreasing solution for 5 minutes to 10 minutes, rinse it with distilled water for 3 to 5 times after taking it out, and then use hydrochloric acid Pickling for 3 to 5 times and rinsing with distilled water for 3 to 5 times to obtain the pretreated substrate. Other steps are the same as those in Embodiments 1 to 7.

具体实施方式九:本实施方式与具体实施方式一至八之一不同点是:步骤三中所述的电镀的时间为30~180min。其它步骤与具体实施方式一至八相同。Embodiment 9: The difference between this embodiment and Embodiment 1 to Embodiment 8 is that the electroplating time in Step 3 is 30-180 minutes. Other steps are the same as those in Embodiments 1 to 8.

具体实施方式十:本实施方式与具体实施方式一至九之一不同点是:步骤四中所述的保温的时间为1h~2h;步骤四中所述的升温的速率为5℃/min~10℃/min。其它步骤与具体实施方式一至九相同。Embodiment 10: The difference between this embodiment and Embodiment 1 to Embodiment 9 is: the time of heat preservation described in step 4 is 1h~2h; °C/min. Other steps are the same as those in Embodiments 1 to 9.

采用以下实施例验证本发明的有益效果:Adopt the following examples to verify the beneficial effects of the present invention:

实施例1:一种高硬度纳米Ni-Co-B合金代铬电镀液用于制备Ni-Co-B合金代铬镀层是按以下步骤完成的:Embodiment 1: a kind of high hardness nano-Ni-Co-B alloy substitution chromium electroplating solution is used for preparing Ni-Co-B alloy substitution chromium coating and is finished according to the following steps:

一、制备代铬电镀液:1. Preparation of chromium-substituting electroplating solution:

将NiSO4·6H2O、CoSO4·7H2O、NiCl2·6H2O、硼酸、二甲胺基甲硼烷、2-乙氨基-4-甲基噻唑-5-羧酸、2-甲氧基-4-乙烯基苯酚和十二烷基硫酸钠溶解到蒸馏水中,得到代铬电镀液;NiSO 4 ·6H 2 O, CoSO 4 ·7H 2 O, NiCl 2 ·6H 2 O, boric acid, dimethylaminoborane, 2-ethylamino-4-methylthiazole-5-carboxylic acid, 2- Methoxy-4-vinylphenol and sodium lauryl sulfate are dissolved in distilled water to obtain a chromium-substituted electroplating solution;

步骤一中所述的代铬电镀液中NiSO4·6H2O的浓度为120g/L,CoSO4·7H2O的浓度为12g/L,NiCl2·6H2O的浓度为40g/L,硼酸的浓度为35g/L,二甲胺基甲硼烷的浓度为3g/L,2-乙氨基-4-甲基噻唑-5-羧酸的浓度为3g/L,2-甲氧基-4-乙烯基苯酚的浓度为1g/L,十二烷基硫酸钠的浓度为0.1g/L;The concentration of NiSO 4 6H 2 O in the chromium-substituting electroplating solution described in step 1 is 120g/L, the concentration of CoSO 4 7H 2 O is 12g/L, and the concentration of NiCl 2 6H 2 O is 40g/L, The concentration of boric acid is 35g/L, the concentration of dimethylaminoborane is 3g/L, the concentration of 2-ethylamino-4-methylthiazole-5-carboxylic acid is 3g/L, 2-methoxy- The concentration of 4-vinylphenol is 1g/L, and the concentration of sodium lauryl sulfate is 0.1g/L;

二、对基体进行预处理,得到预处理后的基体;2. Pretreating the substrate to obtain a pretreated substrate;

步骤二中将基体浸入到90℃的除油液中浸泡5min,取出后蒸馏水冲洗5次,再使用质量分数为15%的盐酸酸洗3次,蒸馏水冲洗5次,得到预处理后的基体;In step 2, immerse the substrate in a degreasing solution at 90°C for 5 minutes, take it out, rinse it with distilled water for 5 times, then pickle it with 15% hydrochloric acid for 3 times, and rinse it with distilled water for 5 times to obtain the pretreated substrate;

步骤二中所述的除油液由氢氧化钠、碳酸钠、磷酸钠、硅酸钠和蒸馏水混合而成,其中氢氧化钠的浓度为60g/L,碳酸钠的浓度为30g/L,磷酸钠的浓度为20g/L,硅酸钠的浓度为8g/L;The degreasing liquid described in step 2 is mixed by sodium hydroxide, sodium carbonate, sodium phosphate, sodium silicate and distilled water, and wherein the concentration of sodium hydroxide is 60g/L, and the concentration of sodium carbonate is 30g/L, phosphoric acid The concentration of sodium is 20g/L, and the concentration of sodium silicate is 8g/L;

步骤二中所述的基体为冷轧钢;The substrate described in step 2 is cold-rolled steel;

三、将代铬电镀液的pH值调节至3.5~4.0,将预处理后的基体浸入到代铬电镀液中,再在温度为50℃和电流密度7A/dm2的条件下电镀30min,得到镀件;3. Adjust the pH value of the chromium-substituting electroplating solution to 3.5-4.0, immerse the pretreated substrate in the chromium-substituting electroplating solution, and then electroplate for 30 minutes at a temperature of 50°C and a current density of 7A/dm 2 to obtain plating;

四、高温热处理:4. High temperature heat treatment:

将镀件置于管式炉中,在氩气气氛保护下,将镀件以10℃/min的升温速率升温至200℃,再在200℃下保温1h,最后自然冷却至室温,得到在基材表面得到Ni-Co-B合金代铬镀层。The plated parts were placed in a tube furnace, and under the protection of argon atmosphere, the plated parts were heated up to 200 °C at a heating rate of 10 °C/min, then kept at 200 °C for 1 h, and finally cooled to room temperature naturally to obtain the base The surface of the material is Ni-Co-B alloy instead of chromium plating.

本实施例所得镀件热处理前后的XRD图对比如图1所示;说明晶粒沿(111)晶面择优生长。经过对比可以发现,热处理后镀层对应于Ni(111)的衍射峰半峰宽宽化程度变小,峰强度逐渐增大,结果表明,在热处理时,由于存在晶粒粗化和析出微小的金属间化合物,从而使硬度快速升高。The comparison of the XRD patterns of the plated parts obtained in this embodiment before and after heat treatment is shown in Figure 1; it shows that the crystal grains grow preferentially along the (111) crystal plane. After comparison, it can be found that after heat treatment, the width of the half-maximum width of the diffraction peak corresponding to Ni(111) of the coating becomes smaller, and the peak intensity gradually increases. inter-compound, so that the hardness increases rapidly.

图1为X射线衍射(XRD)图,图中1为实施例1步骤三制备的镀件在热处理前的X射线衍射曲线,2为实施例1步骤四经过200℃热处理后得到的Ni-Co-B合金代铬镀层的X射线衍射曲线,3为实施例2步骤四经过300℃热处理后得到的Ni-Co-B合金代铬镀层的X射线衍射曲线;Fig. 1 is X-ray diffraction (XRD) figure, among the figure 1 is the X-ray diffraction curve of the plated piece prepared in step 3 of embodiment 1 before heat treatment, and 2 is the Ni-Co obtained after 200 ℃ of heat treatment in step 4 of embodiment 1 -The X-ray diffraction curve of the B alloy chromium coating, 3 is the X-ray diffraction curve of the Ni-Co-B alloy chromium coating obtained after the 300°C heat treatment in Step 4 of Example 2;

进一步地,当晶粒尺寸介于1~100nm之间时,可用谢乐公式计算晶粒的平均尺寸,具体公式如下所示:Further, when the grain size is between 1 and 100nm, the average grain size can be calculated using the Scherrer formula, the specific formula is as follows:

Figure BDA0003908164100000061
Figure BDA0003908164100000061

式中d——晶粒平均尺寸(nm);In the formula, d——average grain size (nm);

λ——X射线波长(λ=0.154nm);λ—X-ray wavelength (λ=0.154nm);

K——谢乐常数(K=0.89);K - Scherrer constant (K=0.89);

B——衍射峰半高宽;B——Diffraction peak width at half maximum;

θ—布拉格衍射角;θ—Bragg diffraction angle;

经过计算,晶粒平均尺寸为10.26nm,证明该镀层为纳米镀层。硬度值为1210HV-50。After calculation, the average grain size is 10.26nm, which proves that the coating is a nano-coating. The hardness value is 1210HV-50.

图2为实施例1步骤四经过200℃热处理后得到的Ni-Co-B合金代铬镀层的SEM图;Fig. 2 is the SEM figure of the Ni-Co-B alloy substituting chromium coating obtained after 200 DEG C of heat treatment in step 4 of embodiment 1;

图3为实施例1步骤四经过200℃热处理后得到的Ni-Co-B合金代铬镀层的光学显微镜图;Fig. 3 is the optical micrograph of the Ni-Co-B alloy chromium-substituting coating obtained after 200 DEG C of heat treatment in step 4 of embodiment 1;

图2和图3显示表面致密平整,硬质相分布均匀。Figures 2 and 3 show that the surface is dense and smooth, and the hard phase is evenly distributed.

实施例2:本实施例与实施例1的不同点是:步骤四中将镀件置于管式炉中,在氩气气氛保护下,将镀件以10℃/min的升温速率升温至300℃,再在300℃下保温1h,最后自然冷却至室温,得到在基材表面得到Ni-Co-B合金代铬镀层。其它步骤及参数与实施例1均相同。Example 2: The difference between this example and Example 1 is that in step 4, the plated piece is placed in a tube furnace, and under the protection of an argon atmosphere, the plated piece is heated up to 300 °C at a heating rate of 10 °C/min. ℃, and then kept at 300 ℃ for 1h, and finally cooled to room temperature naturally to obtain a Ni-Co-B alloy instead of chromium coating on the surface of the substrate. Other steps and parameters are all the same as in Example 1.

实施例2所得镀层的XRD见图1所示;The XRD of embodiment 2 gained coating is shown in Figure 1;

从图2可以发现:此时镀层同样出现结晶态,使镀层硬度得到提升。It can be found from Figure 2 that the coating also appears in a crystalline state at this time, which improves the hardness of the coating.

进一步地,通过谢乐公式计算晶粒的平均尺寸,在实施例2中,晶粒平均尺寸为9.38nm,证明该镀层为纳米镀层。硬度值为1290HV-50。Further, the average grain size was calculated by the Scherrer formula. In Example 2, the average grain size was 9.38nm, which proved that the coating was a nano-coating. The hardness value is 1290HV-50.

对比实施例:本实施例与实施例1的不同点是:步骤一中:制备代铬电镀液:Comparative example: the difference between the present example and Example 1 is: in step one: prepare chromium-substituting electroplating solution:

将NiSO4·6H2O、CoSO4·7H2O、NiCl2·6H2O、硼酸和二甲胺基甲硼烷溶解到蒸馏水中,得到代铬电镀液;步骤一中所述的代铬电镀液中NiSO4·6H2O的浓度为120g/L,CoSO4·7H2O的浓度为12g/L,NiCl2·6H2O的浓度为40g/L,硼酸的浓度为35g/L,二甲胺基甲硼烷的浓度为3g/L。其它步骤及参数与实施例1均相同。Dissolve NiSO 4 6H 2 O, CoSO 4 7H 2 O, NiCl 2 6H 2 O, boric acid and dimethylaminoborane into distilled water to obtain a chromium substitute electroplating solution; the chromium substitute described in step one The concentration of NiSO 4 6H 2 O in the electroplating solution is 120g/L, the concentration of CoSO 4 7H 2 O is 12g/L, the concentration of NiCl 2 6H 2 O is 40g/L, and the concentration of boric acid is 35g/L. The concentration of dimethylaminoborane was 3 g/L. Other steps and parameters are all the same as in Example 1.

对比实施例制备镀层晶粒尺寸为100.4nm,硬度值为698HV-50。进一步说明本发明所述晶粒细化剂、应力消除剂、润湿剂对减小结晶尺寸、提高镀层硬度起到显著作用。The grain size of the coating prepared in the comparative example is 100.4nm, and the hardness value is 698HV-50. It is further illustrated that the grain refiner, stress reliever, and wetting agent of the present invention play a significant role in reducing the crystal size and improving the hardness of the coating.

Claims (10)

1. A high-hardness nano Ni-Co-B alloy chromium-substituting electroplating solution is characterized in that the high-hardness nano Ni-Co-B alloy chromium-substituting electroplating solution is prepared from main salt, a boron source, an anode activator, a pH buffering agent, a grain refiner, a stress relieving agent, a wetting agent and distilled water;
the main salt is nickel salt and cobalt salt;
the grain refiner is one or a mixture of more of 2-ethylamino-4-methylthiazole-5-carboxylic acid, polyethyleneimine, myrcene, allyl furoate and 3- (methylthio) hexanol acetate;
the stress relieving agent is 1,3-dicyclohexyl imidazole chloride, 2-methoxy-4-vinylphenol or rose bengal;
the wetting agent is polyethylene glycol, OP emulsifier or lauryl sodium sulfate.
2. The plating solution of high hardness nano Ni-Co-B alloy as recited in claim 1, wherein the nickel salt is nickel sulfate; the cobalt salt is cobalt sulfate.
3. The plating solution of high hardness nano Ni-Co-B alloy as recited in claim 1, wherein the boron source is dimethyl amino borane; the anode activator is nickel chloride; the pH buffering agent is boric acid.
4. The electroplating solution as claimed in any one of claims 1 to 3, wherein the concentration of the nickel salt, the cobalt salt, the boron source, the anode activator, the pH buffer and the grain refiner is 100 to 150g/L, 10 to 15g/L, 1 to 5g/L, 20 to 50g/L, 30 to 50g/L, 0.1 to 5g/L, 0.5 to 1.5g/L, and 0.05 to 1g/L, respectively.
5. The use of the high hardness nano Ni-Co-B alloy chromium-substituting electroplating solution according to claim 1, wherein a high hardness nano Ni-Co-B alloy chromium-substituting electroplating solution is used for preparing the Ni-Co-B alloy chromium-substituting plating layer.
6. The use of the high-hardness nano Ni-Co-B alloy chromium-substituting electroplating solution as claimed in claim 5, wherein the preparation of the Ni-Co-B alloy chromium-substituting electroplating solution by using the high-hardness nano Ni-Co-B alloy chromium-substituting electroplating solution is carried out by the following steps:
1. preparing a chromium-substituted electroplating solution:
dissolving main salt, a boron source, an anode activator, a pH buffering agent, a grain refiner, a stress relieving agent and a wetting agent into distilled water to obtain a chromium-substituted electroplating solution;
2. pretreating the substrate to obtain a pretreated substrate;
soaking the matrix into deoiling liquid at 80-90 ℃, taking out and washing with distilled water; then using hydrochloric acid for pickling and washing by distilled water to obtain a pretreated matrix;
3. regulating the pH value of the chromium-substituting electroplating solution to 3.5-4.0, immersing the pretreated substrate into the chromium-substituting electroplating solution, and then controlling the temperature to be 40-50 ℃ and the current density to be 2-7A/dm 2 Electroplating under the condition of (1) to obtain a plated part;
4. high-temperature heat treatment:
and (3) placing the plated part in a tube furnace, heating the plated part to 200-300 ℃ under the protection of argon atmosphere, preserving heat at 200-300 ℃, and naturally cooling to room temperature to obtain the Ni-Co-B alloy chromium-substituted plating layer on the surface of the base material.
7. The use of the high-hardness nano Ni-Co-B alloy chromium-substituting electroplating solution according to claim 5, wherein the degreasing liquid in the step two is formed by mixing sodium hydroxide, sodium carbonate, sodium phosphate, sodium silicate and distilled water, wherein the concentration of the sodium hydroxide is 60-80 g/L, the concentration of the sodium carbonate is 20-60 g/L, the concentration of the sodium phosphate is 15-30 g/L, and the concentration of the sodium silicate is 5-10 g/L; the mass fraction of the hydrochloric acid in the second step is 10-20%; and the substrate in the second step is cold-rolled steel.
8. The application of the high-hardness nano Ni-Co-B alloy chromium-substituting electroplating solution according to claim 5 is characterized in that in the second step, the substrate is immersed in deoiling liquid for 5min to 10min, the substrate is taken out and washed by distilled water for 3 times to 5 times, then washed by hydrochloric acid for 3 times to 5 times, and washed by distilled water for 3 times to 5 times, so that the pretreated substrate is obtained.
9. The use of the electroplating solution of high hardness nano Ni-Co-B alloy as claimed in claim 5, wherein the electroplating time in step three is 30-180 min.
10. The application of the high-hardness nano Ni-Co-B alloy chromium-substituting electroplating solution as claimed in claim 5, wherein the heat preservation time in the fourth step is 1-2 h; the heating rate in the fourth step is 5-10 ℃/min.
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