CN115598860A - Weak-absorption low-reflection clear-background-color blue-light-proof resin lens and preparation method thereof - Google Patents
Weak-absorption low-reflection clear-background-color blue-light-proof resin lens and preparation method thereof Download PDFInfo
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- RJSRQTFBFAJJIL-UHFFFAOYSA-N niobium titanium Chemical compound [Ti].[Nb] RJSRQTFBFAJJIL-UHFFFAOYSA-N 0.000 claims abstract description 85
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- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 claims abstract description 8
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- G—PHYSICS
- G02—OPTICS
- G02C—SPECTACLES; SUNGLASSES OR GOGGLES INSOFAR AS THEY HAVE THE SAME FEATURES AS SPECTACLES; CONTACT LENSES
- G02C7/00—Optical parts
- G02C7/02—Lenses; Lens systems ; Methods of designing lenses
- G02C7/022—Ophthalmic lenses having special refractive features achieved by special materials or material structures
-
- G—PHYSICS
- G02—OPTICS
- G02C—SPECTACLES; SUNGLASSES OR GOGGLES INSOFAR AS THEY HAVE THE SAME FEATURES AS SPECTACLES; CONTACT LENSES
- G02C7/00—Optical parts
- G02C7/10—Filters, e.g. for facilitating adaptation of the eyes to the dark; Sunglasses
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- Health & Medical Sciences (AREA)
- Ophthalmology & Optometry (AREA)
- Physics & Mathematics (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Surface Treatment Of Optical Elements (AREA)
Abstract
The invention provides a weak-absorption low-reflection clear background color blue-light-proof resin lens and a preparation method thereof, wherein the preparation method comprises the following steps: the resin lens comprises a resin lens substrate, a hardening layer and a weak-absorption low-reflection clear background color blue-light-proof film layer; the resin lens substrate, the hardened layer and the weak-absorption low-reflection clear ground color blue light prevention film layer are sequentially arranged, the hardened layer is located on the surface of the resin lens substrate, the weak-absorption low-reflection clear ground color blue light prevention film layer is located on the surface of the hardened layer, and the weak-absorption low-reflection clear ground color blue light prevention film layer comprises a silicon-aluminum composite oxide layer, a titanium-niobium composite oxide layer, a tantalum nitride layer, a silicon dioxide layer and a tin-doped indium oxide layer. According to the invention, through adjusting the structure of the ultra-low reflection clear background color blue-light-proof film layer, a special tantalum nitride material and a proper process, the ultra-low reflection lens with a visual clear effect is obtained, the high temperature resistance and the environmental resistance of the resin lens are greatly improved, and the resin lens has a good market application prospect.
Description
Technical Field
The invention relates to the technical field of resin lens preparation, in particular to a weak-absorption low-reflection clear background color blue-light-proof resin lens and a preparation method thereof.
Background
In recent years, there is an increasing demand for optical resin lenses in the domestic and foreign eyeglass markets, and resin lenses have the advantages of light weight, good dyeing property, easy processing and the like compared with glass lenses, and medium and high refractive index optical resin lenses are favored by users with the unique advantages of high light transmittance, ultraviolet resistance, ultra-thinness and the like. . Resin lenses are generally coated with a film to reduce light reflection and enhance light transmission, i.e., an optical antireflection film.
Blue light is classified into harmful blue light and beneficial blue light. Modern people's daily life can not leave various electronic product, and the chance of contacting the blue light sharply increases thereupon, and cell-phone screen, LED lamp, computer screen all can produce a large amount of blue light, and the eyes that can give people like this bring harm with skin, can arouse brown pigment, let skin produce macula lutea, freckle, can deepen eyes myopia degree, produce visual fatigue and feel, also do not do benefit to normal sleep simultaneously. The blue light with the strong and short wavelength has potential harm to human bodies, the blue light with the long wavelength can make the lens more attractive, the clear feeling of the lens is improved, and the work excitement of people is improved. The new national standards for blue light protection also distinguish harmful blue light from beneficial blue light.
The main market demands for resin lenses are: (1) the blue light prevention standard is met so as to protect the visual health of people; (2) low reflectivity reduces interference and improves aesthetic clarity; (3) clear background color, clear and transparent whiteness, and more white and beautiful face and eyes. In order to meet the new requirements of consumers in new electronic environments and the market demands, it is urgently needed to provide a resin lens with weak absorption, low-reflection, clear background color, blue light prevention, high temperature resistance and durability.
Disclosure of Invention
In order to meet new consumption requirements, the invention aims to provide a low-absorption ultralow-reflection clear-background blue-light-proof high-temperature-resistant resin lens and a preparation method thereof, so that the ultralow reflection is realized, the blue-light-proof standard is met, and the high temperature resistance and the durability of the resin lens are improved by reducing stress.
The invention is realized by the following technical scheme:
the invention provides a weak-absorption low-reflection clear background color blue-light-proof resin lens, which comprises the following components in part by weight: the low-absorption anti-clear background color blue-proof film layer is arranged on the resin lens substrate; the resin lens substrate, the hardened layer and the weak-absorption low-reflection clear background color blue-light-proof film layer are sequentially arranged, the hardened layer is located on the surface of the resin lens substrate, and the weak-absorption low-reflection clear background color blue-light-proof film layer is located on the surface of the hardened layer;
further, the weak-absorption low-reflection clear background color blue-light-proof resin lens also comprises a waterproof layer, and the waterproof layer is positioned on the surface of the weak-absorption low-reflection clear background color blue-light-proof film layer;
further, the UV cut-off wavelength of the resin lens substrate is 405-407 nm;
furthermore, the main component of the material of the hardening layer is organic silicon;
further, the weak-absorption low-reflection bottom color blue-light-proof film layer comprises a silicon-aluminum composite oxide layer, a titanium-niobium composite oxide layer, a tantalum nitride (TaN) layer and silicon dioxide (SiO) 2 ) A layer and a tin-doped indium oxide (i.e., ITO) layer; furthermore, the weak-absorption low-reflection clear ground color blue-light-proof film layer comprises three silicon-aluminum composite oxide layers, three titanium-niobium composite oxide layers, a TaN layer and a SiO layer 2 A layer and an ITO layer;
further, the silicon-aluminum composite oxide layer is made of SiO 2 And Al 2 O 3 A composite material composition of, and wherein SiO 2 The composite material accounts for 70 to 95 percent of the molar fraction of the composite material; further preferred, wherein SiO 2 92% of the mole fraction of the composite;
further, the titanium-niobium composite oxide layer is made of TiO 2 And Nb 2 O 5 Composite material composition of TiO 2 Accounting for 10 to 90 percent of the mole fraction of the composite material; preferably, wherein TiO 2 80% of the mole fraction of the composite material;
further, the purity of TaN in the tantalum nitride layer is more than 99.9%;
further, the thickness of the hardening layer is 1-5 μm;
further, the thickness of the weak-absorption low-reflection bottom color blue-light-proof film layer is 200-600 nm;
further, the thickness of the waterproof layer is 4-20 nm;
furthermore, the average reflectivity of the weak-absorption low-reflection clear background color blue-light-proof resin lens is less than or equal to 0.3 percent;
furthermore, the peak reflectivity of the weak absorption low-reflection clear ground color blue-proof resin lens at the position of 400-700 nm of a visible light wave band is less than or equal to 2.2 percent;
furthermore, the reflected light color coordinate H value of the weak absorption low-reflection clear background color blue-proof resin lens is 270-295, and the C value is 12-25;
furthermore, the yellow index of the weak-absorption low-reflection clear-background blue-light-proof resin lens is less than or equal to 3.5 percent;
the second aspect of the invention provides a preparation method of the weak-absorption low-reflection clear background anti-blue-light resin lens, which comprises the following steps:
s1, preparing a hardening layer: forming a hardening layer on the surface of the resin lens substrate to obtain a resin lens containing the hardening layer;
s2, preparing a weak-absorption low-reflection clear background color blue-light-proof film layer: forming the weak-absorption low-reflection clear background color blue-light-prevention film layer on the surface of the resin lens obtained in the step S1, namely obtaining the resin lens containing the weak-absorption low-reflection clear background color blue-light-prevention film layer, and the method specifically comprises the following steps:
s21: respectively forming a resin lens containing a first silicon-aluminum composite oxide layer and a second titanium-niobium composite oxide layer on the surface of the resin lens obtained in the step S1;
s22: forming a third layer of tantalum nitride layer-containing resin lens on the surface of the resin lens obtained in step S21;
s23: forming a fourth SiO-containing layer on the surface of the resin lens obtained in step S22 2 A resin lens of the layer;
s24: forming a resin lens on the surface of the resin lens obtained in the step S23, wherein a fifth titanium-niobium composite oxide layer, a sixth silicon-aluminum composite oxide layer and a seventh titanium-niobium composite oxide layer are respectively formed on the surface of the resin lens;
s25: forming a resin lens comprising an eighth ITO-containing layer formed on the surface of the resin lens obtained in step S24;
s26: a ninth resin lens including a silicon-aluminum composite oxide layer is further formed on the surface of the resin lens obtained in step S25;
s3, preparing a waterproof layer: and forming a waterproof layer on the surface of the resin lens obtained in the step S2.
Advantageous effects
1. The invention adopts a specific resin substrate and a combined film system structure, thereby realizing effective obstruction of harmful blue light and transmission of beneficial blue light; meanwhile, the yellow index of the product is less than or equal to 3 percent, and the product has good visual effect;
2. the TaN layer prepared by adopting a specific process can supplement and meet the blue light prevention standard, and reduce the yellow index to increase the clear background color effect, and the film layer can absorb 1.6% of the single surface of the important 415-445 nm waveband of the blue light prevention standard, so that the lens can meet the blue light prevention standard, and human eyes can be protected from being damaged by blue light; the absorption of yellow light is about 0.5 percent higher than that of blue light, thereby effectively reducing the yellow index and ensuring that the lens is clear and white.
3. And (3) obtaining an ultralow reflection effect: the film layer material adopts niobium-titanium composite oxide material, so that the anti-reflection bandwidth is wider, the reflectivity is lower, the peak reflectivity and the peak reflectivity of the visible light average waveband are effectively controlled, the light transmittance of the resin lens is obviously improved, and the ultra-low reflection effect is obtained;
4. the high temperature resistance and the durability of the lens are obviously improved: firstly, the adoption of niobium-titanium composite oxide material can effectively avoid TiO 2 The characteristic of easy crystallization of the film layer can also effectively avoid compact Nb 2 O 5 The film layer is easy to crack on the resin lens, the film layer is ensured to be in an amorphous state under the condition of low ion source energy of the resin glasses coated film, and the film layer is prevented from cracking due to crystallization, so that the high temperature resistance and high humidity resistance of the film layer and the lens are improved, and the durability of the product is further improved; secondly, the silicon-aluminum composite oxide material layer effectively avoids SiO 2 The long column is easy to form to cause high stress of the film layer, the glass state structure of the film layer is kept, and the high temperature resistance of the film layer is improved;
6. the repeatability and the mass production of the product are improved: the niobium-titanium composite oxide material is adopted to prepare the film layer, so that TiO is effectively reduced 2 For O in IAD auxiliary process 2 Sensitivity of flowThe process difficulty is reduced, and the repeatability and the mass production of the product are effectively improved.
Drawings
FIG. 1 is a schematic diagram of each layer of a weak absorption low-reflection clear ground-color blue-light-proof resin lens prepared in examples 1 to 3 of the present invention; the lens comprises a resin lens substrate 1, a hardening layer 2, an ultra-low reflective clear background color film layer 3 and a waterproof layer 4; wherein, the clear bottom colour rete 3 of ultralow reflection includes: 3-1 parts of silicon-aluminum composite oxide layer, 3-2 parts of titanium-niobium composite oxide layer, 3-3 parts of tantalum nitride layer, 3-4 parts of silicon dioxide layer, 3-5 parts of titanium-niobium composite oxide layer, 3-6 parts of silicon-aluminum composite oxide layer, 3-7 parts of titanium-niobium composite oxide layer, 3-8 parts of ITO layer and 3-9 parts of silicon-aluminum composite oxide layer
Detailed Description
In a specific embodiment, the weak absorption low-reflection bottom color blue-proof film layer comprises three silicon-aluminum composite oxide layers, three titanium-niobium composite oxide layers, one tantalum nitride (TaN) layer and one silicon dioxide (SiO) 2 ) The anti-blue light film comprises a layer and a tin-doped indium oxide (ITO) layer, wherein in the ultra-low reflective clear ground color anti-blue light film layer, the layers are sequentially as follows: silicon-aluminum composite oxide layer, (2) titanium-niobium composite oxide layer, (3) TaN layer, (4) SiO 2 The composite material comprises a layer, (5) a titanium niobium composite oxide layer, (6) a silicon-aluminum composite oxide layer, (7) a titanium niobium composite oxide layer, (8) an ITO layer and (9) a silicon-aluminum composite oxide layer; the first silicon-aluminum composite oxide layer is positioned on the surface of the hardened layer;
further, in a specific embodiment, the thicknesses of the layers of the weak absorption low-reflection bottom color blue-proof film layer are as follows:
the thickness of the first silicon-aluminum composite oxide layer is 0-180 nm, preferably 5-30 nm;
the thickness of the second titanium-niobium composite oxide layer is 10-40 nm, preferably 10-25 nm;
the thickness of the third TaN layer is 0.4-1.5 nm, preferably 0.5-0.6 nm;
the fourth layer of SiO 2 The thickness of the layer is 20 to 60nm, preferably 25 to 40nm;
the thickness of the fifth titanium-niobium composite oxide layer is 30-80 nm, preferably 40-60 nm;
the thickness of the sixth silicon-aluminum composite oxide layer is 10-50 nm, preferably 10-20 nm;
the thickness of the seventh titanium-niobium composite oxide layer is 25-75 nm, preferably 30-45 nm;
the thickness of the eighth ITO layer is 2-10 nm, preferably 4-5 nm;
the thickness of the ninth silicon-aluminum composite oxide layer is 60-130 nm, preferably 70-95 nm;
in a specific embodiment, the step of S1 preparing a hardbanding layer comprises: immersing a resin lens substrate cleaned by ultrasonic waves into a hardening liquid aqueous solution with the mass percentage content of 25-30%, wherein the immersion temperature is 10-20 ℃, after immersing for 4-8 seconds, pulling out the solution at the speed of 1.0-3.0 mm/s, drying the substrate at 70-90 ℃ for 2-5 hours, taking out the substrate, and sending the substrate into a drying oven for drying and curing, wherein the curing temperature is 100-150 ℃, and the curing time is 120-180 min, so as to obtain the resin lens containing a hardening layer;
in a specific embodiment, the process for preparing the weak absorption low-reflection clear bottom color blue-proof film layer in the step S2 includes:
in a vacuum coating machine, a vacuum coating process is adopted, a silicon-aluminum composite oxide layer, a titanium-niobium composite oxide, tantalum nitride, silicon dioxide and an ITO solid film layer material are evaporated and then are subjected to vapor phase transmission, and a film is deposited on the surface of the resin lens obtained in the step S1 to form a weak absorption low reflection clear ground color film layer, and the method specifically comprises the following steps:
s21: forming a first silicon-aluminum composite oxide layer on the surface of the resin lens obtained in the step S1, wherein the background vacuum degree is less than or equal to 3 multiplied by 10 -3 Pa, the temperature in the coating chamber is 50-70 ℃, and the high-energy electron beam is adopted to heat the silicon-aluminum composite oxide under the condition of the ion source auxiliary process, wherein the speed isDepositing the evaporated silicon-aluminum composite oxide in a nanoscale molecular form to obtain a resin lens containing a first silicon-aluminum composite oxide layer;
s22: forming a titanium-niobium composite oxide layer on the surface of the resin lens obtained in step S21, and forming a titanium-niobium composite oxide layer on the surface of the resin lens obtained in step S21 under a background vacuum degree of not more than 3 × 10 -3 Pa, the temperature in the coating chamber is 50-70 ℃, and the titanium-niobium composite oxide is heated by high-energy electron beams at the speed of 50-70 ℃ under the condition of an ion source auxiliary processDepositing the evaporated titanium-niobium composite oxide in a nanoscale molecular form to obtain a resin lens containing a second titanium-niobium composite oxide layer;
s23: forming a tantalum nitride layer on the surface of the resin lens obtained in step S22, specifically including:
s231: firstly, vacuumizing until the background vacuum degree is less than or equal to 8 multiplied by 10 -4 Pa, bombarding by using an ion source Hall source for 50-80 seconds, wherein the bombardment parameters of the ion source are as follows: anode voltage: 90-140V, anode current: 2.5 to 5A, ar as auxiliary gas and 5 to 20sccm of flow rate; preferably, the bombardment time of the Hall source of the ion source is 60 seconds, and the bombardment parameters of the ion source are as follows: anode voltage: 110V, anode current: 3A, ar is used as auxiliary gas, and the flow rate is 10sccm;
s232: deposition with ion source assisted process, heating TaN with high energy electron beam at a rateDepositing the evaporated TaN in a nanoscale molecular form, wherein the auxiliary parameters of the ion source are as follows: anode voltage: 90-140V, anode current: 2.5 to 5A, and Ar and N are auxiliary gas 2 Ar flow rate is 5-15 sccm, N 2 The flow rate is as follows: 3-15 sccm; preferably, at a rate assisted by an ion sourceDepositing the evaporated TaN in a nanoscale molecular form, wherein the auxiliary parameters of the ion source are as follows: anode voltage: 110V, anode current: 3A, auxiliary gas Ar and N 2 Ar flow rate is 10sccm and N 2 The flow rate is as follows: 5sccm;
s233: continuing to use ion source Hall source bombingStriking the surface of the TaN film layer for 20-40 seconds, wherein the bombardment parameters are as follows: anode voltage: 90-140V, anode current: 2.5 to 5A, and Ar and N are auxiliary gas 2 Ar flow rate is 5-15 sccm and N 2 The flow rate is as follows: 3-15 sccm; preferably, the bombardment time is 30 seconds, and the bombardment parameters are as follows: anode voltage: 110V, anode current: 3A, auxiliary gas Ar and N 2 Ar flow rate is 10sccm and N 2 The flow rate is as follows: 5sccm;
s24: on the surface of the resin lens obtained in S23, the vacuum degree at the background is less than or equal to 3 x 10 -3 Pa, the temperature in the coating chamber is 50-70 ℃, and high-energy electron beams are adopted to heat SiO under the condition of ion source auxiliary process 2 At a rate ofThe evaporated SiO 2 Depositing in the form of nano-scale molecules to obtain SiO-containing 2 A resin lens of the layer; the ion source auxiliary parameters are: anode voltage: 90-140V, anode current: 2.5 to 5A, ar as auxiliary gas and 5 to 20sccm of flow rate; preferably at a rate assisted by an ion sourceSiO to be evaporated 2 The deposition is carried out in a nanometer molecular form, and the auxiliary parameters of an ion source are as follows: anode voltage: 110V, anode current: 3A, ar is used as auxiliary gas, and the flow rate is 10sccm;
s25: repeating the step S22, and forming a titanium-niobium composite oxide layer on the surface of the resin lens obtained in the step S24;
s26: repeating the step S21, and forming a silicon-aluminum composite oxide layer on the surface of the resin lens obtained in the step S25;
s27: repeating the step S22, and forming a titanium-niobium composite oxide layer on the surface of the resin lens obtained in the step S26;
s28: on the surface of the resin lens obtained in S27, the degree of vacuum in the background is not more than 3X 10 -3 Pa, the temperature in the coating chamber is 50-70 ℃, and ITO is heated by high-energy electron beams at the speed of 50-70 ℃ under the condition of an ion source auxiliary processDepositing the evaporated ITO in a nanoscale molecular form to obtain a resin lens containing an ITO layer;
s29: continuously adopting a vacuum coating process on the surface of the resin lens obtained in the step S28, repeating the process step S21, and forming a layer of resin lens containing the silicon-aluminum composite oxide layer;
in steps S21, S22, and S25 to S29, the ion source assisted deposition process parameters are: the ion source is a Hall source, and the anode voltage: 90-140V, anode current: 2.5 to 5A, and the auxiliary gas is O 2 The flow rate is 10-30 sccm; preferably, the ion source assisted deposition process parameters are as follows: the ion source is a Hall source, and the anode voltage: 110V, anode current: 3A, auxiliary gas is O 2 The flow rate is 15sccm;
in a specific embodiment, the step S3: the step of forming a water-repellent layer on the surface of the resin lens obtained in step S2 comprises the steps of: the surface of the lens obtained in the step S29 is continuously coated by a vacuum coating process, and the background vacuum degree is less than or equal to 3 multiplied by 10 - 3 Pa, and the temperature in the coating chamber is 50-70 ℃, adopting high-energy electron beams to heat the material at the speed ofThe evaporated fluorine-containing waterproof material (preferably containing perfluoroalkyl (C) 12 F 27 The waterproof material of N)) is deposited in a nanoscale molecular form to obtain a resin lens containing a waterproof layer;
in a specific embodiment, the tantalum nitride material has a molecular formula of TaN and a purity of 99.9%, is prepared by sintering tantalum nitride powder by a conventional process, and is specifically manufactured and developed by the electro-optical technology corporation of shanghai city, changzhou;
in one specific embodiment, the silicon-aluminum composite oxide is developed and produced by the company Summit photoelectric technology, inc., of Yokou city, yokou province, and the silicon-aluminum composite oxide layer is made of SiO 2 And Al 2 O 3 Composite material composition, and SiO therein 2 Of said composite materialThe molar fraction is 70-95%, and the specific types refer to examples and comparative examples;
in one specific embodiment, the titanium-niobium composite oxide is developed and produced by Titania corporation of Suchi opto-electronic technology, inc 2 And Nb 2 O 5 Composition of, wherein TiO 2 The mole fraction of the compound is 10-90%, and the specific types refer to examples and comparative examples;
the resin lens substrate selected by the invention is a conventional lens in the field, the content of UV powder of the conventional lens is adjusted, the UV cut-off wavelength is 405-407 nm, and the definition of the UV cut-off wavelength refers to 5.4.2.4.4 of the standard QB/T2506-2017 of the optical resin lens;
for example, in one embodiment, a resin lens substrate having a UV cut-off wavelength of 405 to 407nm, hereinafter referred to as "MR-8-UV405" or "MR-7-UV405", manufactured by Mitsui chemical corporation of Japan, and having a refractive index of 1.60 or MR-7 (refractive index of 1.67) is purchased; or in a specific embodiment, a resin lens substrate which is developed and produced by Jiangsu Visco New Material Ltd and has a refractive index of 1.56 and a UV value cutoff wavelength of 405-407 nm, hereinafter referred to as "SK1.56-UV405", is purchased, and a specific preparation method of the resin lens substrate is described in the patent of Visco optics: CN201410245692.6.
The present invention may be selected from conventional hardening liquids, for example, in a specific embodiment, a hardening liquid of type Z117 or Z118 (hereinafter, referred to as "Z117" or "Z118") from ita optical industry co; or in a specific embodiment, the hardness-increasing liquid of Dohn optical (rare) Co.Ltd is VH56 (hereinafter referred to as "VH 56") is selected to prepare the lens of the invention, so that the dense connectivity between the film layers is greatly improved.
Example (A)
Example 1
A weak absorption low-reflection clear background color blue light-proof resin lens sequentially comprises: resin lens substrate 1 (MR-8-UV 405); adding a hard layer 2 (Z117)/2.6-3 μm; the ultralow-reflectance undercolor layer 3 includes: silicon aluminum composite oxide layer 3-1 (Wherein SiO is 2 And Al 2 O 3 Molar weight percentage: 92% of SiO 2 :8%Al 2 O 3 (ii) a The material model is SA 56)/24 nm, and the titanium-niobium composite oxide layer 3-2 (TiO is selected from the group consisting of 2 And Nb 2 O 5 The molar weight percentage is as follows: 80% of TiO 2 :20%Nb 2 O 5 (ii) a The material model is PTN 28)/17.42 nm, the tantalum nitride layer 3-3 (molecular formula TaN, purity above 99.9%, sintered by Changzhou Chou photoelectric technology Co., ltd.)/0.6 nm, and the silicon dioxide layer 3-4/32.1nm (molecular formula SiO 2 99.99 percent of purity, sintered by Kodak coating material Co., ltd, danyang, 3-5 (same material as 3-2)/48.9 nm of titanium niobium composite oxide layer and 3-6/12.1nm of silicon aluminum composite oxide layer (same material as 3-1); 3-7 (the same material as 3-2)/34.95 nm of the titanium-niobium composite oxide layer; 3-8/5nm of ITO layer; the silicon-aluminum composite oxide layer is 3-9/91.1nm (the material is the same as 3-1); waterproof layer 4 (adopting C-containing) 12 F 27 Waterproof material of N/10 nm);
the preparation method of the resin lens comprises the following steps:
s1: manufacturing a hardening layer: immersing the resin lens substrate cleaned by ultrasonic waves into hardening liquid aqueous solution with the mass percentage of 27% and the model of Z117, immersing at the temperature of 15 ℃, and pulling out the solution at the speed of 2.0mm/s after immersing for 5 seconds; drying for 3 hours at 80 ℃, taking out the substrate, and conveying the substrate into a drying oven for drying and curing, wherein the curing temperature is 120 ℃, and the curing time is 150min, so as to obtain a resin lens containing a hardening layer;
s2, preparing a weak-absorption low-reflection clear background color blue-light-proof film layer: in a vacuum coating machine, a vacuum coating process is adopted, solid film layer materials are evaporated and then are subjected to gas phase transmission, a film is deposited on the surface of the resin lens obtained in the step S1, and a weak-absorption low-reflection clear ground color blue-light-proof film layer is formed, and the method specifically comprises the following steps:
s21: and forming a silicon-aluminum composite oxide layer on the surface of the resin lens obtained in the step S1. Vacuum degree of less than or equal to 3 x 10 -3 Pa, the temperature in the coating chamber is 50-70 ℃, and an ion source auxiliary process is adoptedUnder the condition, adopting high-energy electron beam to heat the silicon-aluminum composite oxide at the speed ofDepositing the evaporated silicon-aluminum composite oxide in a nanoscale molecular form to obtain a resin lens containing a first silicon-aluminum composite oxide layer;
s22: a titanium-niobium composite oxide layer is formed on the surface of the resin lens obtained in step S21. On the surface of the resin lens obtained in S21, the vacuum degree at the background is less than or equal to 3 x 10 -3 Pa, the temperature in the coating chamber is 50-70 ℃, and the titanium-niobium composite oxide is heated by high-energy electron beams at the speed of 50-70 ℃ under the condition of an ion source auxiliary processDepositing the evaporated titanium-niobium composite oxide in a nano-scale molecular form to obtain a resin lens containing a second titanium-niobium composite oxide layer;
s23: forming a tantalum nitride layer on the surface of the resin lens obtained in step S22, specifically including the steps of: s231: firstly, vacuum pumping is carried out until the background vacuum degree is less than or equal to 8 multiplied by 10 -4 Pa, bombarding by using an ion source Hall source for 60 seconds, wherein the bombardment parameters of the ion source are as follows: anode voltage: 110V, anode current: 3A, ar is used as auxiliary gas, and the flow rate is 10sccm; s232: deposition with ion source assisted process, heating TaN with high energy electron beam at a rateDepositing the evaporated TaN in a nanoscale molecular form, wherein the auxiliary parameters of the ion source are as follows: anode voltage: 110V, anode current: 3A, auxiliary gas Ar and N 2 Ar flow rate is 10sccm and N 2 The flow rate is as follows: 5sccm; s233: and continuing bombarding the surface of the TaN film layer by using an ion source Hall source for 30 seconds, wherein the bombarding parameters are as follows: anode voltage: 110V, anode current: 3A, auxiliary gas Ar and N 2 Ar flow rate is 10sccm and N 2 The flow rate is as follows: 5sccm.
S24: on the surface of the resin lens obtained in S23, the vacuum degree at the background is less than or equal to 3 x 10 -3 Pa and platingThe temperature in the membrane cabin is 50-70 ℃, and high-energy electron beams are adopted to heat SiO under the condition of an ion source auxiliary process 2 At a rate ofThe SiO after evaporation 2 Depositing in the form of nanoscale molecules to obtain SiO-containing 2 A resin lens of the layer; the ion source auxiliary parameters are: anode voltage: 110V, anode current: 3A, ar as an auxiliary gas, at a flow rate of 10sccm.
S25: repeating the step S22, and forming a titanium-niobium composite oxide layer on the surface of the resin lens obtained in the step S24;
s26: repeating the step S21, and forming a silicon-aluminum composite oxide layer on the surface of the resin lens obtained in the step S25;
s27: repeating the step S22, and forming a titanium-niobium composite oxide layer on the surface of the resin lens obtained in the step S26;
s28: on the surface of the resin lens obtained in S27, the degree of vacuum in the background is not more than 3X 10 -3 Pa, the temperature in the coating chamber is 50-70 ℃, and ITO is heated by high-energy electron beams at the speed of 50-70 ℃ under the condition of an ion source auxiliary processDepositing the evaporated ITO in a nanoscale molecular form to obtain a resin lens containing an ITO layer;
s29: continuously adopting a vacuum coating process on the surface of the resin lens obtained in the step S28, repeating the process step S21, and forming a layer of resin lens containing the silicon-aluminum composite oxide layer;
s3, preparing a waterproof layer: forming a waterproof layer on the surface of the resin lens obtained in step S29: the surface of the lens obtained in the step S29 is continuously coated by a vacuum coating process, and the vacuum degree of the background is less than or equal to 3 multiplied by 10 -3 Pa, and the temperature in the coating chamber is 60 ℃, adopting high-energy electron beams to heat the material at the speed ofEvaporated to contain C 12 F 27 N as a water-repellent materialAnd (4) depositing the nano-scale molecular form on the surface of the resin lens obtained in the step S24 to obtain the resin lens.
Example 2
A weak absorption low-reflection clear background color blue light-proof resin lens sequentially comprises: resin lens substrate 1 (SK 1.56-UV 405); hard layer 2 (VH 56)/1-2.6 μm; the ultra-low reflection clear background film layer 3 includes: silicon-aluminum composite oxide layer 3-1 (wherein SiO 2 And Al 2 O 3 The molar weight percentage is as follows: 92% SiO 2 :8%Al 2 O 3 (ii) a The material model is SA 56)/24 nm, and the titanium-niobium composite oxide layer 3-2 (wherein TiO) is developed and produced by Yoghu Chi photoelectric technology corporation 2 And Nb 2 O 5 The molar weight percentage is as follows: 80% of TiO 2 :20%Nb 2 O 5 (ii) a The material model is PTN 28)/16.3 nm, the tantalum nitride layer 3-3 (molecular formula TaN, purity above 99.9%, sintered by Changzhou Chou photoelectric technology Co., ltd.)/0.6 nm, and the silicon dioxide layer 3-4/33.28nm (molecular formula SiO 2 99.99% purity, sintered by Kodak coating material Co., ltd, dengyang), titanium niobium composite oxide layer 3-5 (same material 3-2)/48.14 nm, silicon aluminum composite oxide layer 3-6/12.1nm (same material 3-1); 3-7 (same material as 3-2)/35.07 nm of titanium-niobium composite oxide layer; 3-8/5nm of an ITO layer; the silicon-aluminum composite oxide layer is 3-9/91.0nm (the material is the same as 3-1); waterproof layer 4 (adopting C-containing) 12 F 27 Waterproof material of N/10 nm).
The preparation method of the resin lens comprises the following steps:
s1: manufacturing a hardening layer: immersing the resin lens substrate cleaned by ultrasonic waves into a hardening liquid aqueous solution with the mass percentage of 30% and the model of VH56, wherein the immersion temperature is 15 ℃, and after 5 seconds of immersion, the solution is pulled out at the speed of 2.0 mm/s; drying the substrate for 3 hours at the temperature of 80 ℃, taking out the substrate, and sending the substrate into a drying oven for drying and curing, wherein the curing temperature is 120 ℃, and the curing time is 150min, so that the resin lens containing the hardened layer is obtained;
the rest of the procedure was the same as in example 1.
Example 3
A weak absorption low-reflection clear background color blue light-proof resin lens sequentially comprises: resin lens substrate 1 (MR-7-UV 405); adding a hard layer 2 (Z118)/1-2.6 mu m; the ultralow-reflectance undercolor layer 3 includes: silicon-aluminum composite oxide layer 3-1 (wherein SiO 2 And Al 2 O 3 The molar weight percentage is as follows: 92% SiO 2 :8%Al 2 O 3 (ii) a The material model is SA 56)/24 nm, and the titanium-niobium composite oxide layer 3-2 (wherein TiO) is developed and produced by Yoghu Chi photoelectric technology corporation 2 And Nb 2 O 5 The molar weight percentage is as follows: 80% of TiO 2 :20%Nb 2 O 5 (ii) a The material model is PTN 28)/19.44 nm, tantalum nitride layer 3-3 (molecular formula TaN, purity above 99.9%, sintered by Changzhou Chou photoelectric technology Co., ltd.)/0.6 nm, and silicon dioxide layer 3-4/30.3nm (molecular formula SiO 2 99.99% purity, sintered by Kodak coating material Co., ltd, danyang), 3-5 (same material as 3-2)/50.08 nm titanium niobium composite oxide layer, 3-6/12.1nm silicon aluminum composite oxide layer (same material as 3-1); 3-7 (same as 3-2) of the titanium-niobium composite oxide layer/34.72 nm; 3-8/5nm of an ITO layer; the silicon-aluminum composite oxide layer is 3-9/91.25nm (the material is the same as 3-1); waterproof layer 4 (adopting C) 12 F 27 Waterproof material of N/10 nm).
The preparation method of the resin lens comprises the following steps:
s1: manufacturing a hardening layer: immersing the resin lens substrate cleaned by ultrasonic waves into hardening liquid aqueous solution with the mass percentage of 27% and the model of Z118, wherein the immersion temperature is 15 ℃, and after 5 seconds of immersion, pulling out the solution at the speed of 2.0 mm/s; drying the substrate for 3 hours at the temperature of 80 ℃, taking out the substrate, and sending the substrate into a drying oven for drying and curing, wherein the curing temperature is 120 ℃, and the curing time is 150min, so that the resin lens containing the hardened layer is obtained;
the rest of the procedure was the same as in example 1.
(II) comparative example
Comparative example 1
A low anti-blue light resin lens of preventing of clear background color, arrange in proper order and include: resin lens substrate 1 (MR-8-UV 405); hardening layer 2(Z117)/2.6-3 μm; the antireflection layer 3 includes: silicon-aluminum composite oxide layer 3-1 (wherein SiO is 2 And Al 2 O 3 The molar weight percentage is as follows: 92% SiO 2 :8%Al 2 O 3 (ii) a The material model is SA 56)/24.6 nm, and the titanium-niobium composite oxide layer 3-2 (wherein TiO is prepared by Yokogawa photoelectric technology corporation, inc.) 2 And Nb 2 O 5 The molar weight percentage is as follows: 80% of TiO 2 :20%Nb 2 O 5 (ii) a The material model is PTN 28)/18.8 nm, the silicon-aluminum composite oxide layer is 3-3/31.34nm (the material is the same as 3-1), the titanium-niobium composite oxide layer is 3-4 (the material is the same as 3-2)/51.32 nm, the silicon-aluminum composite oxide layer is 3-5/10.41nm (the material is the same as 3-1), the titanium-niobium composite oxide layer is 3-6 (the material is the same as 3-2)/34.38 nm, and the ITO layer is 3-7/5nm; the silicon-aluminum composite oxide layer is 3-8/92.63nm (the material is the same as 3-1); waterproof layer 4 (adopting C) 12 F 27 Waterproof material of N/10 nm);
the preparation method of the resin lens comprises the following steps:
s1: manufacturing a hardening layer: immersing the resin lens substrate cleaned by ultrasonic waves into hardening liquid aqueous solution with the mass percentage of 27% and the model of Z117, immersing at the temperature of 15 ℃, and pulling out the solution at the speed of 2.0mm/s after immersing for 5 seconds; drying the substrate for 3 hours at the temperature of 80 ℃, taking out the substrate, and sending the substrate into a drying oven for drying and curing, wherein the curing temperature is 120 ℃, and the curing time is 150min, so that the resin lens containing the hardened layer is obtained;
s2, preparing a low-reflection clear ground color blue-light-proof film layer: in a vacuum coating machine, a vacuum coating process is adopted, solid film layer materials are evaporated and then are subjected to gas phase transmission, a film is deposited on the surface of the resin lens obtained in the step S1, and a low-reflection clear ground color blue-light-proof film layer is formed, and the method specifically comprises the following steps:
s21: the method comprises the following steps:
s211: on the surface of the resin lens obtained in S1, the vacuum degree at the background is less than or equal to 3 multiplied by 10 -3 Pa, the temperature in the coating chamber is 60 ℃, and high-energy electron beams are adopted to heat the silicon-aluminum composite oxide under the condition of an ion source auxiliary process, and the speed is the speedDepositing the evaporated silicon-aluminum composite oxide in a nanoscale molecular form to obtain a resin lens containing a first silicon-aluminum composite oxide layer;
s212: the surface of the resin lens obtained in S211 is not more than 3X 10 in the background vacuum degree -3 Pa, the temperature in the coating chamber is 60 ℃, and the titanium-niobium composite oxide is heated by high-energy electron beams at the speed of 60 ℃ under the condition of an ion source auxiliary processDepositing the evaporated titanium-niobium composite oxide in a nanoscale molecular form to obtain a resin lens containing a second titanium-niobium composite oxide layer;
s213: repeating the steps S211 and S212, and alternately forming a third silicon-aluminum composite oxide layer, a fourth titanium-niobium composite oxide layer, a fifth silicon-aluminum composite oxide layer and a sixth titanium-niobium composite oxide layer respectively, namely forming the resin lens comprising the third silicon-aluminum composite oxide layer, the fourth titanium-niobium composite oxide layer, the fifth silicon-aluminum composite oxide layer and the sixth titanium-niobium composite oxide layer;
s22: on the surface of the resin lens obtained in S21, the vacuum degree at the background is less than or equal to 3 x 10 -3 Pa, the temperature in the coating chamber is 60 ℃, and ITO is heated by high-energy electron beams at the speed of 60 ℃ under the condition of an ion source auxiliary processDepositing the evaporated ITO in a nano-scale molecular form to obtain a resin lens containing a seventh ITO layer;
s23: continuously adopting a vacuum coating process on the surface of the resin lens obtained in the step S22, repeating the process step of the step S211, and forming the resin lens containing the eighth silicon-aluminum composite oxide layer;
s3, preparing a waterproof layer: forming a waterproof layer on the surface of the resin lens obtained in the step S23: the surface of the lens obtained in the step S2 is continuously coated by a vacuum coating process, and the background vacuum degree is less than or equal to 3 multiplied by 10 -3 Pa, and the temperature in the coating chamber is 60 ℃, adopting high-energy electron beams to heat the material at the speed ofThe evaporated liquid contains C 12 F 27 And (3) depositing the waterproof material of N on the surface of the resin lens obtained in the step (S24) in a nano-scale molecular form to obtain the waterproof resin lens.
Comparative example 2
A low anti-blue light resin lens of preventing of clear background color, arrange in proper order and include: resin lens substrate 1 (MR-8-UV 405); adding a hard layer 2 (Z117)/2.6-3 μm; the low-reflection clear ground color blue light prevention layer 3 includes: siO 2 2 Layer 3-1/25.6nm, zrO 2 Layer 3-2/21.9nm, siO 2 Layer 3-3/41.55nm, zrO 2 Layer 3-4/49.18nm, siO 2 Layer 3-5/10.11nm, zrO 2 3-6/55.73nm of layer and 3-7/5nm of ITO layer; siO 2 2 Layer 3-8/89.26nm; waterproof layer 4 (adopting a material containing C) 12 F 27 Waterproof material of N/10 nm);
the preparation method comprises the following steps:
s1: manufacturing a hardening layer: immersing the resin lens substrate cleaned by ultrasonic waves into hardening liquid aqueous solution with the mass percentage of 27% and the model of Z117, immersing at the temperature of 15 ℃, and pulling out the solution at the speed of 2.0mm/s after immersing for 5 seconds; drying the substrate for 3 hours at the temperature of 80 ℃, taking out the substrate, and sending the substrate into a drying oven for drying and curing, wherein the curing temperature is 120 ℃, and the curing time is 150min, so that the resin lens containing the hardened layer is obtained;
s2, preparing a low-reflection clear background color blue-light-proof film layer: in a vacuum coating machine, a vacuum coating process is adopted, solid film layer materials are evaporated and then are subjected to gas phase transmission, a film is deposited on the surface of the resin lens obtained in the step S1, and a low-reflection clear ground color blue-light-proof film layer is formed, and the method specifically comprises the following steps:
s21: the method comprises the following steps:
s211: on the surface of the resin lens obtained in S1, the vacuum degree at the background is less than or equal to 3 multiplied by 10 -3 Pa, the temperature in the coating chamber is 60 ℃, and high-energy electron beams are adopted to heat SiO under the condition of no ion source auxiliary process 2 At a rate ofThe SiO after evaporation 2 Depositing in the form of nano-scale molecules to obtain SiO containing the first layer 2 A resin lens of the layer;
s212: the surface of the resin lens obtained in S211 has a vacuum degree of not more than 3X 10 at the background -3 Pa, the temperature in the coating chamber is 60 ℃, and ZrO is heated by high-energy electron beams under the condition of no ion source auxiliary process 2 At a rate ofThe evaporated ZrO 2 Deposited in the form of nanoscale molecules to obtain a layer containing ZrO 2 A resin lens of the layer;
s213: repeating the steps S211 and S212 twice, and respectively and alternately forming a third SiO layer 2 Fourth layer of ZrO 2 Layer, fifth layer of SiO 2 And a sixth layer of ZrO 2 Layers, i.e. formed comprising a third layer of SiO 2 Layer, fourth layer ZrO 2 Layer, fifth layer of SiO 2 And a sixth layer of ZrO 2 A resin lens of the layer;
s22: on the surface of the resin lens obtained in S21, the vacuum degree at the background is less than or equal to 3 x 10 -3 Pa, the temperature in the coating chamber is 60 ℃, and ITO is heated by high-energy electron beams at the speed of an ion source auxiliary processDepositing the evaporated ITO in a nano-scale molecular form to obtain a resin lens containing a seventh ITO layer;
s23: continuing to adopt the vacuum coating process on the surface of the resin lens obtained in the step S22, repeating the process step of the step S211, and forming the SiO-containing eighth layer 2 A resin lens of the layer;
s3, preparing a waterproof layer: forming a waterproof layer on the surface of the resin lens obtained in the step S23: continuously adopting a vacuum coating process on the surface of the lens obtained in the step S2, wherein the vacuum degree of the background is less than or equal to 3 multiplied by 10 -3 Pa and the temperature in the coating chamber is 60 ℃, and high-energy electron beams are adopted to heat the material so as toAt a rate ofAnd (4) depositing the evaporated waterproof material on the surface of the resin lens obtained in the step S23 in a nano-scale molecular form to obtain the waterproof lens.
Comparative example 3
A low-reflection clear background color blue-light-proof resin lens sequentially comprises: resin lens substrate 1 (MR-8-UV 405); adding hard layer 2 (Z117)/2.6-3 μm; the low-reflection-clear background film layer 3 includes: silicon-aluminum composite oxide layer 3-1 (wherein SiO is 2 And Al 2 O 3 The molar weight percentage is as follows: 92% SiO 2 :8%Al 2 O 3 (ii) a The material model is SA 56/24.1 nm, and the titanium-niobium composite oxide layer 3-2 (TiO in the material) is developed and produced by Suichi photoelectric technology corporation of Changzhou city 2 And Nb 2 O 5 The molar weight percentage is as follows: 80% of TiO 2 :20%Nb 2 O 5 (ii) a The material model is PTN 28)/18.05 nm, the silicon-aluminum composite oxide layer is 3-3/31.64nm (the material is the same as 3-1), the titanium-niobium composite oxide layer is 3-4 (the material is the same as 3-2)/48.9 nm, the silicon-aluminum composite oxide layer is 3-5/12.1nm (the material is the same as 3-1), the titanium-niobium composite oxide layer is 3-6 (the material is the same as 3-2)/34.95 nm and the ITO layer is 3-7/5nm; the silicon-aluminum composite oxide layer is 3-8/91.1nm (the material is the same as 3-1); waterproof layer 4 (adopting C) 12 F 27 Waterproof material of N/10 nm); i.e. a structure and a reflection spectrum close to those of example 1, but without the TaN absorber layer.
The preparation method is the same as that of comparative example 1
Comparative example 4
A low anti blue light resin lens is prevented to clear ground colour of weak absorption, arranges in proper order and includes: resin lens substrate 1 (MR-8-UV 405); adding a hard layer 2 (Z117)/2.6-3 μm; the weak absorption low reflection clear background film layer 3 includes: silicon-aluminum composite oxide layer 3-1 (wherein SiO 2 And Al 2 O 3 The molar weight percentage is as follows: 92% of SiO 2 :8%Al 2 O 3 (ii) a The material model is SA 56)/24 nm, and the titanium-niobium composite oxide layer 3-2 (TiO is selected from the group consisting of 2 And Nb 2 O 5 The molar weight percentage is as follows: 80% of TiO 2 :20%Nb 2 O 5 (ii) a The material model is PTN 28)/17.42 nm, the silicon-chromium absorption layer is 3-3 (SiO: cr molar ratio is 1, sintered by Kodak coating material Co., ltd. Of Danyang) is 1.2nm, and the silicon dioxide layer is 3-4/32.1nm (the molecular formula is SiO 2 99.99 percent of purity, sintered by Kodak coating material Co., ltd, danyang), 3-5 (same material as 3-2)/48.9 nm of titanium niobium composite oxide layer and 3-101.66/12.1nm of silicon aluminum composite oxide layer (same material as 3-1); 3-7 (the same material as 3-2)/34.95 nm of the titanium-niobium composite oxide layer; 3-8/5nm of ITO layer; the silicon-aluminum composite oxide layer is 3-9/91.1nm (the material is the same as 3-1); waterproof layer 4 (adopting C-containing) 12 F 27 Waterproof material of N/10 nm);
the preparation method was the same as in example 1 except that the SiO-Cr absorbing layer was formed on 3 to 3 layers. The preparation process of the SiO-Cr absorption layer comprises the following steps: a SiO-Cr layer is formed on the surface of the resin lens obtained in step S22. Firstly, vacuumizing until the background vacuum degree is less than or equal to 1.2 multiplied by 10 -4 Pa. Then depositing under the auxiliary process of an ion source Hall source, heating SiO-Cr by adopting high-energy electron beams at a speedAnd depositing the evaporated SiO-Cr in the form of nano-scale molecules to obtain the resin lens containing the SiO-Cr layer. Here the ion source auxiliary parameters are: anode voltage: 110V, anode current: 3A, ar flow 12sccm.
Comparative example 5
A weak absorption low-reflection clear background color blue light-proof resin lens sequentially comprises: resin lens substrate 1 (MR-8-UV 405); adding a hard layer 2 (Z117)/2.6-3 μm; the weak absorption low-reflection background color film layer 3 comprises: silicon-aluminum composite oxide layer 3-1 (wherein SiO 2 And Al 2 O 3 Molar weight percentage: 92% of SiO 2 :8%Al 2 O 3 (ii) a The material model is SA 56)/24 nm, and the titanium-niobium composite oxide layer 3-2 (wherein TiO) is developed and produced by Yoghu Chi photoelectric technology corporation 2 And Nb 2 O 5 The molar weight percentage is as follows: 80% of TiO 2 :20%Nb 2 O 5 (ii) a The material model is PTN 28)/17.42 nm, the tantalum nitride layer 3-3 (molecular formula TaN, purity above 99.9%, sintered by Changzhou Chou photoelectric technology Co., ltd.)/0.6 nm, and the silicon dioxide layer 3-4/32.1nm (molecular formula SiO 2 99.99 percent of purity, sintered by Kodak coating material Co., ltd, danyang), 3-5 (same material as 3-2)/48.9 nm of titanium niobium composite oxide layer and 3-101.66/12.1nm of silicon aluminum composite oxide layer (same material as 3-1); 3-7 (same as 3-2) of titanium-niobium composite oxide layer/34.95 nm; 3-8/5nm of an ITO layer; the silicon-aluminum composite oxide layer is 3-9/91.1nm (the material is the same as 3-1); waterproof layer 4 (adopting C) 12 F 27 Waterproof material of N/10 nm);
the preparation method is the same as that of the embodiment 1 except that 3-3 layers of tantalum nitride are adopted.
The preparation process of the tantalum nitride comprises the following steps: a tantalum nitride layer is formed on the surface of the resin lens obtained in step S22. Firstly, vacuumizing until the background vacuum degree is less than or equal to 8 multiplied by 10 -4 Pa. And bombarding the ion source for 60 seconds by using a Hall source of the ion source, wherein the bombardment parameters of the ion source are as follows: anode voltage: 110V, anode current: 3A, ar as an auxiliary gas and 10sccm as a flow rate. Then depositing under the auxiliary process of an ion source Hall source, heating TaN by adopting a high-energy electron beam at a certain speedAnd depositing the evaporated TaN in the form of nanoscale molecules to obtain the resin lens containing the TaN layer. The ion source auxiliary parameters here are: anode voltage: 110V, anode current: 3A, ar flow 12sccm, no nitrogen flow. And (4) obtaining a resin lens containing a TaN layer, and continuously bombarding the TaN surface for 30 seconds by using an ion source, wherein the ion source parameters are the same as the auxiliary parameters of the ion source of the layer.
Comparative example 6
A weak absorption low-reflection clear background color blue light-proof resin lens sequentially comprises: resin lens substrate 1 (MR-8-UV 405); adding a hard layer 2 (Z117)/2.6-3 μm; the weak absorption low reflection clear background film layer 3 includes: silicon-aluminum composite oxide layer 3-1 (wherein SiO 2 And Al 2 O 3 Molar weight percentage: 92% of SiO 2 :8%Al 2 O 3 (ii) a The material model is SA 56)/24 nm, and the titanium-niobium composite oxide layer 3-2 (wherein TiO) is developed and produced by Yoghu Chi photoelectric technology corporation 2 And Nb 2 O 5 The molar weight percentage is as follows: 80% of TiO 2 :20%Nb 2 O 5 (ii) a The material model is PTN 28)/17.42 nm, tantalum nitride layer 3-3 (molecular formula TaN, purity above 99.9%, sintered by Changzhou Huachi opto-electronic technology Co., ltd.)/0.6 nm, silicon dioxide layer 3-4/32.1nm (molecular formula SiO 2 99.99 percent of purity, sintered by Kodak coating material Co., ltd, danyang), 3-5 (same material as 3-2)/48.9 nm of titanium niobium composite oxide layer and 3-101.66/12.1nm of silicon aluminum composite oxide layer (same material as 3-1); 3-7 (the same material as 3-2)/34.95 nm of the titanium-niobium composite oxide layer; 3-8/5nm of ITO layer; the silicon-aluminum composite oxide layer is 3-9/91.1nm (the material is the same as 3-1); waterproof layer 4 (adopting C-containing) 12 F 27 Waterproof material of N/10 nm);
the preparation method is the same as that of the embodiment 1 except that 3-3 layers of tantalum nitride are adopted.
The preparation process of the tantalum nitride comprises the following steps: s23: a tantalum nitride layer is formed on the surface of the resin lens obtained in step S22. Firstly, vacuum pumping is carried out until the background vacuum degree is less than or equal to 8 multiplied by 10 -4 Pa. And (4) pre-bombarding the Hall source without the ion source. Directly depositing under the auxiliary process of an ion source Hall source, heating TaN by adopting high-energy electron beams at a certain speedAnd depositing the evaporated TaN in the form of nanoscale molecules to obtain the resin lens containing the TaN layer. Here the ion source auxiliary parameters are: anode voltage: 110V, anode current: 3A, ar flow rate of 10sccm, nitrogen flow rate: 5sccm. Obtaining a resin lens containing a TaN layer, continuously bombarding the TaN surface by an ion source for 30 seconds, wherein the ion source parameters are the same as the auxiliary parameters of the ion source of the layer
Comparative example 7
A weak absorption low-reflection clear background color blue light-proof resin lens sequentially comprises: resin lens substrate 1 (MR-8-UV 405); adding a hard layer 2 (Z117)/2.6-3 μm; weak suctionThe low-reflection clear bottom color collecting film layer 3 includes: silicon-aluminum composite oxide layer 3-1 (wherein SiO 2 And Al 2 O 3 Molar weight percentage: 92% of SiO 2 :8%Al 2 O 3 (ii) a The material model is SA 56)/24 nm, and the titanium-niobium composite oxide layer 3-2 (TiO is selected from the group consisting of 2 And Nb 2 O 5 The molar weight percentage is as follows: 80% of TiO 2 :20%Nb 2 O 5 (ii) a The material model is PTN 28)/17.42 nm, tantalum nitride layer 3-3 (molecular formula TaN, purity above 99.9%, sintered by Changzhou Huachi opto-electronic technology Co., ltd.)/0.6 nm, silicon dioxide layer 3-4/32.1nm (molecular formula SiO 2 99.99 percent of purity, sintered by Kodak coating material Co., ltd, danyang), 3-5 (same material as 3-2)/48.9 nm of titanium niobium composite oxide layer and 3-101.66/12.1nm of silicon aluminum composite oxide layer (same material as 3-1); 3-7 (the same material as 3-2)/34.95 nm of the titanium-niobium composite oxide layer; 3-8/5nm of ITO layer; the silicon-aluminum composite oxide layer is 3-9/91.1nm (the material is the same as 3-1); waterproof layer 4 (adopting C-containing) 12 F 27 Waterproof material of N/10 nm);
the preparation method is the same as that of the embodiment 1 except that 3-3 layers of tantalum nitride are adopted.
The preparation process of the tantalum nitride is S23: a tantalum nitride layer is formed on the surface of the resin lens obtained in step S22. Firstly, vacuumizing until the background vacuum degree is less than or equal to 3 multiplied by 10 -3 Pa (vacuum is not specifically controlled). And bombarding by using an ion source Hall source for 60 seconds, wherein the bombardment parameters of the ion source are as follows: anode voltage: 110V, anode current: 3A, ar as an auxiliary gas and 10sccm as a flow rate. Then depositing under the auxiliary process of an ion source Hall source, heating TaN by adopting a high-energy electron beam at a certain speedAnd depositing the evaporated TaN in the form of nanoscale molecules to obtain the resin lens containing the TaN layer. The ion source auxiliary parameters here are: anode voltage: 110V, anode current: 3A, ar flow rate of 10sccm, nitrogen flow rate: 5sccm. Obtaining a resin lens containing a TaN layer, continuously bombarding the TaN surface by an ion source for 30 seconds,the ion source parameters are the same as the auxiliary parameters of the ion source of the layer.
2. Examples of the experiments
1. The main examples and comparative material list are as follows, with a 9-layer antireflection film structure containing TaN or SiO-Cr, and without an 8-layer antireflection film system.
TABLE 1
Substrate | High refractive index materials | Low refractive index material | Absorbent material | Remarks for note | |
Example 1 | MR-8UV405 | 80%TiO 2 +20%Nb 2 O 5 | 92%SiO 2 +8%Al 2 O 3 | TaN | |
Example 2 | SK1.56UV405 | 80%TiO 2 +20%Nb 2 O 5 | 92%SiO 2 +8%Al 2 O 3 | TaN | |
Example 3 | MR-7UV405 | 80%TiO 2 +20%Nb 2 O 5 | 92%SiO 2 +8%Al 2 O 3 | TaN | |
Comparative example 1 | MR-8UV405 | 80%TiO 2 +20%Nb 2 O 5 | 92%SiO 2+ 8%Al 2 O 3 | Is free of | |
Comparative example 2 | MR-8UV405 | ZrO 2 | SiO 2 | Is composed of | |
Comparative example 3 | MR-8UV405 | 80%TiO 2 +20%Nb 2 O 5 | 92%SiO 2 +8%Al 2 O 3 | Is free of | |
Comparative example 4 | MR-8UV405 | 80%TiO 2 +20%Nb 2 O 5 | 92%SiO 2 +8%Al 2 O 3 | SiO-Cr | 1.2nm |
Comparative example 5 | MR-8UV405 | 80%TiO 2 +20%Nb 2 O 5 | 92%SiO 2 +8%Al 2 O 3 | TaN | Comparative TaN Process |
Comparative example 6 | MR-8UV405 | 80%TiO 2 +20%Nb 2 O 5 | 92%SiO 2 +8%Al 2 O 3 | TaN | Comparative TaN Process |
Comparative example 7 | MR-8UV405 | 80%TiO 2 +20%Nb 2 O 5 | 92%SiO 2 +8%Al 2 O 3 | TaN | Comparative TaN Process |
2. Measuring the optical effects of the lens such as peak reflectivity, average reflectivity, blue light prevention, yellow index and the like
(1) The average reflectance and peak reflectance, national standard for blue light prevention, and yellow index were measured in examples 1 to 3 and comparative examples 1 to 7
The average reflectance (average reflectance: means the visual average reflectance under illumination with C light (light source of color temperature 6774K defined in CIE), herein referred to as the reflectance of one side), and the visible peak reflectance (means the highest reflectance of one side at 400 to 700 nm) of the lenses prepared in examples 1 to 3 and comparative examples 1 to 7 were measured, and the measurement results are reported in table 2 below.
For the lenses prepared in examples 1 to 3 and comparative examples 1 to 7, the arithmetic average transmittance of the main harmful blue light (415 to 445 nm) is determined and the transmission yellow index (national standard requires that the average transmittance of the harmful blue light (415 to 445 nm) is less than or equal to 80%, the average transmittance is more than 80%, and the yellow index is less than 5.0) is determined according to the requirements of a blue light protective film in the new blue light prevention national standard QBT-38120-2019, and the measurement results are recorded in the following table 2.
TABLE 2
It can be seen that the film system with the low absorption layer satisfies the blue light prevention and has the antireflection effect, especially the peak reflectivity is far lower than that of the film system without the absorption layer.
The tantalum nitride absorption layer can obviously reduce the yellow index when the whole visible light transmittance is reduced.
(2) Comparing the influence of TaN process on the blue light prevention standard and the yellow index
The transmission and reflection of a single surface are tested, and the result converted into the absorption is as follows:
TABLE 3 influence of TaN Process on the blue index and yellow index prevention
The general process adopts SiO-Cr as an absorption layer, and can effectively meet the requirement of blue light prevention. But its yellowish green absorption is low, resulting in an increased yellow index. Most weakly absorbent materials are of this nature.
The preparation process of the TaN film layer is strictly controlled, and the preparation of the film layer is facilitated to achieve the expected technical effect.
(1) When the vacuum control of the TaN is not tight, the TaN has the tendency of oxidation, so that the absorption of a film layer is reduced, the absorption of yellow green light and infrared light is reduced more quickly, the yellow index cannot be reduced, and a lens cannot be seen clearly; (2) When TaN is not assisted by an ion source, the film is loose, the nitrogen content is reduced in the evaporation process, and the oxidation is supplemented when other layers are plated. So that the oxidation trend is generated, the absorption of the film layer is reduced, and the absorption of yellow green light and infrared light is reduced more quickly, so that the yellow index is relatively increased, and the lens cannot be seen through; (3) When the TaN ion source is not assisted by nitrogen, metallization (insufficient nitridation) of the film layer can be caused, and absorption is increased sharply. The absorption of blue light increases much faster than yellow-green light and infrared, resulting in a relative increase in the yellowness index, which is visibly yellow and grayish without clear lens. The TaN layer prepared by the specific process can effectively increase the near-infrared barrier absorption, control the blue light absorption and increase the yellow light absorption, thereby reducing the yellow index and enabling the lens to be clearer and more beautiful.
3. High temperature resistance, durability and high temperature adhesion test
(1) High temperature resistance test:
after the samples (examples 1 to 3 and comparative examples 1 to 7) were completed, the temperature resistance of the samples was tested after one week of storage. The test method of the high temperature resistance is as follows according to the 5.8 th item in the national resin lens temperature resistance standard (GB 10810.4-2012): pass the bake test at 55 ℃ for 30 minutes. The test was conducted in the same manner with each additional 5 c bake for 30 minutes until failure of the lens, such as cracking or orange peel, occurred and the maximum acceptable temperature was recorded, and the results are reported in table 4 below.
(2) Durability test:
the photovoltaic industry and the optical communication industry use high temperature and high humidity to evaluate the durability of products. Referring to Test methods of photovoltaic industry Test standards (GB/T18911-2002, item 10.13 of IEC61646: storing for 12 hours at 85 ℃ and 85% humidity, and checking whether the prepared lens has obvious failure phenomena such as film cracking or orange peel and the like; 3 resin lenses placed in different positions for each high temperature and humidity test. The test results of examples 1 to 6 and comparative examples 1 to 9 are reported in table 4 below.
(3) High-temperature adhesion experiment:
the adhesion test refers to the film adhesion test according to 5.9 th item in GB 10810.4-2012. The high-temperature film layer adhesion test refers to that the boiling condition of the Wanxin company is changed into 90 +/-2 ℃ for 60 minutes according to the 5.9 th item in the national standard GB 10810.4-2012, and other test methods are the same. Adhesion and high temperature adhesion test results: the grade A refers to the non-demoulding area or the demoulding area is less than 5 percent, the grade B refers to the demoulding area between 5 and 15 percent, and the grade C (unqualified) refers to the demoulding area which is obviously more than 15 percent. In order to verify the adhesive force distribution of the product, high-temperature adhesive force tests were performed from 5 different positions in the coating chamber. The test results of examples 1 to 3 and comparative examples 1 to 7 are reported in table 4 below.
TABLE 4
And (4) conclusion:
(1) Ultralow adverse effect: examples 1 to 3 all had a low visible light average reflectance of 0.2 to 0.28% and a low peak reflectance of 1.5 to 2.2%; while comparative example 1 does not achieve the above technical effect, i.e., the effect of ultra-low reflection.
(2) The embodiment 1-3 can effectively cut off harmful blue light and highly transmit beneficial blue light, and the yellow index is as low as below 3% to realize the lens clear effect while the national blue light prevention standard is met; the harmful blue light cutoff of the comparative example 3 does not meet the national blue light prevention standard, and the yellow indexes of other comparative examples are higher, so that the excellent clear visual effect of the lens cannot be achieved. Especially TaN absorbing materials under specific process conditions, have obvious help on blue light prevention standard and yellow index.
(3) Under the condition that other conditions are not changed, the high-refractive-index material of the lens adopts titanium-niobium composite oxide, and the high-temperature resistance, high-temperature adhesive force and durability of the titanium-niobium composite oxide are better than those of other conventional materials; the low refractive index material adopts silicon-aluminum composite oxide, and the high temperature resistance, high temperature adhesive force and durability of the silicon-aluminum composite oxide are better than those of other conventional materials; the film system prepared by the two materials with specific mixture ratio and a proper process thereof are adopted to ensure the high temperature resistance and the durability of the ultra-low reflection clear ground color blue-proof product.
Claims (19)
1. A weak absorption low reflection clear background color blue light prevention resin lens is characterized by comprising: the resin lens comprises a resin lens substrate, a hardening layer and a weak-absorption low-reflection clear background color blue-light-proof film layer; the resin lens substrate, the hardening layer and the weak absorption low-reflection clear background color blue-proof film layer are sequentially arranged, the hardening layer is located on the surface of the resin lens substrate, and the weak absorption low-reflection clear background color blue-proof film layer is located on the surface of the hardening layer.
2. The weak absorption low reflection clear base color blue-proof resin lens according to claim 1, further comprising a water-proof layer on the surface of the weak absorption low reflection clear base color blue-proof film layer.
3. The weak absorption low reflection blue-proof resin lens with low clear background color as claimed in claim 1, wherein the material of said hard coat layer is silicone; more preferably, the silicone contains at least Ti element.
4. The resin lens with weak absorption and low reflection and clear background color for preventing blue light of claim 1, wherein the film layer with weak absorption and low reflection and clear background color for preventing blue light comprises a silicon-aluminum composite oxide layer, a titanium-niobium composite oxide layer, a tantalum nitride (TaN) layer, and silicon dioxide (SiO) 2 ) A layer and a tin-doped indium oxide (i.e., ITO) layer; furthermore, the weak-absorption low-reflection bottom color blue-light-proof film layer comprises three silicon-aluminum composite oxide layers, three titanium-niobium composite oxide layers, a TaN layer and a SiO layer 2 A layer and an ITO layer.
5. The weak absorption low reflection bottom color blue light prevention resin lens according to claim 4, wherein the silicon-aluminum composite oxide layer is made of SiO 2 And Al 2 O 3 Composite material composition, and SiO therein 2 The molar fraction of the composite material is 70-95%; further preferred, wherein SiO 2 Representing 92% of the mole fraction of the composite.
6. The weak absorption low reflection blue-blocking resin lens as claimed in claim 4, wherein said titanium-niobium composite oxide layer is made of TiO 2 And Nb 2 O 5 Composite material composition of TiO 2 Accounting for 10 to 90 percent of the mole fraction of the composite material; preferably, wherein TiO 2 Accounting for 80 percent of the mole fraction of the composite material.
7. The weak absorption low reflection blue-blocking resin lens according to claim 4, wherein the TaN purity in said tantalum nitride layer is greater than 99.9%.
8. The weak absorption low reflection blue-blocking resin lens according to claim 1, wherein the thickness of said hard coating is 1 to 5 μm.
9. The resin lens with weak absorption and low reflection for preventing blue light with clear background color as claimed in claim 1, wherein the thickness of the film layer with weak absorption and low reflection for preventing blue light with clear background color is 200-600 nm.
10. The weak absorption low reflection blue-proof resin lens with clear background color as claimed in claim 1, wherein the thickness of the water-proof layer is 4-20 nm.
11. The weak absorption low reflection bottom-color blue-light preventing resin lens according to claim 1, wherein the UV cut-off wavelength of the resin lens substrate is 405 to 407nm.
12. The weak absorption low reflectance bottom-color blue-light preventing resin lens according to any one of claims 1 to 11, wherein the average reflectance of the lens is 0.3% or less.
13. The weak absorption low reflection blue-proof resin lens with clear background color as claimed in any one of claims 1 to 11, wherein the lens has a peak reflectance of 2.2% or less at 400 to 700nm in the visible light band.
14. The weak absorption low reflection blue-proof resin lens with low background color as claimed in any one of claims 1 to 11, wherein the value of reflected light color coordinate H of the weak absorption low reflection blue-proof resin lens with low background color is 270 to 295, and the value of C is 12 to 25.
15. The weak absorption low reverse clear background blue-light prevention resin lens according to any one of claims 1 to 11, wherein the yellow index of the reverse clear background blue-light prevention resin lens is less than or equal to 3.5%.
16. The method for preparing the weak absorption low-reflection clear background color blue-proof resin lens according to any one of claims 1 to 11, which is characterized by comprising the following steps:
s1, preparing a hardening layer: forming a hardening layer on the surface of the resin lens substrate to obtain a resin lens containing the hardening layer;
s2, preparing a weak-absorption low-reflection clear background color blue-light-proof film layer: forming the weak-absorption low-reflection clear background color blue-light-proof film layer on the surface of the resin lens obtained in the step S1, namely obtaining the resin lens containing the weak-absorption low-reflection clear background color blue-light-proof film layer, and the method specifically comprises the following steps:
s21: respectively forming a resin lens containing a first silicon-aluminum composite oxide layer and a second titanium-niobium composite oxide layer on the surface of the resin lens obtained in the step S1;
s22: forming a third layer of tantalum nitride layer-containing resin lens on the surface of the resin lens obtained in step S21;
s23: forming a fourth SiO-containing layer on the surface of the resin lens obtained in step S22 2 A resin lens of the layer;
s24: forming a resin lens on the surface of the resin lens obtained in step S23, wherein a fifth titanium-niobium composite oxide layer, a sixth silicon-aluminum composite oxide layer and a seventh titanium-niobium composite oxide layer are formed on the surface of the resin lens;
s25: forming a resin lens comprising an eighth ITO-containing layer formed on the surface of the resin lens obtained in step S24;
s26: a ninth resin lens containing a silicon-aluminum composite oxide layer is further formed on the surface of the resin lens obtained in the step S25;
s3, preparing a waterproof layer: and forming a waterproof layer on the surface of the resin lens obtained in the step S2.
17. The method for preparing the weak absorption low reflection bottom color blue-proof resin lens according to claim 16, wherein the step of S1 preparing the hardening layer comprises: immersing a resin lens substrate cleaned by ultrasonic waves into a hardening liquid aqueous solution with the mass percentage content of 25-30%, wherein the immersion temperature is 10-20 ℃, after immersing for 4-8 seconds, pulling out the solution at the speed of 1.0-3.0 mm/s, drying the substrate at 70-90 ℃ for 2-5 hours, taking out the substrate, and sending the substrate into a drying oven for drying and curing, wherein the curing temperature is 100-150 ℃, and the curing time is 120-180 min, thus obtaining the resin lens containing the hardening layer.
18. The method for preparing the weak-absorption low-reflection bottom-color blue-light-proof resin lens as claimed in claim 16, wherein a vacuum coating process is adopted in a vacuum coating machine, a silicon-aluminum composite oxide layer, a titanium-niobium composite oxide, tantalum nitride, silicon dioxide and an ITO solid film layer material are evaporated and then subjected to vapor phase transmission, and a thin film is deposited on the surface of the resin lens obtained in the step S1, and the method specifically comprises the following steps:
s21: forming a first silicon-aluminum composite oxide layer on the surface of the resin lens obtained in the step S1, wherein the background vacuum degree is less than or equal to 3 multiplied by 10 -3 Pa, the temperature in the coating chamber is 50-70 ℃, and the high-energy electron beam is adopted to heat the silicon-aluminum composite oxide under the condition of the ion source auxiliary process, wherein the speed isDepositing the evaporated silicon-aluminum composite oxide in a nanoscale molecular form to obtain a resin lens containing a first silicon-aluminum composite oxide layer;
s22: forming a titanium-niobium composite oxide layer on the surface of the resin lens obtained in step S21, and forming a titanium-niobium composite oxide layer on the surface of the resin lens obtained in step S21 under a background vacuum degree of not more than 3 × 10 -3 Pa, the temperature in the coating chamber is 50-70 ℃, and the titanium-niobium composite oxide is heated by high-energy electron beams at the speed of 50-70 ℃ under the condition of an ion source auxiliary processDepositing the evaporated titanium-niobium composite oxide in a nanoscale molecular form to obtain a resin lens containing a second titanium-niobium composite oxide layer;
s23: forming a tantalum nitride layer on the surface of the resin lens obtained in step S22, specifically including:
s231: firstly, vacuumizing until the background vacuum degree is less than or equal to 8 multiplied by 10 -4 Pa, bombarding by using an ion source Hall source for 50-80 seconds, wherein the bombardment parameters of the ion source are as follows: anode voltage: 90-140V, anode current: 2.5 to 5A, ar as auxiliary gas and 5 to 20sccm of flow rate; preferably, the bombardment time of the Hall source of the ion source is 60 seconds, and the bombardment parameters of the ion source are as follows:anode voltage: 110V, anode current: 3A, ar is used as auxiliary gas, and the flow rate is 10sccm;
s232: deposition with ion source assisted process, heating TaN with high energy electron beam at a rateDepositing the evaporated TaN in a nanoscale molecular form, wherein the auxiliary parameters of the ion source are as follows: anode voltage: 90-140V, anode current: 2.5 to 5A, and Ar and N as auxiliary gases 2 Ar flow rate is 5-15 sccm and N 2 The flow rate is as follows: 3-15 sccm; preferably, with the aid of an ion source, at a rateDepositing the evaporated TaN in a nanoscale molecular form, wherein the auxiliary parameters of the ion source are as follows: anode voltage: 110V, anode current: 3A, auxiliary gas Ar and N 2 Ar flow rate is 10sccm and N 2 The flow rate is as follows: 5sccm;
s233: continuously bombarding the surface of the TaN film layer for 20-40 seconds by using an ion source Hall source, wherein the bombarding parameters are as follows: anode voltage: 90-140V, anode current: 2.5 to 5A, and Ar and N as auxiliary gases 2 Ar flow rate is 5-15 sccm, N 2 The flow rate is as follows: 3-15 sccm; preferably, the bombardment time is 30 seconds, and the bombardment parameters are as follows: anode voltage: 110V, anode current: 3A, auxiliary gas Ar and N 2 Ar flow rate is 10sccm and N 2 The flow rate is as follows: 5sccm;
s24: on the surface of the resin lens obtained in S23, the vacuum degree at the background is less than or equal to 3 multiplied by 10 -3 Pa, the temperature in the coating chamber is 50-70 ℃, and high-energy electron beams are adopted to heat SiO under the condition of ion source auxiliary process 2 At a rate ofThe evaporated SiO 2 Depositing in the form of nano-scale molecules to obtain SiO-containing 2 A resin lens of the layer; the ion source auxiliary parameters are: anode voltage: 90-140V, anode current: 2.5 to 5A, ar as auxiliary gas and flowThe amount is 5-20 sccm; preferably, the rate is determined with the aid of an ion sourceTo evaporate SiO 2 Depositing in a nanoscale molecular form, wherein the ion source bombardment auxiliary parameters are as follows: anode voltage: 110V, anode current: 3A, ar is used as auxiliary gas, and the flow rate is 10sccm;
s25: repeating the step S22, and forming a titanium-niobium composite oxide layer on the surface of the resin lens obtained in the step S24;
s26: repeating the step S21, and forming a silicon-aluminum composite oxide layer on the surface of the resin lens obtained in the step S25;
s27: repeating the step S22, and forming a titanium-niobium composite oxide layer on the surface of the resin lens obtained in the step S26;
s28: on the surface of the resin lens obtained in S27, the vacuum degree at the background is less than or equal to 3 x 10 -3 Pa, the temperature in the coating chamber is 50-70 ℃, and ITO is heated by high-energy electron beams at the speed of 50-70 ℃ under the condition of an ion source auxiliary processDepositing the evaporated ITO in a nanoscale molecular form to obtain a resin lens containing an ITO layer;
s29: and (5) continuously adopting a vacuum coating process on the surface of the resin lens obtained in the step (S28), repeating the process step (S21), and forming a layer of resin lens containing the silicon-aluminum composite oxide layer.
19. The method for preparing the weak absorption low reflection bottom color blue-light prevention resin lens according to claim 16, wherein the step S3 of forming a waterproof layer on the surface of the resin lens obtained in the step S2 comprises the following steps: the surface of the lens obtained in the step S29 is continuously coated by a vacuum coating process, and the vacuum degree of the background is less than or equal to 3 multiplied by 10 -3 Pa, and the temperature in the coating chamber is 50-70 ℃, adopting a high-energy electron beam heating material at the speed ofAnd depositing the evaporated fluorine-containing waterproof material in a nano-scale molecular form to obtain the resin lens containing the waterproof layer.
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WO2024093105A1 (en) * | 2022-10-31 | 2024-05-10 | 江苏万新光学有限公司 | Weak-absorption low-reflectance clear anti-blue-light resin lens and preparation method therefor |
WO2024093106A1 (en) * | 2022-10-31 | 2024-05-10 | 江苏万新光学有限公司 | Clear-base-color, blue-light-blocking and anti-infrared resin lens and preparation method therefor |
WO2024138918A1 (en) * | 2022-12-30 | 2024-07-04 | 江苏万新光学有限公司 | Weak-absorption, low-reflection, clear-base-color and anti-blue-light resin lens and preparation method therefor |
Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07151903A (en) * | 1993-08-31 | 1995-06-16 | Sumitomo Osaka Cement Co Ltd | Reflection preventing film |
US20130027766A1 (en) * | 2011-07-28 | 2013-01-31 | Kiyoshi Itoh | Infrared reflection films |
CN106575005A (en) * | 2014-08-05 | 2017-04-19 | 日东电工株式会社 | Infrared-reflecting film |
CN110174717A (en) * | 2019-05-06 | 2019-08-27 | 厦门大学 | A kind of blue light protection optical thin film and its manufacturing method |
CN110187425A (en) * | 2019-05-06 | 2019-08-30 | 厦门大学 | Material with anti-blue light function and the protective film using the material |
CN111856627A (en) * | 2020-07-16 | 2020-10-30 | 河南镀邦光电股份有限公司 | Optical functional film with function of selectively modulating intensity of blue light |
CN113009713A (en) * | 2021-04-07 | 2021-06-22 | 江苏万新光学有限公司 | Ultralow-reflection clear-background-color blue-light-proof resin lens and preparation method thereof |
CN114879380A (en) * | 2022-04-02 | 2022-08-09 | 江苏万新光学有限公司 | Light orange super-clear background-color blue-light-proof resin lens and preparation method thereof |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2022076815A (en) * | 2020-11-10 | 2022-05-20 | 義行 波田野 | Spectacle lens processing device |
CN112415639A (en) * | 2020-11-27 | 2021-02-26 | 江苏万新光学有限公司 | Low-reflection infrared-proof high-temperature-resistant resin lens and preparation method thereof |
CN115598860A (en) * | 2022-10-31 | 2023-01-13 | 江苏万新光学有限公司(Cn) | Weak-absorption low-reflection clear-background-color blue-light-proof resin lens and preparation method thereof |
CN115616797A (en) * | 2022-10-31 | 2023-01-17 | 江苏万新光学有限公司 | Clear background color, blue light and infrared ray preventing resin lens and preparation method thereof |
-
2022
- 2022-10-31 CN CN202211344680.XA patent/CN115598860A/en active Pending
-
2023
- 2023-03-28 WO PCT/CN2023/084277 patent/WO2024093105A1/en unknown
Patent Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
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