CN115430629B - Photomask cleaning and detecting device and method - Google Patents
Photomask cleaning and detecting device and method Download PDFInfo
- Publication number
- CN115430629B CN115430629B CN202210954197.7A CN202210954197A CN115430629B CN 115430629 B CN115430629 B CN 115430629B CN 202210954197 A CN202210954197 A CN 202210954197A CN 115430629 B CN115430629 B CN 115430629B
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- photomask
- connecting rod
- cleaning
- thimble
- liquid medicine
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- 238000004140 cleaning Methods 0.000 title claims abstract description 121
- 238000000034 method Methods 0.000 title claims abstract description 33
- 230000005540 biological transmission Effects 0.000 claims abstract description 26
- 239000007788 liquid Substances 0.000 claims description 68
- 230000001680 brushing effect Effects 0.000 claims description 51
- 230000033001 locomotion Effects 0.000 claims description 50
- 239000003814 drug Substances 0.000 claims description 43
- 238000011010 flushing procedure Methods 0.000 claims description 34
- 238000002791 soaking Methods 0.000 claims description 29
- 238000007689 inspection Methods 0.000 claims description 15
- IJGRMHOSHXDMSA-UHFFFAOYSA-N nitrogen Substances N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 12
- 238000001035 drying Methods 0.000 claims description 11
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 11
- 238000002156 mixing Methods 0.000 claims description 9
- 239000007921 spray Substances 0.000 claims description 9
- 239000007789 gas Substances 0.000 claims description 7
- 229910052757 nitrogen Inorganic materials 0.000 claims description 6
- 239000013078 crystal Substances 0.000 claims description 5
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 claims description 2
- 230000003139 buffering effect Effects 0.000 claims 1
- 230000008569 process Effects 0.000 abstract description 21
- 230000002829 reductive effect Effects 0.000 abstract description 7
- 239000004065 semiconductor Substances 0.000 abstract description 3
- 230000000670 limiting effect Effects 0.000 description 19
- 230000007246 mechanism Effects 0.000 description 18
- 238000001514 detection method Methods 0.000 description 17
- 239000000126 substance Substances 0.000 description 11
- 238000010926 purge Methods 0.000 description 8
- 238000005406 washing Methods 0.000 description 7
- 239000000243 solution Substances 0.000 description 6
- 230000000694 effects Effects 0.000 description 5
- 238000001179 sorption measurement Methods 0.000 description 5
- 230000009471 action Effects 0.000 description 4
- 238000005286 illumination Methods 0.000 description 4
- 238000012360 testing method Methods 0.000 description 4
- 238000007664 blowing Methods 0.000 description 3
- 230000003749 cleanliness Effects 0.000 description 3
- 229940079593 drug Drugs 0.000 description 3
- 239000000835 fiber Substances 0.000 description 3
- 239000002657 fibrous material Substances 0.000 description 3
- 238000003825 pressing Methods 0.000 description 3
- 230000000452 restraining effect Effects 0.000 description 3
- 238000003860 storage Methods 0.000 description 3
- 229910001873 dinitrogen Inorganic materials 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 238000012546 transfer Methods 0.000 description 2
- 238000013459 approach Methods 0.000 description 1
- 230000000712 assembly Effects 0.000 description 1
- 238000000429 assembly Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000000861 blow drying Methods 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 150000004696 coordination complex Chemical class 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 239000008155 medical solution Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 239000013589 supplement Substances 0.000 description 1
Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B1/00—Cleaning by methods involving the use of tools
- B08B1/10—Cleaning by methods involving the use of tools characterised by the type of cleaning tool
- B08B1/12—Brushes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B1/00—Cleaning by methods involving the use of tools
- B08B1/30—Cleaning by methods involving the use of tools by movement of cleaning members over a surface
- B08B1/32—Cleaning by methods involving the use of tools by movement of cleaning members over a surface using rotary cleaning members
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B13/00—Accessories or details of general applicability for machines or apparatus for cleaning
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/02—Cleaning by the force of jets or sprays
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
- B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F26—DRYING
- F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
- F26B21/00—Arrangements or duct systems, e.g. in combination with pallet boxes, for supplying and controlling air or gases for drying solid materials or objects
- F26B21/004—Nozzle assemblies; Air knives; Air distributors; Blow boxes
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/94—Investigating contamination, e.g. dust
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- General Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Abstract
The application relates to the field of auxiliary processes of semiconductor devices, and discloses a photomask cleaning and detecting device and method, wherein the photomask cleaning and detecting device comprises the following steps: the shell and the cleaning part, the cleaning part comprises a fixture head, the fixture head comprises a plurality of thimble connected with the photomask in a clamping way, a buffer structure is arranged between the thimble and the photomask, the fixture head further comprises a moving structure, the moving structure comprises a first connecting rod, a second connecting rod and a third connecting rod, the first connecting rod, the second connecting rod and the third connecting rod are respectively connected with the thimble, and gear transmission is carried out among the first connecting rod, the second connecting rod and the third connecting rod. The application is provided with the plurality of thimbles which can move in a plurality of directions, so that the thimbles are completely clamped to the photomask, the probability of damaging patterns on the photomask caused by relative sliding between the thimbles and the photomask is reduced, the thimbles are connected with the photomask through the buffer structure, and the friction sliding loss of the thimbles on the surface of the photomask is reduced.
Description
Technical Field
The invention relates to the technical field of auxiliary processes of semiconductor devices, in particular to a photomask cleaning and detecting device and method.
Background
The photomask (photomask) is used as an important element in exposure equipment, the storage and transportation environment is required to have necessary cleanliness, safety and stability, various specifications of the photomask are required to be used in the manufacturing process of semiconductor chips and panels, special tools are required to be used in the storage process of the photomask so as to ensure that the photomask cannot be polluted or damaged, and the photomask with dust or organic matters can be used in an exposure machine after being cleaned and inspected.
The existing equipment performs cleaning or checking functions on a photomask, and does not combine the two to be used cooperatively, for example, a photomask cleaning device and a cleaning method thereof proposed by publication No. CN114011791A comprise a machine body, a storage table arranged in the machine body, a liquor soaking tank and a brushing tank, wherein a first grabbing module is fixedly arranged above the liquor soaking tank, a second grabbing module is fixedly arranged above the brushing tank, a first brushing assembly is arranged at a position corresponding to the liquor soaking tank, and a second brushing assembly is fixedly arranged at a position corresponding to the brushing tank. The invention adopts a multi-groove automatic cleaning mode, so that the photomask can be cleaned for a plurality of times, but the cleaning result can be obtained after the cleaning is finished and the detection is carried out. The photomask is conveyed to a detection table to be detected after the cleaning is finished, and the photomask is put into a production process of the next link after the detection is qualified; the unqualified photomask needs to be cleaned again after being transferred, and the process of conveying the photomask to the detection table increases the probability of pollution and loss of the photomask.
Moreover, when the photomask is cleaned, due to the fact that the photomask is large in size relative to the thimble used for clamping the photomask, the photomask cannot be relatively static with the thimble in the moving process, relative sliding can occur between the photomask and the thimble, particularly, in the rotating cleaning process of the photomask, the relative sliding distance of the thimble can be increased, scratches are caused, patterns on the photomask are damaged, the photomask cannot be recovered, and the thimble can be pierced and the surface of the photomask is damaged in an excessive connection mode of the thimble and the photomask.
Disclosure of Invention
Accordingly, the present invention is directed to a device and a method for inspecting a photomask, which solve the above-mentioned problem that the thimble is easy to wear the pattern on the photomask.
The application solves the technical problems by the following technical means: comprising the following steps: the shell and the cleaning part of setting in the shell, cleaning part include the anchor clamps head, and the anchor clamps head includes a plurality of thimble of being connected with the photomask block, and the laminating department of thimble and photomask is provided with buffer structure, and the anchor clamps head still includes the motion structure, and the motion structure is including the head rod, second connecting rod and the third connecting rod that are connected with the thimble respectively, connects through the gear structure transmission between head rod, second connecting rod and the third connecting rod. According to the application, the existing thimble for driving the photomask to relatively displace is improved, firstly, the three thimble for fixing the top angle of the photomask can respectively move in the directions X, Y, Z, so that the thimble can be completely clamped to the photomask, no gap exists between the thimble and the photomask, the damage to patterns on the photomask caused by the relative sliding between the thimble and the photomask is reduced, and further, the connection part between the thimble and the photomask is connected through the buffer structure, so that the friction sliding loss of the thimble on the surface of the photomask and the excessive connection between the thimble and the photomask are reduced.
Further, the cleaning part also comprises a liquid supply assembly, wherein the liquid supply assembly comprises a liquid medicine tank, a liquid medicine mixing cavity, a liquid medicine circulation cavity and a connecting pipeline, and the liquid medicine tank, the liquid medicine mixing cavity and the liquid medicine circulation cavity are communicated through the connecting pipeline in sequence. According to the application, a plurality of liquid medicine tanks storing different types of liquid medicine are used for providing different liquid medicine types needed by cleaning links, and further, the liquid medicine is fully mixed in the mixing cavity, and then the liquid medicine is subjected to temperature and concentration adjustment through the liquid medicine circulation cavity, so that the surface of the photomask is cleaned, the automation degree is high, and the utilization rate of the liquid medicine is reduced.
Further, still be provided with the transport portion in the casing, the transport portion includes the anchor clamps unit, is provided with clean thimble and pollution thimble on the anchor clamps unit, is provided with corresponding clean thimble safety cover and pollution thimble safety cover on clean thimble and the pollution thimble. The application uses two sets of ejector pins for clamping to differentially clamp the clean photomask and the unclean photomask, thereby avoiding secondary pollution of the clamp unit in the clamping process of the qualified photomask.
Further, pollute thimble safety cover and include the cover body and connecting rod, the cover body cover is established on polluting the thimble, cover body and connecting rod fixed connection. Through the mode that sets up the safety cover on polluting thimble and clean thimble respectively, can avoid clean thimble to receive the pollution from light cover and device in the light cover in-process of transporting the light cover to guarantee the cleanliness factor of the clean thimble that uses when pressing from both sides clean light cover, simultaneously, the purpose that protects the pollution thimble is aggravated and is polluting the light cover that is in clean in-process to the contaminated degree of avoiding polluting the thimble in the transportation.
Further, the cleaning part comprises a flushing brush, and the flushing brush comprises a brushing structure and a roller cleaning structure which are respectively attached to the front surface and the back surface of the photomask in use, and a lifting driving structure for driving the brushing structure and the roller cleaning structure to move relative to the photomask. According to the application, the cleaning components capable of performing friction cleaning on the surface of the photomask are arranged, so that the reciprocating cleaning of the surface of the photomask is realized, and the cleaning effect is improved.
Further, a detection part on the moving route of the transport part is also arranged in the shell. The device can immediately check the surface condition of the cleaned photomask by combining the detection part and the cleaning part in one device, optimizes the phenomenon that the photomask is polluted in the process of being conveyed to the detection device after being cleaned, and further can immediately clean the uncleaned photomask again until the photomask is cleaned to be qualified and output.
Further, the cleaning part further comprises a shaking component, and the shaking component comprises a crystal oscillator. The use of the crystal vibration as the shaking component can remove the pollution on the surface of the photomask in an ultrasonic flushing mode in the soaking and cleaning process, and the cleaning efficiency is improved.
A photomask cleaning detection method using a photomask cleaning device includes the following steps: s1: soaking and brushing the photomask in the liquid medicine; s2: checking the surface brushing condition of the photomask, returning to the step S1 if the checking result is that the brushing is not completed, and continuing the next step if the checking result is that the brushing is completed; s3: using pure water to spray and brush the photomask; s4: checking the surface flushing condition of the photomask, returning to the step S3 if the checking result is that flushing is not completed, and continuing the next step if the checking result is that flushing is completed; s5: and (5) rapidly rotating the photomask, drying the moisture on the photomask, and finishing cleaning. By continuously detecting the cleaning condition of the photomask in the photomask cleaning process, the cleaning efficiency of the photomask is improved, the phenomenon that the whole cleaning link of the photomask is required to be carried out again when the cleaning of a certain cleaning link is unqualified is optimized, and the cleaning efficiency of the photomask is improved.
Further, the gas used in the step of drying the moisture on the photomask is nitrogen. The gas used for drying the photomask can be a mixed gas of nitrogen and IPA vapor, and the photomask in high-speed rotation can be dried without causing secondary pollution to the photomask.
The invention has the beneficial effects that:
1. the application improves the existing thimble for driving the photomask to relatively displace, firstly, the thimble can move in three directions of XYZ, so that the thimble can be completely clamped to the photomask, no gap exists between the thimble and the photomask, thereby reducing the damage to patterns on the photomask caused by the relative sliding between the thimble and the photomask, and further, the connection part between the thimble and the photomask is connected through the buffer structure, thereby reducing the friction sliding loss of the thimble on the surface of the photomask.
2. The application uses two sets of ejector pins for clamping to differentially clamp the clean photomask and the unclean photomask, avoids the secondary pollution of the clamp unit in the clamping process of the clean qualified photomask, and can avoid the pollution of the clean ejector pin from the photomask and the liquid medicine in the device in the transferring process of the photomask by arranging the protective covers on the polluted ejector pin and the clean ejector pin respectively, so as to ensure the cleanliness of the clean ejector pin used when clamping the clean photomask, and simultaneously, the aim of protecting the polluted ejector pin is to avoid the aggravation of the polluted degree of the polluted ejector pin in the transportation process and the pollution to the photomask in the cleaning process.
3. The device can immediately check the surface condition of the cleaned photomask by combining the detection part and the cleaning part in one device, optimizes the phenomenon that the photomask is polluted in the process of being conveyed to the detection device after being cleaned, and further can immediately clean the uncleaned photomask again until the photomask is cleaned to be qualified and output.
Drawings
FIG. 1 is a schematic diagram of a mask cleaning and inspection apparatus according to an embodiment of the present invention;
FIG. 2 is a schematic view of a cleaning part of the mask cleaning and detecting device according to the present invention;
FIG. 3 is a schematic view of a brush structure of a mask cleaning and detecting device according to the present invention;
FIG. 4 is a schematic view of a fixture head of the mask cleaning and inspection device according to the present invention;
FIG. 5 is a flowchart of a mask cleaning and inspection process of the mask cleaning and inspection apparatus of the present invention;
FIG. 6 is a schematic view of a fixture unit of the mask cleaning and inspection device according to the present invention;
FIG. 7 is a schematic perspective view of a fixture head of the mask cleaning and inspection device of the present invention;
Wherein,
1: A placement unit; 11: limiting ejector pins; 12: supporting the thimble; 13: a size switching component; 14: a limit driving assembly; 2: a cleaning part; 200: a tank body; 21: soaking and brushing; 22: washing and brushing; 221: a brushing structure; 2211: brushing the roller; 2212: a roller support bar; 2213: a rotation driving part; 2214: a transmission member; 22141: a first bevel gear; 22142: a second bevel gear; 22143: a third bevel gear; 22144: a fourth bevel gear; 22145: a gear drive belt; 2215: clamping the moving part; 22151: clamping the driving group; 22152: a drive connection rod; 22153: a gear drive set; 2216: a support rod restriction member; 22161: clamping limit buckles; 22162: idle limit buckles; 22163: position switching driving; 22164: a connecting plate; 222: a roller cleaning structure; 2221: cleaning the nozzle; 2222: a connection structure; 2223: an adsorption wiping structure; 2224: a motion driving structure; 223: a connecting rod; 224: a housing; 225: a lifting driving structure; 23: a clamp unit; 231: a clamp head; 2311: a thimble; 2312: a motion structure; 23121: a first connecting rod; 23122: horizontally placing a gear set; 23123: a second connecting rod; 23124: a gear set is vertically arranged; 23125: a third connecting rod; 2313: a buffer structure; 2314: clamping driving; 24: a driving unit; 25: a dithering assembly; 26: a purge assembly; 27: a liquid supply assembly; 271: a liquid medicine tank; 272: a liquid medicine mixing cavity; 273: a liquid medicine circulation cavity; 274: a connecting pipeline; 28: a liquid level detection assembly; 29: flushing the spray assembly; 3: a detection unit; 31: a reflective illumination system; 32: an image sensor; 33:45 degree semi-transparent semi-reflective beam splitting plate; 34: a condensing lens; 35: a mask moving platform; 36: a transmissive illumination system; 37: a transmission prism; 38: a reflection prism; 39: a light source; 4: a transport section; 41: driving in horizontal movement; 42: driving in a vertical motion; 43: a connection support; 44: a connecting piece; 45: a clamp unit; 451: pollution thimble protective cover; 4511: a cover body; 4512: a connecting rod; 4513: a rotary motion structure; 4514: a lifting movement mechanism; 452: cleaning the thimble protection cover; 453: cleaning the thimble; 454: pollution thimble; 455: a clean thimble driving structure; 456: a contaminated thimble driving structure; 457: a housing; 5: a housing.
Detailed Description
The following description of the embodiments of the present invention will be made clearly and completely with reference to the accompanying drawings, in which it is apparent that the embodiments described are only some embodiments of the present invention, but not all embodiments. All other embodiments, which can be made by those skilled in the art based on the embodiments of the invention without making any inventive effort, are intended to be within the scope of the invention.
In the present invention, the first direction refers to the OX direction, the second direction refers to the OY direction, and the third direction refers to the OZ direction.
Example 1,
As shown in fig. 1, the mask cleaning and detecting device of the present invention includes a placing section 1, a cleaning section 2, a detecting section 3, a transporting section 4, and a housing 5. The placing section 1, the cleaning section 2, the detecting section 3, and the transporting section 4 are all provided in the housing 5. The placing part 1 is used for placing the photomask so as to facilitate the transportation of the photomask; the cleaning part 2 is used for soaking and cleaning the photomask; the detection part 3 is designed to adopt a structure for detecting the surface dirt condition by transmission and reflection (STARLIGHT); the transporting part 4 is used for transporting and transferring the photomask back and forth among the cleaning part 2, the detecting part 3 and the placing part 1.
The placement part 1 comprises a limit thimble 11, a support thimble 12, a size switching assembly 13 and a limit driving assembly 14. By providing the portion in contact with the mask as the ejector pin, the contact area between the placement portion 1 and the mask can be reduced, and thus the damage of the placement portion 1 to the pattern on the mask can be reduced. The upper part of the limiting thimble 11 is cut to form a platform capable of placing the photomask, and the photomask can be arranged among the limiting thimbles 11 by arranging the edges of the photomask clamped by the limiting thimbles 11. The photomask is arranged on a platform among the limiting ejector pins 11. Preferably, three limiting pins 11 are provided, one on each of the three sides when the mask is attached. The fourth side of the mask is supported by support pins 12. The structure of the supporting thimble 12 is the same as that of the limiting thimble 11, except that the supporting thimble 12 can be lifted up or lowered down at the limiting driving assembly 14. When the photomask is limited, the supporting thimble 12 is controlled to be in a descending state, then the three sides of the photomask are clamped through the limiting thimble 11, and the limiting driving assembly 14 is used for controlling the supporting thimble 12 to lift up to clamp and support the fourth side of the photomask. The positions of the limiting thimble 11 and the supporting thimble 12 can be set according to the shape of a supporting object, in the application, the photomask is rectangular, and the limiting thimble 11 and the supporting thimble 12 are respectively connected to four edges of the photomask. Preferably, the number of the limit thimble 11 and the support thimble 12 is 8. The limiting driving assembly 14 may be a hydraulic lifting device or the like, and is configured to control lifting and lowering of the supporting thimble 12, so that the lifting device in the prior art has a great number of applications, and will not be described in detail herein. The size switching assembly 13 is configured to adjust a distance between the limiting thimble 11 and the supporting thimble 12, so as to change an area of an area enclosed between the limiting thimble 11 and the supporting thimble 12 to adapt to a photomask or other supporting objects with different sizes, and the related art is also mature, and will not be described herein.
The cleaning part 2 includes a soaking brush 21, a washing brush 22, a jig unit 23, and a driving assembly 24, which are disposed in the tub 200. The clip unit 23 has the same principle of action as the spacing thimble 11 and the supporting thimble 12 in the placement unit 1, and is used for fixing the mask by the clip head 231, which will be described in detail later. The driving assembly 24 is used for controlling the rotation and movement of the clamp unit 23 in the tank 200, and in particular, the driving assembly 24 may be a transmission structure such as a mechanical arm. The drive assembly 24 may also control the raising and lowering of the clamp head 231. The soaking brush 21 and the washing brush 22 are respectively provided at different positions on the inner wall inside the tank 200. The position of the soaking brush 21 is a soaking position, and the corresponding position of the flushing brush 22 is a flushing position. The driving assembly 24 can set the photomask on the fixture unit 23 to the soaking position or the flushing position in a mode that the surface of the photomask is attached to the soaking brush 21 or the flushing brush 22, and the photomask is controlled to be wiped on the soaking brush 21 or the flushing brush 22 in a contact mode.
The cleaning section 2 further comprises a shaking assembly 25, a purging assembly 26, a liquid supply assembly 27 and a liquid level detection assembly 28. The shaking unit 25 is disposed on the inner wall of the tank 200. Preferably, the shaking unit 25 is provided on the inner wall surface where the immersing brush 21 is located. The vibrator unit 25 is internally provided with a crystal oscillator, and the crystal oscillator vibrates (ultrasonically cleans) the rinse liquid to impact the surface of the photomask, thereby removing stains remaining on the surface of the photomask during immersion and brushing. The purge assembly 26 is used to purge both sides of the reticle with IPA vapor, hot nitrogen, etc. to effect drying of the reticle surfaces. The liquid supply assembly 27 is used for supplying different kinds of cleaning liquid into the tank 200. The liquid supply unit 27 includes a plurality of liquid medicine tanks 271, liquid medicine mixing chambers 272, liquid medicine circulation chambers 273, and connection pipes 274. Different chemical solutions such as pure water, SC 1 solution, and SC 2 solution are stored in the different chemical solution tanks 271. The liquid medicine tank 271 is collected to the liquid medicine mixing chamber 272 through a connecting pipe 274, and the liquid medicine mixing chamber 272 is used for extracting different types of liquid medicines from different liquid medicine tanks 271 to obtain different kinds of mixed liquid medicines and different concentrations of mixed liquid medicines required in response to different cleaning processes. After the chemical liquid is mixed, the mixed chemical liquid enters the chemical liquid circulation cavity 273 to control the temperature and the like so as to continuously supplement and control the chemical liquid with proper temperature and proper concentration in the 2 cleaning tank. The liquid level detecting assembly 28 is used for detecting the liquid level in the tank body 200, so as to ensure that the liquid medicine amount injected into the tank body 200 by the liquid supplying assembly 27 meets the use requirement and cannot pollute or corrode the clamp unit 23.
The cleaning part 2 further comprises a flushing spray assembly 29 arranged at the position of the purging assembly 26 and used for flushing the photomask at the flushing position with pure water, and the flushing spray assembly is connected with the liquor circulation cavity 273 through a connecting pipeline 274.
As shown in fig. 3, the washing brush 22 includes a brushing structure 221, a roller washing structure 222, a connection rod 223, a housing 224, and a lifting driving structure 225. The brushing structure 221 and the roller cleaning structure 222 are disposed within the housing 224. The brushing structure 221 and the roller cleaning structure 222 are arranged on the two surfaces of the photomask in a manner that the brushing operation can be synchronously performed. A lift drive mechanism 225 is disposed between the pod 200 and the housing 224 for driving the housing 224 and the brush and roller rinse mechanisms 221, 222 within the housing 224 to slide over the reticle surface. Preferably, the principle of the lifting drive structure 225 may be a hydraulic drive, a belt drive, etc.
Specifically, the brushing structure 221 and the roller cleaning mechanism 222 are mounted within a housing 224. Structures (e.g., set bolts) are provided within the housing 224 to limit the displacement movement of the brushing structure 221 and the roller cleaning mechanism 222 to limit the movement of the brushing structure 221 and the roller cleaning mechanism 222 within the housing 224. The connecting rod 223 is used for connecting the shell 224 and the lifting driving structure 225, so that the shell 224 can move under the driving of the lifting driving structure 225.
The brushing structure 221 includes a brushing roller 2211, a roller support rod 2212, a rotation driving member 2213, a transmission member 2214, a holding movement member 2215, a support rod restricting member 2216, and the like. The transmission member 2214 transmits the movement of the rotation driving member 2213 to the brushing roller 2211 mounted on the roller support rod 2212 to realize the rotation wiping of the mask surface by the brushing roller 2211 when the brush 22 is displaced relative to the mask, so as to ensure cleaner wiping of the mask surface. The transmission member 2214 is composed of a first bevel gear 22141 connected to the rotation driving member 2213, a second bevel gear 22142 switching the movement direction of the first bevel gear 22141, a third bevel gear 22143 linearly movable on a shaft coaxial with the second bevel gear 22142 (within a certain range), a fourth bevel gear 22144 switching the movement direction of the third bevel gear 22143, a gear belt transmission group 22145 coaxially connected to the fourth bevel gear 22144 and coaxially connected to the brush roller 2211, and the like. The brush roller 2211 is composed of a fiber material and a shaft structure which can wipe the surface of the photomask. The shaft body structure limits and fixes the fiber material on the shaft body structure and is matched with the gear belt transmission group 22145 at the same time so as to realize the rotary wiping of the fiber material on the surface of the photomask. The clamping movement member 2215 cooperates with the roller support bar 2212 to control whether the clamping movement member 2215 contacts the mask with the brushing structure 221. The gripping motion member 2215 is composed of a gripping drive group 22151, a drive connection rod 22152, a gear drive group 22153, and the like. The drive connection rod 22152 is fixedly connected with the clamping drive unit 22151 and is matched with a gear at one end of the gear transmission unit 22153, so that the linear motion of the rack part on the drive connection rod 22152 is converted into the rotary motion of the gear transmission unit 22153. One section of the gear transmission set 22153 is matched with the structure of the rack on the roller support rod 2212 to realize the linear motion of the roller support rod 2212 on the 224 shell (limiting the motion track of the roller support rod 2212) (when the gears (two racks are arranged on two sides of the gears) rotate, the two parallel and opposite racks form opposite-direction motion, namely the position switching of the clamping contact and the releasing separation of the photomask). The support rod restraining member 2216 is composed of two clip restraining buckles 22161 like umbrella buckles, an idle restraining buckle 22162, a position switching drive 22163, a connection plate 22164, and the like. The connecting plate 22164 is designed to wrap the roller support rod 2212, that is, the clamping limiting position buckle 22161 and the idle limiting buckle 22162 can enter the groove position set on the roller support rod 2212, so as to limit the position of the brushing structure 221. A position switching drive 22163 (similar to the clamp motion structure 2215) is coupled to the connecting plate 22164 to effect switching between the clamp limit and idle limit positions. The roller cleaning mechanism 222 is composed of a cleaning nozzle 2221, a connection structure 2222, an adsorption wiping structure 2223, a movement driving structure 2224 (similar to the clamp movement structure 2215), and the like. The connection structure 2222 fixes the cleaning nozzle 2221 and the suction wiping structure 2223 in the roller cleaning mechanism 222. The motion driving structure 2224 is connected with the connecting structure 2222 to realize the position switching of the roller cleaning or not. When the brushing roller 2211 rotates, the adsorption wiping structure 2223 contacts with the fiber structure on the brushing roller 2211, clean pure water (corresponding cleaning liquid if necessary) is continuously sprayed below, and the brushing roller 2211 in continuous rotation is wiped by the adsorption wiping structure 2223, so that dirt when a cleaning photomask is carried in the fiber structure on the surface of the brushing roller 2211 is removed. When the cleaning is performed for a certain number of times or other cleaning conditions cannot be met, the adsorption cleaning structure 2223 can be cleaned/replaced or the fiber structure on the cleaning roller 2211 can be replaced, so as to ensure the cleaning effect during cleaning.
Referring to fig. 4 and 7, clamp head 231 includes a spike 2311, a motion structure 2312, a buffer structure 2313 and a clamp drive 2314. The movement structure 2312 is composed of a first connecting rod 23121, a horizontally disposed gear set 23122, a second connecting rod 23123, a vertically disposed gear set 23124, a third connecting rod 23125, and the like. The third connecting rod 23125 is provided with a thimble 2311, and a buffer structure 2313 is arranged at the front end of the thimble 2311 to buffer excessive connection when the thimble 2311 clamps the photomask. The first connecting rod 23121 is connected to the clamp driving device 2314 (since the first connecting rod 23121 is connected to the clamp driving device 2314, description will not be repeated for the case where the second connecting rod 23123 is connected to the clamp driving device 2314 specifically) so as to implement movement of the thimble 2311 in the direction. One gear on the horizontally placed gear set 23122 matched with the rack structure on the first connecting rod 23121 rotates, and the other section of the horizontally placed gear set 23122 is matched with the rack structure on the second connecting rod 23123 so as to transfer the movement of the first connecting rod 23121 in the X direction to the second connecting rod 23123 and realize the movement of the second connecting rod 23123 in the Y direction, so that the other side face of the photomask is pressed. Similarly, one gear on the vertically disposed gear set 23124, which mates with the rack structure on the second connection rod 23123, rotates, and the other segment of the vertically disposed gear set 23124 is connected with the third connection rod through the rack structure to transfer the movement of the second connection rod 23123 in the Y direction to the third connection rod 23125, to move the third connection rod 23125 in the Z direction, so as to compress the mask surface. The thimble 2311 is moved in three directions of XYZ axes (three axes perpendicular to each other) by the movement mechanism 2312 to achieve contact between the buffer structure 2313 and the photomask, thereby achieving fixation of the photomask. One clamp head 231 is used for pressing and fixing only one corner of the mask, and the pressing and fixing of the mask can be realized by arranging 4 clamp heads. The thimble 2311 can continue to move under the action of the buffer structure 2313 (the spring is arranged in the buffer structure to buffer the photomask, meanwhile, rubber-like substances are arranged on the surface of the buffer structure, so that the buffer structure has a buffer effect, can not damage the surface of the photomask, has corrosion resistance, can not generate extra dirt and the like, and can not damage the surface and the side surface of the photomask.
The inspection portion 3 includes a reflection illumination system 31, an image sensor 32, a 45 ° half-transmission half-reflection beam splitter 33, a condenser lens 34, a mask moving stage 35, a transmission illumination system 36, a transmission prism 37, a reflection prism 38, a light source 39, and other auxiliary units (such as a cover plate is not shown). The detection part 3 is a transmission reflection detection (STARLIGHT), namely, the light source can perform reflection and transmission inspection on the surface of the photomask through a light path capable of switching reflection and transmission by itself. Two sets of test results are obtained after the reflected and transmitted light paths are switched by themselves, and the surface condition of the photomask (stored in the information corresponding to the photomask) can be obtained by comparing the two results. Comparing the test result with the requirement, and if the test result is in the required range, transmitting the test result by a transmission arm to implement the next operation; otherwise, the alarm prompts the problem on the surface of the photomask or continues to clean and check the surface of the photomask.
The transport portion 4 may be a conventional mechanical arm structure to implement gripping transportation of the mask. Preferably, the transport portion 4 may be a transmission structure with the above-mentioned gripper head 231. The transporting section 4 can move the mask to various positions in the tank 200 on a set track or a set line to complete the cleaning and inspection work of the mask.
As shown in fig. 1, the transport section 4 includes a horizontal movement drive 41, a vertical movement drive 42, a connection support column 43, a connection member 44, and a clamp unit 45. The mask is held by the jig unit 45, and the mask on the jig unit 45 is transferred between the placing section 1, the cleaning section 2, and the detecting section 3 by the horizontal movement drive 41 and the vertical movement drive 42.
Referring to fig. 6, the clamp unit 45 includes a contaminated spike cover 451, a clean spike cover 452, a clean spike 453, a contaminated spike 454, a clean spike drive mechanism 455, a contaminated spike drive mechanism 456, a housing 457, and the like. The contaminated thimble protection cover 451 and the clean thimble protection cover 452 respectively protect the contaminated thimble 454 and the clean thimble 453, and prevent the liquid medicine from polluting the contaminated thimble 454 and the clean thimble 453. Clean thimble drive mechanism 455 and contaminated thimble drive mechanism 456 respectively control the movement of clean thimble 453 and contaminated thimble 454. The contaminated spike sheath 451 (the clean spike sheath 452 is similar) includes a sheath 4511, a connecting rod 4512, a rotary motion mechanism 4513, and a lifting motion mechanism 4514. The cover 4511 may be combined with the housing 457 to form a closed space structure to prevent contamination of the vapor medical solution or the like. The connecting bar 4512 is connected with the cover 4511 to switch the state of the cover 4511. The rotary motion mechanism 4513 and the lifting motion mechanism 4514 transmit the motion to the connecting rod 4512 to further control the opening and closing of the cover 4511, so that the cover 4511 is separated from the position of the polluted thimble 454, that is, the polluted thimble 454 is not damaged when the rotary motion mechanism 4513 performs rotary motion. Clean spike sheath 452 is slightly different from contaminated spike sheath 451 for Z-direction movement. The movement of the clean thimble protection cover 452 along the Z direction is that the clean thimble protection cover 452 along the Z direction is separated from the surface of the housing 457 together with the clean thimble 453, and then the clean thimble protection cover ascends for a certain distance to ensure that the clean thimble protection cover is not contacted with the clamped photomask. The two thimble assemblies used for clamping the photomask are arranged in the device, and the photomask can be clamped through the pollution thimble 454 and the clean thimble 453 through the feedback result of the detection part 3 before the photomask enters the cleaning part 2 through the transportation part 4, so that the photomask is prevented from being polluted after the photomask is cleaned due to pollution caused by the process of clamping and transferring the photomask by the thimble before cleaning. For example, a photomask whose surface is detected as being acceptable by the detecting portion 3 after being cleaned by the cleaning portion 2 is gripped by the clean ejector pins 453, and a photomask whose surface is detected as being unacceptable by the detecting portion 3 after being cleaned by the second cleaning is gripped by the contaminated ejector pins 454.
EXAMPLE 2,
A photomask cleaning and detecting method comprises the following steps: s1: soaking and brushing the photomask in the liquid medicine; s2: checking the surface brushing condition of the photomask, returning to S1 if the checking result is incomplete brushing, and continuing if the checking result is complete brushing; s3: using pure water to spray and brush the photomask; s4: checking the surface flushing condition of the photomask, returning to S3 if the checking result is that flushing is not completed, and continuing if the checking result is that flushing is completed; s5: rapidly rotating the photomask and drying the moisture on the photomask; s6: and (5) finishing the cleaning.
Optionally, as shown in fig. 5, the cleaning process using the device is as follows: ① The clamp unit 23 rotates the mask to the soaking position by 180 degrees after clamping, ② performs liquid medicine soaking and brushing until the liquid medicine soaking and brushing on the surface of the mask is completed, the ③ clamp unit 23 rotates the mask to the flushing position by 90 degrees after clamping, the ④ uses the flushing spray assembly 29 to spray pure water to flush the mask, the ⑤ clamp unit 23 rotates the mask to the spin-drying/placing position by 0 degrees after clamping, the ⑥ clamp unit 23 drives the mask to rotate rapidly under the action of the driving unit 24, and meanwhile, the blowing component 26 is used for blowing and drying the mask (the gas blown out by the blowing component 26 can be preferably mixed gas of nitrogen and IPA steam, and the mask in high-speed rotation can be dried).
Specifically, the process of soaking and brushing with the liquid medicine is ① to inject the cleaning liquid medicine required to be soaked and cleaned into the tank body 100 to a certain liquid level; ② The soaking brush 21 moves to a brushing position to contact the surface of the photomask for brushing (the soaking brush 21 brushes the surface of the photomask under the control of the driving unit 24, and the soaking brush 21 realizes the switching of the surface of the photomask from a brushing start contact point to a brushing completion contact point under the driving control of the inside of the soaking brush 21); ③ After the completion of one brushing, the soaking brush moves back to the brushing start contact point; ④ The shaking component starts to work, so that the liquid medicine forms washing on the surface of the photomask to remove dirt separated from the washing, and the dirt on the soaking brush 21 is removed; ⑤ Checking whether the surface of the photomask is brushed, if yes, then the brushing is completed; if not, repeating steps ② to ④;⑥ to recover the discharged chemical liquid, continuously injecting the pure water to rinse the tank 200 and the photomask, confirming whether all types of chemical liquid soaking cleaning are completed, if so, ending the chemical liquid soaking cleaning, and if not, repeating steps ① to ⑤ until all chemical liquid soaking cleaning is completed. (injecting SPM with mixed proportion to remove organic matters on the surface of the photomask, injecting SC2 with mixed proportion into a 2-cleaning tank after cleaning by pure water to remove metal complex on the surface of the photomask, and finally injecting SC1 with mixed proportion into the 2-cleaning tank after cleaning by pure water to remove particle residues on the surface of the photomask)
Optionally, the flow of pure water spraying and flushing the photomask is as follows: ① Opening the flushing spray assembly 29; ② The brush 22 is moved to the flushing start position; ③ The movable flushing brush 22 contacts the surface of the photomask to carry out surface flushing; ④ The flushing brush 22 moves towards the third direction, and the clamp unit moves towards the second direction (the flushing brush 22 contacts the surface of the photomask under the combined action of the lifting driving structure 225 and the clamp unit 23 and flushes and wipes the surface of the photomask, and the flushing position is switched under the control of the driving unit 24); ⑤ Detecting the surface flushing condition of the photomask, and repeating the steps ② - ④ if the flushing condition is unqualified; and if the rinsing is qualified, the next step is carried out, ⑥ the rinsing brush 22 moves out of contact with the photomask, and the rinsing is completed.
Optionally, the process of quick spin-drying and blow-drying is that ① the clamp unit moves to the central position and starts to spin-dry, ② the purge component 26 moves to the position right above the clamp unit 23 (central position), and simultaneously approaches the mask surface, ③ simultaneously opens the gas nozzles (nitrogen gas, or hot nitrogen gas after heat treatment) at the front purge component 26 and the central position 23 of the clamp unit, so as to purge the front and back surfaces of the mask. Preferably, if the mask surface is to be dried using nitrogen+ipa vapor (tarogoni drying), then the cleaning tank needs to be first formed into a closed space after step ②.
The above embodiments are only for illustrating the technical solution of the present invention and not for limiting the same, and although the present invention has been described in detail with reference to the preferred embodiments, it should be understood by those skilled in the art that modifications and equivalents may be made thereto without departing from the spirit and scope of the technical solution of the present invention, which is intended to be covered by the scope of the claims of the present invention. The technology, shape, and construction parts of the present invention, which are not described in detail, are known in the art.
Claims (9)
1. A reticle cleaning and inspection apparatus, comprising: the device comprises a shell (5) and a cleaning part (2) arranged in the shell (5), wherein the cleaning part (2) comprises a clamp head (231), the clamp head (231) comprises a plurality of ejector pins (2311) which are connected with a photomask in a clamping manner, a buffer structure (2313) is arranged on the ejector pins (2311),
The fixture head (231) further comprises a moving structure (2312), the moving structure (2312) comprises a first connecting rod (23121), a second connecting rod (23123) and a third connecting rod (23125), the first connecting rod (23121), the second connecting rod (23123) and the third connecting rod (23125) are respectively provided with the thimble (2311), the first connecting rod (23121), the second connecting rod (23123) and the third connecting rod (23125) are in gear transmission,
A spring is arranged in the buffer structure (2313), rubber is arranged on the surface of the buffer structure (2313),
The number of the clamp heads (231) is at least 4,
The fixture head (231) comprises a thimble (2311), a moving structure (2312), a buffering structure (2313) and a clamping drive (2314), the moving structure (2312) further comprises a horizontally placed gear set (23122) and a vertically placed gear set (23124), the thimble is arranged on a third connecting rod (23125), a first connecting rod (23121) is connected with the clamping drive (2314) and drives the first connecting rod (23121) to move in the Y direction, the first connecting rod (23121) is in transmission connection with the horizontally placed gear set (23122), the horizontally placed gear set (23122) is in transmission connection with a second connecting rod (23123) to achieve movement of the second connecting rod (23123) in the X direction, the second connecting rod (23123) is in transmission connection with the vertically placed gear set (23124), and the vertically placed gear set (23124) is in transmission connection with the third connecting rod (23125) to achieve movement of the third connecting rod (23125) in the Z direction.
2. The mask cleaning and detecting device according to claim 1, wherein the cleaning portion (2) further comprises a liquid supply assembly (27), the liquid supply assembly (27) comprises a liquid medicine tank (271), a liquid medicine mixing cavity (272), a liquid medicine circulation cavity (273) and a connecting pipeline (274), and the liquid medicine tank (271), the liquid medicine mixing cavity (272) and the liquid medicine circulation cavity (273) are sequentially communicated through the connecting pipeline (274).
3. The photomask cleaning and detecting device according to claim 1, wherein a transporting portion (4) is further arranged in the housing (5), the transporting portion (4) comprises a clamp unit (45), a clean thimble (453) and a pollution thimble (454) are arranged on the clamp unit (45), and a clean thimble protection cover (452) and a pollution thimble protection cover (451) are correspondingly arranged on the clean thimble (453) and the pollution thimble (454).
4. A photomask cleaning inspection apparatus according to claim 3, wherein the contaminated thimble protection cover (451) comprises a cover body (4511) and a connecting rod (4512), the cover body (4511) is sleeved on the contaminated thimble (454), and the cover body (4511) is fixedly connected with the connecting rod (4512).
5. The reticle cleaning inspection device according to claim 1, wherein the cleaning section (2) comprises a rinse brush (22), the rinse brush (22) comprising a brush structure (221) and a roller cleaning structure (222) that are attached to both the front and back surfaces of the reticle in use, and a lift drive structure (225) that drives the brush structure (221) and the roller cleaning structure (222) to move relative to the reticle.
6. A reticle cleaning inspection device according to claim 3, wherein the housing (5) is further provided with an inspection portion (3) located on the moving path of the transporting portion (4).
7. The reticle cleaning inspection device according to claim 5, wherein the cleaning section (2) further comprises a dithering component (25), the dithering component (25) comprising a crystal oscillator.
8. A method of inspecting a reticle cleaning using the reticle cleaning inspecting apparatus as claimed in any one of claims 1 to 7, the method comprising the steps of:
s1: soaking and brushing the photomask in the liquid medicine;
s2: checking the surface brushing condition of the photomask, returning to the step S1 if the checking result is that the brushing is not completed, and continuing the next step if the checking result is that the brushing is completed;
S3: using pure water to spray and brush the photomask;
S4: checking the surface flushing condition of the photomask, returning to the step S3 if the checking result is that flushing is not completed, and continuing the next step if the checking result is that flushing is completed;
s5: and (5) rapidly rotating the photomask, drying the moisture on the photomask, and finishing cleaning.
9. The method of claim 8, wherein the gas used in the step of drying the moisture on the mask is nitrogen.
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| CN202210954197.7A CN115430629B (en) | 2022-08-10 | 2022-08-10 | Photomask cleaning and detecting device and method |
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| CN202210954197.7A CN115430629B (en) | 2022-08-10 | 2022-08-10 | Photomask cleaning and detecting device and method |
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| CN115430629A (en) | 2022-12-06 |
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