CN115232135B - 一种金属卟啉及其制备方法与应用 - Google Patents
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- 238000002360 preparation method Methods 0.000 title claims abstract description 8
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 claims abstract description 30
- 150000004032 porphyrins Chemical class 0.000 claims abstract description 22
- 150000001875 compounds Chemical class 0.000 claims abstract description 20
- 239000000463 material Substances 0.000 claims abstract description 20
- 239000004065 semiconductor Substances 0.000 claims abstract description 19
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 claims abstract description 15
- 238000006243 chemical reaction Methods 0.000 claims abstract description 15
- 238000000034 method Methods 0.000 claims abstract description 15
- HZNVUJQVZSTENZ-UHFFFAOYSA-N 2,3-dichloro-5,6-dicyano-1,4-benzoquinone Chemical compound ClC1=C(Cl)C(=O)C(C#N)=C(C#N)C1=O HZNVUJQVZSTENZ-UHFFFAOYSA-N 0.000 claims abstract description 12
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 claims abstract description 10
- 239000002904 solvent Substances 0.000 claims abstract description 9
- 230000015572 biosynthetic process Effects 0.000 claims abstract description 7
- 238000006356 dehydrogenation reaction Methods 0.000 claims abstract description 7
- OVTCUIZCVUGJHS-UHFFFAOYSA-N dipyrrin Chemical compound C=1C=CNC=1C=C1C=CC=N1 OVTCUIZCVUGJHS-UHFFFAOYSA-N 0.000 claims abstract description 7
- 229910052751 metal Inorganic materials 0.000 claims abstract description 7
- 239000002184 metal Substances 0.000 claims abstract description 7
- 238000003786 synthesis reaction Methods 0.000 claims abstract description 7
- CNUDBTRUORMMPA-UHFFFAOYSA-N formylthiophene Chemical class O=CC1=CC=CS1 CNUDBTRUORMMPA-UHFFFAOYSA-N 0.000 claims abstract description 6
- 150000003839 salts Chemical class 0.000 claims abstract description 5
- 239000011261 inert gas Substances 0.000 claims abstract description 4
- 230000005669 field effect Effects 0.000 claims description 16
- 239000013078 crystal Substances 0.000 claims description 15
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 10
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical group ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 claims description 9
- 239000001257 hydrogen Substances 0.000 claims description 5
- 229910052739 hydrogen Inorganic materials 0.000 claims description 5
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 5
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 5
- 238000010438 heat treatment Methods 0.000 claims description 4
- 238000010992 reflux Methods 0.000 claims description 4
- 239000010949 copper Substances 0.000 claims description 3
- 229910052759 nickel Inorganic materials 0.000 claims description 3
- 238000003756 stirring Methods 0.000 claims description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 claims description 2
- MQRWBMAEBQOWAF-UHFFFAOYSA-N acetic acid;nickel Chemical compound [Ni].CC(O)=O.CC(O)=O MQRWBMAEBQOWAF-UHFFFAOYSA-N 0.000 claims description 2
- 229910052802 copper Inorganic materials 0.000 claims description 2
- OPQARKPSCNTWTJ-UHFFFAOYSA-L copper(ii) acetate Chemical compound [Cu+2].CC([O-])=O.CC([O-])=O OPQARKPSCNTWTJ-UHFFFAOYSA-L 0.000 claims description 2
- 229940078494 nickel acetate Drugs 0.000 claims description 2
- 238000004519 manufacturing process Methods 0.000 claims 1
- 230000005540 biological transmission Effects 0.000 abstract description 4
- 230000004298 light response Effects 0.000 abstract description 3
- 239000000969 carrier Substances 0.000 abstract description 2
- 230000002349 favourable effect Effects 0.000 abstract description 2
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 15
- 230000003287 optical effect Effects 0.000 description 11
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 10
- 239000000047 product Substances 0.000 description 10
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 6
- 238000010521 absorption reaction Methods 0.000 description 6
- 239000008367 deionised water Substances 0.000 description 6
- 229910021641 deionized water Inorganic materials 0.000 description 6
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 5
- 239000007787 solid Substances 0.000 description 5
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 4
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- 238000012546 transfer Methods 0.000 description 4
- 238000005406 washing Methods 0.000 description 4
- 238000000089 atomic force micrograph Methods 0.000 description 3
- 238000004364 calculation method Methods 0.000 description 3
- 238000012790 confirmation Methods 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 238000002484 cyclic voltammetry Methods 0.000 description 3
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- 239000012065 filter cake Substances 0.000 description 3
- 238000004949 mass spectrometry Methods 0.000 description 3
- 238000001840 matrix-assisted laser desorption--ionisation time-of-flight mass spectrometry Methods 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- KAESVJOAVNADME-UHFFFAOYSA-N Pyrrole Chemical compound C=1C=CNC=1 KAESVJOAVNADME-UHFFFAOYSA-N 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 238000000862 absorption spectrum Methods 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- 125000000217 alkyl group Chemical group 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 2
- 229940011182 cobalt acetate Drugs 0.000 description 2
- QAHREYKOYSIQPH-UHFFFAOYSA-L cobalt(II) acetate Chemical compound [Co+2].CC([O-])=O.CC([O-])=O QAHREYKOYSIQPH-UHFFFAOYSA-L 0.000 description 2
- NWFNSTOSIVLCJA-UHFFFAOYSA-L copper;diacetate;hydrate Chemical compound O.[Cu+2].CC([O-])=O.CC([O-])=O NWFNSTOSIVLCJA-UHFFFAOYSA-L 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 238000004770 highest occupied molecular orbital Methods 0.000 description 2
- PVFSDGKDKFSOTB-UHFFFAOYSA-K iron(3+);triacetate Chemical compound [Fe+3].CC([O-])=O.CC([O-])=O.CC([O-])=O PVFSDGKDKFSOTB-UHFFFAOYSA-K 0.000 description 2
- 229940071125 manganese acetate Drugs 0.000 description 2
- UOGMEBQRZBEZQT-UHFFFAOYSA-L manganese(2+);diacetate Chemical compound [Mn+2].CC([O-])=O.CC([O-])=O UOGMEBQRZBEZQT-UHFFFAOYSA-L 0.000 description 2
- 238000012544 monitoring process Methods 0.000 description 2
- 229940078487 nickel acetate tetrahydrate Drugs 0.000 description 2
- OINIXPNQKAZCRL-UHFFFAOYSA-L nickel(2+);diacetate;tetrahydrate Chemical compound O.O.O.O.[Ni+2].CC([O-])=O.CC([O-])=O OINIXPNQKAZCRL-UHFFFAOYSA-L 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 238000011056 performance test Methods 0.000 description 2
- 230000001376 precipitating effect Effects 0.000 description 2
- 238000010791 quenching Methods 0.000 description 2
- 238000011160 research Methods 0.000 description 2
- 230000027756 respiratory electron transport chain Effects 0.000 description 2
- 239000000741 silica gel Substances 0.000 description 2
- 229910002027 silica gel Inorganic materials 0.000 description 2
- 230000003595 spectral effect Effects 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 238000000967 suction filtration Methods 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical group [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 206010034972 Photosensitivity reaction Diseases 0.000 description 1
- 229910021607 Silver chloride Inorganic materials 0.000 description 1
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 1
- 229930003779 Vitamin B12 Natural products 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000005587 bubbling Effects 0.000 description 1
- 238000012512 characterization method Methods 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 229930002875 chlorophyll Natural products 0.000 description 1
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- ATNHDLDRLWWWCB-AENOIHSZSA-M chlorophyll a Chemical compound C1([C@@H](C(=O)OC)C(=O)C2=C3C)=C2N2C3=CC(C(CC)=C3C)=[N+]4C3=CC3=C(C=C)C(C)=C5N3[Mg-2]42[N+]2=C1[C@@H](CCC(=O)OC\C=C(/C)CCC[C@H](C)CCC[C@H](C)CCCC(C)C)[C@H](C)C2=C5 ATNHDLDRLWWWCB-AENOIHSZSA-M 0.000 description 1
- AGVAZMGAQJOSFJ-WZHZPDAFSA-M cobalt(2+);[(2r,3s,4r,5s)-5-(5,6-dimethylbenzimidazol-1-yl)-4-hydroxy-2-(hydroxymethyl)oxolan-3-yl] [(2r)-1-[3-[(1r,2r,3r,4z,7s,9z,12s,13s,14z,17s,18s,19r)-2,13,18-tris(2-amino-2-oxoethyl)-7,12,17-tris(3-amino-3-oxopropyl)-3,5,8,8,13,15,18,19-octamethyl-2 Chemical compound [Co+2].N#[C-].[N-]([C@@H]1[C@H](CC(N)=O)[C@@]2(C)CCC(=O)NC[C@@H](C)OP(O)(=O)O[C@H]3[C@H]([C@H](O[C@@H]3CO)N3C4=CC(C)=C(C)C=C4N=C3)O)\C2=C(C)/C([C@H](C\2(C)C)CCC(N)=O)=N/C/2=C\C([C@H]([C@@]/2(CC(N)=O)C)CCC(N)=O)=N\C\2=C(C)/C2=N[C@]1(C)[C@@](C)(CC(N)=O)[C@@H]2CCC(N)=O AGVAZMGAQJOSFJ-WZHZPDAFSA-M 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 150000004696 coordination complex Chemical class 0.000 description 1
- RKTYLMNFRDHKIL-UHFFFAOYSA-N copper;5,10,15,20-tetraphenylporphyrin-22,24-diide Chemical compound [Cu+2].C1=CC(C(=C2C=CC([N-]2)=C(C=2C=CC=CC=2)C=2C=CC(N=2)=C(C=2C=CC=CC=2)C2=CC=C3[N-]2)C=2C=CC=CC=2)=NC1=C3C1=CC=CC=C1 RKTYLMNFRDHKIL-UHFFFAOYSA-N 0.000 description 1
- 238000005090 crystal field Methods 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 230000008034 disappearance Effects 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- KTWOOEGAPBSYNW-UHFFFAOYSA-N ferrocene Chemical compound [Fe+2].C=1C=C[CH-]C=1.C=1C=C[CH-]C=1 KTWOOEGAPBSYNW-UHFFFAOYSA-N 0.000 description 1
- 239000012458 free base Substances 0.000 description 1
- 229910021397 glassy carbon Inorganic materials 0.000 description 1
- 150000003278 haem Chemical class 0.000 description 1
- 150000002391 heterocyclic compounds Chemical class 0.000 description 1
- 230000004060 metabolic process Effects 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- 238000000386 microscopy Methods 0.000 description 1
- 238000000879 optical micrograph Methods 0.000 description 1
- 238000000643 oven drying Methods 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 230000036211 photosensitivity Effects 0.000 description 1
- 230000029553 photosynthesis Effects 0.000 description 1
- 238000010672 photosynthesis Methods 0.000 description 1
- 230000001766 physiological effect Effects 0.000 description 1
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 1
- 238000007867 post-reaction treatment Methods 0.000 description 1
- 238000004062 sedimentation Methods 0.000 description 1
- HKZLPVFGJNLROG-UHFFFAOYSA-M silver monochloride Chemical compound [Cl-].[Ag+] HKZLPVFGJNLROG-UHFFFAOYSA-M 0.000 description 1
- 239000012265 solid product Substances 0.000 description 1
- WROMPOXWARCANT-UHFFFAOYSA-N tfa trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F.OC(=O)C(F)(F)F WROMPOXWARCANT-UHFFFAOYSA-N 0.000 description 1
- 238000001757 thermogravimetry curve Methods 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
- 239000011715 vitamin B12 Substances 0.000 description 1
- 235000019163 vitamin B12 Nutrition 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D487/00—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, not provided for by groups C07D451/00 - C07D477/00
- C07D487/22—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, not provided for by groups C07D451/00 - C07D477/00 in which the condensed system contains four or more hetero rings
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01V—GEOPHYSICS; GRAVITATIONAL MEASUREMENTS; DETECTING MASSES OR OBJECTS; TAGS
- G01V8/00—Prospecting or detecting by optical means
- G01V8/10—Detecting, e.g. by using light barriers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/30—Coordination compounds
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/30—Coordination compounds
- H10K85/331—Metal complexes comprising an iron-series metal, e.g. Fe, Co, Ni
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/30—Coordination compounds
- H10K85/341—Transition metal complexes, e.g. Ru(II)polypyridine complexes
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07B—GENERAL METHODS OF ORGANIC CHEMISTRY; APPARATUS THEREFOR
- C07B2200/00—Indexing scheme relating to specific properties of organic compounds
- C07B2200/13—Crystalline forms, e.g. polymorphs
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/549—Organic PV cells
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- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Physics & Mathematics (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Life Sciences & Earth Sciences (AREA)
- General Physics & Mathematics (AREA)
- Geophysics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Nitrogen Condensed Heterocyclic Rings (AREA)
Abstract
本发明公开了一种金属卟啉及其制备方法与应用。本发明金属卟啉的结构式如式Ⅰ所示;其制备方法,包括如下步骤:1)5,15‑二噻吩基卟啉的合成:将二吡咯甲烷与如式Ⅱ所示的取代噻吩‑2‑甲醛溶于干燥的溶剂中,通入惰性气体后加入三氟乙酸进行反应;然后再加入2,3‑二氯‑5,6‑二氰对苯醌进行脱氢反应,得到式Ⅲ所示的5,15‑二噻吩基卟啉;2)金属卟啉合成:所述式Ⅲ所示的5,15‑二噻吩基卟啉溶解在N,N‑二甲基甲酰胺中,加入乙酸金属盐进行混合反应,即得到式Ⅰ所示化合物,记为金属卟啉。本发明金属卟啉作为有机半导体材料的性能高,其光滑均一,有利于载流子的传输,在不同光强下具有良好的光响应;其制备的器件几乎没有栅依赖,且接触电阻较小。
Description
技术领域
本发明涉及一种金属卟啉及其制备方法与应用,属于有机半导体材料领域。
背景技术
卟啉是一类由四个吡咯类亚基的α-碳原子通过次甲基桥(=CH-)互联而形成的大分子杂环化合物。卟啉可进一步与金属离子形成金属络合物,即金属卟啉。自然界中的卟啉多以金属卟啉存在,而且广泛存在于生物体中并具有重要作用,例如血红素在生物氧化过程中起着氧的传递、存储、活化以及电子传输、叶绿素在光合作用中起着光敏电子转移作用,维生素B12在新陈代谢中也有着不可或缺的地位,具有特殊的生理活性。卟啉环的共轭的大环结构使其具有良好的光、电、磁特性,常用于分子识别、传感器、半导体、光信息存储等。然而,在有机半导体领域,尤其在有机场效应晶体管类材料中,卟啉类分子的迁移率目前都比较低,但其独特的光电特性与其优异的生物相容性也使该类分子具有潜在的研究价值与应用价值。因此,设计合成新型的高迁移率的卟啉类有机半导体材料不仅可以促进该类材料的器件应用研究,也为后期对其进行结构改造应用到生物相容的电子器件中提供基础。在前人研究的基础上,结合目前卟啉类材料中的问题,我们设计合成了一类新型金属卟啉材料,实验证明该系列材料具有良好的场效应性能,在有机场效应晶体管以及有机光电器件方向有着良好的应用潜力。
发明内容
本发明的目的是提供一种金属卟啉及其制备方法与应用。
本发明提供的式Ⅰ所示化合物:
所述式I中,M选自Ni、Cu、Fe、Co、Mn和Ti中的至少一种,R表示氢或碳原子数为1~11的烷基。
上述的式Ⅰ所示化合物中,所述R表示氢或碳原子数可为1~6的烷基。
本发明还提供了一种制备上述的式Ⅰ所示化合物的方法,包括如下步骤:
1)5,15-二噻吩基卟啉的合成
将二吡咯甲烷与如式Ⅱ所示的取代噻吩-2-甲醛溶于干燥的溶剂中,通入惰性气体后加入三氟乙酸进行反应;然后再加入2,3-二氯-5,6-二氰对苯醌进行脱氢反应,得到式Ⅲ所示的5,15-二噻吩基卟啉;
所述式Ⅱ、Ⅲ中,R与所述式I中的定义相同;
2)金属卟啉合成
所述式Ⅲ所示的5,15-二噻吩基卟啉溶解在N,N-二甲基甲酰胺中,加入乙酸金属盐进行混合反应,即得到式Ⅰ所示化合物,记为金属卟啉。
本发明中,所述二吡咯甲烷的结构式如下所示:
上述的方法中,所述二吡咯甲烷与所述式Ⅱ所示的取代噻吩-2-甲醛、2,3-二氯-5,6-二氰对苯醌的摩尔比可为1:0.5~2:0.5~3,具体可为1:1:1.26、1:0.5~1:0.5~1.26、1:1~2:1.26~3或1:0.5~2:0.5~3。
上述的方法步骤1)中,所述溶剂为二氯甲烷;
加入所述三氟乙酸的反应条件如下:避光,室温,搅拌3~5h,具体可为3h或3~4h;
所述脱氢反应的条件如下:温度为室温,时间可为1~5h,具体可为1h、1~2h、1~3h或1~4h。
本发明中,所述惰性气体选自氮气或氩气,具体可为氮气;
步骤1)中,所述脱氢反应结束后加入三乙胺中和并淬灭反应;
所述脱氢反应的后处理过程如下:将反应液直接短硅胶柱过滤,再除去溶剂,残余固体利用氯仿/甲醇重结晶,分离结晶物即为所述式Ⅲ所示的5,15-二噻吩基卟啉。
上述的方法中,所述式Ⅲ所示的5,15-二噻吩基卟啉的质量与所述N,N-二甲基甲酰胺的体积比可为5mg~10mg:1ml。
所述式Ⅲ所示的5,15-二噻吩基卟啉与所述乙酸金属盐的摩尔比可为1:3~5。
上述的方法中,所述乙酸金属盐选自带有结晶水或无水的如下中的至少一种:乙酸铜、乙酸镍、乙酸铁、乙酸锰、四氯化钛和乙酸钴;具体可为一水合乙酸铜、四水合乙酸镍、无水乙酸铁、无水乙酸锰、或无水乙酸钴;
步骤2)中,所述反应在加热至溶剂回流时进行。
本发明步骤2)中,所述反应通过TLC监测是否结束;
所述反应后处理过程如下:当TLC监测原料消失时,加入与N,N-二甲基甲酰胺等体积的去离子水,有固体析出,冷却沉降,用布氏漏斗抽滤,滤饼先用去离子水洗涤数次,再用无水甲醇洗涤数次,烘干,即得金属卟啉。
本发明上述的式Ⅰ所示化合物作为有机半导体材料应用于制备有机半导场效应晶体管和/或光电探测器件中。
本发明还提供了一种有机半导体场效应晶体管,该晶体管为含有上述的式Ⅰ所示化合物作为有机半导体材料制成。
本发明进一步提供了一种有机半导体场效应晶体管器件,该器件含有上述的式Ⅰ所示化合物制备的有机半导场效应晶体管。
本发明具有以下优点:
1、本发明涉及的原材料成本低。
2、本发明涉及的合成路线操作简单、普遍适用和重复性好。
3、本发明式Ⅰ所示化合物作为卟啉类有机半导体材料的性能高,其光滑均一,有利于载流子的传输,在不同光强下具有良好的光响应。
4、本发明金属卟啉制备的器件几乎没有栅依赖,且接触电阻较小。
附图说明
图1为本发明实施例制备的三种金属卟啉在氯苯中的紫外可见吸收光谱;图1中(a)为H2DTP,(b)为NiDTP和(c)为CuDTP。
图2为本发明实施例制备的三种金属卟啉的循环伏安曲线;图2中(a)为H2DTP,(b)为NiDTP和(c)为CuDTP。
图3为本发明实施例制备的三种金属卟啉的TGA曲线;图3中(a)为H2DTP,(b)为NiDTP和(c)为CuDTP。
图4为本发明实施例制备的三种金属卟啉的光学显微镜图;图4中(a)为H2DTP,(b)为NiDTP和(c)为CuDTP。
图5为本发明实施例制备的三种金属卟啉的AFM图;图5中(a)为H2DTP,(b)为NiDTP和(c)为CuDTP。
图6为本发明实施例制备的三种金属卟啉的转移曲线和输出曲线图;图6中(a)、(b)为H2DTP,(c)、(d)为NiDTP和(e)、(f)为CuDTP。
图7为本发明金属卟啉NiDTP的光响应特性表征;图7中(a)、(b)为不同光强下的转移和输出曲线,(c)、(d)为不同栅压下的光响应值和光敏值。
具体实施方式
下述实施例中所使用的实验方法如无特殊说明,均为常规方法。
下述实施例中所用的材料、试剂等,如无特殊说明,均可从商业途径得到。
实施例1、
将二吡咯甲烷(458mg,3.1mmol)和噻吩-2-甲醛(348mg,3.1mmol)溶于600mL超干二氯甲烷中,鼓氮气10min后,加入三氟乙酸(TFA)(150uL,1.95mmol),避光室温搅拌3h,然后加2,3-二氯-5,6-二氰对苯醌(DDQ)(900mg,3.96mmol)继续搅拌1h,加入三乙胺(3ml)中和并淬灭反应。反应液直接短硅胶柱过滤,再除去溶剂,残余固体利用氯仿/甲醇重结晶,分离结晶物,烘干得紫色固体产物(338mg,0.71mmol),产率46%。
该产物的结构确认数据如下所示:
质谱:MALDI-TOF:M+:473.9
该产物具有单晶结构,属于正方晶系,晶胞参数如下: α=90°,β=90°,γ=90°。
由上可知,该产物结构正确,为式Ⅲ所示化合物,记为H2DTP自由碱卟啉。
实施例2、
本发明实施例1中制备得到的H2DTP自由碱卟啉(1eq.)溶解在N,N-二甲基甲酰胺(1ml/5mg~1ml/10mg卟啉)中,加入四水合乙酸镍(3~5eq.),加热至回流,TLC监测,原料消失,加入与N,N-二甲基甲酰胺等体积的去离子水,有固体析出,冷却沉降,用布氏漏斗抽滤,滤饼先用去离子水洗涤数次,再用无水甲醇洗涤数次,烘干,得金属卟啉,产率98%。
该产物的结构确认数据如下所示:
质谱:MALDI-TOF:M+:529.9。
该产物具有单晶结构,属于单斜晶系,晶胞参数如下: α=90°,β=101.454(7)°,γ=90°。
由上可知,该产物结构正确,为式I所示化合物,其中M为镍,记为NiDTP。
实施例3、
本发明实施例1中制备得到的H2DTP自由碱卟啉(1eq.)溶解在N,N-二甲基甲酰胺(1ml/5mg~1ml/10mg卟啉)中,加入一水合乙酸铜(3~5eq.),加热至回流,TLC监测,原料消失,加入与N,N-二甲基甲酰胺等体积的去离子水,有固体析出,冷却沉降,用布氏漏斗抽滤,滤饼先用去离子水洗涤数次,再用无水甲醇洗涤数次,烘干,得金属卟啉,产率98%。
该产物的结构确认数据如下所示:
质谱:MALDI-TOF:M+:534.9。
该产物具有单晶结构,属于单斜晶系,晶胞参数如下: α=90°,β=101.15(3)°,γ=90°。
由上可知,该产物结构正确,为式I所示化合物,其中M为铜,记为CuDTP。
上述实施例1,实施例2和实施例3制备所得产物H2DTP,NiDTP和CuDTP的光谱性质、电化学性质、热力学性质及有机场效应晶体管的性能测试如下所示:
(1)H2DTP,NiDTP和CuDTP的光谱性质
图1中(a)、(b)和(c)分别为H2DTP,NiDTP和CuDTP在氯苯溶液中的紫外-可见吸收光谱。由图1(a)可知,H2DTP在氯苯溶液中的最大吸收边为658.7nm,根据光学带隙计算公式Eg=1240/λ计算可得其相应的光学带隙为1.88eV,式中Eg为光学带隙,λ为紫外吸收曲线的边界值。由图1(b)可知,NiDTP在氯苯溶液中的最大吸收边为573.1nm,根据光学带隙计算公式Eg=1240/λ计算可得其相应的光学带隙为2.16eV,式中Eg为光学带隙,λ为紫外吸收曲线的边界值。由图1(c)可知,CuDTP在氯苯溶液中的最大吸收边为581.6nm,根据光学带隙计算公式Eg=1240/λ计算可得其相应的光学带隙为2.13eV,式中Eg为光学带隙,λ为紫外吸收曲线的边界值。
(2)H2DTP,NiDTP和CuDTP的电化学性质
材料的电化学性质采用循环伏安法测试,该实验采用三电极系统,以玻碳电极为工作电极,以Ag/AgCl电极为参比电极,以铂丝为对电极。将样品溶于四氢呋喃溶剂中,浓度大约是10-3M,以Bu4NPF6为支持电解质,二茂铁作为内标。
图2(a),(b)和(c)分别为H2DTP,NiDTP和CuDTP的循环伏安曲线。
电化学性能测试显示H2DTP,NiDTP和CuDTP的起始氧化电位分别为1.29eV,1.12eV和1.08eV,根据公式EHOMO=-[Eox-E(Fc/Fc+)+4.8]eV计算得到其HOMO能级分别为-5.69eV,-5.52eV和-5.48eV,说明该材料具有很高的空气稳定性。
(3)H2DTP,NiDTP和CuDTP的热力学性质
图3中(a)、(b)和(c)为材料的H2DTP,NiDTP和CuDTP曲线,该材料显示出优异的热稳定性,热失重的分解温度分别为328℃,387℃和319℃。
(4)H2DTP,NiDTP和CuDTP的场效应晶体管性能
图4中(a)、(b)和(c)分别为H2DTP,NiDTP和CuDTP有机场效应晶体管的单晶的形貌显微镜图。器件采用底栅顶接触结构,Si/SiO2(300nm)作为衬底,同时Si作为栅极,以OTS修饰的SiO2作为绝缘层,金作为源漏电极,H2DTP,NiDTP和CuDTP作为半导体层。通过物理气相传输方法在基底上制备得到H2DTP,NiDTP和CuDTP单晶,并将金源漏电极转移到晶体上,即构筑了单晶有机场效应晶体管。
图5中(a)、(b)和(c)分别为H2DTP,NiDTP和CuDTP单晶的AFM图。AFM图表明H2DTP,NiDTP和CuDTP单晶的厚度分别约为23.8nm,16.7nm和24.1nm,得到的晶体光滑均一,有利于载流子的传输。
图6(a)与(b),(c)与(d)和(e)与(f)分别为H2DTP,NiDTP和CuDTP单晶场效应晶体管的典型转移和输出曲线。该器件的阈值电压较小,迁移率约为0.16cm2V-1s-1,3.25cm2V-1s-1和1.74cm2V-1s-1且器件几乎没有栅依赖。其输出曲线也表明器件的接触电阻较小。
图7.NiDTP的光响应特性表征。其中(a,b)不同光强下的转移和输出曲线,(c,d)不同栅压下的光响应值和光敏值。该材料在不同光强下具有良好的光响应,且P值为19.85,R值为4440A W-1。
Claims (9)
1.式Ⅰ所示化合物:
所述式I中,M为Ni或Cu,R为氢;
当M为Ni,R为氢时,所述式I所示化合物具有单晶结构,属于单斜晶系,晶胞参数如下:α=90°,β=101.454(7)°,γ=90°;
当M为Cu,R为氢时,所述式I所示化合物具有单晶结构,属于单斜晶系,晶胞参数如下:α=90°,β=101.15(3)°,γ=90°。
2.一种制备权利要求1所述的式Ⅰ所示化合物的方法,包括如下步骤:
1)5,15-二噻吩基卟啉的合成
将二吡咯甲烷与如式Ⅱ所示的取代噻吩-2-甲醛溶于干燥的溶剂中,通入惰性气体后加入三氟乙酸进行反应;然后再加入2,3-二氯-5,6-二氰对苯醌进行脱氢反应,得到式Ⅲ所示的5,15-二噻吩基卟啉;
所述式Ⅱ、Ⅲ中,R与所述式I中的定义相同;
所述溶剂为二氯甲烷;
2)金属卟啉合成
所述式Ⅲ所示的5,15-二噻吩基卟啉溶解在N,N-二甲基甲酰胺中,加入乙酸金属盐进行混合反应,即得到式Ⅰ所示化合物,记为金属卟啉。
3.根据权利要求2所述的方法,其特征在于:所述二吡咯甲烷与所述式Ⅱ所示的取代噻吩-2-甲醛、2,3-二氯-5,6-二氰对苯醌的摩尔比为1:0.5~2:0.5~3。
4.根据权利要求2或3所述的方法,其特征在于:步骤1)中,加入所述三氟乙酸的反应条件如下:避光,室温,搅拌3~5h;
所述脱氢反应的条件如下:温度为室温,时间为1~5h。
5.根据权利要求2或3所述的方法,其特征在于:所述式Ⅲ所示的5,15-二噻吩基卟啉的质量与所述N,N-二甲基甲酰胺的体积比为5mg~10mg:1ml;
所述式Ⅲ所示的5,15-二噻吩基卟啉与所述乙酸金属盐的摩尔比为1:3~5。
6.根据权利要求2或3所述的方法,其特征在于:所述乙酸金属盐选自带有结晶水或无水的如下中的一种:乙酸铜、乙酸镍;
步骤2)中,所述反应在加热至溶剂回流时进行。
7.权利要求1所述的式Ⅰ所示化合物作为有机半导体材料在制备有机半导场效应晶体管和/或光电探测器件中的应用。
8.一种有机半导体场效应晶体管,其特征在于:该晶体管为含有权利要求1所述的式Ⅰ所示化合物作为有机半导体材料制成。
9.一种有机半导体场效应晶体管器件,其特征在于:该器件含有权利要求1所述的式Ⅰ所示化合物制备的有机半导场效应晶体管。
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