CN115236948B - Drying device of wafer photoetching machine - Google Patents
Drying device of wafer photoetching machine Download PDFInfo
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- CN115236948B CN115236948B CN202210924501.3A CN202210924501A CN115236948B CN 115236948 B CN115236948 B CN 115236948B CN 202210924501 A CN202210924501 A CN 202210924501A CN 115236948 B CN115236948 B CN 115236948B
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- photoetching machine
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/26—Drying gases or vapours
- B01D53/261—Drying gases or vapours by adsorption
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/26—Drying gases or vapours
- B01D53/266—Drying gases or vapours by filtration
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2253/00—Adsorbents used in seperation treatment of gases and vapours
- B01D2253/10—Inorganic adsorbents
- B01D2253/102—Carbon
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2257/00—Components to be removed
- B01D2257/80—Water
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/10—Greenhouse gas [GHG] capture, material saving, heat recovery or other energy efficient measures, e.g. motor control, characterised by manufacturing processes, e.g. for rolling metal or metal working
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- General Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Health & Medical Sciences (AREA)
- Epidemiology (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Public Health (AREA)
- Toxicology (AREA)
- Environmental & Geological Engineering (AREA)
- Atmospheric Sciences (AREA)
- Drying Of Solid Materials (AREA)
Abstract
The invention relates to a drying device of a wafer photoetching machine, which comprises: the photoetching machine is provided with a filter cartridge, a filter assembly for filtering air is arranged in the filter cartridge, a round hole is formed in the bottom of the filter cartridge, a water storage assembly extending to the inside of the round hole is fixedly arranged on the photoetching machine, water generated by the filter assembly is stored through the water storage assembly, a round hole which is circumferentially distributed is formed in one end of the filter cartridge, and a pump cylinder is fixedly arranged at the other end of the filter cartridge. The invention has novel design, the set air enters the filter cartridge, the first step of filtering is carried out on the moist air through the installed adsorption sponge, the adsorption sponge absorbs a large amount of water in the air, the second filtering is carried out on the air through the installed active carbon layer, the air outlet pipe blows the hot air into the drying pipe, the hot air entering the drying pipe dries the photoetching machine, and the humidity in the air is greatly reduced through the filter assembly in the filter cartridge, so that the drying effect of the drying device is improved.
Description
Technical Field
The invention relates to the field of photoetching machine production, in particular to a drying device of a wafer photoetching machine.
Background
Photolithography is the most important process in integrated circuits, and a photoetching machine is core equipment for manufacturing chips, and in the manufacturing of chips, the photoetching technology is needed for implementation of almost every process, so to speak, the photoetching machine is a bright bead in the semiconductor world;
exposing the thin sheet coated with the photoresist by using the light emitted by the photoetching machine through a photomask with patterns, wherein the properties of the photoresist are changed after the photoresist is exposed to light, the patterns on the photomask are copied to the thin sheet, and then the thin sheet has the function of an electronic circuit pattern;
the lithography machine drying device that is used often adopts the mode of heating air to dry, and the humidity in the air can be great range change in different environment and different weather, if the higher air of humidity heats the stoving, the higher hot air of humidity greatly reduced drying device's drying effect.
Disclosure of Invention
The present invention is directed to a drying device of a wafer lithography machine, so as to solve the above-mentioned problems in the prior art.
In order to achieve the above purpose, the present invention provides the following technical solutions:
a drying apparatus for a wafer lithography machine, comprising:
the photoetching machine is provided with a filter cartridge, a filter assembly for filtering air is arranged in the filter cartridge, a first round hole is formed in the bottom of the filter cartridge, a water storage assembly extending into the first round hole is fixedly arranged on the photoetching machine, water generated by the filter assembly is stored through the water storage assembly, a second round hole which is circumferentially distributed is formed in one end of the filter cartridge, an air suction cylinder is fixedly arranged at the other end of the filter cartridge, a supporting block for supporting the air suction cylinder is fixedly arranged at the bottom of the air suction cylinder, the supporting block is fixedly arranged on the photoetching machine, a piston block is connected in the air suction cylinder in a sliding manner, and a driving assembly connected with the piston block is arranged on the photoetching machine;
the drive assembly is connected with the filter assembly, and the drive assembly drives the filter assembly to extrude and guide moisture into the water storage assembly, and the heating assembly communicated with the heating assembly is installed on one side of the air suction cylinder, so that the inside of the photoetching machine is drier by heating the air through the heating assembly.
As a further scheme of the invention: the filter component comprises two filter plates arranged in a filter cylinder, an adsorption sponge fixedly mounted with one of the filter plates is arranged between the two filter plates, one of the filter plates is fixedly mounted with the filter cylinder, the other filter plate is slidably connected in the filter cylinder, and an activated carbon layer is fixedly mounted in the filter cylinder.
As still further aspects of the invention: the water storage component comprises a short pipe fixedly arranged on the first round hole, a water storage tank communicated with the short pipe is fixedly arranged on one side, away from the filter cartridge, of the short pipe, the water storage tank is fixedly arranged on the short pipe, a water outlet pipe communicated with the water storage tank is fixedly arranged on one side of the water storage tank, and an electromagnetic valve for controlling the opening and closing of the water outlet pipe is fixedly arranged on the water outlet pipe.
As still further aspects of the invention: the drive assembly comprises a disc which is rotationally connected with the drive assembly, a servo motor for driving the drive assembly to operate is arranged on the photoetching machine, a supporting seat for supporting the servo motor is fixedly arranged on the servo motor, the supporting seat is fixedly arranged on the photoetching machine, and a transmission belt for transmission is arranged between an output shaft of the servo motor and a rotating shaft of the disc.
As still further aspects of the invention: the disc is provided with a through sliding groove, a threaded rod is rotationally connected to the through sliding groove, a sliding block is slidingly connected to the threaded rod in the through sliding groove, a piston rod is fixedly arranged on one side of the piston block, one side of the piston rod, which is far away from the piston block, extends out of the air suction cylinder and is fixedly provided with a hinge seat, a first pushing rod is hinged to the hinge seat, and a cylinder fixedly arranged on one side, which is far away from the hinge seat, of the first pushing rod is rotationally connected with the sliding block.
As still further aspects of the invention: the second push rod is fixedly mounted on the piston rod, one end of the second push rod, far away from the piston rod, extends into the filter cartridge, a penetrating chute for the second push rod to slide is formed in the filter cartridge, the second push rod extending into the filter cartridge is fixedly mounted with the filter plate which is in the filter cartridge in a sliding manner, and a moving plate fixedly mounted with the second push rod is slidingly mounted on the filter cartridge.
As still further aspects of the invention: the heating component comprises a heating cylinder fixedly arranged on the photoetching machine, a circular tube is fixedly arranged between one side of the heating cylinder and the air extraction cylinder, one-way valves are fixedly arranged at the joint of the air extraction cylinder and the filter cylinder and on the circular tube, the installation directions of the two one-way valves are opposite, a drying tube for drying the inside of the heating cylinder is fixedly arranged on the photoetching machine, an air outlet tube is fixedly arranged between one end of the heating cylinder and the drying tube, and a plurality of heating pieces for heating air in the heating cylinder are arranged in the heating cylinder.
As still further aspects of the invention: the heating element comprises a plurality of mounting plates fixedly arranged in the heating cylinder, and an electric heating wire for heating air in the heating cylinder is fixedly arranged between the two mounting plates.
Compared with the prior art, the invention has the beneficial effects that: the invention has novel design, the set air enters the filter cartridge, the wet air is filtered in the first step through the installed adsorption sponge, a large amount of water in the air is absorbed by the adsorption sponge, the air is filtered for the second time through the installed active carbon layer, the water in the air is thoroughly filtered and cleaned through the active carbon layer, the air is pushed into the heating cartridge by the air suction cartridge, the air entering the heating cartridge is heated by the heating element, finally, the hot air is blown into the drying tube through the air outlet pipe, the hot air entering the drying tube dries the photoetching machine, the humidity in the air is greatly reduced through the filter assembly in the filter cartridge, and the drying effect of the drying device is improved.
Drawings
FIG. 1 is a schematic perspective view of an embodiment of a drying apparatus of a wafer lithography machine.
FIG. 2 is an enlarged schematic view of a pump cylinder in one embodiment of a drying apparatus for a wafer lithography machine.
FIG. 3 is a schematic view showing an internal structure of a filter cartridge in one embodiment of a drying apparatus of a wafer lithography machine.
FIG. 4 is an enlarged schematic view of a disk in one embodiment of a drying apparatus of a wafer lithography machine.
FIG. 5 is an enlarged schematic view of a heating cylinder in one embodiment of a drying apparatus of a wafer lithography machine.
FIG. 6 is a schematic diagram showing an internal structure of a heating cylinder in one embodiment of a drying apparatus of a wafer lithography machine.
FIG. 7 is a schematic view of a bottom structure of a support base in an embodiment of a drying apparatus of a wafer lithography machine.
In the figure: 1. a photoetching machine; 2. a drying tube; 3. a filter cartridge; 4. a suction cylinder; 5. a heating cylinder; 6. a servo motor; 7. a water storage tank; 8. a water outlet pipe; 9. a second push rod; 10. a moving plate; 11. a support block; 12. a piston rod; 13. a disc; 14. a support base; 15. an air outlet pipe; 16. a transmission belt; 17. a filter plate; 18. adsorbing the sponge; 19. an activated carbon layer; 20. a one-way valve; 21. a hinge base; 22. a first push rod; 23. a threaded rod; 24. moving the slide block; 25. a mounting plate; 26. heating wire.
Detailed Description
The following description of the embodiments of the present invention will be made clearly and completely with reference to the accompanying drawings, in which it is apparent that the embodiments described are only some embodiments of the present invention, but not all embodiments. All other embodiments, which can be made by those skilled in the art based on the embodiments of the invention without making any inventive effort, are intended to be within the scope of the invention.
In addition, an element in the present disclosure may be referred to as being "fixed" or "disposed" on another element or being directly on the other element or intervening elements may also be present. When an element is referred to as being "connected" to another element, it can be directly connected to the other element or intervening elements may also be present. The terms "vertical," "horizontal," "left," "right," and the like are used herein for illustrative purposes only and are not meant to be the only embodiment.
Referring to fig. 1, 2 and 3, in an embodiment of the invention, a drying apparatus of a wafer lithography machine includes:
the photoetching machine 1, be equipped with cartridge filter 3 on the photoetching machine 1, install the filter component that filters the air in the cartridge filter 3.
The filter assembly comprises two filter plates 17 arranged in the filter cartridge 3, an adsorption sponge 18 fixedly mounted with one of the filter plates 17 is arranged between the two filter plates 17, one of the filter plates 17 is fixedly mounted with the filter cartridge 3, the other filter plate 17 is slidably connected in the filter cartridge 3, and an activated carbon layer 19 is fixedly mounted in the filter cartridge 3.
The air that sets up gets into cartridge filter 3 in, carries out the first step through the absorption sponge 18 of installation to moist air and filters, and absorption sponge 18 absorbs away a large amount of moisture in the air, and the rethread activated carbon layer 19 of installation carries out the secondary to the air and filters totally thoroughly through the moisture in the air of activated carbon layer 19.
The photoetching machine 1 is fixedly provided with a water storage component which extends into the first round hole, and water generated by the filtering component is stored through the water storage component.
Referring to fig. 1, 2 and 3, the water storage assembly includes a short pipe fixedly installed on the first round hole, a water storage tank 7 communicated with the short pipe is fixedly installed on one side of the short pipe away from the filter cartridge 3, the water storage tank 7 is fixedly installed on the photoetching machine 1, a water outlet pipe 8 communicated with the water storage tank 7 is fixedly installed on one side of the water storage tank 7, and an electromagnetic valve for controlling the opening and closing of the water outlet pipe 8 is fixedly installed on the water outlet pipe 8.
Specifically, the filter assembly in the filter cartridge 3 generates a large amount of water drops during filtration, the water drops enter the water storage tank 7 below through the fixed short pipe, the water drops are stored through the water storage tank 7, the solenoid valve on one side is opened after the storage is full, and the liquid is discharged through the water outlet pipe 8 fixed on one side.
The other end of the filter cylinder 3 is fixedly provided with an air extraction cylinder 4, the bottom of the air extraction cylinder 4 is fixedly provided with a supporting block 11 for supporting the air extraction cylinder, the supporting block 11 is fixedly arranged on the photoetching machine 1, a piston block is connected in a sliding manner in the air extraction cylinder 4, and the photoetching machine 1 is provided with a driving assembly connected with the piston block.
Referring to fig. 1, 2, 4 and 7, the driving assembly includes a disc 13 rotatably connected to the lithography machine 1, a servo motor 6 for driving the device to operate is disposed on the lithography machine 1, a support seat 14 for supporting the servo motor 6 is fixedly mounted on the servo motor 6, the support seat 14 is fixedly mounted on the lithography machine 1, and a driving belt 16 for driving is mounted between an output shaft of the servo motor 6 and a rotating shaft of the disc 13.
Specifically, the servo motor 6 is operated, the servo motor 6 drives the disc 13 at one side to rotate through the installed driving belt 16, and the driving belt 16 can be driven to operate more stably when the servo motor 6 operates at a high speed through the supporting seat 14.
Referring to fig. 1, 2, 4 and 7, the disc 13 is provided with a through chute, a threaded rod 23 is rotationally connected with the through chute, the threaded rod 23 is in threaded connection with a moving slide block 24 slidably connected with the through chute, a piston rod 12 is fixedly installed on one side of the piston block, one side of the piston rod 12, which is far away from the piston block, extends out of the air suction cylinder 4 and is fixedly installed with a hinge seat 21, a first pushing rod 22 is hinged on the hinge seat 21, and a cylinder fixedly installed with the moving slide block 24 is rotationally connected on one side, which is far away from the hinge seat 21, of the first pushing rod 22.
The set threaded rod 23 rotates, the rotating threaded rod 23 drives the movable slide block 24 in threaded connection to move, when the threaded rod 23 rotates positively, the movable slide block 24 in threaded connection with the rotating threaded rod 23 approaches to the circle center of the disc 13, the movable slide block 24 enables the swing amplitude of the first push rod 22 to be smaller, the push depth of the piston rod 12 is shallower, the air outlet speed of the drying equipment is reduced, and when the threaded rod 23 rotates reversely, the movable slide block 24 in threaded connection with the rotating threaded rod 23 moves to the outer side of the disc 13, the movable slide block 24 enables the swing amplitude of the first push rod 22 to be larger, the push depth of the piston rod 12 is deeper, and the air outlet speed of the drying equipment is faster.
The driving assembly is connected with the filtering assembly, and drives the filtering assembly to extrude to guide water into the water storage assembly.
Referring to fig. 1, 3 and 5, a second push rod 9 is fixedly mounted on the piston rod 12, one end of the second push rod 9 away from the piston rod 12 extends into the filter cartridge 3, a through chute for sliding the second push rod 9 is formed on the filter cartridge 3, the second push rod 9 extending into the filter cartridge 3 is fixedly mounted with a filter plate 17 slidably connected in the filter cartridge 3, and a moving plate 10 fixedly mounted with the second push rod 9 is slidably connected to the filter cartridge 3.
Specifically, the piston rod 12 moving back and forth drives the connected second pushing rod 9 to move, the moving second pushing rod 9 pushes the connected filter plate 17 to move, the moving filter plate 17 extrudes the adsorption sponge 18, and water generated by filtration on the adsorption sponge 18 is extruded, so that the adsorption sponge 18 can be filtered for a long time.
And a heating component communicated with the air suction cylinder 4 is arranged on one side of the air suction cylinder, and air is heated by the heating component so that the inside of the photoetching machine is drier.
Referring to fig. 1, 5 and 6, the heating assembly includes a heating cylinder 5 fixedly installed on the lithography machine 1, a circular tube is fixedly installed between one side of the heating cylinder 5 and the air suction cylinder 4, a one-way valve 20 is fixedly installed at the joint of the air suction cylinder 4 and the filter cylinder 3 and on the circular tube, the installation directions of the two one-way valves 20 are opposite, a drying pipe 2 for drying the interior of the lithography machine 1 is fixedly installed, an air outlet pipe 15 is fixedly installed between one end of the heating cylinder 5 and the drying pipe 2, and a plurality of heating elements for heating air in the heating cylinder 5 are installed in the heating cylinder 5.
Specifically, the air pump 4 pushes air into the heating cylinder 5, the air entering the heating cylinder 5 is heated by the heating member, finally, the hot air is blown into the drying tube 2 through the air outlet tube 15, the hot air entering the drying tube 2 dries the lithography machine 1, the air pump 4 only can pump air through the filter cartridge 3 through the installed check valve 20, and the air pump 4 only can discharge air into the heating cylinder 5 through the installed check valve 20.
Referring to fig. 1, 5 and 6, the heating element includes a plurality of mounting plates 25 fixedly installed in the heating cylinder 5, and an electric heating wire 26 for heating air in the heating cylinder 5 is fixedly installed between the two mounting plates 25.
The plurality of heating wires 26 arranged in the heating cylinder 5 are electrified, the electrified heating wires 26 generate heat, and the passing air continuously takes away the heat.
It will be evident to those skilled in the art that the invention is not limited to the details of the foregoing illustrative embodiments, and that the present invention may be embodied in other specific forms without departing from the spirit or essential characteristics thereof. The present embodiments are, therefore, to be considered in all respects as illustrative and not restrictive, the scope of the invention being indicated by the appended claims rather than by the foregoing description, and all changes which come within the meaning and range of equivalency of the claims are therefore intended to be embraced therein. Any reference sign in a claim should not be construed as limiting the claim concerned.
Furthermore, it should be understood that although the present disclosure describes embodiments, not every embodiment is provided with a separate embodiment, and that this description is provided for clarity only, and that the disclosure is not limited to the embodiments described in detail below, and that the embodiments described in the examples may be combined as appropriate to form other embodiments that will be apparent to those skilled in the art.
Claims (4)
1. A drying device of a wafer photoetching machine is characterized by comprising
The photoetching machine (1), be equipped with cartridge filter (3) on photoetching machine (1), install in cartridge filter (3) and carry out filterable filter module to the air, round hole No. one has been seted up to the bottom of cartridge filter (3), fixedly mounted on photoetching machine (1) is extended to the retaining subassembly in the round hole No. one, through retaining subassembly stores the water that filter module produced, just second round hole that is circumference distribution is seted up to one end of cartridge filter (3), the other end fixed mounting of cartridge filter (3) has pump bowl (4), the bottom fixed mounting of pump bowl (4) has supporting shoe (11) to carry out its support, supporting shoe (11) fixed mounting is in on photoetching machine (1), sliding connection has the piston piece in pump bowl (4), install on photoetching machine (1) with the drive assembly of piston piece connection.
The driving assembly is connected with the filtering assembly, the driving assembly drives the filtering assembly to extrude and guide water into the water storage assembly, a heating assembly communicated with the air suction cylinder (4) is arranged on one side of the air suction cylinder, and air is heated by the heating assembly to enable the inside of the photoetching machine to be drier; the filter assembly comprises two filter plates (17) arranged in the filter cylinder (3), an adsorption sponge (18) fixedly mounted with one filter plate (17) is arranged between the two filter plates (17), one filter plate (17) is fixedly mounted with the filter cylinder (3), the other filter plate (17) is slidingly connected in the filter cylinder (3), and an active carbon layer (19) is fixedly mounted in the filter cylinder (3); the driving assembly comprises a disc (13) rotatably connected to the photoetching machine (1), a servo motor (6) for driving the device to operate is arranged on the photoetching machine (1), a supporting seat (14) for supporting the servo motor (6) is fixedly arranged on the servo motor (6), the supporting seat (14) is fixedly arranged on the photoetching machine (1), and a transmission belt (16) for transmission is arranged between an output shaft of the servo motor (6) and a rotating shaft of the disc (13); the disc (13) is provided with a through sliding groove, a threaded rod (23) is rotationally connected to the through sliding groove, the threaded rod (23) is in threaded connection with a movable sliding block (24) which is in sliding connection with the through sliding groove, one side of the piston block is fixedly provided with a piston rod (12), one side of the piston rod (12) away from the piston block extends out of the air suction cylinder (4) and is fixedly provided with a hinging seat (21), a first pushing rod (22) is hinged to the hinging seat (21), and one side of the first pushing rod (22) away from the hinging seat (21) is rotationally connected with a cylinder fixedly installed with the movable sliding block (24); the utility model discloses a filter cartridge, including cartridge filter (3), filter cartridge, piston rod (3), piston rod (12) are gone up fixed mounting has second catch bar (9), second catch bar (9) keep away from the one end of piston rod (12) extends to in cartridge filter (3), offer on cartridge filter (3) confession second catch bar (9) gliding run through the spout, extend to in cartridge filter (3) second catch bar (9) and sliding connection are in filter (17) fixed mounting in cartridge filter (3), sliding connection have on cartridge filter (3) with second catch bar (9) fixed mounting's movable plate (10).
2. The drying device of a wafer lithography machine according to claim 1, wherein the water storage assembly comprises a short pipe fixedly installed on the first round hole, a water storage tank (7) communicated with the short pipe is fixedly installed on one side, away from the filter cartridge (3), of the short pipe, the water storage tank (7) is fixedly installed on the lithography machine (1), a water outlet pipe (8) communicated with the water storage tank (7) is fixedly installed on one side of the water storage tank (7), and an electromagnetic valve for controlling opening and closing of the water outlet pipe (8) is fixedly installed on the water outlet pipe.
3. The drying device of a wafer lithography machine according to claim 1, wherein the heating assembly comprises a heating cylinder (5) fixedly installed on the lithography machine (1), a circular tube is fixedly installed between one side of the heating cylinder (5) and the air suction cylinder (4), a one-way valve (20) is fixedly installed at the joint of the air suction cylinder (4) and the filter cylinder (3) and on the circular tube, the installation directions of the two one-way valves (20) are opposite, a drying tube (2) for drying the interior of the lithography machine (1) is fixedly installed, an air outlet tube (15) is fixedly installed between one end of the heating cylinder (5) and the drying tube (2), and a plurality of heating elements for heating air in the heating cylinder (5) are installed in the heating cylinder (5).
4. A drying apparatus of a wafer lithography machine according to claim 3, wherein the heating element comprises a plurality of mounting plates (25) fixedly mounted in the heating cylinder (5), and heating wires (26) fixedly mounted between the two mounting plates (25) for heating air in the heating cylinder (5).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202210924501.3A CN115236948B (en) | 2022-08-02 | 2022-08-02 | Drying device of wafer photoetching machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202210924501.3A CN115236948B (en) | 2022-08-02 | 2022-08-02 | Drying device of wafer photoetching machine |
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| CN115236948A CN115236948A (en) | 2022-10-25 |
| CN115236948B true CN115236948B (en) | 2023-08-15 |
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| CN202210924501.3A Active CN115236948B (en) | 2022-08-02 | 2022-08-02 | Drying device of wafer photoetching machine |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN115654886B (en) * | 2022-10-28 | 2023-08-22 | 江苏晶杰光电科技有限公司 | Quick drying device is used in wafer processing |
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| JP2000036481A (en) * | 1998-07-17 | 2000-02-02 | Sumitomo Metal Ind Ltd | Drying method for semiconductor substrate and drying device therefor |
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| CN103353209A (en) * | 2013-06-20 | 2013-10-16 | 京东方科技集团股份有限公司 | Vacuum drying device and photolithographic process |
| CN207119227U (en) * | 2017-06-01 | 2018-03-20 | 赵莉莉 | Removable wash liq filters air cleaning unit and has its Cress equipment |
| CN110310904A (en) * | 2018-03-20 | 2019-10-08 | 株式会社斯库林集团 | Decompression dry device, substrate board treatment and decompression drying method |
-
2022
- 2022-08-02 CN CN202210924501.3A patent/CN115236948B/en active Active
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000036481A (en) * | 1998-07-17 | 2000-02-02 | Sumitomo Metal Ind Ltd | Drying method for semiconductor substrate and drying device therefor |
| CN1830039A (en) * | 2003-08-29 | 2006-09-06 | 东京毅力科创株式会社 | Method and system for drying a substrate |
| JP2009260034A (en) * | 2008-04-16 | 2009-11-05 | Sokudo Co Ltd | Substrate drying device and substrate treatment apparatus equipped with the same |
| CN103353209A (en) * | 2013-06-20 | 2013-10-16 | 京东方科技集团股份有限公司 | Vacuum drying device and photolithographic process |
| CN207119227U (en) * | 2017-06-01 | 2018-03-20 | 赵莉莉 | Removable wash liq filters air cleaning unit and has its Cress equipment |
| CN110310904A (en) * | 2018-03-20 | 2019-10-08 | 株式会社斯库林集团 | Decompression dry device, substrate board treatment and decompression drying method |
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| Publication number | Publication date |
|---|---|
| CN115236948A (en) | 2022-10-25 |
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