CN115060658A - Dual-vortex wave plate Mueller matrix ellipsometer and measurement method thereof - Google Patents
Dual-vortex wave plate Mueller matrix ellipsometer and measurement method thereof Download PDFInfo
- Publication number
- CN115060658A CN115060658A CN202210640130.6A CN202210640130A CN115060658A CN 115060658 A CN115060658 A CN 115060658A CN 202210640130 A CN202210640130 A CN 202210640130A CN 115060658 A CN115060658 A CN 115060658A
- Authority
- CN
- China
- Prior art keywords
- light intensity
- vortex
- wave plate
- intensity modulation
- sample
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000011159 matrix material Substances 0.000 title claims abstract description 73
- 238000000691 measurement method Methods 0.000 title claims abstract description 10
- 230000010287 polarization Effects 0.000 claims abstract description 35
- 238000004458 analytical method Methods 0.000 claims abstract description 24
- 238000001514 detection method Methods 0.000 claims abstract description 11
- 238000005070 sampling Methods 0.000 claims abstract description 3
- 230000001419 dependent effect Effects 0.000 claims description 6
- 238000002310 reflectometry Methods 0.000 claims description 3
- 238000005259 measurement Methods 0.000 abstract description 24
- 238000000034 method Methods 0.000 abstract description 14
- 230000005540 biological transmission Effects 0.000 description 24
- 230000003287 optical effect Effects 0.000 description 7
- 230000000694 effects Effects 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 238000001228 spectrum Methods 0.000 description 3
- 238000004630 atomic force microscopy Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000000572 ellipsometry Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 238000011160 research Methods 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- 238000004364 calculation method Methods 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 230000001066 destructive effect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000000284 extract Substances 0.000 description 1
- 238000010191 image analysis Methods 0.000 description 1
- 238000005305 interferometry Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000011326 mechanical measurement Methods 0.000 description 1
- 230000028161 membrane depolarization Effects 0.000 description 1
- 238000004377 microelectronic Methods 0.000 description 1
- 239000002086 nanomaterial Substances 0.000 description 1
- 238000004626 scanning electron microscopy Methods 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/21—Polarisation-affecting properties
Landscapes
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
Abstract
A dual-vortex wave plate Mueller matrix ellipsometer and a measurement method thereof are provided, the dual-vortex wave plate Mueller matrix ellipsometer comprises a polarization modulation unit, and the polarization modulation unit comprises: the polarization detection modulation unit comprises a second vortex quarter-wave plate and an analyzer; the image sensor is suitable for sampling the emergent light beam of the analyzer to obtain a light intensity modulation image, and the light intensity modulation image is changed in a light and shade alternative mode along with the azimuth angle of the light intensity modulation image; the first analysis unit is suitable for obtaining a light intensity modulation function according to the light intensity modulation image; the second analysis unit is suitable for carrying out Fourier analysis on the light intensity modulation function to obtain a Fourier expression; the third analysis unit is suitable for obtaining the Mueller matrix of the sample to be detected according to the coefficient in the Fourier expression. The double-vortex wave plate Mueller matrix ellipsometer has the advantages of simple structure, good stability, high measurement speed and simple resolving process.
Description
Technical Field
The invention relates to the technical field of optics, in particular to a double-vortex wave plate Mueller matrix ellipsometer and a measuring method thereof.
Background
The ellipsometer analyzes and extracts the film thickness, optical constant and nano-structure characteristic dimension of the sample to be measured and waits for measuring parameters by measuring the change of the polarization state of the polarized light before and after the polarized light is reflected or transmitted by the sample to be measured. Compared with other optical or mechanical measurement methods such as interferometry, Atomic Force Microscopy (AFM), Scanning Electron Microscopy (SEM), etc., ellipsometry has the advantages of fast measurement speed, high measurement accuracy, capability of simultaneously measuring various parameters such as film thickness and refractive index, non-destructive sample, etc., which makes ellipsometry an indispensable measurement instrument in the fields of material science, microelectronics, biomedical, etc.
The traditional ellipsometer can only obtain two kinds of ellipsometric parameters of amplitude ratio and phase difference (only corresponding to partial elements of a mueller matrix of a sample to be measured) in measurement, and the mueller matrix ellipsometer can realize measurement of all elements of the mueller matrix of the sample to be measured, so that more abundant optical characteristics of anisotropy, depolarization effect and the like of the sample can be obtained, and therefore, the ellipsometer has higher application value.
The current scheme for implementing the mueller matrix ellipsometer mainly has two types of time sequence modulation and wavelength modulation. Most of the existing commercial mueller matrix ellipsometers adopt a time sequence modulation method to measure the mueller matrix of a sample to be measured, for example, ME-L mueller matrix ellipsometers developed by wuhan Yilight science and technology ltd in China synchronously rotate two compensators in a polarizing arm and an analyzing arm at a constant angular velocity ratio, so that continuous modulation and demodulation of polarization states of an incident beam and an emergent beam are realized, and all mueller matrix elements of the sample to be measured are obtained by performing fourier analysis on a light intensity signal obtained by measurement; the 150XT type mueller matrix ellipsometer developed by Hinds Instruments in the united states uses two photoelastic modulation devices (PEMs) in the polarization arm and the polarization analyzing arm to modulate and demodulate the polarization state of the light beam. The rotary time sequence modulation type muller matrix ellipsometer relates to the mechanical rotation of optical elements, the system structure is complex, and the stability of a light path is poor; the Mueller matrix ellipsometer based on the photoelastic modulator does not need to be provided with a rotating device, the stability of a light path and the measurement speed are greatly improved, but the Mueller matrix ellipsometer is limited by the photoelastic modulator, the system structure is complex, the cost is high, and the Mueller matrix ellipsometer is sensitive to wavelength drift of a light source and temperature change of a measurement environment. In addition, the time-series modulation-based mueller matrix ellipsometer takes sub-second or even seconds to complete a single measurement, which limits its application in fast-changing dynamic measurement. The wavelength modulation type Mueller matrix ellipsometer modulates Mueller spectrum information of a sample to be measured onto a plurality of high-frequency carriers by utilizing a multi-stage wave plate which is arranged according to a specific thickness ratio and a specific azimuth angle, and further obtains Mueller matrix elements of the sample to be measured by processing measured spectra in a channel division mode. The wavelength modulation type muller matrix ellipsometer has the advantages of high measurement speed, simple optical path structure, no interference of moving devices and the like, but the multiplexing of multiple information brings huge challenges to the muller spectrum reconstruction, a simple and efficient reconstruction and calibration method is absent at present, and the method is still in the stage of principle research and technical development.
In summary, it is necessary to research a muller matrix ellipsometer with simple system structure, good stability, fast measurement speed, and simple calculation process.
Disclosure of Invention
The invention aims to provide a double-vortex wave plate Mueller matrix ellipsometer and a measuring method thereof, so that the double-vortex wave plate Mueller matrix ellipsometer is simple in structure, good in stability, high in measuring speed and simple in calculating process.
In order to solve the technical problem, the invention provides a dual-vortex wave plate mueller matrix ellipsometer, which comprises: a polarization modulation unit, the polarization modulation unit comprising: the polarizer is positioned between the light source and the first vortex quarter-wave plate; the sample table is suitable for placing a sample to be detected; the polarization analyzing and modulating unit comprises a second vortex quarter-wave plate and an analyzer; the light passing through the first vortex quarter-wave plate is suitable for being reflected or transmitted by the sample to be detected, and the light reflected or transmitted by the sample to be detected is suitable for sequentially passing through the second vortex quarter-wave plate and the analyzer; an image sensor; the image sensor is suitable for sampling the emergent light beam of the analyzer to obtain a light intensity modulation image, and the light intensity modulation image is alternately changed in light and shade along with the azimuth angle of the light intensity modulation image; the first analysis unit is suitable for obtaining a light intensity modulation function according to the light intensity modulation image, and the light intensity modulation function takes the azimuth angle of the light intensity modulation image as an independent variable and takes the light intensity value of the light intensity modulation image as a dependent variable; the second analysis unit is suitable for carrying out Fourier analysis on the light intensity modulation function to obtain a Fourier expression of the light intensity modulation function; and the third analysis unit is suitable for acquiring the Mueller matrix of the sample to be detected according to the coefficient in the Fourier expression of the light intensity modulation function.
Optionally, the order p of the first vortex quarter-wave plate and the order q of the second vortex quarter-wave plate satisfy that p and q are both positive integers, q is greater than 2p, and p and q are relatively prime.
Optionally, the sample stage has a stage center axis perpendicular to a surface of the sample stage; the arrangement directions of the light source, the polarizer and the first vortex quarter-wave plate in the polarization modulation unit and the arrangement directions of the second vortex quarter-wave plate and the analyzer in the polarization detection modulation unit are symmetrical relative to the central axis of the table board.
Optionally, the method further includes: the first position adjusting unit is suitable for adjusting the arrangement direction of the light source, the polarizer and the first vortex quarter-wave plate in the polarization modulation unit; the second position adjusting unit is suitable for adjusting the arrangement direction of the second vortex quarter-wave plate and the analyzer; and the third position regulator is suitable for switching between a horizontal placing position of the sample to be measured on the sample table and a vertical placing position of the sample to be measured on the sample table.
Optionally, when the sample to be detected is a transmissive sample, the thickness direction of the sample to be detected is parallel to the surface of the sample stage, and the arrangement directions of the light source, the polarizer and the first vortex quarter-wave plate and the arrangement directions of the second vortex quarter-wave plate and the analyzer are parallel to the surface of the sample stage; when the sample to be detected is a reflective sample, the thickness direction of the sample to be detected is perpendicular to the surface of the sample stage, the included angle between the arrangement direction of the light source, the polarizer and the first vortex quarter-wave plate and the surface of the sample stage is larger than zero, and the included angle between the arrangement direction of the second vortex quarter-wave plate and the analyzer and the surface of the sample stage is larger than zero.
The invention also provides a measuring method, and the double-vortex wave plate Mueller matrix ellipsometer comprises the following steps: step S1, placing the sample to be tested on a sample table; step S2, turning on a light source, and adjusting the arrangement directions of the light source, the polarizer and the first vortex quarter-wave plate in the polarization modulation unit and the arrangement directions of the second vortex quarter-wave plate and the analyzer in the polarization detection modulation unit according to the transmissivity and the reflectivity of the sample to be detected; step S3, the image sensor samples the emergent light beam of the analyzer to obtain a light intensity modulation image, and the light intensity modulation image is alternately changed in light and shade along with the azimuth angle of the light intensity modulation image; step S4, analyzing the light intensity modulation image to obtain a light intensity modulation function, wherein the light intensity modulation function takes the azimuth angle of the light intensity modulation image as an independent variable and takes the light intensity value of the light intensity modulation image as a dependent variable; step S5, carrying out Fourier analysis on the light intensity modulation function to obtain a Fourier expression of the light intensity modulation function; and step S6, obtaining the Mueller matrix of the sample to be measured according to the coefficient in the Fourier expression of the light intensity modulation function.
Optionally, the light intensity modulation function is:
the Fourier expression of the light intensity modulation function is as follows:
wherein m is 11 ＝1，m 12 ＝(2a 2p -2a 2q-2p -2a 2q+2p )/(a 0 -a 2p +a 2q-2p -a 2q +a 2q+2p )；
m 13 ＝(2b 2p +2b 2q-2p -2b 2q+2p )/(a 0 -a 2p +a 2q-2p -a 2q +a 2q+2p )；
m 14 ＝(b p +b 2q-p -b 2q+p )/(a 0 -a 2p +a 2q-2p -a 2q +a 2q+2p )；
m 21 ＝(-2a 2q-2p +2a 2q -2a 2q+2p )/(a 0 -a 2p +a 2q-2p -a 2q +a 2q+2p )；
m 22 ＝(4a 2q-2p +4a 2q+2p )/(a 0 -a 2p +a 2q-2p -a 2q +a 2q+2p )；
m 23 ＝(-4b 2q-2p +4b 2q+2p )/(a 0 -a 2p +a 2q-2p -a 2q +a 2q+2p )；
m 24 ＝(-2b 2q-p +2b 2q+p )/(a 0 -a 2p +a 2q-2p -a 2q +a 2q+2p )；
m 31 ＝(-2b 2q-2p +2b 2q -2b 2q+2p )/(a 0 -a 2p +a 2q-2p -a 2q +a 2q+2p )；
m 32 ＝(4b 2q-2p +4b 2q+2p )/(a 0 -a 2p +a 2q-2p -a 2q +a 2q+2p )；
m 33 ＝(4a 2q-2p -4a 2q+2p )/(a 0 -a 2p +a 2q-2p -a 2q +a 2q+2p )；
m 34 ＝(2a 2q-p -2a 2q+p )/(a 0 -a 2p +a 2q-2p -a 2q +a 2q+2p )；
m 41 ＝(2b q-2p -b q )/(a 0 -a 2p +a 2q-2p -a 2q +a 2q+2p )；
m 42 ＝(-2b q-2p -2b q+2p )/(a 0 -a 2p +a 2q-2p -a 2q +a 2q+2p )；
m 43 ＝(-2a q-2p +2a q+2p )/(a 0 -a 2p +a 2q-2p -a 2q +a 2q+2p )；
m 44 ＝(a q+p -a q-p )/(a 0 -a 2p +a 2q-2p -a 2q +a 2q+2p )；
Wherein,
the light intensity value of the image is modulated for the light intensity,
m11, m12, m13, m14, m21, m22, m23, m24, m31, m32, m33, m34, m41, m42, m43, and m44 are elements of the mueller matrix, which is the azimuth angle of the light intensity modulation image; p is the order of the first vortex quarter wave plate and q is the order of the second vortex quarter wave plate; a is 0 For constant terms in the Fourier expression of the light intensity modulation function, p, 2p, q-p, q + p, q +2p, 2q-p, 2q + p, 2q +2p are 12 non-zero harmonic orders in the Fourier expression of the light intensity modulation function, a n Being the coefficient of the cosine term in the Fourier expression of the light intensity modulation function, b n Is the coefficient of the sinusoidal term in the fourier expression of the light intensity modulation function.
The technical scheme of the invention has the following advantages:
according to the double-vortex wave plate Mueller matrix ellipsometer provided by the technical scheme, the modulation and demodulation of the polarization states of an incident beam and a reflected (or transmitted) beam are realized by utilizing the two vortex quarter-wave plates with a certain order ratio, all Mueller matrices of a sample to be detected can be obtained by single-time image shooting, the detection speed is high, and the double-vortex wave plate Mueller matrix ellipsometer is suitable for detection occasions with high real-time requirements.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings used in the description of the embodiments or the prior art will be briefly described below, and it is obvious that the drawings in the following description are some embodiments of the present invention, and other drawings can be obtained by those skilled in the art without creative efforts.
Fig. 1 is a schematic structural diagram of a double-vortex wave plate mueller matrix ellipsometer according to an embodiment of the present invention;
fig. 2 is a schematic structural diagram of a dual-vortex wave plate mueller matrix ellipsometer according to another embodiment of the present invention;
FIG. 3 is a flow chart of a measurement method of a double-vortex wave plate Mueller matrix ellipsometer according to the present invention;
FIG. 4 is a light intensity modulation image acquired by an image sensor when the double-vortex wave plate Mueller matrix ellipsometer measures an air sample;
FIG. 5 is a theoretical light intensity modulation image obtained when the double-vortex wave plate Mueller matrix ellipsometer of the present invention measures an air sample;
FIG. 6 is a graph of a light intensity modulation function corresponding to a light intensity modulation image collected by an image sensor and a graph of a light intensity modulation function corresponding to a theoretical light intensity modulation image;
FIG. 7 is a light intensity modulation image measured on a linear polarizer with a light transmission direction at 0 degrees;
FIG. 8 is a simulated light intensity modulation image measured on a linear polarizer with a light transmission direction at 0 degrees;
FIG. 9 is a graph of intensity modulation measured for a linear polarizer at 90 degrees to the transmission direction;
FIG. 10 is a simulated light intensity modulation image measured on a linear polarizer whose light transmission direction is at 90 degrees;
FIG. 11 is a graph showing the intensity modulation measured on a linear polarizer at 135 degrees in the transmission direction;
FIG. 12 is a simulated light intensity modulation image measured on a linear polarizer with a light transmission direction of 135 degrees;
FIG. 13 is a graph of intensity modulation measured for a quarter wave plate at 0 degrees in the fast axis direction;
FIG. 14 is a simulated intensity modulation image measured for a quarter-wave plate at 0 degrees in the fast axis direction;
FIG. 15 is a graph of intensity modulation measured for a quarter wave plate at 45 degrees to the fast axis;
FIG. 16 is a simulated intensity modulation image measured for a quarter-wave plate positioned at 45 degrees in the fast axis direction;
FIG. 17 is a graph of the light intensity modulation function corresponding to the light intensity modulated image of FIG. 7 and the simulated light intensity modulated image of FIG. 8;
FIG. 18 is a graph of the light intensity modulation function corresponding to the light intensity modulated image of FIG. 9 and the simulated light intensity modulated image of FIG. 10;
FIG. 19 is a graph of the light intensity modulation function corresponding to the light intensity modulated image of FIG. 11 and the simulated light intensity modulated image of FIG. 12;
FIG. 20 is a graph of the intensity modulation function corresponding to the light intensity modulated image of FIG. 13 and the simulated light intensity modulated image of FIG. 14;
fig. 21 is a light intensity modulation function curve corresponding to the light intensity modulation image in fig. 15 and a light intensity modulation function curve corresponding to the simulated light intensity modulation image in fig. 16.
Detailed Description
The technical solutions of the present invention will be described clearly and completely with reference to the accompanying drawings, and it should be understood that the described embodiments are some, but not all embodiments of the present invention. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
In the description of the present invention, it should be noted that the terms "center", "upper", "lower", "left", "right", "vertical", "horizontal", "inner", "outer", etc., indicate orientations or positional relationships based on the orientations or positional relationships shown in the drawings, and are only for convenience of description and simplicity of description, but do not indicate or imply that the device or element being referred to must have a particular orientation, be constructed and operated in a particular orientation, and thus, should not be construed as limiting the present invention. Furthermore, the terms "first," "second," and "third" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance.
In addition, the technical features involved in the different embodiments of the present invention described below may be combined with each other as long as they do not conflict with each other.
An embodiment of the present invention provides a dual-vortex wave plate mueller matrix ellipsometer, which is combined with fig. 1 and fig. 2, and includes:
a polarization modulation unit 1, the polarization modulation unit 1 comprising: a light source 101, a polarizer 102 and a first vortex quarter wave plate 103, wherein the polarizer 102 is located between the light source 101 and the first vortex quarter wave plate 103;
the sample table 2 is suitable for placing a sample 201 to be detected on the sample table 2;
an analyzer-modulator unit 3, wherein the analyzer-modulator unit 3 comprises a second vortex quarter-wave plate 301 and an analyzer 302;
the light passing through the first vortex quarter wave plate 103 is suitable for being reflected or transmitted by the sample 201 to be detected, and the light reflected or transmitted by the sample 201 to be detected is suitable for sequentially passing through the second vortex quarter wave plate 301 and the analyzer 302;
an image sensor 401 adapted to sample the outgoing light beam of the analyzer to obtain a light intensity modulated image, the light intensity modulated image alternating in brightness with an azimuth angle of the light intensity modulated image;
the first analysis unit is suitable for obtaining a light intensity modulation function according to the light intensity modulation image, and the light intensity modulation function takes the azimuth angle of the light intensity modulation image as an independent variable and takes the light intensity value of the light intensity modulation image as a dependent variable; the second analysis unit is suitable for carrying out Fourier analysis on the light intensity modulation function to obtain a Fourier expression of the light intensity modulation function; and the third analysis unit is suitable for acquiring the Mueller matrix of the sample to be detected according to the coefficient in the Fourier expression of the light intensity modulation function.
Referring to fig. 1 and 2, the computer 402 includes a first analysis unit, a second analysis unit, and a third analysis unit.
Referring to fig. 1, when the sample 201 to be detected is a reflective sample, the thickness direction of the sample 201 to be detected is perpendicular to the surface of the sample stage 2, the included angle between the arrangement direction of the light source 101, the polarizer 102 and the first vortex quarter-wave plate 103 and the surface of the sample stage 2 is greater than zero, and the included angle between the arrangement direction of the second vortex quarter-wave plate 301 and the analyzer 302 and the surface of the sample stage 2 is greater than zero. Such as a film sample.
Referring to fig. 2, when the sample 201 to be measured is a transmissive sample, the thickness direction of the sample 201 to be measured is parallel to the surface of the sample stage 2, and the arrangement directions of the light source 101, the polarizer 102 and the first vortex quarter-wave plate 103 and the arrangement directions of the second vortex quarter-wave plate 301 and the analyzer 302 are parallel to the surface of the sample stage 2. Such as wave plates, polarizers, etc.
The light source 101 emits a collimated light beam having a uniform light intensity distribution. The light source 101 may be a laser light source. The polarizer 102 and the first vortex quarter-wave plate 103 are sequentially arranged along the propagation direction of the light emitted by the light source 101. The light emitted from the light source 101 passes through the polarizer 102 and becomes horizontally linearly polarized light. The light emitted by the first vortex quarter-wave plate 103 is a vector polarized light field with the polarization state changing along with the azimuth rule.
The second vortex quarter wave plate 301 and the analyzer 302 are sequentially arranged along the propagation direction of the light reflected or transmitted by the sample 201 to be measured.
In the embodiment, the order p of the first vortex quarter-wave plate and the order q of the second vortex quarter-wave plate satisfy that p and q are both positive integers, q is greater than 2p, and p and q are relatively prime. Reasons and benefits of such an arrangement include: and ensuring that enough non-zero Fourier coefficients exist in the Fourier expression of the light intensity modulation function so as to solve all Mueller matrix elements of the sample to be detected.
The sample table top 2 is provided with a table top central axis vertical to the surface of the sample table 2; the arrangement directions of the light source 101, the polarizer 102 and the first vortex quarter-wave plate 103 in the polarization modulation unit 1 and the arrangement directions of the second vortex quarter-wave plate 301 and the analyzer 302 in the polarization modulation unit 3 are symmetrical relative to the central axis of the table top.
The intensity of the outgoing beam of the analyzer 302 varies alternately with azimuthal light. The outgoing beam of the analyzer 302 is captured by an image sensor 401, and the image sensor 401 samples the outgoing beam of the analyzer 302 to obtain a light intensity modulation image, which changes alternately in brightness with the azimuth angle of the light intensity modulation image.
The double-vortex wave plate Mueller matrix ellipsometer further comprises: a first position adjusting unit (not shown) adapted to adjust the arrangement direction of the light source, the polarizer and the first vortex quarter-wave plate in the polarization modulation unit; a second position adjustment unit (not shown) adapted to adjust the arrangement direction of the second swirling quarter wave plate and the analyzer; a third position adjuster (not shown) adapted to switch between a horizontally placed position of the sample to be measured on the sample stage and a vertically placed position of the sample to be measured on the sample stage.
The first position adjustment adjusts the arrangement directions of the light source, the polarizer and the first vortex quarter-wave plate in the polarization modulation unit, and then adjusts the included angle between the arrangement directions of the light source, the polarizer and the first vortex quarter-wave plate and the central axis of the table board, and accordingly, the incident angle of the light beam incident to the surface of the sample 201 to be measured can be adjusted.
The second position adjusting unit adjusts the arrangement direction of the second vortex quarter-wave plate and the analyzer and the included angle between the arrangement direction of the second vortex quarter-wave plate and the analyzer and the central shaft of the table board. The second position adjustment unit can also adjust the position of the image sensor 401.
The transmission axis direction of the polarizer 102 is set at 0 degree, and the initial fast axis direction of the first vortex quarter-wave plate 103 is set at 0 degree. The initial fast axis direction of the second vortex quarter wave plate 301 is set at 0 degrees and the transmission axis direction of the analyzer 302 is set at 0 degrees. The fast axis direction of the first vortex quarter wave plate 103 varies with the azimuthal regularity of the first vortex quarter wave plate 103, and the fast axis direction when the azimuthal angle of the first vortex quarter wave plate 103 is 0 degrees is referred to as the initial fast axis direction of the first vortex quarter wave plate 103. The fast axis direction of the second vortex quarter wave plate 301 varies with the azimuthal law of the second vortex quarter wave plate 301, and the fast axis direction when the second vortex quarter wave plate 301 has an azimuthal angle of 0 degree is referred to as the initial fast axis direction of the second vortex quarter wave plate 301. Reference to 0 degrees in this paragraph means that the horizontal right direction is defined as the 0 degree direction, looking against the direction of light propagation.
Another embodiment of the present invention further provides a measurement method, which uses the above-mentioned dual-vortex wave plate mueller matrix ellipsometer, including:
step S1, placing the sample 201 to be detected on the sample platform 2;
step S2, turning on the light source 101, and adjusting the arrangement directions of the light source 101, the polarizer 102 and the first vortex quarter-wave plate 103 in the polarization modulation unit 1 and the arrangement directions of the second vortex quarter-wave plate 301 and the analyzer 302 in the polarization detection modulation unit 2 according to the transmissivity and reflectivity of the sample 2 to be detected;
step S3, the image sensor 401 samples the emergent light beam of the analyzer 302 to obtain a light intensity modulation image, and the light intensity modulation image is alternately changed in light and shade along with the azimuth angle of the light intensity modulation image;
step S4, analyzing the light intensity modulation image to obtain a light intensity modulation function, wherein the light intensity modulation function takes the azimuth angle of the light intensity modulation image as an independent variable and takes the light intensity value of the light intensity modulation image as a dependent variable;
step S5, carrying out Fourier analysis on the light intensity modulation function to obtain a Fourier expression of the light intensity modulation function;
and step S6, obtaining the Mueller matrix of the sample to be tested according to the coefficient in the Fourier expression of the light intensity modulation function.
When the sample to be detected is a transmissive sample, the thickness direction of the sample to be detected is parallel to the surface of the sample stage, and the arrangement directions of the light source, the polarizer and the first vortex quarter-wave plate and the arrangement directions of the second vortex quarter-wave plate and the analyzer are parallel to the surface of the sample stage, namely a straight-through light path is adopted; when the sample to be detected is a reflective sample, the thickness direction of the sample to be detected is perpendicular to the surface of the sample stage, the included angles between the arrangement directions of the light source, the polarizer and the first vortex quarter-wave plate and the surface of the sample stage are larger than zero, the included angles between the arrangement directions of the second vortex quarter-wave plate and the analyzer and the surface of the sample stage are larger than zero, and the light beams of the light source, the polarizer and the first vortex quarter-wave plate are adjusted to be obliquely incident to the surface of the sample to be detected at a certain incident angle.
The light intensity modulation function is:
The Fourier expression of the light intensity modulation function is as follows:
in the expression, a 0 The order is constant, only the order of p, 2p, q-p, q + p, q +2p, 2q-2p, 2q-p, 2q +2p are not zero, the Fourier coefficients of the cosine terms corresponding to the harmonic orders not being zero are a p 、a 2p 、a q-2p 、a q-p 、a q 、a q+p 、a q+2p 、a 2q-2p 、a 2q-p 、a 2q 、a 2q+p 、a 2q+2p The Fourier coefficients of the sine terms corresponding to the harmonic orders which are not zero are respectively b p 、b 2p 、b q-2p 、b q-p 、b q 、b q+p 、b q+2p 、b 2q-2p 、b 2q-p 、b 2q 、b 2q+p 、b 2q+2p 。
Wherein m is 11 ＝1，m 12 ＝(2a 2p -2a 2q-2p -2a 2q+2p )/(a 0 -a 2p +a 2q-2p -a 2q +a 2q+2p )；
m 13 ＝(2b 2p +2b 2q-2p -2b 2q+2p )/(a 0 -a 2p +a 2q-2p -a 2q +a 2q+2p )；
m 14 ＝(b p +b 2q-p -b 2q+p )/(a 0 -a 2p +a 2q-2p -a 2q +a 2q+2p )；
m 21 ＝(-2a 2q-2p +2a 2q -2a 2q+2p )/(a 0 -a 2p +a 2q-2p -a 2q +a 2q+2p )；
m 22 ＝(4a 2q-2p +4a 2q+2p )/(a 0 -a 2p +a 2q-2p -a 2q +a 2q+2p )；
m 23 ＝(-4b 2q-2p +4b 2q+2p )/(a 0 -a 2p +a 2q-2p -a 2q +a 2q+2p )；
m 24 ＝(-2b 2q-p +2b 2q+p )/(a 0 -a 2p +a 2q-2p -a 2q +a 2q+2p )；
m 31 ＝(-2b 2q-2p +2b 2q -2b 2q+2p )/(a 0 -a 2p +a 2q-2p -a 2q +a 2q+2p )；
m 32 ＝(4b 2q-2p +4b 2q+2p )/(a 0 -a 2p +a 2q-2p -a 2q +a 2q+2p )；
m 33 ＝(4a 2q-2p -4a 2q+2p )/(a 0 -a 2p +a 2q-2p -a 2q +a 2q+2p )；
m 34 ＝(2a 2q-p -2a 2q+p )/(a 0 -a 2p +a 2q-2p -a 2q +a 2q+2p )；
m 41 ＝(2b q-2p -b q )/(a 0 -a 2p +a 2q-2p -a 2q +a 2q+2p )；
m 42 ＝(-2b q-2p -2b q+2p )/(a 0 -a 2p +a 2q-2p -a 2q +a 2q+2p )；
m 43 ＝(-2a q-2p +2a q+2p )/(a 0 -a 2p +a 2q-2p -a 2q +a 2q+2p )；
m 44 ＝(a q+p -a q-p )/(a 0 -a 2p +a 2q-2p -a 2q +a 2q+2p )；
a 0 P, 2p, q-p, q + p, q +2p, 2q-p, 2q + p, 2q +2p are 12 non-zero harmonic orders in the Fourier expression of the light intensity modulation function, a n As a Fourier expression of the light intensity modulation functionCoefficient of cosine term in formula, b n Is the coefficient of the sinusoidal term in the fourier expression of the light intensity modulation function.
In order to test the actual calibration effect of the invention, an experimental light path of a double-vortex wave plate muller matrix ellipsometer is established according to a structural system shown in fig. 1 and fig. 2, a light source 101 is a collimator with an emergent wavelength of 633nm, a polarizer 102 and an analyzer 302 are LPVISE100-a type polarizers produced by Thorlabs (sorel) corporation, a first vortex quarter-wave plate 103 is a VR1-633Q-SP type first-order vortex quarter-wave plate produced by lib technology (LBTEK), a second vortex quarter-wave plate 301 is a VR5-633Q-SP type fifth-order vortex quarter-wave plate produced by lib technology (LBTEK), and an image sensor 401 is a diana 95 type scientific grade CMOS camera of a photoelectron (Tucsen).
In the examples, the samples to be tested include: air, linear polarizers with transmission directions at 0 degrees, 90 degrees and 135 degrees, quarter wave plates with fast axis directions at 0 degrees and 45 degrees.
Taking the measurement of an air sample as an example, the measurement method of the double-vortex wave plate mueller matrix ellipsometer is shown as follows: turning on the light source 101, placing no sample on the sample stage 2 (directly measuring air), adjusting the light path of the ellipsometer to a straight-through type, and controlling the image sensor 401 to collect the light intensity of the outgoing light beam of the analyzer by using the computer 402 to obtain a light intensity modulation image corresponding to the air sample as shown in fig. 4. Processing the light intensity modulation image corresponding to the air sample to obtain a light intensity modulation curve corresponding to the air sample, wherein the light intensity modulation curve corresponding to the air sample is shown as a dot-dash curve in fig. 6, performing Fourier analysis on the light intensity modulation curve corresponding to the air sample to obtain a corresponding Fourier expression, and obtaining a Fourier coefficient a in the air sample testing process i (i ═ 0,1,2.. 12) and b j (j ═ 1,2.. 12), a normalized mueller matrix was further calculated as:
for convenience of comparison, the measurement effect of the double-vortex wave plate Mueller matrix ellipsometerMeanwhile, a simulated light intensity modulation image of the air sample and a corresponding light intensity modulation curve thereof are given, as shown by solid lines in fig. 5 and 6, respectively. As can be seen from fig. 4, 5 and 6, the light intensity modulation law obtained by measurement in the experiment is better in agreement with the theory. Calculated normalized Mueller matrix M Air Theoretical value of Mueller matrix with air
Compared with the measurement error of
From the above formula, except that the measurement error of individual mueller matrix elements is slightly larger, the measurement error of most mueller matrix elements can be controlled within 5%, and the feasibility of the dual-vortex wave plate mueller matrix ellipsometer and the measurement method thereof is preliminarily proved.
In order to further verify the effectiveness of the invention, the double-vortex wave plate Mueller matrix ellipsometer provided by the invention is used for measuring a linear polarizer with a light transmission direction at 0 degree, a linear polarizer with a light transmission direction at 90 degrees, a linear polarizer with a light transmission direction at 135 degrees, a quarter-wave plate with a fast axis direction at 0 degree and a quarter-wave plate with a fast axis direction at 45 degrees. FIG. 7 shows a light intensity modulation image measured by a linear polarizer with a transmission direction of 0 degree, FIG. 8 shows a simulated light intensity modulation image measured by a linear polarizer with a transmission direction of 0 degree, FIG. 9 shows a light intensity modulation image measured by a linear polarizer with a transmission direction of 90 degrees, FIG. 10 shows a simulated light intensity modulation image measured by a linear polarizer with a transmission direction of 90 degrees, FIG. 11 shows a light intensity modulation image measured by a linear polarizer with a transmission direction of 135 degrees, FIG. 12 shows a simulated light intensity modulation image measured by a linear polarizer with a transmission direction of 135 degrees, FIG. 13 shows a light intensity modulation image measured by a quarter-wave plate with a fast axis direction of 0 degree, FIG. 14 shows a simulated light intensity modulation image measured by a quarter-wave plate with a fast axis direction of 0 degree, FIG. 15 shows a simulated light intensity modulation image measured by a quarter-wave plate with a fast axis direction of 45 degrees, the simulated light intensity modulation image obtained by measuring the quarter-wave plate with the fast axis direction positioned at 45 degrees is shown in FIG. 16. The light intensity modulation function curve corresponding to the light intensity modulation image in fig. 7 is a chain line in fig. 17, and the light intensity modulation function curve corresponding to the simulated light intensity modulation image in fig. 8 is a solid line in fig. 17. The light intensity modulation function curve corresponding to the light intensity modulation image in fig. 9 is a chain line in fig. 18, and the light intensity modulation function curve corresponding to the simulated light intensity modulation image in fig. 10 is a solid line in fig. 18. The light intensity modulation function curve corresponding to the light intensity modulation image in fig. 11 is a chain line in fig. 19, and the light intensity modulation function curve corresponding to the simulated light intensity modulation image in fig. 12 is a solid line in fig. 19. The light intensity modulation function curve corresponding to the light intensity modulation image in fig. 13 is a chain line in fig. 20, and the light intensity modulation function curve corresponding to the simulated light intensity modulation image in fig. 14 is a solid line in fig. 20. The light intensity modulation function curve corresponding to the light intensity modulation image in fig. 15 is a chain line in fig. 21, and the light intensity modulation function curve corresponding to the simulated light intensity modulation image in fig. 16 is a solid line in fig. 21.
Further calculating to obtain a linear polarizer with a light transmission direction at 0 degree, a linear polarizer with a light transmission direction at 90 degrees, a linear polarizer with a light transmission direction at 135 degrees, a quarter-wave plate with a fast axis direction at 0 degree and a quarter-wave plate with a fast axis direction at 45 degrees, and calculating to obtain measurement errors of five sample Mueller matrix elements:
E p_0 error of Mueller matrix element of linear polarizer with light transmission direction at 0 degree, E p_90 Error of Mueller matrix element of linearly polarizing plate having light transmission direction at 90 degrees, E p_135 The error of the mueller matrix element of the linear polarizer with the light transmission direction at 135 degrees is shown. E Q_0 Error of the Mueller matrix element of the quarter-wave plate at 0 degree in the fast axis direction, E Q_45 Is the error of the mueller matrix element of the quarter-wave plate with the fast axis direction at 45 degrees.
From the above results, although the light intensity modulation rule of each sample to be measured slightly deviates from the theoretical expectation due to various error factors such as the alignment error of the optical element, the wave plate phase retardation error, the camera noise and the like, the measurement errors of most of the mueller matrix elements except a few elements with larger errors can be controlled within 5%, and the feasibility of the double-vortex wave plate mueller matrix ellipsometer and the measurement method thereof is further proved.
The invention adopts a space modulation method, realizes the modulation and demodulation of the polarization states of an incident beam and a reflected (or transmitted) beam by using two vortex wave plates with a certain order ratio, can obtain all Mueller matrices of a sample to be detected by single-time image analysis, has high detection speed, is suitable for detection occasions with higher real-time requirements, is convenient and fast to operate, is simple to calculate, does not have the rotation of an optical element in the measurement process, avoids the error caused by mechanical rotation, improves the stability of a detection system, has insensitive measurement results to the power and wavelength change of a light source, and avoids the measurement error caused by the power fluctuation and wavelength drift of the light source. It should be understood that the above examples are only for clarity of illustration and are not intended to limit the embodiments. Other variations and modifications will be apparent to persons skilled in the art in light of the above description. And are neither required nor exhaustive of all embodiments. And obvious variations or modifications therefrom are within the scope of the invention.
Claims (7)
1. A dual-vortex wave plate Mueller matrix ellipsometer, comprising:
a polarization modulation unit, the polarization modulation unit comprising: the polarizer is positioned between the light source and the first vortex quarter-wave plate;
the sample table is suitable for placing a sample to be detected;
the polarization analyzing and modulating unit comprises a second vortex quarter-wave plate and an analyzer;
the light passing through the first vortex quarter-wave plate is suitable for being reflected or transmitted by the sample to be detected, and the light reflected or transmitted by the sample to be detected is suitable for sequentially passing through the second vortex quarter-wave plate and the analyzer;
the image sensor is suitable for sampling the emergent light beam of the analyzer to obtain a light intensity modulation image, and the light intensity modulation image is changed with the azimuth angle of the light intensity modulation image in a light and shade alternating mode;
the first analysis unit is suitable for obtaining a light intensity modulation function according to the light intensity modulation image, and the light intensity modulation function takes the azimuth angle of the light intensity modulation image as an independent variable and takes the light intensity value of the light intensity modulation image as a dependent variable; the second analysis unit is suitable for carrying out Fourier analysis on the light intensity modulation function to obtain a Fourier expression of the light intensity modulation function; and the third analysis unit is suitable for acquiring the Mueller matrix of the sample to be detected according to the coefficient in the Fourier expression of the light intensity modulation function.
2. The dual-vortex wave plate mueller matrix ellipsometer of claim 1, wherein the order p of the first vortex quarter wave plate and the order q of the second vortex quarter wave plate satisfy that p and q are positive integers, q is greater than 2p, and p and q are coprime.
3. The dual-vortex waveplate mueller matrix ellipsometer of claim 1, wherein the sample stage has a stage center axis perpendicular to a surface of the sample stage; the arrangement directions of the light source, the polarizer and the first vortex quarter-wave plate in the polarization modulation unit and the arrangement directions of the second vortex quarter-wave plate and the analyzer in the polarization detection modulation unit are symmetrical relative to the central axis of the table board.
4. The dual-vortex wave plate mueller matrix ellipsometer according to any one of claims 1 to 3, further comprising: the first position adjusting unit is suitable for adjusting the arrangement direction of the light source, the polarizer and the first vortex quarter-wave plate in the polarization modulation unit; the second position adjusting unit is suitable for adjusting the arrangement direction of the second vortex quarter-wave plate and the analyzer; and the third position regulator is suitable for switching between a horizontal placing position of the sample to be measured on the sample table and a vertical placing position of the sample to be measured on the sample table.
5. The dual-vortex wave plate Mueller matrix ellipsometer according to claim 1, wherein when the sample to be tested is a transmissive sample, a thickness direction of the sample to be tested is parallel to a surface of the sample stage, and arrangement directions of the light source, the polarizer and the first vortex quarter wave plate and arrangement directions of the second vortex quarter wave plate and the analyzer are parallel to the surface of the sample stage; when the sample to be detected is a reflective sample, the thickness direction of the sample to be detected is perpendicular to the surface of the sample stage, the included angle between the arrangement direction of the light source, the polarizer and the first vortex quarter-wave plate and the surface of the sample stage is larger than zero, and the included angle between the arrangement direction of the second vortex quarter-wave plate and the analyzer and the surface of the sample stage is larger than zero.
6. A measurement method using the dual-vortex-plate mueller matrix ellipsometer of any one of claims 1 to 5, comprising:
step S1, placing the sample to be tested on a sample table;
step S2, turning on a light source, and adjusting the arrangement directions of the light source, the polarizer and the first vortex quarter-wave plate in the polarization modulation unit and the arrangement directions of the second vortex quarter-wave plate and the analyzer in the polarization detection modulation unit according to the transmissivity and the reflectivity of the sample to be detected;
step S3, the image sensor samples the emergent light beam of the analyzer to obtain a light intensity modulation image, and the light intensity modulation image is alternately changed in light and shade along with the azimuth angle of the light intensity modulation image;
step S4, analyzing the light intensity modulation image to obtain a light intensity modulation function, wherein the light intensity modulation function takes the azimuth angle of the light intensity modulation image as an independent variable and takes the light intensity value of the light intensity modulation image as a dependent variable;
step S5, carrying out Fourier analysis on the light intensity modulation function to obtain a Fourier expression of the light intensity modulation function;
and step S6, obtaining the Mueller matrix of the sample to be measured according to the coefficient in the Fourier expression of the light intensity modulation function.
7. The measurement method according to claim 6, wherein the light intensity modulation function is:
the Fourier expression of the light intensity modulation function is as follows:
wherein m is 11 ＝1，m 12 ＝(2a 2p -2a 2q-2p -2a 2q+2p )/(a 0 -a 2p +a 2q-2p -a 2q +a 2q+2p )；
m 13 ＝(2b 2p +2b 2q-2p -2b 2q+2p )/(a 0 -a 2p +a 2q-2p -a 2q +a 2q+2p )；
m 14 ＝(b p +b 2q-p -b 2q+p )/(a 0 -a 2p +a 2q-2p -a 2q +a 2q+2p )；
m 21 ＝(-2a 2q-2p +2a 2q -2a 2q+2p )/(a 0 -a 2p +a 2q-2p -a 2q +a 2q+2p )；
m 22 ＝(4a 2q-2p +4a 2q+2p )/(a 0 -a 2p +a 2q-2p -a 2q +a 2q+2p )；
m 23 ＝(-4b 2q-2p +4b 2q+2p )/(a 0 -a 2p +a 2q-2p -a 2q +a 2q+2p )；
m 24 ＝(-2b 2q-p +2b 2q+p )/(a 0 -a 2p +a 2q-2p -a 2q +a 2q+2p )；
m 31 ＝(-2b 2q-2p +2b 2q -2b 2q+2p )/(a 0 -a 2p +a 2q-2p -a 2q +a 2q+2p )；
m 32 ＝(4b 2q-2p +4b 2q+2p )/(a 0 -a 2p +a 2q-2p -a 2q +a 2q+2p )；
m 33 ＝(4a 2q-2p -4a 2q+2p )/(a 0 -a 2p +a 2q-2p -a 2q +a 2q+2p )；
m 34 ＝(2a 2q-p -2a 2q+p )/(a 0 -a 2p +a 2q-2p -a 2q +a 2q+2p )；
m 41 ＝(2b q-2p -b q )/(a 0 -a 2p +a 2q-2p -a 2q +a 2q+2p )；
m 42 ＝(-2b q-2p -2b q+2p )/(a 0 -a 2p +a 2q-2p -a 2q +a 2q+2p )；
m 43 ＝(-2a q-2p +2a q+2p )/(a 0 -a 2p +a 2q-2p -a 2q +a 2q+2p )；
m 44 ＝(a q+p -a q-p )/(a 0 -a 2p +a 2q-2p -a 2q +a 2q+2p )；
Wherein,
the light intensity value of the image is modulated for the light intensity,
for the azimuth angle, m, of the intensity-modulated image 11 、m 12 、m 13 、m 14 、m 21 、m 22 、m 23 、m 24 、m 31 、m 32 、m 33 、m 34 、m 41 、m 42 、m 43 And m 44 Is an element of the mueller matrix; p is the order of the first vortex quarter wave plate and q is the order of the second vortex quarter wave plate; a is 0 P, 2p, q-p, q + p, q +2p, 2q-p, 2q + p, 2q +2p are 12 non-zero harmonic orders in the Fourier expression of the light intensity modulation function, a n Being the coefficient of the cosine term in the Fourier expression of the light intensity modulation function, b n Is the coefficient of the sinusoidal term in the fourier expression of the light intensity modulation function.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202210640130.6A CN115060658B (en) | 2022-06-07 | 2022-06-07 | Double-vortex wave plate Mueller matrix ellipsometer and measuring method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202210640130.6A CN115060658B (en) | 2022-06-07 | 2022-06-07 | Double-vortex wave plate Mueller matrix ellipsometer and measuring method thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN115060658A true CN115060658A (en) | 2022-09-16 |
| CN115060658B CN115060658B (en) | 2023-12-26 |
Family
ID=83201317
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202210640130.6A Active CN115060658B (en) | 2022-06-07 | 2022-06-07 | Double-vortex wave plate Mueller matrix ellipsometer and measuring method thereof |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN115060658B (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN116930093A (en) * | 2023-04-01 | 2023-10-24 | 中国人民解放军国防科技大学 | Error calibration method of double-vortex wave plate Mueller matrix ellipsometer |
Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103134592A (en) * | 2013-01-31 | 2013-06-05 | 华中科技大学 | Transmission type Mueller matrix spectrum ellipsometer and measuring method thereof |
| US20160169742A1 (en) * | 2014-12-16 | 2016-06-16 | Korea Research Institute Of Standards And Science | Rotating-Element Spectroscopic Ellipsometer and Method for Measurement Precision Prediction of Rotating-Element Spectroscopic Ellipsometer, Recording Medium Storing Program for Executing the Same, and Computer Program Stored in Medium for Executing the Same |
| CN112345460A (en) * | 2020-10-14 | 2021-02-09 | 武汉颐光科技有限公司 | Dual-rotation and high-yield mode switching method and system for Mueller matrix ellipsometer |
| CN112378860A (en) * | 2020-10-23 | 2021-02-19 | 华中科技大学 | Calibration method for system parameters of rotary device type Mueller matrix ellipsometer |
| CN113281267A (en) * | 2021-05-14 | 2021-08-20 | 华中科技大学 | Method for calibrating system parameters of dual-rotation compensator type Mueller matrix ellipsometer |
| CN114136894A (en) * | 2021-11-28 | 2022-03-04 | 中国人民解放军国防科技大学 | Error calibration method and device of polarization detection system based on vortex wave plate |
| CN114152578A (en) * | 2021-11-26 | 2022-03-08 | 北京理工大学 | Vortex wave plate-based spatial modulation polarization detection method |
| US11346768B1 (en) * | 2020-12-02 | 2022-05-31 | Onto Innovation Inc. | Vortex polarimeter |
-
2022
- 2022-06-07 CN CN202210640130.6A patent/CN115060658B/en active Active
Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103134592A (en) * | 2013-01-31 | 2013-06-05 | 华中科技大学 | Transmission type Mueller matrix spectrum ellipsometer and measuring method thereof |
| US20160169742A1 (en) * | 2014-12-16 | 2016-06-16 | Korea Research Institute Of Standards And Science | Rotating-Element Spectroscopic Ellipsometer and Method for Measurement Precision Prediction of Rotating-Element Spectroscopic Ellipsometer, Recording Medium Storing Program for Executing the Same, and Computer Program Stored in Medium for Executing the Same |
| CN112345460A (en) * | 2020-10-14 | 2021-02-09 | 武汉颐光科技有限公司 | Dual-rotation and high-yield mode switching method and system for Mueller matrix ellipsometer |
| CN112378860A (en) * | 2020-10-23 | 2021-02-19 | 华中科技大学 | Calibration method for system parameters of rotary device type Mueller matrix ellipsometer |
| US11346768B1 (en) * | 2020-12-02 | 2022-05-31 | Onto Innovation Inc. | Vortex polarimeter |
| CN113281267A (en) * | 2021-05-14 | 2021-08-20 | 华中科技大学 | Method for calibrating system parameters of dual-rotation compensator type Mueller matrix ellipsometer |
| CN114152578A (en) * | 2021-11-26 | 2022-03-08 | 北京理工大学 | Vortex wave plate-based spatial modulation polarization detection method |
| CN114136894A (en) * | 2021-11-28 | 2022-03-04 | 中国人民解放军国防科技大学 | Error calibration method and device of polarization detection system based on vortex wave plate |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN116930093A (en) * | 2023-04-01 | 2023-10-24 | 中国人民解放军国防科技大学 | Error calibration method of double-vortex wave plate Mueller matrix ellipsometer |
| CN116930093B (en) * | 2023-04-01 | 2024-01-26 | 中国人民解放军国防科技大学 | Error calibration method of double-vortex wave plate Mueller matrix ellipsometer |
Also Published As
| Publication number | Publication date |
|---|---|
| CN115060658B (en) | 2023-12-26 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US5956145A (en) | System and method for improving data acquisition capability in spectroscopic rotatable element, rotating element, modulation element, and other ellipsometer and polarimeter and the like systems | |
| US4647207A (en) | Ellipsometric method and apparatus | |
| JP5368507B2 (en) | Surface characteristic analysis system with self-calibration function | |
| CN111122460B (en) | Single-rotation compensator type spectroscopic ellipsometer parameter calibration method and device | |
| CN103134592A (en) | Transmission type Mueller matrix spectrum ellipsometer and measuring method thereof | |
| CN109115690B (en) | Terahertz time domain ellipsometer sensitive to real-time polarization and optical constant measurement method | |
| CN104677834A (en) | Method for carrying out optical measurement by using full-Mueller matrix ellipsometer | |
| CN112378860B (en) | Calibration method for system parameters of rotary device type Mueller matrix ellipsometer | |
| CN111413282A (en) | Photoelastic high-speed Mueller matrix ellipsometer and in-situ calibration and measurement method thereof | |
| CN104677838A (en) | Self-calibration full-Mueller matrix ellipsometer measuring system | |
| CN113281268B (en) | Data analysis method and system for rotating polarization device spectrum ellipsometer | |
| US20130242303A1 (en) | Dual angles of incidence and azimuth angles optical metrology | |
| CN115060658B (en) | Double-vortex wave plate Mueller matrix ellipsometer and measuring method thereof | |
| EP0737856A2 (en) | Polarisation monitoring methods and apparatus | |
| CN103163078B (en) | Method for improving measurement precision of ellipsometer | |
| CN104677837A (en) | Calibration method of full-Mueller matrix ellipsometer | |
| TW201638575A (en) | Calibration method and device for broad-band achromatic composite wave plate and corresponding measurement system | |
| CN114427834A (en) | Ellipsometry measurement system based on synchronous reference light correction | |
| CN111207678B (en) | Non-rotating film thickness and refractive index measuring method | |
| CN104677835A (en) | Calibration method of full-Mueller matrix ellipsometer | |
| CN118243274A (en) | Optical nondestructive testing system and method for residual stress of substrate | |
| CN113358604B (en) | Oblique incidence type spectral reflection differential measurement device and method | |
| JP5361843B2 (en) | Optical anisotropy evaluation method and evaluation apparatus | |
| CN115112028A (en) | Film thickness measuring device and method based on laser ellipsometry system | |
| Srisuwan et al. | Validiation of photometric ellipsometry for refractive index and thickness measurements |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |