CN115057628B - Neutral-color LOW-reflection LOW-E coated glass and preparation method thereof - Google Patents
Neutral-color LOW-reflection LOW-E coated glass and preparation method thereof Download PDFInfo
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- CN115057628B CN115057628B CN202210742156.1A CN202210742156A CN115057628B CN 115057628 B CN115057628 B CN 115057628B CN 202210742156 A CN202210742156 A CN 202210742156A CN 115057628 B CN115057628 B CN 115057628B
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- 239000011521 glass Substances 0.000 title claims abstract description 86
- 238000002360 preparation method Methods 0.000 title abstract description 7
- 239000010410 layer Substances 0.000 claims abstract description 624
- 239000002131 composite material Substances 0.000 claims abstract description 109
- 230000004888 barrier function Effects 0.000 claims abstract description 81
- 239000002346 layers by function Substances 0.000 claims abstract description 80
- 239000011241 protective layer Substances 0.000 claims abstract description 45
- 230000000903 blocking effect Effects 0.000 claims abstract description 27
- 239000000758 substrate Substances 0.000 claims abstract description 24
- VNNRSPGTAMTISX-UHFFFAOYSA-N chromium nickel Chemical compound [Cr].[Ni] VNNRSPGTAMTISX-UHFFFAOYSA-N 0.000 claims abstract description 21
- 229910001120 nichrome Inorganic materials 0.000 claims abstract description 21
- 230000007935 neutral effect Effects 0.000 claims abstract description 18
- 229910004205 SiNX Inorganic materials 0.000 claims description 23
- 238000000034 method Methods 0.000 claims description 17
- 229910007667 ZnOx Inorganic materials 0.000 claims description 15
- 239000011248 coating agent Substances 0.000 claims description 15
- 238000000576 coating method Methods 0.000 claims description 15
- 238000001755 magnetron sputter deposition Methods 0.000 claims description 14
- 229910003087 TiOx Inorganic materials 0.000 claims description 4
- HLLICFJUWSZHRJ-UHFFFAOYSA-N tioxidazole Chemical compound CCCOC1=CC=C2N=C(NC(=O)OC)SC2=C1 HLLICFJUWSZHRJ-UHFFFAOYSA-N 0.000 claims description 4
- 238000004519 manufacturing process Methods 0.000 claims 1
- 230000005540 biological transmission Effects 0.000 abstract description 7
- 238000001579 optical reflectometry Methods 0.000 abstract description 4
- 238000004544 sputter deposition Methods 0.000 description 23
- 239000000047 product Substances 0.000 description 20
- 238000002834 transmittance Methods 0.000 description 13
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 12
- 239000000463 material Substances 0.000 description 10
- 230000008569 process Effects 0.000 description 10
- 239000013077 target material Substances 0.000 description 10
- 239000011247 coating layer Substances 0.000 description 8
- 229910052786 argon Inorganic materials 0.000 description 6
- 239000007789 gas Substances 0.000 description 6
- 229910052709 silver Inorganic materials 0.000 description 6
- 239000004332 silver Substances 0.000 description 6
- 230000008901 benefit Effects 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 5
- 230000007547 defect Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 230000031700 light absorption Effects 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 230000000007 visual effect Effects 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 239000004566 building material Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000005329 float glass Substances 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000012466 permeate Substances 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3615—Coatings of the type glass/metal/other inorganic layers, at least one layer being non-metallic
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3626—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer one layer at least containing a nitride, oxynitride, boronitride or carbonitride
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3639—Multilayers containing at least two functional metal layers
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3644—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the metal being silver
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3649—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer made of metals other than silver
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3657—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating having optical properties
- C03C17/366—Low-emissivity or solar control coatings
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/70—Properties of coatings
- C03C2217/78—Coatings specially designed to be durable, e.g. scratch-resistant
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/154—Deposition methods from the vapour phase by sputtering
- C03C2218/156—Deposition methods from the vapour phase by sputtering by magnetron sputtering
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- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Surface Treatment Of Glass (AREA)
Abstract
The invention relates to neutral LOW-reflection LOW-E coated glass and a preparation method thereof, wherein the coated glass comprises a glass substrate, an antireflection film layer, two or three composite film layers and a top protective layer, wherein the antireflection film layer, the two or three composite film layers and the top protective layer are sequentially coated on one side surface of the glass substrate from inside to outside, each composite film layer comprises a medium layer, a seed layer, a functional layer and a blocking layer which are sequentially arranged, the antireflection film layer is adjacent to the medium layer of the adjacent composite film layer, the blocking layer of the adjacent composite film layer is adjacent to the medium layer of the adjacent composite film layer, the top protective layer is adjacent to the blocking layer of the adjacent composite film layer, the blocking layer is a NiCrMo layer or a NiCr layer, and the blocking layer of at least one composite film layer is a NiCrMo layer. According to the coated glass provided by the invention, the antireflection film layer is added, so that the coated glass can have extremely low visible light reflectivity, and NiCrMo is used as a barrier layer of the functional layer, so that the coated glass has a relatively neutral transmission color.
Description
Technical Field
The invention belongs to the technical field of coated glass, and particularly relates to neutral-color LOW-reflection LOW-E coated glass and a preparation method thereof.
Background
As an energy-saving building material, in the prior art, low-emissivity coated glass generally refers to a low-emissivity coated glass which is formed by depositing a low-emissivity functional layer on the surface of float glass, so as to reflect near infrared rays in sunlight and far infrared rays in living environment, thereby achieving the effect of reducing the absorption and radiation of the glass to the infrared rays, and is called as low-emissivity coated glass.
The low-radiation coated glass can be used for doors and windows of families, glass curtain walls of shops, office buildings and high-grade hotels and other places where the glass is needed. Along with the large-scale application of the traditional low-emissivity coated glass, the light pollution is an urgent problem which puzzles urban residents due to the higher reflectivity of the glass to visible light. In order to reduce the phenomenon of light pollution caused by large-scale use of the glass curtain wall, governments in various places issue policy and regulations, and limit the external reflection of building glass.
The existing low-emissivity coated glass has the following defects: 1. the visible light reflectivity is high, and light pollution is easy to cause; 2. the product is transmitted through the chromatic aberration, and the visual effect of people is affected.
Disclosure of Invention
The invention aims to provide neutral-color LOW-reflection LOW-E coated glass and a preparation method thereof, which are used for solving the problems that the visible light reflectivity of the existing coated glass is higher, the product has a color difference in transmission and the visual effect is affected.
In order to achieve the above purpose, the invention adopts a technical scheme that:
The neutral color LOW-reflection LOW-E coated glass comprises a glass substrate, an antireflection film layer, two or three composite film layers and a top protective layer, wherein the antireflection film layer, the two or three composite film layers and the top protective layer are sequentially coated on one side surface of the glass substrate from inside to outside, each composite film layer comprises a medium layer, a seed layer, a functional layer and a barrier layer which are sequentially arranged, the antireflection film layer is adjacent to the medium layer of the adjacent composite film layer, the barrier layer of the adjacent composite film layer is adjacent to the medium layer of the adjacent composite film layer, the top protective layer is adjacent to the barrier layer of the adjacent composite film layer, the barrier layer is a NiCrMo layer or a NiCr layer, and at least one barrier layer of the composite film layer is a NiCrMo layer.
Preferably, the thickness of the barrier layer of at least one of the composite film layers is greater than or equal to 1nm.
Preferably, the antireflection film layer is a NiCr layer.
Preferably, the functional layer is an Ag layer or an Ag+Cu layer; if the functional layer is an Ag+Cu layer, the Ag layer is adjacent to the seed layer of the adjacent composite film layer, and the Cu layer is adjacent to the barrier layer of the adjacent composite film layer.
Preferably, the dielectric layer and the top protective layer are one or a combination of multiple layers of SiNx layer, siOx layer, siNxOy layer and TiOx layer.
Preferably, the seed layer is one layer or a combination of two layers of a ZnOx layer and a ZnSnOx layer.
Preferably, two composite film layers are arranged, the composite film layer adjacent to the antireflection film layer comprises a first dielectric layer, a first seed layer, a first functional layer and a first blocking layer, the composite film layer adjacent to the top protective layer comprises a second dielectric layer, a second seed layer, a second functional layer and a second blocking layer, and the antireflection film layer, the first dielectric layer, the first seed layer, the first functional layer, the first blocking layer, the second dielectric layer, the second seed layer, the second functional layer, the second blocking layer and the top protective layer are sequentially deposited on one side surface of the glass substrate from inside to outside.
Preferably, the number of the composite film layers is three, the composite film layer adjacent to the antireflection film layer comprises a first dielectric layer, a first seed layer, a first functional layer and a first blocking layer, the middle composite film layer between the two composite film layers comprises a second dielectric layer, a second seed layer, a second functional layer and a second blocking layer, the composite film layer adjacent to the top protective layer comprises a third dielectric layer, a third seed layer, a third functional layer and a third blocking layer, and the antireflection film layer, the first dielectric layer, the first seed layer, the first functional layer, the first blocking layer, the second dielectric layer, the second seed layer, the second functional layer, the second blocking layer, the third dielectric layer, the third seed layer, the third functional layer, the third blocking layer and the top protective layer are sequentially deposited on one side surface of the glass substrate from inside to outside.
Preferably, in each of the composite film layers, the thickness of the functional layer is 7 or more and 16nm or less; if the functional layer is an Ag+Cu layer, the thickness of the Cu layer is more than or equal to 5 and less than 7nm; the thickness of the barrier layer is more than 0 and less than or equal to 4nm; the thickness of the anti-reflection film layer is more than 1.3 and less than or equal to 3nm; the thickness range of the dielectric layer is 28-70 nm; the thickness range of the top protective layer is 25-43 nm; the thickness of the seed layer ranges from 5 nm to 10nm.
Another object of the present invention is to provide a method for preparing the neutral color LOW-reflection LOW-E coated glass, which comprises the following steps: an antireflection film layer, a composite film layer and a top protective layer are sequentially plated on one side surface of a glass substrate in a magnetron sputtering coating mode, wherein two or three composite film layers are arranged, and each composite film layer comprises a medium layer, a seed layer, a functional layer and a barrier layer which are sequentially arranged; when the composite layer is plated, the antireflection film layer is adjacent to the dielectric layer of the adjacent composite film layer, the functional layer of the composite film layer adjacent to the antireflection film layer is adjacent to the barrier layer of the adjacent composite film layer, and the top protective layer is adjacent to the barrier layer of the adjacent composite film layer.
Due to the application of the technical scheme, compared with the prior art, the invention has the following advantages:
According to the neutral-color LOW-reflection LOW-E coated glass provided by the invention, the antireflection film layer is added, so that the coated glass can have extremely LOW visible light reflectivity, and the NiCrMo is used as a barrier layer of the functional layer, so that the coated glass has a more neutral transmission color, and a more real look and feel when an outdoor scene is observed indoors; the thickness of the blocking layer can be adjusted to flexibly adjust the visible light transmittance of the whole film system, and the neutrality of the transmission color of the glass product is maximally maintained, so that the adjustment range of the perspective color of the glass product is wide, and the requirements of customers in different areas are met; as a barrier layer, niCrMo can increase the toughness and hardness of the film layer and prevent the coated film layer from being scratched, worn, corroded, oxidized and other defects.
Detailed Description
The invention is further described below in connection with the embodiments shown.
The neutral LOW-reflection LOW-E coated glass comprises a glass substrate, an antireflection film layer, two or three composite film layers and a top protective layer, wherein the antireflection film layer, the two or three composite film layers and the top protective layer are sequentially coated on one side surface of the glass substrate from inside to outside, each composite film layer comprises a medium layer, a seed layer, a functional layer and a blocking layer which are sequentially arranged, the antireflection film layer is adjacent to the medium layer of the adjacent composite film layer, the blocking layer of the adjacent composite film layer is adjacent to the medium layer of the adjacent composite film layer, and the top protective layer is adjacent to the blocking layer of the adjacent composite film layer, wherein:
The anti-reflection film layer mainly comprises NiCr, and the material has high visible light absorption capacity, high hardness, high wear resistance and high chemical stability, provides high anti-reflection capacity, has high protection effect on the film layer, has good adhesiveness with glass, and has good adhesiveness with a dielectric layer.
The barrier layer is a NiCrMo layer or a NiCr layer, the barrier layer of at least one composite film layer is a NiCrMo layer, the material of the barrier layer NiCrMo is used for enabling a glass product to permeate color neutrality, the light transmittance of the glass product can be adjusted by adjusting the thickness of the material of the barrier layer NiCrMo, the color neutrality of the glass product is maximally maintained, and a more real look and feel when an outdoor scene is observed indoors is obtained; the functional layer can also be protected from damage during hot working.
Conventional double-silver and triple-silver coated glass adopts NiCr as a barrier layer for adjusting the light transmittance of a product, but due to the inherent property of a NiCr film material, the transparent color is greenish, and no new material is used for replacing the defective barrier layer material for a long time, so that the double-silver and triple-silver coated glass has been used all the time.
If two composite film layers are arranged, the barrier layer of one of the two composite film layers is a NiCrMo layer, or the barrier layers of the two composite film layers are both NiCrMo layers. If three composite film layers are arranged, the barrier layer in one composite film layer is a NiCrMo layer, or the barrier layers in two composite film layers are both NiCrMo layers, or the barrier layers in three composite film layers are both NiCrMo layers.
The advantage of NiCrMo over NiCr is that adding Mo to the alloy can improve the color of the product. The NiCrMo has the advantages that compared with a single Mo layer, the alloy can increase the toughness and hardness of the film layer, and the main function is to prevent the coated film layer from being scratched, worn, corroded, oxidized and other defects.
The thickness of the blocking layer of at least one composite film layer is larger than or equal to 1nm, if the blocking layer is too thin, the light transmittance of the product is higher, the influence of the reflection of the matched piece on the whole outdoor reflection of the product is larger, and the reduction of the reflection of the product is not facilitated.
The dielectric layer is one or a combination of multiple layers of SiNx layer, siOx layer, siNxOy layer and TiOx layer, and is an ultra-strength and ultra-hardness material with excellent chemical stability, which has the functions of improving the adhesion of the functional silver layer to the glass surface, protecting the functional silver layer, adjusting the color and improving the hardness of the film system, and can improve the mechanical processing performance of the film layer, wherein the SiNx layer is optimal, and the SiNx and the glass have good bonding performance and strong corrosion resistance, mechanical scratch resistance and high-temperature oxidation resistance.
The seed layer is one layer or the combination of two layers of the ZnOx layer and the ZnSnOx layer, the ZnOx is used as the optimal seed layer, the flatness of the film layer can be improved, a clean surface without pollution is provided for the functional layer, and the adhesive force of the metal of the functional layer in the film layer is increased, so that the functional layer can better exert performance.
The functional layer is an Ag layer or an Ag+Cu layer, and the metal Ag has very good conductivity, so that the surface resistance and the emissivity of the whole film layer can be reduced, and the function of adjusting the color and the performance of the film layer is also realized. If the functional layer is an Ag+Cu layer, the Ag layer is adjacent to the seed layer of the adjacent composite film layer, and the Cu layer is adjacent to the barrier layer of the adjacent composite film layer.
The top protective layer is one or a combination of multiple layers of SiNx layer, siOx layer, siNxOy layer and TiOx layer, and is optimal to the SiNx layer, and has strong corrosion resistance, mechanical scratch resistance and high-temperature oxidation resistance.
The thickness ranges of the film layers are as follows: in each composite film layer, the thickness of the antireflection film layer is more than 1.3 and less than or equal to 3nm; the thickness range of the dielectric layer is 28-70 nm; the thickness range of the seed layer is 5-10 nm; the thickness of the functional layer is more than or equal to 7 and less than or equal to 16nm; the thickness of the barrier layer is more than 0 and less than or equal to 4nm; the thickness of the top protective layer ranges from 25 nm to 43nm.
According to different transmission color requirements, two or three composite film layers can be arranged, when the two composite film layers are arranged, an antireflection film layer, two composite film layers and a top protective layer are sequentially plated on one side surface of a glass substrate of neutral color LOW-reflection LOW-E coated glass from inside to outside, one composite film layer comprises a first medium layer, a first seed layer, a first functional layer and a first barrier layer, the other composite film layer comprises a second medium layer, a second seed layer, a second functional layer and a second barrier layer, the antireflection film layer, the first medium layer, the first seed layer, the first functional layer, the first barrier layer, the second medium layer, the second seed layer, the second functional layer, the second barrier layer and the top protective layer are sequentially deposited on the glass substrate from inside to outside, and concretely:
The thickness of the antireflection film layer is more than 1.3 and less than or equal to 3nm; the thickness range of the first dielectric layer is 28-35 nm; the thickness of the first seed layer ranges from 5nm to 8nm; the first functional layer is an Ag layer or an Ag+Cu layer; the thickness of the first barrier layer ranges from 0nm to 2nm; the thickness range of the second dielectric layer is 43-70 nm; the thickness of the second seed layer ranges from 5nm to 10nm; the second functional layer is an Ag layer or an Ag+Cu layer; the thickness of the second barrier layer ranges from 0nm to 4nm; the thickness of the top protective layer ranges from 25 nm to 43nm.
The first functional layer is an Ag layer or an Ag+Cu layer, the thickness of the film layer is more than or equal to 7 and less than or equal to 16nm, if the functional layer is the Ag+Cu layer, the Ag layer is adjacent to the seed layer of the adjacent composite film layer, the Cu layer is adjacent to the barrier layer of the adjacent composite film layer, namely the Ag layer and the Cu layer are sequentially coated respectively, and the thickness of the Cu layer is more than or equal to 5 and less than 7nm; the second functional layer is an Ag layer or an Ag+Cu layer, the thickness range of the film layer is 10-15 nm, if the functional layer is the Ag+Cu layer, the Ag layer is adjacent to the seed layer of the adjacent composite film layer, the Cu layer is adjacent to the barrier layer of the adjacent composite film layer, namely, the Ag layer and the Cu layer are sequentially coated respectively, and the thickness range of the Cu layer is 5-7 nm.
When three composite film layers are arranged, an antireflection film layer, three composite film layers and a top protective layer are sequentially plated on one side surface of the glass substrate of the neutral LOW-reflection coated glass, the composite film layer adjacent to the antireflection film layer comprises a first medium layer, a first seed layer, a first functional layer and a first barrier layer, the middle composite film layer between the two composite film layers comprises a second medium layer, a second seed layer, a second functional layer and a second barrier layer, the composite film layer adjacent to the top protective layer comprises a third medium layer, a third seed layer, a third functional layer and a third barrier layer, the antireflection film layer, the first medium layer, the first seed layer, the first functional layer, the first barrier layer, the second medium layer, the second seed layer, the second functional layer, the second barrier layer, the third medium layer, the third seed layer, the third functional layer, the third barrier layer and the top protective layer are sequentially deposited on the glass substrate from inside to outside.
The thickness range of the antireflection film layer is 1.3-3 nm; the thickness range of the first dielectric layer is 28-35 nm; the thickness of the first seed layer ranges from 5nm to 8nm; the first functional layer is an Ag layer or an Ag+Cu layer; the thickness of the first barrier layer ranges from 0nm to 2nm; the thickness range of the second dielectric layer is 43-70 nm; the thickness of the second seed layer ranges from 5nm to 10nm; the second functional layer is an Ag layer or an Ag+Cu layer; the thickness of the second barrier layer ranges from 0nm to 4nm; the thickness range of the third dielectric layer is 25-43 nm; the thickness range of the third seed layer is 5-8 nm, the thickness range of the third functional layer is 12-17 nm, the thickness range of the third barrier layer is 0-2 nm, and the thickness range of the top protective layer is 25-43nm.
The following is a specific description of two or three composite film layers, see examples 1-2.
Example 1
The composite film layers are two, the neutral LOW-reflection LOW-E coated glass comprises a glass substrate, an antireflection film layer, two composite film layers and a top protective layer, wherein the antireflection film layer, the two composite film layers and the top protective layer are sequentially coated on one side surface of the glass substrate from inside to outside, the antireflection film layer is a NiCr layer, and the thickness of the film layer is 1.3nm; the first dielectric layer is a SiNx layer, and the thickness of the film layer is 29.5nm; the first seed layer is a ZnOx layer, and the thickness of the film layer is 7nm; the first functional layer is an Ag+Cu layer, and the thickness of the film layer is 7nm+5.2nm; the first barrier layer is a NiCrMo layer, and the thickness of the film layer is 1.5nm; the second dielectric layer is a SiNx layer, and the thickness of the film layer is 49nm; the second seed layer is a ZnOx layer, and the thickness of the film layer is 7nm; the second functional layer is an Ag layer, and the thickness of the film layer is 11.2nm; the second barrier layer is a NiCrMo layer, and the thickness of the film layer is 2.7nm; the top protective layer is a SiNx layer, and the thickness of the film layer is 35.5nm.
The standard hollow outdoor reflectance and transmittance color data of the coated glass product provided in this example are as follows:
table 1 outdoor reflectance and transmittance data for example 1
| Outdoor reflectance | Transmittance of light | Transmitted color a × | Transmitted color b | |
| Standard hollow | 7％ | 48％ | -1.1 | 0.8 |
As can be seen from Table 1, the coated glass product of this example showed a reflectance as low as 7% and a neutral color in transmitted color, which was close to natural color.
Comparative example 1
The difference from example 1 is that: the antireflection film layer is not provided in this example.
In this example, the specific film structure and thickness are:
The first dielectric layer is a SiNx layer, and the thickness of the film layer is 29.5nm; the first seed layer is a ZnOx layer, and the thickness of the film layer is 7nm; the first functional layer is an Ag+Cu layer, and the thickness of the film layer is 7nm+5.2nm; the first barrier layer is a NiCrMo layer, and the thickness of the film layer is 1.5nm; the second dielectric layer is a SiNx layer, and the thickness of the film layer is 49nm; the second seed layer is a ZnOx layer, and the thickness of the film layer is 7nm; the second functional layer is an Ag layer, and the thickness of the film layer is 11.2nm; the second barrier layer is a NiCrMo layer, and the thickness of the film layer is 2.7nm; the top protective layer is a SiNx layer, and the thickness of the film layer is 35.5nm.
The standard hollow outdoor reflectance and transmittance color data of the coated glass product provided in this example are as follows:
table 2 comparative example outdoor reflectance and transmission color data
| Outdoor reflectance | Transmittance of light | Transmitted color a × | Transmitted color b | |
| Standard hollow | 9％ | 52％ | -0.8 | 1.5 |
As can be seen from tables 1 and 2, the outdoor reflectance of the coated glass of example 1 is smaller than that of the coated glass of the comparative example, and the NiCr layer of the antireflection film layer of example 1 can effectively reduce the outdoor reflectance of the glass product.
Comparative example 2
The difference from example 1 is that: the first barrier layer and the second barrier layer are both NiCr layers.
In this example, the specific film structure and thickness are:
The antireflection film layer is a NiCr layer, and the thickness of the film layer is 1.3nm; the first dielectric layer is a SiNx layer, and the thickness of the film layer is 29.5nm; the first seed layer is a ZnOx layer, and the thickness of the film layer is 7nm; the first functional layer is an Ag+Cu layer, the thickness of the Ag layer is 7nm, and the thickness of the Cu layer is 5.2nm; the first barrier layer is a NiCr layer, and the thickness of the film layer is 1.5nm; the second dielectric layer is a SiNx layer, and the thickness of the film layer is 49nm; the second seed layer is a ZnOx layer, and the thickness of the film layer is 7nm; the second functional layer is an Ag layer, and the thickness of the film layer is 11.2nm; the second barrier layer is a NiCr layer, and the thickness of the film layer is 2.7nm; the top protective layer is a SiNx layer, and the thickness of the film layer is 35.5nm.
The standard hollow outdoor reflectance and transmittance color data of the coated glass product provided in this example are as follows:
| outdoor reflectance | Transmittance of light | Transmitted color a × | Transmitted color b | |
| Standard hollow | 7％ | 46％ | -2.5 | -1 |
From a comparison of example 1 and comparative example 2, it is understood that the use of a NiCrMo layer for the barrier layer in example 1 is effective in improving the color of the product.
Example 2
The composite film layer is three, the neutral LOW-reflection LOW-E coated glass comprises a glass substrate, and an antireflection film layer, three composite film layers and a top protective layer which are sequentially coated on one side surface of the glass substrate from inside to outside, wherein the specific film layer structure and thickness are as follows: the antireflection film layer is a NiCr layer, and the thickness of the film layer is 1.3nm; the first dielectric layer is a SiNx layer, and the thickness of the film layer is 24.5nm; the first seed layer is a ZnOx layer, and the thickness of the film layer is 7nm; the first functional layer is an Ag layer, and the thickness of the film layer is 8.1nm; the first barrier layer is a NiCrMo layer, and the thickness of the film layer is 0.8nm; the second dielectric layer is a SiNx layer, and the thickness of the film layer is 61nm; the second seed layer is a ZnOx layer, and the thickness of the film layer is 7nm; the second functional layer is an Ag+Cu layer, and the thickness of the film layer is 7nm+4.6nm; the second barrier layer is a NiCrMo layer, and the thickness of the film layer is 1.3nm; the third dielectric layer is a SiNx layer, and the thickness of the film layer is 66nm; the third seed layer is a ZnOx layer, and the thickness of the film layer is 7nm; the third functional layer is an Ag layer, and the thickness of the film layer is 12.6nm; the third barrier layer is a NiCrMo layer, and the thickness of the film layer is 2.1nm; the top protective layer was a SiNx layer with a film thickness of 28.6nm.
The standard hollow outdoor reflectance and transmittance color data of the coated glass product provided in this example are as follows:
| outdoor reflectance | Transmittance of light | Transmitted color a × | Transmitted color b | |
| Standard hollow | 7％ | 49％ | -1.1 | -0.8 |
The invention also provides a method for preparing the neutral-color LOW-reflection LOW-E coated glass, which comprises the following steps:
The method comprises the steps of sequentially plating an antireflection film layer, a composite film layer and a top protective layer on the inner side surface of a glass substrate in a magnetron sputtering coating mode, wherein the composite film layer comprises a medium layer, a seed layer, a functional layer and a barrier layer which are sequentially arranged, the composite film layer is two or three, when the composite layer is plated, the antireflection film layer is adjacent to the medium layer of the adjacent composite film layer, the functional layer of the adjacent composite film layer is adjacent to the barrier layer of the adjacent composite film layer, and the top protective layer is adjacent to the barrier layer of the adjacent composite film layer.
Taking the neutral LOW-reflection LOW-E coated glass of preparation example 1 as an example, the preparation method is specifically described, and the method comprises the following steps:
1. Cleaning and drying a glass substrate to be coated;
2. Vacuum transition;
3. The following sputtering layers are formed by vacuum magnetron sputtering from the glass substrate outwards, and the specific sputtering method is as follows:
s1: the antireflection film layer is a NiCr layer, a magnetron sputtering process is adopted for sputtering coating, and the thickness range of the film layer is 0-2 nm;
S2: the first dielectric layer is a SiNx layer, a magnetron sputtering process is adopted for sputtering coating, and the thickness range of the film layer is 28-35 nm;
S3: the first seed layer is a ZnOx layer, a magnetron sputtering process is adopted for sputtering coating, and the thickness range of the coating layer is 5-8 nm;
S4: the first functional layer is an Ag+Cu layer (sequentially and respectively coated according to sequence), a magnetron sputtering process is adopted for sputtering coating, the total thickness range of the coating layer is 7-16 nm, and the thickness range of the Cu layer is 5-7 nm;
S5: the first barrier layer is a NiCrMo layer, a magnetron sputtering process is adopted for sputtering coating, and the thickness range of the coating layer is 0-2 nm;
s6: the second dielectric layer is a SiNx layer, a magnetron sputtering process is adopted for sputtering coating, and the thickness range of the coating layer is 43-70 nm;
S7: the second seed layer is a ZnOx layer, and is subjected to sputtering coating by adopting a magnetron sputtering process, wherein the thickness range of the coating layer is 5-10 nm;
S8: the second functional layer is an Ag layer, and is subjected to sputtering coating by adopting a magnetron sputtering process, wherein the thickness range of the coating layer is 10-15 nm;
S9: the second barrier layer is a NiCrMo layer, a magnetron sputtering process is adopted for sputtering coating, and the thickness range of the coating layer is 0-4 nm;
s10: the top protective layer is a SiNx layer, a magnetron sputtering process is adopted for sputtering coating, and the thickness range of the coating layer is 25-43 nm;
The sputtering method of the antireflection film layer in the step S1 comprises the following steps: and sputtering in pure argon working gas by adopting a direct current power supply and using a target material as a NiCr target, wherein the purity of the target material is more than 99.99 percent.
The sputtering methods of the first dielectric layer, the second dielectric layer and the top protective layer in the steps S2, S6 and S10 all adopt: the method comprises the steps of adopting an alternating-current intermediate-frequency power supply, using a SiAl target or a pure Si target as a target material, sputtering the target material with the purity of more than 99.7 percent (if the SiAl target is adopted, the Al content in the SiAl target is 8-15 wt%, and the doped Al in the SiAl material mainly plays a role in increasing the conductivity of a film layer material) in an argon and nitrogen mixed gas.
The sputtering method of the first seed layer and the second seed layer in the steps S3 and S7 comprises the following steps: the method adopts an alternating-current medium-frequency power supply, uses a ZnAl target as a target, has the purity of more than 99.8 percent, and is formed by sputtering the target in an argon and oxygen mixed gas, wherein the Al content of the target is 1.5-2.5 weight percent.
The sputtering method of the first functional layer and the second functional layer in the steps S4 and S8 is as follows: and adopting a direct current power supply, and sputtering in pure argon working gas by using a target material which is an Ag+Cu target or an Ag target, wherein the purity of the target material is more than 99.99 percent.
The sputtering method of the first barrier layer and the second barrier layer in the steps S5 and S9 comprises the following steps: and sputtering in pure argon working gas by adopting a direct current power supply and using a NiCrMo target as a target material, wherein the purity of the target material is more than 99.9%. Wherein, the thickness of at least one of the first barrier layer and the second barrier layer is more than or equal to 1nm.
If the first barrier layer and the second barrier layer are NiCr layers, a target material NiCr target is used, the purity of the target material is more than 99.9%, and sputtering is carried out in pure argon working gas.
In the neutral-color LOW-reflection LOW-E coated glass provided by the invention, niCrMo is used as a barrier layer of LOW-radiation glass, and the produced product has the advantage of wide range of perspective color adjustment, even can obtain the purpose of neutral transmission color without Cu with poor processing resistance, and can obtain more real look and feel when an indoor scene is observed; the NiCr is used as an antireflection film layer, and the material has the advantages of higher visible light absorption capacity, high hardness, high wear resistance and high chemical stability, provides higher antireflection capacity, has higher protection effect on the film layer, has good adhesiveness with glass, and has good adhesiveness with a dielectric layer.
The above embodiments are provided to illustrate the technical concept and features of the present invention and are intended to enable those skilled in the art to understand the content of the present invention and implement the same, and are not intended to limit the scope of the present invention. All equivalent changes or modifications made in accordance with the spirit of the present invention should be construed to be included in the scope of the present invention.
Claims (4)
1. A neutral LOW-reflection LOW-E coated glass is characterized in that:
the neutral LOW-reflection LOW-E coated glass comprises a glass substrate, an antireflection film layer, two or three composite film layers and a top protective layer which are sequentially coated on one side surface of the glass substrate from inside to outside, wherein each composite film layer comprises a medium layer, a seed layer, a functional layer and a barrier layer which are sequentially arranged, the anti-reflection film layer is adjacent to a dielectric layer of the adjacent composite film layer, a barrier layer of the adjacent composite film layer is adjacent to a dielectric layer of the adjacent composite film layer, the top protective layer is adjacent to a barrier layer of the adjacent composite film layer, and the barrier layer is a NiCrMo layer; the anti-reflection film layer is a NiCr layer;
The functional layer is an Ag layer or an Ag+Cu layer; if the functional layer is an Ag+Cu layer, the Ag layer is adjacent to the seed layer of the adjacent composite film layer, and the Cu layer is adjacent to the barrier layer of the adjacent composite film layer;
The dielectric layer and the top protective layer are one or a combination of multiple layers of SiNx layer, siOx layer, siNxOy layer and TiOx layer;
the seed layer is one layer or the combination of two layers of a ZnOx layer and a ZnSnOx layer;
In each composite film layer, the thickness of the functional layer is more than or equal to 7 and less than or equal to 16nm; if the functional layer is an Ag+Cu layer, the thickness of the Cu layer is more than or equal to 5 and less than 7nm; the thickness of the anti-reflection film layer is more than 1.3 and less than or equal to 3nm; the thickness range of the dielectric layer is 28-70 nm; the thickness range of the seed layer is 5-10 nm; the thickness of the barrier layer is more than or equal to 1 and less than or equal to 4nm; the thickness of the top protective layer ranges from 25 nm to 43nm.
2. The neutral color LOW-reflection LOW-E coated glass according to claim 1, wherein:
The composite film layer is provided with two, and with the adjacent composite film layer of antireflection film layer include first dielectric layer, first seed layer, first functional layer, first barrier layer, with the adjacent composite film layer of top inoxidizing coating include second dielectric layer, second seed layer, second functional layer, second barrier layer, antireflection film layer, first dielectric layer, first seed layer, first functional layer, first barrier layer, second dielectric layer, second seed layer, second functional layer, second barrier layer, top inoxidizing coating be in glass base member one side surface from interior to exterior deposit in proper order.
3. The neutral color LOW-reflection LOW-E coated glass according to claim 1, wherein:
The composite film layer is arranged to be three, the composite film layer adjacent to the antireflection film layer comprises a first dielectric layer, a first seed layer, a first functional layer and a first blocking layer, the middle composite film layer between the two composite film layers comprises a second dielectric layer, a second seed layer, a second functional layer and a second blocking layer, the composite film layer adjacent to the top protective layer comprises a third dielectric layer, a third seed layer, a third functional layer and a third blocking layer, and the antireflection film layer, the first dielectric layer, the first seed layer, the first functional layer, the first blocking layer, the second dielectric layer, the second seed layer, the second functional layer, the second blocking layer, the third dielectric layer, the third seed layer, the third functional layer, the third blocking layer and the top protective layer are sequentially deposited on one side surface of the glass substrate from inside to outside.
4. A method of making the neutral LOW-reflectance LOW-E coated glass of any one of claims 1-3, comprising:
The method comprises the following steps: an antireflection film layer, a composite film layer and a top protective layer are sequentially plated on one side surface of a glass substrate in a magnetron sputtering coating mode, wherein two or three composite film layers are arranged, and each composite film layer comprises a medium layer, a seed layer, a functional layer and a barrier layer which are sequentially arranged; when the composite layer is plated, the antireflection film layer is adjacent to the dielectric layer of the adjacent composite film layer, the functional layer of the composite film layer adjacent to the antireflection film layer is adjacent to the barrier layer of the adjacent composite film layer, and the top protective layer is adjacent to the barrier layer of the adjacent composite film layer.
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