CN114911149A - Multi-parameter tuning holographic printing photoetching system - Google Patents
Multi-parameter tuning holographic printing photoetching system Download PDFInfo
- Publication number
- CN114911149A CN114911149A CN202210481399.4A CN202210481399A CN114911149A CN 114911149 A CN114911149 A CN 114911149A CN 202210481399 A CN202210481399 A CN 202210481399A CN 114911149 A CN114911149 A CN 114911149A
- Authority
- CN
- China
- Prior art keywords
- subsystem
- light
- optical path
- imaging
- illumination
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000001259 photo etching Methods 0.000 title abstract description 7
- 238000005286 illumination Methods 0.000 claims abstract description 56
- 238000003384 imaging method Methods 0.000 claims abstract description 36
- 230000033001 locomotion Effects 0.000 claims abstract description 20
- 230000003287 optical effect Effects 0.000 claims description 40
- 238000013519 translation Methods 0.000 claims description 16
- 238000011897 real-time detection Methods 0.000 claims description 9
- 238000001459 lithography Methods 0.000 claims description 6
- 238000005516 engineering process Methods 0.000 abstract description 12
- 230000008901 benefit Effects 0.000 abstract description 6
- 238000000034 method Methods 0.000 description 8
- 238000004519 manufacturing process Methods 0.000 description 4
- 238000012544 monitoring process Methods 0.000 description 3
- 230000008859 change Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 230000003190 augmentative effect Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000007687 exposure technique Methods 0.000 description 1
- 238000000025 interference lithography Methods 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/04—Processes or apparatus for producing holograms
- G03H1/0476—Holographic printer
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/04—Processes or apparatus for producing holograms
- G03H1/0465—Particular recording light; Beam shape or geometry
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/26—Processes or apparatus specially adapted to produce multiple sub- holograms or to obtain images from them, e.g. multicolour technique
- G03H1/268—Holographic stereogram
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Holo Graphy (AREA)
Abstract
The invention discloses a multi-parameter tuning holographic printing photoetching system, which comprises: an illumination subsystem for emitting light; the illumination subsystem is connected with the display and imaging subsystem and is used for forming light spots; the display and imaging subsystem is connected with a motion subsystem and a control subsystem and is used for adjusting parameters; the advantages of the computer hologram printing technology and the holographic volume view printing technology are combined, the volume holographic device with complex wavefront modulation capability can be manufactured, the included angle between the reference light and the object light can be adjusted, the illumination mode of the reference light can be adjusted, and the application requirement of a non-collimated complex illumination light field during reproduction is met.
Description
Technical Field
The invention relates to the technical field of holographic functional devices, in particular to a multi-parameter tuning holographic printing photoetching system.
Background
The holographic functional device has wide application in the novel display fields of 3D display, augmented reality, virtual reality, transparent projection and the like. The holographic functional device has flexible design, rich functions, small volume and light weight, so the holographic functional device is favored. However, how to manufacture a large-area high-performance holographic functional device is still a difficult problem in the field. Current fabrication techniques include holographic exposure techniques and holographic printing techniques. The holographic exposure technical scheme is simple, the operation is convenient, but only simple holographic functional devices such as gratings and lenses can be manufactured, and the laboratory environments such as a stable optical platform are required to be used as supports, so that complex large-area functional devices are difficult to manufacture. Holographic printing techniques in turn include holographic volume view printing techniques, computational hologram printing techniques, and wavefront printing techniques. The holographic view printing technology, such as the systems disclosed in US6330088, US7505186, US7800803 and chinese patent CN201711499714.1, cannot produce a holographic device with complex wavefront information because the principle limits that only the direction and intensity information of light can be recorded. The computer-generated hologram printing technology, such as the system disclosed in chinese patent application CN200710068553.0, can theoretically implement a complex wavefront-modulated holographic device, but this technology can only make a thin transmission-type holographic device, and cannot implement the making of a volume holographic device. And diffraction efficiency is limited. The system disclosed in the wave front printing technology such as chinese patent application 202111480688.4 combines the advantages of the computer hologram printing technology and the holographic volume view printing technology, and can realize the fabrication of volume holographic devices with complex wave front modulation capability. However, the included angle between the reference light and the object light of the existing wavefront printing technology system is fixed and difficult to modulate, and the illumination mode of the reference light is fixed, so that the application requirement of a non-collimated complex illumination light field during reproduction cannot be met.
Disclosure of Invention
The invention provides a multi-parameter tuning holographic printing photoetching system, which can realize real-time modulation of any reference light illumination mode and any reference light included angle of the holographic printing photoetching system, and aims to solve the problems that the included angle of reference light and object light of a printing technology system is fixed and is difficult to modulate, the illumination mode of the reference light is fixed, and the application requirement of a non-collimated complex illumination light field during reproduction cannot be met.
In order to achieve the above purpose, the invention provides the following technical scheme:
a multi-parametric tuned holographic printing lithography system, comprising: an illumination subsystem for emitting light; the illumination subsystem is connected with the display and imaging subsystem and is used for forming light spots; the display and imaging subsystem is connected with a motion subsystem and a control subsystem for adjusting parameters. The illumination subsystem comprises a laser light source, a beam expanding and collimating device and a light splitting device. The real-time modulation of any reference light illumination mode and any reference object light included angle of the holographic printing photoetching system can be realized.
Preferably, the display and imaging subsystem comprises: a reference light forming optical path including an optical 4f system; the object light forming light path comprises a beam combining prism; the reference light forming light path and the object light forming light path form a set of two-channel coaxial Fourier transform light path through the beam combining prism. The reference light forming light path at least comprises a scanning galvanometer, the scanning galvanometer is connected with a scanning lens, the scanning lens is connected with a Fourier transform lens, and the scanning lens and the Fourier transform lens form a 4f system. The scanning galvanometer is positioned on the input surface of the scanning lens. The object light forming light path at least comprises a beam combining prism, the beam combining prism is connected with a spatial light modulator, and the spatial light modulator is connected with a Fourier transform lens. The spatial light modulator is located on an input face of the fourier transform lens. The reference light and the object light optical path form a set of double-channel coaxial Fourier transform optical path through a beam combining prism. The reference light and the object light coincide on the output face of the fourier transform lens.
Preferably, the motion subsystem comprises: the motor is connected with the reference light path and used for emitting vibration; and the translation stage is connected with the display and imaging subsystem and is used for changing the imaging position. The angle parameter change of two dimensionalities of the scanning galvanometer (theta, phi) and the position parameter change of two dimensionalities of the two-dimensional precision translation stage (x, y) can be adjusted.
Preferably, the control subsystem is respectively connected with the illumination subsystem, the display and imaging subsystem and the motion subsystem, and comprises a switch, wherein the switch is connected with the illumination subsystem and used for controlling the light source; the control module is connected with the display and imaging subsystem and used for outputting image information; and the controller is connected with the motion subsystem and is used for controlling the motion subsystem to move. The system can coordinate and control the on-off of a laser light source, the image output of a spatial light modulator and the movement of a vibration motor, a two-dimensional precision translation stage and other movement subsystems.
Preferably, the display and imaging subsystem further comprises a miniature imaging optical path, and the miniature imaging optical path comprises an automatic focusing optical path and a real-time detection optical path.
Preferably, the miniature imaging optical path comprises a miniature lens group, and the miniature lens group is connected with the reference light forming optical path, the object light forming optical path and the motion subsystem. The output surface of the Fourier transform lens can be subjected to micro imaging.
Preferably, the automatic focusing optical path comprises an automatic focusing system, the automatic focusing system is connected with the control subsystem, the automatic focusing system is connected with a dichroic mirror, and the dichroic mirror is connected with the reference light forming optical path and the object light forming optical path. The imaging surface formed by the miniature lens group can be ensured to be focused on the surface of the receiver clearly.
Preferably, the real-time detection optical path comprises a real-time detection system, and the real-time detection system is connected with the control subsystem and the automatic focusing system. The imaging result can be monitored in real time.
The invention has the following advantages:
the advantages of the computer hologram printing technology and the holographic volume view printing technology are combined, the volume holographic device with complex wavefront modulation capability can be manufactured, the included angle between the reference light and the object light can be adjusted in real time, the illumination mode of the reference light can be adjusted, and the application requirement of a non-collimated complex illumination light field during reproduction is met.
Drawings
In order to more clearly illustrate the present invention or the technical solutions in the prior art, the drawings used in the description of the embodiments or the prior art will be briefly described below. It should be apparent that the drawings in the following description are merely exemplary, and that other embodiments can be derived from the drawings provided by those of ordinary skill in the art without inventive effort.
Fig. 1 is a schematic view of a first embodiment of the present invention.
Fig. 2 is a schematic view of a second embodiment of the present invention.
Fig. 3 is a schematic view of a third embodiment of the present invention.
Fig. 4 is a schematic view of a fourth embodiment of the present invention.
In the figure:
1-nanosecond pulsed laser; 2-a beam expander; 3-a collimating mirror; 4-a beam splitter; 5-a reflector; 6-reference light diaphragm; 7-MEMS galvanometer; 8-a scanning lens; 9-a beam combiner; 10-phase-only spatial light modulator; 11-a fourier transform lens; 12-a two-dimensional translation stage; 13-a control system; 14-galvanometer drive means; 15-a photosensitive material; 16-a reference light spot; 17-object light spot; 18-field stop; 19-a miniature lens set; a 20-picosecond pulsed laser; 21-a first dichroic mirror; 22-a second dichroic mirror; 23-an autofocus system; 24-an autofocus system driver; 25-a real-time monitoring system; 26-a continuous laser; 27-transmissive amplitude type spatial light modulator; 28-reflective digital micromirror device spatial light modulator; 29-galvanometer mirror; 30-galvanometer driving means; 31-femtosecond pulse laser.
Detailed Description
While embodiments of the present invention will be described with reference to particular embodiments, those skilled in the art will readily appreciate that the present invention has additional advantages and benefits that may be realized from the teachings herein, and that the embodiments described are only a few, but not all embodiments of the present invention. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
In a preferred embodiment, as shown in FIG. 1, the present invention discloses a multi-parameter tuned holographic lithography system comprising an illumination subsystem, a display and imaging subsystem, a motion subsystem and a control subsystem. The illumination subsystem comprises a laser source, the laser source is connected with a beam expanding and collimating device, and the beam expanding and collimating device is connected with a light splitting device; the display and imaging subsystem includes a reference light forming optical path and an object light forming optical path. The reference light forming light path at least comprises a scanning galvanometer, the scanning galvanometer is connected with a scanning lens, the scanning lens is connected with a Fourier transform lens, and the scanning lens and the Fourier transform lens form a 4f system. The scanning galvanometer is positioned on the input surface of the scanning lens. The object light forming light path at least comprises a beam combining prism, the beam combining prism is connected with a spatial light modulator, and the spatial light modulator is connected with a Fourier transform lens. The spatial light modulator is located on an input face of the fourier transform lens. The reference light and the object light optical path form a set of double-channel coaxial Fourier transform optical path through a beam combining prism. The reference light and the object light coincide on the output face of the fourier transform lens. The motion subsystem at least comprises a motor for driving the scanning galvanometer to vibrate and a two-dimensional precision translation stage. The control subsystem is respectively connected with the illumination subsystem, the display and imaging subsystem and the motion subsystem, and coordinates and controls the switch of the laser light source, the image output of the spatial light modulator, the motion of the vibration motor and the two-dimensional precision translation stage.
The optical path structure is as follows: the laser light source emits laser, wide beam parallel light is formed after the laser light passes through the beam expanding and collimating device, the wide beam parallel light passes through the beam splitter to form first illumination light and second illumination light, and the two paths of light enter the display and imaging subsystem. The first illumination light illuminates the reference light path and the second illumination light illuminates the object light path. The first illumination light is incident to the scanning galvanometer, enters the scanning lens and the Fourier transform lens after being reflected by the scanning galvanometer, and forms a reference light spot on the output surface of the Fourier transform lens. The second illumination light passes through the beam combining prism to illuminate the spatial light modulator, transmitted light or reflected light of the spatial light modulator enters the Fourier transform lens after passing through the beam combining prism, and an object light spot is formed on the output face of the Fourier transform lens. The reference spot and the object spot coincide.
The tunable parameters include at least one or a combination of the following parameters: 1) refreshing the spatial light modulator on the object path. 2) The angular parameters of the two dimensions of the scanning galvanometer (theta, phi) are changed. 3) The position parameters of two dimensions of the two-dimensional precision translation stage (x, y) are changed.
Real-time modulation of the included angle between any reference light and object light is realized by modulating two dimensions (theta, phi) of the scanning galvanometer.
The realization method of the arbitrary reference light mode comprises the realization of two dimensions of a scanning galvanometer (theta, phi) and two dimensions of a two-dimensional precision translation stage (x, y) through comprehensive modulation.
The method for realizing the arbitrary reference light mode also comprises the steps of comprehensively modulating two dimensions of the scanning galvanometers (theta, phi), two dimensions of the two-dimensional precision translation stages (x, y) and refreshing the spatial light modulator.
The display and imaging optical path also comprises an optical path for carrying out micro imaging on the output surface of the Fourier transform lens. The miniature imaging optical path also comprises an automatic focusing optical path and a real-time detection optical path. The display and imaging optical path further comprises a reflecting mirror, a wave plate, a dichroic mirror and the like.
The spatial light modulator is selected from a reflective pure phase spatial light modulator, a transmissive pure phase spatial light modulator, a reflective amplitude spatial light modulator, and a transmissive amplitude spatial light modulator.
The information displayed on the spatial light modulator is selected from phase type information, amplitude type information, and complex amplitude type information.
The scanning galvanometer comprises an MEMS two-dimensional scanning mirror, a two-dimensional galvanometer vibrating mirror, a two-dimensional servo motor deflection mirror and a two-dimensional voice coil motor deflection mirror.
The laser light source is selected from a continuous laser, a nanosecond pulse laser, a picosecond pulse laser and a femtosecond pulse laser. The optical path structure of the invention when in use is as follows: the laser light source emits laser, wide beam parallel light is formed after the laser light passes through the beam expanding and collimating device, the wide beam parallel light passes through the beam splitter to form first illumination light and second illumination light, and the two paths of light enter the display and imaging subsystem. The first illumination light illuminates the reference light path and the second illumination light illuminates the object light path. The first illumination light is incident to the scanning galvanometer, enters the scanning lens and the Fourier transform lens after being reflected by the scanning galvanometer, and forms a reference light spot on the output surface of the Fourier transform lens. The second illumination light passes through the beam combining prism to illuminate the spatial light modulator, transmitted light or reflected light of the spatial light modulator enters the Fourier transform lens after passing through the beam combining prism, and an object light spot is formed on the output face of the Fourier transform lens. The reference spot and the object spot coincide.
In a specific embodiment, as shown in fig. 1, the illumination subsystem comprises a nanosecond pulsed laser 1; the nanosecond laser pulser is connected with a beam expander 2, the beam expander is connected with a collimating mirror 3, the collimating mirror is connected with a beam splitter 4, the beam splitter is connected with a reflector 5, the reflector is connected with a reference light diaphragm 6, the reference light diaphragm is connected with an MEMS galvanometer 7, the other side of the MEMS galvanometer corresponding to the reference light diaphragm 6 is connected with a galvanometer driving device 14, the side of the MEMS galvanometer corresponding to the reference light diaphragm 6 is connected with a scanning lens 8, the side of the scanning lens 8 connected with a beam combiner 9, the beam combiner 9 is connected with a pure phase spatial light modulator 10, 9 is also connected with a Fourier transform lens 11, the Fourier transform lens is connected with a photosensitive material 15, one side of the photosensitive material 15, which is far away from the reference light diaphragm 6, is connected with a two-dimensional translation platform 12, and the nanosecond pulse laser 1, the pure phase spatial light modulator 10, the galvanometer driving device 14 and the two-dimensional translation platform 12 are all connected with a control system 13.
Laser light emitted by the nanosecond pulse laser 1 passes through the beam expander 2 and the collimator 3 to form wide-beam parallel light, and the parallel light enters the beam splitter 4 to form first illumination light and second illumination light. The first illuminating light forms a fine parallel light beam through the reflector 5 and the reference light diaphragm 6 to enter the MEMS galvanometer 7, the MEMS galvanometer reflects the fine parallel light beam at a certain angle, the fine parallel light beam enters the scanning lens 8, and the incident angle of the fine parallel light beam controls two-dimensional parameters (theta, phi) of the galvanometer in real time through the galvanometer driving device 14 to realize continuous modulation. The beamlets pass through the scanning lens 8 and the beam combining prism 9 in sequence into the fourier transform lens 11, forming a reference spot 16 on the output face of the fourier transform lens. The reference spot 16 is located on the surface of the photosensitive material 15. The second illumination light enters the beam combining prism 9 after passing through the beam splitter, then illuminates the pure phase type spatial light modulator 10, is modulated and reflected by the spatial light modulator, then is reflected by the beam combining prism 9 to enter the Fourier transform lens 11, and forms an object light spot 17 on the output surface of the Fourier transform lens 11. The object light spot 17 and the reference light spot 16 coincide on the surface of the photosensitive material. The photosensitive material 15 is fixed on the two-dimensional translation stage 12 and can move along with the two-dimensional translation stage. The control system 13 connects the two-dimensional translation stage 12, the spatial light modulator 10, the galvanometer drive 14, and the laser source 1. And the control system coordinately controls the on-off of the laser source, the refreshing of the spatial light modulator, the movement of the MEMS galvanometer and the two-dimensional translation stage, so that each component operates according to a set time sequence.
As shown in fig. 2, in the 2 nd embodiment, the illumination subsystem includes a picosecond pulse laser 20; a miniature lens group 19 is connected between the Fourier transform lens 11 and the photosensitive material 15, and a field stop 18 is connected between the Fourier transform lens 11 and the miniature lens group 19. Laser light emitted by the picosecond pulse laser 20 passes through the beam expander 2 and the collimator lens 3 to form wide-beam parallel light, and the parallel light enters the beam splitter 4 to form first illumination light and second illumination light. The first illuminating light forms a fine parallel light beam through the reflector 5 and the reference light diaphragm 6 to enter the MEMS galvanometer 7, the MEMS galvanometer reflects the fine parallel light beam at a certain angle, the fine parallel light beam enters the scanning lens 8, and the incident angle of the fine parallel light beam controls two-dimensional parameters (theta, phi) of the galvanometer in real time through the galvanometer driving device 14 to realize continuous modulation. The beamlets pass through the scanning lens 8 and the beam combining prism 9 in sequence into the fourier transform lens 11, forming a reference spot 16 on the output face of the fourier transform lens. The reference spot 16 is located in the plane of the field stop 18. The field stop is used to limit the size and shape of the reference spot.
The second illumination light enters the beam combining prism 9 after passing through the beam splitter, and then illuminates the pure phase type spatial light modulator 10, and an included angle α is formed between the normal direction of the display plane of the pure phase type spatial light modulator 10 and the illumination light beam. The illumination light is modulated and reflected by the spatial light modulator and then reflected by the beam combining prism 9 to enter the fourier transform lens 11, and an object light spot 17 is formed on the output surface of the fourier transform lens 11. The angle alpha is such that the positive or negative first order diffracted light of the spatial light modulator is located exactly in the middle of the field stop 18.
The object light spot 17 and the reference light spot 16 coincide in the plane of the field stop 18. The field stop simultaneously limits the size and shape of the object light spot. Light spots corresponding to the field stop are imaged on the surface of the photosensitive material 15 through the miniature lens group 19.
As shown in fig. 3, in the 3 rd embodiment, the illumination subsystem comprises a continuous laser 26; a first dichroic mirror 21 and a second dichroic mirror 22 are arranged between the miniature lens group 19 and the field diaphragm 18, the miniature lens group 19 is connected with an automatic focusing system 23 corresponding to the second dichroic mirror 22, the miniature lens group 19 is connected with an automatic focusing system driver 24, the control system 13 and the first dichroic mirror 21 are both connected with a real-time monitoring system 25, the real-time monitoring system 25 is located on the other side of the light path of the miniature lens group 19, and the object light forming light path comprises a transmission type amplitude spatial light modulator 27.
Laser light emitted by the continuous laser 26 passes through the beam expander 2 and the collimator 3 to form wide-beam parallel light, and the parallel light enters the beam splitter 4 to form first illumination light and second illumination light. The first illuminating light forms a fine parallel light beam through the reflector 5 and the reference light diaphragm 6 to enter the MEMS galvanometer 7, the MEMS galvanometer reflects the fine parallel light beam at a certain angle, the fine parallel light beam enters the scanning lens 8, and the incident angle of the fine parallel light beam controls two-dimensional parameters (theta, phi) of the galvanometer in real time through the galvanometer driving device 14 to realize continuous modulation. The beamlets pass through the scanning lens 8 and the beam combining prism 9 in sequence into the fourier transform lens 11, forming a reference spot 16 on the output face of the fourier transform lens. The reference spot 16 is located in the plane of the field stop 18. The field stop is used to limit the size and shape of the reference spot.
The second illumination light passes through the beam splitter and illuminates the transmissive amplitude type spatial light modulator 27, and then enters the beam combining prism 9. The illumination light is modulated by the spatial light modulator and then enters the fourier transform lens 11 through reflection of the beam combining prism 9, and an object light spot 17 is formed on the output surface of the fourier transform lens 11. The object light spot 17 and the reference light spot 16 coincide in the plane of the field stop 18. The field stop simultaneously limits the size and shape of the object light spot. Light spots corresponding to the field stop are imaged on the surface of the photosensitive material 15 through the first dichroic mirror 21, the second dichroic mirror 22 and the miniature lens group 19. The automatic focusing system 23 is used to ensure that the image plane formed by the field stop through the miniature lens set is focused on the surface of the photosensitive material 15.
As shown in fig. 4, in the 4 th embodiment, the illumination subsystem includes a femtosecond pulse laser 31, the reference light forming optical path includes a galvanometer mirror 29, the galvanometer mirror 29 is connected with a mirror driving device 30, and the object light forming optical path includes a reflective digital micromirror device spatial light modulator 28.
Laser light emitted by the femtosecond pulse laser 31 passes through the beam expander 2 and the collimator lens 3 to form wide-beam parallel light, and the parallel light enters the beam splitter 4 to form first illumination light and second illumination light. The first illumination light forms a fine parallel light beam through the reflector 5 and the reference light diaphragm 6 and enters the galvanometer vibrating mirror 29, the galvanometer vibrating mirror reflects the fine parallel light beam at a certain angle, the fine parallel light beam enters the scanning lens 8, and the incident angle of the fine parallel light beam realizes continuous modulation by controlling two-dimensional parameters (theta, phi) of the vibrating mirror in real time through the vibrating mirror driving device 30. The beamlets pass through the scanning lens 8 and the beam combining prism 9 in sequence into the fourier transform lens 11, forming a reference spot 16 on the output face of the fourier transform lens. The reference spot 16 is located in the plane of the field stop 18. The field stop is used to limit the size and shape of the reference spot.
The second illumination light penetrates through the beam splitter, is reflected by the reflector 5, illuminates the reflective digital micromirror device spatial light modulator 28, is modulated and reflected by the spatial light modulator, then enters the beam combining prism, then enters the Fourier transform lens 11, and forms an object light spot 17 on the output surface of the Fourier transform lens 11. The object light spot 17 and the reference light spot 16 coincide in the plane of the field stop 18. The field stop simultaneously limits the size and shape of the object light spot. Light spots corresponding to the field stop are imaged on the surface of the photosensitive material 15 through the dichroic mirrors 21 and 22 and the miniature lens group 19. The automatic focusing system 23 is used to ensure that the image plane formed by the field stop through the miniature lens set is focused on the surface of the photosensitive material 15.
Although the invention has been described in detail above with reference to a general description and specific examples, it will be apparent to one skilled in the art that modifications or improvements may be made thereto based on the invention. Accordingly, such modifications and improvements are intended to be within the scope of the invention as claimed.
Claims (8)
1. A multi-parameter tuned holographic printing lithography system, comprising: an illumination subsystem for emitting light; the illumination subsystem is connected with the display and imaging subsystem and is used for forming light spots; the display and imaging subsystem is connected with a motion subsystem and a control subsystem for adjusting parameters.
2. The multi-parametric tuned holographic printing lithography system of claim 1, wherein the display and imaging subsystem comprises: a reference light forming optical path including an optical 4f system; the object light forming light path comprises a beam combining prism; and the reference light forming light path and the object light forming light path form a set of double-channel coaxial Fourier transform light path through the beam combining prism.
3. A multiparameter-tuned holographic printing lithography system as claimed in claim 1 or 2, wherein the motion subsystem comprises: the motor is connected with the reference light path and used for emitting vibration; and the translation stage is connected with the display and imaging subsystem and is used for changing into an imaging position.
4. The system of claim 3, wherein the control subsystem is connected to the illumination subsystem, the display and imaging subsystem, and the motion subsystem, respectively, and comprises a switch connected to the illumination subsystem for controlling the light source; the control module is connected with the display and imaging subsystem and used for outputting image information; and the controller is connected with the motion subsystem and is used for controlling the motion subsystem to move.
5. The multi-parameter tuned holographic printing lithography system of claim 4, wherein said display and imaging subsystem further comprises a miniature imaging optical path, said miniature imaging optical path comprising an autofocus optical path and a real-time detection optical path.
6. The system of claim 5, wherein the miniature imaging optical path comprises a miniature lens group, and the miniature lens group is connected with the reference light forming optical path, the object light forming optical path and the motion subsystem.
7. A multiparameter-tuned holographic printing lithography system according to claim 5 or 6, wherein the autofocus optics includes an autofocus optics system, the autofocus optics system being coupled to the control subsystem, the autofocus optics system being coupled to the dichroic mirror, the dichroic mirror being coupled to the reference light forming optics and the object light forming optics.
8. The system of claim 7, wherein the real-time detection optical path comprises a real-time detection system, the real-time detection system being coupled to the control subsystem and the autofocus system.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202210481399.4A CN114911149A (en) | 2022-05-05 | 2022-05-05 | Multi-parameter tuning holographic printing photoetching system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202210481399.4A CN114911149A (en) | 2022-05-05 | 2022-05-05 | Multi-parameter tuning holographic printing photoetching system |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN114911149A true CN114911149A (en) | 2022-08-16 |
Family
ID=82767187
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202210481399.4A Pending CN114911149A (en) | 2022-05-05 | 2022-05-05 | Multi-parameter tuning holographic printing photoetching system |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN114911149A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN116841172A (en) * | 2023-07-05 | 2023-10-03 | 昆明理工大学 | Holographic printing system and method based on optical scanning holography |
Citations (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0580353A2 (en) * | 1992-07-20 | 1994-01-26 | Fujitsu Limited | Stereoscopic display apparatus and method |
| CA2139823A1 (en) * | 1995-01-09 | 1996-07-10 | Michael Burney | Holographic Display Transmitting Device |
| KR19990056437A (en) * | 1997-12-29 | 1999-07-15 | 전주범 | How to control playback of volume holographic digital storage and playback system |
| KR20000043342A (en) * | 1998-12-28 | 2000-07-15 | 전주범 | Device for recording hologram |
| US20050169094A1 (en) * | 2002-08-01 | 2005-08-04 | Yoshihisa Itoh | Hologram recording/reproducing system |
| JP2006078944A (en) * | 2004-09-13 | 2006-03-23 | National Institute Of Information & Communication Technology | Hologram multiple recording apparatus |
| US20060171006A1 (en) * | 2004-12-27 | 2006-08-03 | Sony Corporation | Hologram recording/reproducing device and optical unit |
| US20070041066A1 (en) * | 2005-08-19 | 2007-02-22 | Fuji Xerox Co., Ltd. | Hologram recording method and device |
| US20070104069A1 (en) * | 2005-09-30 | 2007-05-10 | Sony Corporation | Hologram recording/reproducing device and hologram reproducing device |
| CN101373608A (en) * | 2007-08-24 | 2009-02-25 | 日立麦克赛尔株式会社 | Objective optical element and optical head apparatus |
| JP2009238292A (en) * | 2008-03-26 | 2009-10-15 | Fuji Xerox Co Ltd | Device and method for optical recording, and device and method for optical recording/reproducing |
| CN101622576A (en) * | 2007-03-02 | 2010-01-06 | 朗讯科技公司 | Holographic MEMS operated optical projectors |
| JP2017041288A (en) * | 2015-08-18 | 2017-02-23 | 日本放送協会 | Hologram recording medium multiple recording method and hologram recording medium multiple recording device |
| CN112649962A (en) * | 2020-12-22 | 2021-04-13 | 上海趣立信息科技有限公司 | Large-field-angle holographic display system and method based on single spatial light modulator |
-
2022
- 2022-05-05 CN CN202210481399.4A patent/CN114911149A/en active Pending
Patent Citations (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0580353A2 (en) * | 1992-07-20 | 1994-01-26 | Fujitsu Limited | Stereoscopic display apparatus and method |
| CA2139823A1 (en) * | 1995-01-09 | 1996-07-10 | Michael Burney | Holographic Display Transmitting Device |
| KR19990056437A (en) * | 1997-12-29 | 1999-07-15 | 전주범 | How to control playback of volume holographic digital storage and playback system |
| KR20000043342A (en) * | 1998-12-28 | 2000-07-15 | 전주범 | Device for recording hologram |
| US20050169094A1 (en) * | 2002-08-01 | 2005-08-04 | Yoshihisa Itoh | Hologram recording/reproducing system |
| JP2006078944A (en) * | 2004-09-13 | 2006-03-23 | National Institute Of Information & Communication Technology | Hologram multiple recording apparatus |
| US20060171006A1 (en) * | 2004-12-27 | 2006-08-03 | Sony Corporation | Hologram recording/reproducing device and optical unit |
| US20070041066A1 (en) * | 2005-08-19 | 2007-02-22 | Fuji Xerox Co., Ltd. | Hologram recording method and device |
| US20070104069A1 (en) * | 2005-09-30 | 2007-05-10 | Sony Corporation | Hologram recording/reproducing device and hologram reproducing device |
| CN101622576A (en) * | 2007-03-02 | 2010-01-06 | 朗讯科技公司 | Holographic MEMS operated optical projectors |
| CN101373608A (en) * | 2007-08-24 | 2009-02-25 | 日立麦克赛尔株式会社 | Objective optical element and optical head apparatus |
| JP2009238292A (en) * | 2008-03-26 | 2009-10-15 | Fuji Xerox Co Ltd | Device and method for optical recording, and device and method for optical recording/reproducing |
| JP2017041288A (en) * | 2015-08-18 | 2017-02-23 | 日本放送協会 | Hologram recording medium multiple recording method and hologram recording medium multiple recording device |
| CN112649962A (en) * | 2020-12-22 | 2021-04-13 | 上海趣立信息科技有限公司 | Large-field-angle holographic display system and method based on single spatial light modulator |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN116841172A (en) * | 2023-07-05 | 2023-10-03 | 昆明理工大学 | Holographic printing system and method based on optical scanning holography |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US12092815B2 (en) | Methods and systems for generating virtual content display with a virtual or augmented reality apparatus | |
| JP4290095B2 (en) | Display optical system and image display system | |
| CN111247488B (en) | Exposure apparatus for recording hologram, method of recording hologram, and method of controlling exposure apparatus for recording hologram | |
| CN112602004B (en) | Projector-combiner display with beam replication | |
| EP3528058B1 (en) | Holographic display apparatus for providing expanded viewing window | |
| US9213312B2 (en) | Holographic 3D printing apparatus and method of driving the same | |
| JP7371683B2 (en) | Image display device, image display method, and head mounted display | |
| KR101942973B1 (en) | Apparatus for recording/reconstruction of holograms | |
| US20040218241A1 (en) | System for storing holographic digital data | |
| JP2002150567A (en) | Holographic digital data storage system compatible with cd/dvd player | |
| CN115840290A (en) | Compact head-up display | |
| CN114911149A (en) | Multi-parameter tuning holographic printing photoetching system | |
| JPWO2016046863A1 (en) | Lighting device and display device | |
| CN115840291A (en) | Compact head-up display | |
| CN211403128U (en) | Processing and copying system of holographic optical device | |
| EP1916653A1 (en) | Holographic information recording and reproducing apparatus | |
| US20210356745A1 (en) | Method for producing a holographic optical element (hoe), which is provided for projection in a projection system, a holographic optical element of this kind, projection device, lens for data glasses and data glasses of this kind | |
| KR20210147408A (en) | Holographic display apparatus | |
| CN113534478A (en) | Optical assembly, display system and manufacturing method | |
| CN113534477B (en) | Optical assembly, display system and manufacturing method | |
| KR101942975B1 (en) | Apparatus for high speed recording of hologram | |
| KR20130011421A (en) | Holographic 3d display | |
| JP2013195802A (en) | Holographic stereogram recording device and method | |
| JP2011174989A (en) | Holographic recording device and element hologram recording method | |
| CN118068466B (en) | Surface plasmon bottle preparation method and device |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination |